Pulse ion plating nitride coating composite ta-C and aluminum oxide coating deposition equipment

Abstract

The utility model discloses pulse ion plating nitride coating composite ta-C and aluminum oxide coating deposition equipment which comprises an equipment shell, a vacuumizing device and an argon injection device, a vacuum chamber is arranged in the equipment shell; a plurality of ion source devices positioned in different horizontal directions are mounted on the equipment shell, and the ion source devices are communicated with the vacuum chamber; a vacuumizing device and an argon injection device are fixedly mounted on the equipment shell; the vacuumizing device and the argon injection device are both communicated with the vacuum chamber; a base material fixing device is rotationally mounted on the equipment shell and is driven by a motor fixedly mounted on the equipment shell; the base material fixing device is located at the center position in the vacuum chamber; the ion source devices are installed in the multiple horizontal directions of the square cabin and the equipment shell, coating preparation can be conducted on base materials in sequence, and therefore preparation of nitride coating composite ta-C and aluminum oxide coatings is completed.

Description

Technical Field

[0001] The utility model relates to the technical field of coating preparation, in particular to a pulsed ion plating nitride coating composite ta-C and alumina coating deposition equipment. Background Art

[0002] In modern industry, coating technology is widely used in fields such as tools, mechanical parts, electronic components, and aerospace to improve the hardness, wear resistance, corrosion resistance, and other properties of materials. Among them, the demand for coatings with high strength and high toughness is increasing day by day, especially composite coatings, which can maintain good toughness while providing high hardness, thus performing excellently under various extreme working conditions. For example, the composite of nitride coating, ta-C, and alumina coating not only has characteristics such as higher hardness, wear resistance, corrosion resistance, high temperature resistance, and low friction coefficient, but also the synergistic effect between each coating can more effectively protect the substrate and extend the service life of the product.

[0003] The prior art CN204298452U discloses a microwave pulse plasma vacuum coating device, including: a machine base provided with a first vacuum chamber and a second vacuum chamber, a "Y"-shaped vacuum pipeline, and two or more sealed microwave covers. The bottoms of the first vacuum chamber and the second vacuum chamber are respectively provided with a first air extraction port and a second air extraction port. The first upper end interface and the second upper end interface of the vacuum pipeline are respectively connected to the first air extraction port and the second air extraction port, and the lower end interface of the vacuum pipeline is connected to a vacuum pump. The sealed microwave covers are arranged on the top surface of the machine base and are respectively communicated with the first vacuum chamber or the second vacuum chamber. It improves the consistency of the vacuum degree between each sealed microwave cover and the uniformity of the vacuum degree inside a single sealed microwave cover, thereby ensuring the uniformity of the film layer of the workpiece, simplifying the structure of the coating device, saving costs, and saving space. Although this solution can complete the coating of the substrate, there are still certain deficiencies; first, this solution can only perform a single-layer coating on the substrate and cannot adjust the position of the substrate according to needs, which cannot meet the production requirements; second, there is only one mode for pulsed coating in this solution and it cannot be adjusted according to the different materials of the substrate and the target, which affects the quality of the coating; finally, there is a lack of a filtering device, and target particles will be generated during the coating process of the target on the substrate. The attachment of the target particles on the surface of the substrate will affect the coating effect and result in uneven coating.

[0004] Therefore, it is necessary to design a pulsed ion plating nitride coating composite ta-C and alumina coating deposition equipment to solve the above problems. Summary of the Utility Model

[0005] The utility model overcomes the deficiencies of the prior art and provides a pulsed ion plating nitride coating composite ta-C and alumina coating deposition equipment.

[0006] To achieve the above object, the technical solution adopted by the present utility model is as follows: A pulsed ion plating nitride coating composite ta-C and alumina coating deposition equipment, comprising: an equipment housing, a vacuum pumping device, an argon injection device, and a control device;

[0007] A vacuum chamber is provided inside the equipment housing; A plurality of ion source devices located in different horizontal directions are installed on the equipment housing, and the ion source devices are communicated with the vacuum chamber;

[0008] The vacuum pumping device and the argon injection device are fixedly installed on the equipment housing; Both the vacuum pumping device and the argon injection device are communicated with the vacuum chamber;

[0009] A substrate fixing device is rotatably installed on the equipment housing and is driven by a motor fixedly installed on the equipment housing; The substrate fixing device is located at the central position inside the vacuum chamber and corresponds to a plurality of ion source devices;

[0010] The control device is used to control the operation of the entire pulsed ion plating nitride coating composite ta-C and alumina coating deposition equipment except itself.

