Chemical vapor deposition equipment

Abstract

The utility model discloses chemical vapor deposition equipment. The chemical vapor deposition equipment comprises a cavity, a heating disc, a driving device and a spraying head, the heating disc comprises a disc, a hollow shaft, a heating pipe and a temperature sensor; a slip ring assembly is arranged on the outer wall of the hollow shaft, and a positive wire and a negative wire of the heating pipe penetrate through the bottom opening of the hollow shaft and then are connected with the slip ring assembly. The slip ring assembly comprises an insulating shaft sleeve, a positive slip ring, an insulating spacer bush, a negative slip ring and an insulating sleeve which coaxially sleeve the hollow shaft; the insulating shaft sleeve is fixedly connected with the hollow shaft; the positive slip ring, the insulating spacer bush and the negative slip ring are coaxially sleeved on the insulating shaft sleeve in sequence, and are fixedly connected with the insulating shaft sleeve; the insulating sleeve penetrates through the cathode slip ring along the axis direction of the insulating shaft sleeve, the anode wire sequentially penetrates through the insulating sleeve and the insulating spacer bush and then is connected with the anode slip ring, and the cathode wire is connected with the cathode slip ring. The utility model solves the technical problem that when the heating disc rotates dynamically, the wire is easy to wind to influence the power supply of the circuit.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor equipment, in particular to a chemical vapor deposition equipment. Background Art

[0002] Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) are technologies widely used in the semiconductor industry for thin film deposition. For example, CVD equipment includes a reaction chamber and a wafer heating plate. When two or more gaseous raw materials are introduced into the reaction chamber, the gaseous raw materials react chemically with each other to form a new material and deposit on the surface of the heated base wafer to form a deposited film. The process of vapor deposition coating is complex and diverse, and various factors will affect the uniformity of the coating thickness during coating.

[0003] The wafer heating plate of the existing vapor deposition equipment is embedded with a heating tube, and a heating wire is arranged in the heating tube. The heating circuit makes the heating wire heat up and heats the wafer to a high temperature through the heating tube and the heating plate to accelerate the reaction. In order to meet higher coating process requirements, the existing heating plate adopts a lifting and reciprocating rotation method. Since the heating tube needs to be powered, the wire will be entangled when the heating plate rotates, which limits the rotation angle of the heating plate and leads to poor adjustment ability of the heating plate. Therefore, it is necessary to design a vapor deposition device that can realize 360° rotation of the heating plate. Utility Model Content

[0004] The utility model provides a chemical vapor deposition device to solve the technical problem that the heating disk of the existing chemical vapor deposition device is easy to cause the wire to be entangled during dynamic rotation, thereby affecting the power supply of the circuit.

[0005] In order to achieve the above purpose, the technical solution of the utility model is:

[0006] A chemical vapor deposition device comprises: a cavity, a heating plate, a driving device and a shower head; the heating plate is used to carry and heat a wafer placed in the cavity, and the heating plate comprises: a disc, a hollow shaft, a heating tube and a temperature sensor; a slip ring assembly is arranged on the outer wall of the hollow shaft, and the positive and negative wires of the heating tube are connected to the slip ring assembly after passing through the bottom opening of the hollow shaft.

[0007] The slip ring assembly comprises: an insulating sleeve, a positive slip ring, an insulating spacer, a negative slip ring and an insulating sleeve which are coaxially sleeved on a hollow shaft; the insulating sleeve is fixedly connected to the hollow shaft; the positive slip ring, the insulating spacer and the negative slip ring are coaxially sleeved on the insulating sleeve in sequence, and the positive slip ring, the insulating spacer and the negative slip ring are all fixedly connected to the insulating sleeve; the insulating sleeve passes through the negative slip ring along the axial direction of the insulating sleeve, the positive wire of the heating tube passes through the insulating sleeve and the insulating spacer in sequence and is connected to the positive slip ring, and the negative wire of the heating tube is connected to the negative slip ring.

[0008] The driving device drives the hollow shaft to rotate; the spray head is used to introduce process gas into the cavity.

[0009] Furthermore, the positive electrode wire of the heating tube is electrically connected to the positive slip ring through the positive connecting electrode; a first through hole coaxial with the insulating sleeve is opened on the insulating sleeve, one end of the positive connecting electrode is connected to the positive slip ring, and the other end passes through the first through hole and the insulating sleeve in sequence and is electrically connected to the positive electrode wire of the heating tube.

[0010] Furthermore, the aperture of the first through hole is equal to the inner aperture of the insulating sleeve, a first blind hole is opened at one end of the insulating spacer toward the negative electrode slip ring, the first blind hole is coaxial with the first through hole, the aperture of the first blind hole is equal to the outer diameter of the insulating sleeve, and the end of the insulating sleeve passes through the negative electrode slip ring and is inserted into the first blind hole.

[0011] Furthermore, the hollow shaft includes a first shaft section and a second shaft section from top to bottom, and the diameter of the second shaft section is smaller than the diameter of the first shaft section; the insulating sleeve is a T-shaped sleeve, the large diameter end of the insulating sleeve abuts against the end face of the first shaft section, and the small diameter end is pressed by an insulating pressure ring, and the insulating pressure ring is detachably fixedly connected to the second shaft section.

[0012] Furthermore, the outer diameters of the insulating sleeve, positive slip ring, insulating spacer, negative slip ring and insulating pressure ring are all equal to the diameter of the first shaft section; the positive wire of the heating tube passes through the insulating pressure ring and then into the insulating sleeve, and the negative wire of the heating tube passes through the insulating pressure ring and is connected to the negative slip ring.

