Cavity capable of being vacuumized and anti-reflection coating supply system

Abstract

The utility model discloses a vacuumizable cavity which comprises a cavity body and a pipeline system, the cavity body is used for storing anti-reflection coating, the pipeline system comprises a feeding pipeline, a discharging pipeline, an exhaust pipeline and a vacuumizing pipeline, the feeding pipeline and the discharging pipeline are connected with the cavity body, and the vacuumizing pipeline is connected with the cavity body. The exhaust pipeline and the vacuumizing pipeline are connected with the cavity body, and pipeline connectors are located above the anti-reflection coating. The utility model further provides a supply system of the anti-reflection coating, the supply system comprises the cavity capable of being vacuumized, a raw material supply tank and a coating opening, the raw material supply tank is connected with the cavity capable of being vacuumized through the feeding pipeline, and the coating opening is connected with the cavity capable of being vacuumized through the discharging pipeline. The method can prevent bubble residues in the anti-reflection coating from leaving annular defects on the surface of the wafer in the subsequent exposure and development process.

Description

TECHNICAL FIELD

[0001] The utility model belongs to the field of semiconductor manufacturing, concretely relates to a kind of vacuum cavity and the supply system of anti-reflection coating. BACKGROUND

[0002] The anti-reflective layer (ARC) in the photoetch process is mainly used to reduce the light reflection that occurs in the photoetch process. In the photoetch process, if the wafer substrate is a light-reflecting material such as glass or metal, there will be a strong light reflection problem. When light shines on its surface, part of the light will be reflected, and another part will penetrate the substrate into the underlying layer. The reflected light will return to the photoresist layer, which may cause excessive exposure of the photoresist layer and produce problems such as image blur and distortion. In order to avoid this situation, an anti-reflective layer is needed. It is a special film that can absorb or interfere with reflected light, thereby reducing the impact of reflection.

[0003] In the production process, the anti-reflective layer is prone to have air bubbles, as shown in Figure 1 , a part of the light is totally reflected by the air bubble 100 during the exposure process, resulting in the photoresist that should be exposed in the photoresist layer 200 not being exposed, as shown in Figure 2 , the photoresist 300 that should be exposed but not exposed forms a ring-shaped photoresist residue 400 after the subsequent development process, and forms a ring-shaped defect after etching. TARC (Top Anti-Reflective Coating) refers to an anti-reflective coating coated on the photoresist layer (Photoresist) during the semiconductor manufacturing process. The prior art is to place the anti-reflective coating in a TANK cavity at normal pressure. There will be small air bubbles in the anti-reflective coating. When the PUMP is extracted and sprayed to the wafer surface, air bubbles will be left on the photoresist layer on the wafer surface, which will leave ring-shaped defects in the subsequent exposure and development process. UTILITY MODEL CONTENT

[0004] In view of the above-mentioned deficiencies of the prior art, the purpose of the utility model is to provide a supply system of vacuum cavity and anti-reflective coating, which can prevent air bubbles in the anti-reflective coating from leaving ring-shaped defects on the wafer surface in the subsequent exposure and development process.

[0005] To achieve the above-mentioned utility model purposes, the utility model provides the following technical solutions:

[0006] The utility model provides a kind of vacuumable cavity, including cavity body and pipeline system, the cavity body is used to store antireflection coating, the pipeline system includes feed pipeline, discharge pipeline, exhaust pipeline and vacuum pipeline, the feed pipeline and the discharge pipeline are connected with the cavity body, the exhaust pipeline and the vacuum pipeline are connected with the cavity body and pipeline interface are all located above the antireflection coating.

[0007] Let antireflection coating pass through vacuumable cavity and then be coated on the photoresist layer of wafer surface, the cavity body is vacuumed by vacuum pipeline, and the bubbles in the antireflection coating in the tank float and break under low pressure environment, thereby achieving the effect of removing bubbles, which can prevent the residual bubbles from causing ring-shaped defects on the wafer surface during subsequent exposure and development process, and improve product quality.

[0008] It also includes an air extraction pump connected to the vacuum pipeline through an air extraction pipeline, and a liquid stop valve is arranged in the air extraction pipeline between the vacuum pipeline and the air extraction pump. The liquid stop valve allows gas to pass normally but prevents liquid from passing through, preventing the antireflection coating from being sucked back into the vacuum pipeline and the air extraction pipeline due to vacuuming, and ensuring that the air extraction pipeline is free of liquid contamination.

[0009] A gas pressure detection sensor is arranged in the cavity body above the antireflection coating. The gas pressure detection sensor can be used to detect the gas pressure in the cavity body, so that the vacuuming of the vacuum pipeline can control the gas pressure within a suitable range, effectively removing bubbles and preventing the antireflection coating from being sucked back into the vacuum pipeline.