[0011] In a preferred embodiment of the present utility model, the substrate fixing device includes: a placement plate, clamping plates, and a cylinder; The placement plate is rotatably installed on the equipment housing and is driven by a motor fixedly installed on the equipment housing; The placement plate is located at the central position inside the vacuum chamber and corresponds to a plurality of ion source devices;

[0012] A groove is provided inside the placement plate; Two clamping plates are symmetrically and horizontally slidably installed in the groove and are respectively driven by two cylinders fixedly installed on the placement plate.

[0013] In a preferred embodiment of the present utility model, there are multiple clamping plates with different shapes and they can be replaced to fix substrates with different shapes.

[0014] In a preferred embodiment of the present utility model, a feeding frame is provided on one side of the equipment housing; A door handle is installed on the feeding frame to facilitate the opening and closing of the feeding frame.

[0015] In a preferred embodiment of the present utility model, a plurality of ion source devices in different horizontal directions are provided in the vertical direction to coat substrates of different sizes.

[0016] In a preferred embodiment of the present utility model, the pulsed arc modes in the ion source devices in different horizontal directions are different.

[0017] In a preferred embodiment of the present utility model, a cabin is fixedly installed on the equipment housing; the cabin and the ion source device installed on the equipment housing are in different horizontal directions; one end of the cabin is communicated with the vacuum chamber, and a plurality of ion source devices are fixedly installed at the other end in the vertical direction; a baffle is fixedly installed in the cabin; the baffle is located between the ion source device on the cabin and the vacuum chamber.

[0018] In a preferred embodiment of the present utility model, the baffle is provided with filtering holes; the filtering holes are used to isolate the target particles generated by the ion source device in the cabin.

[0019] In a preferred embodiment of the present utility model, the cabin can be replaced with a straight tube cabin; a plurality of the straight tube cabins are fixedly installed on the equipment housing and are in different horizontal directions from the ion source device installed on the equipment housing; the plurality of straight tube cabins are located in the same vertical plane; one end of each straight tube cabin is communicated with the vacuum chamber, and an ion source device is fixedly installed at the other end; a baffle is fixedly installed in each straight tube cabin; the baffle is located between the ion source device and the vacuum chamber.

[0020] In a preferred embodiment of the present utility model, a heating wire is fixedly installed on the equipment housing, and the heating wire is located in the vacuum chamber.

[0021] The present utility model solves the defects in the background technology, and the present utility model has the following beneficial effects:

[0022] (1) The present utility model provides a pulsed ion plating nitride coating composite ta-C and alumina coating deposition equipment. By installing ion source devices in multiple horizontal directions of the cabin and the equipment housing, the equipment can sequentially prepare coatings on the substrate, thereby completing the preparation of the nitride coating composite ta-C and alumina coatings.

[0023] (2) The pulsed arc modes in the ion source devices in multiple horizontal directions of the equipment of the present utility model are different, and the process parameters and mode selection can be flexibly adjusted according to the specific requirements of the coating, so as to achieve precise control of the coating performance.

[0024] (3) By replacing the clamping plate in the substrate fixing device of the present utility model, substrates of different shapes can be fixed, increasing the applicable range of the device.