[0013] Furthermore, the negative electrode wire of the heating tube is electrically connected to the negative electrode slip ring through the negative electrode connecting electrode; a second through hole along the axial direction of the insulating sleeve is opened on the insulating pressure ring, one end of the negative electrode connecting electrode is connected to the negative electrode slip ring, and the other end passes through the second through hole and is electrically connected to the negative electrode wire of the heating tube.

[0014] Furthermore, the heating tube includes an inner ring, a middle ring and an outer ring which are concentrically arranged and have successively increasing radii.

[0015] The inner ring is provided with a first notch to form an inner arc-shaped pipe section, and the symmetry plane of the inner arc-shaped pipe section along the vertical direction is a reference symmetry plane.

[0016] A second notch and a third notch are provided on the middle circle, which are opposite to each other. The second notch corresponds to the first notch. The second notch and the third notch divide the middle circle into two middle arc tube sections that are symmetrical about the reference symmetry plane. The end of the middle arc tube section facing the second notch is the first connecting end, and the end facing the third notch is the second connecting end.

[0017] A fourth notch and a fifth notch are provided on the outer ring, which are opposite to each other. The fourth notch corresponds to the second notch. The fourth notch and the fifth notch divide the outer ring into two outer arc-shaped tube sections symmetrical about the reference symmetry plane. The end of the outer arc-shaped tube section facing the fourth notch is the third connecting end, and the end facing the fifth notch is the fourth connecting end.

[0018] One end of the inner arc pipe segment is connected to the first connecting end of the adjacent middle arc pipe segment through the first transition pipe segment, the second connecting end is connected to the fourth connecting end of the adjacent outer arc pipe segment through the second transition pipe segment, and the third connecting end is connected to the straight pipe segment through the third transition pipe segment. The straight pipe segment passes through the first notch and the second notch and extends to the inner circle of the inner arc pipe segment.

[0019] The straight pipe section includes a heating section and a cold section in sequence, and the cold section is far away from the third transition pipe section.

[0020] The first transition pipe section, the second transition pipe section and the third transition pipe section are all arc-shaped.

[0021] Furthermore, the first transition pipe section is located in the area sandwiched by the straight pipe section and the outer arc-shaped pipe section.

[0022] Furthermore, the distance between the middle arc-shaped pipe segment and the inner arc-shaped pipe segment is greater than the radius of the inner arc-shaped pipe segment, and the distance between the outer arc-shaped pipe segment and the middle arc-shaped pipe segment is equal to the radius of the inner arc-shaped pipe segment.

[0023] Furthermore, the first notch and the second notch both correspond to a first central angle, the third notch and the fifth notch both correspond to a second central angle, and the first central angle is greater than the second central angle.

[0024] Beneficial effects:

[0025] A chemical vapor deposition device disclosed in the present application can respectively contact the stator part for external power supply through the positive slip ring and the negative slip ring of the slip ring assembly, so that the positive wire and the negative wire of the heating tube can rotate with the heating plate, thereby avoiding the situation that the positive wire and the negative wire of the heating tube are entangled after being connected to the external power supply line and rotating; thereby solving the technical problem in the prior art that the heating plate is prone to cause the wire to be entangled during dynamic rotation and affect the power supply of the circuit; thereby realizing 360° rotation of the heating plate, improving the adjustment ability of the heating plate, and ensuring uniform deposition of the wafer in the cavity. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0027] Figure 1 It is a structural schematic diagram of a chemical vapor deposition device disclosed in the utility model;

[0028] Figure 2 This is a front view of a heating tube structure of a chemical vapor deposition device disclosed in the utility model;

[0029] Figure 3 It is a top view of a heating tube structure of a chemical vapor deposition device disclosed in the utility model;

[0030] Figure 4 A heat generation power simulation diagram of a heating tube structure of a chemical vapor deposition device disclosed in the utility model;

[0031] Figure 5 A temperature test diagram of a heating test of a heating tube structure of a chemical vapor deposition device disclosed in the utility model;

[0032] Figure 6 It is a structural schematic diagram of a heating plate of a chemical vapor deposition device disclosed in the utility model;

[0033] Figure 7 for Figure 6 A partial enlarged view of middle A.

[0034] 1. Cavity; 11. Chamber; 12. Cavity cover; 13. Inlet; 14. Partition; 15. Air extraction port;

[0035] 2. Heating plate; 21. Round plate; 22. Hollow shaft;

[0036] 23, heating pipe; 231, inner arc-shaped pipe section; 232, middle arc-shaped pipe section; 2321, first connection end; 2322, second connection end; 233, outer arc-shaped pipe section; 2331, third connection end; 2332, fourth connection end; 234, first transition pipe section; 235, second transition pipe section; 236, third transition pipe section; 237, straight pipe section; 2371, heating section; 2372, cooling section; 238, fourth transition pipe section; 239, vertical pipe section;

[0037] 24. Temperature sensor; 251. Insulating sleeve; 252. Positive slip ring; 253. Insulating spacer; 254. Negative slip ring; 255. Insulating sleeve; 256. Positive connecting electrode; 257. Negative connecting electrode; 26. Insulating pressure ring; 27. Protective cover;

[0038] 3. Driving device; 4. Sprinkler head; 51. Ejector; 52. Supporting ring; 53. Lifter; 61. First shielding air distribution plate; 62. Second shielding air distribution plate. DETAILED DESCRIPTION

[0039] In order to make the purpose, technical solution and advantages of the embodiment of the utility model clearer, the technical solution in the embodiment of the utility model will be clearly and completely described below in conjunction with the drawings in the embodiment of the utility model. Obviously, the described embodiment is a part of the embodiment of the utility model, not all of the embodiments. Based on the embodiment of the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0040] A chemical vapor deposition device, combined with Figure 1 , Figure 2 , Figure 3 , Figure 4 and Figure 5 As shown, it includes: a cavity 1, a heating plate 2, a driving device 3 and a shower head 4. The heating plate 2 is used to carry and heat the wafer placed in the cavity 1. The heating plate 2 includes a heating tube 23. The heating tube 23 includes an inner ring, a middle ring and an outer ring which are concentrically arranged and have increasing radii. The inner ring, the middle ring and the outer ring are evenly distributed in the heating plate 2.

