Integrated cavity air extractor and thin film deposition equipment thereof
Through the integrated cavity exhaust device, the exhaust angle valve core and vacuum gauge are integrated on the exhaust block, which solves the problem of restricted connection position and inconvenient maintenance caused by the L-type exhaust angle valve, and realizes convenient connection and safe exhaust of the exhaust device.
Patent Information
- Application Number
- CN202422628722.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-29
- Publication Date
- 2025-08-26
- Estimated Expiration
- 2034-10-29
AI Technical Summary
In the reaction chamber exhaust structure of existing semiconductor equipment, the exhaust angle valve spool is usually L-shaped, resulting in inconvenient replacement and maintenance.
An integrated cavity exhaust device is designed to integrate the exhaust angle valve spool, vacuum gauge and safety valve on the block exhaust block. The exhaust passage and exhaust passage are arranged vertically to achieve high integration and facilitate connection at any position in the reaction chamber.
It improves the convenience and maintenance of the exhaust device, avoids the problem of restricted connection position, and ensures the safety of the exhaust process and the smoothness of the passage.
Smart Images
Figure CN223268753U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of exhaust mechanisms in semiconductor equipment, in particular to an integrated cavity exhaust device and thin film deposition equipment thereof. Background Art
[0002] The exhaust structure of the reaction chamber of the existing semiconductor equipment generally adopts an exhaust angle valve core. The commonly used exhaust angle valve core is an L-shaped angle valve, which can only be connected and assembled at the bottom of the reaction chamber, making it extremely inconvenient to replace or maintain the angle valve later. Utility Model Content
[0003] The purpose of the present invention is to overcome the deficiencies of the prior art and to provide an integrated chamber exhaust device and thin film deposition equipment thereof, so as to solve the technical problem that the prior exhaust device is inconvenient to replace and maintain.
[0004] In order to achieve the above purpose, the utility model adopts the following technical solutions:
[0005] In the first aspect, an embodiment of the utility model provides an integrated cavity exhaust device, which includes: an exhaust block, at least one group of exhaust control components connected to the exhaust block, the exhaust block is provided with an exhaust channel and an exhaust channel, one end of the exhaust channel and the exhaust channel extend to the surface of the exhaust block, and the exhaust control component is used to control the connection and disconnection of the exhaust channel and the exhaust channel.
[0006] Wherein, the air inlet end of the air extraction channel extends to the inner side surface of the air extraction block.
[0007] Wherein, the air extraction channel is extended along the thickness direction of the air extraction block.
[0008] Wherein, the exhaust channel extends along the length direction of the air pumping block.
[0009] Wherein, the air extraction channel and the air exhaust channel are arranged perpendicular to each other.
[0010] Wherein, the air extraction control component includes: an air extraction angle valve core and a vacuum gauge, the air extraction angle valve core is connected to the outer side of the air extraction block, and the vacuum gauge is connected to the air extraction channel.
[0011] Wherein, the air extraction control component further includes a safety valve, and the safety valve is connected to the air extraction channel.
[0012] Wherein, the exhaust channel includes: a main exhaust channel and several auxiliary exhaust channels connected to the main exhaust channel, the number of the auxiliary exhaust channels is the same as the number of the exhaust control components, and each of the auxiliary exhaust channels is provided with an exhaust channel connected to it.
[0013] Wherein, the vacuum gauge and the safety valve of the same group of the exhaust control components are respectively connected to the top and the bottom of the exhaust block, and are connected to the same auxiliary exhaust channel.
[0014] In the second aspect, an embodiment of the utility model also provides a thin film deposition device, which includes the integrated cavity exhaust device and a reaction chamber, wherein the integrated cavity exhaust device is connected to the side wall of the reaction chamber, and the side wall of the reaction chamber of the reaction chamber is provided with an air inlet and an air outlet opposite to each other, and the air outlet is connected to the exhaust channel.
[0015] The integrated chamber vacuum device and thin film deposition apparatus of this utility model integrates the vacuum angle valve core, the corresponding vacuum gauge, and the safety valve into a block-shaped vacuum block. The vacuum block is internally provided with a vacuum channel and an exhaust channel, thereby realizing a highly integrated vacuum module. This facilitates the connection and assembly of the vacuum module at any position in the reaction chamber according to actual needs. The thin film deposition apparatus of this embodiment arranges the air inlet and air outlet of the reaction chamber relative to each other, thereby enabling air convection and avoiding the formation of dead zones within the reaction chamber.
