Gas sensor processing equipment capable of conveniently adjusting deposition thickness

Abstract

The utility model discloses a gas sensitive sensor processing device convenient to adjust deposition thickness, which comprises an ultrasonic cleaning machine, a cleaning tank is arranged on the ultrasonic cleaning machine, a placing basket is arranged in the cleaning tank, a fixed blow-drying mechanism is placed in the placing basket, the fixed blow-drying mechanism comprises a bottom plate, and the bottom plate is arranged on the bottom plate. Supporting blocks are fixed to the two sides of the top end of the bottom plate correspondingly, two fixing pipes are arranged at the top ends of the two supporting blocks correspondingly, air grooves are formed in the opposite sides of the two supporting blocks correspondingly, a lower pressing plate can be lifted through an auxiliary handle, a single crystal aluminum oxide substrate is placed on the bottom plate, the lower pressing plate is loosened, and the single crystal aluminum oxide substrate can be placed on the bottom plate. The downward pressing plate automatically presses down and fixes the single crystal aluminum oxide substrates, and when the fixing and blow-drying mechanism is placed in cleaning liquid, the single crystal aluminum oxide substrates are prevented from rolling over due to ultrasonic cleaning, so that the single crystal aluminum oxide substrates are prevented from colliding with one another and being damaged.

Description

Technical Field

[0001] The utility model relates to the field of gas sensor processing, in particular to gas sensor processing equipment which can conveniently adjust deposition thickness. Background Art

[0002] Gas sensors are used to detect gas concentration and composition, and they play an extremely important role in environmental protection and safety supervision.

[0003] The raw materials for gas-sensitive sensors include single-crystal alumina substrates. During production, an oriented single-crystal alumina substrate with a side length of 10 mm needs to be ultrasonically cleaned in acetone, isopropyl alcohol, and deionized water for 5 minutes in sequence. The substrate is then blown dry with ultra-clean synthetic air, and the polished surface of the substrate is checked under an optical microscope to see if it is clean. Otherwise, subsequent processing will be required.

[0004] Since the single crystal alumina substrate is small in size, it is easy for the single crystal alumina substrate to roll and collide when placed directly in an ultrasonic cleaning machine, resulting in damage to the single crystal alumina substrate.

[0005] Therefore, it is necessary to propose a new gas sensor processing equipment that can easily adjust the deposition thickness to solve the above problems. Utility Model Content

[0006] The purpose of the utility model is to provide a gas sensor processing equipment with convenient adjustment of deposition thickness, so as to solve the problem that the single crystal alumina substrate is small in size and is easily caused to roll and collide when placed directly in an ultrasonic cleaning machine, resulting in damage to the single crystal alumina substrate.

[0007] To achieve the above-mentioned purpose, the utility model provides the following technical solution: a gas sensor processing equipment that is convenient for adjusting the deposition thickness, including an ultrasonic cleaning machine, a cleaning tank is provided on the ultrasonic cleaning machine, a placement basket is provided inside the cleaning tank, and a fixed drying mechanism is placed inside the placement basket.

[0008] The fixed drying mechanism includes a base plate, support blocks are fixed on both sides of the top of the base plate, two fixed tubes are provided on the top of the two support blocks, air grooves are opened on the opposite sides of the two support blocks, the bottom ends of the two fixed tubes are connected to the corresponding air grooves, a lower pressure plate is slidably provided on the fixed tubes, an air box for inputting ultra-clean synthetic air is fixed on the ultrasonic cleaning machine, a hose is provided on one side of the air box, and one end of the hose is connected to the corresponding fixed tube.

[0009] Preferably, two gas boxes are provided, and the two gas boxes are connected by a pipeline. The bottom end of the hose is provided with a threaded opening, and the threaded opening is threadedly connected to the fixed pipe.

[0010] Preferably, support handles are fixed to the top ends of both sides of the placement basket, and the two support handles are supported on the top ends of both sides of the cleaning tank.

[0011] Preferably, an auxiliary handle is fixedly connected to the top of the lower pressure plate, and an input port is provided on one side of the air box.

[0012] Preferably, an ultrasonic generator is provided inside the ultrasonic cleaning machine, and the ultrasonic generator is located at the bottom end of the cleaning tank, and a cleaning liquid is provided inside the cleaning tank.