[0041] The inner ring is provided with a first notch to form an inner arc-shaped tube section 231 , and the symmetry plane of the inner arc-shaped tube section 231 along the vertical direction is a reference symmetry plane.

[0042] A second notch and a third notch are provided on the middle circle, which are opposite to each other. The second notch corresponds to the first notch. The second notch and the third notch divide the middle circle into two middle arc tube sections 232 which are symmetrical about the reference symmetry plane. The end of the middle arc tube section 232 facing the second notch is the first connection end 2321, and the end facing the third notch is the second connection end 2322.

[0043] A fourth notch and a fifth notch are provided on the outer ring, which are opposite to each other. The fourth notch corresponds to the second notch. The fourth notch and the fifth notch divide the outer ring into two outer arc-shaped tube segments 233 which are symmetrical about the reference symmetry plane. The end of the outer arc-shaped tube segment 233 facing the fourth notch is the third connecting end 2331, and the end facing the fifth notch is the fourth connecting end 2332.

[0044] One end of the inner arc-shaped pipe segment 231 is connected to the first connection end 2321 of the adjacent middle arc-shaped pipe segment 232 through the first transition pipe segment 234, the second connection end 2322 is connected to the fourth connection end 2332 of the adjacent outer arc-shaped pipe segment 233 through the second transition pipe segment 235, and the third connection end 2331 is connected to the straight pipe segment 237 through the third transition pipe segment 236. The straight pipe segment 237 passes through the first notch and the second notch and extends to the inner circle of the inner arc-shaped pipe segment 231. Ultimately, the straight pipe segment 237 of the first section, the third transition pipe segment 236 of the first section, the outer arc pipe segment 233 of the first section, the second transition pipe segment 235 of the first section, the middle arc pipe segment 232 of the first section, the first transition pipe segment 234 of the first section, the inner arc pipe segment 231, the first transition pipe segment 234 of the second section, the middle arc pipe segment 232 of the second section, the second transition pipe segment 235 of the second section, the outer arc pipe segment 233 of the second section, the third transition pipe segment 236 of the second section and the straight pipe segment 237 of the second section are connected in sequence.

[0045] The first transition pipe section 234 heats the first notch and the second notch regions, and the second transition pipe section 235 heats the third notch and the fifth notch regions.

[0046] The straight pipe section 237 includes a heating section 2371 and a cooling section 2372 in sequence, and the cooling section 2372 is far away from the third transition pipe section 236. The setting of the cooling section 2372 reduces the density of the heating part in the area from the fourth notch to the first notch, thereby preventing the temperature in this area from being higher than other areas.

[0047] The driving device 3 drives the heating plate 2 to rotate. The shower head 4 is used to introduce process gas into the cavity 1.

[0048] Figure 4 This is a simulation diagram of the heating power of the heating tube structure. The horizontal axis in the figure is X and the vertical axis is Y. The units of the horizontal and vertical axes are millimeters (i.e. mm). The color on the left represents W / m 2 (i.e., the heating power per square meter). From the simulation diagram, it can be seen that the proportion of red and yellow in the entire circular area is relatively high, and the colors in the entire circular area tend to be symmetrically distributed along the X-axis and the Y-axis. Figure 5The figure is a temperature test diagram of the heating test of the heating tube structure. The heating tube 23 is installed in the heating plate 2 and 9 test points are set on the surface of the heating plate 2. The temperature sensor is installed at the test point for measurement. The figure shows the test data when heated to 55. From the figure, the 9 data values ​​are: 54.90℃, 54.90℃, 55.00℃, 55.20℃, 55.20℃, 55.30℃, 55.30℃, 55.50℃ and 55.60℃, the highest temperature is 55.60℃, the lowest temperature is 54.90℃, the average temperature is 55.21℃, and the temperature variation range is 0.70℃. In actual use, the error range of the temperature of the heating plate 2 is required to be ±2%. From the test data, it can be seen that the maximum error of the temperature of the heating plate 2 with the heating tube 23 installed is 1.09%, which meets the error requirement. Therefore, the chemical vapor deposition equipment can keep the temperature of the entire heating plate 2 uniform, and then can evenly heat the entire wafer.

[0049] Preferably, a wire is inserted into the cold section 2372, and heating wires are inserted into the heating section 2371, the third transition pipe section 236, the outer arc-shaped pipe section 233, the second transition pipe section 235, the middle arc-shaped pipe section 232, the first transition pipe section 234 and the inner arc-shaped pipe section 231, and the wires are connected to the heating wires. The wires ensure power supply to the heating wires and prevent the cold section 2372 from heating up, and the heating wires heat the two heating sections 2371, the two third transition pipe sections 236, the two outer arc-shaped pipe sections 233, the two second transition pipe sections 235, the two middle arc-shaped pipe sections 232, the two first transition pipe sections 234 and the inner arc-shaped pipe section 231.

[0050] Specifically, the diameter of each pipe section is 8.5 mm, the heating wire is made of Cr20Ni80, and the total resistance of the heating wire is less than 16 ohms.

