Deposition apparatus

Abstract

The utility model relates to the technical field of photovoltaics and semiconductors, in particular to deposition equipment, and solves the problem that the deposition equipment cannot be used for coating the inner wall of a cavity. The deposition equipment is configured to perform film coating on the inner wall of a cavity, the inner wall is enclosed to form a cavity, and the cavity is provided with at least one opening communicating the cavity with the outside. The deposition equipment comprises at least one sealing piece, at least one target table and at least one laser emitting assembly. And the sealing element is used for sealing the opening, so that the cavity forms a closed cavity. The target table is used for bearing a target material and can be placed in the cavity. And the laser emitting assembly emits laser to the target material, so that the target material generates plasma plume, and the plasma plume can be deposited on the inner wall of the cavity so as to perform film coating on the inner wall of the cavity.

Description

Technical Field

[0001] This application relates to the fields of semiconductor and photovoltaic technologies, and particularly to a deposition device. Background Art

[0002] Semiconductor and photovoltaic materials usually need to be processed before they can be applied to products. The processing technologies of semiconductor and photovoltaic materials usually include chemical vapor deposition, oxidation, diffusion, etc. The above-mentioned technologies all need to send semiconductor and photovoltaic materials into a cavity and carry out the processes under specific temperature and pressure conditions. During the process, a relatively thick film layer, such as polycrystalline silicon, is likely to accumulate and deposit on the inner wall of the cavity. The film layers of some materials have a large difference in thermal expansion coefficient from the cavity, which can easily cause damage to the cavity. In order to avoid damage to the cavity, it is necessary to coat the inner wall of the cavity.

[0003] However, the deposition devices in related technologies can only coat substrates and cannot coat the inner wall of the cavity. Summary of the Utility Model

[0004] In view of this, an embodiment of this application provides a deposition device, which solves the problem that the deposition device cannot coat the inner wall of the cavity.

[0005] An embodiment of this application provides a deposition device configured to deposit a film layer on the inner wall of a cavity. The inner wall encloses a chamber, and the cavity has at least one opening communicating the chamber with the outside; wherein, the deposition device includes: at least one seal configured to seal the opening so that the chamber forms a sealed chamber; at least one target table configured to carry a target, and the target table can be placed into the chamber; at least one laser emission component configured to emit laser light to the target to generate a plasma plume, and the plasma plume can be deposited on the inner wall of the cavity.

[0006] In some embodiments, the chamber extends in a first direction; the deposition device further includes: a first driving component, a first end of the first driving component is disposed on one side of the seal, and a second end of the first driving component passes through the seal and extends into the chamber; wherein, at least one of the target tables is disposed on the first driving component and moves along the first direction under the drive of the first driving component.

[0007] In some embodiments, the chamber extends in a first direction, and the chamber has an axis along the first direction; the deposition apparatus further includes: a second driving assembly configured to be connected to the target table and drive the target table to rotate relative to the cavity about the axis of the cavity, or configured to be capable of being connected to the cavity and drive the cavity to rotate relative to the target table about the axis of the cavity; wherein, when the second driving assembly is configured to drive the target table to rotate relative to the cavity about the axis of the cavity, the deposition apparatus further includes: a third driving assembly connected to the laser emitting assembly and configured to drive the laser emitting assembly to rotate following the target table about the axis of the cavity.

[0008] In some embodiments, the deposition apparatus further includes: a fourth driving assembly connected to the target table and configured to drive the target table to rotate about its own axis.

[0009] In some embodiments, the target table includes: a target table body that can be placed in the chamber; at least one target holder rotatably connected to the target table body, the target holder being configured to carry the target material; wherein, the deposition apparatus further includes: a fifth driving assembly connected to the target holder and configured to drive the target holder to rotate about its own axis so that the target holder drives the target material to rotate about its own axis.

[0010] In some embodiments, the chamber extends in a first direction, and the chamber has an axis along the first direction; the deposition apparatus further includes: a second driving assembly disposed on the first driving assembly and connected to the target table, configured to drive the target table to rotate relative to the cavity about the axis of the cavity; a third driving assembly connected to the laser emitting assembly and configured to drive the laser emitting assembly to rotate following the target table about the axis of the cavity; a fourth driving assembly disposed on the second driving assembly such that the second driving assembly is connected to the target table through the fourth driving assembly, the fourth driving assembly being configured to drive the target table to rotate about its own axis; wherein, the target table includes: a target table body that can be placed in the chamber and is disposed on the fourth driving assembly; at least one target holder rotatably connected to the target table body, the target holder being configured to carry the target material; wherein, the deposition apparatus further includes: a fifth driving assembly disposed on the target table body and connected to the target holder, configured to drive the target holder to rotate about its own axis so that the target holder drives the target material to rotate about its own axis; wherein, the target table includes a plurality of the target holders such that the target table rotates about its own axis, and the plurality of target holders drive the target material to rotate about its own axis.

[0011] In some embodiments, the laser emitted by the laser emitting assembly irradiates one side of the target material facing the inner wall of the cavity, so that the plasma plume generated by the target material faces the inner wall of the cavity.

[0012] In some embodiments, the chamber extends in a first direction, and the chamber has an axis along the first direction; the number of the target tables is multiple; wherein, the multiple target tables are arranged at intervals along the first direction, and / or, the multiple target tables are arranged at intervals circumferentially around the axis of the chamber; wherein, the number of the laser emission components is multiple, and the multiple laser emission components are arranged in one-to-one correspondence with the multiple target tables.

[0013] In some embodiments, the material of the cavity is a transparent material, and the laser emitted by the laser emission component passes through the cavity and irradiates the target material; and / or, the seal has a transparent area, and the laser emitted by the laser emission component passes through the transparent area and irradiates the target material.

[0014] In some embodiments, the target material is in a sheet structure, and the target material has a first surface facing the inner wall of the cavity; when the laser emitted by the laser emission component passes through the cavity, the target material is parallel to the extension direction of the cavity, and the laser passing through the cavity is perpendicular or forms an acute angle with the inner wall of the cavity, so that the irradiation direction of the laser is perpendicular or forms an acute angle with the first surface.

[0015] In some embodiments, the target material is in a sheet structure, and the target material has a first surface facing the inner wall of the cavity, and at least one opening is located at at least one end of the chamber along the extension direction of the chamber; when the laser emitted by the laser emission component passes through the transparent area, the deposition device further includes: at least one galvanometer, arranged on the path of the laser emitted by the laser emission component irradiating the target material, configured to reflect the laser emitted by the laser emission component, so that the laser irradiates the first surface at a non-zero incident angle; and / or, at least one focusing lens, arranged on the path of the laser emitted by the laser emission component irradiating the target material, configured to focus the laser emitted by the laser emission component.

