Tool for detecting optical performance of optical wafer

Abstract

The utility model provides a jig for detecting the optical performance of an optical wafer. The jig comprises a first fixed seat and a second fixed seat, an optical wafer with a plurality of groups of grating structure areas is clamped in the first fixing seat, and an optical machine is clamped in the second fixing seat. A plurality of first positioning pieces are arranged on the side, connected with the second fixing base, of the first fixing base, and a plurality of second positioning pieces are arranged on the side, connected with the first fixing base, of the second fixing base. By clamping the first positioning piece and the second positioning piece at the corresponding positions, the optical machine and any group of grating structure areas to be detected in the multiple groups of grating structure areas of the optical wafer meet the corresponding position relation of optical performance detection. A plurality of optical machines are not needed, optical performance detection errors caused by performance differences of different optical machines are avoided, and the same optical machine does not need to be placed at different optical machine fixing positions, so that the corresponding position precision of the optical machine and a group of grating structure areas to be detected is ensured, the optical machine is not damaged, and the test time is shortened.

Description

Technical Field

[0001] The utility model belongs to the technical field of AR diffraction optical waveguides, and in particular relates to an optical performance detection fixture for an optical wafer. Background Art

[0002] With the development of information technology, augmented reality (AR) technology has become increasingly mature and is being used more and more widely in education, medical care, entertainment, industry and other industries.

[0003] Augmented reality technology can be implemented through many hardware platforms, among which the most immersive is wearable augmented reality devices, namely AR glasses. At present, the more mature AR glasses technology solutions are mainly divided into prism solutions, bi rdbath solutions, free-form surface solutions, off-axis holographic lens solutions and diffraction waveguide solutions. Depending on the type of grating, diffraction waveguides can be divided into two categories: surface relief grating waveguides and volume holographic grating waveguides.

[0004] The surface relief grating waveguide includes a waveguide substrate, an in-coupling grating and an out-coupling grating, and the in-coupling grating and the out-coupling grating are arranged on the waveguide substrate. The basic principle is as follows Figure 1 As shown, the light output by the optical machine 1 (imaging device) is coupled into the grating 3 and coupled into the waveguide matrix 2, and propagates in the waveguide matrix 2 by total reflection. Whenever encountering the out-coupling grating 4, a part of the light is coupled out, and the out-coupled light (the solid line in the direction of the human eye in the figure) enters the human eye, so that the same image as the output of the optical machine 1 can be seen. At the same time, the human eye can see the real world scene (the dotted line in the direction of the human eye in the figure), and the overlap of the two parts can realize the function of augmented reality.

[0005] Taking the surface relief grating waveguide as an example, a prior art AR lens preparation scheme is as follows:

[0006] The grating structure areas on a plurality of surface relief grating waveguides are spliced ​​on a large-sized mold substrate to obtain a spliced ​​mold with a plurality of groups of grating structure areas.

[0007] Using the spliced ​​mold as an imprint template, a surface relief grating waveguide is obtained by nanoimprinting:

[0008] Soft film glue is spin-coated on the splicing mold, and the patterns of multiple groups of grating structure areas of the splicing mold are transferred to the soft film substrate through a nanoimprint process to obtain a splicing soft film. The transfer area of ​​the splicing soft film has transfer patterns of multiple groups of grating structure areas (i.e., the reverse pattern of the pattern of the grating structure area).

[0009] The embossing glue is spin-coated on the optical wafer, and the transfer patterns of the multiple groups of grating structure area patterns in the transfer area of ​​the spliced ​​soft film are transferred to the optical wafer through a nano-imprint process to obtain an optical wafer with multiple groups of grating structure areas.

[0010] An optical wafer having a plurality of groups of grating structure area patterns is cut to obtain a surface relief grating waveguide corresponding to the shape of an AR lens, and each surface relief optical waveguide has a group of grating structure area patterns.

[0011] The surface relief grating waveguide is bonded and edge-sealed to obtain an AR lens.

