Liquid treatment device

Abstract

The utility model discloses a liquid treatment device, which comprises a mechanical arm assembly, a liquid treatment device and a liquid treatment device, the mechanical arm assembly comprises a first mechanical arm, a second mechanical arm and a third mechanical arm, the first mechanical arm and the second mechanical arm are oppositely arranged and extend along a first direction, and the third mechanical arm extends along a second direction; the driving assembly comprises a lifting driving assembly and a horizontal driving assembly, and the lifting driving assembly is used for driving the first mechanical arm, the second mechanical arm and the third mechanical arm to do lifting motion in the third direction; the first direction, the second direction and the third direction are mutually vertical in pairs; the horizontal driving assembly is used for driving the first mechanical arm and the second mechanical arm to do translational motion in the second direction and driving the third mechanical arm to do translational motion in the first direction; the nozzle assembly is connected with the first mechanical arm, the second mechanical arm and the third mechanical arm and used for supplying liquid to the substrate for liquid treatment. According to the utility model, the space in the process cavity can be saved, the space utilization rate is improved, and the productivity is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductors, in particular to a liquid processing device. Background Art

[0002] After completing the photolithography step in the semiconductor manufacturing process, a developer is applied to the surface of the wafer through a developing device.

[0003] In the prior art, the developing equipment is designed as two processing areas side by side, which are used to horizontally arrange each wafer and process the wafer using the liquid from the nozzle. Since multiple nozzles are arranged horizontally in the entire space, and the setting direction of the nozzles is consistent with the movement direction, a single nozzle needs to cross another nozzle during the movement, so it occupies more space in the vertical direction. At the same time, the horizontal side-by-side arrangement of multiple nozzles also wastes the horizontal space, which reduces the space utilization in the horizontal direction, fewer nozzles are arranged in the same space, and the overall production capacity is low.

[0004] Therefore, it is necessary to provide a liquid processing device to solve the above problems existing in the prior art. Utility Model Content

[0005] The utility model aims to provide a liquid processing device, which can save space in a process chamber, improve space utilization, and increase production capacity.

[0006] To achieve the above purpose, the technical solution of the utility model is as follows:

[0007] A liquid processing device, comprising:

[0008] A mechanical arm assembly, comprising a first mechanical arm, a second mechanical arm and a third mechanical arm, wherein the first mechanical arm and the second mechanical arm are arranged opposite to each other and both extend along a first direction, and the third mechanical arm extends along a second direction;

[0009] A driving assembly, comprising a lifting driving assembly and a horizontal driving assembly, wherein the lifting driving assembly is used to drive the first mechanical arm, the second mechanical arm and the third mechanical arm to perform lifting motion along a third direction; the first direction, the second direction and the third direction are mutually perpendicular; the horizontal driving assembly is used to drive the first mechanical arm and the second mechanical arm to perform translational motion along the second direction, and the third mechanical arm to perform translational motion along the first direction;

[0010] The nozzle assembly is respectively connected to the first robot arm, the second robot arm and the third robot arm, and is used to supply liquid to the substrate for liquid processing.

[0011] The beneficial effect of the liquid processing device provided by the utility model is that: by arranging the first robot arm and the second robot arm in the first direction and arranging the third robot arm in the second direction, that is, the first robot arm, the second robot arm and the third robot arm are staggered, so that when working, the third robot arm can work without crossing the first robot arm and the second robot arm, which can effectively save the space in the process chamber; and when working, the first robot arm, the second robot arm and the third robot arm drive the nozzle assembly to move in different directions, so as to meet a variety of liquid processing methods; at the same time, in the same space, more first robot arms, second robot arms and third robot arms can also be arranged, which can not only improve the space utilization rate, but also can perform liquid processing on more substrates, thereby improving production efficiency.

[0012] Further, the lifting drive assembly includes a first lifting drive unit, a second lifting drive unit and a third lifting drive unit, the horizontal drive assembly includes a first horizontal drive unit, a second horizontal drive unit and a third horizontal drive unit, the nozzle assembly includes a first nozzle, a second nozzle and a third nozzle, the first nozzle is connected to the first robotic arm, and the first robotic arm is respectively connected to the first lifting drive unit and the first horizontal drive unit; the second nozzle is connected to the second robotic arm, and the second robotic arm is respectively connected to the second lifting drive unit and the second horizontal drive unit; the third nozzle is connected to the third robotic arm, and the third robotic arm is respectively connected to the third lifting drive unit and the third horizontal drive unit.

