Evaporation source device for molecular beam epitaxy

Abstract

The utility model discloses an evaporation source device for molecular beam epitaxy, and aims to solve the problems that in the prior art, an evaporation source is complex in structure, high in energy consumption and serious in deflation, different cells are prone to influence each other and the like. The evaporation source comprises the following components: an aluminum oxide substrate, a glass crucible, a lamp filament, an electrode (aviation plug), a thermocouple, a water tank, a supporting rod, a flange and the like. Wherein raw materials to be evaporated are contained in the glass crucible; the aluminum oxide substrate supports the shallow crucible; the filament is used as a high-temperature metal material and is connected with the electrode which is connected with the high-voltage power supply. The supporting rod connects the water tank and the flange. By adopting the technical scheme of the invention, the to-be-evaporated raw materials can be uniformly heated, so that stable material evaporation is provided, meanwhile, the mutual influence between different cells is small, and simultaneous evaporation and co-deposition can be realized; the filament has a heating function, so that the evaporation source is simple in structure, energy consumption is reduced, and industrial production is facilitated; the evaporation source equipment is small in size and small in air release amount; in addition, a thermocouple temperature measuring device is arranged, and suggestion and accurate regulation and control of the temperature of the glass crucible can be achieved.

Description

Technical Field

[0001] The utility model relates to a co-deposition process, in particular to a novel evaporation source device for molecular beam epitaxy. Background Art

[0002] Molecular beam epitaxy, or MBE, is an important means of growing high-quality single-crystal thin films and nanostructures. The evaporation source is an important part of the molecular beam epitaxy system. The co-deposition evaporation source is a special type of evaporation source used in molecular beam epitaxy (MBE), which allows two or more materials to be evaporated and deposited on a substrate at the same time to form a composite thin film structure. This technology helps to prepare complex multilayer structures or alloy materials, as well as to achieve specific structural and performance requirements.

[0003] Compared with traditional MBE evaporation sources, which can usually only control the evaporation of one material, this limits the preparation of thin films with complex structures. The emergence of co-deposition evaporation source technology overcomes this limitation. It allows multiple materials to be deposited on the same film at the same time, thereby realizing the preparation of composite, alloy or multilayer structures. The development background of co-deposition evaporation sources stems from the increasing demand for complex thin film structures, which have strict requirements on the composition, structure and properties of the materials. By using co-deposition evaporation sources, researchers can more flexibly design and prepare thin film materials with specific functions and properties, such as magnetic, optoelectronic properties, etc.

[0004] In traditional evaporation sources, different cells have a great influence on each other, which is not conducive to precise temperature control, and the structure is complex and the cost is high. Therefore, there is an urgent need for a molecular evaporation source with a simple structure, low cost, small outgassing, precise temperature control, and suitable for ultra-high vacuum co-deposition, so as to improve the stability and ease of use of the evaporation source. Summary of the invention

[0005] The utility model aims to provide a novel evaporation source device for molecular beam epitaxy in view of the deficiencies of the prior art, aiming to solve the problems of complex evaporation source structure, high energy consumption, low limit temperature, severe outgassing and easy mutual influence of different cells in the prior art.

[0006] A novel evaporation source device for molecular beam epitaxy includes: an alumina substrate, a glass crucible, a filament, an electrode, a water tank, a support rod and a flange; wherein the glass crucible contains raw materials to be evaporated; the alumina substrate supports the shallow crucible; the filament is a high-temperature metal material, and the filament is connected to the electrode; the electrode is connected to a high-voltage power supply; and the support rod connects the support tube and the flange.

[0007] Preferably, in the novel evaporation source device for molecular beam epitaxy, the depth of the glass crucible is not greater than 27 mm.

[0008] Preferably, the novel evaporation source device for molecular beam epitaxy further comprises a threaded mesh heating means for the alumina substrate disposed between the filament and the glass crucible.

[0009] Preferably, in the novel evaporation source device for molecular beam epitaxy, the filament of the alumina substrate threaded mesh heating method is connected to the electrode.