[0012] In order to make AR lenses meet the required optical performance, optical inspection is required during the preparation of AR lenses. The existing inspection method is: optical inspection of the surface relief grating waveguide after cutting or the surface relief grating waveguide after bonding. If the optical inspection does not meet the requirements, the current surface relief grating waveguide is discarded. Since the optical inspection is performed at the end of the AR lens preparation process, if the inspection result is that the surface relief grating waveguide does not meet the requirements, the production efficiency of the AR lens will be greatly reduced.

[0013] In order to solve this problem, the detection method is changed to: perform optical performance detection on an optical wafer having multiple groups of grating structure areas. During the detection process, it is necessary to use an optical performance detection fixture to fix the optical machine and the optical wafer having multiple groups of grating structure area patterns. When performing optical performance detection on a group of grating structure area patterns at corresponding positions of the optical wafer, it is necessary to maintain a corresponding position relationship between the optical machine and the group of grating structure area patterns to be tested. Therefore, the existing optical performance detection fixture sets multiple optical machine fixing positions, uses the same optical machine to be placed in multiple optical machine fixing positions respectively, or places different optical machines in multiple optical machine fixing positions to achieve a corresponding position relationship between the optical machine and a group of grating structure area patterns to be tested. For the scheme of using different optical machines, since different optical machine performances are different, placing different optical machines in multiple optical machine fixed positions will cause optical performance detection errors. For the scheme of placing the same optical machine in multiple optical machine fixed positions, the corresponding position accuracy of the optical machine and a group of grating structure areas to be tested cannot be guaranteed, and it is easy to damage the optical machine and increase the test time. Utility Model Content

[0014] In order to overcome the defects of the prior art, the utility model provides an optical wafer optical performance detection fixture.

[0015] The utility model is realized by the following technical solutions:

[0016] The utility model provides an optical wafer optical performance detection fixture, comprising a first fixing seat and a second fixing seat;

[0017] An optical wafer having multiple groups of grating structure regions is clamped in the first fixing seat;

[0018] The optical device is clamped in the second fixing seat;

[0019] A plurality of first positioning members are arranged on one side where the first fixing seat is connected to the second fixing seat, and a plurality of second positioning members are arranged on one side where the second fixing seat is connected to the first fixing seat;

[0020] By clamping the first positioning member and the second positioning member at corresponding positions, the optical engine and any group of grating structure areas to be measured among the multiple groups of grating structure areas of the optical wafer meet a corresponding position relationship.

[0021] Furthermore, a first mounting hole is provided in the first fixing seat;

[0022] The inner wall of the first mounting hole is clamped with the side wall of the optical wafer having multiple groups of grating structure areas.

[0023] Furthermore, a second mounting hole is provided in the second fixing seat;

[0024] The optical machine is fixed in the second mounting hole.

[0025] Furthermore, the first positioning member is a positioning protrusion, and the second positioning member is a positioning groove;

[0026] By snapping the positioning protrusions and positioning grooves at corresponding positions, the optical machine and any group of grating structure areas to be measured among the multiple groups of grating structure areas of the optical wafer can meet the required corresponding position relationship.

[0027] Further, each group of the grating structure regions includes an in-coupling grating region and an out-coupling grating region;

[0028] The coupling-in grating region and the coupling-out grating region are arranged on an optical wafer.

[0029] Further, it also includes a protective cover;

[0030] The protective cover is connected to the side of the first fixing base opposite to the side of the first fixing base connected to the second fixing base;

[0031] The protection cover plate is provided with positioning through holes around the outcoupling grating region of each group of the grating structure regions.

[0032] Furthermore, a supporting protrusion is provided on a side of the protective cover plate close to the optical wafer;

[0033] The supporting protrusion contacts a wafer substrate region of the optical wafer where no grating structure region is provided.

[0034] Furthermore, a first connecting hole is provided on the protective cover plate;

[0035] A second connecting hole is provided on the first fixing seat;

[0036] The first connecting hole and the second connecting hole are fixed by a connecting member.

[0037] Furthermore, a local edge of the first mounting hole close to one end of the second fixing seat extends inwardly to form a limiting portion.

[0038] Furthermore, a third connecting hole is provided on the second fixing seat.