[0051] Specifically, the cold section 2372 is connected to the vertical section 239 through the fourth transition section 238. The vertical section 239 is along the vertical direction, and the vertical sections 239 corresponding to the two straight sections 237 are symmetrical about the reference symmetry plane. The vertical section 239 is arranged in the hollow shaft of the heating plate. The wires of the two cold sections 2372 are respectively connected to the positive and negative poles of the power supply. The positive wire enters the first cold section 2372 through the first fourth transition section 238 after passing through the first cold section 2372; the negative wire enters the second vertical section 239 through the second fourth transition section 238 after passing through the second cold section 2372. The setting of the vertical section 239 facilitates the routing of the wire from the middle area of ​​the heating plate 2, which is conducive to the connection of the wire with the external power supply.

[0052] Preferably, the first transition pipe section 234, the second transition pipe section 235, the third transition pipe section 236 and the fourth transition pipe section 238 are all arc-shaped, which is conducive to the smooth transition of the transition position and avoids the transition position being too densely packed, thereby generating a high temperature area. The arc shape is also conducive to the routing of the wire and the heating wire, avoiding the wire and the heating wire from having a sharp turning point.

[0053] Preferably, the first transition pipe section 234 is located in the area sandwiched by the straight pipe section 237 and the outer arc-shaped pipe section 233. The first transition pipe section 234 can heat the area sandwiched by the straight pipe section 237 and the outer arc-shaped pipe section 233 to ensure the temperature in the area far away from the outer arc-shaped pipe section 233, the third transition pipe section 236 and the heating section 2371.

[0054] Preferably, the two straight pipe sections 237 are parallel to each other and symmetrical about the reference symmetry plane, so that the two heating sections 2371 uniformly heat the area therebetween.

[0055] Specifically, the cold section 2372 passes through the first notch and the second notch to avoid the area where the heating section 2371 is close to the first transition pipe section 234 and has a higher temperature.

[0056] Preferably, the distance between the middle arc-shaped pipe section 232 and the inner arc-shaped pipe section 231 is greater than the radius of the inner arc-shaped pipe section 231, and the distance between the outer arc-shaped pipe section 233 and the middle arc-shaped pipe section 232 is equal to the radius of the inner arc-shaped pipe section 231. Since the peripheral area of ​​the heating plate 2 is more prone to heat loss, the heating plate 2 is prone to uneven temperature with hot inside and cold outside. The distance between the outer arc-shaped pipe section 233 and the middle arc-shaped pipe section 232 is smaller than the distance between the middle arc-shaped pipe section 232 and the inner arc-shaped pipe section 231, which can offset the influence of heat loss in the peripheral area of ​​the heating plate 2, and ensure that the temperature of the area between the outer arc-shaped pipe section 233 and the middle arc-shaped pipe section 232 and the area between the middle arc-shaped pipe section 232 and the inner arc-shaped pipe section 231 remains uniform. Since the inner circle area of ​​the inner arc tube segment 231 is heated by the inner arc tube segment 231, the radius of the inner arc tube segment 231 is smaller than the distance between the middle arc tube segment 232 and the inner arc tube segment 231, which can ensure that the temperature of the inner circle area of ​​the inner arc tube segment 231 and the area between the middle arc tube segment 232 and the inner arc tube segment 231 remains uniform. Figure 3 As shown, the red part at the edge of the circular area is more distributed than the red part at the center of the circular area, reflecting that the heating power of the outer arc tube segment 233 and the middle arc tube segment 232 at the edge of the circular area is slightly higher, which can offset the heat loss in the peripheral area of ​​the heating plate 2 during continuous heating and insulation.

[0057] Preferably, combined Figure 1 , Figure 2 and Figure 3As shown, the ratio of the radius of the inner arc tube segment 231, the distance between the middle arc tube segment 232 and the inner arc tube segment 231, and the distance between the outer arc tube segment 233 and the middle arc tube segment 232 is 14:19:14, so that the temperature of each area of ​​the heating plate 2 remains uniform.

[0058] Specifically, the radius of the inner arc-shaped pipe segment 231 is 35 mm, the radius of the middle arc-shaped pipe segment 232 is 82.5 mm, and the radius of the outer arc-shaped pipe segment 233 is 117.5 mm.

[0059] Preferably, the first notch and the second notch both correspond to the first central angle, the third notch and the fifth notch both correspond to the second central angle, and the first central angle is greater than the second central angle, so that the area at the first notch and the second notch is convenient for setting two cold sections 2372, and ensuring that the second transition pipe section 235 uniformly heats the area at the third notch and the fifth notch.

[0060] Preferably, the ratio of the first central angle to the second central angle is 40:11, so that the areas at the third notch and the fifth notch can be evenly heated; at the same time, the first notch and the second notch can meet both the setting of the cold section 2372 and the uniform heating of the areas at the first notch and the second notch.

[0061] Specifically, the first center angle is 120°, and the second center angle is 33°. The first transition pipe section 234 and the second transition pipe section 235 are both semicircular arcs, the radius of the first transition pipe section 234 is 23.75 mm, and the radius of the second transition pipe section 235 is 17.5 mm, ensuring that the two ends of the first transition pipe section 234 are tangent to the inner arc pipe section 231 and the middle arc pipe section 232 respectively, and the two ends of the second transition pipe section 235 are tangent to the outer arc pipe section 233 and the middle arc pipe section 232 respectively. The corresponding central angle of the third transition pipe section 236 is an obtuse angle, and the radius of the third transition pipe section 236 is 18mm; the distance between the center of curvature of the third transition pipe section 236 and the reference symmetry plane is 27mm, and the distance between the center of curvature of the third transition pipe section 236 and the reference plane perpendicular to the reference symmetry plane and passing through the center of curvature of the inner arc pipe section 231 is 95.767mm, and the third transition pipe section 236 is tangent to the straight pipe section 237; the center of curvature of the third connecting end 2331 and the third transition pipe section 236 on the same side of the reference symmetry plane is located on the same straight line as the center of curvature of the inner arc pipe section 231. The corresponding central angle of the fourth transition pipe section 238 is a right angle, and the radius of the fourth transition pipe section 238 is 9.75mm. The two ends of the fourth transition pipe section 238 are tangent to the straight pipe section 237 and the vertical pipe section 239 respectively.

