Waste silicon powder purification treatment equipment

Abstract

The utility model provides waste silicon powder purification treatment equipment and relates to the field of waste silicon powder treatment. The waste silicon powder purification treatment equipment comprises: a tank body provided with a silicon powder inlet, a hot nitrogen inlet, a silicon powder outlet and an exhaust port; the heating device is provided with a nitrogen inlet and a nitrogen outlet, and the nitrogen outlet is communicated with the hot nitrogen inlet of the tank body; wherein a nitrogen distribution structure is arranged in the tank body, a gas inlet end of the nitrogen distribution structure is communicated with the hot nitrogen inlet, and a plurality of gas outlet ends of the nitrogen distribution structure are arranged at the bottom of a silicon powder storage chamber in the tank body, so that hot nitrogen discharged from the plurality of gas outlet ends can be in full contact with silicon powder; according to the waste silicon powder treatment device, the waste silicon powder treatment efficiency can be improved, and chlorosilane residues after treatment are reduced.

Description

Technical Field

[0001] This utility model relates to the field of waste silicon powder treatment, specifically a waste silicon powder purification and treatment equipment. Background Technology

[0002] Waste silicon powder originates from various sources, including the production processes of solar photovoltaic panels and polycrystalline silicon. In the production of solar photovoltaic panels, especially during the cutting of crystalline silicon wafers, a large amount of high-purity silicon is wasted due to the wire sawing of monocrystalline or polycrystalline silicon wafers; this waste silicon powder has high recycling value. Polycrystalline silicon production also generates a significant amount of waste silicon powder. While most of this waste silicon powder can be reused, its emission carries certain amounts of chlorosilanes, causing personal injury and environmental pollution.

[0003] The common method for treating hazardous waste silicon powder generated during polysilicon production is to repeatedly purge it with nitrogen in a standard silicon powder storage tank. However, this method involves numerous purges, is time-consuming, uses a large amount of nitrogen, has low efficiency, and results in high residual chlorosilane content. Consequently, the discharged silicon powder contains a high amount of chlorosilane, posing certain safety risks. Operators are required to wear protective gear, increasing the complexity of the treatment process. Utility Model Content

[0004] This invention addresses the problems of existing silicon powder treatment methods that involve multiple nitrogen purgings into ordinary silicon powder storage tanks, which are time-consuming, use large amounts of nitrogen, and have low processing efficiency, resulting in high chlorosilane content in the discharged silicon powder and posing certain safety risks. It provides a waste silicon powder purification and treatment device that allows nitrogen to be introduced into the silicon powder to treat chlorosilanes, thereby improving processing efficiency and reducing residual chlorosilanes after treatment.

[0005] The technical solution adopted in this utility model is:

[0006] A waste silicon powder purification and treatment device, comprising:

[0007] The tank body is equipped with a silicon powder inlet, a hot nitrogen inlet, a silicon powder outlet, and an exhaust port; and

[0008] The heating device is equipped with a nitrogen inlet and a nitrogen outlet, wherein the nitrogen outlet is connected to the hot nitrogen inlet of the tank.

[0009] The tank is equipped with a nitrogen distribution structure. The inlet of the nitrogen distribution structure is connected to the hot nitrogen inlet. Multiple outlets of the nitrogen distribution structure are located at the bottom of the silicon powder storage chamber inside the tank, so that the hot nitrogen discharged from the multiple outlets can fully contact the silicon powder.

[0010] Furthermore, the nitrogen gas distribution structure is recessed downwards in the middle, and the silicon powder outlet is connected to the bottom of the recessed part of the nitrogen gas distribution structure.

[0011] Furthermore, the nitrogen distribution structure includes a labyrinth-type distribution plate; the lower air inlet of the labyrinth-type distribution plate is connected to the hot nitrogen inlet, and the multiple air outlets on the upper part of the labyrinth-type distribution plate are located at the bottom of the silicon powder storage chamber inside the tank.

[0012] Furthermore, the nitrogen distribution structure also includes multiple nozzles; the air inlets of the multiple nozzles are connected to the multiple air outlets of the labyrinthine distribution plate, and the exhaust ports of the nozzles are located at the bottom of the silicon powder storage chamber inside the tank.

[0013] Furthermore, the nitrogen distribution structure includes multiple nozzles; the air inlets of the multiple nozzles are all connected to the hot nitrogen inlet, and the exhaust ports of the multiple nozzles are located at the bottom of the silicon powder storage chamber inside the tank.

