Bubbler for growth of semiconductor silicon epitaxial wafer

Abstract

The utility model discloses a bubbler for growth of a semiconductor silicon epitaxial wafer, which comprises a rotating seat and a stirring motor, the stirring motor is mounted on the inner wall of the rotating seat, a worm is mounted at the output end of the stirring motor, a stirring rod is movably mounted in the rotating seat on one side of the worm, a worm gear is sleeved on the surface of the stirring rod, and the worm gear is movably mounted in the rotating seat on the other side of the worm. The top end of the stirring rod is movably provided with an adapter, the top end of the adapter is provided with a flexible hose, the side wall of the stirring rod is provided with a connecting pipe, the flexible hose penetrates through the adapter and the stirring rod to be connected with the connecting pipe, and the surface of the stirring rod is symmetrically provided with two groups of blades. And the connecting pipes extend to the surfaces of the blades. According to the bubbling device disclosed by the utility model, the liquid source can be conveniently bubbled in a self-rotation manner and a circumferential rotation manner, the bubbling operation on the liquid source from different liquid levels is facilitated, the bubbling uniformity is increased, and the bubbling effect is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of bubblers, in particular to a bubbler for growing semiconductor silicon epitaxial wafers. Background Technique

[0002] Single crystal silicon epitaxy is to regrow a single crystal silicon layer of several micrometers to dozens of micrometers on the surface of a polished silicon wafer through chemical vapor deposition. Silicon epitaxial materials are important basic materials in integrated circuits and discrete devices. Silicon epitaxial wafers can provide electrical parameters that polished wafers do not have, and remove many surface and near-surface defects formed during crystal growth and processing into substrate materials. Single crystal silicon epitaxial wafers are mainly used in the manufacture of CMOS logic circuits, DRAMs, and discrete devices. Epitaxial technology is an important means to solve the surface defects of large-diameter single crystal silicon wafers. Epitaxial furnaces are key equipment for silicon epitaxy, and the performance of epitaxial furnaces directly affects the quality of silicon epitaxial wafers. Bubblers are important gas-providing components in single crystal silicon epitaxial equipment. In order to better produce single crystal silicon epitaxial wafers, a bubbler for growing semiconductor silicon epitaxial wafers is proposed.

[0003] As disclosed in a liquid source material bubbler and gas supply system for a silicon carbide epitaxial device with the authorized announcement number CN116463727A, it includes a tank body. An end plate is arranged at the end of the tank body, and a pipeline is configured on the end plate. An air diffuser pipe, a liquid replenishing pipe, and multiple layers of partition plates are arranged in the tank body. The partition plates are arranged in the tank body at intervals, and air permeable holes are arranged on the partition plates. The air diffuser pipe is connected to the first pipeline and communicated to the carrier gas source through it. The air diffuser pipe includes a first pipe section located below the lowermost partition plate, and a plurality of perforations are configured on the first pipe section. The carrier passes through the perforations of the first pipe section and enters the liquid source. The liquid replenishing pipe is spiral, and the liquid inlet of the liquid replenishing pipe is connected to the second pipeline, and the outlet of the liquid replenishing pipe is located below the lowermost partition plate;

[0004] Although it realizes providing a stable vaporized liquid source for the epitaxial growth process of the silicon carbide epitaxial device through the improvement of the internal structure of the bubbler and the optimization of the design of the bubbler itself's tank, it does not solve the problem that the existing bubbler is not convenient for self-rotating and circumferentially rotating to bubble the liquid source, and is not conducive to bubbling the liquid source from different liquid levels, which affects the bubbling effect. Content of the Utility Model

[0005] The purpose of the utility model is to provide a bubbler for growing semiconductor silicon epitaxial wafers, so as to solve the problem that the bubbler is not convenient for self-rotating and circumferentially rotating to bubble the liquid source, and is not conducive to bubbling the liquid source from different liquid levels, which affects the bubbling effect as proposed in the above background technique.