[0039] Compared with the prior art, the technical solution of the utility model has the following beneficial effects:

[0040] The utility model provides an optical performance detection jig for an optical wafer, comprising a first fixing seat and a second fixing seat. An optical wafer having multiple groups of grating structure areas is clamped in the first fixing seat, and an optical machine is clamped in the second fixing seat. A plurality of first positioning members are arranged on one side where the first fixing seat is connected to the second fixing seat, and a plurality of second positioning members are arranged on one side where the second fixing seat is connected to the first fixing seat. By clamping the first positioning members and the second positioning members at corresponding positions, the optical machine and any group of grating structure areas to be tested among the multiple groups of grating structure areas of the optical wafer meet a corresponding position relationship, thereby realizing the optical performance detection operation of the corresponding grating structure area to be tested on the optical wafer by the optical performance detection equipment. There is no need to use multiple optical machines, thereby avoiding optical performance detection errors caused by performance differences of different optical machines, and there is no need to place the same optical machine in different optical machine fixing positions, thereby ensuring the corresponding position accuracy of the optical machine and a group of grating structure areas to be tested, without damaging the optical machine, and reducing the test time. BRIEF DESCRIPTION OF THE DRAWINGS

[0041] In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0042] Figure 1 A schematic diagram of the basic principle of the grating waveguide scheme as an example;

[0043] Figure 2 A schematic diagram of the overall structure of an optical wafer optical performance detection fixture for clamping an optical wafer at a first angle;

[0044] Figure 3 A schematic diagram of the overall structure of an optical wafer optical performance detection fixture for clamping an optical wafer at a second angle;

[0045] Figure 4A schematic diagram of the structure of the first fixing seat at a first angle;

[0046] Figure 5 A schematic diagram of the structure of the first fixing seat at a second angle;

[0047] Figure 6 A schematic diagram of the structure of an exemplary optical wafer at a first angle;

[0048] Figure 7 A schematic diagram of the structure of an exemplary optical wafer at a second angle;

[0049] Figure 8 A schematic diagram of the structure of the second fixing seat at a first angle;

[0050] Fig. 9 A schematic diagram of the structure of the second fixing seat at a second angle;

[0051] Fig.10 A schematic diagram of the structure of an exemplary protective cover at a first angle;

[0052] Fig.11 Schematic diagram of the structure of the protective cover plate at a second angle.

[0053] Among them, 1-optical machine, 2-waveguide substrate, 3-coupling grating, 4-coupling grating, 5-first fixing seat, 6-second fixing seat, 7-first mounting hole, 8-optical wafer, 9-grating structure area, 9-1-coupling grating area, 9-2-coupling grating area, 10-second mounting hole, 11-positioning protrusion, 12-positioning groove, 13-first fixing hole, 14-second fixing hole, 15-first positioning hole, 16-second positioning hole, 17-limiting part, 18-protective cover, 19-first connecting hole, 20-second connecting hole, 21-positioning through hole, 22-supporting protrusion, 23-third connecting hole. DETAILED DESCRIPTION

[0054] The following will be combined with the embodiments of the utility model to clearly and completely describe the technical solution of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0055] In this article, the terms "first", "second" and other similar words are not intended to imply any order, quantity and importance, but are only used to distinguish different elements. In this article, the terms "one", "an" and other similar words are not intended to indicate that there is only one of the things described, but rather indicate that the relevant description is only for one of the things described, and the things described may have one or more. In this article, the terms "comprise", "include" and other similar words are intended to indicate logical mutual relationships, and cannot be regarded as indicating spatial structural relationships. For example, "A includes B" is intended to indicate that B belongs to A logically, but does not indicate that B is located inside A spatially. In addition, the meanings of the terms "comprise", "include" and other similar words should be regarded as open, rather than closed. For example, "A includes B" is intended to indicate that B belongs to A, but B does not necessarily constitute the whole of A, and A may also include other elements such as C, D, and E.