[0016] In some embodiments, the chamber extends in a first direction, and the chamber has an axis along the first direction, and multiple target tables are arranged at intervals circumferentially around the axis of the chamber; the deposition device includes multiple galvanometers, the multiple galvanometers are arranged at intervals circumferentially around the axis of the chamber, and the multiple galvanometers are arranged in one-to-one correspondence with the multiple target tables; wherein, the deposition device further includes: an adjustable galvanometer, arranged between the multiple galvanometers; a sixth driving component, connected to the adjustable galvanometer, configured to drive the galvanometer to rotate, so that the laser emitted by the laser emission component can irradiate any one of the galvanometers after passing through the adjustable galvanometer, and irradiate the target material corresponding to the galvanometer under the reflection of the galvanometer.

[0017] In some embodiments, the deposition device further includes: a vacuum chamber connected to the seal to form a vacuum chamber that can accommodate the chamber; wherein, the seal includes a transparent region, the laser emission component is disposed outside the vacuum chamber, and the laser emitted by the laser emission component sequentially passes through the transparent region and the opening and irradiates the target; or, the material of the chamber is a transparent material, the material of the vacuum chamber is a transparent material, and the laser emitted by the laser emission component sequentially passes through the vacuum chamber and the chamber and irradiates the target.

[0018] In some embodiments, the seal has an air extraction port through which the gas in the sealed chamber can be extracted to form a vacuum state in the sealed chamber; and / or, the seal has an air inlet through which external gas can enter the sealed chamber; wherein, the air extraction port is used to connect a vacuum pumping device, and the air inlet is used to connect an air inlet device.

[0019] The deposition device provided by the embodiments of the present application forms a sealed chamber by setting a seal between the seal and the chamber to be coated, then places the target in the sealed chamber, and irradiates the target with a laser emission component outside the chamber to realize coating the inner wall of the chamber. Description of the Drawings

[0020] By describing the embodiments of the present application in more detail in conjunction with the drawings, the above and other objects, features, and advantages of the present application will become more obvious. The drawings are used to provide a further understanding of the embodiments of the present application, and constitute a part of the specification. Together with the embodiments of the present application, they are used to explain the present application and do not constitute a limitation to the present application. In the drawings, the same reference numerals generally represent the same components or steps.

[0021] Figure 1 The figure shows a schematic diagram of the application scenario of the deposition device provided by an embodiment of the present application.

[0022] Figure 2 The figure shows a schematic diagram of the application scenario of the deposition device provided by another embodiment of the present application.

[0023] Figure 3 The figure shows a schematic diagram of the application scenario of the deposition device provided by another embodiment of the present application.

[0024] Figure 4 The figure shows a schematic diagram of the application scenario of the deposition device provided by another embodiment of the present application.

[0025] Figure 5 The figure shows a schematic diagram of the structure of the target stage and the target provided by an embodiment of the present application.

[0026] Figure 6The figure shows a schematic diagram of the application scenario of a deposition device provided by another embodiment of the present application.

[0027] Figure 7 As shown Figure 6 A partial enlarged view of the deposition device shown in the A area.

[0028] Figure 8 The figure shows a schematic diagram of the application scenario of a deposition device provided by another embodiment of the present application.

[0029] Figure 9 The figure shows a schematic diagram of the application scenario of a deposition device provided by another embodiment of the present application.

[0030] Figure 10 The figure shows a schematic diagram of the application scenario of a deposition device provided by another embodiment of the present application.

[0031] Figure 11 The figure shows a schematic diagram of the application scenario of a deposition device provided by another embodiment of the present application.

[0032] Figure 12 The figure shows a schematic diagram of the application scenario of a deposition device provided by another embodiment of the present application.

[0033] Figure 13 As shown Figure 12 A partial enlarged view of the deposition device shown in the B area.

[0034] Figure 14 The figure shows a schematic diagram of the application scenario of a deposition device provided by another embodiment of the present application.

[0035] Figure 15 The figure shows a schematic diagram of the application scenario of a deposition device provided by another embodiment of the present application.

[0036] Figure 16 The figure shows a schematic diagram of the application scenario of a deposition device provided by another embodiment of the present application.

[0037] Figure 17 The figure shows a schematic diagram of the application scenario of a deposition device provided by another embodiment of the present application.

[0038] Figure 18 The figure shows a schematic diagram of the application scenario of a deposition device provided by another embodiment of the present application.

[0039] Figure 19 The figure shows a schematic diagram of the application scenario of a deposition device provided by another embodiment of the present application.

[0040] Figure 20 The figure shows a schematic diagram of the structures of a vacuum chamber and a cavity provided by an embodiment of the present application.

[0041] Figure 21 The figure shows a schematic diagram of the application scenario of a deposition device provided by another embodiment of the present application.

[0042] Reference numerals:

[0043] 10. Deposition device; 100. Seal; 101. Transparent area; 111. Transparent window; 110. Air extraction port; 120. Air inlet; 200. Target table; 210. Target table body; 220. Target holder; 300. Laser emission component; 301. Laser; 400. First drive component; 401. First end of the first drive component; 402. Second end of the first drive component; 500. Second drive component; 600. Third drive component; 700. Fourth drive component; 800. Fifth drive component; 900. Galvanometer; 1000. Focusing lens; 1100. Adjustable galvanometer; 1200. Sixth drive component; 1300. Drive source; 1400. Vacuum cavity; 1401. Vacuum chamber; 2. Cavity; 21. Inner wall; 2001. Chamber; 2101. Axis of the chamber; 2011. Sealed chamber; 2002. Opening; 2100. Axis of the cavity; 3. Target; 3001. First surface; 31. Plasma plume; X1. First direction; 4. Vacuum pumping device; 5. Air inlet device. Detailed implementation manners

[0044] Next, the technical solutions in the embodiments of the present application will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present application without creative efforts shall fall within the protection scope of the present application.

[0045] Next, the specific structure of the deposition device will be described in conjunction with the embodiments.