[0025] (4) By installing baffles in the cabin and the straight tube cabin of the present utility model, the filtering of target ions can be effectively completed, improving the uniformity of the coating film layer. Description of the Drawings

[0026] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings required for the description of the embodiments or the prior art. Obviously, the drawings in the following description are only some embodiments recorded in the present invention. For those of ordinary skill in the art, without creative efforts, other drawings can also be obtained based on these drawings;

[0027] Figure 1 is the overall assembly structure schematic diagram of the present invention;

[0028] Figure 2 is the partial assembly structure schematic diagram of the present invention;

[0029] Figure 3 is the sectional structure schematic diagram of the cabin, ion source device and baffle of the present invention;

[0030] Figure 4 is the assembly structure schematic diagram of the substrate fixing device of the present invention;

[0031] Figure 5 is the overall assembly structure schematic diagram of the present invention equipped with a straight tube cabin.

[0032] In the figure: 1. Equipment shell; 2. Cabin; 3. Ion source device; 4. Heating wire; 5. Motor; 6. Substrate fixing device (601. Placing plate; 602. Clamping plate; 603. Cylinder); 7. Feeding frame; 8. Baffle; 9. Straight tube cabin. Detailed implementation manners

[0033] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the drawings in the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, rather than all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts belong to the scope of protection of the present invention.

[0034] Many specific details are set forth in the following description in order to fully understand the present invention, but the present invention can also be implemented in other ways different from those described herein. Therefore, the scope of protection of the present invention is not limited by the specific embodiments disclosed below.

[0035] As Figures 1-4 shown, a pulsed ion plating nitride coating composite ta-C and alumina coating deposition equipment includes: an equipment shell 1, a vacuum pumping device, an argon injection device and a control device;

[0036] Inside the device housing 1, there is a vacuum chamber; on the device housing 1, ion source devices 3 are installed in three horizontal directions, and in each horizontal direction, three ion source devices 3 are installed vertically; each ion source device 3 is connected to the vacuum chamber; by arranging three ion source devices 3 vertically, it is convenient to prepare coatings for substrates of different sizes;

[0037] On the device housing 1, a vacuum pumping device and an argon injection device (not shown in the drawings) are fixedly installed; both the vacuum pumping device and the argon injection device are connected to the vacuum chamber; the vacuum pumping device is used to pump the vacuum chamber, and the argon injection device is used to inject argon into the vacuum chamber;

[0038] The control device is used to control the operation of the entire pulsed ion plating nitride coating composite ta-C and alumina coating deposition equipment except itself.

[0039] As a specific implementation manner of this embodiment, the internal electromagnetic controllable pulse arc modes of the ion source devices 3 in the three horizontal directions are different; according to specific equipment design, coating requirements, and process parameters, multiple modes are used to prepare coatings in sequence; using multiple modes to prepare coatings can flexibly adjust process parameters and mode selection according to specific coating requirements, so as to achieve precise control of coating performance. At the same time, it also helps to reduce the complexity and control difficulty of the equipment.

[0040] As a specific implementation manner of this embodiment, a conventional nitride coating is prepared by a multi-mode electromagnetic controllable pulse arc to provide the bottom layer of the overall film layer.

[0041] Specifically, as Figures 2-4 shown, a substrate fixing device 6 is rotatably installed on the device housing 1 and is driven by a motor 5 fixedly installed on the device housing 1; the substrate fixing device 6 is located at the central position inside the vacuum chamber and corresponds to multiple ion source devices 3 installed on the device housing 1.

[0042] Specifically, as Figures 2-4 shown, the substrate fixing device 6 includes: a placement plate 601, clamping plates 602, and a cylinder 603; the placement plate 601 is rotatably installed on the device housing 1 and is driven by a motor 5 fixedly installed on the device housing 1; the placement plate 601 is located at the central position of the vacuum chamber and corresponds to multiple ion source devices 3;

[0043] The placement plate 601 is provided with a groove; two clamping plates 602 are symmetrically and horizontally slidably installed in the groove and are respectively driven by two cylinders 603 fixedly installed on the placement plate 601.

[0044] The clamping plate 602 is driven by the cylinder 603 to move and clamp the substrate for fixation; during the process of coating preparation on the substrate, the substrate is rotated by the motor 5 so that the substrate corresponds to the ion source device 3 in sequence, and the coating preparation of the substrate is completed.

[0045] As a specific implementation manner of this embodiment, there are multiple clamping plates 602 with different shapes and they can be replaced; by replacing the clamping plates 602 with different shapes, substrates with different shapes can be fixed, increasing the applicable range of the equipment.

