Device suitable for docking interaction between AGV and photoetching machine
By installing the upper plate frame with reflector and dimension adjuster on the lithography machine, the direct docking of AGV and the lithography machine is achieved, which solves the problem that the lithography machine cannot directly dock with AGV, and improves the positioning of the mask plate Accuracy and production efficiency reduce equipment and raw materials costs.
Patent Information
- Application Number
- CN202421151022.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-05-24
- Publication Date
- 2024-12-31
- Estimated Expiration
- 2034-05-24
AI Technical Summary
The lithography machine cannot directly connect with the AGV, resulting in the need to use the transfer equipment for the mask transfer, which increases the risk, time and cost of the product during transportation, and reduces the production efficiency.
A device suitable for docking AGV with lithography machine is designed, including an upper plate frame installed on the lithography machine, with a beam and reflector on the top, and a dimension adjuster and a cover at the bottom, which can be adjusted to accommodate different The mask plate of size realizes direct connection between AGV and lithography machine.
Through the cooperation of the reflector and the size regulator, the positioning accuracy and placement accuracy of the mask plate are improved, the use of transit equipment is reduced, the handling risks of the mask plate and the risk of raw material pollution are reduced, and the production efficiency is improved.
Smart Images
Figure CN222281047U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of mask plate transportation, and in particular to a device suitable for docking and interacting between an AGV and a photolithography machine. Background Art
[0002] A photo mask, also known as a photomask or photomask, is a mask tool used in the preparation of microelectronic chips. It is prepared by photolithography. In the preparation process, the chip design pattern to be prepared must first be made into a transparent mask. The mask is combined with a semiconductor silicon wafer, and a series of processes such as exposure and development are performed by a photolithography machine to finally prepare a microelectronic chip.
[0003] Photolithography is the flower of the modern optical industry and the core technology in the semiconductor, flat panel display and other industries. It mainly uses optical imaging technology to transfer the chip design pattern on the photomask to the surface of the silicon wafer, thereby preparing microelectronic devices with the required functions.
[0004] When preparing large-size masks, lithography machines usually use AGV① to transport the products because they cannot be transported manually. Since the loader on the lithography equipment does not have the function of directly docking with the AGV to pick up and place the mask, when the AGV transports the mask to the lithography equipment, a transfer device is required, such as the HMU Assist Loader (HMU② for short) docking with the AGV to grab and place the mask, and then docking with the lithography machine through the HMU to grab and place the mask.
[0005] The need to transfer the mask through transfer equipment increases the risk of the product during transportation. It also increases the transportation time of the mask and the risk of the mask raw materials being contaminated. This greatly increases the equipment cost and raw material cost, while also reducing production efficiency.
[0006] Explanation of terms:
[0007] ①AGV stands for Automated Guided Vehicle, and its most common applications include AGV handling robots or AGV carts. Its main functions are automatic logistics handling and transportation. AGV handling robots navigate through special landmarks and automatically transport items to designated locations.
[0008] ②HMU Assist Loader is Bare Mask Stocker, a temporary storage device for mask substrates. AGV can place and grab Masks through the AGV port of HMU, and HMU then transfers the Mask from the AGV port to the lithography machine Loader through the Robot. Utility Model Content
[0009] The utility model provides a device suitable for the docking interaction between AGV and photolithography machine, the purpose of which is to save the transfer equipment, realize the direct docking of AGV to grab and release the mask, and solve the problem that the photolithography machine cannot be directly docked with the AGV.
[0010] The utility model is achieved through the following technical scheme: a device suitable for AGV to dock and interact with a photolithography machine, comprising an upper plate frame installed on the photolithography machine, the top of the upper plate frame is connected with a crossbeam, the crossbeam and the bottom of the upper plate frame are both installed with reflective plates, the lower part of the upper plate frame is connected with a size adjuster, the size adjuster is connected with a cover, the cover cover and the size adjuster can be adjusted along the length direction of the upper plate frame, and the top of the cover cover is provided with a groove.
[0011] Compared with the prior art, this solution has the following advantages and beneficial effects:
[0012] In this solution, the reflector at the top crossbeam is used to ensure the left and right position accuracy and distance accuracy of the mask when it is placed on the upper frame, and to avoid interference caused by position deviation when the claw approaches the upper frame. The two reflectors on the top are used for the first positioning when the distance is far, to ensure that the left and right and front and back distances are within the specified range, and the bottom reflector is used for accurate positioning when the distance is close for the second time, to adjust the angle and up and down height of the mask.