[0062] Preferably, the distance between the two straight pipe sections 237 is equal to the radius of the third transition pipe section 236, so that the heating section 2371, the third transition pipe section 236 and the end of the outer arc-shaped pipe section 233 can achieve uniform heating of the area at the fourth notch.

[0063] Specifically, the distance between the end of the cold section 2372 away from the heating section 2371 and the reference surface is 7 mm, and the length of the cold section 2372 is 70 mm.

[0064] Preferably, combined Figure 1 , Figure 2 , Figure 3 , Figure 6 and Figure 7 As shown, the heating plate 2 also includes: a disc 21, a hollow shaft 22 and a temperature sensor 24; a slip ring assembly is provided on the outer wall of the hollow shaft 22, and the positive and negative wires of the heating tube 23 are connected to the slip ring assembly after passing through the bottom opening of the hollow shaft 22; the slip ring assembly includes: an insulating sleeve 251, a positive slip ring 252, an insulating spacer 253, a negative slip ring 254 and an insulating sleeve 255 coaxially sleeved on the hollow shaft 22; the insulating sleeve 251 is fixedly connected to the hollow shaft 22; the positive slip ring 252, the insulating spacer 253, and the negative slip ring 254 are coaxially sleeved on the insulating sleeve 251 in sequence, and the positive slip ring 252, the insulating spacer 253, and the negative slip ring 254 are all fixedly connected to the insulating sleeve 251. In this embodiment, the positive slip ring 252, the insulating spacer 253, and the negative slip ring 254 are all interference fit with the insulating sleeve 251. The insulating sleeve 251 isolates the hollow shaft 22, and the insulating spacer 253 isolates the positive slip ring 252 and the negative slip ring 254 to prevent short circuit. The insulating sleeve 255 passes through the negative slip ring 254 along the axial direction of the insulating sleeve 251, and the positive wire of the heating tube 23 passes through the insulating sleeve 255 and the insulating spacer 253 in sequence and then connects to the positive slip ring 252. The insulating sleeve 255 protects the positive wire of the heating tube 23 to prevent the positive wire of the heating tube 23 from being short-circuited with the negative slip ring 254 after breakdown. The negative wire of the heating tube 23 is connected to the negative slip ring 254. The positive slip ring 252 and the negative slip ring 254 rotate with the hollow shaft 22, that is, the positive slip ring 252 and the negative slip ring 254 rotate synchronously with the heating plate 2. The positive and negative wires of the heating tube 23 are connected to the positive slip ring 252 and the negative slip ring 254 respectively after passing through the bottom opening of the hollow shaft 22. The positive wire and the positive slip ring 252 of the heating tube 23 rotate with the hollow shaft 22, and the negative wire and the negative slip ring 254 of the heating tube 23 rotate with the hollow shaft 22; the positive slip ring 252 and the negative slip ring 254 are respectively in contact with the positive and negative stator parts of the external power supply, ensuring that the heating tube 23 is powered while avoiding the occurrence of entanglement. Therefore, the heating plate 2 of the chemical vapor deposition equipment can solve the technical problem in the prior art that the heating plate is prone to wire entanglement during dynamic rotation, thereby affecting the power supply of the circuit. Then, the 360° rotation of the heating plate 2 is realized, the adjustment ability of the heating plate 2 is improved, and the uniform deposition of the wafer is ensured. While the entire heating plate 2 provides a uniform heating effect, the uniformity of the coating is further improved through rotation.

[0065] Specifically, the inner arc tube section 231, two middle arc tube sections 232, two outer arc tube sections 233, two first transition tube sections 234, two second transition tube sections 235, two third transition tube sections 236 and two straight tube sections 237 of the heating tube 23 are all installed in the disc 21, and the reference symmetry plane passes through the axis of the hollow shaft 22. The vertical tube sections 239 at both ends penetrate the hollow shaft 22 from the central area of ​​the disc 21 parallel to the axis of the hollow shaft 22. The wires in the two straight tube sections 237 are respectively the positive wire and the negative wire, and the positive wire and the negative wire are both routed along the fourth transition tube section 238 and the vertical tube section 239, and the positive wire and the negative wire are electrically connected to the positive slip ring 252 and the negative slip ring 254 respectively.

[0066] Specifically, the positive slip ring 252 and the negative slip ring 254 can adopt a conductive slip ring device, the mover of the conductive slip ring is installed on the hollow shaft 22, and the stator of the conductive slip ring is connected to an external power supply to achieve rotational conduction. The positive slip ring 252 and the negative slip ring 254 can also adopt a conductive ring, and the positive slip ring 252 and the negative slip ring 254 abut against a brush structure connected to an external power supply to achieve rotational conduction.

[0067] Preferably, the hollow shaft 22 includes a first shaft section and a second shaft section from top to bottom, the diameter of the second shaft section is smaller than the diameter of the first shaft section, so that the first shaft section and the second shaft section form a step; the insulating sleeve 251 is a T-shaped sleeve, the large diameter end of the insulating sleeve 251 abuts against the end face of the first shaft section, and the small diameter end is pressed by the insulating pressure ring 26, and the insulating pressure ring 26 presses the insulating sleeve 251 against the end face of the first shaft section to fix the insulating sleeve 251, ensuring that the insulating sleeve 251 rotates synchronously with the hollow shaft 22. The insulating pressure ring 26 is detachably fixedly connected to the second shaft section, which is convenient for installation and removal.