[0010] Preferably, in the novel evaporation source device for molecular beam epitaxy, the material of the filament is tungsten, and the material of the electrode is brass, tin bronze and pottery bronze.

[0011] Preferably, the novel evaporation source device for molecular beam epitaxy further comprises a shielded short-circuit connector disposed between the filament and the electrode, disposed between the filament and the alumina substrate and in the middle of the inner layer of the water tank.

[0012] Preferably, in the novel evaporation source device for molecular beam epitaxy, the material of the shielding short-circuit connector is an insulating material, including but not limited to ceramic and glass.

[0013] Preferably, the novel evaporation source device for molecular beam epitaxy further comprises a high-efficiency thermal conductive contact surface arranged at the contact portion between the alumina substrate and the water tank, and the material of the high-efficiency thermal conductive contact surface is a thermal conductive material, including but not limited to graphene and thermal conductive silicone sheet.

[0014] Preferably, in the novel evaporation source device for molecular beam epitaxy, the water tank and the support tube may be equipped with a cooling water device, and the cooling water device is configured as a water-cooled interlayer device for the water tank and the support tube.

[0015] Preferably, the novel evaporation source device for molecular beam epitaxy further comprises a temperature measuring device, and the temperature measuring device is a thermocouple.

[0016] The technical solution of the present invention can solve the technical problems of the complex structure of the evaporation source, high energy consumption, serious outgassing and easy influence of different cells in the prior art; the technical solution of the present invention is implemented, and a glass crucible is used to heat the raw material to be evaporated, and the raw material to be evaporated is heated evenly, so as to provide stable metal vapor; alumina ceramics are heat-insulating and high-temperature resistant materials, which can withstand the higher temperature in the high-temperature zone on the one hand, and separate the heat from the water cooling on the other hand to ensure that the temperature in the middle high-temperature zone is not easily lost, and a fixed structure with threads is provided on it to ensure that the tungsten wire is wound into a stable shape, and this design enhances the stability and repeatability of heating; the evaporation source has a simple structure, reduces energy consumption, and is conducive to industrial production; the evaporation source equipment is small and has less outgassing; and a thermocouple temperature measuring device is provided to achieve precise control of the temperature of the glass crucible; the evaporation source has a simple structure and is easy to control, which can achieve the technical effect of reducing the overall cost of the device, and greatly improves the stability and ease of use of the evaporation source. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only one embodiment of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0018] Figure 1 A structural diagram of this embodiment.

[0019] Figure 2 Schematic diagram of the structure of the aluminum oxide substrate (evaporation source) in this embodiment;

[0020] Figure 3 Schematic diagram of the structure used to achieve different cell deposition.

[0021] Reference numerals include:

[0022] 1-water tank; 2-evaporation source metal shell; 3-alumina substrate; 4-support rod; 5-CF35 flange; 6-top cover of metal shell; 7-electrode; 8-aviation plug connector; 9-magnetic rod connector; 10-CF16 flange; 11-magnetic knob rod; 12-Shutter lever; 13-glass crucible; 14-Shutter cover. DETAILED DESCRIPTION

[0023] The present invention is described in detail below in conjunction with the accompanying drawings so that the advantages and features of the present invention can be more easily understood by those skilled in the art.

[0024] In the description of the present invention, it should be understood that the terms "upper", "lower", "left", "right", "top", "bottom", "inside", "outside", etc. indicate directions or positional relationships based on the directions or positional relationships shown in the accompanying drawings. They are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific direction, be constructed and operated in a specific direction. Therefore, they should not be understood as limitations on the present invention.

[0025] The structures, proportions, sizes, etc. shown in the drawings of the utility model specification are only used to match the contents disclosed in the specification so as to facilitate understanding and reading by people familiar with this technology. They are not used to limit the restrictive conditions for the implementation of the utility model, and therefore have no substantive technical significance. Any structural modification, change in proportional relationship or adjustment of size should still fall within the scope of the technical contents disclosed in the utility model without affecting the effects and purposes that can be achieved by the utility model.

