Non-magnetic U-shaped sample table
By designing a magnetic-free U-shaped sample table, the problem that the Gatan 682 ion polishing equipment cannot perform CP cross-section polishing and cutting is solved, and the sample fixation and CP cross-section polishing and cutting are achieved, which are suitable for samples of different shapes and thicknesses.
Patent Information
- Application Number
- CN202421356234.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-06-14
- Publication Date
- 2025-03-18
- Estimated Expiration
- 2034-06-14
AI Technical Summary
The existing Gatan 682 ion polishing equipment original sample table can only be used for flat polishing and cannot be used for CP cross-section polishing and cutting.
A magnetic-free U-shaped sample stage is designed, including a base body, a slot, threaded hole, hole, ion beam occlusion bevel and ion occlusion plane, through these structures, the sample fixation and CP cross-section polishing and cutting are achieved.
This sample table can be adapted to Gatan 682 ion polishing machine, enabling sample fixation and CP cross-section polishing and cutting. It has a simple structure and is suitable for samples of different shapes and thicknesses.
Smart Images

Figure CN222627122U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of ion polishing, in particular to a non-magnetic U-shaped sample table. Background Art
[0002] Ion beam cross-section grinding, also known as CP cross-section grinding, uses ion beam cutting to cut out the cross-section of the sample. Different from general sample cross-section grinding, ion beam cutting can avoid the stress caused by the grinding process.
[0003] Gatan 682 is a device that can be used for ion polishing. Its original sample stage can only be used for plane polishing, and cannot be used for CP cross-section polishing and cutting.
[0004] The utility model aims to provide a sample table, which is used for Gatan 682 to perform CP cross-section polishing and cutting, and has a simple structure and is easy to operate. Utility Model Content
[0005] The utility model aims to provide a non-magnetic U-shaped sample stage to solve the problems raised in the above background technology.
[0006] In order to achieve the above purpose, the utility model provides the following technical solutions:
[0007] A non-magnetic U-shaped sample stage comprises a substrate, wherein a slot is provided inside the substrate, a threaded hole is provided inside the substrate, a hole is provided at the bottom of the substrate, an ion beam shielding inclined surface and an ion shielding plane are respectively provided at the top of the top of the substrate, the inner side of the upper part of the substrate is a sample close contact surface, and the outer side of the bottom of the substrate is a bottom surface.
[0008] As a preferred solution of the utility model, the angle between the ion beam shielding inclined plane and the ion shielding plane is 98°, and the ion shielding plane is parallel to the sample close contact surface.
[0009] As a preferred solution of the utility model, the threaded hole and the hole are coaxially connected, and the diameter of the hole is 1.2 times the diameter of the threaded hole.
[0010] As a preferred solution of the utility model, the threaded hole and a bolt are arranged in the hole, and the threaded hole and the bolt are threadedly connected.
[0011] As a preferred solution of the utility model, the sample is placed in the card slot, and the sample-contacting surface abuts against the top of the sample.
[0012] As a preferred solution of the utility model, the height of the substrate is set to 40 mm, and the material of the substrate is non-magnetic stainless steel.
[0013] As a preferred solution of the utility model, the height of the threaded hole is set to 5 mm, and the height of the hole is set to 10 mm.
[0014] As a preferred solution of the utility model, the height of the card slot is set to 15 mm, and the bottom surface is fixedly connected to the original sample stage of the ion polishing machine.
[0015] Compared with the prior art, the beneficial effects of the utility model are:
[0016] 1. In the utility model, the base provided can be adapted to the Gatan ion polishing machine and can be directly bonded to the original sample stage for use. When in use, the sample needs to be fixed in the card slot of the base, the sample is first supported by bolts, and then the bolts are rotated to move the sample upward so that the top of the sample and the sample are in close contact with each other, thereby fixing the sample on the sample stage. The sample stage has a simple structure, and the process of fixing and clamping the sample is also very simple, and can be suitable for samples of different shapes and thicknesses.
[0017] 2. In the utility model, an ion beam shielding inclined plane and an ion shielding plane are provided to form an inclined plane with an angle of 98°, so that the sample fixed on the sample stage can be subjected to CP cross-section polishing and cutting. The position of sample cutting is first determined, and then the sample is fixed on the sample stage by bolts, and then the bottom surface of the sample stage is bonded to the original sample stage of the Gatan ion polishing machine, and then cutting and polishing can be performed. Compared with the original sample stage, this sample stage can realize the CP cross-section polishing and cutting function that the original sample stage does not have. BRIEF DESCRIPTION OF THE DRAWINGS
[0018] Figure 1 It is an overall schematic diagram of the utility model;
[0019] Figure 2 It is an overall bottom view schematic diagram of the utility model;
[0020] Figure 3 It is the overall bottom schematic diagram of the utility model;
[0021] Figure 4 It is a schematic diagram of the internal section of the utility model.
[0022] In the figure: 1, substrate; 2, threaded hole; 3, ion beam shielding inclined surface; 4, ion shielding plane; 5, sample close contact surface; 6, bottom surface; 7, hole; 8, slot. DETAILED DESCRIPTION
[0023] The technical solutions in the embodiments of the utility model will be clearly and completely described below in conjunction with the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, rather than all of the embodiments. Based on the embodiments of the utility model, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the utility model.