[0046] Figure 1 The figure shows a schematic diagram of the application scenario of a deposition device provided by an embodiment of the present application. As Figure 1 shown, the deposition device 10 is configured to coat the inner wall 21 of the cavity 2. The inner wall 21 encloses to form a chamber 2001, and the cavity 2 has at least one opening 2002 communicating the chamber 2001 with the outside. The deposition device 10 includes at least one seal 100, at least one target table 200, and at least one laser emission component 300. The seal 100 is configured to seal the opening 2002 so that the chamber 2001 forms a sealed chamber 2011. The target table 200 is configured to carry the target 3, and the target table 200 can be placed into the chamber 2001. The laser emission component 300 is configured to emit a laser 301 towards the target 3, so that the target 3 generates a plasma plume 31, and the plasma plume 31 can be deposited on the inner wall 21 of the cavity 2.

[0047] The deposition device 10 forms a sealed chamber 2011 by providing a seal 100 between the seal 100 and the chamber 2 to be coated. Then, the target 3 is placed inside the sealed chamber 2011, and the target 3 is irradiated by a laser emission component 300 outside the chamber 2001 to coat the inner wall 21 of the chamber 2.

[0048] Exemplarily, the deposition device 10 has little limitation on the size of the chamber 2 to be coated in the extending direction of the chamber 2. Exemplarily, the deposition device 10 has certain limitations on the size of the opening 2002 of the chamber 2 to be coated, but the limitations are small as long as the seal 100 can seal the opening 2002. Additionally, if the opening 2002 of the chamber 2 is large, the inner wall 21 of the chamber 2 can be coated by replacing the seal 100 of the deposition device 10.

[0049] Exemplarily, the cross-sectional shape of the chamber 2 can be a rectangular ring, a circular ring, a polygonal ring, or a ring with other irregular shapes. Exemplarily, the material of the chamber 2 can be a transparent material, a non-transparent material, or a combination of a transparent material and a non-transparent material. Exemplarily, the seal 100 can be a sealing flange, a sealing cover, etc.

[0050] Exemplarily, the laser emission component 300 can be placed inside or outside the chamber 2001. Exemplarily, when the laser emission component 300 is placed outside the chamber 2001 and the material of the chamber 2 is a transparent material or the material of a partial area of the chamber 2 is a transparent material, the laser 301 emitted by the laser emission component 300 can pass through the transparent area of the chamber 2 and irradiate the target 3. Exemplarily, when the material of a partial area of the seal 100 is a transparent material, the laser 301 emitted by the laser emission component 300 can pass through the transparent area of the seal 100, enter the chamber 2001 through the opening 2002, and irradiate the target 3. Figure 1 As shown in the figure, the laser emission component 300 is placed outside the chamber 2001, and the laser 301 emitted by the laser emission component 300 can pass through the chamber 2 and irradiate the target 3.

[0051] Exemplarily, the chamber 2 has two openings 2002. The deposition device 10 includes two seals 100 and two second seals 200. One seal 100 seals one first opening 2002, and the second seals 200 are provided in one-to-one correspondence with the seals 100.

[0052] Exemplarily, the deposition apparatus 10 includes a target stage 200 and a laser emission assembly 300. The target stage 200 can be placed at different positions within the chamber 2001, and the laser emission assembly 300 can emit a laser 301 towards a target 3 carried by the target stage 200 located at different positions within the chamber 2001, so as to generate a plasma plume 31 from the target 3 located at different positions within the chamber 2001, and enable the plasma plumes 31 located at different positions within the chamber 2001 to be deposited on the inner walls 21 at different positions of the cavity 2, thereby achieving coating of all the inner walls 21 of the cavity 2.

[0053] Exemplarily, the material of the target 3 can be metal, metal oxide, ceramic, graphite, etc. The coating temperature and the material of the target 3 can be selected according to actual production requirements.

[0054] In some embodiments, as Figure 2 shown, the chamber 2001 extends along a first direction X1. The deposition apparatus 10 further includes a first driving assembly 400. A first end 401 of the first driving assembly is disposed on one side of the seal 100, and a second end 402 of the first driving assembly passes through the seal 100 and extends into the chamber 2001. At least one target stage 200 is disposed on the first driving assembly 400 and moves along the first direction X1 under the drive of the first driving assembly 400.

[0055] The deposition apparatus 10 uses the first driving assembly 400 to drive the target stage 200 to move along the first direction X1, so that the plasma plume 31 generated by the target 3 carried by the target stage 200 can be deposited on the inner wall 21 of the cavity 2 along the first direction X1, and can also improve the coating uniformity of the inner wall 21 of the cavity 2 extending along the first direction X1.

[0056] Exemplarily, the deposition apparatus 10 further includes a drive source 1300. The drive source 1300 is disposed outside the cavity 2 and is connected to the first end 401 of the first driving assembly to drive the first driving assembly 400 to move, so that the first driving assembly 400 drives the target stage 200 to move along the first direction X1. Exemplarily, the drive source 1300 can be a motor, a cylinder, or other structures capable of providing driving force.

[0057] In some embodiments, as Figure 3 shown, the chamber 2001 extends along the first direction X1, and the chamber 2001 has an axis along the first direction X1. The deposition apparatus 10 further includes a second driving assembly 500 and a third driving assembly 600. The second driving assembly 500 is configured to be connected to the target stage 200 and drive the target stage 200 to rotate relative to the cavity 2 about the axis 2100 of the cavity. The third driving assembly 600 is connected to the laser emission assembly 300 and is configured to drive the laser emission assembly 300 to rotate following the target stage 200 about the axis 2100 of the cavity.

[0058] The deposition apparatus 10 utilizes the second driving assembly 500 to drive the target stage 200 to rotate relative to the cavity 2 about the axis 2100 of the cavity, and utilizes the third driving assembly 600 to drive the laser emitting assembly 300 to rotate following the target stage 200 about the axis 2100 of the cavity, so that the laser 301 emitted by the laser emitting assembly 300 can always irradiate the target 3 carried by the target stage 200, and the plasma plume 31 generated by the target 3 can deposit on the inner wall 21 of the cavity 2 around the axis 2100 of the cavity. In other words, the plasma plume 31 generated by the target 3 can perform annular coating on the inner wall 21 of the cavity 2.

[0059] In some embodiments, the chamber 2001 extends along the first direction X1, and the chamber 2001 has an axis along the first direction X1. The deposition apparatus 10 further includes a second driving assembly 500, and the second driving assembly 500 is configured to be connectable to the cavity 2 and drive the cavity 2 to rotate relative to the target stage 200 about the axis 2100 of the cavity, so as to enable the plasma plume 31 carried by the target stage 200 to deposit on the inner wall 21 of the cavity 2 around the axis 2100 of the cavity. In other words, the plasma plume 31 generated by the target 3 can perform annular coating on the inner wall 21 of the cavity 2.

