Double-sided coating equipment

Abstract

The utility model discloses double-sided coating equipment which comprises a silicon wafer transfer mechanism, a wafer taking and placing lifting mechanism, a boat frame transfer mechanism, a purification table, a furnace body cabinet and an air source cabinet which are connected in sequence, the silicon wafer transfer mechanism is used for loading silicon wafers into the flower basket boat frame, the wafer taking and placing lifting mechanism and the boat frame transfer mechanism are used for moving the flower basket boat frame loaded with the silicon wafers into the boat support, the flower basket boat frame and the boat support are both of hollow structures, a gap exists between every two adjacent silicon wafers, and the purification table is used for feeding, discharging, cooling and buffering of the boat support. A reaction cavity is arranged in the furnace body cabinet, the gas source cabinet is used for providing process gas, and the boat support for loading the flower basket boat frame enters the reaction cavity so as to realize double-sided coating of a silicon wafer. The device has the advantages of being compact in structure, easy and convenient to operate, beneficial to saving process time, improving production efficiency and the like, can coat films on the front face and the back face of the silicon wafer at the same time, and can coat films with different thicknesses on the front face and the back face of the silicon wafer.

Description

Technical Field

[0001] This utility model relates to the field of silicon wafer coating technology, specifically to a double-sided coating device suitable for TOPCON battery fabrication. Background Technology

[0002] With the development of photovoltaic technology, TOPCON cells have gradually become the mainstream in the photovoltaic market. In the current TOPCON cell process, coating is a crucial step. Due to the structure of the graphite boat, only one side of the silicon wafer can be coated during the coating process. After coating one side, the graphite boat must be removed, and then the silicon wafer is flipped over by an insertion machine for the next process. In other words, coating the front and back sides of the silicon wafer are two separate processes. Because the thickness and structure of the front and back films differ, and because the current graphite boat structure can only coat one side of the silicon wafer at a time, it cannot meet the requirement of simultaneously coating both the front and back films. Therefore, the current mainstream solution still involves performing the front and back film processes sequentially, using two different types of equipment. Utility Model Content

[0003] The technical problem to be solved by this utility model is to provide a double-sided coating equipment that is compact in structure, easy to operate, and conducive to saving process time and improving production efficiency, in order to address the shortcomings of existing coating equipment.

[0004] To solve the above-mentioned technical problems, the technical solution adopted by this utility model is as follows:

[0005] A double-sided coating equipment includes a silicon wafer transfer mechanism, a wafer picking and placing lifting mechanism, a boat frame transfer mechanism, a clean bench, a furnace cabinet, and a gas source cabinet connected in sequence. The silicon wafer transfer mechanism is used to load silicon wafers into the basket-shaped boat frame. The wafer picking and placing lifting mechanism and the boat frame transfer mechanism are used to move the basket-shaped boat frame loaded with silicon wafers into a boat support. Both the basket-shaped boat frame and the boat support are hollow structures, and there are gaps between adjacent silicon wafers. The clean bench is used for loading and unloading the boat support and for cooling buffering. The furnace cabinet is equipped with a reaction chamber. The gas source cabinet is used to provide process gas. The boat support loaded with the basket-shaped boat frame enters the reaction chamber to achieve double-sided coating of silicon wafers.

[0006] As a further improvement of this utility model, the reaction chamber of the furnace cabinet is provided with an adjustable radio frequency power supply with an adjustable discharge waveform to adjust the coating time of the front and back sides of the silicon wafer.

[0007] As a further improvement of this utility model, the flower basket boat frame includes a top plate, a bottom plate and conductive columns. The top plate and the bottom plate are connected and fixed by multiple conductive columns, and the polarities of adjacent conductive columns are opposite. Multiple slots for mounting silicon wafers are provided on the outer side of the conductive columns along the vertical direction.

[0008] As a further improvement of this utility model, the flower basket boat frame also includes a wire for connecting conductive posts of the same polarity.

[0009] As a further improvement of this utility model, the bottom of the base plate is provided with a notch, which is matched with the lifting mechanism for picking up and placing plates.

[0010] As a further improvement of this utility model, the boat support includes a support plate, side plates and railings. The support plate has side plates symmetrically arranged at both ends, and the two side plates are connected by railings.

[0011] As a further improvement of this utility model, the bottom of the side plate is provided with a boat foot, and the side plate is provided with an electrode hole.

