Cleaning device for silicon wafer

Abstract

The utility model belongs to the field of silicon wafer cleaning. In view of low cleaning efficiency of the existing cleaning device for the silicon wafer, the utility model discloses the cleaning device for the silicon wafer, which comprises a cleaning assembly and a cleaning assembly, a door body is arranged on the outer side of the cleaning box; the water storage tank is arranged at the top of the cleaning tank; a silicon wafer needing to be cleaned is placed in the silicon wafer clamp, after fixing is completed, the electric push rod is started through an external power source to press the box body downwards, the frame body is arranged on the outer side of the silicon wafer clamp in a sleeving mode, then water in the water storage tank is conveyed into the box body through the water conveying pipe through the water pump, and the water is sprayed to the surface of the silicon wafer clamp through the spraying head; due to the fact that the transmission wheels are arranged on the outer side walls of one ends of the two roller brushes, and the two transmission wheels are in transmission connection through the transmission belt, the two roller brushes can be driven to rotate, the two faces of a silicon wafer fixed to the inner side of the silicon wafer clamp can be brushed, the two faces of the silicon wafer can be brushed at the same time, and operation efficiency is improved.

Description

Technical Field

[0001] The utility model belongs to the field of silicon wafer cleaning, in particular to a cleaning device for silicon wafers. Background Art

[0002] Silicon wafers must be strictly cleaned during the production of semiconductor devices. Even trace contamination can cause device failure. The purpose of cleaning is to remove surface contamination impurities, including organic and inorganic substances. Some of these impurities exist on the surface of silicon wafers in atomic or ionic state, and some in the form of thin films or particles, which can cause various defects. There are two methods to remove contamination: physical cleaning and chemical cleaning.

[0003] Currently, in the production process of solar cells, the surface of the silicon wafer needs to be cleaned to remove impurities on the surface of the silicon wafer.

[0004] However, the existing silicon wafer cleaning device cleans only one side of the silicon wafer, and after the cleaning of the single side is completed, the silicon wafer is turned over and the other side is cleaned, so the cleaning efficiency is low. Utility Model Content

[0005] In view of the fact that the above-mentioned existing cleaning devices for silicon wafers are not convenient for cleaning silicon wafers, one of the purposes of the utility model is to provide a cleaning device for silicon wafers, which is convenient for cleaning silicon wafers.

[0006] In order to achieve the above purpose, the utility model adopts the following technical solutions:

[0007] A cleaning device for a silicon wafer, comprising:

[0008] A cleaning component, the cleaning component comprising:

[0009] A cleaning box, the outer side of which is provided with a door body;

[0010] A water storage tank, arranged on the top of the cleaning tank;

[0011] A water pump, arranged on the water storage tank;

[0012] A water delivery pipe, arranged on the water pump;

[0013] An electric push rod is symmetrically arranged on the inner side of the cleaning box;

[0014] A box body is arranged at the bottom of the electric push rod;

[0015] The nozzle is symmetrically arranged at the bottom of the box;

[0016] A drain plate, arranged on the inner side of the cleaning box;

[0017] A support frame is arranged on the top of the leaking plate;

[0018] A silicon wafer fixture, arranged on the top of the support frame;

[0019] A driving assembly is provided at the bottom of the box, and the driving assembly comprises:

[0020] A frame body, arranged at the bottom of the box body;

[0021] A motor is arranged on the frame;

[0022] A roller brush is rotatably arranged inside the frame;

[0023] Transmission wheels are respectively arranged on the outer side walls of the roller brush;

[0024] The transmission belt is respectively connected to the two transmission wheels.

[0025] In one of the technical solutions disclosed in the utility model, an auxiliary component is arranged on the inner side of the frame, and the auxiliary component includes: a connecting plate, which is rotatably arranged on the inner side of the frame and is bolted to the roller brush.

[0026] In one of the technical solutions disclosed in the present utility model, the leak plate is connected to the support frame by bolts.

[0027] In one of the technical solutions disclosed in the utility model, a slot is provided on the top of the drain plate.