[0056] In this document, the terms "embodiment", "present embodiment", "preferred embodiment" and "one embodiment" do not mean that the relevant description is only applicable to a specific embodiment, but rather that the description may also be applicable to one or more other embodiments. Those skilled in the art should understand that in this document, any description of a certain embodiment can be replaced, combined, or combined in other ways with the relevant description in one or more other embodiments, and the new embodiment generated by the replacement, combination, or combination in other ways is easily conceivable by those skilled in the art and belongs to the protection scope of the present utility model.

[0057] In the description herein, “plurality” means at least two, for example, two, three, etc., unless otherwise clearly and specifically defined.

[0058] like Figure 2 as well as Figure 3 As shown, the utility model provides an optical wafer optical performance detection fixture, including a first fixing seat 5 and a second fixing seat 6.

[0059] The optical wafer 8 is clamped in the first fixing seat. For example, Figure 4 as well as Figure 5 As shown, a first mounting hole 7 is provided in the first fixing seat 5, and an inner wall of the first mounting hole 7 is engaged with a side wall of the optical wafer.

[0060] Here, there is only one first fixing hole, that is, the optical wafer is fixed at only one fixed position in the first fixing seat. There is no specific requirement for the shape and diameter of the first fixing hole, but it needs to be designed accordingly based on the sidewall profile and size of the optical wafer. The figure shows that the first fixing hole is a circular first fixing hole.

[0061] The optical wafer has multiple groups of grating structure areas, and each group of grating structure areas includes an in-coupling grating area and an out-coupling grating area. The in-coupling grating area and the out-coupling grating area are arranged at intervals on the optical wafer. There is no limit on the number of grating structure areas arranged on the optical wafer, and those skilled in the art can select and set them. There is no specific limit on the morphology of the in-coupling grating area and the morphology of the out-coupling grating area of ​​each group of grating structure areas on the optical wafer, and those skilled in the art can design them by themselves. Figure 6 as well as Figure 7 As shown in the figure, six groups of grating structure regions 9 are arranged on the optical wafer 8, and each group of grating structure regions 9 includes a circular coupling-in grating region 9 - 1 and a rectangular coupling-out grating region 9 - 2.

[0062] The second fixed seat is provided with a light receiving device. Figure 8 as well as Fig. 9 As shown, a second mounting hole 10 is provided in the second fixing seat 6, and the optical machine is fixed in the second mounting hole 10. The optical machine here can be an existing optical machine. There is only one second fixing hole on the second fixing seat, that is, the optical machine is fixed at only one fixed position in the second fixing seat. There is no specific requirement for the shape and size of the second fixing hole, but it needs to be designed accordingly based on the outline and size of the optical machine.

[0063] A plurality of first positioning members are arranged on one side where the first fixing seat is connected to the second fixing seat, and a plurality of second positioning members are arranged on one side where the second fixing seat is connected to the first fixing seat. By clamping the first positioning members and the second positioning members at corresponding positions, any one of the plurality of grating structure regions to be measured of the optical machine and the optical wafer satisfies the corresponding position relationship.

[0064] Exemplarily, a plurality of positioning protrusions are provided on the edge of the side where the first fixing seat is connected to the second fixing seat. A plurality of positioning grooves are provided on the side where the second fixing seat is connected to the first fixing seat. By engaging the positioning protrusions at the corresponding positions in the first fixing base in the positioning grooves at the corresponding positions of the second fixing seat, the optical machine in the second fixing seat is aligned with the coupling-in grating area in any one group of grating structure areas to be measured in the multiple groups of grating structure areas of the optical wafer in the first fixing seat, so that the projected light of the optical machine fixed in the second fixing seat can be received by the coupling-in grating area in any one group of grating structure areas to be measured in the multiple groups of grating structure areas of the optical wafer in the first fixing seat, and propagated to the coupling-out grating area in the grating structure area to be measured through the total reflection of the optical wafer substrate, and then coupled out through the diffraction of the coupling-out grating area to the optical detection device for optical detection. Exemplarily, the optical detection here can be a light effect detection.