[0010] The utility model also provides a kind of antireflection coating supply system, including the above-mentioned vacuumable cavity, and also includes a raw material supply tank and a coating port, the raw material supply tank is connected to the vacuumable cavity through the feed pipeline, and the coating port is connected to the vacuumable cavity through the discharge pipeline.

[0011] The feed pipeline includes a first feed passage and a second feed passage, a filter is arranged on the first feed passage, a first switch is arranged on the first feed passage, and a second switch is arranged on the second feed passage. When there are tiny particulate impurities in the selected antireflection coating, the first feed passage is selected for feeding, and the second switch is closed. When the selected antireflection coating does not need to remove impurities, the second feed passage is selected for feeding, and the first switch is closed.

[0012] It also includes a material extraction pump, one end of the material extraction pump is connected to the vacuumable cavity through the discharge pipeline, the other end is connected to the coating port, and the material extraction pump is also connected to a pressure generator.

[0013] The backflow pipeline is arranged between the material pumping pump and the vacuumable cavity.

[0014] The full sensor is connected with the material pumping pump, and the pressure sensor is arranged on the pipeline between the pressure generator and the material pumping pump.

[0015] The flow meter and the distribution valve are sequentially arranged on the material outlet pipeline between the material pumping pump and the coating outlet.

[0016] The exhaust pipeline is connected with the raw material supply tank, and the exhaust pipeline of the vacuumable cavity is connected with the exhaust pipeline.

[0017] Compared with the prior art, the utility model has at least the following beneficial effects:

[0018] The anti-reflective coating is coated on the photoresist layer on the wafer surface after passing through the vacuumable cavity, the vacuum pipeline is used for vacuumizing the cavity body, the bubbles in the anti-reflective coating in the cavity body (TANK) are broken under the low-pressure environment, so that the bubbles are removed, the ring-shaped defects caused by the residual bubbles in the subsequent exposure and development process are prevented, and the product quality is improved. BRIEF DESCRIPTION OF DRAWINGS

[0019] In order to more clearly illustrate the technical scheme in the specific embodiments of the utility model, the drawings needed in the embodiment description will be briefly introduced, and obviously, the drawings described below are only some embodiments of the utility model, and other drawings can be obtained according to these drawings without creative labor for the ordinary skilled in the art.

[0020] Figure 1 It is a schematic diagram of the unexposed photoresist caused by the bubbles in the anti-reflective layer;

[0021] Figure 2 It is a cross-sectional schematic diagram of the ring-shaped photoresist residue formed after development;

[0022] Figure 3 It is a structure schematic diagram of the vacuumable cavity in embodiment 1 and embodiment 2;

[0023] Figure 4 It is a schematic diagram of the supply system of the anti-reflective coating in embodiment 2.

[0024] Reference numerals: 100-bubble; 200-photoresist layer; 300-unexposed photoresist; 400-annular photoresist residue; 1-cavity body; 2-feeding pipeline; 201-first feeding passage; 202-second feeding passage; 203-filter; 204-first switch; 205-second switch; 206-backflow pipeline; 3-discharging pipeline; 4-exhaust pipeline; 5-vacuumizing pipeline; 6-pumping pump; 7-exhaust pipeline; 8-liquid-stopping valve; 9-air pressure detection sensor; 10-raw material supply tank; 11-coating port; 12-raw material storage tank; 13-pressure generator; 14-full sensor; 15-pressure sensor; 16-flow meter; 17-distribution valve; 18-exhaust line; a, b, c, d, e, f, g, h-switch. DETAILED DESCRIPTION

[0025] The technical solutions in the embodiments of the present application will be described below in a clear and complete manner. Obviously, the described embodiments are only some of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the present application.

[0026] It should be noted that, in order to describe the technical solutions more specifically, the steps described in the following embodiments do not strictly and correspondingly correspond to the steps described in the part of the present application.

