Swing structure for improving wet cleaning process
By introducing a swing structure in the wet cleaning process, the servo motor drives the output shaft to move, drive the support plate group and support rack to swing, so that the wafer can swing in the cleaning liquid, solving the problem of the diaphragm generation of the drug liquid, achieving more thorough wafer cleaning and improving cleaning efficiency.
Patent Information
- Application Number
- CN202421141511.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-05-23
- Publication Date
- 2025-03-11
- Estimated Expiration
- 2034-05-23
AI Technical Summary
In the ultrasonic cleaning process, the chemical components in the medicine liquid are easily attached to the wafer surface, forming a separator, affecting the peeling of impurities on the wafer surface, resulting in incomplete cleaning.
A swing structure that improves the wet cleaning process is adopted, including a drive assembly, a connecting assembly, two supporting plate groups and several supporting racks. The output shaft is driven by a servo motor to move in the horizontal direction, driving the connecting assembly and support plate groups to run at a certain swing amplitude, thereby causing the wafer to swing and preventing the formation of a diaphragm of the drug liquid.
Through the swing of the wafer, the accumulated cleaning liquid reaction product is quickly peeled off from the wafer, ensuring that impurities on the wafer surface are completely removed and cleaning efficiency is improved.
Smart Images
Figure CN222587492U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of cleaning systems, in particular to a swing structure for improving a wet cleaning process. Background Art
[0002] With the continuous development of semiconductor manufacturing technology, IC circuit integration is getting higher and higher, the key dimensions of products are gradually decreasing, and the requirements for pollution control are becoming more and more stringent. Wafers must be cleaned before entering each process to remove particles, organic matter, metals, natural oxides and other contaminants on their surfaces. Therefore, how to reduce pollution and improve cleaning efficiency in the cleaning process has become an important part of the development of semiconductor technology.
[0003] Wafer cleaning is generally carried out in a tank-type wafer cleaning device. Currently, ultrasonic technology is generally used to achieve wafer cleaning. The wafer is placed on a wafer carrier and placed in a cleaning tank, and the cavitation and acceleration effects of ultrasonic waves in the liquid medicine are used to peel off the impurities on the wafer surface. However, ultrasonic cleaning can easily cause the chemical components in the liquid medicine to adhere to the wafer surface and form a diaphragm, affecting the continued contact between the wafer and the liquid medicine, thereby affecting the peeling of impurities on the wafer surface, resulting in incomplete wafer cleaning. Utility Model Content
[0004] In view of this, in order to solve the above problems, the purpose of the present invention is to provide a swing structure for improving the wet cleaning process, including:
[0005] A driving assembly, a connecting assembly, two support plate groups, a plurality of supporting racks, a connecting shaft and a fixed bracket, the driving assembly having an output shaft and a connecting block, the output shaft is operable to move in a horizontal direction, one end of the connecting block is mounted on one end of the output shaft, the other end of the connecting block is rotatably connected to one end of the connecting assembly, a plurality of supporting racks are arranged between the two support plate groups, and the two ends of each of the supporting racks are respectively connected to the two support plate groups, a plurality of supporting racks are used to carry a plurality of wafers, the other end of the connecting assembly is rotatably connected to one side of one support plate group, one end of the connecting shaft is rotatably mounted on one side of the fixed bracket, and the other end of the connecting shaft is mounted on one side of the other support plate group.
[0006] In another preferred embodiment, the driving assembly includes: a housing, a servo motor, an electric cylinder and a synchronous belt, the housing having an accommodating space, the servo motor and the electric cylinder being both installed on an outer wall of one side of the housing, the synchronous belt being installed in the accommodating space, the electric cylinder having the output shaft, and the servo motor driving the electric cylinder via the synchronous belt and causing the output shaft to move in a horizontal direction.
[0007] In another preferred embodiment, it further includes: a mounting shaft. The other end of the connecting block is provided with a U-shaped groove, and both ends of the mounting shaft are rotatably mounted on the inner walls of both sides of the U-shaped groove. One end of the connecting component is rotatably connected to the mounting shaft.
[0008] In another preferred embodiment, the connecting component includes: a connecting plate, a rotating shaft and two bearings. One end of the connecting plate is provided with a mounting hole, and the connecting plate is rotatably sleeved on the outer wall of the mounting shaft through the mounting hole. The two bearings are sleeved on the outer wall of the rotating shaft. One of the bearings is mounted on the other end of the connecting plate, and the other bearing is mounted on one side of a support plate group. And both ends of the rotating shaft are connected to the other end of the connecting plate and one side of a support plate group.