[0013] Furthermore, it also includes a base, on which a first guide rail and a second guide rail are arranged, the first guide rail is used to limit the stroke of the first horizontal driving unit and the second horizontal driving unit, the second guide rail is used to limit the stroke of the third horizontal driving unit, the first guide rail is arranged along the second direction and is located between the first robotic arm and the second robotic arm, and the second guide rail is arranged along the first direction and is located on one side of the first robotic arm.

[0014] Furthermore, it also includes a plurality of waste liquid boxes, which are arranged on the base and corresponding to the first nozzle, the second nozzle and the third nozzle.

[0015] Furthermore, it also includes a plurality of carrying platforms, wherein the carrying platforms are arranged on the base, and the carrying platforms are used to carry the substrate.

[0016] Furthermore, the supporting platform includes a first side, a second side and a third side, the first side is located on the other side of the first robotic arm, the second side is located on one side of the second robotic arm, and the third side is located on one side of the third robotic arm.

[0017] Furthermore, a plurality of adsorption holes are evenly arranged on the support platform, and the adsorption holes are used to be connected to the vacuum equipment.

[0018] Furthermore, it also includes a rotation driving component, which is connected to the supporting platform and is used to drive the supporting platform to rotate.

[0019] Furthermore, the first nozzle, the second nozzle and the third nozzle all have a discharge port, and the discharge port is used to communicate with a liquid source system.

[0020] Furthermore, the first nozzle discharges a first liquid medicine, the second nozzle discharges a cleaning liquid, and the third nozzle discharges a second liquid medicine. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 A schematic diagram of a liquid treatment device according to an embodiment of the present utility model;

[0022] Figure 2 for Figure 1 Top view of unit A.

[0023] Figure numerals: 1. first robot arm; 2. second robot arm; 3. third robot arm; 4. drive assembly; 5. first nozzle; 6. second nozzle; 7. third nozzle; 8. first guide rail; 9. second guide rail; 10. waste liquid box; 11. carrier table; 12. base; 13. wafer. DETAILED DESCRIPTION

[0024] In order to make the purpose, technical scheme and advantages of the embodiments of the utility model clearer, the technical scheme in the embodiments of the utility model will be clearly and completely described below. Obviously, the described embodiments are part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the utility model. Unless otherwise defined, the technical terms or scientific terms used herein should be understood by people with general skills in the field to which the utility model belongs. "Including" and similar words used in this article mean that the elements or objects appearing before the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects.

[0025] The specific implementation of the utility model is further described in detail below in conjunction with the accompanying drawings.

[0026] like Figure 1-Figure 2As shown, an embodiment of the utility model provides a liquid processing device, including: a mechanical arm assembly, a driving assembly 4 and a nozzle assembly. The driving assembly 4 is used to drive the mechanical arm assembly to drive the nozzle assembly to perform liquid processing on a substrate. The substrate is, for example, a wafer 13 after exposure.

[0027] The robot arm assembly includes a first robot arm 1, a second robot arm 2 and a third robot arm 3. The first robot arm 1 and the second robot arm 2 are arranged opposite to each other and both extend along the first direction, and the third robot arm 3 extends along the second direction. Since the overall space in the chamber is limited, this staggered arrangement makes it unnecessary for the third robot arm 3 to cross the first robot arm 1 and the second robot arm 2, which greatly saves the vertical space in the chamber, thereby improving the space utilization rate in the chamber and expanding the production capacity in the limited space.

[0028] The driving assembly 4 includes a lifting driving assembly and a horizontal driving assembly. The lifting driving assembly is used to drive the first mechanical arm 1, the second mechanical arm 2 and the third mechanical arm 3 to perform lifting motion along the third direction. The first direction, the second direction and the third direction are mutually perpendicular. The horizontal driving assembly is used to drive the first mechanical arm 1 and the second mechanical arm 2 to perform translational motion along the second direction, and the third mechanical arm 3 to perform translational motion along the first direction.