[0013] A size adjuster is connected to the lower part of the upper plate frame, and a cover is fixed on the size adjuster. The size adjuster can be adjusted along the length direction of the upper plate frame. The size adjuster is adjustable to meet the placement requirements of masks of different sizes. A groove is provided on the top of the cover, and the groove is the position for the claw at the bottom of the AGV to enter. The setting of this groove can avoid interference with the bottom claw of the AGV.
[0014] In this solution, after the lithography machine grabs the mask and transports it to the lithography machine through the AGV cart, the robot arm on the AGV cart aligns the grabbed mask with the upper plate rack on the lithography machine. After the positions of the upper and lower claws of the AGV arm are aligned with the two reflective plates on the beam and the reflective plate at the bottom of the upper plate rack, the grabbed mask can be accurately placed on the upper plate rack. This solution does not require transfer equipment and realizes direct docking with the AGV to grab and place the mask, solving the problem that the lithography machine cannot be directly docked with the AGV.
[0015] Furthermore, two reflective plates are provided on the crossbeam, and the two reflective plates on the crossbeam are respectively located on the left and right parts of the crossbeam.
[0016] Beneficial effect: The two reflective plates on the crossbeam can improve the positioning accuracy of the claw of the AGV and the upper plate rack of the photolithography machine, so that the mask can be placed on the upper plate rack smoothly and accurately.
[0017] Furthermore, the two reflective plates on the crossbeam are in horizontal sliding cooperation with the crossbeam.
[0018] Beneficial effect: In this solution, the two reflective plates on the beam can slide and adjust their positions according to actual conditions, thereby ensuring positioning accuracy.
[0019] Furthermore, the reflective plate at the bottom of the upper frame is in horizontal sliding cooperation with the upper frame.
[0020] Beneficial effects: This solution facilitates adjustment of the position of the reflector at the bottom of the upper frame according to actual conditions, and is more flexible and practical.
[0021] Furthermore, the reflective plate at the bottom of the upper plate rack is a cross reflective plate.
[0022] Beneficial effect: The cross reflector is used for visual positioning camera to identify the precise position, and can make position judgment during visual positioning, so that the position and angle of the mask can be accurately adjusted through the cross pattern position on the cross reflector identified by the visual camera.
[0023] Furthermore, the groove of the cover is centrally arranged, and vertical fixing holes and latch holes are respectively provided on both sides of the groove of the cover, and two groups of symmetrically arranged guide blocks are provided on the upper plate frame, and the cover is fixed to the size adjuster by inserting fasteners into the vertical fixing holes, and the size adjuster is slidably matched with the two groups of guide blocks, and a plurality of vertical positioning holes are opened on the guide blocks along the length direction thereof, and the size adjuster is detachably connected by inserting latches into the latch holes and the vertical positioning holes.
[0024] Beneficial effects: This solution realizes the connection between the size adjuster and the guide block by fixing the pin into the vertical positioning hole in the guide block. After the pin is pulled out, the size adjuster can be moved up and down, and the size can be locked by inserting the pin. In this solution, the cover and the size adjuster are connected by fasteners and vertical fixing holes. By moving the cover and the size adjuster, the pin holes on the cover are aligned with the vertical positioning holes at different heights on the guide block, so that the cover and the size adjuster can be fixed after adjusting their positions.
[0025] Furthermore, two vertical fixing holes are provided on both sides of the groove of the cover, and each of the latch holes is provided with one, and the two vertical fixing holes are vertically spaced apart from the latch holes.
[0026] Beneficial effect: Such a configuration can improve the fixing effect between the cover and the size adjuster.
[0027] Furthermore, transverse fixing holes which cooperate with the size adjuster are provided on both sides of the groove of the cover, the vertical fixing holes and the transverse fixing holes are respectively located at the upper and lower parts of the cover, and the latch hole is located in the middle part of the cover.
[0028] Beneficial effects: Such an arrangement enables both the upper and lower parts of the cover to be connected to the size adjuster, further improving the installation accuracy between the cover and the size adjuster.
[0029] Furthermore, a side of the upper plate frame for placing the mask is provided with a plurality of support blocks distributed at intervals.