[0014] Furthermore, the nozzle includes an inner nozzle and an outer cylinder fitted onto the inner nozzle; the gap between the inner nozzle and the outer cylinder forms a second chamber, and the second chamber is connected to the first chamber inside the inner nozzle through a side flow hole on the side wall of the inner nozzle, so that the exhaust hole of the nozzle is set towards the bottom of the tank to prevent silicon powder from entering the nozzle.

[0015] Furthermore, the inner nozzle and the outer cylinder are provided with matching mounting heads and mounting holes at the ends facing the top of the tank.

[0016] Furthermore, the heating device is a steam heater, which is also provided with a steam inlet and a condensate outlet.

[0017] Furthermore, it also includes:

[0018] The silicon powder filter has an air inlet connected to the exhaust port of the tank for receiving treated waste gas; the silicon powder filter is equipped with a ceramic filter element for gas filtration; and the silicon powder filter is provided with an exhaust port at the top for discharging waste gas; and the silicon powder filter is provided with a silicon powder recovery port at the bottom for discharging silicon powder.

[0019] Furthermore, the tank is provided with a silicon powder return port that communicates with the silicon powder recovery port of the silicon powder filter, for returning the separated and recovered silicon powder back into the tank.

[0020] The beneficial effects of this utility model are:

[0021] 1. This utility model uses a heating device to heat nitrogen gas, and then introduces the hot nitrogen gas and waste silicon powder containing chlorosilanes into the tank for silicon powder treatment. A nitrogen distribution structure evenly introduces hot nitrogen gas from the bottom of the waste silicon powder, agitating the silicon powder and creating a bubbling state. This allows the hot nitrogen gas to fully contact the waste silicon powder, removing residual chlorosilanes in the gaps between the silicon powder particles and those adsorbed on the surface. This achieves highly efficient waste silicon powder purification, reduces the residual chlorosilanes in the waste silicon powder, and solves the problems of existing methods that involve multiple nitrogen replacements in ordinary silicon powder storage tanks, which are time-consuming, use large amounts of nitrogen, have low processing efficiency, and result in high chlorosilane content in the discharged silicon powder, posing certain safety risks. Attached Figure Description

[0022] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0023] Figure 1 This is a schematic diagram of the processing equipment according to Embodiment 1 of this utility model;

[0024] Figure 2 This is a schematic diagram of the tank body according to Embodiment 2 of this utility model;

[0025] Figure 3 This is a schematic diagram of the tank body according to Embodiment 3 of this utility model;

[0026] Figure 4 This is a three-dimensional schematic diagram of the nozzle according to an embodiment of the present utility model;

[0027] Figure 5 This is a cross-sectional view of the nozzle according to an embodiment of the present invention;

[0028] Figure 6 This is a perspective view of the inner nozzle of an embodiment of the present utility model;

[0029] Figure 7 This is a perspective view of the outer cylinder of an embodiment of the present utility model;

[0030] Figure 8 This is a nozzle distribution diagram of an embodiment of the present invention.

[0031] Attached reference numerals: 100-Tank body, 110-Hot nitrogen inlet, 120-Exhaust port, 130-Silicon powder inlet, 140-Silicon powder outlet, 150-Maze distribution plate, 160-Silicon powder return port;

[0032] 200 - Steam heater, 210 - Steam inlet, 220 - Condensate outlet, 230 - Nitrogen inlet, 240 - Nitrogen outlet;

[0033] 300 - Silica powder filter, 310 - Air inlet, 320 - Exhaust gas outlet, 330 - Ceramic filter element, 340 - Silica powder recovery port;

[0034] 500-Nozzle, 520-Outer cylinder, 522-Exhaust port, 524-Mounting hole, 530-First chamber, 540-Inner nozzle, 542-Air inlet, 544-Mounting head, 546-Side flow hole, 548-Outer flange, 550-Second chamber. Detailed Implementation

[0035] In the description of this utility model, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this utility model and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model.

[0036] The following disclosure provides many different embodiments or examples for implementing various structures of this invention. To simplify the disclosure, specific examples of components and arrangements are described below. Of course, these are merely examples and are not intended to limit the scope of this invention.

[0037] The embodiments of the utility model will now be described in detail with reference to the accompanying drawings.

[0038] Example 1

[0039] In existing technologies, the hazardous waste silicon powder generated during polysilicon production is generally treated by purging nitrogen into a regular silicon powder storage tank for multiple replacements. This method only mixes nitrogen with the gas in the silicon powder storage tank, and the discharged nitrogen carries away some chlorosilanes. However, it cannot directly treat the chlorosilanes remaining in the gaps between silicon powder particles or adsorbed on the surface of the silicon powder, resulting in incomplete chlorosilane treatment, low treatment efficiency, and poor treatment effect.

