Bipolar plate cleaning device

Abstract

The utility model provides a bipolar plate cleaning device which comprises a bearing mechanism, the bearing mechanism comprises a first bearing platform and a second bearing platform, a plurality of first bearing stations are arranged on the first bearing platform, and a plurality of second bearing stations are arranged on the second bearing platform; the cleaning mechanism is arranged on the side of the bearing mechanism, the cleaning mechanism comprises a cleaning assembly, and the position of the cleaning assembly is movably arranged; the transferring mechanism is movably arranged along a preset track, and the transferring mechanism is used for sucking the to-be-cleaned workpiece and driving the to-be-cleaned workpiece to move; and the overturning assembly is provided with an overturning platform, the overturning platform is arranged around a preset axis in an overturning mode, the overturning platform is provided with a plurality of overturning stations, and the transferring mechanism transfers the to-be-cleaned workpieces on the first bearing station to the overturning stations to be overturned and then transfers the to-be-cleaned workpieces to the second bearing station to be cleaned. The problem that in the prior art, a graphite bipolar plate cleaning device is low in cleaning efficiency is solved.

Description

Technical Field

[0001] The utility model relates to the technical field of graphite bipolar plate cleaning, and in particular to a bipolar plate cleaning device. Background Art

[0002] The plate with the main raw material of graphite is a core component of a hydrogen fuel cell. After the graphite plate undergoes various technological processes such as molding, leveling, bonding, curing, and cutting, some graphite powder or other adhesives will adhere to the surface and flow channels of the bipolar plate, affecting the result of the airtight detection of the bipolar plate and indirectly affecting the product quality.

[0003] Usually, the cut graphite bipolar plates are all contained in a specific tooling, and each time they need to be manually taken out, and then the bipolar plates are cleaned on both the front and back sides by manually holding a plate brush. The manual operation skills required for the plate cleaning work are high and proficient, which is both time-consuming and laborious. Moreover, during manual cleaning, it cannot be guaranteed that the cleaning force and angle for each bipolar plate are the same each time, resulting in poor consistency in product cleaning.

[0004] In the existing graphite bipolar plate cleaning devices, the front and back sides of the plate are cleaned simultaneously, which is likely to cause damage to the plate when clamping the plate, and only one plate can be cleaned each time, reducing the cleaning efficiency. Summary of the Utility Model

[0005] The main purpose of the utility model is to provide a bipolar plate cleaning device to solve the problem of low cleaning efficiency of the existing graphite bipolar plate cleaning devices.

[0006] To achieve the above purpose, according to one aspect of the utility model, a bipolar plate cleaning device is provided, including: a carrying mechanism, the carrying mechanism includes a first carrying platform and a second carrying platform, a plurality of first carrying stations are arranged on the first carrying platform, a plurality of second carrying stations are arranged on the second carrying platform, and each of the first carrying stations and each of the second carrying stations are respectively used for carrying workpieces to be cleaned; a cleaning mechanism, arranged on the side of the carrying mechanism, the cleaning mechanism includes a cleaning assembly, and the position of the cleaning assembly is movably arranged to clean the first surface of the workpieces to be cleaned on each of the first carrying stations, and / or clean the second surface of the workpieces to be cleaned on each of the second carrying stations; a transfer mechanism, movably arranged along a predetermined trajectory, the transfer mechanism is used to suck the workpieces to be cleaned and drive the workpieces to be cleaned to move; a flipping assembly, a flipping platform is arranged on the flipping assembly, the flipping platform is rotatably arranged around a predetermined axis, a plurality of flipping stations are arranged on the flipping platform, after the transfer mechanism transfers the workpieces to be cleaned on the first carrying station to the flipping station for flipping, the workpieces to be cleaned are transferred to the second carrying station for cleaning.

[0007] Further, the bipolar plate cleaning device further includes a first positioning assembly, and the first positioning assembly includes: a plurality of first trays, on each of which there are provided a first positioning baffle and a second positioning baffle connected to each other. There is a first included angle between the first positioning baffle and the second positioning baffle, and the workpiece to be cleaned is blocked by the first positioning baffle and the second positioning baffle respectively; a first movable end plate, arranged on the side of the first tray away from the first positioning baffle, and the first movable end plate is movably arranged in a direction close to or away from the first positioning baffle to push the workpiece to be cleaned into contact with the first positioning baffle; a second movable end plate, arranged on the side of the first tray away from the second positioning baffle, and the second movable end plate is movably arranged in a direction close to or away from the second positioning baffle to push the workpiece to be cleaned into contact with the second positioning baffle; wherein, after each workpiece to be cleaned is positioned in each first tray, the transfer mechanism transfers each workpiece to be cleaned to the corresponding first loading station.

[0008] Further, the bipolar plate cleaning device further includes a second positioning assembly, and the second positioning assembly includes: a positioning platform, which is movably arranged in the horizontal direction and the vertical direction respectively. The positioning platform moves below the flipping platform and moves in a direction close to the flipping platform to be used for carrying each workpiece to be cleaned at the flipping station, and the transfer mechanism transfers the workpiece to be cleaned on the positioning platform to each second loading station.

[0009] Further, the second positioning assembly further includes: a slide rail, on which there is a slider, the positioning platform is connected to the slider, and the slider drives the positioning platform to be movably arranged along the extending direction of the slide rail; a jacking component, arranged on the slider and connected to the positioning platform, and at least part of the jacking component is movably arranged in the vertical direction to drive the positioning platform to lift.

[0010] Further, the second positioning assembly further includes: a plurality of second trays, the positioning platform is arranged in the second trays, and on each of the second trays there are provided a third positioning baffle and a fourth positioning baffle connected to each other. There is a second included angle between the third positioning baffle and the fourth positioning baffle, and the workpiece to be cleaned is blocked by the third positioning baffle and the fourth positioning baffle respectively; a third movable end plate, arranged on the side of the second tray away from the third positioning baffle, and the third movable end plate is movably arranged in a direction close to or away from the third positioning baffle to push the workpiece to be cleaned into contact with the third positioning baffle; a fourth movable end plate, arranged on the side of the second tray away from the fourth positioning baffle, and the fourth movable end plate is movably arranged in a direction close to or away from the fourth positioning baffle to push the workpiece to be cleaned into contact with the fourth positioning baffle.