[0027] Embodiment 1

[0028] A vacuumizable cavity, with reference to Figure 3 and Figure 4 , comprises a cavity body 1 for storing anti-reflective coating and a pipeline system, the pipeline system comprises a feeding pipeline 2, a discharging pipeline 3, an exhaust pipeline 4 and a vacuumizing pipeline 5, the feeding pipeline 2 and the discharging pipeline 3 are connected with the cavity body 1, the exhaust pipeline 4 and the vacuumizing pipeline 5 are connected with the cavity body 1 and the pipeline interfaces are all located above the anti-reflective coating. An exhaust pump (not shown) is further included, connected with the vacuumizing pipeline 5 through an exhaust pipeline 7, a liquid-stopping valve 8 is arranged in the exhaust pipeline 7 between the vacuumizing pipeline 5 and the exhaust pump, the liquid-stopping valve 8 can prevent the anti-reflective coating from being sucked back to contaminate the whole exhaust pipeline 7. An air pressure detection sensor 9 is arranged in the cavity body 1, located above the anti-reflective coating, for detecting the air pressure in the cavity body 1 and cooperating with the vacuumizing pipeline 5 to provide appropriate pressure for removing bubbles in the anti-reflective coating. The anti-reflective coating is TARC coating, i.e. top anti-reflective layer coating, and the bottom anti-reflective layer coating, i.e. BARC coating, can not be removed of bubbles separately because of different materials and the fact that the heat plate baking after BARC process can remove bubbles.

[0029] Embodiment 2

[0030] A supply system of anti-reflective coating, referring to Figure 3 and Figure 4 , comprising the vacuumable cavity provided in embodiment 1, further comprising a raw material supply tank 10 and a coating port 11, the raw material supply tank 10 is connected with the vacuumable cavity through a feeding pipeline 2, the coating port 11 is connected with the vacuumable cavity through a discharging pipeline 3, the coating port 11 is a nozzle, used for spraying anti-reflective coating on the photoresist layer on the wafer surface. Further comprising a raw material storage tank 12, the raw material storage tank 12 is connected with the raw material supply tank 10, and the anti-reflective coating is transported into the raw material supply tank 10. Nitrogen supply is provided for the raw material storage tank 12 to control the pressure balance in the container, and a switch a is provided to control the nitrogen supply, a switch b is provided between the raw material storage tank 12 and the raw material supply tank 10, the switch b is a switch control valve, when the liquid level of the raw material supply tank 10 is lower than the set value, the switch b is automatically opened, and the raw material supply tank 10 is supplemented with liquid from the raw material storage tank 12.

[0031] The feeding pipeline 2 comprises a first feeding passage 201 and a second feeding passage 202, the first feeding passage 201 is provided with a filter 203, the first feeding passage 201 is provided with a first switch 204, and the second feeding passage 202 is provided with a second switch 205. The first feeding passage 201 and the second feeding passage 202 are both connected with the raw material supply tank 10, and the first switch 204 and the second switch 205 are selectively opened and closed. When the anti-reflective coating supplied has less impurities of small particles, it can be used without filtering, at this time, the first switch 204 is closed and the second switch 205 is opened, and the anti-reflective coating is supplied through the second feeding passage 202; when the anti-reflective coating supplied has more impurities of small particles, some impurities of small particles need to be filtered out, at this time, the second switch 205 is closed and the first switch 204 is opened, and the anti-reflective coating is supplied through the first feeding passage 201.

[0032] The system further comprises a material pumping device 6, one end of which is connected to the vacuumable cavity through the material outlet pipeline 3, and the other end is connected to the coating outlet 11, and the material pumping device 6 is used to pump and transport the anti-reflective coating in the vacuumable cavity after removing bubbles to the coating outlet 11. The material pumping device 6 is further connected to a pressure generator 13. A backflow pipeline 206 is further arranged between the material pumping device 6 and the vacuumable cavity, and the backflow pipeline 206 is located above the material pumping device 6. A switch c is arranged on the backflow pipeline 206, and when the switch c is opened, the liquid in the material pumping device 6 can flow back to the vacuumable cavity. A switch d is arranged between the vacuumable cavity and the material pumping device 6. The pressure generator 13 serves as a power source for pumping and backflow of the material pumping device 6. The system further comprises a full sensor 14 and a pressure sensor 15, the full sensor 14 is connected to the material pumping device 6, the pressure sensor 15 is arranged on the pipeline between the pressure generator 13 and the material pumping device 6, the pressure sensor 15 is a pressure detection sensor for the operation of the material pumping device 6, and the full sensor 14 is a liquid level detector in the material pumping device 6. A flow meter 16 and a distribution valve 17 are further arranged in sequence on the material outlet pipeline 3 between the material pumping device 6 and the coating outlet 11. A switch e is arranged between the material pumping device 6 and the flow meter 16.

[0033] The system further comprises an exhaust pipeline 18, the raw material supply tank 10 is connected to the exhaust pipeline 18 and is provided with a switch f, the exhaust pipeline 4 of the vacuumable cavity is connected to the exhaust pipeline 18 and is provided with a switch h, and the filter 203 is connected to the exhaust pipeline 18 and is provided with a switch g. The exhaust pipeline 18 is used to control the pressure balance in the container.

