Device for increasing precision during measurement of IV equipment

Abstract

The utility model discloses a precision increasing device for IV equipment during measurement. The precision increasing device comprises an air supply mechanism, the horizontal spray head and the inclined spray head are arranged at the air supply end of the air supply mechanism; the backlight plate is arranged at the air injection ends of the horizontal spray head and the inclined spray head so as to reduce impurity reflection; when the impurities on the surface of the small label sheet are cleaned, the air supply mechanism supplies air to the horizontal spray head and the inclined spray head, the horizontal spray head and the inclined spray head purge the impurities from two directions to complete the cleaning action, and due to the dual functions of the horizontal spray head and the inclined spray head, the impurities can be purged from the two directions at the same time; therefore, impurities can be blown away from the surface of the small label piece, and suspended impurities can be pushed out of the surface of the small label piece. Therefore, not only can the cleaning efficiency be improved, but also the cleaning effect can be improved, so that the damage of the impurities to the IV small standard piece is reduced.

Description

Technical Field

[0001] The utility model relates to the technical field of testing devices, in particular to a device for increasing the accuracy of IV equipment measurements. Background Art

[0002] With the rapid development of the photovoltaic field, competition in the silicon wafer battery market is becoming increasingly fierce, and the quality requirements for battery cells are becoming higher and higher. The conversion efficiency of battery cells is the most important parameter of crystalline silicon solar cells. Preventing abnormal high / low efficiency of battery cells and ensuring the stability of IV testing are of great value and significance.

[0003] During the production process of solar cells, debris is often generated. In actual measurement, cleaning and maintenance are relatively complicated and take a long time. If the debris falls under the IV test needle row and produces reflections, it will affect the IV electrical performance. Therefore, solving the reflection effect of the debris becomes a difficult problem.

[0004] In addition, most IV devices on the market come with small IV wafers, which are key components for testing and sorting silicon wafer production to ensure photoelectric conversion efficiency, output volt-ampere characteristic curves, and calibration of parameter measurement accuracy. Due to the influence of the workshop environment, battery fragments, etc., dust particles, fragments and other debris are often attached to the surface of the small glass slide, resulting in reduced IV measurement accuracy or abnormal electrical performance parameters. The method of wiping the surface of the small wafer with a dust-free cloth is often used in the production process, which is not only time-consuming and labor-intensive, but also cannot guarantee complete wiping of surface impurities and easily causes fine scratches on the surface of the small wafer; how to clean the surface dirt of the wafer has also become a problem.

[0005] Therefore, there is an urgent need for a cleaning device that can clean impurities without causing fine scratches on the surface of the IV small label to increase the accuracy of IV equipment measurements. Utility Model Content

[0006] The purpose of this section is to summarize some aspects of the embodiments of the utility model and briefly introduce some preferred embodiments. Some simplifications or omissions may be made in this section and the abstract of the specification and the name of the utility model of this application to avoid blurring the purpose of this section, the abstract of the specification and the name of the utility model, and such simplifications or omissions cannot be used to limit the scope of the utility model.

[0007] In view of the above and / or existing problems in a device for increasing the accuracy of IV equipment measurement, the present utility model is proposed.

[0008] In order to solve the above technical problems, according to one aspect of the present invention, the present invention provides the following technical solutions:

[0009] A device for increasing the accuracy of IV equipment measurement, comprising:

[0010] Gas supply mechanism;

[0011] The horizontal nozzle and the inclined nozzle are both arranged at the air supply end of the air supply mechanism;

[0012] The backlight plate is arranged at the jet end of the horizontal nozzle and the inclined nozzle to reduce the reflection of impurities; when cleaning impurities on the surface of the small label, the air supply mechanism supplies air to the horizontal nozzle and the inclined nozzle, and the horizontal nozzle and the inclined nozzle sweep the impurities from two directions to complete the cleaning action.

[0013] As a preferred solution of the device for increasing the accuracy of IV equipment measurement described in the utility model, the gas supply mechanism includes:

[0014] compressor;

[0015] The diversion chamber is connected to the air supply end of the compressor through a pipeline;

[0016] The guide plate is arranged in the diversion chamber body and divides the diversion chamber into two mutually connected chamber bodies;

[0017] One end of the inclined tube is arranged on the bin body of the diversion bin located on the bottom surface of the drainage plate.

[0018] As a preferred solution of the device for increasing the accuracy of measurement of an IV device described in the utility model, the other end of the bevel tube is arranged on an inclined nozzle, and the horizontal nozzle is arranged on another bin body of the diversion bin.

[0019] As a preferred solution of the device for increasing the accuracy of measurement of an IV device described in the utility model, it also includes a support plate arranged at the detection end of the IV device, the backlight plate is arranged on the support plate, a protective shell is arranged on one side of the support plate, and the diversion chamber is arranged in the protective shell.