[0060] Exemplarily, the deposition apparatus 10 includes a target stage 200 and a laser emitting assembly 300. The target stage 200 can be placed at different positions inside the chamber 2001 along the first direction X1. When the cavity 2 rotates relative to the target stage 200 about the axis 2100 of the cavity, the plasma plumes 31 generated by the targets 3 at different positions inside the chamber 2001 can respectively perform annular coating on different positions of the inner wall 21 of the cavity 2, thereby realizing annular coating on the entire inner wall 21 of the cavity 2.

[0061] In some embodiments, as Figure 4 shown, the deposition apparatus 10 further includes a fourth driving assembly 700. The fourth driving assembly 700 is connected to the target stage 200 and is configured to drive the target stage 200 to rotate self - rotationally.

[0062] Exemplarily, the target stage 200 carries targets 3 of multiple materials. By driving the target stage 200 to rotate self - rotationally through the fourth driving assembly 700, the target stage 200 drives the targets 3 of multiple materials to rotate self - rotationally, so that the laser 301 emitted by the laser emitting assembly 300 can sequentially irradiate the targets 3 of different materials, so as to realize composite coating on the inner wall 21 of the cavity 2.

[0063] In some embodiments, as Figure 4 and Figure 5As shown, the target stage 200 includes a target stage main body 210 and at least one target holder 220. The target stage main body 210 can be placed in the chamber 2001. The target holder 220 is rotatably connected to the target stage main body 210, and the target holder 220 is configured to carry the target 3. The deposition device 10 further includes a fifth driving assembly 800. The fifth driving assembly 800 is connected to the target holder 220 and is configured to drive the target holder 220 to rotate self - sufficiently, so that the target holder 220 drives the target 3 to rotate self - sufficiently.

[0064] By driving the target holder 220 to rotate self - sufficiently through the fifth driving assembly 800, the target holder 220 drives the target 3 to rotate self - sufficiently, so that the laser 301 emitted by the laser emitting assembly 300 can irradiate different regions of the target 3, facilitating the uniform consumption of the target 3.

[0065] Exemplarily, the target stage main body 210 includes one target holder 220. The target holder 220 can successively carry targets 3 of the same material to achieve single - layer coating of the inner wall 21 of the cavity 2. Or, the target holder 220 can successively carry targets 3 of different materials to achieve composite coating of the inner wall 21 of the cavity 2.

[0066] When the laser 301 emitted by the laser emitting assembly 300 irradiates the target 3 carried by one of the plurality of target holders 220, the fifth driving assembly 800 drives the target holder 220 to rotate self - sufficiently, so that the target holder 220 drives the target 3 to rotate self - sufficiently, so that the laser 301 emitted by the laser emitting assembly 300 can irradiate different regions of the target 3, facilitating the uniform consumption of the target 3.

[0067] In some embodiments, as Figure 6 and Figure 7 shown, the chamber 2001 extends along the first direction X1, and the chamber 2001 has an axis along the first direction X1. The deposition device 10 further includes a second driving assembly 500, a third driving assembly 600, and a fourth driving assembly 700. The second driving assembly 500 is disposed on the first driving assembly 400 and is connected to the target stage 200, and is configured to drive the target stage 200 to rotate relative to the cavity around the axis 2100 of the cavity. The third driving assembly 600 is connected to the laser emitting assembly 300 and is configured to drive the laser emitting assembly 300 to rotate following the target stage 200 around the axis 2100 of the cavity. The fourth driving assembly 700 is disposed on the second driving assembly 500, so that the second driving assembly 500 is connected to the target stage 200 through the fourth driving assembly 700. The fourth driving assembly 700 is configured to drive the target stage 200 to rotate self - sufficiently.

[0068] The target stage 200 includes a target stage main body 210 and at least one target holder 220. The target stage main body 210 can be placed in the chamber 2001 and is provided with a fourth driving assembly 700. The target holder 220 is rotatably connected to the target stage main body 210 and is configured to carry the target 3. The deposition device 10 further includes a fifth driving assembly 800. The fifth driving assembly 800 is provided on the target stage main body 210, connected to the target holder 220, and is configured to drive the target holder 220 to rotate self - sufficiently, so that the target holder 220 drives the target 3 to rotate self - sufficiently. The target stage 200 includes a plurality of target holders 220 to enable the target stage 200 to rotate self - sufficiently, and the plurality of target holders 220 drive the target 3 to rotate self - sufficiently.

[0069] Exemplarily, the target stage main body 210 includes a plurality of target holders 220, and the plurality of target holders 220 respectively carry targets 3 of different materials. The fourth driving assembly 700 drives the target stage 200 to rotate self - sufficiently. The target stage 200 drives the plurality of target holders 220 to rotate, and the plurality of target holders 220 respectively drive the targets 3 they carry to rotate, so that the laser 301 emitted by the laser emission assembly 300 can irradiate the targets 3 of different materials carried by different target holders 220, to achieve composite coating of the inner wall 21 of the cavity 2. When the laser 301 emitted by the laser emission assembly 300 irradiates the target 3 carried by one of the plurality of target holders 220, the fifth driving assembly 800 drives the target holder 220 to rotate self - sufficiently, so that the target holder 220 drives the target 3 to rotate self - sufficiently, so that the laser 301 emitted by the laser emission assembly 300 towards the target 3 can irradiate different regions of the target 3, facilitating uniform consumption of the target 3.

[0070] In some embodiments, such as Figure 6 and Figure 7 shown, the laser 301 emitted by the laser emission assembly 300 irradiates the side of the target 3 facing the inner wall 21 of the cavity 2, so that the plasma plume 31 generated by the target 3 faces the inner wall 21 of the cavity 2, facilitating deposition of the plasma plume 31 on the inner wall 21 of the cavity 2.

[0071] In some embodiments, such as Figure 8 shown, the chamber 2001 extends along the first direction X1, and the chamber 2001 has an axis along the first direction X1. The number of target stages 200 is multiple, and the multiple target stages 200 are arranged at intervals along the first direction X1. The number of laser emission assemblies 300 is multiple, and the multiple laser emission assemblies 300 are arranged in one - to - one correspondence with the multiple target stages 200.