[0068] Preferably, the outer diameters of the insulating sleeve 251, the positive slip ring 252, the insulating spacer 253, the negative slip ring 254 and the insulating pressure ring 26 are all equal to the diameter of the first shaft section; the positive wire of the heating tube 23 passes through the insulating pressure ring 26 and then passes through the insulating sleeve 255, and the negative wire of the heating tube 23 passes through the insulating pressure ring 26 and then connects to the negative slip ring 254. The structural size of the slip ring assembly is reduced, and the radial size of the slip ring assembly is ensured to be consistent with that of the first shaft section, so as to facilitate the installation of the heating plate 2.

[0069] Preferably, the positive electrode wire of the heating tube 23 is electrically connected to the positive electrode slip ring 252 through the positive electrode connection electrode 256; a first through hole coaxial with the insulating sleeve 255 is provided on the insulating spacer 253, one end of the positive electrode connection electrode 256 is connected to the positive electrode slip ring 252, and the other end passes through the first through hole and the insulating sleeve 255 in sequence and then electrically connects to the positive electrode wire of the heating tube 23. The positive electrode connection electrode 256 is convenient to penetrate the first through hole and the insulating sleeve 255, and is convenient to connect the positive electrode connection electrode 256 to the positive electrode slip ring 252 and to braze the positive electrode wire of the heating tube 23 to the positive electrode connection electrode 256.

[0070] Preferably, the aperture of the first through hole is equal to the inner aperture of the insulating sleeve 255, and a first blind hole is opened at one end of the insulating spacer 253 toward the negative electrode slip ring 254. The first blind hole is coaxial with the first through hole, and the aperture of the first blind hole is equal to the outer diameter of the insulating sleeve 255. The end of the insulating sleeve 255 passes through the negative electrode slip ring 254 and then is inserted into the first blind hole. The butt joint position of the insulating sleeve 255 and the insulating spacer 253 is kept at a certain distance from the end face of the negative electrode slip ring 254, which can improve the protection of the positive electrode connection electrode 256 and avoid a short circuit between the positive electrode connection electrode 256 and the negative electrode slip ring 254.

[0071] Specifically, the insulating pressure ring 26 is provided with a third through hole coaxial with the insulating sleeve 255, and the insulating pressure ring 26 is provided with an arc groove at one end facing the negative slip ring 254. The arc groove is arranged around the central axis of the insulating pressure ring 26, and the arc groove corresponds to the third through hole and the width of the arc groove is equal to the outer diameter of the insulating sleeve 255. The end of the insulating sleeve 255 away from the insulating spacer 253 passes through the negative slip ring 254 and then inserts into the arc groove. The positive connection electrode 256 passes through the first through hole, the insulating sleeve 255 and the third through hole in sequence, and the positive connection electrode 256 is electrically connected to the positive lead. The docking position of the insulating sleeve 255 and the insulating pressure ring 26 is kept at a certain distance from the end face of the negative slip ring 254, which can improve the protection of the positive connection electrode 256 and avoid a short circuit between the positive connection electrode 256 and the negative slip ring 254.

[0072] Preferably, the negative electrode wire of the heating tube 23 is electrically connected to the negative electrode slip ring 254 through the negative electrode connection electrode 257; a second through hole along the axial direction of the insulating sleeve 251 is provided on the insulating pressure ring 26, and one end of the negative electrode connection electrode 257 is connected to the negative electrode slip ring 254, and the other end passes through the second through hole and is electrically connected to the negative electrode wire of the heating tube 23. The negative electrode connection electrode 257 is convenient for penetrating into the second through hole, and convenient for connecting the negative electrode slip ring 254 and the negative electrode wire of the heating tube 23 to the negative electrode connection electrode 257 for brazing connection.

[0073] Preferably, the insulating pressure ring 26 includes a connecting section and a limiting section from top to bottom, the connecting section abuts against the insulating sleeve 251 and is connected to the second shaft segment, the limiting section abuts against the end face of the second shaft segment away from the first shaft segment, and the inner diameter of the limiting section is equal to the inner diameter of the second shaft segment. The limiting section abuts against the end face of the second shaft segment away from the first shaft segment to limit the position of the insulating pressure ring 26, so as to prevent the insulating pressure ring 26 from exerting too much pressure on the insulating sleeve 251 and damaging the insulating sleeve 251.

[0074] Specifically, a first internal thread is provided in the connecting section, a first external thread is provided on the second shaft section, and the insulating pressure ring 26 is fixed on the hollow shaft 22 by tightening.

[0075] Preferably, a protective cover 27 is further included, and the protective cover 27 is detachably connected to the insulating pressure ring 26. In this embodiment, the protective cover 27 is provided with a second internal thread, and the outer periphery of the insulating pressure ring 26 is provided with a second external thread, and the protective cover 27 is screwed on the insulating pressure ring 26. The protective cover 27 covers the insulating pressure ring 26 and the end of the second shaft section. The protective cover 27 protects the positive connection electrode 256, the positive wire, the negative connection electrode 257 and the negative wire, and can prevent dust from entering the hollow shaft 22. The temperature sensor 24 is connected to the micro conductive slip ring after passing through the protective cover 27 to ensure that the signal line of the temperature sensor 24 is not entangled.

[0076] Specifically, the chamber 1 includes a chamber 11 and a chamber cover 12. The upper part of the chamber 11 is open, and the chamber cover 12 can cover the upper part of the chamber 11 to keep the chamber 1 closed; the chamber 11 and the chamber cover 12 form a process chamber. An entrance 13 is opened on the side wall of the chamber 11, and the entrance 13 is used for a wafer robot to send a wafer into the chamber 11. A gate structure is installed at the entrance 13, and the gate structure is used to open and close the entrance 13.