[0065] There is no specific requirement for the number of positioning protrusions on the first fixed seat and the number of positioning grooves on the second fixed seat. As long as the positioning protrusions and positioning grooves at different positions on the first fixed seat and the second fixed seat are mutually engaged with each other, optical detection of multiple groups of grating structure areas on the optical wafer to be tested can be achieved separately. Figure 5 The first fixing seat 5 shown in FIG. 1 is provided with three positioning protrusions 11 at intervals. Figure 8 It is shown in the figure that two positioning grooves 12 are arranged on the second fixing seat 6 at intervals. Through the snap-fitting of the positioning protrusions at different positions and the positioning grooves, optical detection can be realized for the six groups of grating structure areas on the optical wafer respectively.

[0066] The optical performance detection fixture for optical wafers provided by the utility model can meet the needs of optical performance detection operations of optical performance detection equipment on any group of grating structure areas to be tested among multiple groups of grating structure areas on an optical wafer. There is no need to use multiple optical machines, thereby avoiding optical performance detection errors caused by performance differences of different optical machines. There is also no need to place the same optical machine in different optical machine fixing positions, thereby ensuring the corresponding position accuracy of the optical machine and a group of grating structure areas to be tested, without damaging the optical machine and reducing the test time.

[0067] In order to improve the connection stability between the first fixing seat and the second fixing seat, the first fixing seat 5 is provided with a first fixing hole 13 (such as Figure 5 The second fixing seat 6 is provided with a second fixing hole 14 (as shown in FIG. Figure 8 The first fixing hole and the second fixing hole can be connected and fixed by a connecting member such as a screw.

[0068] At the same time, in order to realize the quick alignment and connection between the positioning protrusion at the corresponding position of the first fixing seat and the positioning groove at the corresponding position of the second fixing seat, the first fixing seat is provided with a first positioning hole 15 (such as Figure 5 The second fixing seat is provided with a second positioning hole 16 (as shown in FIG. Figure 8 As shown), the first positioning hole and the second positioning hole can be quickly adsorbed by connecting parts such as magnets to achieve rapid alignment and connection between the positioning protrusion at the corresponding position of the first fixing seat and the positioning groove at the corresponding position of the second fixing seat.

[0069] In order to improve the connection stability between the optical wafer and the first fixing seat, Figure 4 as well as Figure 5 As shown, the local edge of the first mounting hole 7 near one end of the second fixing seat 6 extends inward to form a limiting portion 17. Therefore, when the optical wafer is placed in the first fixing hole, the limiting portion of the first fixing hole near one end of the second fixing seat can support and limit the edge of the optical wafer to prevent the optical wafer from falling.

[0070] In order to further improve the connection stability between the optical wafer and the first fixing seat, the optical wafer optical performance detection fixture of the utility model may also include a protective cover.

[0071] The protective cover is connected to the side opposite to the side where the first fixing base is connected to the second fixing base (eg Figure 3 The protective cover can support and limit the optical wafer from the side of the first fixing seat away from the second fixing seat to prevent the optical wafer from falling.

[0072] For example, the protective cover plate 18 is provided with a first connection hole 19 (eg Fig.10 as well as Fig.11 The first fixing seat 5 is provided with a second connecting hole 20 (as Figure 5 As shown), the first connection hole and the second connection hole are fixed by a connection member. Exemplarily, the connection member here can be a magnet, a screw, etc.

[0073] There is no specific limit on the number of the first connection holes and the second connection holes, and those skilled in the art can make corresponding arrangements according to the shapes and sizes of the first fixing base and the protective cover.

[0074] Corresponding to the multiple groups of grating structure regions on the optical wafer, the protective cover plate 18 is provided with positioning through holes 21 (such as Fig.10 as well as Fig.11 As shown), it is ensured that the light diffracted and coupled out of the out-coupled grating area of ​​each group of grating structure areas on the optical wafer can pass through the protective cover and be received by the optical detection equipment.

[0075] As a preferred embodiment, in order to prevent the side of the protective cover plate close to the optical wafer from damaging the grating structure area on the optical wafer, a supporting protrusion 22 (such as Fig.11 As shown), the support protrusion 22 contacts the wafer substrate area of ​​the optical wafer where the grating structure area is not set.