[0034] The use process of the utility model is described in combination with Embodiment 1 and Embodiment 2:

[0035] The anti-reflection coating is transported from the raw material storage tank 12 to the raw material supply tank 10, and is transported from the raw material supply tank 10 into the vacuumable cavity through the first feeding channel 201 and / or the second feeding channel 202, and is vacuumed in the cavity body 1 through the vacuum pipeline 5 to remove the bubbles in the anti-reflection coating, and the anti-reflection coating after removing the bubbles is extracted by the extraction pump 6, is sprayed from the nozzle, i.e. the coating port 11, through the flow meter 16 and the distribution valve 17 on the discharge pipeline 3, and is coated on the photoresist layer on the wafer surface. The extraction pump 6 transports part of the excess and residual liquid back into the vacuumable cavity through the backflow pipeline 206. The utility model is suitable for the pretreatment of all photoresist layers with anti-reflection coating TARC, and can remove the bubbles of the anti-reflection layer. The process of removing the bubbles at the vacuum position is as follows: when working, the valve, i.e. the switch h, on the exhaust pipeline 4 is closed. According to the Bernoulli three-way principle, the air in the vacuumable cavity, i.e. the TANK, can be extracted to 0.2 atm, so as to ensure that the liquid, i.e. the anti-reflection coating, is not sucked back into the vacuum pipeline 5 under the action of gravity. For the bubbles suspended in the anti-reflection coating: F buoyancy = F pressure + G bubble, when the air pressure in the upper part of the TANK decreases, the F pressure of the bubble decreases, the F buoyancy of the bubble is greater than its own gravity + its own pressure, the bubble rises, the volume increases, the F buoyancy of the bubble is ρgV, the bubble increases more, and finally accelerates to float and break.

[0036] The above description of the embodiments is only used to help understand the method and core idea of the utility model. It should be pointed out that, for ordinary skilled persons in the technical field, some improvements and modifications can be made to the utility model without departing from the principle of the utility model, and these improvements and modifications also fall within the scope of protection of the utility model.

Claims

1. A vacuum chamber, characterized in that: The invention comprises a cavity body (1) and a pipeline system, wherein the cavity body (1) is used for storing anti-reflective coating, and the pipeline system comprises a feed pipeline (2), a discharge pipeline (3), an exhaust pipeline (4) and a vacuum pipeline (5), wherein the feed pipeline (2) and the discharge pipeline (3) are connected to the cavity body (1), and the exhaust pipeline (4) and the vacuum pipeline (5) are connected to the cavity body (1), and the pipeline interfaces are all located above the anti-reflective coating.

2. The vacuum chamber according to claim 1, wherein: It also includes an air pump connected to the vacuum pumping pipeline (5) via an air pumping pipeline (7), and a liquid stop valve (8) is provided in the air pumping pipeline (7) between the vacuum pumping pipeline (5) and the air pump.

3. The vacuum chamber according to claim 1, wherein: An air pressure detection sensor (9) is provided in the cavity body (1) and is located above the anti-reflective coating.

4. Anti-reflective coating supply system, characterized in that, It comprises the vacuum chamber according to claim 1, and also comprises a raw material supply tank (10) and a coating port (11), wherein the raw material supply tank (10) is connected to the vacuum chamber through the feed pipe (2), and the coating port (11) is connected to the vacuum chamber through the discharge pipe (3).

5. The anti-reflective coating supply system according to claim 4, characterized in that: The feed pipeline (2) comprises a first feed passage (201) and a second feed passage (202); the first feed passage (201) is provided with a filter (203); the first feed passage (201) is provided with a first switch (204); and the second feed passage (202) is provided with a second switch (205).

6. The anti-reflective coating supply system according to claim 4, characterized in that: The invention also includes a material extraction pump (6), one end of which is connected to the vacuum chamber via the discharge pipe (3), and the other end is connected to the coating port (11), and the material extraction pump (6) is also connected to a pressure generator (13).

7. The anti-reflective coating supply system according to claim 6, characterized in that: A return line (206) is also provided between the extraction pump (6) and the vacuum chamber.

8. The anti-reflective coating supply system according to claim 6, characterized in that: It also includes a full sensor (14) and a pressure sensor (15), wherein the full sensor (14) is connected to the material extraction pump (6), and the pressure sensor (15) is arranged on the pipeline between the pressure generator (13) and the material extraction pump (6).

9. The anti-reflective coating supply system according to claim 6, characterized in that: The discharge pipeline (3) between the extraction pump (6) and the coating port (11) is also provided with a flow meter (16) and a distribution valve (17) in sequence.

10. The anti-reflective coating supply system according to claim 4, characterized in that: The invention also includes an exhaust pipeline (18), the raw material supply tank (10) is connected to the exhaust pipeline (18), and the exhaust pipeline (4) of the vacuum chamber is connected to the exhaust pipeline (18).

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