[0006] To achieve the above object, the present utility model provides the following technical solutions: A bubbler for growing semiconductor silicon epitaxial wafers, comprising a rotating base and a stirring motor. The stirring motor is installed on the inner wall of the rotating base. The output end of the stirring motor is installed with a worm. Inside the rotating base on one side of the worm, a stirring rod is movably installed. A worm gear is sleeved on the surface of the stirring rod, and the worm and the worm gear are meshed with each other. The top end of the stirring rod is movably installed with a swivel joint. The top end of the swivel joint is installed with a flexible hose. A connecting pipe is installed on the side wall of the stirring rod, and the flexible hose passes through the swivel joint and the stirring rod and is connected to the connecting pipe. Two groups of blades are symmetrically installed on the surface of the stirring rod, and the connecting pipe extends to the surface of the blades. A plurality of air outlet holes are installed at equal intervals on the surface of the connecting pipe. A chassis is arranged outside the rotating base.

[0007] Preferably, a top frame is arranged above the chassis. Two front trusses are installed at the top end of the chassis. Lower hinge shafts are installed at the bottom ends of the front trusses, and the front trusses are movably connected to the chassis through the lower hinge shafts.

[0008] Preferably, two rear trusses are installed at the bottom end of the top frame. Upper hinge shafts are installed at the top ends of the rear trusses, and the rear trusses are movably connected to the top frame through the upper hinge shafts.

[0009] Preferably, lower movable wheels are movably installed at the bottom ends of the rear trusses, and the rear trusses are slidably connected to the chassis through the lower movable wheels. Upper movable wheels are movably installed at the top ends of the front trusses, and the front trusses are slidably connected to the top frame through the upper movable wheels.

[0010] Preferably, central shafts are installed at the central positions of the front trusses, and the front trusses are movably connected to the rear trusses through the central shafts. Electric push rods are movably installed on the side walls of the rear trusses, and the output ends of the electric push rods are movably connected to the front trusses.

[0011] Preferably, a support column is installed at the top end of the top frame. A rotating frame is installed at the top end of the support column. A movable shaft is installed on one side of the rotating frame close to the center of the support column, and the rotating frame is movably connected to the support column through the movable shaft.

[0012] Preferably, a rotating arm is installed on the side wall of the rotating frame, and the rotating arm is connected to the rotating base.

[0013] Preferably, a rotating motor is installed at the bottom end of the rotating frame. A driving shaft is installed at the output end of the rotating motor. A traveling wheel is sleeved on the surface of the driving shaft. A track is sleeved on the surface of the support column on one side of the traveling wheel, and the traveling wheel is slidably connected to the track.

[0014] Compared with the prior art, the beneficial effects of the present utility model are as follows: This bubbler not only realizes convenient self-rotation and circumferential rotation for bubbling the liquid source, facilitating bubbling operations on the liquid source at different liquid levels, increasing the uniformity of bubbling, but also improves the bubbling effect.

[0015] (1) By connecting the flexible hose to the external inert gas pipeline, the inert gas passes through the flexible hose, through the adapter and the stirring rod, into the interior of the connecting pipe, and is ejected through the air holes on the surface of the connecting pipe to bubble the interior of the liquid source. Through bubbling, a certain amount of vaporized liquid source is carried to the gas phase space above the liquid surface, and is connected to the reaction chamber of the silicon carbide epitaxial equipment through the air outlet pipe for reaction. The stirring motor drives the worm to rotate, the worm drives the stirring rod to rotate through the worm gear, the adapter provides a movable support for the connection between the flexible hose and the stirring rod, the stirring rod drives the blades and the connecting pipe to rotate, the blades perform self-rotation stirring on the liquid source, and at the same time bubble the liquid source to increase the uniformity of bubbling. The rotation motor drives the traveling wheels to rotate through the drive shaft, the traveling wheels drive the rotating frame to rotate on the surface of the track, and the rotating frame drives the stirring rod and the connecting pipe to rotate through the rotating arm to perform circumferential rotation stirring and bubbling on the liquid source, so as to improve the bubbling effect, realizing convenient self-rotation and circumferential rotation for bubbling the liquid source, increasing the uniformity of bubbling, and improving the bubbling effect.