[0046] Specifically, a feeding frame 7 is provided on one side of the equipment housing 1; a door handle is installed on the feeding frame 7 to facilitate the opening and closing of the feeding frame 7. The substrate is placed on the substrate fixing device 6 through the feeding frame 7, and the substrate is fixed by the substrate fixing device 6.

[0047] Specifically, a cabin 2 is fixedly installed on the equipment housing 1; the cabin 2 and the ion source device 3 installed on the equipment housing 1 are in different horizontal directions; one end of the cabin 2 is connected to the vacuum chamber, and three ion source devices 3 are fixedly installed in the vertical direction at the other end; a baffle 8 is fixedly installed in the cabin 2; the baffle 8 is located between the ion source device 3 on the cabin 2 and the vacuum chamber.

[0048] As a specific implementation manner of this embodiment, the baffle 8 is provided with filter holes; the filter holes are used to isolate the target particles generated by the ion source device 3 in the cabin 2.

[0049] As a specific implementation manner of this example, the ion source device 3 on the cabin 2 is used to prepare ta-C coating or alumina coating; when preparing ta-C coating or alumina coating, target particles will be generated in the ion source device 3, and when the target particles adhere to the surface of the substrate, it will affect the coating effect of the substrate and cause uneven coating; the filter holes on the baffle 8 can block the diffusion of target particles into the vacuum chamber, making the target particles stay in the cabin 2 and improving the uniformity of the film layer.

[0050] As a specific implementation manner of this embodiment, a dynamic magnetic field scanning device (not shown in the figure) is installed in the vacuum chamber of the equipment housing 1 to ensure that the magnetic field can change according to the preset parameters.

[0051] Specifically, as Figure 1 shown, a heating wire 4 is fixedly installed on the equipment housing 1, and the heating wire 4 is located in the vacuum chamber; as a specific implementation manner of this embodiment, the heating wire 4 is located on the side close to the cabin 2, so that Al ions undergo ionization oxidation reaction in the nearby filament area to prepare alumina, and a high-temperature protection layer and an anti-adhesion layer are provided through the alumina.

[0052] The ion source device 3, the heating wire 4, the motor 5, the air cylinder 603, and the dynamic magnetic field scanning device are all electrically connected to the control device.

[0053] Embodiment 2:

[0054] As Figure 5 shown, the shelter 2 is replaced by a straight cylinder chamber 9; the three straight cylinder chambers 9 are fixedly installed on the equipment housing 1 and are located in different horizontal directions from the ion source device 3 installed on the equipment housing 1; the three straight cylinder chambers 9 are located in the same vertical plane; one end of each straight cylinder chamber 9 is communicated with the vacuum chamber, and the other end is fixedly installed with an ion source device 3; a baffle 8 is fixedly installed in each straight cylinder chamber 9; the baffle 8 is located between the ion source device 3 and the vacuum chamber. Compared with Embodiment 1, Embodiment 2 is the same except that the shelter 2 is replaced by the straight cylinder chamber 9.

[0055] Working principle:

[0056] First step, the operator selects the corresponding clamping plate 602 according to the shape of the substrate, and then places the substrate on the placing plate 601 through the feeding frame 7 and fixes it with the clamping plate 602;

[0057] Second step, adjust the ion source device 3 in multiple modes according to the coating requirements and process parameters;

[0058] Third step, the vacuum pumping device pumps the vacuum chamber, and then the argon injection device injects argon into the vacuum chamber;

[0059] Fourth step, the motor 5 drives the substrate to rotate, and cooperates with the ion source device 3 in different directions to coat the substrate in turn.

[0060] Based on the ideal embodiments of the present invention as inspiration, through the above description, relevant personnel can completely make various changes and modifications without departing from the technical idea of the present invention. The technical scope of the present invention is not limited to the content in the specification, and must be determined according to the scope of the claims.

