Corrosion cleaning device for quartz wafer
By designing a corrosion cleaning device including an acid tank and a sink, and using a rocker arm mechanism to achieve automated corrosion and cleaning, the problem of quartz wafer corrosion and cleaning in the prior art relying on manual operation, and improving production efficiency and equipment stability.
Patent Information
- Application Number
- CN202421625393.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-07-10
- Publication Date
- 2025-04-22
- Estimated Expiration
- 2034-07-10
AI Technical Summary
In the prior art, corrosion and cleaning of quartz wafers mainly rely on manual operations, resulting in high labor intensity, high labor costs, low production efficiency, and large equipment size and poor stability.
A corrosion cleaning device including an acid tank and a sink is designed, and a rocker arm mechanism is used to achieve automatic corrosion and cleaning. The rocker arm mechanism consists of a base, a lifting structure, a rotating structure and a swing structure, which can automatically transport, corrode and clean the wafer basket between the acid tank and the sink.
It realizes automatic corrosion and cleaning of quartz wafers, improves production efficiency, reduces labor costs, and has a simple structure, good stability and relatively small size.
Smart Images
Figure CN222778513U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to a quartz wafer corrosion cleaning device. Background Art
[0002] Quartz wafers, quartz wafers are referred to as wafers for short. The wafers are sorted by frequency sorting feeders, and then etched by etching cleaning machines to unify the frequency range of the wafers. The wafers are cut into large square pieces using quartz crystal rods, and then processed into smaller wafers through a series of processes. The wafers will produce mechanical vibrations when subjected to an external alternating electric field. When the frequency of the alternating electric field is the same as the natural frequency of the quartz crystal, the vibration becomes very strong. This is the characteristic of the wafer frequency. Using this characteristic, the frequency of a single wafer can be measured, classified, and then etched to unify the frequency range.
[0003] The traditional method is to place the quartz crystal in a crystal basket, then place it in a corrosion liquid pool, shake the corrosion basket to corrode the crystal, and then place the crystal basket in a cleaning pool and shake it to clean it. The existing technology uses manual operation, where the crystal basket is held by hand and shaken manually for cleaning. This method not only has high labor intensity and high labor costs, but also has low production efficiency. Summary of the invention
[0004] The utility model provides a quartz wafer etching and cleaning device which can complete etching and cleaning on one device and has good automation, high efficiency and good stability; it solves the technical problems existing in the prior art that the quartz wafer etching work is all manual operation, the efficiency is low, the stability is poor, and the etching and cleaning equipment is large in size.
[0005] The above technical problem of the utility model is solved by the following technical scheme: a quartz wafer etching cleaning device, comprising a working cover, an acid tank for etching and a water tank for cleaning are arranged in the working cover, a rocker mechanism is arranged between the acid tank and the water tank, the rocker mechanism comprises a base, a rocker lifting structure and a rocker rotating structure are installed on the base, a support seat is installed on the rocker lifting structure, a rocker swinging structure is installed on the support seat, the rocker swinging structure is connected with one end of the rocker, and a wafer basket is installed at the other end of the rocker. A transparent window is arranged above the working cover, through which the wafer basket is placed, and the acid tank is placed in the cover to prevent the acid from volatilizing into the air and affecting the health of the operator. After the rocker drives the wafer basket to be etched in the acid tank, it enters the water tank for cleaning. The water tank is used to clean the acid solution residue of the basket and the wafer in the basket, which can prevent the acid solution from continuing to corrode the wafer and causing excessive corrosion of the wafer, and can also prevent the acid solution on the basket from harming the hands of the operator. During the etching step, the lifting structure drives the rocker arm to move up and down, driving the wafer basket to enter or escape from the etching solution in the acid tank, and the rocker arm swing structure swings in the acid tank for etching. Then the rocker arm is driven to rotate above the water tank by the rotating structure, and the lifting structure drives the wafer basket to descend and immerse it in the water tank for cleaning. The rocker arm swing structure drives the rocker arm to swing again for cleaning, and after cleaning, the rocker arm is driven to rise again. One device completes etching and cleaning, with a simple structure, high efficiency, and high degree of automation.
[0006] Preferably, the rocker arm rotating structure comprises a driving motor mounted on a support seat, a gear set is mounted on a support plate of the support seat, and a rocker arm is fixed on the gear of the gear set.