[0011] Further, the cleaning assembly includes: a first cleaning brush group disposed on the side of the first carrying platform, the first cleaning brush group including a plurality of first cleaning brushes, the plurality of first cleaning brushes being provided in one-to-one correspondence with a plurality of first carrying stations; a first driving member, at least a part of the first driving member being telescopically provided, a driving end of the first driving member being respectively connected to each of the first cleaning brushes, and each of the first cleaning brushes being driven to move simultaneously by each of the first driving members so as to clean a first surface of each workpiece to be cleaned.

[0012] Further, the cleaning assembly includes: a second cleaning brush group disposed on the side of the second carrying platform, the second cleaning brush group including a plurality of second cleaning brushes, the plurality of second cleaning brushes being provided in one-to-one correspondence with a plurality of second carrying stations; a second driving member, at least a part of the second driving member being telescopically provided, a driving end of the second driving member being respectively connected to each of the second cleaning brushes, and each of the second cleaning brushes being driven to move simultaneously by each of the second driving members so as to clean a second surface of each workpiece to be cleaned.

[0013] Further, the cleaning mechanism further includes a first purging assembly, the first purging assembly including: a first support frame disposed on the side of the first carrying platform; a first nozzle disposed on the first support frame, the first nozzle being oriented towards the first carrying station to blow air onto the surface of the workpiece to be cleaned, the first nozzle being movably disposed in the vertical direction; and a plurality of first nozzles, the plurality of first nozzles being provided corresponding to the plurality of first carrying stations.

[0014] Further, the cleaning mechanism further includes a second purging assembly, the second purging assembly including: a second support frame disposed on the side of the second carrying platform; a second nozzle disposed on the second support frame, the second nozzle being oriented towards the second carrying station to blow air onto the surface of the workpiece to be cleaned, the second nozzle being movably disposed in the vertical direction; and a plurality of second nozzles, the plurality of second nozzles being provided corresponding to the plurality of second carrying stations.

[0015] Further, the transfer mechanism includes: a first robotic arm having a plurality of first suction cups disposed thereon, the plurality of workpieces to be cleaned being simultaneously sucked by each of the first suction cups and respectively placed on each of the first carrying stations; and a second robotic arm having a plurality of second suction cups disposed thereon, the workpieces to be cleaned on each of the positioning platforms being simultaneously sucked by each of the second suction cups and respectively placed on each of the second carrying stations.

[0016] Applying the technical solution of the present utility model, the bipolar plate cleaning device includes a carrying mechanism, a cleaning mechanism, a transfer mechanism and a flipping assembly. The carrying mechanism includes a first carrying platform and a second carrying platform. A plurality of first carrying stations are provided on the first carrying platform, and a plurality of second carrying stations are provided on the second carrying platform. Each of the first carrying stations and each of the second carrying stations are respectively used for carrying workpieces to be cleaned. The cleaning mechanism is arranged on the side of the carrying mechanism. The cleaning mechanism includes a cleaning assembly, and the position of the cleaning assembly is movably arranged to clean the first surface of the workpieces to be cleaned on each of the first carrying stations, and / or clean the second surface of the workpieces to be cleaned on each of the second carrying stations. The transfer mechanism is movably arranged along a predetermined trajectory, and the transfer mechanism is used to suck the workpieces to be cleaned and drive the workpieces to be cleaned to move. The flipping assembly is provided with a flipping platform, and the flipping platform is rotatably arranged around a predetermined axis. A plurality of flipping stations are provided on the flipping platform. After the transfer mechanism transfers the workpieces to be cleaned on the first carrying station to the flipping station for flipping, the workpieces to be cleaned are transferred to the second carrying station for cleaning. Such an arrangement can utilize a plurality of first carrying stations to simultaneously clean the first surfaces of a plurality of workpieces to be cleaned. After using the flipping assembly to flip each workpiece to be cleaned, a plurality of second carrying stations are used to simultaneously clean the second surfaces of a plurality of workpieces to be cleaned, and a plurality of workpieces to be cleaned can be cleaned simultaneously, improving the cleaning efficiency of the workpieces to be cleaned. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] The accompanying drawings forming a part of this application are used to provide a further understanding of the present utility model. The schematic embodiments of the present utility model and their descriptions are used to explain the present utility model and do not constitute an improper limitation to the present utility model. In the drawings:

[0018] Figure 1 shows a schematic structural diagram of an embodiment of the bipolar plate cleaning device according to the present utility model;

[0019] Figure 2 shows a schematic structural diagram of the first positioning assembly in the bipolar plate cleaning device according to the present utility model from a first perspective;

[0020] Figure 3 shows a schematic structural diagram of the first positioning assembly in the bipolar plate cleaning device according to the present utility model from a second perspective;

[0021] Figure 4 shows a schematic structural diagram of the second positioning assembly in the bipolar plate cleaning device according to the present utility model from a first perspective;

[0022] Figure 5 shows a schematic structural diagram of the second positioning assembly in the bipolar plate cleaning device according to the present utility model from a second perspective;

[0023] Figure 6 Shows a schematic structural view of the flipping assembly in the bipolar plate cleaning device according to the present utility model from the first perspective;

[0024] Figure 7 Shows a schematic structural view of the flipping assembly in the bipolar plate cleaning device according to the present utility model from the second perspective;

[0025] Figure 8 Shows a schematic structural view of the first bearing platform in the bipolar plate cleaning device according to the present utility model from the first perspective;

[0026] Figure 9 Shows a schematic structural view of the first bearing platform in the bipolar plate cleaning device according to the present utility model from the second perspective;

[0027] Figure 10 Shows a schematic structural view of the first bearing platform in the bipolar plate cleaning device according to the present utility model from the third perspective;

[0028] Figure 11 Shows a schematic structural view of the second bearing platform in the bipolar plate cleaning device according to the present utility model;

[0029] Figure 12 Shows a schematic structural view of the first cleaning brush set in the bipolar plate cleaning device according to the present utility model from the first perspective;

[0030] Figure 13 Shows a schematic structural view of the first cleaning brush set in the bipolar plate cleaning device according to the present utility model from the second perspective;

[0031] Figure 14 Shows a schematic structural view of the second cleaning brush set in the bipolar plate cleaning device according to the present utility model;

[0032] Figure 15 Shows a schematic structural view of the first robotic arm or the second robotic arm in the bipolar plate cleaning device according to the present utility model;

[0033] Figure 16 Shows a schematic structural view of the tooling basket in the bipolar plate cleaning device according to the present utility model.