[0012] As a further improvement of this utility model, the wafer loading and unloading lifting mechanism includes a conveyor belt assembly, a lifting assembly, and a tray; the conveyor belt assembly is arranged horizontally inside the silicon wafer transfer mechanism, and the conveyor belt assembly matches the notch to realize the entry and exit of silicon wafers into and out of the basket-like frame; the lifting assembly is arranged vertically on the side of the silicon wafer transfer mechanism and is located at the end of the conveyor belt assembly; the tray is connected to the lifting assembly, and under the drive of the lifting assembly, the tray drives the basket-like frame to move vertically up and down on the side of the silicon wafer transfer mechanism.

[0013] As a further improvement of this utility model, the boat frame transfer mechanism includes a conveying guide rail and a robotic arm. The conveying guide rail is arranged in a horizontal direction, and the robotic arm is arranged on the side of the conveying guide rail. The conveying guide rail is used to realize the transfer of the boat support between the boat frame transfer mechanism and the purification table, and the robotic arm is used to realize the transfer of the flower basket boat frame between the boat support and the picking and placing piece lifting mechanism.

[0014] As a further improvement of this utility model, the robotic arm is a three-axis robotic arm, which is arranged on the side of the conveyor rail along the length direction of the conveyor rail.

[0015] Compared with the prior art, the advantages of this utility model are:

[0016] 1. The double-sided coating equipment of this utility model uses a hollowed-out basket-shaped boat frame to load silicon wafers. There is a certain gap between adjacent silicon wafers. The hollowed-out boat support is used to load the basket-shaped boat frame. When the boat support loaded with silicon wafers enters the reaction chamber of the furnace cabinet, there is no obstruction around the silicon wafers. Therefore, during coating, both the front and back sides of the silicon wafers are in a plasma environment, realizing simultaneous coating on both sides of the silicon wafers.

[0017] 2. The double-sided coating equipment of this utility model, by setting an adjustable discharge waveform radio frequency power supply in the reaction chamber of the furnace cabinet, realizes the adjustment of the coating time of the front and back of the silicon wafer, and meets the coating requirements of different thicknesses of the front and back of the silicon wafer.

[0018] 3. The double-sided coating equipment of this utility model uses a basket-type boat frame for loading silicon wafers. The silicon wafers in the basket-type boat frame can be directly transferred to the conveyor belt of the silicon wafer transfer mechanism by the wafer picking and placing lifting mechanism. There is no need for a suction cup robot to transport the silicon wafers to the boat frame, which eliminates the need for a suction cup robot, simplifies the structure of the loading and unloading wafer insertion machine, saves the cost and space of the wafer insertion machine, and improves the efficiency of the insertion machine. Attached Figure Description

[0019] Figure 1 This is a schematic diagram of the overall structural principle of the double-sided coating equipment in a specific embodiment of this utility model;

[0020] Figure 2 This is a schematic diagram of the structural principle of the boat frame transfer mechanism in a specific embodiment of this utility model;

[0021] Figure 3 This is a schematic diagram of the structural principle of the boat frame in a specific embodiment of this utility model;

[0022] Figure 4 This is a schematic diagram of the structural principle of the boat frame from another perspective in a specific embodiment of this utility model;

[0023] Figure 5 This is a schematic diagram of the structural principle of the plate-picking and unpicking lifting mechanism in a specific embodiment of this utility model;

[0024] Figure 6 This is a schematic diagram of the structural principle of the boat support in a specific embodiment of this utility model;

[0025] Figure 7 This is a discharge waveform diagram of the radio frequency power supply in a specific embodiment of this utility model;

[0026] Legend: 1. Silicon wafer; 100. Silicon wafer transfer mechanism; 200. Wafer loading and unloading lifting mechanism; 201. Conveyor belt assembly; 202. Lifting assembly; 203. Pallet; 300. Boat frame transfer mechanism; 301. Conveyor rail; 302. Flower basket boat frame; 3021. Top plate; 3022. Bottom plate; 3023. Conductive column; 3024. Notch; 3025. Wire; 303. Robotic arm; 3031. Gripper; 400. Boat support; 401. Support plate; 402. Side plate; 403. Railing; 404. Boat feet; 405. Electrode hole; 500. Cleaning table; 600. Furnace cabinet; 700. Gas source cabinet. Detailed Implementation

[0027] The present invention will be further described below with reference to the accompanying drawings and specific preferred embodiments, but this does not limit the scope of protection of the present invention.