[0007] Preferably, the gear set includes a driving gear, which is fixed on the output shaft of the driving motor, meshed with a transmission gear, meshed with a driven gear, and the driven gear is mounted on the driven gear shaft through a bearing, and the driven gear shaft is fixed on the support plate; a rocker arm mounting shaft seat is mounted on each of the driving gear and the driven gear, a rocker arm mounting shaft is formed on the rocker arm mounting shaft seat, and the rocker arm is mounted on the rocker arm mounting shaft through a bearing. The driving gear drives the driven gear to rotate through the transmission gear, so that the driving gear and the driven gear rotate in the same direction. The rocker arm is designed with two connection points on the driving gear and the driven gear through two rocker arm fixing seats, and the four points of the driving gear shaft, the driven gear shaft, and the two rocker arm shafts form a hinged four-bar structure, so that the rocker arm can swing with the rotation of the driving gear, thereby shaking the wafers in the wafer basket in the acid tank or the water tank, and fully corroding and cleaning each wafer.
[0008] Preferably, the rocker arm mounting shaft seat is fixed to the gear by screws. The screw fixing method effectively prevents the rocker arm mounting shaft seat from falling off the gear after multiple rocker arm rotations, thereby improving the stability of rocker arm rotation, increasing service life, and ensuring corrosion cleaning effect.
[0009] Preferably, the rocker arm is L-shaped, and includes a rocker arm bracket and a rocker arm rod. The rocker arm bracket is L-shaped, and slots are provided at both ends of the rocker arm bracket. The slots are provided with waist-shaped connecting holes, and the rocker arm rod is inserted into the slots. By fixing the waist-shaped connecting holes at different positions, the position of the rocker arm rod in the rocker arm bracket is adjusted, thereby adjusting the length of the rocker arm, so as to meet the requirement that the acid solution completely immerses the wafers in the basket, thereby achieving the purpose of etching the wafers.
[0010] Preferably, the rocker arm lifting structure comprises a lifting frame, a cylinder housing is fixed on the lifting frame, a rotating shaft is installed below the cylinder housing, the cylinder drives the lifting frame to move up and down, and a support seat is fixed on the lifting frame.
[0011] Preferably, the rocker arm rotating structure includes a rotating motor, and the rotating motor drives the rocker arm lifting structure to rotate via a belt.
[0012] Therefore, the utility model of a quartz wafer etching and cleaning device has the following advantages: an acid tank and a water tank are provided, and a rocker mechanism is designed between the acid tank and the water tank. The rocker mechanism can transport the wafer basket from the acid tank to the water tank, thereby realizing automated etching and cleaning with high efficiency. At the same time, the rocker swing structure and the gears are fixed on the support plate, so the structure is stable and will not loosen and fall due to the rotation of the rocker. BRIEF DESCRIPTION OF THE DRAWINGS
[0013] Figure 1 The present invention is a three-dimensional diagram of a quartz wafer etching and cleaning device with its cover removed.
[0014] Figure 2 yes Figure 1 A three-dimensional diagram of the inner rocker arm swing structure.
[0015] Figure 3 yes Figure 1 Schematic diagram of the gear set on the inner support plate. DETAILED DESCRIPTION
[0016] The technical solution of the utility model is further specifically described below through embodiments and in conjunction with the accompanying drawings.
[0017] Example:
[0018] like Figure 1 and 2As shown in FIG. 3 , a quartz wafer etching cleaning device includes an acid tank 1 for etching and a water tank 2 for cleaning located in a working housing (not shown). A rocker mechanism is arranged between the acid tank 1 and the water tank 2. The rocker mechanism includes a base 9, on which a rocker lifting structure and a rocker rotating structure are installed.
[0019] The rocker arm lifting structure includes a lifting frame 6 mounted on a base, a cylinder housing 7 is mounted on the lifting frame 6, a rotating shaft 8 is mounted below the cylinder housing 7, the cylinder drives the lifting bracket 5 to move up and down, and a support base 4 is mounted on the lifting bracket 5.
[0020] The rocker arm rotating structure includes a rotating motor 10 installed on the base. The rotating motor 10 drives the rotating shaft 8 to rotate through a belt, thereby driving the entire lifting frame 6 to rotate.