[0034] Among them, the above-mentioned drawings include the following reference numerals:

[0035] 100. Carrier mechanism; 110. First carrier platform; 111. First carrier station; 112. Fourth suction cup; 113. Fourth photoelectric sensor; 114. Fourth light-transmitting hole; 115. Third fixing plate; 116. Third fixing hole; 117. Third vertical frame; 120. Second carrier platform; 121. Second carrier station; 122. Fifth suction cup; 123. Fourth vertical frame; 124. Fifth light-transmitting hole; 125. Fourth fixing plate; 126. Fourth fixing hole;

[0036] 200. Cleaning mechanism; 210. Cleaning assembly; 211. First cleaning brush group; 2110. First cleaning brush; 212. First driving component; 213. Second cleaning brush group; 2130. Second cleaning brush; 214. Second driving component; 215. Third support frame; 216. Third strip hole; 217. Third locking part; 220. First purging assembly; 221. First nozzle; 222. First support frame; 223. First mounting plate; 224. First locking part; 225. First strip hole; 230. Second purging assembly; 231. Second nozzle; 232. Second support frame;

[0037] 300. Transfer mechanism; 310. First robotic arm; 311. First suction cup; 312. First adsorption area; 320. Second robotic arm; 321. Second suction cup; 322. Second adsorption area;

[0038] 400. Flipping assembly; 410. Flipping platform; 411. Flipping station; 420. Third suction cup; 430. Flipping motor; 440. Third photoelectric sensor; 441. Third light-transmitting hole;

[0039] 500. First positioning assembly; 510. First tray; 511. First positioning baffle; 512. Second positioning baffle; 513. First light-transmitting hole; 514. First photoelectric sensor; 520. First movable end plate; 521. First driving cylinder; 530. Second movable end plate; 531. Second driving cylinder; 540. First fixing plate; 541. First fixing hole; 550. First vertical frame;

[0040] 600. Second positioning assembly; 610. Positioning platform; 620. Slide rail; 621. Slide block; 630. Lifting component; 640. Second tray; 641. Third positioning baffle; 642. Fourth positioning baffle; 650. Third movable end plate; 660. Fourth movable end plate; 670. Second fixing plate; 671. Second fixing hole; 680. Second vertical frame; 690. Horizontal driving part;

[0041] 700. Tooling basket; 710. Accommodation cavity. Detailed implementation manners

[0042] It should be noted that, without conflict, the embodiments in this application and the features in the embodiments can be combined with each other. The following will describe the present utility model in detail with reference to the drawings and in conjunction with the embodiments.

[0043] Please refer to Figures 1 to 16 , the present utility model provides a bipolar plate cleaning device, including: a carrying mechanism 100, the carrying mechanism 100 includes a first carrying platform 110 and a second carrying platform 120, a plurality of first carrying stations 111 are arranged on the first carrying platform 110, and a plurality of second carrying stations 121 are arranged on the second carrying platform 120. Each of the first carrying stations 111 and each of the second carrying stations 121 are respectively used for carrying workpieces to be cleaned; a cleaning mechanism 200, arranged on the side of the carrying mechanism 100, the cleaning mechanism 200 includes a cleaning assembly 210, and the position of the cleaning assembly 210 is movably arranged to clean the first surface of the workpieces to be cleaned on each of the first carrying stations 111, and / or clean the second surface of the workpieces to be cleaned on each of the second carrying stations 121; a transfer mechanism 300, movably arranged along a predetermined trajectory, the transfer mechanism 300 is used for sucking the workpieces to be cleaned and driving the workpieces to be cleaned to move; a flipping assembly 400, a flipping platform 410 is arranged on the flipping assembly 400, the flipping platform 410 is rotatably arranged around a predetermined axis, a plurality of flipping stations 411 are arranged on the flipping platform 410, after the transfer mechanism 300 transfers the workpieces to be cleaned on the first carrying station 111 to the flipping stations 411 for flipping, the workpieces to be cleaned are transferred to the second carrying station 121 for cleaning.

[0044] According to the bipolar plate cleaning device provided by the present utility model, it includes a carrying mechanism 100, a cleaning mechanism 200, a transfer mechanism 300 and a flipping assembly 400. The carrying mechanism 100 includes a first carrying platform 110 and a second carrying platform 120. A plurality of first carrying stations 111 are arranged on the first carrying platform 110, and a plurality of second carrying stations 121 are arranged on the second carrying platform 120. Each of the first carrying stations 111 and each of the second carrying stations 121 are respectively used for carrying workpieces to be cleaned. The cleaning mechanism 200 is arranged on the side of the carrying mechanism 100. The cleaning mechanism 200 includes a cleaning assembly 210. The position of the cleaning assembly 210 is movably arranged to clean the first surface of the workpieces to be cleaned on each of the first carrying stations 111, and / or to clean the second surface of the workpieces to be cleaned on each of the second carrying stations 121. The transfer mechanism 300 is movably arranged along a predetermined trajectory. The transfer mechanism 300 is used to suck the workpieces to be cleaned and drive the workpieces to be cleaned to move. A flipping platform 410 is arranged on the flipping assembly 400. The flipping platform 410 is rotatably arranged around a predetermined axis. A plurality of flipping stations 411 are arranged on the flipping platform 410. After the transfer mechanism 300 transfers the workpieces to be cleaned on the first carrying stations 111 to the flipping stations 411 for flipping, the workpieces to be cleaned are transferred to the second carrying stations 121 for cleaning. With such an arrangement, multiple first carrying stations 111 can be utilized to simultaneously clean the first surfaces of multiple workpieces to be cleaned. After each workpiece to be cleaned is flipped by the flipping assembly 400, multiple second carrying stations 121 are utilized to simultaneously clean the second surfaces of multiple workpieces to be cleaned, enabling multiple workpieces to be cleaned simultaneously and improving the cleaning efficiency of the workpieces to be cleaned.