[0072] In some embodiments, the chamber 2001 extends along the first direction X1, and the chamber 2001 has an axis along the first direction X1. The number of target stages 200 is multiple, and the multiple target stages 200 are arranged at circumferential intervals around the axis 2101 of the chamber. The number of laser emission assemblies 300 is multiple, and the multiple laser emission assemblies 300 are arranged in one - to - one correspondence with the multiple target stages 200.

[0073] Exemplarily, as Figure 9 shown, the two target platforms 200 are circumferentially spaced around the axis 2101 of the chamber, and the number of laser emission assemblies 300 is two. The two laser emission assemblies 300 are arranged in one-to-one correspondence with the two target platforms 200.

[0074] In some embodiments, as Figure 10 shown, the chamber 2001 extends in the first direction X1, and the chamber 2001 has an axis in the first direction X1. The number of target platforms 200 is multiple, the multiple target platforms 200 are spaced along the first direction X1, and the multiple target platforms 200 are circumferentially spaced around the axis 2101 of the chamber.

[0075] The multiple target platforms 200 are used to carry multiple target materials 3, and the multiple laser emission assemblies 300 simultaneously emit lasers 301. The multiple lasers 301 simultaneously irradiate the target materials 3 carried by their respective corresponding target platforms 200, so that the multiple target materials 3 simultaneously generate plasma plumes 31, so as to simultaneously coat the inner walls 21 of different regions of the cavity 2, thereby improving the coating efficiency of the deposition device 10.

[0076] In some embodiments, the material of the cavity 2 is a transparent material, and the laser 301 emitted by the laser emission assembly 300 passes through the cavity 2 and irradiates the target material 3.

[0077] In some embodiments, the seal 100 is provided with a transparent region 101, and the laser 301 emitted by the laser emission assembly 300 passes through the transparent region 101 and irradiates the target material 3.

[0078] In some embodiments, the material of the cavity 2 is a transparent material, the laser 301 emitted by the laser emission assembly 300 passes through the cavity 2 and irradiates the target material 3, and the seal 100 is provided with a transparent region 101, and the laser 301 emitted by the laser emission assembly 300 passes through the transparent region 101 and irradiates the target material 3.

[0079] In some embodiments, as Figures 1 to 11 shown, the material of the cavity 2 is a transparent material, the target material 3 is in a sheet structure, the target material 3 has a first surface 3001 facing the inner wall 21 of the cavity 2, and the target material 3 is parallel to the extension direction of the cavity 2. The laser 301 emitted by the laser emission assembly 300 passes through the cavity 2 and irradiates the target material 3. The laser 301 passing through the cavity 2 is perpendicular or forms an acute angle with the inner wall 21 of the cavity 2, so that the irradiation direction of the laser 301 is perpendicular or forms an acute angle with the first surface 3001.

[0080] In the above irradiation method, the laser emission component 300 is relatively close to the target 3, and the laser 301 emitted by the laser emission component 300 can irradiate the target 3 quickly, so that the coating efficiency of the deposition device 10 is relatively high. Exemplarily, the material of the cavity 2 in this embodiment is quartz.

[0081] In some embodiments, the seal 100 is provided with a transparent region 101, and the laser 301 emitted by the laser emission component 300 passes through the transparent region 101 and irradiates the target 3. The deposition device 10 further includes at least one galvanometer 900. The galvanometer 900 is disposed on the path of the laser 301 emitted by the laser emission component 300 irradiating the target 3, and is configured to reflect the laser 301 emitted by the laser emission component 300, so that the laser 301 irradiates the first surface 3001 at a non-zero incident angle.

[0082] Exemplarily, the cavity 2 in this embodiment may be made of a non-transparent material. Exemplarily, the non-transparent material may be ceramic, graphite, etc. Exemplarily, the seal 100 includes a transparent window 111, and the transparent window 111 forms the transparent region 101. Exemplarily, the materials of the cavity 2 and the transparent window 111 in this embodiment are both quartz.

[0083] Since most of the cavities 2 in the current industry are made of quartz material, therefore, only local modification of the quartz cavity 2 is required. The cavity 2 is convenient to manufacture and has a low cost.

[0084] Exemplarily, as Figure 12 and Figure 13 shown, a target 3 is parallel to the extending direction of the cavity 2. The deposition device 10 includes two galvanometers 900. Both of the two galvanometers 900 are located on the side of the target stage 200 close to the laser emission component 300, and the setting directions of the two galvanometers 900 are both acute angles with the inner wall 21 of the cavity 2. The laser 301 emitted by one laser emission component 300 irradiates one galvanometer 900, and this galvanometer 900 reflects the laser 301 so that the laser 301 irradiates another galvanometer 900, and this another galvanometer 900 reflects the laser 301 so that the laser 301 irradiates the first surface 3001 of the target 3.

[0085] In addition, the target stage 200 and the galvanometer 900 are both disposed on the first driving component 400 and move along the first direction X1 under the drive of the first driving component 400, and the target stage 200 and the galvanometer 900 can rotate relative to the cavity 2 around the axis 2100 of the cavity, and the laser emission component 300 can follow the target stage 200 to rotate around the axis 2100 of the cavity to realize coating of the entire inner wall 21 of the cavity 2.

[0086] Exemplarily, as Figure 14As shown in the figure, two target platforms 200 are circumferentially spaced around the axis 2101 of the chamber. The number of laser emission components 300 is two, and the number of galvanometers 900 is four. The two laser emission components 300 are arranged in one-to-one correspondence with the two target platforms 200. The two galvanometers 900 are arranged corresponding to one laser emission component 300 and one target platform 200. The galvanometer 900 is located on the side of the corresponding target platform 200 close to the corresponding laser emission component 300. That is, the two sets of laser emission components 300, galvanometers 900, and target platforms 200 are symmetrically arranged with respect to the axis 2101 of the chamber. The seal 100 is provided with two transparent regions 101, and the laser 301 emitted by the two laser emission components 300 respectively passes through the two transparent regions 101.

[0087] In addition, the two target platforms 200 and the four galvanometers 900 are both arranged on the first driving component 400 and move along the first direction X1 under the drive of the first driving component 400 to coat the entire inner wall 21 of the cavity 2.