[0030] Beneficial effect: The setting of the support block can support the mask placed on the upper plate rack, making it convenient to take it out later. BRIEF DESCRIPTION OF THE DRAWINGS
[0031] The drawings described herein are used to provide a further understanding of the embodiments of the present utility model, constitute a part of this application, and do not constitute a limitation of the embodiments of the present utility model. In the drawings:
[0032] Figure 1 This is a three-dimensional diagram of an embodiment of a device for docking and interacting an AGV with a photolithography machine in the utility model, in which an upper plate frame is placed on a shockproof platform;
[0033] Figure 2 This is a front view of a cover in an embodiment of a device suitable for docking and interacting between an AGV and a photolithography machine according to the utility model;
[0034] Figure 3 This is a front view of a guide block in an embodiment of a device suitable for docking and interacting an AGV with a photolithography machine according to the utility model.
[0035] Marks and corresponding parts names in the attached drawings:
[0036] Upper plate frame 1, support block 101, cross beam 2, first reflector 3, second reflector 4, cross reflector 5, cover 6, groove 601, vertical fixing hole 602, latch hole 603, horizontal fixing hole 604, size adjuster 605, shockproof platform 7, guide block 8, vertical positioning hole 801. DETAILED DESCRIPTION
[0037] In order to make the purpose, technical solutions and advantages of the utility model more clearly understood, the utility model is further described in detail below in conjunction with embodiments and drawings. The schematic implementation manner of the utility model and its description are only used to explain the utility model and are not intended to limit the utility model.
[0038] like Figure 1-Figure 2As shown, this embodiment provides a device suitable for AGV to interact with a photolithography machine, including an upper frame 1 installed on the photolithography machine, a crossbeam 2 is connected to the top of the upper frame 1, and a reflector is installed at the bottom of the crossbeam 2 and the upper frame 1. In this embodiment, there are two reflectors on the crossbeam 2, namely a first reflector 3 and a second reflector 4, and the first reflector 3 and the second reflector 4 on the crossbeam 2 are respectively located at the left and right parts of the crossbeam 2. In this embodiment, the first reflector 3 and the second reflector 4 on the crossbeam 2 are both horizontally slidably matched with the crossbeam 2, and the reflector at the bottom of the upper frame 1 is horizontally slidably matched with the upper frame 1. In this embodiment, the reflector at the bottom of the upper frame 1 is a cross reflector 5.
[0039] The lower part of the upper plate frame 1 is connected to a size adjuster 605, and the size adjuster 605 is connected to a cover 6. The cover 6 and the size adjuster 605 can be adjusted simultaneously along the length direction of the upper plate frame 1 to adapt to different mask sizes. A groove 601 is provided on the top of the cover 6. Specifically, the groove 601 of the cover 6 is centrally arranged, and vertical fixing holes 602 and latch holes 603 are respectively arranged on both sides of the groove 601 of the cover 6. In this embodiment, two vertical fixing holes 602 are arranged on both sides of the groove 601 of the cover 6, and the two vertical fixing holes 602 are vertically spaced apart. The width of the groove 601 is 118 mm and the depth is 40 mm. The cover 6 is fixed to the size adjuster 605 by inserting fasteners (such as screws and bolts) into the vertical fixing holes 602.
[0040] The upper plate frame 1 is provided with two sets of symmetrically arranged guide blocks 8, which are fixedly connected to the upper plate frame 1 by screws. In this embodiment, there are two size adjusters 605, and the two size adjusters 605 are respectively slidably matched with the two sets of guide blocks 8, and the size adjusters 605 are respectively slidably matched with the two sets of guide blocks 8. Figure 3 As shown, the guide block 8 is provided with a plurality of spaced vertical positioning holes 801 along its length direction, and the cover 6 and the size adjuster 605 are detachably connected by inserting fasteners (such as latches) into the latch holes 603 and the vertical positioning holes 801 .