[0028] In one of the technical solutions disclosed in the present utility model, an observation window is provided on the door body.

[0029] In one of the technical solutions disclosed in the utility model, a stopper is symmetrically arranged on the inner side of the cleaning box and is bolted to the leaking plate.

[0030] In one of the technical solutions disclosed in the present utility model, a protective shell is provided on the outer side of the frame.

[0031] In one of the technical solutions disclosed in the present utility model, LED lights are symmetrically arranged on the inner side of the cleaning box.

[0032] From the above description, it can be seen that the beneficial effects of the utility model are:

[0033] Put the silicon wafer to be cleaned into the silicon wafer fixture. After fixing, start the electric push rod through the external power supply to press the box down. The box drives the frame to descend and put the frame on the outside of the silicon wafer fixture. Then use the water pump to transport the water in the water tank to the inside of the box through the water pipe, and then spray it onto the surface of the silicon wafer fixture through the nozzle. Then start the motor through the external power supply to drive the roller brush to rotate. Since the outer walls of one end of the two roller brushes are provided with transmission wheels, and the two transmission wheels are connected by a transmission belt, the two sets of roller brushes can be driven to rotate to brush both sides of the silicon wafer fixed on the inner side of the silicon wafer fixture. The device can brush both sides of the silicon wafer at the same time, which increases the working efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings required for use in the embodiments or technical descriptions will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0035] Figure 1 It is a front view of the utility model.

[0036] Figure 2 This is an internal diagram of the utility model.

[0037] Figure 3 A diagram of the top of the drain plate of the utility model;

[0038] FIG4 is a diagram of the bottom of the frame of the present invention;

[0039] FIG. 5 is a diagram of the bottom of the box body of the present invention.

[0040] Figure numerals: 1. cleaning component; 11. cleaning box; 111. door body; 12. water storage tank; 13. water pump; 131. water pipe; 14. electric push rod; 15. box body; 151. nozzle; 16. drain plate; 17. support frame; 18. silicon wafer clamp; 2. driving component; 21. frame; 22. motor; 23. roller brush; 24. transmission wheel; 25. transmission belt; 3. auxiliary component; 31. connecting plate; 32. slot; 33. block; 34. LED lamp; 35. observation window; 36. protective shell. DETAILED DESCRIPTION

[0041] In the following, only some exemplary embodiments are briefly described. As those skilled in the art will appreciate, the described embodiments may be modified in various ways without departing from the spirit or scope of the present invention. Therefore, the drawings and descriptions are considered to be exemplary and non-restrictive in nature.

[0042] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present invention.

[0043] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present utility model, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.

[0044] In the present invention, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0045] In the present utility model, unless otherwise clearly specified and limited, a first feature being "above" or "below" a second feature may include that the first and second features are in direct contact, or may include that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, a first feature being "above", "above" and "above" a second feature includes that the first feature is directly above and obliquely above the second feature, or simply indicates that the first feature is higher in level than the second feature. A first feature being "below", "below" and "below" a second feature includes that the first feature is directly below and obliquely below the second feature, or simply indicates that the first feature is lower in level than the second feature.

[0046] The embodiments of the present utility model are described in detail below with reference to the accompanying drawings.

[0047] The utility model discloses a cleaning device for silicon wafers, the structure of which is shown in the attached figure. Figure 1 As shown in Figure 5, it includes: a cleaning component 1, which is convenient for cleaning silicon wafers.

[0048] Specifically, as attached Figure 1 ~As shown in Figure 5;

[0049] A cleaning device for a silicon wafer, comprising:

[0050] A cleaning component 1, the cleaning component 1 comprising:

[0051] The cleaning box 11 has a door 111 disposed on its outer side;

[0052] A water storage tank 12 is arranged on the top of the cleaning tank 11;

[0053] A water pump 13 is arranged on the water storage tank 12;

[0054] A water delivery pipe 131 is provided on the water pump 13;

[0055] The electric push rod 14 is symmetrically arranged on the inner side of the cleaning box 11;

[0056] The box body 15 is arranged at the bottom of the electric push rod 14;