[0040] Please see Figure 1This embodiment addresses the problems existing in the removal of chlorosilanes from silicon powder in the prior art by providing a waste silicon powder purification and treatment device. This device uses nitrogen gas to pass through the silicon powder to treat chlorosilanes, which can improve treatment efficiency and reduce the residue of chlorosilanes after treatment. The waste silicon powder purification and treatment device mainly includes: a tank 100 and a steam heater 200, etc.

[0041] Steam heater 200 is used to heat nitrogen gas, thereby providing high-temperature nitrogen gas to tank 100 for the removal of chlorosilanes. Steam heater 200 uses six kilograms of steam for heating. Internally, heat exchange tubes transfer the heat of the high-temperature steam to the nitrogen flowing through them. As the steam flows within the heat exchange tubes, heat is transferred through the tube walls to the nitrogen outside the tubes, raising the nitrogen temperature, while the steam gradually cools and condenses into water. Figure 1 As shown, the steam heater 200 is mainly equipped with a steam inlet 210, a condensate outlet 220, a nitrogen inlet 230, and a nitrogen outlet 240. The steam inlet 210 and nitrogen outlet 240 are located at the upper part of the steam heater 200. The steam inlet 210 is used to introduce steam to provide heat; the nitrogen outlet 240 is connected to the tank 100 and is used to supply hot nitrogen to the tank 100. In this example, the temperature of the hot nitrogen is preferably 160℃~170℃. The condensate outlet 220 and nitrogen inlet 230 are located at the lower part of the steam heater 200. The condensate outlet 220 is used to discharge condensate, which can be reheated and evaporated into steam externally; the nitrogen inlet 230 is connected to a nitrogen source for introducing nitrogen.

[0042] Tank 100 is used for temporary storage of waste silicon powder, serving as a container to provide space for the removal of chlorosilanes from the waste silicon powder. For example... Figure 1As shown, the tank body 100 is mainly equipped with a hot nitrogen inlet 110, an exhaust port 120, a silicon powder inlet 130, and a silicon powder outlet 140. The hot nitrogen inlet 110 is located on the lower side of the tank body 100 and is connected to the nitrogen outlet 240 of the steam heater 200 for introducing hot nitrogen. The exhaust port 120 is located near the top of the tank body 100 for discharging waste gas after hot nitrogen replacement treatment. The silicon powder inlet 130 is located in the middle of the tank body 100 for introducing waste silicon powder generated by the polysilicon production system. The silicon powder outlet 140 is located at the center of the bottom of the tank body 100 for discharging silicon powder after hot nitrogen replacement treatment. Additionally, the tank body 100 is equipped with a labyrinth-type distribution plate 150. The labyrinth-type distribution plate 150 is a plate with a special structure, characterized by achieving uniform distribution or separation of fluid through a series of tortuous channels. This design increases the path length of fluid flow, thereby improving the uniformity of fluid distribution or separation efficiency. In this embodiment, the fluid port at the lower part of the labyrinth-type distribution plate 150 serves as the nitrogen inlet, and the fluid port at the upper part serves as the nitrogen outlet. The lower inlet is connected to the hot nitrogen inlet 110, allowing hot nitrogen to enter the channel within the labyrinth-type distribution plate 150. The multiple outlets at the upper part are evenly distributed at the bottom of the silicon powder storage chamber within the tank 100. When hot nitrogen is blown out through the multiple outlets on the labyrinth-type distribution plate 150, it agitates the silicon powder, creating a bubbling state. This allows the hot nitrogen discharged from the multiple outlets to fully contact the silicon powder. During this process, the hot nitrogen carries away the chlorosilanes remaining in the gaps between the silicon powder particles and those adsorbed on the surface of the silicon powder, ensuring that these originally difficult-to-eliminate chlorosilanes can ultimately be discharged through the exhaust port 120. In this embodiment, on the one hand, the labyrinth distribution plate 150 can make the blown hot nitrogen gas evenly distributed at the bottom of the silicon powder, and on the other hand, the silicon powder above the labyrinth distribution plate 150 is not a fluid. The silicon powder is difficult to pass through a series of tortuous channels in the labyrinth distribution plate 150, so the labyrinth distribution plate 150 can also prevent the silicon powder from flowing back.