[0029] The nozzle assembly is connected to the first robot arm 1, the second robot arm 2 and the third robot arm 3 respectively, and is used to supply liquid to the substrate for liquid treatment. That is, the nozzle assembly is driven by the robot arm assembly to move above the wafer 13, and supplies liquid to the wafer 13 for liquid treatment.

[0030] The first direction is, for example, the X-axis direction, the second direction is, for example, the Y-axis direction, and the third direction is, for example, the Z-axis direction.

[0031] like Figure 2 As shown, in some embodiments of the utility model, the lifting drive assembly includes a first lifting drive unit, a second lifting drive unit and a third lifting drive unit. The horizontal drive assembly includes a first horizontal drive unit, a second horizontal drive unit and a third horizontal drive unit. The nozzle assembly includes a first nozzle 5, a second nozzle 6 and a third nozzle 7. The first nozzle 5 is connected to the first robotic arm 1, and the first robotic arm 1 is respectively connected to the first lifting drive unit and the first horizontal drive unit. The second nozzle 6 is connected to the second robotic arm 2, and the second robotic arm 2 is respectively connected to the second lifting drive unit and the second horizontal drive unit. The third nozzle 7 is connected to the third robotic arm 3, and the third robotic arm 3 is respectively connected to the third lifting drive unit and the third horizontal drive unit.

[0032] The first lifting drive unit is used to drive the first robot arm 1 to perform lifting motion along the Z-axis direction, so as to drive the first nozzle 5 to perform lifting motion along the Z-axis direction. The first horizontal drive unit is used to drive the first robot arm 1 to perform horizontal reciprocating motion along the Y-axis direction, so as to drive the first nozzle 5 to perform horizontal reciprocating motion along the Y-axis direction, so as to spray the liquid on the wafer 13.

[0033] The second lifting drive unit is used to drive the second robot arm 2 to perform lifting motion along the Z-axis direction, so as to drive the second nozzle 6 to perform lifting motion along the Z-axis direction. The second horizontal drive unit is used to drive the second robot arm 2 to perform horizontal reciprocating motion along the Y-axis direction, so as to drive the second nozzle 6 to perform horizontal reciprocating motion along the Y-axis direction, so as to spray the cleaning liquid on the wafer 13.

[0034] The third lifting drive unit is used to drive the third robot arm 3 to perform lifting motion along the Z-axis direction, so as to drive the third nozzle 7 to perform lifting motion along the Z-axis direction. The third horizontal drive unit is used to drive the third robot arm 3 to perform horizontal reciprocating motion along the X-axis direction, so as to drive the third nozzle 7 to perform horizontal reciprocating motion along the X-axis direction, so as to spray the liquid on the wafer 13.

[0035] It should be noted that both the lifting drive assembly and the horizontal drive assembly can be driven by a combination of a motor and a lead screw. The specific structure refers to the prior art and will not be described in detail here.

[0036] In some embodiments of the utility model, the three first nozzles 5 are respectively connected to the corresponding three first mechanical arms 1, and the three first mechanical arms 1 are respectively connected to the corresponding three first lifting drive parts and the three first horizontal drive parts. The three second nozzles 6 are respectively connected to the corresponding three second mechanical arms 2, and the three second mechanical arms 2 are respectively connected to the corresponding three second lifting drive parts and the three second horizontal drive parts. The two third nozzles 7 are respectively connected to the corresponding two third mechanical arms 3, and the two third mechanical arms 3 are respectively connected to the corresponding two third lifting drive parts and the two third horizontal drive parts. That is, the liquid processing device in this embodiment is provided with three liquid processing units at the same time, namely unit A, unit B and unit C. Unit A, unit B and unit C can perform liquid processing on the wafer 13 individually, and can also work simultaneously to perform liquid processing on three wafers 13.

[0037] It should be noted that the liquid processing device of the present invention can be provided with two liquid processing units, or more than two liquid processing units, and the specific number of the liquid processing units is specifically designed according to the size of the actual space in the chamber.

[0038] like Figure 1-Figure 2 As shown, in some embodiments of the present invention, the first nozzle 5, the second nozzle 6 and the third nozzle 7 all have a discharge port. The discharge port is used to discharge liquid to the wafer 13 for liquid processing.