[0016] (2) The electric push rod drives the front truss to rotate around the hinge shaft, the front truss drives the rear truss to rotate around the hinge shaft through the central shaft, the front truss drives the upper movable wheel to slide on the inner wall of the top frame, the rear truss drives the lower movable wheel to slide on the inner wall of the bottom frame, the front truss and the rear truss jointly drive the top frame to move upward, and the top frame drives the connecting pipe to move upward to adjust the bubbling height of the movable shaft, so as to perform bubbling operations on the liquid source at different liquid levels. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 is a three-dimensional structure schematic diagram of the present utility model;

[0018] Figure 2 is a front view sectional structure schematic diagram of the rotating seat of the present utility model;

[0019] Figure 3 is a front view sectional structure schematic diagram of the bottom frame of the present utility model;

[0020] Figure 4 is a three-dimensional structure schematic diagram of the rotating frame of the present utility model;

[0021] Figure 5 is a three-dimensional structure schematic diagram of the connecting pipe of the present utility model.

[0022] In the figure: 1, chassis; 2, top frame; 3, support column; 4, movable shaft; 5, rotating frame; 6, rotating arm; 7, rotating base; 8, flexible hose; 9, adapter; 10, worm; 11, worm gear; 12, stirring rod; 13, stirring motor; 14, connecting pipe; 15, blade; 16, lower hinge shaft; 17, front truss; 18, central axis; 19, rear truss; 20, upper hinge shaft; 21, lower movable wheel; 22, electric push rod; 23, upper movable wheel; 24, drive shaft; 25, rotating motor; 26, track; 27, air vent; 28, traveling wheel. Detailed implementation manners

[0023] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Based on the embodiments in the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0024] Please refer to Figures 1-5 , an embodiment provided by the present invention: A bubbler for growing semiconductor silicon epitaxial wafers, including a rotating base 7 and a stirring motor 13. A stirring motor 13 is installed on the inner wall of the rotating base 7, and the stirring motor 13 plays a role of power drive. A worm 10 is installed at the output end of the stirring motor 13. A stirring rod 12 is movably installed inside the rotating base 7 on one side of the worm 10. A worm gear 11 is sleeved on the surface of the stirring rod 12, and the worm 10 meshes with the worm gear 11. A rotating joint 9 is movably installed at the top end of the stirring rod 12. A flexible hose 8 is installed at the top end of the rotating joint 9. A connecting pipe 14 is installed on the side wall of the stirring rod 12, and the flexible hose 8 passes through the rotating joint 9 and the stirring rod 12 and is connected to the connecting pipe 14. Two groups of blades 15 are symmetrically installed on the surface of the stirring rod 12, and the connecting pipe 14 extends to the surface of the blades 15. A plurality of groups of equally spaced air vents 27 are installed on the surface of the connecting pipe 14. A chassis 1 is arranged outside the rotating base 7;

[0025] Connect the flexible hose 8 to the external inert gas pipeline. The inert gas passes through the flexible hose 8, enters the interior of the connecting pipe 14 through the adapter 9 and the stirring rod 12, and sprays out through the air holes 27 on the surface of the connecting pipe 14 to bubble the interior of the liquid source. By bubbling, a certain amount of vaporized liquid source is carried to the gas phase space above the liquid surface, and is connected to the reaction chamber of the silicon carbide epitaxial equipment through the outlet pipe for reaction. Turn on the stirring motor 13, drive the worm 10 to rotate by the stirring motor 13. Under the mutual meshing of the worm 10 and the worm gear 11, drive the stirring rod 12 to rotate by the worm 10 through the worm gear 11. The adapter 9 provides a movable support for the connection between the flexible hose 8 and the stirring rod 12. Drive the blades 15 and the connecting pipe 14 to rotate by the stirring rod 12. The blades 15 rotate the liquid source for self-stirring, and bubble the liquid source while stirring to increase the uniformity of bubbling. Turn on the rotating motor 25, drive the traveling wheels 28 to rotate by the rotating motor 25 through the drive shaft 24. Under the sliding fit of the traveling wheels 28 and the track 26, and under the movable fit of the movable shaft 4 and the support column 3, drive the rotating frame 5 to rotate on the surface of the track 26 by the traveling wheels 28. Drive the stirring rod 12 and the connecting pipe 14 to rotate by the rotating frame 5 through the rotating arm 6 to perform circumferential rotation stirring and bubbling on the liquid source, so as to improve the bubbling effect. It realizes convenient self-rotation type and circumferential rotation type bubbling of the liquid source, increases the uniformity of bubbling, and improves the bubbling effect;