[0009] In another preferred embodiment, each support plate group includes: a vertical plate, a horizontal plate and a support plate. The upper ends of the vertical plate and the support plate are both mounted on the lower surface of the horizontal plate. The vertical plate, the horizontal plate and the support plate are jointly arranged in a "冂" shape. The other bearing is mounted on the lower end of one side of the corresponding vertical plate. Both ends of several support racks are mounted on the two support plates.
[0010] In another preferred embodiment, the support plate is arranged in a ⊥ shape.
[0011] In another preferred embodiment, the number of the support racks is four, and the four support racks are distributed in an inverted trapezoid on the opposite sides of the two support plates.
[0012] In another preferred embodiment, it further includes: an inner water tank, an outer water tank and a circulating water pipe. The lower ends of the two support plates extend into the inner water tank. The inner water tank is mounted in the outer water tank. The circulating water pipe is mounted at the bottom of the inner water tank, and the circulating water pipe is connected to a liquid supply device.
[0013] In another preferred embodiment, a through hole is provided at the bottom of the outer water tank. The inner water tank is mounted in the through hole. The height of the upper end of the inner water tank is less than the height of the upper end of the outer water tank, and the height of the lower end of the inner water tank is less than the height of the lower end of the outer water tank.
[0014] In another preferred embodiment, several V-shaped grooves are provided at the upper end of the inner water tank, and the several V-shaped grooves are sequentially arranged along the circumferential direction of the inner water tank.
[0015] Due to the adoption of the above technical scheme, the utility model has the following positive effects compared with the prior art: through the application of the utility model, a swing structure for improving the wet cleaning process is provided, and the driving component drives the two support plate groups and a plurality of support racks through the connecting component to swing the wafer at a certain swing amplitude, so that the reaction products of the cleaning solution accumulated on the wafer are quickly separated from the wafer, avoiding the formation of a diaphragm on the wafer surface by the cleaning solution, making the wafer cleaning more thorough and improving the efficiency of the wafer cleaning. BRIEF DESCRIPTION OF THE DRAWINGS
[0016] Figure 1 It is a first partial stereogram of a swing structure for improving a wet cleaning process according to the utility model;
[0017] Figure 2 A second partial stereoscopic diagram of a swing structure for improving a wet cleaning process according to the utility model;
[0018] Figure 3 It is a cross-sectional schematic diagram of a swing structure for improving a wet cleaning process according to the utility model.
[0019] In the attached figure: 1. housing; 2. servo motor; 3. electric cylinder; 4. connecting plate; 5. rotating shaft; 6. bearing; 7. vertical plate; 8. horizontal plate; 9. supporting plate; 10. supporting rack; 11. outer water tank; 12. inner water tank; 13. V-shaped groove; 14. connecting shaft; 15. fixing bracket; 16. output shaft; 17. connecting block; 18. U-shaped groove. DETAILED DESCRIPTION
[0020] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments, but they are not intended to limit the present invention.
[0021] like Figures 1 to 3 As shown, a preferred embodiment of a swing structure for improving a wet cleaning process is shown, comprising:
[0022] A driving assembly, a connecting assembly, two support plate groups, a plurality of support racks 10, a connecting shaft 14 and a fixed bracket 15. The driving assembly has an output shaft 16 and a connecting block 17. The output shaft 16 can be operated to move in a horizontal direction. One end of the connecting block 17 is installed at one end of the output shaft 16, and the other end of the connecting block 17 is rotatably connected to one end of the connecting assembly. A plurality of support racks 10 are arranged between the two support plate groups, and the two ends of each support rack 10 are respectively connected to the two support plate groups. The plurality of support racks 10 are used to carry a plurality of wafers. The other end of the connecting assembly is rotatably connected to one side of a support plate group. One end of the connecting shaft 14 is rotatably installed on one side of the fixed bracket 15, and the other end of the connecting shaft 14 is installed on one side of the other support plate group.
[0023] During actual use, the corresponding support plate group is rotatably connected to the fixed bracket 15 through the connecting shaft 14, so that the support plate group rotates around a fixed point, and a number of wafers are placed on a number of support racks 10, and then a number of wafers are placed at the bottom of the inner water tank 12. The output shaft 16 of the driving component moves in the horizontal direction, so that the connecting component swings to a certain extent, and then the two support plate groups are driven to swing to a certain extent through the connecting component, and then the number of wafers on the number of support racks 10 are driven to swing, thereby avoiding the formation of a diaphragm on the wafer surface by the cleaning solution, making the cleaning of the wafers more thorough, and improving the cleaning efficiency of Jingyuan.