[0041] The bottom of the mask is placed on two size adjusters 605, which support the mask. The vertical fixing hole 602 is used to fix the cover 6 and the size adjuster 605. The latch is used to fix the size adjuster 605 to the vertical positioning hole 801 in the guide block 8. Specifically: the size adjuster 605 is fixed by inserting the latch into the vertical positioning hole 801 in the guide block 8. When the latch is pulled out, the size adjuster 605 can move up and down, and the size adjustment can be locked by inserting the latch. The cover 6 connects the size adjusters 605 on both sides to ensure that both sides move at the same time. Therefore, the size adjusters on the left and right sides are always kept at the same horizontal position during the size adjustment process. In this embodiment, there are two vertical fixing holes 602 on both sides of the groove 601 of the cover 6, and there is one latch hole 603, and the two vertical fixing holes 602 and the latch hole 603 are vertically spaced.
[0042] In this embodiment, transverse fixing holes 604 are provided on both sides of the groove 601 of the cover 6 to be connected with the size adjuster 605, the vertical fixing holes 602 and the transverse fixing holes 604 are respectively located at the upper part and the lower part of the cover 6, and the latch hole 603 is located at the middle part of the cover 6. By inserting fasteners, such as screws, into the transverse fixing holes 604 and the vertical fixing holes 602, the upper part and the lower part of the cover 6 can be connected with the size adjuster 605, thereby improving the stability and accuracy of the connection between the cover 6 and the size adjuster 605.
[0043] like Figure 1 As shown, in this embodiment, a side of the upper plate frame 1 for placing the mask is provided with a plurality of support blocks 101 distributed at intervals, and the support blocks 101 can support the mask placed on the upper plate frame 1 .
[0044] The specific implementation process is as follows:
[0045] In this embodiment, the photolithography machine delivers the mask into or out of the cavity of the photolithography machine through the upper plate frame 1. The anti-vibration platform 7 is placed on the ground in advance. In this embodiment, the anti-vibration platform 7 should be 38 cm above the ground. When the upper plate frame 1 is pulled out of the cavity of the photolithography machine, the bottom of the upper plate frame 1 is located on the top surface of the anti-vibration platform 7.
[0046] The laser sensor on the robot arm of the AGV detects the distance to the two reflective plates on the beam 2 for positioning. To ensure the positioning accuracy of the plate rack 1 on the lithography machine and the two claws on the upper side of the AGV robot arm, the spacing and height between the first reflective plate 3 and the second reflective plate 4 are adjusted accordingly according to the laser detection position.
[0047] The visual camera on the robot arm is used to take pictures and identify image parameters. The height, angle and other positions of the cross reflector 5 at the bottom of the upper plate frame 1 are adjusted by adding or removing gaskets. The reflector is adjusted to a position that is basically at the same height and horizontal with the camera, which facilitates the camera to perform image recognition and positioning, thereby ensuring the positioning accuracy of a claw located on the lower side of the AGV robot arm.
[0048] After completing the above operations, the AGV can be manually moved to the position facing the lithography machine to grab the mask plate that has been photolithographically processed on the upper plate rack 1, or the mask plate to be photolithographically processed can be grabbed and placed on the upper plate rack 1, and then the upper plate rack 1 can be flipped over to the lithography machine and sent into the lithography machine for lithography processing.
[0049] The device in this embodiment can realize direct docking between the AGV and the lithography machine, saving the cost of transfer equipment; reducing the risk of mask handling and raw material contamination, reducing the cost of raw materials, and improving production efficiency.
[0050] It should be noted that the above description of the disclosed embodiments enables professionals and technicians in the field to implement or use the present application. Various modifications to these embodiments will be apparent to professionals and technicians in the field, and the general principles defined herein can be implemented in other embodiments without departing from the scope of the present application. Therefore, the present application will not be limited to the embodiments shown herein, but should conform to the widest scope consistent with the principles and novel features disclosed herein.
[0051] In the description of the present invention, it should be noted that the terms "first", "second", "third", etc. are only used to distinguish the description and cannot be understood as indicating or implying relative importance.
[0052] In the description of this document, terms such as "up", "down", "left", "right", "front", "back", "top", "bottom", "inside", "outside", "middle", "vertical", "horizontal", "lateral", and "longitudinal" indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only used to illustrate the relative positional relationships between the various components or components, and do not particularly limit the specific installation orientations of the various components or components.
[0053] In the description of this document, some terms may be used to express other meanings in addition to indicating orientation or positional relationship. For example, the term "on" may also be used to express a certain dependency or connection relationship in some cases. For those of ordinary skill in the art, the specific meanings of these terms in this application can be understood according to the specific circumstances.