[0077] Specifically, there are multiple spray heads 4, which are evenly installed on the chamber cover 12. The spray heads 4 pass through the chamber cover 12 to communicate with the external gas supply pipeline to realize the injection of process gas into the chamber 11. The number of heating disks 2 is consistent with the number of spray heads 4, and the discs 21 of the heating disks 2 correspond to the spray heads 4 one by one. A first clearance hole is provided at the bottom of the chamber 11, and the hollow shaft 22 passes through the first clearance hole and is connected to the driving device 3. The driving device 3 drives the hollow shaft 22 to rotate and then drives the disc 21 to achieve 360° rotation.

[0078] Specifically, the driving device 3 includes: a mounting frame, a magnetic fluid rotating mechanism and a power mechanism. The mounting frame is mounted on the lower surface of the chamber 11 and blocks the first clearance hole. The magnetic fluid rotating mechanism is mounted on the mounting frame, and the magnetic fluid rotating mechanism includes a magnetic fluid hollow shaft, and the hollow shaft 22 passes through the magnetic fluid hollow shaft and is fixed to the magnetic fluid hollow shaft. The power mechanism drives the magnetic fluid hollow shaft to rotate, and the hollow shaft 22 rotates synchronously with the magnetic fluid hollow shaft.

[0079] Specifically, the chemical vapor deposition equipment also includes a pin lifting device. The pin lifting device includes: three pins 51, a supporting ring 52 and a lifter 53. A second clearance hole is provided at the bottom of the chamber 11, and the lifter 53 is installed on the lower surface of the chamber 11. The driving end of the lifter 53 passes through the second clearance hole to connect the supporting ring 52. The supporting ring 52 is arranged around the hollow shaft 22 and is located below the disc 21. The lifter 53 drives the supporting ring 52 to move along the axial direction of the hollow shaft 22. The three pins 51 are arranged on the upper surface of the supporting ring 52 along the axial direction of the hollow shaft 22, and the three pins 51 are arranged in a triangular shape. Three corresponding pin through holes are opened on the disc 21, and the pin through holes are adapted to the size of the pins 51. Driven by the supporting ring 52, the three pins 51 can extend into the pin through holes. The support ring 52 drives the three ejector pins 51 to pass through the upper surface of the disk 21, and the three ejector pins 51 lift up the wafer on the wafer robot, and the wafer robot withdraws to transfer the wafer to the three ejector pins 51; the support ring 52 drives the three ejector pins 51 to move downward, and the three ejector pins 51 place the wafer on the upper surface of the disk 21. The support ring 52 continues to move downward to make the three ejector pins 51 withdraw from the ejector pin through holes to prevent the ejector pins 51 from affecting the rotation of the disk 21.

[0080] Specifically, a partition 14 is fixedly provided at the bottom of the chamber 11, and the partition 14 is perpendicular to the bottom surface of the chamber 11 and surrounds the heating plate 2. A first shielding gas distribution plate 61 is provided at the top of the partition 14, and the lower surface of the first shielding gas distribution plate 61 abuts against the top of the partition 14, and the upper surface of the first shielding gas distribution plate 61 is flush with the upper surface of the disk 21; the outer side of the first shielding gas distribution plate 61 abuts against the side wall of the chamber 11, and the inner side has a gap with the side wall of the disk 21, and the first shielding gas distribution plate 61, the partition 14, the bottom surface of the chamber 11 and the side wall of the chamber 11 form an annular cavity, which is a part of the process chamber. The first shielding gas distribution plate 61 is provided with an air hole, and the side wall of the chamber 11 is provided with an exhaust port 15 connected to the annular cavity. The process gas enters the chamber 11 from the shower head 4 for reaction. After the reaction, the process gas enters the annular cavity from the air hole and is discharged from the exhaust port 15.

[0081] Specifically, a second shielding gas distributor 62 is also provided in the annular cavity, and the second shielding gas distributor 62 is located above the gas extraction port 15 and below the first shielding gas distributor 61. The outer side of the second shielding gas distributor 62 abuts against the side wall of the chamber 11, and the inner side has a gap with the side wall of the partition 14. After the process gas enters the annular cavity, it is compressed by the gap between the second shielding gas distributor 62 and the side wall of the partition 14, so that the process gas is evenly distributed in the entire annular cavity through the gap between the second shielding gas distributor 62 and the side wall of the partition 14, which is conducive to the uniform discharge of the process gas through the gas extraction port 15, and the rapid discharge of the process gas is achieved.

[0082] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the utility model, rather than to limit it. Although the utility model has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the scope of the technical solutions of the embodiments of the utility model.

Claims

1. A chemical vapor deposition device, characterized in that: include: A cavity (1), a heating plate (2), a driving device (3) and a spray head (4); The heating plate (2) is used to carry and heat the wafer placed in the cavity (1), and the heating plate (2) comprises: a disc (21), a hollow shaft (22), a heating tube (23) and a temperature sensor (24); a slip ring assembly is provided on the outer wall of the hollow shaft (22), and the positive and negative wires of the heating tube (23) are connected to the slip ring assembly after passing through the bottom opening of the hollow shaft (22); The slip ring assembly comprises: an insulating sleeve (251) coaxially sleeved on the hollow shaft (22), a positive slip ring (252), an insulating spacer (253), a negative slip ring (254) and an insulating sleeve (255); the insulating sleeve (251) is fixedly connected to the hollow shaft (22); the positive slip ring (252), the insulating spacer (253) and the negative slip ring (254) are coaxially sleeved on the insulating sleeve (251) in sequence; the positive slip ring (252) ), the insulating spacer (253), and the negative slip ring (254) are all fixedly connected to the insulating sleeve (251); the insulating sleeve (255) passes through the negative slip ring (254) along the axial direction of the insulating sleeve (251); the positive wire of the heating tube (23) passes through the insulating sleeve (255) and the insulating spacer (253) in sequence and then connects to the positive slip ring (252); the negative wire of the heating tube (23) is connected to the negative slip ring (254); The driving device (3) drives the hollow shaft (22) to rotate; The shower head (4) is used to introduce process gas into the cavity (1).