[0045] Specifically, the bipolar plate cleaning device further includes a first positioning assembly 500, and the first positioning assembly 500 includes: a plurality of first trays 510, on each of which there are provided a first positioning baffle 511 and a second positioning baffle 512 that are connected to each other. There is a first included angle between the first positioning baffle 511 and the second positioning baffle 512, and the workpiece to be cleaned is blocked by the first positioning baffle 511 and the second positioning baffle 512 respectively; a first movable end plate 520, arranged on the side of the first tray 510 away from the first positioning baffle 511, and the first movable end plate 520 is movably arranged along the direction of approaching or departing from the first positioning baffle 511 to push the workpiece to be cleaned into contact with the first positioning baffle 511; a second movable end plate 530, arranged on the side of the first tray 510 away from the second positioning baffle 512, and the second movable end plate 530 is movably arranged along the direction of approaching or departing from the second positioning baffle 512 to push the workpiece to be cleaned into contact with the second positioning baffle 512; wherein, after each workpiece to be cleaned is positioned in each first tray 510, the transfer mechanism 300 transfers each workpiece to be cleaned to the corresponding first loading station 111. In this application, the workpiece to be cleaned is a graphite bipolar plate with a rectangular structure. In order to ensure that each bipolar plate can be accurately placed on each first loading station 111, the first tray 510 is used to position the bipolar plate to determine the center position of the bipolar plate. Preferably, the height of the first positioning baffle 511 and the height of the second positioning baffle 512 are twice the thickness of the bipolar plate.

[0046] Further, a plurality of fourth suction cups 112 are respectively arranged on each first loading station 111. The bipolar plates are fixed on each first loading station 111 through the fourth suction cups 112. A fourth light-transmitting hole 114 is also arranged on each first loading station 111. A fourth photoelectric sensor 113 is respectively arranged on the bottom surface of each first loading station 111. Whether there is a bipolar plate on each first loading station 111 is detected through each fourth photoelectric sensor 113. Each first loading station 111 is of a disk structure and is fixed on a third fixing plate 115 through a third vertical frame 117. The disk structures are arranged in parallel. The height of the flanging around each disk is the same as the thickness of the bipolar plate. The surface of each disk structure can just accommodate a bipolar plate of a specific model. The fourth suction cups 112 are evenly embedded at the positions where the four sides of each disk structure approach the center. The third fixing plate 115 is an aluminum alloy base. Each third vertical frame 117 includes a plurality of aluminum alloy support columns. A plurality of third fixing holes 116 are arranged on the third fixing plate 115. Each aluminum alloy support column can be selectively inserted into any one of the plurality of third fixing holes 116, so as to adjust the size of the third vertical frame 117 to adapt to disk structures of different sizes, and thus adapt to bipolar plates of different sizes. Similarly, a plurality of fifth suction cups 122 are respectively arranged on each second loading station 121. The bipolar plates are fixed on each second loading station 121 through the fifth suction cups 122. A fifth light-transmitting hole 124 is also arranged on each second loading station 121. A fifth photoelectric sensor is respectively arranged on the bottom surface of each second loading station 121. Whether there is a bipolar plate on each second loading station 121 is detected through each fifth photoelectric sensor. Each second loading station 121 is of a disk structure and is fixed on a fourth fixing plate 125 through a fourth vertical frame 123. The disk structures are arranged in parallel. The height of the flanging around each disk structure is the same as the thickness of the bipolar plate. The surface of each disk structure can just accommodate a bipolar plate of a specific model. The fifth suction cups 122 are evenly embedded at the positions where the four sides of each disk structure approach the center. The fourth fixing plate 125 is an aluminum alloy base. Each fourth vertical frame 123 includes a plurality of aluminum alloy support columns. A plurality of fourth fixing holes 126 are arranged on the fourth fixing plate 125. Each aluminum alloy support column can be selectively inserted into any one of the plurality of fourth fixing holes 126, so as to adjust the size of the fourth vertical frame 123 to adapt to disk structures of different sizes, and thus adapt to bipolar plates of different sizes. Preferably, the diameter of the aluminum alloy support column is 6 mm, and threads are arranged at both ends, which are respectively connected to the disk structure and the third fixing hole 116 or the fourth fixing hole 126.

[0047] During the transportation of bipolar plates in the tooling basket 700, due to reasons such as shaking, the intervals between each bipolar plate and the inner wall of the accommodating cavity 710 are unequal, that is, misalignment occurs between the stacked bipolar plates. Therefore, if directly placed on the first loading station 111, the bipolar plates cannot be completely placed on the first loading station 111 due to inaccurate positioning. Therefore, the first positioning component 500 is used to find the center position of the bipolar plate. In the control program of the transfer mechanism 300, the coordinates of the center position of the first tray 510 are preset in advance. When the first moving end plate 520 and the second moving end plate 530 respectively push the bipolar plate to fit with the first positioning baffle 511 and the second positioning baffle 512, at this time, the center position of the bipolar plate is the same as the center position of the first tray 510, so that the transfer mechanism 300 can directly suck the center position of the bipolar plate during the grasping process.

[0048] In the specific implementation process, each first tray 510 is provided with a first light-transmitting hole 513, and a first photoelectric sensor 514 is arranged on the bottom surface of each first tray 510. The first photoelectric sensor 514 is opposite to the first light-transmitting hole 513, and it is detected whether a bipolar plate is placed on the first tray 510 through the first photoelectric sensor 514; a first driving cylinder 521 and a second driving cylinder 531 are also arranged on the bottom surface of each first tray 510. The first driving cylinder 521 is drivingly connected to the first moving end plate 520, and the first moving end plate 520 is driven to move through the first driving cylinder 521. The second driving cylinder 531 is drivingly connected to the second moving end plate 530, and the second moving end plate 530 is driven to move through the second driving cylinder 531. Each first tray 510 is fixed on the first fixing plate 540 through a first vertical frame 550. The first vertical frame 550 includes four columns, and the four columns are respectively arranged at intervals along the circumferential direction of the first tray 510. A plurality of first fixing holes 541 are arranged on the first fixing plate 540, and the four columns can be selectively inserted into any four of the plurality of first fixing holes 541 to adjust the distance between the four columns to adapt to first trays 510 of different sizes and position bipolar plates of different sizes.

[0049] Further, the bipolar plate cleaning device further includes a second positioning assembly 600. The second positioning assembly 600 includes: a positioning platform 610, which is movably arranged along the horizontal and vertical directions respectively. The positioning platform 610 moves below the flipping platform 410 and moves towards the direction close to the flipping platform 410 to carry each workpiece to be cleaned at the flipping station 411. The transfer mechanism 300 transfers the workpiece to be cleaned on the positioning platform 610 to each second bearing station 121. After the bipolar plate is flipped by the flipping platform 410, in order to re-find the center position of the bipolar plate, after the flipped bipolar plate is received by the second positioning assembly 600, the bipolar plate is re-positioned. A plurality of third suction cups 420 are arranged on the flipping platform 410. The end of the flipping platform 410 is connected to the flipping motor 430. The flipping platform 410 is driven to flip by the flipping motor 430. A third light-transmitting hole 441 is arranged at each flipping station 411. A third photoelectric sensor 440 is arranged on one side of each flipping station 411 away from the mounting end face of the third suction cup 420 to detect whether there is a bipolar plate at each flipping station 411. Among them, the flipping motor is a servo motor with a reducer, and the flipping platform 410 is detachably connected to the flipping motor.