[0024] For examples, see Figure 1-4 , the utility model provides a technical solution:
[0025] A non-magnetic U-shaped sample stage comprises a substrate 1, a card slot 8 is provided inside the substrate 1, a threaded hole 2 is provided inside the substrate 1, a hole 7 is provided at the bottom of the substrate 1, an ion beam shielding inclined surface 3 and an ion shielding plane 4 are provided at the top of the substrate 1, the inner side of the upper part of the substrate 1 is a sample close contact surface 5, and the outer side of the bottom of the substrate 1 is a bottom surface 6.
[0026] In this embodiment, Figure 1 , Figure 3 and Figure 4 As shown, the threaded hole 2 and the hole 7 are coaxially connected, the diameter of the hole 7 is 1.2 times the diameter of the threaded hole 2, bolts are arranged in the threaded hole 2 and the hole 7, the threaded hole 2 and the bolt are threadedly connected, the height of the base 1 is set to 40mm, the material of the base 1 is non-magnetic stainless steel, the height of the threaded hole 2 is set to 5mm, and the height of the hole 7 is set to 10mm.
[0027] Among them, the provided base can be adapted to the Gatan 682 ion polisher and can be directly bonded to the original sample stage for use. When in use, the sample needs to be fixed in the slot 8 of the substrate 1. The sample is first supported by bolts, and then the bolts are rotated to move the sample upward so that the top of the sample is in contact with the sample close surface 5, thereby fixing the sample on the sample stage. The sample stage has a simple structure, and the sample fixing and clamping process is also very simple, and can be suitable for samples of different shapes and thicknesses.
[0028] In this embodiment, Figure 1 , Figure 2 and Figure 3 As shown, the angle between the ion beam shielding slope 3 and the ion shielding plane 4 is 98°, the ion shielding plane 4 is parallel to the sample close contact surface 5, the sample is placed in the slot 8, the sample close contact surface 5 is in contact with the top of the sample, the height of the slot 8 is set to 15 mm, and the bottom surface 6 is fixedly connected to the original sample stage of the ion polishing machine.
[0029] Among them, by setting the ion beam shielding inclined plane 3 and the ion shielding plane 4 to form an inclined plane with an angle of 98°, the sample fixed on the sample stage can be subjected to CP cross-section polishing and cutting. The bone cutting position of the sample is first determined, and then the sample is fixed on the sample stage, and then the bottom surface of the sample stage is bonded to the original sample stage of the Gatan 682 ion polishing machine, and then cutting and polishing can be performed. Compared with the original sample stage, this sample stage can realize the CP cross-section polishing and cutting function that the original sample stage does not have.
[0030] The working process of the utility model is as follows: when using a non-magnetic U-shaped sample stage designed by the present invention, first prepare a screw that matches the threaded hole 2 and the hole 7, rotate the screw upward from 7, screw the screw part into the threaded hole 2, place the sample into 8, place the plane of the sample to be cut and polished close to the sample close surface 5, expose the part that needs to be cut, and then rotate the screw so that the top of the screw is against the sample to fix it, and then bond the bottom surface to the original sample stage of the Gatan 682 ion polisher after fixation, and then cut and polish can be performed. During the ion beam bombardment and cutting process, the material of the sample exposed outside the sample close surface 5 will be removed by ion bombardment to produce a CP polished section.
[0031] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.
Claims
1. A non-magnetic U-shaped sample stage, comprising a substrate (1), characterized in that: The substrate (1) is provided with a slot (8) inside, a threaded hole (2) inside, a hole (7) at the bottom, an ion beam shielding inclined surface (3) and an ion shielding plane (4) at the top, the inner side of the upper part of the substrate (1) is a sample close contact surface (5), and the outer side of the bottom of the substrate (1) is a bottom surface (6).
2. The non-magnetic U-shaped sample stage according to claim 1, characterized in that: The angle between the ion beam shielding inclined surface (3) and the ion shielding plane (4) is 98°, and the ion shielding plane (4) is parallel to the sample close contact surface (5).
3. The non-magnetic U-shaped sample stage according to claim 1, characterized in that: The threaded hole (2) and the hole (7) are coaxially connected, and the diameter of the hole (7) is 1.2 times the diameter of the threaded hole (2).
4. The non-magnetic U-shaped sample stage according to claim 1, characterized in that: Bolts are arranged in the threaded hole (2) and the hole (7), and the threaded hole (2) and the bolt are threadedly connected.
5. The non-magnetic U-shaped sample stage according to claim 1, characterized in that: The sample is placed in the card slot (8), and the sample close contact surface (5) abuts against the top of the sample.
6. The non-magnetic U-shaped sample stage according to claim 1, characterized in that: The height of the base (1) is set to 40 mm, and the material of the base (1) is non-magnetic stainless steel.
7. The non-magnetic U-shaped sample stage according to claim 1, characterized in that: The height of the threaded hole (2) is set to 5 mm, and the height of the hole (7) is set to 10 mm.
8. The non-magnetic U-shaped sample stage according to claim 1, characterized in that: The height of the card slot (8) is set to 15 mm, and the bottom surface (6) is fixedly connected to the original sample stage of the ion polishing machine.