Automatic feeding device and evaporator

Abstract

The utility model provides an automatic feeding device and an evaporator, the automatic feeding device comprises a stock bin, a driving device, a gravity sensor, a container and a signal processor, the stock bin is used for placing a metal source material, and a telescopic valve is arranged at a discharge port of the stock bin; the driving device is connected with the telescopic valve so as to control the discharge port to be opened or closed; the gravity sensor is positioned below the discharge hole; the container is located on the gravity sensor, and the metal source material in the stock bin can enter the container through the discharge port; the signal processor is electrically connected with the gravity sensor and the driving device, signals of the gravity sensor are fed back to the signal processor, and the signal processor controls the driving device to open or close the discharging port. Through the gravity sensor, the signal processor and the driving device, automatic source adding of the crucible is achieved, impurities are prevented from being introduced by manual source adding, and the weighing time is shortened; in addition, the detection structure can avoid splashing caused by wrong addition of the metal source, and can detect whether the metal source material in the crucible contains impurities or not, thereby avoiding splashing caused by the impurities.

Description

Technical Field

[0001] The utility model belongs to the field of wafer processing and relates to an automatic feeding device and a vapor deposition machine. Background Art

[0002] Wafer processing involves metal deposition, currently performed primarily through two methods: magnetron sputtering and evaporation. The principle of evaporation involves accelerating an electron beam under high pressure, deflecting it through a strong magnetic field, and impacting the target, thereby heating the evaporation source. The heating is limited to the surface of the evaporation source. Metal deposition typically involves multiple metal materials, using multiple crucibles arranged in a circle. The crucible corresponding to the material being evaporated is then positioned for electron beam bombardment.

[0003] During manufacturing, each batch of products consumes a certain amount of metal source in the crucible. Therefore, the metal source needs to be manually weighed and added before the process begins. During the process of adding the metal source, it is difficult to distinguish the differences between different source materials with the naked eye. If the wrong source material particles are added, during the evaporation process, different metals have different specific heat capacities and different thermal expansion and contraction ratios, which can easily cause sputtering. During sputtering, some metals are liquid. When the splashing liquid metal hits the wafer, it will melt the wafer, resulting in large-scale scrap and cross-contamination of metal sources in different crucibles. At the same time, surface impurities left over from the process and impurities introduced during the manual removal and placement of source materials are also the main causes of spatter sources. The current main means of avoiding surface impurities is manual observation before adding the source and cleaning the machine and crucible. This is extremely subjective and can easily lead to misjudgment and omission, resulting in the scrapping of the spatter source.

[0004] Therefore, how to provide an automatic feeding device and a vapor deposition machine to avoid incorrect addition of metal sources or splashing caused by impurities in the metal source has become a technical problem that needs to be solved urgently by those skilled in the art. Utility Model Content

[0005] In view of the above-mentioned shortcomings of the prior art, the purpose of the present invention is to provide an automatic feeding device and a vapor deposition machine to solve the problem in the prior art that manual addition of metal sources easily leads to incorrect addition and introduction of impurities.

[0006] To achieve the above-mentioned and other related purposes, the present invention provides an automatic feeding device, comprising:

[0007] A silo is used to store metal source materials, and a discharge port of the silo is provided with a telescopic valve;

[0008] A driving device connected to the telescopic valve to control the opening or closing of the discharge port;

[0009] A gravity sensor is located below the discharge port;

[0010] a container, located on the gravity sensor, into which the metal source material in the silo can flow through the discharge port;

[0011] A signal processor is electrically connected to the gravity sensor and the driving device, wherein the signal of the gravity sensor is fed back to the signal processor, and the signal processor controls the driving device to open or close the discharge port.

[0012] Optionally, a detection structure is further included, which includes an X-ray emitter and an X-ray receiver. The X-rays emitted by the X-ray emitter are irradiated to the metal source material in the container to obtain an X-ray reflection information spectrum of the metal source material in the container.

[0013] Optionally, the detection mechanism further includes a memory connected to the X-ray receiver to store the X-ray reflection information spectrum.

[0014] Optionally, a rotating structure is further included, and the rotating structure is used to drive the container to rotate.

[0015] Optionally, the driving device includes a motor.

[0016] Optionally, the container comprises a crucible.

[0017] Optionally, there are multiple silos to store different types of metal source materials; and there are multiple containers to load different types of metal source materials.

[0018] Optionally, the number of the silos is three, and the number of the containers is three.