[0013] Preferably, the outer sides of the placement baskets are all provided with filter structures.

[0014] Preferably, a solenoid valve is provided at the connection between the input port and the corresponding gas box.

[0015] The beneficial technical effects of the present utility model are:

[0016] The lower pressure plate is lifted up by the auxiliary handle, and the single crystal alumina substrate is placed on the bottom plate. The lower pressure plate is released, and the lower pressure plate automatically presses down and fixes the single crystal alumina substrate. When the fixed drying mechanism is placed in the cleaning liquid, ultrasonic cleaning will not cause the single crystal alumina substrate to roll over, resulting in collisions between the single crystal alumina substrates and damage.

[0017] At the same time, single crystal alumina substrates can be stacked and placed as needed. According to the thickness of the single crystal alumina substrates, the lower pressure plate can be pressed down and fixed to clean and deposit single crystal alumina substrates of different thicknesses.

[0018] The support block can support the lower pressure plate at a minimum height, leaving space for the cleaning liquid to enter and clean the single crystal alumina substrate, so as to avoid squeezing and damaging the single crystal alumina substrate or the cleaning liquid being unable to enter. At the same time, when the single crystal alumina substrate is cleaned, the personnel pulls the placement basket up and inputs ultra-clean synthetic air through the input port. The ultra-clean synthetic air can be discharged from the wind slot on one side of the support block to dry the cleaned single crystal alumina substrate and reduce the residue of the cleaning liquid. The fixed pipe can be used as an air circulation channel and also as a sliding rod for the lower pressure plate to rise and fall. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 This is a structural diagram of the gas sensor processing equipment that facilitates adjustment of deposition thickness according to the present invention.

[0020] Figure 2 This is a schematic diagram of the structure of the input of the utility model.

[0021] Figure 3 This is a structural diagram of the placement basket and support handle of the utility model.

[0022] In the figure: 1. Ultrasonic cleaning machine; 2. Cleaning tank; 3. Air box; 4. Inlet port; 5. Hose; 6. Threaded port; 7. Auxiliary handle; 8. Placement basket; 9. Support handle; 10. Base plate; 11. Support block; 12. Fixing tube; 13. Lower pressure plate; 14. Air duct. DETAILED DESCRIPTION

[0023] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0024] like Figure 1 - Figure 3 As shown, the present invention provides a gas sensor processing device that can conveniently adjust the deposition thickness, including an ultrasonic cleaning machine 1, a cleaning tank 2 is provided on the ultrasonic cleaning machine 1, an ultrasonic generator is provided inside the ultrasonic cleaning machine 1, and the ultrasonic generator is located at the bottom of the cleaning tank 2, and a cleaning liquid is provided inside the cleaning tank 2. A placement basket 8 is provided inside the cleaning tank 2, and a fixed drying mechanism is placed inside the placement basket 8. The single crystal alumina substrate for manufacturing the gas sensor can be placed in the fixed drying mechanism, and the fixed drying mechanism can be placed inside the placement basket 8.

[0025] A cleaning liquid is injected into the cleaning tank 2, and acetone, isopropyl alcohol and deionized water are injected in sequence. The single crystal aluminum oxide substrate is cleaned by starting the ultrasonic cleaning machine 1.

[0026] The fixed drying mechanism includes a base plate 10, and support blocks 11 are fixed on both sides of the top of the base plate 10. Two fixed tubes 12 are provided on the top of the two support blocks 11. Wind grooves 14 are opened on the opposite sides of the two support blocks 11. The bottom ends of the two fixed tubes 12 are connected to the corresponding wind grooves 14. A lower pressure plate 13 is slidably provided on the fixed tubes 12. An air box 3 for inputting ultra-clean synthetic air is fixed on the ultrasonic cleaning machine 1. A hose 5 is provided on one side of the air box 3, and one end of the hose 5 is connected to the corresponding fixed tube 12.

[0027] There are two air boxes 3, which are connected by a pipe. A threaded port 6 is provided at the bottom end of the hose 5, and the threaded port 6 is threadedly connected to the fixed tube 12. An auxiliary handle 7 is fixedly connected to the top of the lower pressure plate 13. An input port 4 is provided on one side of the air box 3, and an electromagnetic valve is provided at the connection between the input port 4 and the corresponding air box 3.