[0076] There is no specific requirement for the shape and number of the supporting protrusions, and those skilled in the art can set them according to actual needs. The figure shows that three supporting protrusions are set on the side of the protective cover plate close to the optical wafer.

[0077] In order to facilitate the fixing of the optical wafer optical performance detection fixture, a third connecting hole 23 (such as Figure 8 as well as Fig. 9The third connection hole can be used to achieve fixed connection between the optical wafer optical performance detection fixture and other components. For example, the other fixed components can be a mobile device composed of a slide rail and a slider. A fourth connection hole is provided on the slider connected to the slide rail. The optical wafer optical performance detection fixture is fixedly connected to the fourth connection hole on the slider through the third connection hole using screws and other connecting parts. The optical wafer optical performance detection fixture can be moved together with the mobile device, so that the optical detection device in a fixed position can perform optical detection on the out-coupled grating area of ​​any group of grating structure areas to be tested in the multiple groups of grating structure areas in the optical wafer.

[0078] The above embodiments are only used to illustrate the technical solutions of the present invention rather than to limit it. Although the present invention has been described in detail with reference to the above embodiments, ordinary technicians in the relevant field can still modify or replace the specific implementation methods of the present invention. Any modifications or equivalent replacements that do not depart from the spirit and scope of the present invention are within the scope of protection of the claims of the present invention to be approved.

Claims

1. An optical wafer optical performance detection fixture, characterized in that: It includes a first fixing seat and a second fixing seat; An optical wafer having multiple groups of grating structure regions is clamped in the first fixing seat; The optical device is clamped in the second fixing seat; A plurality of first positioning members are arranged on one side where the first fixing seat is connected to the second fixing seat, and a plurality of second positioning members are arranged on one side where the second fixing seat is connected to the first fixing seat; By clamping the first positioning member and the second positioning member at corresponding positions, the optical engine and any group of grating structure areas to be measured among the multiple groups of grating structure areas of the optical wafer meet a corresponding position relationship.

2. The optical wafer optical performance testing fixture according to claim 1, characterized in that: A first mounting hole is defined in the first fixing seat; The inner wall of the first mounting hole is clamped with the side wall of the optical wafer having multiple groups of grating structure areas.

3. The optical wafer optical performance testing fixture according to claim 1, characterized in that: A second mounting hole is provided in the second fixing seat; The optical machine is fixed in the second mounting hole.

4. The optical wafer optical performance testing fixture according to claim 1, characterized in that: The first positioning member is a positioning protrusion, and the second positioning member is a positioning groove; By snapping the positioning protrusions and positioning grooves at corresponding positions, the optical machine and any group of grating structure areas to be measured among the multiple groups of grating structure areas of the optical wafer can meet the required corresponding position relationship.

5. The optical wafer optical performance testing fixture according to any one of claims 1 to 4, characterized in that: Each group of the grating structure regions comprises an in-coupling grating region and an out-coupling grating region; The coupling-in grating region and the coupling-out grating region are arranged on an optical wafer.

6. The optical wafer optical performance testing fixture according to claim 5, characterized in that: Also includes a protective cover; The protective cover is connected to the side of the first fixing base opposite to the side of the first fixing base connected to the second fixing base; The protection cover plate is provided with positioning through holes around the outcoupling grating region of each group of the grating structure regions.

7. The optical wafer optical performance testing fixture according to claim 6, characterized in that: The protective cover plate is provided with a supporting protrusion on one side close to the optical wafer; The supporting protrusion contacts a wafer substrate region of the optical wafer where no grating structure region is provided.

8. The optical wafer optical performance testing fixture according to claim 6, characterized in that: The protective cover plate is provided with a first connecting hole; A second connecting hole is provided on the first fixing seat; The first connecting hole and the second connecting hole are fixed by a connecting member.

9. The optical wafer optical performance testing fixture according to claim 2, characterized in that: A local edge of the first mounting hole close to one end of the second fixing seat extends inwardly to form a limiting portion.

10. The optical wafer optical performance testing fixture according to claim 1, characterized in that: The second fixing seat is provided with a third connecting hole.

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