[0019] Optionally, the accuracy of the gravity sensor is 0.1g.

[0020] The utility model also provides a vapor deposition machine, which includes any one of the automatic feeding devices described above.

[0021] As described above, in the automatic feeding device and the evaporation machine of the present invention, the gravity sensor, the signal processor and the driving device can realize automatic source addition to the crucible, avoid the introduction of impurities by manual source addition, and reduce the weighing time; in addition, the detection structure can avoid splashing caused by incorrect addition of the metal source, and can detect whether the metal source material in the crucible contains impurities, thereby avoiding splashing caused by impurities. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 Shown is a structural schematic diagram of the automatic feeding device in an embodiment of the present utility model.

[0023] Component number description

[0024] 1 Silo

[0025] 2 telescopic valve

[0026] 3 Drive unit

[0027] 4 Gravity sensor

[0028] 5 Containers

[0029] 6 Signal Processor

[0030] 7 X-ray emitters

[0031] 8 X-ray receivers

[0032] 9 Memory DETAILED DESCRIPTION

[0033] The following describes the embodiments of the present invention through specific examples. Those skilled in the art will readily understand the other advantages and benefits of the present invention from the disclosure herein. The present invention may also be implemented or applied through various other specific embodiments, and the details in this specification may be modified or altered based on different perspectives and applications without departing from the spirit of the present invention.

[0034] See also Figure 1 It should be noted that the illustrations provided in this embodiment are merely schematic illustrations of the basic concept of the present invention. Therefore, the illustrations only show components relevant to the present invention and are not drawn according to the number, shape, and size of components in actual implementation. In actual implementation, the type, quantity, and proportion of each component may be arbitrarily changed, and the component layout may also be more complex.

[0035] This embodiment provides an automatic feeding device, see Figure 1 The automatic feeding device includes a silo 1, a driving device 3, a gravity sensor 4, a container 5 and a signal processor 6. The silo 1 is used to place metal source materials, and the discharge port of the silo 1 is provided with a telescopic valve 2; the driving device 3 is connected to the telescopic valve 2 to control the opening or closing of the discharge port; the gravity sensor 4 is located below the discharge port; the container 5 is located on the gravity sensor 5, and the metal source material in the silo 1 can enter the container 5 through the discharge port; the signal processor 6 is electrically connected to the gravity sensor 4 and the driving device 3, wherein the signal of the gravity sensor 4 is fed back to the signal processor 6, and the signal processor 6 controls the driving device 3 to open or close the discharge port.

[0036] As an example, the weight standard value is set to 300g, wherein the weight of the container 5 is 200g, and the metal source material in the container 5 is 100g. After the metal deposition process, the metal source material in the container 5 is consumed, and the container 5 is placed in the weighing area. The gravity sensor 4 obtains weight information. The weight of the container 5 containing the metal source material is less than the standard value of 300g. The driving device 3 receives a signal to open the telescopic valve 2, and the metal source material in the silo 1 falls into the container 5 until the weight reaches the standard value of 300g±2g. The driving device 3 receives a signal to close the telescopic valve 2.

[0037] As an example, the driving device 3 is a motor, and the driving device 3 is driven by the telescopic valve 2 through a belt-gear.

[0038] As an example, the accuracy of the gravity sensor 4 is 0.1 g. The high-precision gravity sensor 4 is used to provide an accurate weight measurement result for the metal source material in the container 5 .

[0039] As an example, the container 5 is a crucible used for evaporation in an electron gun evaporation machine.

[0040] As an example, a detection structure is also included, which includes an X-ray emitter 7 and an X-ray receiver 8. The X-rays emitted by the X-ray emitter 7 are irradiated to the metal source material in the container 5 to obtain the X-ray reflection information spectrum of the metal source material in the container 5.

[0041] As an example, the detection mechanism further includes a memory 9, which is connected to the X-ray receiver to store the X-ray reflection information spectrum; in this embodiment, the memory 9 is a computer.