[0050] Specifically, the second positioning assembly 600 further includes: a slide rail 620, on which a slider 621 is arranged. The positioning platform 610 is connected to the slider 621, and the slider 621 drives the positioning platform 610 to be movably arranged along the extending direction of the slide rail 620; a lifting member 630, arranged on the slider 621 and connected to the positioning platform 610, and at least part of the lifting member 630 is movably arranged along the vertical direction to drive the positioning platform 610 to lift. A horizontal driving member 690 is arranged at the end of the slide rail 620 to drive the slide rail 620 to drive the slider 621 to move. Such a setting can utilize the cooperation of the slide rail 620 and the slider 621 to move the positioning platform 610 below the flipping platform 410, and then the lifting member 630 pushes the positioning platform 610 upward until the positioning platform 610 is docked with the flipping platform 410. After that, the third suction cup 420 on the flipping platform 410 is released, and the bipolar plate falls onto the positioning platform 610 under the action of gravity.

[0051] Further, the second positioning component 600 further includes: a plurality of second trays 640, the positioning platform 610 is arranged inside the second trays 640, and a third positioning baffle 641 and a fourth positioning baffle 642 which are connected to each other are arranged on each second tray 640. There is a second included angle between the third positioning baffle 641 and the fourth positioning baffle 642, and the workpiece to be cleaned is blocked by the third positioning baffle 641 and the fourth positioning baffle 642 respectively; a third moving end plate 650 is arranged on the side of the second tray 640 away from the third positioning baffle 641, and the third moving end plate 650 is movably arranged along the direction of approaching or departing from the third positioning baffle 641 to push the workpiece to be cleaned to fit with the third positioning baffle 641; a fourth moving end plate 660 is arranged on the side of the second tray 640 away from the fourth positioning baffle 642, and the fourth moving end plate 660 is movably arranged along the direction of approaching or departing from the fourth positioning baffle 642 to push the workpiece to be cleaned to fit with the fourth positioning baffle 642. After the positioning platform 610 receives the bipolar plate, the lifting component 630 retracts, and the positioning platform 610 horizontally moves out from below the flipping platform 410, and then the third moving end plate 650 and the fourth moving end plate 660 are used to position the bipolar plate.

[0052] Wherein, each second tray 640 is connected to the second fixing plate 670 through a second vertical frame 680. The second vertical frame 680 includes four columns which are arranged along the circumferential direction of the second tray 640. A plurality of second fixing holes 671 are arranged on the second fixing plate 670, and each column can be selectively inserted into any four of the plurality of second fixing holes 671 to support the second tray 640, so that the four columns can adapt to second trays 640 of different sizes and position bipolar plates of different sizes.

[0053] In the embodiment provided by the present utility model, the cleaning assembly 210 includes: a first cleaning brush group 211, arranged on the side of the first bearing platform 110, the first cleaning brush group 211 includes a plurality of first cleaning brushes 2110, and the plurality of first cleaning brushes 2110 are arranged in one-to-one correspondence with the plurality of first bearing stations 111; a first driving component 212, at least part of the first driving component 212 is telescopically arranged, the driving end of the first driving component 212 is respectively connected to each first cleaning brush 2110, and each first cleaning brush 2110 is driven to move simultaneously through each first driving component 212 so as to clean the first surface of each workpiece to be cleaned. Preferably, the first driving component 212 is an electric push rod or a cylinder, which drives each first cleaning brush 2110 to expand and contract, so as to clean the first surfaces of a plurality of bipolar plates simultaneously. Wherein, the first driving component 212 is arranged on the third support frame 215, a third strip-shaped hole 216 is arranged on the third support frame 215, the third strip-shaped hole 216 extends in the vertical direction, a third locking component 217 passes through the third strip-shaped hole 216 and is connected to the first driving component 212, the third locking component 217 is a locking bolt, and the locking bolt drives the first driving component 212 to be movably arranged along the extending direction of the third strip-shaped hole 216, and the first driving component 212 is fixed under the action of frictional force by fitting the locking bolt with the surface of the third support frame 215, so as to adjust the height of the first driving component 212 and ensure that each first cleaning brush 2110 is in contact with the first surface of the bipolar plate. Preferably, the first driving component 212 is an adjustable-speed cylinder, and each first cleaning brush 2110 is connected to the end of the telescopic rod of the adjustable-speed cylinder through a threaded sleeve by a first bracket, and the first bracket is made of aluminum alloy material.

[0054] Furthermore, the cleaning assembly 210 includes: a second cleaning brush group 213, arranged on the side of the second bearing platform 120, the second cleaning brush group 213 includes a plurality of second cleaning brushes 2130, and the plurality of second cleaning brushes 2130 are arranged in one-to-one correspondence with the plurality of second bearing stations 121; a second driving component 214, at least part of the second driving component 214 is telescopically arranged, the driving end of the second driving component 214 is respectively connected to each second cleaning brush 2130, and each second cleaning brush 2130 is driven to move simultaneously through the second driving component 214 so as to clean the second surface of each workpiece to be cleaned. Preferably, the second driving component 214 is an adjustable-speed cylinder, which drives each second cleaning brush 2130 to expand and contract, so as to clean the second surfaces of a plurality of bipolar plates simultaneously, and each second cleaning brush 2130 is connected to the end of the telescopic rod of the adjustable-speed cylinder through a threaded sleeve by a second bracket, and the second bracket is made of aluminum alloy material.

[0055] In specific implementation, the cleaning mechanism 200 further includes a first purging assembly 220. The first purging assembly 220 includes: a first support frame 222 disposed on the side of the first carrying platform 110; a first nozzle 221 disposed on the first support frame 222. The first nozzle 221 faces the first carrying station 111 to blow air onto the surface of the workpiece to be cleaned. The first nozzle 221 is movably disposed in the vertical direction; there are multiple first nozzles 221, and the multiple first nozzles 221 are disposed corresponding to the multiple first carrying stations 111. Among them, two first nozzles 221 are in a group and disposed on the first mounting plate 223. Each first carrying station 111 corresponds to two first nozzles 221. A plurality of first strip-shaped holes 225 are provided on the first support frame 222. The first strip-shaped holes 225 extend along the length direction of the first support frame 222. Each first mounting plate 223 is installed on the first support frame 222 by cooperating with the first strip-shaped holes 225 through a first locking member 224. The first locking member 224 passes through the first strip-shaped hole 225 and then connects to the first mounting plate 223. The first mounting plate 223 is driven by the first locking member 224 to move in the vertical direction to adjust the height of each first nozzle 221. Preferably, the first locking member 224 is a locking bolt.