[0020] As a preferred solution of the device for increasing the precision of IV equipment measurement described in the utility model, the tilt angle of the tilted nozzle is 30-45° downward.

[0021] As a preferred solution of the device for increasing the precision of IV equipment measurement described in the utility model, the horizontal nozzle and the IV small label of the IV equipment are maintained on the same horizontal plane.

[0022] Compared with existing technologies:

[0023] 1. Improved cleaning efficiency and effect: Due to the dual functions of the horizontal nozzle and the inclined nozzle, impurities can be blown away from two directions at the same time, which can not only blow impurities away from the surface of the small tablet, but also push the suspended impurities out of the surface of the small tablet. In this way, not only the cleaning efficiency can be improved, but also the cleaning effect can be improved, thereby reducing the damage caused by impurities to the IV small tablet.

[0024] 2. Improved the measurement accuracy of IV equipment: By effectively cleaning the impurities on the surface of the small scale piece, the interference of impurities on the measurement of IV equipment can be reduced, thereby improving the measurement accuracy of IV equipment.

[0025] 3. Simplified cleaning process: Since the entire cleaning process is completed automatically without human intervention, the cleaning process is greatly simplified and the errors that may be caused by manual cleaning are reduced. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] In order to more clearly illustrate the technical solution of the implementation of the utility model, the utility model will be described in detail below in combination with the drawings and detailed implementation. Obviously, the drawings described below are only some implementations of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative labor. Among them:

[0027] Figure 1 This is a schematic diagram of the overall structure of a device for increasing the accuracy of IV equipment measurement according to the utility model;

[0028] Figure 2 A horizontal nozzle and an inclined nozzle and a schematic diagram of the surface thereof are provided for increasing the accuracy of measurement of an IV device according to the utility model;

[0029] Figure 3 The utility model is a schematic diagram of the structure of a shunt chamber of a device for increasing the accuracy of IV equipment measurement. DETAILED DESCRIPTION

[0030] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, the specific implementation methods of the present invention are described in detail below with reference to the accompanying drawings.

[0031] Secondly, the present invention is described in detail with reference to the schematic diagram. When describing the implementation of the present invention, for the sake of convenience, the cross-sectional diagram showing the device structure will not be partially enlarged according to the general proportion, and the schematic diagram is only an example, which should not limit the scope of protection of the present invention. In addition, in actual production, the three-dimensional dimensions of length, width and depth should be included.

[0032] In order to make the purpose, technical solution and advantages of the present invention more clear, the implementation mode of the present invention will be further described in detail below with reference to the accompanying drawings.

[0033] Example 1

[0034] Figure 1-3 The structure diagram of the first embodiment of the device for increasing the precision of IV equipment measurement according to the utility model is shown. Figure 1-Figure 3 In this embodiment, a device for increasing the accuracy of IV equipment measurement includes an air supply mechanism 100, a horizontal nozzle 200, a tilted nozzle 300 and a backlight plate 400.

[0035] The gas supply mechanism 100, the horizontal nozzle 200 and the inclined nozzle 300 are all arranged at the gas supply end of the gas supply mechanism 100. The gas supply mechanism 100 is used to supply gas to the horizontal nozzle 200 and the inclined nozzle 300, so that both can spray gas outward.

[0036] The backlight plate 400 is disposed at the jetting end of the horizontal nozzle 200 and the inclined nozzle 300 to reduce the reflection of impurities, thereby increasing the measurement accuracy of the IV device.

[0037] Combination Figure 1-Figure 3 The present embodiment is a device for increasing the precision of IV equipment measurement. When in use, the horizontal nozzle 200 and the inclined nozzle 300 are first installed at the corresponding positions of the IV equipment, and it is necessary to ensure that the gas ejected by the horizontal nozzle 200 and the inclined nozzle 300 can be blown onto the IV small label. When in use, the backlight panel 400 reduces the reflection of impurities. When impurities are found in the IV small label, the gas supply mechanism 100 is started to allow the horizontal nozzle 200 and the inclined nozzle 300 to spray outward. The gas ejected by the inclined nozzle 300 is inclined, so that the impurities can be separated from the surface of the IV small label, and the horizontal nozzle 200 pushes the suspended impurities out of the surface of the IV small label to complete the cleaning.

[0038] Example 2

[0039] Figure 1-3 The structure diagram of the second embodiment of the device for increasing the precision of IV equipment measurement of the utility model is shown. Figure 1-Figure 3 Different from the above-mentioned embodiment, the air supply mechanism 100 of the device for increasing the accuracy of measurement of an IV device in this embodiment includes a compressor 101, a diversion chamber 102, a guide plate 103 and a bevel tube 104, and also includes a support plate 500 and a protective shell 600.