[0043] One specific working method of this embodiment is as follows:

[0044] First, waste silicon powder is introduced into tank 100 through silicon powder inlet 130. Then, the nitrogen source is turned on, and nitrogen is introduced into steam heater 200 through nitrogen inlet 230 and into tank 100 through nitrogen inlet 110. Next, steam inlet 210 and condensate outlet 220 of steam heater 200 are opened to introduce steam for heat exchange, gradually heating the nitrogen to 160°C. Inside tank 100, the hot nitrogen passes through labyrinth distribution plate 150 and is blown out from the bottom of the waste silicon powder, agitating the silicon powder and creating a bubbling state. The exhaust port 120 of tank 100 is opened to vent and replace the gas. After about 6 hours of treatment, most of the chlorosilanes are removed, and the introduction of hot nitrogen is stopped. Then, room temperature nitrogen is introduced to cool the silicon powder. After cooling to below 40°C, the silicon powder outlet 140 of tank 100 is opened, and the silicon powder with chlorosilanes removed is manually bagged.

[0045] In summary, in this embodiment, the waste silicon powder purification and treatment equipment is equipped with a steam heater 200 to heat nitrogen gas. Then, the hot nitrogen gas and waste silicon powder containing chlorosilanes are introduced into the tank 100 for silicon powder treatment. The hot nitrogen gas is evenly introduced from the bottom of the waste silicon powder using a labyrinth-type distribution plate 150, which blows the silicon powder and forms a bubbling state, allowing the hot nitrogen gas to fully contact the waste silicon powder, removing residual chlorosilanes in the gaps between the silicon powder particles and those adsorbed on the surface of the silicon powder. This achieves efficient waste silicon powder purification and treatment, reduces the residual chlorosilanes in the waste silicon powder, and solves the problems of the existing technology, which uses nitrogen gas to replace the silicon powder multiple times in a conventional silicon powder storage tank. This method is time-consuming, uses a large amount of nitrogen gas, and has low treatment efficiency, resulting in a high content of chlorosilanes in the discharged silicon powder, which poses certain safety risks.

[0046] Meanwhile, in this embodiment, the labyrinthine distribution plate 150 has a V-shaped cross-section in the main viewing direction, with its middle part concave downwards. The bottom opening of the concave part connects to the silicon powder discharge outlet 140, which facilitates the collection of the processed waste silicon powder to the silicon powder discharge outlet 140 for external discharge.

[0047] In addition, this embodiment also includes a silicon powder filter 300, which is used to filter the exhaust gas discharged from the exhaust port 120 of the tank 100 and recover the silane therein. Figure 1As shown, the silicon powder filter 300 has a ceramic filter element 330 for solid-gas separation inside; the silicon powder filter 300 has an air inlet 310, a tail gas outlet 320, and a silicon powder recovery outlet 340 on the outside. The air inlet 310 is located in the middle of the silicon powder filter 300 and connects to the exhaust outlet 120 of the tank 100 to receive the treated waste gas; the tail gas outlet 320 is located at the top of the silicon powder filter 300 to discharge the waste gas after silicon powder recovery; the silicon powder recovery outlet 340 is located at the top of the silicon powder filter 300, and a silicon powder return outlet 160 connected to the silicon powder recovery outlet 340 is located at the top of the tank 100 to return the separated and recovered silicon powder back into the tank 100.

[0048] In this embodiment, the bends of the pipelines between the exhaust port 120, the air inlet 310, the silicon powder return port 160, the exhaust port 320, and the silicon powder recovery port 340 all adopt a radius of four times D. Since the above pipelines all involve silicon powder, in order to avoid the high hardness of silicon powder from causing wear on the bends and to reduce leakage caused by wear through the bends, a bend of four times D is adopted to improve the strength of the bends.

[0049] It should also be noted that in one or more other embodiments, the steam heater 200 may be replaced by a nitrogen electric heater, a gas heating system, or a pipe heater in a nitrogen pipeline, etc., to heat the nitrogen. However, the cost of using electric heating is higher than that of steam heating, so a steam heater 200 is preferred in this embodiment.

[0050] Example 2

[0051] Based on the first embodiment, another waste silicon powder purification and treatment device is proposed. The main difference between the waste silicon powder purification and treatment device of the second embodiment and the first embodiment is that multiple nozzles 500 are used instead of the labyrinth distribution plate 150 in the first embodiment.