[0056] Further, the cleaning mechanism 200 further includes a second purging assembly 230. The second purging assembly 230 includes: a second support frame 232 disposed on the side of the second carrying platform 120; a second nozzle 231 disposed on the second support frame 232. The second nozzle 231 faces the second carrying station 121 to blow air onto the surface of the workpiece to be cleaned. The second nozzle 231 is movably disposed in the vertical direction; there are multiple second nozzles 231, and the multiple second nozzles 231 are disposed corresponding to the multiple second carrying stations 121. Among them, two second nozzles 231 are in a group and disposed on the second mounting plate. Each second carrying station 121 corresponds to two second nozzles 231. Each second mounting plate is disposed on the second support frame 232. A plurality of second strip-shaped holes are provided on the second support frame 232. The second locking member passes through the second strip-shaped hole and then connects to the second mounting plate. The second mounting plate is driven by the second locking member to move in the vertical direction and locked at a predetermined height position to adjust the height of each second nozzle 231.

[0057] The transfer mechanism 300 includes: a first robotic arm 310, on which a plurality of first suction cups 311 are provided. Multiple workpieces to be cleaned are simultaneously sucked by each of the first suction cups 311, and each workpiece to be cleaned is respectively placed on each first loading station 111; a second robotic arm 320, on which a plurality of second suction cups 321 are provided. Each workpiece to be cleaned on each positioning platform 610 is simultaneously sucked by each of the second suction cups 321, and each workpiece to be cleaned is respectively placed on each second loading station 121. Among them, a first flat plate is provided on the first robotic arm 310, and a plurality of first suction cups 311 are arranged on the first flat plate. The first flat plate is divided into a plurality of first adsorption areas 312, and a plurality of first suction cups 311 are respectively arranged in each first adsorption area. The arrangement of each first adsorption area enables the first robotic arm 310 to simultaneously suck a plurality of bipolar plates. A sixth photoelectric sensor is respectively arranged in each first adsorption area for detecting whether there is a bipolar plate in each first adsorption area 312; similarly, a second flat plate is provided on the second robotic arm 320, and a plurality of second suction cups 321 are arranged on the second flat plate. The second flat plate is divided into a plurality of second adsorption areas 322. The arrangement of each second adsorption area enables the second robotic arm 320 to simultaneously suck a plurality of bipolar plates. A seventh photoelectric sensor is respectively arranged in each second adsorption area for detecting whether there is a bipolar plate in each second adsorption area 322.

[0058] Further, tooling baskets 700 are respectively arranged on the sides of the first robotic arm 310 and the second robotic arm 320. The first robotic arm 310 takes bipolar plates from the tooling basket 700 for cleaning, and the second robotic arm 320 places the cleaned bipolar plates into its corresponding tooling basket 700 to meet the connection of the upstream and downstream processes of the production line.

[0059] In the actual use process, the tooling basket containing bipolar plates is transferred from the upstream process through the roller conveyor line. The three empty baskets of the tooling basket are filled with the same number of graphite bipolar plates. After reaching the loading and cleaning position through photoelectric detection, they are lifted and fixed by the positioning cylinder of the roller conveyor line. Photoelectric switches are installed at the center position of the roller conveyor line at the bottom of the tooling for detecting the presence or absence of the plates. When the incoming tooling basket is fixed in place and the photoelectric detection feedback indicates the presence of materials, the cleaning condition of the graphite plates is met.

[0060] The robotic arm (the first robotic arm 310) simultaneously adsorbs three graphite plates from the tooling basket containing the plates through the suction cups (the first suction cups 311) of the flange tooling. Three photoelectric switches are installed on the suction cup mounting surface of the flange tooling to respectively detect whether the three plates are sucked in place.

[0061] After the manipulator finishes picking up the material, it moves along the arc direction with the axis arm as the radius to directly above the center of the tray of the fixed plate fine positioning device (the first positioning assembly 500). At this time, the positioning blocks (the first movable end plate 520 and the second movable end plate 530) of each part of the tray are in the natural extended state. The manipulator takes the center of each part of the tray as the reference point, gently places the material on the surface of the tray, and after the air in the suction cup is cut off, it returns to directly above the tray again.

[0062] After the fixed plate fine positioning device detects that the three bipolar plates are placed, the movable positioning blocks of each part of the three trays are retracted horizontally towards the center of the platform and then restored to the natural extended state again to achieve the fine positioning of the bipolar plates.

[0063] The manipulator takes the center of the tray after the positioning blocks are retracted in place as the reference point again, re-sucks the plate and continues to move along the arc direction of the manipulator axis arm to directly above the tray of the cleaning platform (the first bearing platform 110). The manipulator takes the center of each part of the tray of the cleaning platform as the reference point and gently places the plate on the surface of the tray. After the suction cups on the bottom planes of the three trays of the cleaning platform are opened to suck air and catch the plate, the suction of the flange tooling suction cup of the manipulator is cut off and it moves to the diagonal upper part of the tray to make room for the cleaning mechanism.

[0064] After the cleaning mechanism adjusts the height in place through the cylinder fixed bracket (adjusts the first driving component 212 to the specified height through the third locking part 217), the system issues an instruction to the cylinder to make it perform the extending and retracting actions, thereby driving the plate brush bracket and the three plate brushes (the first cleaning brush 2110) fixedly installed at the head of the bracket to clean back and forth on the upper surfaces of the three graphite plates for two rounds. Since a speed-regulating cylinder is used, the most suitable working speed of the cylinder telescopic rod can be found through repeated tests, so as to achieve the optimal cleaning effect.