Claims

1. A pulsed ion plating nitride coating composite ta-C and alumina coating deposition equipment, characterized in that, Including: Equipment housing (1), vacuum pumping device, argon injection device and control device; A vacuum chamber is provided inside the equipment housing (1); A plurality of ion source devices (3) located in different horizontal directions are installed on the equipment housing (1), and the ion source devices (3) are communicated with the vacuum chamber; The vacuum pumping device and the argon injection device are fixedly installed on the equipment housing (1); Both the vacuum pumping device and the argon injection device are communicated with the vacuum chamber; A substrate fixing device (6) is rotatably installed on the equipment housing (1) and is driven by a motor (5) fixedly installed on the equipment housing (1); The substrate fixing device (6) is located at the central position inside the vacuum chamber and corresponds to a plurality of ion source devices (3); The control device is used to control the operation of the entire pulsed ion plating nitride coating composite ta-C and alumina coating deposition equipment except itself.

2. A pulsed ion plating nitride coating composite ta-C and alumina coating deposition apparatus according to claim 1, characterized in that: The substrate fixing device (6) includes: a placement plate (601), a clamping plate (602) and a cylinder (603); The placement plate (601) is rotatably installed on the equipment housing (1) and is driven by a motor (5) fixedly installed on the equipment housing (1); The placement plate (601) is located at the central position of the vacuum chamber and corresponds to a plurality of ion source devices (3); A groove is provided inside the placement plate (601); Two clamping plates (602) are symmetrically and horizontally slidably installed in the groove and are respectively driven by two cylinders (603) fixedly installed on the placement plate (601).

3. A pulsed ion plating nitride coating composite ta-C and alumina coating deposition apparatus according to claim 2, characterized in that: There are a plurality of the clamping plates (602) with different shapes and they can be replaced to fix substrates with different shapes.

4. A pulsed ion plating nitride coating composite ta-C and alumina coating deposition apparatus according to claim 1, characterized in that: A feeding frame (7) is provided on one side of the equipment housing (1); A door handle is installed on the feeding frame (7) to facilitate the opening and closing of the feeding frame (7).

5. A pulsed ion plating nitride coating composite ta-C and alumina coating deposition equipment according to claim 1, characterized in that: A plurality of the ion source devices (3) in different horizontal directions are provided in the vertical direction to coat substrates of different sizes.

6. A pulsed ion plating nitride coating composite ta-C and alumina coating deposition equipment according to claim 1, characterized in that: The pulsed arc modes in the ion source devices (3) in different horizontal directions are different.

7. A pulsed ion plating nitride coating composite ta-C and alumina coating deposition equipment according to claim 1, characterized in that: A cabin (2) is fixedly installed on the equipment housing (1); The cabin (2) and the ion source device (3) installed on the equipment housing (1) are in different horizontal directions; One end of the cabin (2) is communicated with the vacuum chamber, and a plurality of ion source devices (3) are fixedly installed at the other end in the vertical direction; A baffle (8) is fixedly installed inside the cabin (2); The baffle (8) is located between the ion source device (3) on the cabin (2) and the vacuum chamber.

8. A pulsed ion plating nitride coating composite ta-C and alumina coating deposition apparatus according to claim 7, characterized in that: Filter holes are provided on the baffle (8); The filter holes are used to isolate the target particles generated by the ion source device (3) inside the cabin (2).

9. A pulsed ion plating nitride coating composite ta-C and alumina coating deposition equipment according to claim 7, characterized in that: The cabin (2) can be replaced by a straight tube cabin (9); a plurality of the straight tube cabins (9) are fixedly installed on the equipment housing (1), and are located in different horizontal directions from the ion source device (3) installed on the equipment housing (1); the plurality of straight tube cabins (9) are located in the same vertical plane; one end of each straight tube cabin (9) is communicated with the vacuum chamber, and the other end is fixedly installed with an ion source device (3); a baffle (8) is fixedly installed in each straight tube cabin (9); the baffle (8) is located between the ion source device (3) and the vacuum chamber.

10. A pulsed ion plating nitride coating composite ta-C and alumina coating deposition equipment according to claim 1, characterized in that: A heating wire (4) is fixedly installed on the equipment housing (1), and the heating wire (4) is located in the vacuum chamber.

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