[0052] Please see Figure 2 In the second embodiment, instead of a labyrinthine distribution plate 150, multiple nozzles 500 are provided at the bottom of the silicon powder storage chamber inside the tank 100. Each nozzle 500 has an air inlet 542 at its bottom, and each air inlet 542 is connected to a hot nitrogen inlet 110, so that hot nitrogen can be sprayed out through the nozzles 500 and come into contact with the waste silicon powder.

[0053] like Figures 4-8As shown, the nozzle 500 mainly consists of two parts: an inner nozzle 540 and an outer cylinder 520. The inner nozzle 540 is hollow, with an air inlet 542 at one end facing the bottom of the tank 100, and a mounting head 544 at the other end. The mounting head 544 is closed and used to connect with the outer cylinder 520. Additionally, four symmetrical side-flow holes 546 are provided on the side wall of the inner nozzle 540, connecting the first chamber 530 inside the inner nozzle 540 to the outside. Furthermore, an outer flange 548 is provided on the outer side wall of the inner nozzle 540 near the bottom of the tank 100, for mounting and fixing the nozzle 500 to the bottom of the tank 100. The outer cylinder 520 is hollow inside, with an exhaust port 522 at one end facing the bottom of the tank 100 and a mounting hole 524 at the other end. The exhaust port 522 is used to discharge hot nitrogen gas near the bottom of the silicon powder storage chamber inside the tank 100, ensuring that the hot nitrogen gas fully contacts the waste silicon powder. The mounting hole 524 is used to fit onto the mounting head 544 of the inner nozzle 540, fixing the inner nozzle 540 and the outer cylinder 520 relative to each other. After the inner nozzle 540 and the outer cylinder 520 are installed and fixed, a second chamber 550 is formed in the gap between the inner nozzle 540 and the outer cylinder 520. Figure 5 As shown, the second chamber 550 and the first chamber 530 inside the inner nozzle 540 are connected through the side flow hole 546, so that the first chamber 530 and the second chamber 550 together form the airflow channel inside the nozzle 500, and the exhaust hole 522 connected to the second chamber 550 is set downward to avoid waste silicon powder from flowing back into the airflow channel of the nozzle 500 and causing blockage.

[0054] In this embodiment, the nitrogen distribution structure composed of multiple nozzles 500 can also agitate the silicon powder, creating a bubbling state. This allows the hot nitrogen to fully contact the waste silicon powder, removing residues in the gaps between the silicon powder particles and chlorosilanes adsorbed on the surface of the silicon powder. Furthermore, the structure of multiple nozzles 500 can prevent the backflow of waste silicon powder and also prevent it from flowing back into the airflow channel and causing blockages.

[0055] In this embodiment, the nozzles are arranged as follows: the innermost ring has 1 nozzle, and from the second ring onwards, the number of nozzles increases sequentially from the inside out to 8, 14, 20, 26..., with an increase of 6 nozzles per ring, and all nozzles are evenly distributed. The nozzle spacing is 354mm between the rings containing the nozzle centers.

[0056] Example 3

[0057] In the above embodiments, both the first and second embodiments of the nitrogen diversion structure can prevent silicon powder from flowing back into the hot nitrogen inlet 110. The first embodiment uses a labyrinthine distribution plate 150, which has a more stable overall structure, while the second embodiment uses multiple nozzles 500, which has a better anti-clogging effect. To combine the advantages of the two nitrogen diversion structures based on the above embodiments, a third embodiment is provided below.

[0058] Please see Figure 3 The third embodiment is based on the nitrogen distribution structure of the first embodiment. First, a labyrinth-type distribution plate 150 is set at the bottom of the silicon powder storage chamber in the tank 100, and the air inlet of the labyrinth-type distribution plate 150 is connected to the hot nitrogen inlet 110 so that the hot nitrogen enters the channel in the labyrinth-type distribution plate 150. Then, multiple nozzles 500 are installed in the air outlet of the upper part of the labyrinth-type distribution plate 150, and the air inlet 542 of the nozzle 500 is connected to the air outlet of the upper part of the labyrinth-type distribution plate 150 so that the hot nitrogen is sprayed out through the exhaust hole 522 of the nozzle 500 and comes into contact with the waste silicon powder.

[0059] In this embodiment, the waste silicon powder purification and treatment equipment uses a nitrogen diversion structure with a labyrinthine distribution plate 150 and multiple nozzles 500 interconnected and coordinated. On the one hand, this enhances the effect of preventing silicon powder backflow, and on the other hand, it ensures the stability of the overall structure while avoiding blockage of the airflow channel. Even when local nozzles 500 fall off, the integrated nitrogen diversion structure can still maintain normal operation.