[0026] A top frame 2 is arranged above the bottom frame 1. Two groups of front trusses 17 are installed at the top end of the bottom frame 1. Lower hinge shafts 16 are installed at the bottom ends of the front trusses 17, and the front trusses 17 are movably connected to the bottom frame 1 through the lower hinge shafts 16;

[0027] Two groups of rear trusses 19 are installed at the bottom end of the top frame 2. Upper hinge shafts 20 are installed at the top ends of the rear trusses 19, and the rear trusses 19 are movably connected to the top frame 2 through the upper hinge shafts 20;

[0028] Lower movable wheels 21 are movably installed at the bottom ends of the rear trusses 19, and the rear trusses 19 are slidably connected to the bottom frame 1 through the lower movable wheels 21. Upper movable wheels 23 are movably installed at the top ends of the front trusses 17, and the front trusses 17 are slidably connected to the top frame 2 through the upper movable wheels 23. Central shafts 18 are installed at the central positions of the front trusses 17, and the front trusses 17 are movably connected to the rear trusses 19 through the central shafts 18. Electric push rods 22 are movably installed on the side walls of the rear trusses 19. The electric push rods 22 play a role of power drive, and the output ends of the electric push rods 22 are movably connected to the front trusses 17;

[0029] A support column 3 is installed at the top end of the top frame 2. A rotating frame 5 is installed at the top end of the support column 3. A movable shaft 4 is installed on one side of the rotating frame 5 close to the center of the support column 3. The rotating frame 5 is movably connected to the support column 3 through the movable shaft 4. A rotating arm 6 is installed on the side wall of the rotating frame 5, and the rotating arm 6 is connected to the rotating seat 7;

[0030] A rotating motor 25 is installed at the bottom end of the rotating frame 5. The rotating motor 25 plays a role in power driving. A driving shaft 24 is installed at the output end of the rotating motor 25. A traveling wheel 28 is sleeved on the surface of the driving shaft 24. A track 26 is sleeved on the surface of the support column 3 on one side of the traveling wheel 28. The traveling wheel 28 is slidably connected to the track 26;

[0031] Open the electric push rod 22. Under the support of the bottom frame 1, the front truss 17 is driven by the electric push rod 22 to rotate about the hinge shaft 16. The rear truss 19 is driven by the front truss 17 through the central shaft 18 to rotate about the hinge shaft 20. The upper movable wheel 23 is driven by the front truss 17 to slide on the inner wall of the top frame 2. The lower movable wheel 21 is driven by the rear truss 19 to slide on the inner wall of the bottom frame 1. The top frame 2 is driven by the front truss 17 and the rear truss 19 to move upward. The connecting pipe 14 is driven by the top frame 2 to move upward to adjust the bubbling height of the movable shaft 4 and perform bubbling operations on the liquid source at different liquid levels.

[0032] Working principle: Connect the flexible hose 8 to the external inert gas pipeline. The inert gas passes through the flexible hose 8, enters the interior of the connecting pipe 14 through the adapter 9 and the stirring rod 12, and sprays out through the air holes 27 on the surface of the connecting pipe 14 to bubble the interior of the liquid source. Through bubbling, a certain amount of vaporized liquid source is carried to the gas phase space above the liquid surface, and is connected to the reaction chamber of the silicon carbide epitaxial equipment through the outlet pipe for reaction. The stirring motor 13 drives the worm 10 to rotate, the worm 10 drives the stirring rod 12 to rotate through the worm gear 11, the adapter 9 provides a movable support for the connection between the flexible hose 8 and the stirring rod 12, the stirring rod 12 drives the blades 15 and the connecting pipe 14 to rotate, the blades 15 rotate the liquid source for self-stirring, and bubble the liquid source while stirring to increase the uniformity of bubbling. The rotation motor 25 drives the traveling wheels 28 to rotate through the drive shaft 24, the traveling wheels 28 drive the rotating frame 5 to rotate on the surface of the track 26, and the rotating frame 5 drives the stirring rod 12 and the connecting pipe 14 to rotate through the rotating arm 6 to rotate and bubble the liquid source in a circular motion to improve the bubbling effect. The electric push rod 22 drives the front truss 17 to rotate with the hinge shaft 16 as the axis, the front truss 17 drives the rear truss 19 to rotate with the hinge shaft 20 as the axis through the central shaft 18, the front truss 17 drives the upper movable wheel 23 to slide on the inner wall of the top frame 2, the rear truss 19 drives the lower movable wheel 21 to slide on the inner wall of the bottom frame 1, the front truss 17 and the rear truss 19 jointly drive the top frame 2 to move upward, and the top frame 2 drives the connecting pipe 14 to move upward to adjust the bubbling height of the movable shaft 4 and bubble the liquid source at different liquid levels for bubbling operation.