[0016] The above description is only an overview of the technical solution of the present invention. In order to more clearly understand the technical means of the present invention, it can be implemented in accordance with the contents of the specification. In addition, in order to make the above and other purposes, features and advantages of the present invention more obvious and easy to understand, the following preferred embodiments are specifically cited and described in detail as follows. BRIEF DESCRIPTION OF THE DRAWINGS
[0017] Figure 1 and Figure 2 Schematic diagram of the overall structure of the integrated cavity exhaust device according to an embodiment of the present invention from different angles.
[0018] Figure 3 This is an exploded view of the integrated cavity exhaust device according to an embodiment of the present invention.
[0019] Figure 4 This is a side view of the integrated cavity exhaust device according to an embodiment of the present invention.
[0020] Figure 5 for Figure 4 DD sectional view shown.
[0021] Figure 6 This is a schematic diagram of the assembly structure of the reaction chamber and the exhaust device of the thin film deposition equipment according to an embodiment of the present invention.
[0022] Figure 7 This is a schematic diagram of the structure of the reaction chamber of the thin film deposition equipment according to an embodiment of the present invention.
[0023] Description of reference numerals:
[0024] Integrated cavity exhaust device 100, reaction chamber 200, exhaust block 1, exhaust channel 11, exhaust channel 12, main exhaust channel 13, auxiliary exhaust channel 14, auxiliary exhaust channel 15, exhaust control component 2, exhaust angle valve core 21, safety valve 22, vacuum gauge 23, exhaust control component 3, exhaust angle valve core 31, safety valve 32, vacuum gauge 33, reaction chamber 201, air inlet 202, air outlet 203, air outlet 204. DETAILED DESCRIPTION
[0025] In order to make the purpose, technical solutions and advantages of the present invention more clear, the present invention will be further described in detail below with reference to the accompanying drawings and specific implementation methods.
[0026] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without making creative efforts shall fall within the scope of protection of the present invention.
[0027] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise" and the like indicate orientations or positional relationships based on the orientations or positional relationships described in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present invention.
[0028] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of the technical features being referred to. Thus, a feature specified as "first" or "second" may explicitly or implicitly include one or more of such features. In the description of this utility model, "plurality" means two or more, unless otherwise specifically defined.
[0029] In this utility model, unless otherwise specified or limited, the terms "installed," "connected," "connect," "fixed," etc. should be understood in a broad sense. For example, they can mean connected, detachably connected, or integrated; they can mean mechanically connected or electrically connected; they can mean directly connected or indirectly connected through an intermediate medium; they can mean internal communication between two components or an interaction between two components. Those skilled in the art will understand the specific meanings of the above terms in this utility model based on the specific circumstances.
[0030] In the present invention, unless otherwise expressly specified or limited, a first feature being "above" or "below" a second feature may include the first and second features being in direct contact, or may include the first and second features being in contact not directly but through another feature between them. Moreover, a first feature being "above," "above," and "above" a second feature may include the first feature being directly above or obliquely above the second feature, or may simply mean that the first feature is higher in level than the second feature. A first feature being "below," "below," and "below" a second feature may include the first feature being directly below or obliquely below the second feature, or may simply mean that the first feature is lower in level than the second feature.
[0031] Throughout this specification, reference to terms such as "one embodiment," "some embodiments," "examples," "specific examples," or "some examples" means that the specific features, structures, materials, or characteristics described in conjunction with that embodiment or example are included in at least one embodiment or example of the present invention. Throughout this specification, the schematic representations of the above terms should not be construed as necessarily referring to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
[0032] Existing semiconductor equipment reaction chamber exhaust structures typically utilize an L-shaped angle valve core. This valve core can only be connected and assembled at the bottom of the reaction chamber, making subsequent replacement or maintenance of the valve extremely inconvenient. To address these requirements, this embodiment discloses an integrated chamber exhaust device 100.
[0033] See also Figures 1 to 7This embodiment discloses an integrated chamber exhaust device 100, which includes: an exhaust block 1, at least one exhaust control assembly 2 connected to the exhaust block 1, the exhaust block 1 being provided with an exhaust channel and an exhaust channel, one end of each of the exhaust channel and the exhaust channel extending to the surface of the exhaust block 1, and the exhaust control assembly 2 being used to control the opening and closing of the exhaust channel and the exhaust channel, thereby achieving exhaust or vacuum treatment of a closed chamber such as a reaction chamber. Specifically, the air inlet end of the exhaust channel extends to the inner side of the exhaust block, and the air outlet end of the exhaust channel extends to the top or bottom surface of the exhaust block 1.