[0024] Further, as a preferred embodiment, the driving assembly includes: a housing 1, a servo motor 2, an electric cylinder 3 and a synchronous belt, the housing 1 has a housing space, the servo motor 2 and the electric cylinder 3 are both installed on the outer wall of one side of the housing 1, the synchronous belt is installed in the housing space, the electric cylinder 3 has an output shaft 16, the servo motor 2 drives the electric cylinder 3 through the synchronous belt and makes the output shaft 16 move in the horizontal direction. Further, in actual use, the output end of the servo motor 2 extends into the housing space and drives the output shaft 16 of the electric cylinder 3 to move in the horizontal direction through the synchronous belt, and the servo motor 2 and the electric cylinder 3 and the transmission cooperation between the two drive the output shaft 16 to move in the horizontal direction, which are all conventional technical means in the field and will not be described in detail here.
[0025] Furthermore, as a preferred embodiment, it also includes: an installation shaft, a U-shaped groove 18 is opened at the other end of the connecting block 17, both ends of the installation shaft are rotatably installed on the two side walls of the U-shaped groove 18, and one end of the connecting component is rotatably connected to the installation shaft.
[0026] Further, as a preferred embodiment, the connecting component includes: a connecting plate 4, a rotating shaft 5, and two bearings 6. One end of the connecting plate 4 is provided with a mounting hole, and the connecting plate 4 is rotatably sleeved on the outer wall of the mounting shaft through the mounting hole. The two bearings 6 are sleeved on the outer wall of the rotating shaft 5. One of the bearings 6 is installed at the other end of the connecting plate 4, and the other bearing 6 is installed on one side of a support plate group. Moreover, both ends of the rotating shaft 5 are connected to the other end of the connecting plate 4 and one side of a support plate group. Further, during actual use, the servo motor 2 drives the electric cylinder 3 to work, thereby driving the output shaft 16 to move horizontally, so that the connecting block 17 moves horizontally. One end of the connecting plate 4 is connected to the connecting block 17 through a mounting shaft. The other end of the connecting plate 4 is rotatably connected to a support plate group through the rotating shaft 5 and a bearing 6. The other support plate group is rotatably connected to the fixed bracket 15 through the connecting shaft 14, and the two support plate groups are connected by a plurality of support racks 10. Thus, when the output shaft 16 drives the connecting plate 4 to swing in the vertical direction, the connecting plate 4 drives a support plate group to swing through the rotating shaft 5, thereby driving a plurality of support racks 10 to swing in the inner water tank 12, and finally driving a plurality of wafers to swing in the cleaning liquid in the inner water tank 12, improving the cleaning efficiency.
[0027] Further, as a preferred embodiment, each support plate group includes: a vertical plate 7, a horizontal plate 8, and a support plate 9. The upper ends of the vertical plate 7 and the support plate 9 are both installed on the lower surface of the horizontal plate 8. The vertical plate 7, the horizontal plate 8, and the support plate 9 together are arranged in a "冂" shape. The other bearing 6 is installed at the lower end of one side of the corresponding vertical plate 7. Both ends of a plurality of support racks 10 are installed on the two support plates 9.
[0028] Further, as a preferred embodiment, the support plate 9 is arranged in a ⊥ shape. Further, the support plate 9 being arranged in a ⊥ shape facilitates the installation of a plurality of support racks 10.
[0029] Further, as a preferred embodiment, the number of the support racks 10 is four, and the four support racks 10 are distributed in an inverted trapezoid on the opposite sides of the two support plates 9. Further, the four support racks 10 being distributed in an inverted trapezoid on the opposite sides of the two support plates 9 facilitates the placement of wafers and ensures the stability of the wafers during placement.
[0030] Furthermore, as a preferred embodiment, it also includes: an inner water tank 12, an outer water tank 11 and a circulating water pipe, the lower ends of the two support plates 9 extend into the inner water tank 12, the inner water tank 12 is installed in the outer water tank 11, the circulating water pipe is installed at the bottom of the inner water tank 12, and the circulating water pipe is connected to a liquid supply device. Furthermore, in actual use, a plurality of liquid spray holes are provided on the outer wall of the circulating water pipe, and the circulating water pipe is connected to a liquid supply device, and liquid is supplied to the inner water tank 12 through the liquid spray holes on the circulating water pipe, so that the cleaning liquid in the inner water tank 12 overflows the inner water tank 12, and the impurities washed off the wafer flow into the outer water tank 11 through the upper end of the inner water tank 12, and the outer water tank 11 then discharges the impurities and excess cleaning liquid. Furthermore, a liquid drain hole is provided at the bottom of the outer water tank 11 to facilitate the discharge of impurities and cleaning liquid in the outer water tank 11.
[0031] Further, as a preferred embodiment, a through hole is provided at the bottom of the outer water tank 11, and the inner water tank 12 is installed in the through hole. The height of the upper end of the inner water tank 12 is less than the height of the upper end of the outer water tank 11, and the height of the lower end of the inner water tank 12 is less than the height of the lower end of the outer water tank 11. Furthermore, by installing the upper part of the inner water tank 12 in the through hole of the outer water tank 11, the overall volume is reduced, thereby reducing the occupied space.