Claims

1. A bubbler for growing semiconductor silicon epitaxial wafers, comprising a rotating base (7) and a stirring motor (13), characterized in that: A stirring motor (13) is installed on the inner wall of the rotating base (7). A worm (10) is installed at the output end of the stirring motor (13). Inside the rotating base (7) on one side of the worm (10), a stirring rod (12) is movably installed. A worm gear (11) is sleeved on the surface of the stirring rod (12), and the worm (10) meshes with the worm gear (11). A swivel joint (9) is movably installed at the top end of the stirring rod (12). A flexible hose (8) is installed at the top end of the swivel joint (9). A connecting pipe (14) is installed on the side wall of the stirring rod (12), and the flexible hose (8) passes through the swivel joint (9) and the stirring rod (12) and is connected to the connecting pipe (14). Two groups of blades (15) are symmetrically installed on the surface of the stirring rod (12), and the connecting pipe (14) extends to the surface of the blades (15). A plurality of air outlet holes (27) at equal intervals are installed on the surface of the connecting pipe (14). A chassis (1) is arranged outside the rotating base (7).

2. The bubbler for growing semiconductor silicon epitaxial wafers according to claim 1, wherein: A top frame (2) is arranged above the chassis (1). Two front trusses (17) are installed at the top end of the chassis (1). Lower hinge shafts (16) are installed at the bottom ends of the front trusses (17), and the front trusses (17) are movably connected to the chassis (1) through the lower hinge shafts (16).

3. A bubbler for growing semiconductor silicon epitaxial wafers according to claim 2, characterized in that: Two rear trusses (19) are installed at the bottom end of the top frame (2). Upper hinge shafts (20) are installed at the top ends of the rear trusses (19), and the rear trusses (19) are movably connected to the top frame (2) through the upper hinge shafts (20).

4. The bubbler for growing semiconductor silicon epitaxial wafers according to claim 3, characterized in that: Lower movable wheels (21) are movably installed at the bottom ends of the rear trusses (19), and the rear trusses (19) are slidably connected to the chassis (1) through the lower movable wheels (21). Upper movable wheels (23) are movably installed at the top ends of the front trusses (17), and the front trusses (17) are slidably connected to the top frame (2) through the upper movable wheels (23).

5. The bubbler for growing semiconductor silicon epitaxial wafers according to claim 2, wherein: Central shafts (18) are installed at the central positions of the front trusses (17), and the front trusses (17) are movably connected to the rear trusses (19) through the central shafts (18). Electric push rods (22) are movably installed on the side walls of the rear trusses (19), and the output ends of the electric push rods (22) are movably connected to the front trusses (17).

6. A bubbler for growing semiconductor silicon epitaxial wafers according to claim 2, characterized in that: A support column (3) is installed at the top end of the top frame (2). A rotating frame (5) is installed at the top end of the support column (3). A movable shaft (4) is installed on one side of the rotating frame (5) close to the center of the support column (3), and the rotating frame (5) is movably connected to the support column (3) through the movable shaft (4).

7. A bubbler for growing semiconductor silicon epitaxial wafers according to claim 6, characterized in that: A rotating arm (6) is installed on the side wall of the rotating frame (5), and the rotating arm (6) is connected to the rotating base (7).

8. A bubbler for growing semiconductor silicon epitaxial wafers according to claim 6, characterized in that: A rotating motor (25) is installed at the bottom end of the rotating frame (5). A drive shaft (24) is installed at the output end of the rotating motor (25). A traveling wheel (28) is sleeved on the surface of the drive shaft (24). A track (26) is sleeved on the surface of the support column (3) on one side of the traveling wheel (28), and the traveling wheel (28) is slidably connected to the track (26).

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