[0039] like Figure 1-Figure 2 As shown, in some embodiments of the utility model, the first nozzle 5 discharges the first liquid, the second nozzle 6 discharges the cleaning liquid, and the third nozzle 7 discharges the second liquid. The first liquid and the second liquid are different types of developer to meet different development requirements. A set of devices can realize two liquid processing methods at the same time, which greatly improves the development efficiency.

[0040] In some embodiments of the present invention, the discharge port is used to communicate with the liquid source system. That is, a liquid inlet and a discharge port are provided on the first nozzle 5, and the liquid in the liquid source system enters the first nozzle 5 from the liquid inlet and is discharged from the discharge port. The second nozzle 6 and the third nozzle 7 are similar, and will not be described in detail here.

[0041] like Figure 1 As shown, in some embodiments of the utility model, the liquid processing device also includes a base 12. A first guide rail 8 and a second guide rail 9 are arranged on the base 12. The first guide rail 8 is arranged along the second direction and is located between the first mechanical arm 1 and the second mechanical arm 2. The second guide rail 9 is arranged along the first direction and is located on one side of the first mechanical arm 1. The first guide rail 8 is used to limit the stroke of the first horizontal driving unit and the second horizontal driving unit, and the second guide rail 9 is used to limit the stroke of the third horizontal driving unit. Specifically, the first guide rail 8 limits the stroke of the first mechanical arm 1 driving the first nozzle 5, and also limits the stroke of the second mechanical arm 2 driving the second nozzle 6. That is, the first guide rail 8 is a common guide rail for the driving devices of the first mechanical arm 1 and the second mechanical arm 2. The second guide rail 9 limits the stroke of the third mechanical arm 3 driving the third nozzle 7. The second guide rail 9 can be a common guide rail for the third horizontal driving units of the two liquid processing units, for example, a common guide rail for the A unit and the B unit, which saves space and greatly improves space utilization.

[0042] like Figure 1 As shown, in some embodiments of the present invention, the liquid treatment device further includes a plurality of waste liquid boxes 10. The waste liquid boxes 10 are disposed on the base 12 and are disposed corresponding to the first nozzle 5, the second nozzle 6, and the third nozzle 7. That is, a corresponding waste liquid box 10 is disposed under each of the first nozzle 5, the second nozzle 6, and the third nozzle 7 for storing residual developer and cleaning liquid.

[0043] like Figure 1 As shown, in some embodiments of the present invention, the liquid processing device further comprises a plurality of carriers 11. The carriers 11 are disposed on a base 12, and the carriers 11 are used to carry substrates. For example, three carriers 11 are respectively disposed in unit A, unit B, and unit C.

[0044] In some embodiments of the utility model, the carrier 11 includes a first side, a second side and a third side. The first side is located on the other side of the first robotic arm 1, the second side is located on one side of the second robotic arm 2, and the third side is located on one side of the third robotic arm 3. That is, the carrier 11 is located between the first robotic arm 1, the second robotic arm 2 and the third robotic arm 3. That is, the carrier is set within the space enclosed by the first robotic arm 1, the second robotic arm 2 and the third robotic arm 3, so as to maximize the use of the space in the chamber.

[0045] like Figure 1 As shown, in some embodiments of the utility model, a plurality of adsorption holes are evenly arranged on the carrier 11. The adsorption holes are used to be connected to the vacuum equipment. By evenly arranging a plurality of adsorption holes, the force on the wafer 13 is more evenly distributed when being adsorbed. By connecting the pipe to the vacuum equipment, the vacuum suction is started to generate a negative pressure in the carrier 11, thereby sucking the wafer 13. Specifically, in the process of adsorbing the wafer 13, under the action of the vacuum equipment, the adsorption holes generate vacuum pressure, so that the wafer 13 is sucked; when the wafer 13 needs to be released, the vacuum equipment stops generating vacuum pressure, and blows air of a certain pressure and flow rate into the adsorption holes to break the vacuum, thereby facilitating better separation of the wafer 13 from the carrier.

[0046] It should be noted that the first nozzle 5 of the A unit sprays the developer, the second nozzle 6 of the A unit sprays the cleaning solution, the A unit and the B unit share a third nozzle 7 to spray different types of developers, and the A unit and the B unit share a second guide rail 9. This design effectively saves space in the chamber and maximizes space utilization. The first nozzle 5 of the C unit sprays the developer, the second nozzle of the C unit sprays the cleaning solution, and the third nozzle 7 of the C unit only sprays the developer on the wafer 13 in the C unit.