[0088] Exemplarily, as Figure 15 shown in the figure, the setting direction of the target 3 forms an acute angle with the inner wall 21 of the cavity 2. The deposition device 10 includes one galvanometer 900 and one target platform 200. The galvanometer 900 is located on the side of the target platform 200 away from the laser emission component 300, and the setting direction of the galvanometer 900 forms an acute angle with the inner wall 21 of the cavity 2. The laser 301 emitted by the laser emission component 300 irradiates on the galvanometer 900, and the galvanometer 900 reflects the laser 301 so that the laser 301 irradiates on the target 3.

[0089] In addition, the target platform 200 and the galvanometer 900 are both arranged on the first driving component 400 and move along the first direction X1 under the drive of the first driving component 400. Moreover, the target platform 200 and the galvanometer 900 can rotate relative to the cavity 2 around the axis 2100 of the cavity, and the laser emission component 300 can follow the target platform 200 to rotate around the axis 2100 of the cavity to coat the entire inner wall 21 of the cavity 2.

[0090] Exemplarily, as Figure 16 shown in the figure, two target platforms 200 are circumferentially spaced around the axis 2101 of the chamber. The number of laser emission components 300 is two, and the number of galvanometers 900 is two. The two laser emission components 300 are arranged in one-to-one correspondence with the two target platforms 200. The two galvanometers 900 are arranged corresponding to the two laser emission components 300 and the two target platforms 200. The galvanometer 900 is located on the side of the corresponding target platform 200 away from the corresponding laser emission component 300. That is, the two sets of laser emission components 300, galvanometers 900, and target platforms 200 are symmetrically arranged with respect to the axis 2101 of the chamber. The seal 100 is provided with two transparent regions 101, and the laser 301 emitted by the two laser emission components 300 respectively passes through the two transparent regions 101.

[0091] In addition, two target platforms 200 and two galvanometric mirrors 900 are both arranged on the first driving component 400 and move along the first direction X1 under the drive of the first driving component 400 to coat the entire inner wall 21 of the cavity 2.

[0092] In some embodiments, the seal 100 is provided with a transparent area 101, and the laser 301 emitted by the laser emitting component 300 passes through the transparent area 101 and irradiates the target 3. The deposition device 10 further includes at least one focusing mirror 1000, which is arranged on the path where the laser 301 emitted by the laser emitting component 300 irradiates the target 3 and is configured to focus the laser 301 emitted by the laser emitting component 300.

[0093] Exemplarily, the cavity 2 in this embodiment can be made of a non-transparent material. Exemplarily, the non-transparent material can be ceramics, graphite, etc. Exemplarily, the seal 100 includes a transparent window 111, and the transparent window 111 forms the transparent area 101. Exemplarily, the materials of the cavity 2 and the transparent window 111 in this embodiment are both quartz.

[0094] Exemplarily, as Figure 17 shown, the deposition device 10 includes one focusing mirror 1000 and one target platform 200. The focusing mirror 1000 is located on the side of the target platform 200 close to the laser emitting component 300, and the setting direction of the target 3 forms an acute angle with the inner wall 21 of the cavity 2. The laser 301 emitted by the laser emitting component 300 irradiates the focusing mirror 1000, and the focusing mirror 1000 focuses the laser 301. After focusing, the laser 301 irradiates the target 3.

[0095] In addition, both the target platform 200 and the focusing mirror 1000 are arranged on the first driving component 400 and move along the first direction X1 under the drive of the first driving component 400. Moreover, the target platform 200 and the focusing mirror 1000 can rotate relative to the cavity 2 around the axis 2100 of the cavity, and the laser emitting component 300 can follow the target platform 200 to rotate around the axis 2100 of the cavity to coat the entire inner wall 21 of the cavity 2.

[0096] Or, both the target platform 200 and the focusing mirror 1000 are arranged on the first driving component 400 and move along the first direction X1 under the drive of the first driving component 400. Moreover, the cavity 2 can rotate relative to the target platform 200 and the focusing mirror 1000 around the axis 2100 of the cavity to coat the entire inner wall 21 of the cavity 2.

[0097] Exemplarily, as Figure 18As shown, two target platforms 200 are circumferentially spaced around the axis 2101 of the chamber. The number of laser emission assemblies 300 is two, and the number of focusing lenses 1000 is two. The two laser emission assemblies 300 are arranged in one-to-one correspondence with the two target platforms 200. The two focusing lenses 1000 are arranged corresponding to the two laser emission assemblies 300 and the two target platforms 200. The focusing lens 1000 is located on the side of the corresponding target platform 200 close to the corresponding laser emission assembly 300. That is, the two sets of laser emission assemblies 300, focusing lenses 1000, and target platforms 200 are symmetrically arranged with respect to the axis 2101 of the chamber. The seal 100 is provided with two transparent regions 101, and the laser 301 emitted by the two laser emission assemblies 300 respectively passes through the two transparent regions 101.

[0098] In addition, the two target platforms 200 and the two focusing lenses 1000 are both arranged on the first driving assembly 400 and move along the first direction X1 under the drive of the first driving assembly 400 to coat the entire inner wall 21 of the cavity 2.

[0099] In some embodiments, the seal 100 is provided with a transparent region 101. The laser 301 emitted by the laser emission assembly 300 passes through the transparent region 101 and irradiates the target 3. The deposition device 10 further includes at least one galvanometer 900 and at least one focusing lens 1000. The galvanometer 900 and the focusing lens 1000 are both arranged on the path of the laser 301 emitted by the laser emission assembly 300 irradiating the target 3. The focusing lens 1000 is configured to focus the laser 301 emitted by the laser emission assembly 300. The galvanometer 900 is configured to reflect the laser 301 emitted by the laser emission assembly 300 so that the laser 301 irradiates the first surface 3001 at a non-zero incident angle.

[0100] In some embodiments, the chamber 2001 extends along the first direction X1, and the chamber 2001 has an axis along the first direction X1. A plurality of target platforms 200 are circumferentially spaced around the axis 2101 of the chamber. The deposition device 10 includes a plurality of galvanometers 900, and the plurality of galvanometers 900 are circumferentially spaced around the axis 2101 of the chamber. The plurality of galvanometers 900 are arranged in one-to-one correspondence with the plurality of target platforms 200. The deposition device 10 further includes an adjustable galvanometer 1100 and a sixth driving assembly 1200. The adjustable galvanometer 1100 is arranged between the plurality of galvanometers 900. The sixth driving assembly 1200 is connected to the adjustable galvanometer 1100 and is configured to drive the galvanometer 900 to rotate so that the laser 301 emitted by the laser emission assembly 300 can irradiate any one of the galvanometers 900 after passing through the adjustable galvanometer 1100 and irradiate the target 3 corresponding to the galvanometer 900 under the reflection of the galvanometer 900.