[0028] In the actual operation of the present invention, the lower pressure plate 13 can be lifted up by the auxiliary handle 7, and the single crystal alumina substrate can be placed on the bottom plate 10. The lower pressure plate 13 is released, and the lower pressure plate 13 automatically presses down and fixes the single crystal alumina substrate. When the fixed drying mechanism is placed in the cleaning liquid, ultrasonic cleaning will not cause the single crystal alumina substrate to roll, resulting in collisions between the single crystal alumina substrates and damage.

[0029] At the same time, single crystal alumina substrates can be stacked and placed as needed. According to the thickness of the single crystal alumina substrates, the lower pressing plate 13 can be pressed down and fixed to clean and deposit single crystal alumina substrates of different thicknesses.

[0030] Furthermore, the support block 11 can support the lower pressure plate 13 to a minimum height, leaving space for the cleaning liquid to enter and clean the single crystal alumina substrate, thereby preventing the single crystal alumina substrate from being squeezed and damaged or the cleaning liquid from entering. At the same time, when the single crystal alumina substrate is cleaned, the personnel lifts the placement basket 8 up and inputs ultra-clean synthetic air through the input port 4. The ultra-clean synthetic air can be discharged from the wind slot 14 on one side of the support block 11 to dry the cleaned single crystal alumina substrate and reduce the residual cleaning liquid. The fixed tube 12 can serve as an air circulation channel and also as a sliding rod for the lower pressure plate 13 to rise and fall.

[0031] Support handles 9 are fixed to the top of both sides of the placement basket 8. The two support handles 9 are supported on the top of both sides of the cleaning tank 2 to facilitate personnel to take the placement basket 8.

[0032] The outer sides of the placement baskets 8 are all provided with filter structures, so as to facilitate the entry of the cleaning liquid into the placement baskets 8 to clean the single crystal alumina substrate.

Claims

1. A gas sensor processing device that can easily adjust the deposition thickness, characterized by: The invention comprises an ultrasonic cleaning machine (1), wherein a cleaning tank (2) is provided on the ultrasonic cleaning machine (1), a placement basket (8) is provided inside the cleaning tank (2), and a fixed drying mechanism is placed inside the placement basket (8); the fixed drying mechanism comprises a bottom plate (10), support blocks (11) are fixed on both sides of the top of the bottom plate (10), two fixed pipes (12) are provided at the tops of the two support blocks (11), air grooves (14) are provided on opposite sides of the two support blocks (11), the bottom ends of the two fixed pipes (12) are communicated with the corresponding air grooves (14), a lower pressure plate (13) is slidably provided on the fixed pipes (12), an air box (3) for inputting ultra-clean synthetic air is fixed on the ultrasonic cleaning machine (1), a hose (5) is provided on one side of the air box (3), and one end of the hose (5) is connected to the corresponding fixed pipe (12).

2. The gas sensor processing equipment with convenient adjustment of deposition thickness according to claim 1, characterized in that: There are two gas boxes (3), which are connected via a pipeline. The bottom end of the hose (5) is provided with a threaded opening (6), and the threaded opening (6) is threadedly connected to the fixed pipe (12).

3. The gas sensor processing equipment with convenient adjustment of deposition thickness according to claim 1, characterized in that: Support handles (9) are fixed to the top ends of both sides of the placement basket (8), and the two support handles (9) are supported on the top ends of both sides of the cleaning tank (2).

4. The gas sensor processing equipment with convenient adjustment of deposition thickness according to claim 1, characterized in that: The top end of the lower pressing plate (13) is fixedly connected to an auxiliary handle (7), and an input port (4) is provided on one side of the air box (3).

5. The gas sensor processing equipment with convenient adjustment of deposition thickness according to claim 1, characterized in that: An ultrasonic generator is provided inside the ultrasonic cleaning machine (1), and the ultrasonic generator is located at the bottom end of the cleaning tank (2). Cleaning liquid is provided inside the cleaning tank (2).

6. The gas sensor processing equipment with convenient adjustment of deposition thickness according to claim 1, characterized in that: The outer sides of the placement baskets (8) are all arranged as filter structures.

7. The gas sensor processing equipment with convenient adjustment of deposition thickness according to claim 4, characterized in that: A solenoid valve is provided at the connection between the input port (4) and the corresponding gas box (3).

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