[0047] Taking unit A as an example, the liquid processing device of the present invention provides two liquid processing methods:

[0048] The first liquid treatment method is that the first nozzle 5 of the A unit and the second nozzle 6 of the A unit work in coordination, the first nozzle 5 of the A unit discharges the developing liquid to spray the entire surface of the wafer 13, and the second nozzle 6 of the A unit discharges the cleaning liquid. Specifically, it includes the following steps:

[0049] S1: The first lifting drive unit of the A unit drives the first robot arm 1 of the A unit to perform an upward movement along the Z-axis direction, so as to drive the first nozzle 5 to perform a synchronous upward movement along the Z-axis direction.

[0050] S2: The first horizontal driving unit of unit A drives the first robot arm 1 of unit A to move upward on the Y axis along the first guide rail 8 of unit A, so as to drive the first nozzle 5 to move upward on the Y axis to the center position of the surface of the wafer 13 to spray the developer.

[0051] S3: After the first nozzle 5 of unit A finishes spraying, the first robot arm 1 of unit A drives the first nozzle 5 of unit A to move downward on the Y axis, thereby returning to the standby position.

[0052] S4: After the developer reacts for a certain period of time, the second lifting drive unit of unit A drives the second robot arm 2 of unit A to move upward along the Z axis direction, so as to drive the second nozzle 6 of unit A to move upward synchronously along the Z axis direction.

[0053] S5: The second horizontal driving unit of unit A drives the second robot arm 2 of unit A to move downward along the Y axis, so as to drive the second nozzle 6 to move downward along the Y axis to the center position of the surface of the wafer 13 to spray the cleaning liquid.

[0054] S6: After the second nozzle 6 of unit A finishes spraying, the second robot arm 2 of unit A drives the second nozzle 6 of unit A to move upward on the Y axis, thereby returning to the standby position.

[0055] The second liquid treatment method is that the third nozzle 7 of the A unit and the second nozzle 6 of the A unit work in coordination, the third nozzle 7 of the A unit discharges the developing liquid to spray the entire surface of the wafer 13, and the second nozzle 6 of the A unit discharges the cleaning liquid. Specifically, it includes the following steps:

[0056] S1: The third lifting drive unit of the A unit drives the third robot arm 3 of the A unit to perform an upward movement along the Z axis direction, so as to drive the third nozzle 7 of the A unit to perform a synchronous upward movement along the Z axis direction.

[0057] S2: The third horizontal driving unit of unit A drives the third robot arm 3 of unit A to move leftward on the X-axis along the second guide rail 9 of unit A, thereby driving the third nozzle 7 of unit A to move leftward on the X-axis. During the movement, the third nozzle 7 of unit A continuously sprays the developing solution onto the surface of the wafer 13, so that the developing solution is supplied to the entire surface of the wafer 13.

[0058] S3: After the third nozzle 7 of unit A finishes spraying, the third robot arm 3 of unit A drives the third nozzle 7 of unit A to move rightward on the X-axis, thereby returning to the standby position.

[0059] S4: After the developer reacts for a certain period of time, the second lifting drive unit of unit A drives the second robot arm 2 of unit A to move upward along the Z axis direction, so as to drive the second nozzle 6 of unit A to move upward synchronously along the Z axis direction.

[0060] S5: The second horizontal driving unit of unit A drives the second robot arm 2 of unit A to move downward on the Y axis, so as to drive the second nozzle 6 of unit A to move downward on the Y axis to the center of the surface of the wafer 13 to spray the cleaning liquid.

[0061] S6: After the second nozzle 6 of unit A finishes spraying, the second robot arm 2 of unit A drives the second nozzle 6 of unit A to move upward on the Y axis, thereby returning to the standby position.

[0062] The liquid treatment method of the B unit and the C unit is the same as that of the A unit, and will not be repeated here.

[0063] In some embodiments of the present invention, the liquid treatment device further comprises a rotation drive assembly. The rotation drive assembly is connected to the carrier 11 and is used to drive the carrier 11 to rotate. That is, during the process of liquid treatment of the wafer 13, the rotation drive assembly is started to drive the carrier 11 to rotate, thereby driving the wafer 13 to rotate. The wafer 13 rotates at a certain speed, so that the developer and cleaning liquid sprayed are more uniform and play a role reasonably.