[0060] The foregoing has shown and described the basic principles, main features, and advantages of this utility model. Those skilled in the art should understand that this utility model is not limited to the above embodiments. The embodiments and descriptions in the specification are merely preferred examples and are not intended to limit the utility model. Various changes and modifications can be made to this utility model without departing from its spirit and scope, and all such changes and modifications fall within the scope of the claimed utility model. The scope of protection of this utility model is defined by the appended claims and their equivalents.

Claims

1. A waste silicon powder purification and treatment device, characterized in that, Include: The tank body (100) is equipped with a silicon powder inlet (130), a hot nitrogen inlet (110), a silicon powder outlet (140), and an exhaust port (120); and The heating device is provided with a nitrogen inlet (230) and a nitrogen outlet (240), wherein the nitrogen outlet (240) is connected to the hot nitrogen inlet (110) of the tank (100); The tank (100) is provided with a nitrogen distribution structure. The inlet of the nitrogen distribution structure is connected to the hot nitrogen inlet (110). Multiple outlets of the nitrogen distribution structure are located at the bottom of the silicon powder storage chamber in the tank (100), so that the hot nitrogen discharged from the multiple outlets can fully contact the silicon powder.

2. The waste silicon powder purification and treatment equipment as described in claim 1, characterized in that, The nitrogen gas diversion structure is recessed in the middle, and the silicon powder outlet (140) is connected to the bottom of the recessed part of the nitrogen gas diversion structure.

3. The waste silicon powder purification and treatment equipment as described in claim 1, characterized in that, The nitrogen distribution structure includes a labyrinth distribution plate (150); the lower air inlet of the labyrinth distribution plate (150) is connected to the hot nitrogen inlet (110), and the upper multiple air outlets of the labyrinth distribution plate (150) are located at the bottom of the silicon powder storage chamber inside the tank (100).

4. The waste silicon powder purification and treatment equipment as described in claim 3, characterized in that, The nitrogen distribution structure also includes multiple nozzles (500); the air inlet (542) of the multiple nozzles (500) is connected to the multiple air outlets of the labyrinth distribution plate (150), and the exhaust port (522) of the nozzles (500) is located at the bottom of the silicon powder storage chamber inside the tank (100).

5. The waste silicon powder purification and treatment equipment as described in claim 1, characterized in that, The nitrogen distribution structure includes multiple nozzles (500); the air inlets (542) of the multiple nozzles (500) are all connected to the hot nitrogen inlet (110), and the exhaust ports (522) of the multiple nozzles (500) are located at the bottom of the silicon powder storage chamber inside the tank (100).

6. The waste silicon powder purification and treatment equipment as described in claim 4 or 5, characterized in that, The nozzle (500) includes an inner nozzle (540) and an outer cylinder (520) sleeved on the inner nozzle (540); the gap between the inner nozzle (540) and the outer cylinder (520) forms a second chamber (550), and the second chamber (550) is connected to the first chamber (530) inside the inner nozzle (540) through a side flow hole (546) on the side wall of the inner nozzle (540), so that the exhaust hole (522) of the nozzle (500) is set towards the bottom of the tank (100) to prevent silicon powder from entering the nozzle (500).

7. The waste silicon powder purification and treatment equipment as described in claim 6, characterized in that, The inner nozzle (540) and the outer cylinder (520) are provided with matching mounting heads (544) and mounting holes (524) at the ends facing the top of the tank (100).

8. The waste silicon powder purification and treatment equipment as described in claim 1, characterized in that, The heating device is a steam heater (200), which is also provided with a steam inlet (210) and a condensate outlet (220).

9. The waste silicon powder purification and treatment equipment as described in claim 1, characterized in that, Also includes: The silicon powder filter (300) has an air inlet (310) connected to the exhaust port (120) of the tank (100) for receiving treated waste gas; the silicon powder filter (300) is provided with a ceramic filter element (330) for gas filtration; and the silicon powder filter (300) is provided with a tail gas discharge port (320) at the top for discharging waste gas; and the silicon powder filter (300) is provided with a silicon powder recovery port (340) at the bottom for discharging silicon powder.

10. The waste silicon powder purification and treatment equipment as described in claim 9, characterized in that, The tank (100) is provided with a silicon powder return port (160) that is connected to the silicon powder recovery port (340) of the silicon powder filter (300) for returning the separated and recovered silicon powder back into the tank (100).

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