[0032] Further, as a preferred embodiment, a plurality of V-shaped grooves 13 are provided at the upper end of the inner water tank 12, and the plurality of V-shaped grooves 13 are sequentially arranged along the circumference of the inner water tank 12. Further, the V-shaped grooves 13 can destroy the surface tension of the cleaning liquid, which is conducive to discharge impurities on the surface of the cleaning liquid to the outer water tank 11.
[0033] The above description is only a preferred embodiment of the present invention, and does not limit the implementation mode and protection scope of the present invention. For those skilled in the art, it should be aware that all solutions obtained by equivalent substitutions and obvious changes made using the description and illustrations of the present invention should be included in the protection scope of the present invention.
Claims
1. A swing structure for improving a wet cleaning process, characterized in that: Including: A driving component, a connecting component, two support plate groups, a plurality of support racks, a connecting shaft and a fixing bracket. The driving component has an output shaft and a connecting block. The output shaft is operably movable in the horizontal direction. One end of the connecting block is mounted on one end of the output shaft, and the other end of the connecting block is rotatably connected to one end of the connecting component. A plurality of the support racks are arranged between the two support plate groups, and both ends of each support rack are respectively connected to the two support plate groups. The plurality of support racks are used for carrying a plurality of wafers. The other end of the connecting component is rotatably connected to one side of one of the support plate groups. One end of the connecting shaft is rotatably mounted on one side of the fixing bracket, and the other end of the connecting shaft is mounted on one side of the other support plate group.
2. The swing structure for improving wet cleaning process according to claim 1, characterized in that: The driving component includes: a housing, a servo motor, an electric cylinder and a synchronous belt. The housing has an accommodation space. The servo motor and the electric cylinder are both mounted on the outer wall of one side of the housing. The synchronous belt is mounted in the accommodation space. The electric cylinder has the output shaft. The servo motor drives the electric cylinder through the synchronous belt and makes the output shaft move in the horizontal direction.
3. The swing structure for improving wet cleaning process according to claim 2, characterized in that: Also including: A mounting shaft. The other end of the connecting block is provided with a U-shaped groove. Both ends of the mounting shaft are rotatably mounted on the inner walls of both sides of the U-shaped groove. One end of the connecting component is rotatably connected to the mounting shaft.
4. The swing structure for improving wet cleaning process according to claim 3, characterized in that: The connecting component includes: a connecting plate, a rotating shaft and two bearings. One end of the connecting plate is provided with a mounting hole. The connecting plate is rotatably sleeved on the outer wall of the mounting shaft through the mounting hole. The two bearings are sleeved on the outer wall of the rotating shaft. One of the bearings is mounted on the other end of the connecting plate, and the other bearing is mounted on one side of one of the support plate groups. And both ends of the rotating shaft are connected to the other end of the connecting plate and one side of one of the support plate groups.
5. The swing structure for improving wet cleaning process according to claim 4, characterized in that: Each support plate group includes: a vertical plate, a horizontal plate and a support plate. The upper end of the vertical plate and the upper end of the support plate are both mounted on the lower surface of the horizontal plate. The vertical plate, the horizontal plate and the support plate are jointly arranged in an "冂" shape. The other bearing is mounted on the lower end of one side of the corresponding vertical plate. Both ends of the plurality of support racks are mounted on the two support plates.
6. The swing structure for improving wet cleaning process according to claim 5, characterized in that: The support plate is arranged in a ⊥ shape.
7. The swing structure for improving wet cleaning process according to claim 1, characterized in that: The number of the support racks is four. The four support racks are distributed in an inverted trapezoid on the opposite sides of the two support plates.
8. The swing structure for improving wet cleaning process according to claim 5, characterized in that: Also including: An inner water tank, an outer water tank and a circulating water pipe. The lower ends of the two support plates extend into the inner water tank. The inner water tank is mounted in the outer water tank. The circulating water pipe is mounted at the bottom of the inner water tank. The circulating water pipe is connected to a liquid supply device.
9. The swing structure for improving wet cleaning process according to claim 8, characterized in that: A through hole is opened at the bottom of the outer water tank. The inner water tank is mounted in the through hole. The height of the upper end of the inner water tank is less than the height of the upper end of the outer water tank, and the height of the lower end of the inner water tank is less than the height of the lower end of the outer water tank.
10. The swing structure for improving wet cleaning process according to claim 9, characterized in that: A plurality of V-shaped grooves are opened at the upper end of the inner water tank. The plurality of V-shaped grooves are sequentially arranged along the circumferential direction of the inner water tank.