[0054] In the description of this document, the terms "installed", "set", "provided with", "connected", and "connected" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral structure; it can be a mechanical connection, or an electrical connection; it can be a direct connection, or an indirect connection through an intermediate medium, or it can be an internal connection between two devices, elements, or components. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood according to specific circumstances.
[0055] The structures, proportions, sizes, etc. drawn in the drawings in this application are only used to match the contents disclosed in this technical briefing book for technical personnel in this field to understand and read, and are not used to limit the restrictive conditions for the implementation of this application. Therefore, they have no substantive technical significance. Any structural modification, change in proportional relationship or adjustment of size should still fall within the scope of the technical content disclosed in this application without affecting the effects and purposes that can be achieved by this application.
[0056] The terms used in this document are those common terms currently widely used in the art in consideration of the functions of the present disclosure, but these terms may vary according to the intention of a person of ordinary skill in the art, precedents, or new technologies in the art. In addition, specific terms may be selected by the applicant, and in this case, their detailed meanings will be described in the detailed description of the present disclosure. Therefore, the terms used in the document should not be understood as simple names, but rather as an overall description based on the meaning of the terms and the present disclosure.
[0057] Flowcharts or text are used in this document to illustrate the operating steps performed according to the embodiments of the present application. It should be understood that the operating steps in the embodiments of the present application are not necessarily accurately performed in the order of recording. On the contrary, various steps can be processed in reverse order or simultaneously as needed. At the same time, other operations can also be added to these processes, or a certain step or several steps can be removed from these processes.
[0058] The above are only preferred embodiments of the present application and are not intended to limit the present application. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present application should be included in the protection scope of the present application.
Claims
1. A device suitable for docking and interacting between an AGV and a photolithography machine, characterized in that: It includes an upper plate frame installed on a photolithography machine, the top of the upper plate frame is connected to a crossbeam, the crossbeam and the bottom of the upper plate frame are both installed with reflective plates, the lower part of the upper plate frame is connected to a size adjuster, the size adjuster is connected to a cover, the cover and the size adjuster can be adjusted along the length direction of the upper plate frame, and the top of the cover is provided with a groove.
2. A device suitable for docking and interacting between an AGV and a photolithography machine according to claim 1, characterized in that: There are two reflecting plates on the crossbeam, and the two reflecting plates on the crossbeam are respectively located at the left part and the right part of the crossbeam.
3. The device for docking and interacting an AGV with a photolithography machine according to claim 2, characterized in that: The two reflection plates on the crossbeam are both in horizontal sliding cooperation with the crossbeam.
4. The device for docking and interacting an AGV with a photolithography machine according to claim 1, characterized in that: The reflecting plate at the bottom of the upper plate frame is horizontally slidably matched with the upper plate frame.
5. The device for docking and interacting an AGV with a photolithography machine according to claim 1, characterized in that: The reflector plate at the bottom of the upper plate frame is a cross reflector plate.
6. The device for docking and interacting an AGV with a photolithography machine according to claim 1, characterized in that: The groove of the cover is centrally arranged, and vertical fixing holes and latch holes are respectively arranged on both sides of the groove of the cover. Two groups of symmetrically arranged guide blocks are arranged on the upper plate frame. The cover is fixed to the size adjuster by inserting fasteners into the vertical fixing holes. The size adjuster is slidably matched with the two groups of guide blocks, and a plurality of vertical positioning holes are opened on the guide blocks along the length direction thereof. The size adjuster is detachably connected by inserting latches into the latch holes and the vertical positioning holes.
7. The device for docking and interacting an AGV with a photolithography machine according to claim 6, characterized in that: Two vertical fixing holes are provided on both sides of the groove of the cover, and one latch hole is provided for each cover, and the two vertical fixing holes are spaced apart from the latch holes in a vertical manner.
8. The device for docking and interacting an AGV with a photolithography machine according to claim 7, characterized in that: The groove of the cover is also provided with transverse fixing holes on both sides thereof which are connected with the size adjuster. The vertical fixing holes and the transverse fixing holes are respectively located at the upper part and the lower part of the cover, and the latch hole is located at the middle part of the cover.
9. A device suitable for docking and interacting an AGV with a photolithography machine according to any one of claims 1 to 8, characterized in that: A side of the upper plate frame for placing the mask is provided with a plurality of support blocks distributed at intervals.