[0065] After the upper surface of the plate is cleaned, when the manipulator adsorbs the plate and transfers it to the flat tray of the plate flipping device, the plate air blowing starts for three seconds and then automatically stops (the first nozzle is opened). The purpose is to blow away the graphite powder and other impurities brushed off the platform. At this time, the flat tray (flipping platform) of the plate flipping device is horizontally upward. When the plate adsorbed by the manipulator is gently placed on the flat surface of the tray, the embedded suction cups in the three corresponding rectangular areas of the tray are opened to suck air and catch the three plates respectively. At the same time, the suction of the manipulator suction cup is cut off and it withdraws to start the next round of material picking.

[0066] After the planar tray of the plate flipping device detects that the plate is adsorbed and in place, it will rotate 180° clockwise along the central axis. At this time, the positioning blocks (the third moving end plate 650 and the fourth moving end plate 660) of each part of the tray of the mobile plate fine positioning device (the second positioning component) are in the natural extended state. The mobile plate fine positioning device moves along the slide rail under the action of the horizontal servo shaft to the position directly below the planar tray that has completed a 180° flip. Then, under the action of the vertical servo shaft (the lifting component), the tray of the plate fine positioning device rises steadily until it is close to the graphite plate that has completed a 180° flip. After the suction cups on the tray of the flipping device stop sucking air, the three plates naturally and gently fall into the three rectangular areas of the tray of the plate fine positioning device.

[0067] Under the action of the vertical servo shaft, the tray of the plate fine positioning device steadily descends to the initial height position. After detecting that the three plates are in place, it moves along the slide rail to the initial horizontal position under the action of the horizontal servo shaft. The planar tray of the plate flipping device will rotate 180° counterclockwise along the central axis to return to the initial position. The positioning blocks of each part of the three trays of the mobile plate fine positioning device are retracted horizontally towards the center of the platform and then return to the natural extended state again to achieve the fine positioning of the bipolar plate.

[0068] Another manipulator (the second robotic arm 320) will place the plate on the plate cleaning platform on the right side in the same way after the bipolar plate fine positioning is completed, so as to complete the cleaning of the other side of the bipolar plate. After the bipolar plate cleaning is completed, the manipulator will place the cleaned plate into the blanking tooling basket, thus completing the cleaning of the graphite bipolar plate.

[0069] In the actual production and manufacturing process, we must consider the influence of the processing accuracy of the tooling basket for holding the graphite bipolar plate. Especially, the size of the gap between each tooling basket and the plate needs to be kept within a specific range to meet the normal use of the bipolar plate positioning device.

[0070] As described above is the process of the device for realizing the cleaning of the graphite plate. The device proposes a method of cleaning the graphite bipolar plate by cleaning the front and back sides separately. The plate positioning tray, the rotating device tray, and the cleaning platform tray of the device only need to be disassembled and replaced to meet the use requirements of automatic cleaning of graphite plates of different sizes and models, so it has high versatility.

[0071] From the above description, it can be seen that the above embodiments of the present utility model achieve the following technical effects:

[0072] According to the bipolar plate cleaning device provided by the present utility model, it includes a carrying mechanism 100, a cleaning mechanism 200, a transfer mechanism 300 and a flipping assembly 400. The carrying mechanism 100 includes a first carrying platform 110 and a second carrying platform 120. A plurality of first carrying stations 111 are arranged on the first carrying platform 110, and a plurality of second carrying stations 121 are arranged on the second carrying platform 120. Each of the first carrying stations 111 and each of the second carrying stations 121 are respectively used for carrying workpieces to be cleaned. The cleaning mechanism 200 is arranged on the side of the carrying mechanism 100. The cleaning mechanism 200 includes a cleaning assembly 210. The position of the cleaning assembly 210 is movably arranged to clean the first surface of the workpieces to be cleaned on each of the first carrying stations 111, and / or to clean the second surface of the workpieces to be cleaned on each of the second carrying stations 121. The transfer mechanism 300 is movably arranged along a predetermined trajectory. The transfer mechanism 300 is used to suck the workpieces to be cleaned and drive the workpieces to be cleaned to move. A flipping platform 410 is arranged on the flipping assembly 400. The flipping platform 410 is rotatably arranged around a predetermined axis. A plurality of flipping stations 411 are arranged on the flipping platform 410. After the transfer mechanism 300 transfers the workpieces to be cleaned on the first carrying stations 111 to the flipping stations 411 for flipping, the workpieces to be cleaned are transferred to the second carrying stations 121 for cleaning. With such an arrangement, multiple first carrying stations 111 can be utilized to simultaneously clean the first surfaces of multiple workpieces to be cleaned. After using the flipping assembly 400 to flip each workpiece to be cleaned, multiple second carrying stations 121 are utilized to simultaneously clean the second surfaces of multiple workpieces to be cleaned, enabling multiple workpieces to be cleaned simultaneously and improving the cleaning efficiency of the workpieces to be cleaned.

[0073] The above are only the preferred embodiments of the present utility model and are not intended to limit the present utility model. For those skilled in the art, the present utility model can have various changes and modifications. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present utility model shall be included within the protection scope of the present utility model.

Claims

1. A bipolar plate cleaning device, characterized in that: include: A carrying mechanism (100), the carrying mechanism (100) comprising a first carrying platform (110) and a second carrying platform (120), the first carrying platform (110) being provided with a plurality of first carrying stations (111), the second carrying platform (120) being provided with a plurality of second carrying stations (121), each of the first carrying stations (111) and each of the second carrying stations (121) being respectively used for carrying a workpiece to be cleaned; A cleaning mechanism (200) is arranged on the side of the carrying mechanism (100), the cleaning mechanism (200) comprising a cleaning assembly (210), the cleaning assembly (210) being movably arranged to clean the first surface of the workpiece to be cleaned on each of the first carrying stations (111), and / or to clean the second surface of the workpiece to be cleaned on each of the second carrying stations (121); A transfer mechanism (300) is movably arranged along a predetermined track, and the transfer mechanism (300) is used to absorb the workpiece to be cleaned and drive the workpiece to be cleaned to move; A turning assembly (400), wherein a turning platform (410) is arranged on the turning assembly (400), the turning platform (410) is arranged to be turnable around a predetermined axis, a plurality of turning stations (411) are arranged on the turning platform (410), and the transfer mechanism (300) transfers the workpiece to be cleaned on the first carrying station (111) to the turning station (411) for turning, and then transfers the workpiece to be cleaned to the second carrying station (121) for cleaning.