[0101] Exemplarily, as Figure 19As shown, two target platforms 200 are circumferentially spaced around the axis 2101 of the chamber. The deposition device 10 includes two galvanometers 900, two focusing lenses 1000, an adjustable galvanometer 1100, and a laser emission assembly 300. The two galvanometers 900 are arranged in one-to-one correspondence with the two target platforms 200 and the two laser emission assemblies 300. The two galvanometers 900 are arranged outside the chamber 2001, close to the first opening 2002, and are located between the laser emission assembly 300 and the cavity 2. The two focusing lenses 1000 are arranged inside the chamber 2001, and are both located on the side of the corresponding target platform 200 close to the laser emission assembly 300. The two sets of galvanometers 900, focusing lenses 1000, and target platforms 200 are symmetrically arranged with respect to the axis 2101 of the chamber. The adjustable galvanometer 1100 is arranged between the two galvanometers 900. The laser 301 emitted by the laser emission assembly 300 can irradiate one of the galvanometers 900 after passing through the adjustable galvanometer 1100. The galvanometer 900 reflects the laser 301. The reflected laser 301 irradiates the corresponding focusing lens 1000 after passing through the transparent region 101 of the seal 100. The focusing lens 1000 focuses the laser 301. The focused laser 301 irradiates the target material 3 carried by the corresponding target platform 200.

[0102] In addition, the two target platforms 200 and the two focusing lenses 1000 are both arranged on the first driving assembly 400, and move along the first direction X1 under the drive of the first driving assembly 400 to coat the entire inner wall 21 of the cavity 2.

[0103] In some embodiments, as Figure 20 and Figure 21 shown, the deposition device 10 further includes a vacuum chamber 1400. The vacuum chamber 1400 is connected to the seal 100 to form a vacuum chamber 1401, and the vacuum chamber 1401 can accommodate the cavity 2. The seal 100 includes a transparent region 101. The laser emission assembly 300 is arranged outside the vacuum chamber 1401. The laser 301 emitted by the laser emission assembly 300 sequentially passes through the transparent region 101 and the opening 2002, and irradiates the target material 3.

[0104] In some embodiments, the material of the cavity 2 is a transparent material, the material of the vacuum chamber 1400 is a transparent material, and the laser 301 emitted by the laser emission assembly 300 sequentially passes through the vacuum chamber 1400 and the cavity 2, and irradiates the target material 3.

[0105] In some embodiments, the seal 100 has an air extraction port 110. The gas in the sealed chamber 2011 can be extracted through the air extraction port 110 to form a vacuum state in the sealed chamber 2011. The air extraction port 110 is used to connect the vacuum pumping device 4.

[0106] In some embodiments, the seal 100 has an air inlet 120 through which external gas can enter the sealed chamber 2011, and the air inlet 120 is used to connect to an air intake device 5.

[0107] In some embodiments, as Figure 21 shown, the seal 100 has an air extraction port 110 and an air inlet 120. The gas in the sealed chamber 2011 can be extracted through the air extraction port 110 to create a vacuum state in the sealed chamber 2011, and the air extraction port 110 is used to connect to a vacuum pumping device 4. External gas can enter the sealed chamber 2011 through the air inlet 120, and the air inlet 120 is used to connect to an air intake device 5.

[0108] Exemplarily, the gas can be an inert gas, and the inert gas can be helium, nitrogen, etc. The type of inert gas can be selected according to actual production needs.

[0109] In the embodiments of the present application, if not clearly defined, the connection form can be a detachable connection by means of bolts and nuts, screws, buckles, magnetic attraction, etc. In some connections, if there is no special requirement for the form of detachable cooperation, an irreversible connection can be made by means of welding, bonding, etc.

[0110] The basic principles of the present application have been described above in conjunction with specific embodiments. However, it should be noted that the advantages, advantages, effects, etc. mentioned in the present application are only examples and not limitations, and it cannot be considered that these advantages, advantages, effects, etc. are essential for each embodiment of the present application. In addition, the above-disclosed specific details are only for the purposes of illustration and easy understanding, rather than limitations, and the above details do not limit the present application to necessarily adopt the above specific details to be implemented.

[0111] The block diagrams of the devices, apparatuses, equipment, and systems involved in the present application are only illustrative examples and do not intend to require or imply that they must be connected, arranged, and configured in the manner shown in the block diagrams. As those skilled in the art will recognize, these devices, apparatuses, equipment, and systems can be connected, arranged, and configured in any manner. Words such as "including", "comprising", "having", etc. are open-ended words meaning "including but not limited to", and can be used interchangeably with each other. The words "or" and "and" used herein refer to the word "and / or" and can be used interchangeably with each other unless the context clearly indicates otherwise. The word "such as" used herein refers to the phrase "such as but not limited to" and can be used interchangeably with each other.

[0112] It should also be noted that in the devices, equipment, and methods of the present application, each component or each step can be decomposed and / or recombined. These decompositions and / or recombinations should be regarded as equivalent solutions of the present application.

[0113] The above description of the disclosed aspects enables any person skilled in the art to make or use this application. Various modifications to these aspects will be readily apparent to those skilled in the art, and the general principles defined herein can be applied to other aspects without departing from the scope of this application. Therefore, this application is not intended to be limited to the aspects shown herein, but rather to the broadest scope consistent with the principles and novel features disclosed herein.

[0114] The above description has been presented for purposes of illustration and description. In addition, this description is not intended to limit the embodiments of this application to the forms disclosed herein. Although multiple example aspects and embodiments have been discussed above, those skilled in the art will recognize certain variations, modifications, alterations, additions, and subcombinations thereof.

Claims

1. A deposition device, characterized in that: The device is configured to deposit a film layer on the inner wall of a cavity, wherein the inner wall encloses a cavity, and the cavity has at least one opening connecting the cavity with the outside; Wherein, the deposition equipment comprises: at least one seal configured to seal the opening so that the chamber forms a closed chamber; at least one target table, configured to carry a target material, the target table being capable of being placed in the chamber; At least one laser emitting assembly is configured to emit a laser toward the target material, so that the target material generates a plasma plume, and the plasma plume can be deposited on the inner wall of the cavity.