[0021] A driving motor 15 is mounted on the support seat 4, and a gear set is mounted on the support plate 16 of the support seat 4. The gear set includes a driving gear 19, which is fixed on the output shaft of the driving motor, and is meshed with a transmission gear 20, which is meshed with a driven gear 18, and the driven gear 18 is mounted on the driven gear shaft through a bearing, and the driven gear shaft is fixed on the support plate 16; a rocker arm mounting shaft seat 21 is mounted on each of the driving gear 19 and the driven gear 18, and the rocker arm mounting shaft seat 21 is fixed on the gear through screws. A rocker arm mounting shaft 22 is formed on the rocker arm mounting shaft seat 21, and the rocker arm 3 is mounted on the rocker arm mounting shaft 22 through a bearing.
[0022] The rocker arm 3 is L-shaped, and includes a rocker arm bracket 11 and a rocker arm rod 17. The rocker arm bracket 11 is L-shaped, and slots 12 are provided at both ends of the rocker arm bracket 11. The slots 12 are provided with waist-shaped connecting holes, and the rocker arm rod 17 is inserted into the slots 12. A collar 14 is formed at the end of the rocker arm rod, and the wafer basket 13 is clamped in the collar 14.
[0023] When in use, the cylinder drives the lifting bracket to move up and down, so that the wafer basket can be put into or taken out of the acid tank or water tank. The rotary motor drives the entire lifting bracket to rotate, so as to realize the rotation of the rocker arm, so that the wafer basket can be rotated from the acid tank to the water tank, or from the water tank to the acid tank. When etching or washing in the acid tank or water tank, the driving motor drives the rocker arm to swing, so as to achieve thorough etching in the acid tank and thorough washing in the water tank.
[0024] The rocker arm mechanism comprises a base, on which a lifting motor is installed, and the lifting motor drives the lifting rod to move.
[0025] The specific embodiments described herein are merely examples of the concept of the present invention. Those skilled in the art may make various modifications or additions to the specific embodiments described or replace them in similar ways, but they will not deviate from the spirit of the present invention or exceed the scope defined by the appended claims.
Claims
1. A quartz wafer etching cleaning device, comprising a working housing, an acid tank for etching and a water tank for cleaning are provided in the working housing, characterized in that: A rocker mechanism is provided between the acid tank and the water tank, and the rocker mechanism comprises a base, on which a rocker lifting structure and a rocker rotating structure are installed, a supporting seat is installed on the rocker lifting structure, a rocker swinging structure is installed on the supporting seat, the rocker swinging structure is connected to one end of the rocker, and a chip basket is installed on the other end of the rocker.
2. The quartz wafer etching cleaning device according to claim 1, characterized in that: The rocker arm swing structure comprises a driving motor installed on a supporting seat, a gear set is installed on a supporting plate of the supporting seat, and a rocker arm is fixed on the gear of the gear set.
3. The quartz wafer etching cleaning device according to claim 2, characterized in that: The gear set includes a driving gear, which is fixed on the output shaft of the driving motor, the driving gear is meshed with a transmission gear, the transmission gear is meshed with a driven gear, the driven gear is mounted on the driven gear shaft through a bearing, and the driven gear shaft is fixed on a support plate; a rocker arm mounting shaft seat is respectively mounted on the driving gear and the driven gear, a rocker arm mounting shaft seat is formed with a rocker arm mounting shaft, and the rocker arm is mounted on the rocker arm mounting shaft through a bearing.
4. The quartz wafer etching cleaning device according to claim 3, characterized in that: The rocker arm mounting shaft seat is fixed on the gear by screws.
5. A quartz wafer etching cleaning device according to any one of claims 1 to 4, characterized in that: The rocker arm is L-shaped and includes a rocker arm bracket and a rocker arm rod. The rocker arm bracket is L-shaped, with slots at both ends of the rocker arm bracket, waist-shaped connecting holes are arranged on the slots, and the rocker arm rod is inserted into the slots.
6. A quartz wafer etching cleaning device according to any one of claims 1 to 4, characterized in that: The rocker arm lifting structure comprises a lifting frame, a cylinder housing is fixed on the lifting frame, a rotating shaft is installed below the cylinder housing, the cylinder drives the lifting frame to move up and down, and a supporting seat is fixed on the lifting frame.
7. A quartz wafer etching cleaning device according to any one of claims 1 to 4, characterized in that: The rocker arm rotating structure comprises a rotating motor, and the rotating motor drives the rocker arm lifting structure to rotate through a belt.