[0057] The nozzle 151 is symmetrically arranged at the bottom of the box 15;

[0058] A drain plate 16 is disposed inside the cleaning box 11;

[0059] A support frame 17 is arranged on the top of the drain plate 16;

[0060] A silicon wafer fixture 18 is disposed on the top of the support frame 17;

[0061] A driving assembly 2 is disposed at the bottom of the box 15, and the driving assembly 2 includes:

[0062] The frame 21 is arranged at the bottom of the box 15;

[0063] The motor 22 is arranged on the frame 21;

[0064] A roller brush 23 is rotatably disposed inside the frame 21;

[0065] The transmission wheels 24 are respectively arranged on the outer side walls of the roller brushes 23;

[0066] The transmission belt 25 is respectively connected to the two transmission wheels 24 in transmission connection.

[0067] With the above structure, the silicon wafer to be cleaned is first placed in the silicon wafer fixture 18. The working principle of the silicon wafer fixture 18 is a device for fixing the silicon wafer through an interlayer. Referring to the description of the utility model publication number "CN216460370U", paragraph

[0022] , after the fixing is completed, the electric push rod 14 is started by an external power supply to press the box body 15 downward, and the box body 15 drives the frame body 21 to descend, and the frame body 21 is placed on the outside of the silicon wafer fixture 18, and then the water in the water storage tank 12 is pumped through the water pump 13. The water is transported to the interior of the box 15 through the water pipe 131, and then sprayed onto the surface of the silicon wafer fixture 18 through the nozzle 151. Then, the motor 22 is started by an external power supply to drive the roller brush 23 to rotate. Since the outer walls of one end of the two roller brushes 23 are provided with a transmission wheel 24, and the two transmission wheels 24 are connected by a transmission belt 25, the two sets of roller brushes 23 can be driven to rotate, and the two sides of the silicon wafer fixed on the inner side of the silicon wafer fixture 18 can be brushed. The device can brush both sides of the silicon wafer at the same time, thereby increasing the working efficiency.

[0068] In one of the technical solutions disclosed in the present utility model, an auxiliary component 3 is arranged inside the frame 21 , and the auxiliary component 3 includes a connecting plate 31 rotatably arranged inside the frame 21 and bolted to the roller brush 23 .

[0069] With the above structure, the connecting plate 31 is rotatably arranged inside the frame 21 and is bolted to the roller brush 23, so that when the roller brush 23 is damaged, it is convenient to replace it to avoid affecting the cleaning effect.

[0070] In one of the technical solutions disclosed in the present utility model, the leaking plate 16 is connected to the supporting frame 17 by bolts.

[0071] With the above structure, the drain plate 16 and the support frame 17 are connected by bolts. When the silicon wafer fixture 18 is damaged, it is convenient to disassemble the support frame 17 and replace the silicon wafer fixture 18 on the top thereof to avoid affecting the subsequent cleaning operation.

[0072] In one of the technical solutions disclosed in the present utility model, a slot 32 is provided on the top of the drain plate 16 .

[0073] With the above structure, a slot 32 is provided on the top of the drain plate 16, so that when the support frame 17 is installed, the bottom of the support frame 17 is inserted into the inner side of the slot 32, which makes it convenient to fix with bolts.

[0074] In one of the technical solutions disclosed in the present utility model, an observation window 35 is provided on the door body 111 .

[0075] With the above structure, an observation window 35 is provided on the front of the door body 111 , so that the operator can observe the cleaning status of the silicon wafer without opening the door body 111 , so as to prevent a large amount of dust from entering the cleaning box 11 .

[0076] In one of the technical solutions disclosed in the present utility model, a stopper 33 is symmetrically arranged on the inner side of the cleaning box 11 and is bolted to the leaking plate 16 .

[0077] With the above structure, the stopper 33 is symmetrically arranged on the opposite surface of the inner side of the cleaning box 11 and is bolted to the leakage plate 16, so that it is convenient to remove the leakage plate 16 later and clean the debris blocked in the through hole, thereby increasing the practical effect.