[0064] The up, down, left, and right directions in this article are Figure 1 and Figure 2 Up, down, left, and right as shown.

[0065] In summary, the utility model extends the first robotic arm and the second robotic arm along the X-axis and the third robotic arm along the Y-axis. This staggered arrangement can save space in the chamber and improve the overall space utilization. At the same time, more first robotic arms, second robotic arms and third robotic arms can be arranged in the same space to achieve movement in different directions, thereby coping with various liquid processing methods.

[0066] Although the embodiments of the present invention are described in detail above, it is obvious to those skilled in the art that various modifications and variations can be made to these embodiments. However, it should be understood that such modifications and variations are within the scope and spirit of the present invention as described in the claims. Moreover, the present invention described herein may have other embodiments and may be implemented or realized in a variety of ways.

Claims

1. A liquid treatment device, characterized in that: include: A mechanical arm assembly, comprising a first mechanical arm, a second mechanical arm and a third mechanical arm, wherein the first mechanical arm and the second mechanical arm are arranged opposite to each other and both extend along a first direction, and the third mechanical arm extends along a second direction; A driving assembly, comprising a lifting driving assembly and a horizontal driving assembly, wherein the lifting driving assembly is used to drive the first mechanical arm, the second mechanical arm and the third mechanical arm to perform lifting motion along a third direction; the first direction, the second direction and the third direction are mutually perpendicular; the horizontal driving assembly is used to drive the first mechanical arm and the second mechanical arm to perform translational motion along the second direction, and the third mechanical arm to perform translational motion along the first direction; The nozzle assembly is respectively connected to the first robot arm, the second robot arm and the third robot arm, and is used to supply liquid to the substrate for liquid processing.

2. The liquid treatment device according to claim 1, characterized in that: The lifting drive assembly includes a first lifting drive unit, a second lifting drive unit and a third lifting drive unit, the horizontal drive assembly includes a first horizontal drive unit, a second horizontal drive unit and a third horizontal drive unit, the nozzle assembly includes a first nozzle, a second nozzle and a third nozzle, the first nozzle is connected to the first robot arm, and the first robot arm is respectively connected to the first lifting drive unit and the first horizontal drive unit; the second nozzle is connected to the second robot arm, and the second robot arm is respectively connected to the second lifting drive unit and the second horizontal drive unit; the third nozzle is connected to the third robot arm, and the third robot arm is respectively connected to the third lifting drive unit and the third horizontal drive unit.

3. The liquid treatment device according to claim 2, characterized in that: It also includes a base, on which a first guide rail and a second guide rail are arranged, the first guide rail is used to limit the stroke of the first horizontal driving unit and the second horizontal driving unit, the second guide rail is used to limit the stroke of the third horizontal driving unit, the first guide rail is arranged along the second direction and is located between the first robotic arm and the second robotic arm, and the second guide rail is arranged along the first direction and is located on one side of the first robotic arm.

4. The liquid treatment device according to claim 3, characterized in that: It also includes a plurality of waste liquid boxes, which are arranged on the base and corresponding to the first nozzle, the second nozzle and the third nozzle.

5. The liquid treatment device according to claim 3, characterized in that: It also includes a plurality of carrying platforms, which are arranged on the base and used for carrying the substrate.

6. The liquid processing device according to claim 5, characterized in that: The supporting platform includes a first side, a second side and a third side, the first side is located at the other side of the first mechanical arm, the second side is located at one side of the second mechanical arm, and the third side is located at one side of the third mechanical arm.

7. The liquid treatment device according to claim 5, characterized in that: A plurality of adsorption holes are evenly arranged on the bearing platform, and the adsorption holes are used to be connected with the vacuum equipment.

8. The liquid treatment device according to claim 5, characterized in that: It also includes a rotation driving component, which is connected to the supporting platform and is used to drive the supporting platform to rotate.

9. The liquid treatment device according to claim 2, characterized in that: The first nozzle, the second nozzle and the third nozzle all have a discharge port, and the discharge port is used to communicate with a liquid source system.

10. The liquid treatment device according to claim 2, characterized in that: The first nozzle discharges a first liquid chemical, the second nozzle discharges a cleaning liquid, and the third nozzle discharges a second liquid chemical.

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