2. A chemical vapor deposition device according to claim 1, characterized in that: The positive electrode wire of the heating tube (23) is electrically connected to the positive electrode slip ring (252) via a positive electrode connecting electrode (256); a first through hole coaxial with the insulating sleeve (255) is provided on the insulating sleeve (253); one end of the positive electrode connecting electrode (256) is connected to the positive electrode slip ring (252), and the other end passes through the first through hole and the insulating sleeve (255) in sequence and then is electrically connected to the positive electrode wire of the heating tube (23).

3. A chemical vapor deposition device according to claim 2, characterized in that: The aperture of the first through hole is equal to the inner aperture of the insulating sleeve (255); a first blind hole is opened on one end of the insulating spacer (253) toward the negative electrode slip ring (254); the first blind hole is coaxial with the first through hole; the aperture of the first blind hole is equal to the outer diameter of the insulating sleeve (255); and the end of the insulating sleeve (255) passes through the negative electrode slip ring (254) and is inserted into the first blind hole.

4. The chemical vapor deposition device according to claim 1, characterized in that: The hollow shaft (22) comprises a first shaft section and a second shaft section from top to bottom, the diameter of the second shaft section being smaller than the diameter of the first shaft section; the insulating shaft sleeve (251) is a T-shaped shaft sleeve, the large diameter end of the insulating shaft sleeve (251) abuts against the end surface of the first shaft section, and the small diameter end is pressed by an insulating pressure ring (26), and the insulating pressure ring (26) is detachably fixedly connected to the second shaft section.

5. A chemical vapor deposition device according to claim 4, characterized in that: The outer diameters of the insulating shaft sleeve (251), the positive electrode slip ring (252), the insulating spacer (253), the negative electrode slip ring (254) and the insulating pressure ring (26) are all equal to the diameter of the first shaft section; the positive electrode wire of the heating tube (23) passes through the insulating pressure ring (26) and then passes into the insulating sleeve (255), and the negative electrode wire of the heating tube (23) passes through the insulating pressure ring (26) and is connected to the negative electrode slip ring (254).

6. The chemical vapor deposition device according to claim 5, characterized in that: The negative electrode wire of the heating tube (23) is electrically connected to the negative electrode slip ring (254) via a negative electrode connecting electrode (257); a second through hole is provided on the insulating pressure ring (26) along the axial direction of the insulating sleeve (251); one end of the negative electrode connecting electrode (257) is connected to the negative electrode slip ring (254), and the other end passes through the second through hole and is electrically connected to the negative electrode wire of the heating tube (23).

7. The chemical vapor deposition device according to claim 1, characterized in that: The heating tube (23) comprises an inner ring, a middle ring and an outer ring which are arranged concentrically and have radii increasing in sequence; The inner ring is provided with a first notch to form an inner arc-shaped pipe section (231), and the symmetry plane of the inner arc-shaped pipe section (231) along the vertical direction is a reference symmetry plane; The middle ring is provided with a second notch and a third notch which are located opposite to each other, the second notch corresponds to the first notch, the second notch and the third notch divide the middle ring into two middle arc-shaped tube segments (232) which are symmetrical about the reference symmetry plane, the end of the middle arc-shaped tube segment (232) facing the second notch is a first connection end (2321), and the end facing the third notch is a second connection end (2322); The outer ring is provided with a fourth notch and a fifth notch which are opposite to each other, the fourth notch corresponds to the second notch, the fourth notch and the fifth notch divide the outer ring into two outer arc-shaped tube segments (233) which are symmetrical about the reference symmetry plane, the end of the outer arc-shaped tube segment (233) facing the fourth notch is a third connecting end (2331), and the end facing the fifth notch is a fourth connecting end (2332); One end of the inner arc-shaped pipe segment (231) is connected to the first connection end (2321) of the adjacent middle arc-shaped pipe segment (232) through a first transition pipe segment (234); the second connection end (2322) is connected to the fourth connection end (2332) of the adjacent outer arc-shaped pipe segment (233) through a second transition pipe segment (235); the third connection end (2331) is connected to a straight pipe segment (237) through a third transition pipe segment (236); the straight pipe segment (237) passes through the first notch and the second notch and then extends to the inner circle of the inner arc-shaped pipe segment (231); The straight pipe section (237) includes a heating section (2371) and a cooling section (2372) in sequence, and the cooling section (2372) is far away from the third transition pipe section (236); The first transition pipe section (234), the second transition pipe section (235) and the third transition pipe section (236) are all arc-shaped.

8. The chemical vapor deposition device according to claim 7, characterized in that: The first transition pipe section (234) is located in the area sandwiched between the straight pipe section (237) and the outer arc-shaped pipe section (233).

9. The chemical vapor deposition device according to claim 7, characterized in that: The distance between the middle arc-shaped pipe segment (232) and the inner arc-shaped pipe segment (231) is greater than the radius of the inner arc-shaped pipe segment (231), and the distance between the outer arc-shaped pipe segment (233) and the middle arc-shaped pipe segment (232) is equal to the radius of the inner arc-shaped pipe segment (231).

10. The chemical vapor deposition equipment according to claim 7, characterized in that: The first notch and the second notch both correspond to a first central angle, the third notch and the fifth notch both correspond to a second central angle, and the first central angle is greater than the second central angle.

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