[0034] The integrated cavity exhaust device 100 of this embodiment integrates one or more exhaust control components 2 for controlling the on / off of the exhaust circuit on the exhaust block 1. There is no blocking component in one pair of the interface directions of the exhaust block 1, so that the device connected to it can be installed in any suitable position, thereby solving the disadvantages of the prior art of using an L-shaped exhaust angle valve, which results in limited connection position and inconvenient disassembly and maintenance.
[0035] In this embodiment, there are two groups of air extraction control components, namely air extraction control component 2 and air extraction control component 3. The above two groups of air extraction control components have the same structure. The following only takes the air extraction control component 2 as an example to describe the structure. The structure of the air extraction control component 3 can be directly obtained based on the structure of the air extraction control component 2.
[0036] Taking the exhaust control assembly 2 as an example, the corresponding exhaust block 1 is provided with an exhaust channel 11. The inlet end of the exhaust channel 11 extends to the inner side of the exhaust block 1. The inner side of the exhaust block 1 here refers to the mating surface where the exhaust block 1 and the reaction chamber 200 are assembled. Once assembled, the exhaust channel 11 communicates with the reaction chamber 201 of the reaction chamber 200.
[0037] The air extraction channel 11 is extended along the thickness direction of the air extraction block 1. Figure 3 and Figure 5 As shown, the air extraction block 1 is roughly in the shape of a cube, and the extension direction of the air extraction channel 11 is horizontally extending from the inside to the outside.
[0038] In this embodiment, the exhaust channel extends along the length direction of the air pumping block 1. Figure 5 It is understood that the exhaust channel 11 and the extension direction of the exhaust channel in this embodiment can integrate the necessary air channel structure without increasing the size and volume of the exhaust block 1, which is conducive to improving the miniaturization and integrated design of the exhaust device.
[0039] Furthermore, the air extraction channel 11 and the exhaust channel are arranged perpendicular to each other. Of course, as in other embodiments, the positional relationship between the air extraction channel 11 and the exhaust channel includes but is not limited to the above-mentioned perpendicular relationship.
[0040] Please refer again Figure 2 and Figure 3 The exhaust control assembly 2 includes: an exhaust angle valve core 21 and a vacuum gauge 23. The exhaust angle valve core 21 is connected to the outer side of the exhaust block 1, and the vacuum gauge 23 is connected to the exhaust channel.
[0041] In this embodiment, the valve core 21 of the exhaust angle valve, which controls the on / off flow of the gas path, is directly integrated into the exhaust block 1. This avoids the prior art practice of connecting the finished exhaust angle valve to the reaction chamber 200. Due to the L-shaped housing of the finished exhaust angle valve, the installation position and angle are limited. This embodiment solves the aforementioned drawbacks by directly integrating the valve core 21 of the exhaust angle valve directly into the exhaust block 1.
[0042] The air extraction control assembly 2 further includes a safety valve 22, which is connected to the air extraction channel 11. The safety valve 22 is used to control the air extraction pressure of the air extraction channel to be triggered when it exceeds a limit value, thereby ensuring the safety of the air extraction process.
[0043] The vacuum gauge 23 is also called a vacuum gauge, which is used to detect the vacuum degree or pressure of the cavity. In this embodiment, the vacuum gauge 23 indirectly detects the pressure value in the reaction chamber 201 of the reaction chamber 200 by detecting the air pressure in the exhaust channel 11.
[0044] Please refer again Figure 5 The exhaust channel includes: a main exhaust channel 13 and a plurality of auxiliary exhaust channels 14 (15) connected to the main exhaust channel 13. The number of the auxiliary exhaust channels 14 (15) is the same as the number of the exhaust control components 2 (3), and each of the auxiliary exhaust channels 14 (15) is provided with an exhaust channel 11 (12) connected thereto. The auxiliary exhaust channels 14 (15) are all arranged in parallel with the main exhaust channel 13, that is, the exhaust channel is a multi-inlet and one-outlet pipeline structure. While ensuring that the pipeline is unobstructed, the structural design and processing difficulty of the air channel inside the exhaust block 1 are simplified.
[0045] In this embodiment, the main exhaust passage 13 is located between the two auxiliary exhaust passages 14 and 15 .
[0046] The vacuum gauge 23 and the safety valve 22 of the same group of the exhaust control assembly 2 are respectively connected to the top and bottom of the exhaust block 1 and are connected to the same secondary exhaust channel 14 .