[0042] As an example, in the initial state, after the metal source material in the silo 1 is added to the container 5 and melted into a standard metal ingot, the X-ray reflection information spectrum of the metal source material in the silo 1 is obtained by the detection mechanism as a standard X-ray reflection information spectrum and stored in the memory 9; after the metal source material in the container 5 is consumed in production, when the container 5 is placed in the corresponding area to add metal source material, the X-ray reflection information spectrum of the metal source material in the container 5 is obtained by the detection mechanism and compared with the corresponding standard X-ray reflection information spectrum. If the spectral information matching degree is 100±5%, weighing and adding are started; if the spectral information does not match 100%, it indicates that the container 5 is placed in the wrong area, and an alarm signal is generated, which can avoid splashing caused by incorrect addition of metal source material in advance; if the spectral information does not match 20%-80%, it indicates that the metal source material in the container 5 has impurities left over during the long-term evaporation production process, and an alarm signal is generated for cleaning or manual melting to remove impurities, which can avoid splashing caused by impurities in advance.

[0043] As an example, the X-ray transmitter 7 and the X-ray receiver 8 are separately arranged on both sides of the discharge port of the silo 1 .

[0044] As an example, a rotating structure is also included, which is used to drive the container 5 to rotate. When obtaining the X-ray reflection information spectrum of the metal source material in the container 5, the rotating structure drives the container 5 to rotate 360° and then collects the surface information of the metal source material, which can make the collection of the surface information of the metal source material in the container 5 more efficient and accurate.

[0045] As an example, there are multiple silos 1 to store different types of metal source materials; there are multiple containers 1 to load different types of metal source materials.

[0046] As an example, the last step in the wafer back-end process is usually back-end metallization, and the metal materials used for back-end metallization are Ti, Ni, and Ag. In this embodiment, three silos 1 are provided to respectively store Ti, Ni, and Ag, and three containers 5 are provided to respectively load Ti, Ni, and Ag for metal evaporation. Of course, in other examples, the silos 1 can also be provided to store other types of metal source materials, and the number of silos 1 can also be selected according to actual needs and is not limited to this embodiment.

[0047] The utility model also provides a vapor deposition machine, which includes the automatic feeding device mentioned above.

[0048] In summary, the automatic feeding device and evaporation machine of the present invention, through the use of a gravity sensor, a signal processor, and a drive device, can automatically add the source to the crucible, avoiding the introduction of impurities during manual addition and reducing weighing time. Furthermore, the provision of a detection structure prevents splashing caused by incorrectly added metal source and can detect whether the metal source material in the crucible contains impurities, thereby preventing splashing caused by impurities. Therefore, the present invention effectively overcomes the various shortcomings of the prior art and has high industrial application value.

[0049] The above embodiments are merely illustrative of the principles and effects of the present invention and are not intended to limit the present invention. Anyone skilled in the art may modify or alter the above embodiments without departing from the spirit and scope of the present invention. Therefore, all equivalent modifications or alterations made by one of ordinary skill in the art without departing from the spirit and technical principles disclosed in the present invention are intended to be covered by the claims of the present invention.

Claims

1. An automatic feeding device, characterized in that: include: A silo is used to store metal source materials, and a discharge port of the silo is provided with a telescopic valve; A driving device connected to the telescopic valve to control the opening or closing of the discharge port; A gravity sensor is located below the discharge port; a container, located on the gravity sensor, into which the metal source material in the silo can flow through the discharge port; A signal processor is electrically connected to the gravity sensor and the driving device, wherein the signal of the gravity sensor is fed back to the signal processor, and the signal processor controls the driving device to open or close the discharge port.

2. The automatic feeding device according to claim 1, characterized in that: The container further includes a detection structure comprising an X-ray emitter and an X-ray receiver. The X-rays emitted by the X-ray emitter are irradiated to the metal source material in the container to obtain an X-ray reflection information spectrum of the metal source material in the container.

3. The automatic feeding device according to claim 2, characterized in that: The detection mechanism further includes a memory connected to the X-ray receiver to store the X-ray reflection information spectrum.

4. The automatic feeding device according to claim 2, characterized in that: It also includes a rotating structure, which is used to drive the container to rotate.

5. The automatic feeding device according to claim 1, characterized in that: The driving device includes a motor.

6. The automatic feeding device according to claim 1, characterized in that: The container includes a crucible.

7. The automatic feeding device according to claim 1, characterized in that: There are multiple silos to store different types of metal source materials; there are multiple containers to load different types of metal source materials.

8. The automatic feeding device according to claim 7, characterized in that: The number of the silos is three, and the number of the containers is three.

9. The automatic feeding device according to claim 1, characterized in that: The accuracy of the gravity sensor is 0.1g.

10. A vapor deposition machine, characterized in that: The evaporation machine includes the automatic feeding device according to any one of claims 1 to 9.

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