[0026] Example

[0027] like Figures 1 to 3 A novel evaporation source device for molecular beam epitaxy includes: a schematic diagram of the evaporation source structure ( Figure 1 ) and internal magnification ( Figure 2 ), display methods when using different Cells ( Figure 3 )

[0028] In a specific embodiment of the present invention, Figure 1 and 2 As shown, a novel evaporation source (3Cell) for molecular beam epitaxy includes: an alumina substrate 3, a glass crucible 13, a filament, an electrode 7, a water tank 1, a support rod 4 and a flange 5. Among them, the glass crucible 1 contains the raw material to be evaporated; the alumina substrate 3 supports the glass crucible 13; the alumina substrate 3 is fixed to the water tank 1 through the threaded holes on both sides shown in the picture to ensure its stability; the top cover 6 of the metal shell is fixed to the metal shell 2 of the evaporation source through the threaded holes shown in the picture, which increases the convenience for assembly and subsequent maintenance; the filament is a high-temperature metal material, and the filament is connected to the electrode 7; the electrode 7 is connected to a high-voltage power supply; the support rod 4 connects the water tank 1 and the flange 5.

[0029] In a specific embodiment of the present invention, Figure 3As shown in the figure, a new type of molecular beam epitaxy evaporation source device realizes co-deposition, wherein, Figure a shows the angle when all 3Cells are closed; Figure b shows the angle when all 3Cells are opened; Figure c shows the angle when Cell.1 is used alone; Figure d shows the angle when Cell.2 is used alone; Figure e shows the angle when Cell.3 is used alone; further realizes double-cell co-deposition: Figure f shows the angle when Cell.1 and Cell.3 are used together; Figure g shows the angle when Cell.1 and Cell.2 are used together. The heat radiation is transmitted through the insulation material between the baffles inside the metal shell, which reduces the influence between different cells, and a thermocouple temperature measuring device is set to achieve precise control of the glass crucible temperature, thereby achieving co-deposition.

[0030] The above contents are only preferred embodiments of the present invention. For ordinary technicians in this field, according to the concept of the present invention, there may be changes in the specific implementation method and application scope. The content of this specification should not be understood as limiting the present invention.

Claims

1. An evaporation source device for molecular beam epitaxy, characterized in that: The evaporation source device for molecular beam epitaxy includes: an alumina substrate, a glass crucible, a filament, an electrode, a water tank, a support rod and a flange; wherein, The glass crucible contains the raw material to be evaporated; The alumina substrate supports the glass crucible; The filament is made of high-temperature metal material, and the filament is connected to the electrode; The electrodes are connected to a high voltage power supply; The support rod connects the flange and the water tank.

2. The evaporation source device for molecular beam epitaxy according to claim 1, characterized in that: The depth of the glass crucible is no more than 27 mm.

3. The evaporation source device for molecular beam epitaxy according to claim 1, characterized in that: Also included is a threaded mesh heating means for the alumina substrate disposed between the filament and the glass crucible.

4. The evaporation source device for molecular beam epitaxy according to claim 1, characterized in that: The alumina substrate has a threaded mesh heating pattern on which the filaments are connected to the electrodes.

5. The evaporation source device for molecular beam epitaxy according to claim 1, characterized in that: It also includes a shielding short-circuit connector arranged between the filament and the electrode, and arranged between the filament and the alumina substrate and in the middle of the inner layer of the water tank.

6. The evaporation source device for molecular beam epitaxy according to claim 5, characterized in that: The material of the shielding short-circuit connecting piece is ceramic or glass insulator material.

7. The evaporation source device for molecular beam epitaxy according to claim 1, characterized in that: It also includes a high-efficiency heat-conducting contact surface arranged at the contact portion between the alumina substrate and the water tank, and the material of the high-efficiency heat-conducting contact surface is graphene or silicone sheet heat-conducting material.

8. The evaporation source device for molecular beam epitaxy according to claim 1, characterized in that: The water tank and the support rod may be equipped with a cooling water device, and the cooling water device is configured as a water-cooled sandwich device for the water tank and the support rod.

9. The evaporation source device for molecular beam epitaxy according to claim 1, characterized in that: It also includes a temperature measuring device, which is a thermocouple.

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