2. The bipolar plate cleaning device according to claim 1, characterized in that: The bipolar plate cleaning device further comprises a first positioning assembly (500), wherein the first positioning assembly (500) comprises: A plurality of first trays (510), each of the first trays (510) being provided with a first positioning baffle (511) and a second positioning baffle (512) which are connected to each other, a first angle being formed between the first positioning baffle (511) and the second positioning baffle (512), and the workpiece to be cleaned being blocked by the first positioning baffle (511) and the second positioning baffle (512); a first movable end plate (520) disposed on a side of the first tray (510) away from the first positioning baffle (511), the first movable end plate (520) being movably disposed in a direction approaching or away from the first positioning baffle (511) so as to push the workpiece to be cleaned to fit the first positioning baffle (511); a second movable end plate (530) disposed on a side of the first tray (510) away from the second positioning baffle (512), the second movable end plate (530) being movably disposed in a direction approaching or away from the second positioning baffle (512) so as to push the workpiece to be cleaned to fit the second positioning baffle (512); After each of the workpieces to be cleaned is positioned in each of the first trays (510), the transfer mechanism (300) transfers each of the workpieces to be cleaned to the corresponding first carrying station (111).

3. The bipolar plate cleaning device according to claim 1, characterized in that: The bipolar plate cleaning device further comprises a second positioning assembly (600), wherein the second positioning assembly (600) comprises: A positioning platform (610), wherein the positioning platform (610) is movably arranged in the horizontal direction and the vertical direction respectively, and the positioning platform (610) moves to the bottom of the flipping platform (410) and moves in a direction close to the flipping platform (410) to carry each of the workpieces to be cleaned on the flipping station (411), and the transfer mechanism (300) transfers the workpieces to be cleaned on the positioning platform (610) to each of the second carrying stations (121).

4. The bipolar plate cleaning device according to claim 3, characterized in that: The second positioning component (600) further includes: A slide rail (620), wherein a slider (621) is disposed on the slide rail (620), the positioning platform (610) is connected to the slider (621), and the slider (621) drives the positioning platform (610) to be movably disposed along an extension direction of the slide rail (620); A lifting component (630) is arranged on the sliding block (621) and connected to the positioning platform (610); at least a portion of the lifting component (630) is movably arranged in a vertical direction to drive the positioning platform (610) to rise and fall.

5. The bipolar plate cleaning device according to claim 3, characterized in that: The second positioning component (600) further includes: A plurality of second trays (640), wherein the positioning platform (610) is arranged in the second tray (640), and each second tray (640) is provided with a third positioning baffle (641) and a fourth positioning baffle (642) which are connected to each other, and a second included angle is formed between the third positioning baffle (641) and the fourth positioning baffle (642), and the workpiece to be cleaned is blocked by the third positioning baffle (641) and the fourth positioning baffle (642) respectively; a third movable end plate (650) disposed on a side of the second tray (640) away from the third positioning baffle (641), the third movable end plate (650) being movably disposed in a direction approaching or away from the third positioning baffle (641) so as to push the workpiece to be cleaned to fit the third positioning baffle (641); A fourth movable end plate (660) is arranged on a side of the second tray (640) away from the fourth positioning baffle (642), and the fourth movable end plate (660) is movably arranged in a direction approaching or away from the fourth positioning baffle (642) to push the workpiece to be cleaned to fit the fourth positioning baffle (642).

6. The bipolar plate cleaning device according to claim 1, characterized in that: The cleaning component (210) comprises: A first cleaning brush group (211) is arranged on the side of the first carrying platform (110), the first cleaning brush group (211) comprising a plurality of first cleaning brushes (2110), the plurality of first cleaning brushes (2110) being arranged in one-to-one correspondence with the plurality of first carrying stations (111); A first driving component (212), at least a portion of which is telescopically arranged, a driving end of the first driving component (212) is respectively connected to each of the first cleaning brushes (2110), and each of the first driving components (212) drives each of the first cleaning brushes (2110) to move simultaneously, so as to clean the first surface of each of the workpieces to be cleaned.

7. The bipolar plate cleaning device according to claim 1, characterized in that: The cleaning component (210) comprises: A second cleaning brush group (213) is arranged on the side of the second carrying platform (120), the second cleaning brush group (213) comprising a plurality of second cleaning brushes (2130), the plurality of second cleaning brushes (2130) being arranged in a one-to-one correspondence with the plurality of second carrying stations (121); A second driving component (214), at least a portion of which is telescopically arranged, a driving end of the second driving component (214) is respectively connected to each of the second cleaning brushes (2130), and the second driving component (214) drives each of the second cleaning brushes (2130) to move simultaneously, so as to clean the second surface of each of the workpieces to be cleaned.

8. The bipolar plate cleaning device according to claim 1, characterized in that: The cleaning mechanism (200) further comprises a first purge component (220), wherein the first purge component (220) comprises: A first support frame (222) is arranged on the side of the first bearing platform (110); a first blowing nozzle (221) disposed on the first supporting frame (222), the first blowing nozzle (221) being disposed toward the first carrying station (111) so as to blow air toward the surface of the workpiece to be cleaned, the first blowing nozzle (221) being movably disposed in a vertical direction; There are a plurality of the first blowing nozzles (221), and the plurality of the first blowing nozzles (221) are arranged corresponding to the plurality of the first carrying stations (111).

9. The bipolar plate cleaning device according to claim 1, characterized in that: The cleaning mechanism (200) further comprises a second purge assembly (230), wherein the second purge assembly (230) comprises: A second support frame (232) is arranged on the side of the second bearing platform (120); a second blowing nozzle (231) disposed on the second supporting frame (232), the second blowing nozzle (231) being disposed toward the second carrying station (121) so as to blow air toward the surface of the workpiece to be cleaned, the second blowing nozzle (231) being movably disposed in a vertical direction; There are a plurality of the second blowing nozzles (231), and the plurality of the second blowing nozzles (231) are arranged corresponding to the plurality of the second carrying stations (121).

10. The bipolar plate cleaning device according to claim 3, characterized in that: The transfer mechanism (300) comprises: a first mechanical arm (310), wherein a plurality of first suction cups (311) are provided on the first mechanical arm (310), and a plurality of workpieces to be cleaned are simultaneously sucked up by each of the first suction cups (311), and each of the workpieces to be cleaned is respectively placed on each of the first carrying stations (111); A second robotic arm (320), wherein a plurality of second suction cups (321) are provided on the second robotic arm (320), and each of the workpieces to be cleaned on each of the positioning platforms (610) is simultaneously sucked up by each of the second suction cups (321), and each of the workpieces to be cleaned is respectively placed on each of the second carrying stations (121).

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