2. The deposition device according to claim 1, characterized in that: The chamber extends along a first direction; The deposition device also includes: a first drive assembly, wherein a first end of the first drive assembly is disposed on one side of the sealing member, and a second end of the first drive assembly passes through the sealing member and extends into the chamber; Wherein, at least one of the target platforms is disposed on the first driving component and moves along the first direction under the drive of the first driving component.

3. The deposition device according to claim 1, characterized in that: The chamber extends along a first direction, and the chamber has an axis along the first direction; The deposition device also includes: a second driving assembly, configured to be connected to the target stage and drive the target stage to rotate relative to the cavity around the axis of the cavity, or configured to be able to be connected to the cavity and drive the cavity to rotate relative to the target stage around the axis of the cavity; Wherein, when the second driving assembly is configured to drive the target table to rotate relative to the cavity around the axis of the cavity, the deposition device further includes: The third driving assembly is connected to the laser emitting assembly and is configured to drive the laser emitting assembly to rotate around the axis of the cavity following the target platform.

4. The deposition device according to claim 1, characterized in that: The deposition device also includes: The fourth driving assembly is connected to the target platform and is configured to drive the target platform to rotate.

5. The deposition device according to claim 1, characterized in that: The target station comprises: A target stage body, which can be placed in the chamber; At least one target holder, rotatably connected to the target stage body, the target holder being configured to carry the target material; Wherein, the deposition equipment further comprises: The fifth driving assembly is connected to the target holder and is configured to drive the target holder to rotate, so that the target holder drives the target material to rotate.

6. The deposition device according to claim 2, characterized in that: The chamber extends along a first direction, and the chamber has an axis along the first direction; The deposition device also includes: A second driving assembly, disposed on the first driving assembly and connected to the target stage, configured to drive the target stage to rotate relative to the cavity around the axis of the cavity; A third driving assembly is connected to the laser emitting assembly and is configured to drive the laser emitting assembly to rotate around the axis of the cavity following the target stage; A fourth driving assembly, disposed on the second driving assembly, so that the second driving assembly is connected to the target platform through the fourth driving assembly, and the fourth driving assembly is configured to drive the target platform to rotate; Wherein, the target platform comprises: A target stage body, which can be placed in the chamber and is arranged on the fourth driving assembly; At least one target holder, rotatably connected to the target stage body, the target holder being configured to carry the target material; Wherein, the deposition equipment further comprises: A fifth driving assembly is disposed on the target stage body, connected to the target holder, and configured to drive the target holder to rotate, so that the target holder drives the target material to rotate; Wherein, the target stage includes a plurality of target holders, so that the target stage can rotate, and the plurality of target holders drive the target material to rotate.

7. The deposition device according to claim 1, characterized in that: The laser emitted by the laser emitting assembly irradiates the side of the target material facing the inner wall of the cavity, so that the plasma plume generated by the target material faces the inner wall of the cavity.

8. The deposition device according to claim 1, characterized in that: The chamber extends along a first direction, and the chamber has an axis along the first direction; The number of the target platforms is multiple; Wherein, the plurality of target platforms are arranged at intervals along the first direction, and / or the plurality of target platforms are arranged at intervals circumferentially around the axis of the chamber; There are multiple laser emitting components, and the multiple laser emitting components are arranged in one-to-one correspondence with the multiple target platforms.

9. The deposition device according to any one of claims 1 to 8, characterized in that: The cavity is made of a transparent material, and the laser emitted by the laser emitting assembly passes through the cavity and irradiates the target material; And / or, the sealing member is provided with a transparent area, and the laser emitted by the laser emitting assembly passes through the transparent area and irradiates the target material.

10. The deposition device according to claim 9, characterized in that The target material is a sheet-like structure, and the target material has a first surface facing the inner wall of the cavity; When the laser emitted by the laser emitting assembly passes through the cavity, the target material is parallel to the extension direction of the cavity, and the laser passing through the cavity is perpendicular or at an acute angle to the inner wall of the cavity, so that the irradiation direction of the laser is perpendicular or at an acute angle to the first surface.

11. The deposition device according to claim 9, characterized in that The target material is a sheet-like structure, and the target material has a first surface facing the inner wall of the cavity, and at least one of the openings is located at at least one end of the cavity along the extension direction of the cavity; In the case where the laser emitted by the laser emitting assembly passes through the transparent area, the deposition device further comprises: at least one galvanometer, disposed on a path where the laser light emitted by the laser emitting assembly irradiates the target material, and configured to reflect the laser light emitted by the laser emitting assembly so that the laser light irradiates the first surface at a non-zero incident angle; And / or, at least one focusing mirror is disposed on a path where the laser light emitted by the laser emitting assembly irradiates the target material, and is configured to focus the laser light emitted by the laser emitting assembly.

12. The deposition device according to claim 11, characterized in that The chamber extends along a first direction, and the chamber has an axis along the first direction, and a plurality of target stages are arranged at intervals around the circumference of the axis of the chamber; The deposition device comprises a plurality of the galvanometers, the plurality of the galvanometers are arranged at intervals around the circumference of the axis of the chamber, and the plurality of the galvanometers are arranged in one-to-one correspondence with the plurality of the target stages; Wherein, the deposition equipment further comprises: An adjustable galvanometer is arranged between the plurality of galvanometers; The sixth driving component is connected to the adjustable galvanometer and is configured to drive the galvanometer to rotate so that the laser emitted by the laser emitting component can irradiate any one of the galvanometers after passing through the adjustable galvanometer, and irradiate the target material corresponding to the galvanometer under the reflection of the galvanometer.

13. The deposition device according to any one of claims 1 to 8, characterized in that: Also includes: A vacuum cavity body connected to the sealing member to form a vacuum chamber, wherein the vacuum chamber can accommodate the cavity body; Wherein, the sealing member includes a transparent area, the laser emitting assembly is arranged outside the vacuum chamber, and the laser emitted by the laser emitting assembly passes through the transparent area and the opening in sequence and irradiates the target material; or, the material of the cavity is a transparent material, the material of the vacuum cavity is a transparent material, and the laser emitted by the laser emitting assembly passes through the vacuum cavity and the cavity in sequence and irradiates the target material.

14. The deposition device according to any one of claims 1 to 8, characterized in that: The sealing member has an air extraction port, through which the gas in the sealed chamber can be extracted to form a vacuum state in the sealed chamber; And / or, the sealing member has an air inlet, and external gas can enter the closed chamber through the air inlet; The air suction port is used to connect to a vacuum pumping device, and the air inlet is used to connect to an air intake device.

Images