[0040] The diversion chamber 102 is connected to the gas supply end of the compressor 101 through a pipeline, and the compressor 101 provides high-pressure gas to the diversion chamber 102.

[0041] The guide plate 103 is arranged in the body of the diversion chamber 102, and divides the diversion chamber 102 into two interconnected chambers. The guide plate 103 has a guiding function for the flowing gas, and divides the diversion chamber 102 into two interconnected chambers, thereby dividing the gas into two parts.

[0042] One end of the inclined tube 104 is arranged on the bin body of the diversion bin 102 located on the bottom surface of the guide plate 103 , and the other end of the inclined tube 104 is arranged on the inclined nozzle 300 , and the inclined nozzle 300 is connected to the diversion bin 102 by means of the inclined tube 104 .

[0043] The horizontal nozzle 200 is arranged on another chamber body of the diversion chamber 102 , so that the diversion chamber 102 can supply air to the horizontal nozzle 200 .

[0044] A support plate 500 is arranged at the detection end of the IV device, the backlight plate 400 is arranged on the support plate 500, a protective shell 600 is arranged on one side of the support plate 500, and the diversion chamber 102 is arranged in the protective shell 600. With the help of the support plate 500, the entire device can be connected to the IV device.

[0045] The tilt angle of the tilted nozzle 300 is 30-45° downward. This tilt angle can provide a reasonable balance, which can blow impurities off the surface of the IV small label without causing too much pressure on the surface of the object, thereby reducing the possibility of scratches.

[0046] The horizontal nozzle 200 is kept at the same horizontal plane as the IV device IV small label, so that a greater thrust is generated on the impurities on the IV small label.

[0047] Combination Figure 1-Figure 3 In this embodiment, a device for increasing the accuracy of measurement of an IV device is provided. When the entire device is in use, the support plate 500 is first installed on the detection end of the IV device. When impurities need to be cleaned, the compressor 101 is started. The compressor 101 provides high-pressure gas to the diversion chamber 102 through a pipeline. Under the action of the diversion plate 103, most of the gas is drained into the horizontal nozzle 200, and a small part of the gas enters the inclined nozzle 300 through the bevel pipe 104. The gas sprayed from the inclined nozzle 300 is inclined, so that impurities can be separated from the surface of the IV small label. The horizontal nozzle 200 pushes the suspended impurities out of the surface of the IV small label to complete the cleaning.

[0048] Although the present invention has been described above with reference to the embodiments, various modifications may be made thereto and parts thereof may be replaced with equivalents without departing from the scope of the present invention. In particular, as long as there is no structural conflict, the various features in the embodiments disclosed in the present invention may be used in combination with each other in any manner, and the fact that these combinations are not exhaustively described in this specification is only for the sake of omitting space and saving resources. Therefore, the present invention is not limited to the specific embodiments disclosed herein, but includes all technical solutions falling within the scope of the claims.

Claims

1. A device for increasing the accuracy of IV equipment measurement, characterized in that: include: Air supply mechanism (100); The horizontal nozzle (200) and the inclined nozzle (300) are both arranged at the air supply end of the air supply mechanism (100); A backlight plate (400) is arranged at the spraying ends of the horizontal spray head (200) and the inclined spray head (300) to reduce the reflection of impurities; When cleaning impurities on the surface of the small label, the air supply mechanism (100) supplies air to the horizontal nozzle (200) and the inclined nozzle (300), and the horizontal nozzle (200) and the inclined nozzle (300) sweep the impurities from two directions to complete the cleaning action.

2. A device for increasing the accuracy of IV equipment measurement according to claim 1, characterized in that: The air supply mechanism (100) comprises: Compressor (101); The diversion chamber (102) is connected to the air supply end of the compressor (101) through a pipeline; A flow guide plate (103) is arranged in the body of the diversion chamber (102) and divides the diversion chamber (102) into two mutually connected chambers; One end of the inclined tube (104) is arranged on the bin body of the diversion bin (102) located on the bottom surface of the guide plate (103).

3. A device for increasing the accuracy of IV equipment measurement according to claim 2, characterized in that: The other end of the inclined tube (104) is arranged on the inclined nozzle (300), and the horizontal nozzle (200) is arranged on the other bin body of the diversion bin (102).

4. A device for increasing the accuracy of IV equipment measurement according to claim 2, characterized in that: It also includes a support plate (500) arranged at the detection end of the IV device, the backlight plate (400) is arranged on the support plate (500), a protective shell (600) is arranged on one side of the support plate (500), and the diversion chamber (102) is arranged in the protective shell (600).

5. The device for increasing the accuracy of IV equipment measurement according to claim 1, characterized in that: The inclined spray head (300) has an inclination angle of 30-45° downward.

6. A device for increasing the accuracy of IV equipment measurement according to claim 1, characterized in that: The horizontal spray head (200) is maintained at the same horizontal plane as the IV device IV small label.

Images