[0047] Similarly, another air extraction control assembly 3 also includes: a vacuum gauge 33, a safety valve 32, and an air extraction angle valve core 31. The vacuum gauge 33, safety valve 32, and air extraction angle valve core 31 are connected to another air passage, which includes the air extraction passage 12, the auxiliary exhaust passage 14, and the main exhaust passage 13. The structure of the air extraction control assembly 3 and the internal structure of the air extraction block 1 equipped with it are basically the same as those of the air extraction control assembly 2.
[0048] Please refer again Figure 6 and Figure 7 The present invention also provides a thin film deposition apparatus according to an embodiment of the present invention. The apparatus includes the integrated chamber exhaust device 100 and a reaction chamber 200. The integrated chamber exhaust device 100 is connected to the sidewall of the reaction chamber 200. An air inlet 202 and an air outlet 203 are disposed on the sidewalls of a reaction chamber 201 of the reaction chamber 200, and the air outlet 203 is connected to the exhaust channel 11. In other embodiments, the integrated chamber exhaust device 100 may also be connected to other locations of the reaction chamber 200.
[0049] In this embodiment, the reaction chamber 200 has two reaction chambers, and therefore its sidewalls are provided with two gas outlets 203 and 204. Correspondingly, the integrated chamber exhaust device 100 is provided with two sets of exhaust control components 2 and 3. In other embodiments, the number of reaction chambers 201 in the reaction chamber 200 corresponds to the number of exhaust control components integrated in the integrated chamber exhaust device 100, and may be one or more sets, which can be increased or decreased based on actual needs.
[0050] The integrated chamber exhaust device and thin film deposition apparatus of this embodiment integrates an exhaust angle valve core, a corresponding vacuum gauge, and a safety valve into a block-shaped exhaust block. The exhaust block is internally provided with exhaust and exhaust channels, thereby achieving a highly integrated exhaust module. This facilitates connection and assembly of the exhaust module at any location within the reaction chamber as needed. The thin film deposition apparatus of this embodiment arranges the reaction chamber's air inlet and outlet relative to each other, enabling convection of the incoming air and preventing dead zones within the reaction chamber.
[0051] The above examples are merely used to further illustrate the technical content of the present invention for easier understanding by the reader. However, they do not limit the implementation of the present invention to these examples. Any technical extension or reinvention based on the present invention is protected by the present invention. The scope of protection of the present invention shall be determined by the claims.
Claims
1. An integrated cavity exhaust device, characterized in that: include: An air pumping block, at least one set of air pumping control components connected to the air pumping block, an air pumping channel and an exhaust channel are provided on the air pumping block, one end of the air pumping channel and the exhaust channel extend to the surface of the air pumping block, and the air pumping control component is used to control the opening and closing of the air pumping channel and the exhaust channel.
2. The integrated cavity exhaust device according to claim 1, characterized in that: The air inlet end of the air extraction channel extends to the inner side surface of the air extraction block.
3. The integrated cavity exhaust device according to claim 2, characterized in that: The air extraction channel is extended along the thickness direction of the air extraction block.
4. The integrated cavity exhaust device according to claim 3, characterized in that: The exhaust channel extends along the length direction of the air pumping block.
5. The integrated cavity exhaust device according to claim 4, characterized in that: The air extraction channel and the air exhaust channel are arranged perpendicular to each other.
6. The integrated cavity exhaust device according to any one of claims 1 to 5, characterized in that: The air extraction control component includes: an air extraction angle valve core and a vacuum gauge, the air extraction angle valve core is connected to the outer side of the air extraction block, and the vacuum gauge is connected to the air extraction channel.
7. The integrated cavity exhaust device according to claim 6, characterized in that: The air extraction control component further includes a safety valve connected to the air extraction channel.
8. The integrated cavity exhaust device according to claim 7, characterized in that: The exhaust channel includes: a main exhaust channel and a plurality of auxiliary exhaust channels connected to the main exhaust channel. The number of the auxiliary exhaust channels is the same as the number of the exhaust control components, and each of the auxiliary exhaust channels is provided with an exhaust channel connected thereto.
9. The integrated cavity exhaust device according to claim 8, characterized in that: The vacuum gauge and the safety valve of the same group of the exhaust control components are respectively connected to the top and the bottom of the exhaust block, and are connected to the same auxiliary exhaust channel.
10. A thin film deposition device, characterized in that: The thin film deposition equipment includes an integrated chamber exhaust device and a reaction chamber as described in any one of claims 1 to 9, wherein the integrated chamber exhaust device is connected to the side wall of the reaction chamber, and the side wall of the reaction chamber of the reaction chamber is provided with an air inlet and an air outlet opposite to each other, and the air outlet is connected to the exhaust channel.