[0078] In one of the technical solutions disclosed in the present utility model, a protective shell 36 is provided on the outer side of the frame 21 .

[0079] With the above structure, a protective shell 36 is provided on one side of the frame 21 , so that the transmission wheel 24 and the transmission belt 25 are prevented from being exposed to the outside, thereby protecting them and increasing the service life of the transmission belt 25 .

[0080] In one of the technical solutions disclosed in the present utility model, LED lights 34 are symmetrically arranged on the inner side of the cleaning box 11 .

[0081] With the above structure, the LED lights 34 are symmetrically arranged inside the cleaning box 11, so that the LED lights 34 can be turned on when the light is dim, which is convenient for the operator to observe the cleaning status and increases practicality.

[0082] From the above description, it can be seen that the installation mode of the embodiment of the utility model is:

[0083] The cleaning component 1 can rinse the silicon wafer;

[0084] The driving assembly 2 uses a roller brush 23 to scrub the washed silicon wafer.

[0085] It can be seen from the above description that the beneficial effects of the embodiments of the utility model are:

[0086] First, put the silicon wafer to be cleaned into the silicon wafer fixture. After fixing, start the electric push rod through the external power supply to press the box down, and the box drives the frame to go down, and put the frame on the outside of the silicon wafer fixture. Then use the water pump to transport the water in the water tank to the inside of the box through the water pipe, and then spray it onto the surface of the silicon wafer fixture through the nozzle. Then start the motor through the external power supply to drive the roller brush to rotate. Since the outer walls of one end of the two roller brushes are provided with transmission wheels, and the two transmission wheels are connected by a transmission belt, the two sets of roller brushes can be driven to rotate, and the two sides of the silicon wafer fixed on the inside of the silicon wafer fixture can be brushed. The device can brush both sides of the silicon wafer at the same time, which increases the working efficiency.

[0087] The specific implementation methods described above further illustrate the purpose, technical solutions and beneficial effects of the utility model in detail. It should be understood that the above description is only the specific implementation method of the utility model and is not used to limit the protection scope of the utility model. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the utility model should be included in the protection scope of the utility model.

Claims

1. A cleaning device for a silicon wafer, characterized in that: include: A cleaning component, the cleaning component comprising: A cleaning box, the outer side of which is provided with a door body; A water storage tank, arranged on the top of the cleaning tank; A water pump, arranged on the water storage tank; A water delivery pipe, arranged on the water pump; An electric push rod is symmetrically arranged on the inner side of the cleaning box; A box body is arranged at the bottom of the electric push rod; The nozzle is symmetrically arranged at the bottom of the box; A drain plate, arranged on the inner side of the cleaning box; A support frame, arranged on the top of the leaking plate; A silicon wafer fixture, arranged on the top of the support frame; A driving assembly is provided at the bottom of the box, and the driving assembly comprises: A frame body, arranged at the bottom of the box body; A motor is arranged on the frame; A roller brush is rotatably arranged inside the frame; Transmission wheels are respectively arranged on the outer side walls of the roller brush; The transmission belt is respectively connected to the two transmission wheels.

2. The cleaning device for silicon wafer according to claim 1, characterized in that: An auxiliary component is arranged inside the frame, and the auxiliary component comprises a connecting plate, which is rotatably arranged inside the frame and is bolted to the roller brush.

3. The cleaning device for silicon wafer according to claim 2, characterized in that: The leak plate is connected to the support frame via bolts.

4. The cleaning device for silicon wafer according to claim 3, characterized in that: A slot is provided on the top of the leak plate.

5. The cleaning device for silicon wafer according to claim 4, characterized in that: The door body is provided with an observation window.

6. The cleaning device for silicon wafer according to claim 5, characterized in that: Stoppers are symmetrically arranged on the inner side of the cleaning box and are connected with the leaking plate bolts.

7. The cleaning device for silicon wafer according to claim 6, characterized in that: A protective shell is arranged on the outer side of the frame.

8. The cleaning device for silicon wafer according to claim 7, characterized in that: LED lights are symmetrically arranged on the inner side of the cleaning box.

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