[0028] In the description of this utility model, it should be understood that the terms "side", "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model.

[0029] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this utility model, "multiple" means two or more, unless otherwise explicitly specified.

[0030] Example

[0031] like Figure 1As shown, the double-sided coating equipment of this utility model includes a silicon wafer transfer mechanism 100, a wafer picking and placing lifting mechanism 200, a boat frame transfer mechanism 300, a clean bench 500, a furnace cabinet 600, and a gas source cabinet 700 connected in sequence. The silicon wafer transfer mechanism 100, the wafer picking and placing lifting mechanism 200, and the boat frame transfer mechanism 300 together form a wafer insertion machine, while the clean bench 500, the furnace cabinet 600, and the gas source cabinet 700 together form the main equipment. The silicon wafer transfer mechanism 100 is used to load silicon wafers 1 into the basket boat frame 302, and can also remove silicon wafers 1 from the basket boat frame 302. The wafer picking and placing lifting mechanism 200 and the boat frame transfer mechanism 300 are used to move the basket boat frame 302 loaded with silicon wafers 1 to the boat support 400, and can also remove the basket boat frame 302 from the boat support 400 and move it to the silicon wafer transfer mechanism 100. Both the basket-shaped boat frame 302 and the boat support 400 are hollow structures, and there are gaps between adjacent silicon wafers 1 within the basket-shaped boat frame 302. The purification table 500 is used for loading and unloading the boat support 400 and for cooling buffering. The furnace cabinet 600 contains a reaction chamber, which is the place where the silicon wafers undergo front and back coating processes, providing suitable temperature, pressure, airflow field, and plasma environment for silicon wafer coating. The gas source cabinet 700 mainly provides the corresponding process gases to the reaction chamber and controls parameters such as gas flow rate, as well as the pressure and plasma environment required by the reaction chamber. The boat support 400, which carries the basket-shaped boat frame 302, enters the reaction chamber to achieve double-sided coating of the silicon wafer 1. In this embodiment, the structural settings of the silicon wafer transfer mechanism 100, purification table 500, furnace cabinet 600, and gas source cabinet 700 are the same as those of existing silicon wafer coating equipment, and will not be described again here.

[0032] In this embodiment, a hollow-structured flower basket boat frame 302 is used to load silicon wafers 1, with a certain gap between adjacent silicon wafers 1. A hollow-structured boat support 400 is then used to load the flower basket boat frame 302. When the boat support 400 loaded with silicon wafers 1 enters the reaction chamber of the furnace cabinet 600, there is no obstruction around the silicon wafers 1. Therefore, during the coating process, both the front and back sides of the silicon wafers 1 are in a plasma environment, achieving simultaneous coating on both sides of the silicon wafers 1.

[0033] In this embodiment, in order to grow films of different thicknesses on the front and back sides of silicon wafer 1, an adjustable discharge waveform radio frequency power supply is provided in the reaction chamber of the furnace cabinet 600 to adjust the coating time of the front and back sides of silicon wafer 1. Figure 7 As shown, the discharge time of the positive voltage electrode is significantly longer than that of the negative voltage electrode. Thus, more plasma will be deposited on one side of silicon wafer 1 than on the other side, which can control the film thickness of the front and back sides of silicon wafer 1 to be in different proportions.

[0034] like Figure 3 and Figure 4As shown, the flower basket frame 302 includes a top plate 3021, a bottom plate 3022, and conductive posts 3023. The top plate 3021 and the bottom plate 3022 are connected and fixed by multiple conductive posts 3023, thus forming a hollow structure flower basket frame 302 that does not obstruct the periphery of the silicon wafer 1. Moreover, the polarities of adjacent conductive posts 3023 are opposite, and multiple slots for mounting the silicon wafer 1 are provided vertically on the outer side of the conductive posts 3023. This achieves both mounting of the silicon wafer 1 and ensures that there is a certain gap between adjacent silicon wafers 1.

[0035] like Figure 4 As shown, in this embodiment, the flower basket frame 302 also includes a wire 3025. The wire 3025 can be disposed on both sides of the top plate 3021 or the bottom plate 3022 for connecting conductive posts 3023 with the same polarity. When the conductive posts 3023 are energized, the process gas is ionized.

[0036] like Figure 4 As shown, in this embodiment, the bottom of the base plate 3022 is provided with a notch 3024 that is approximately U-shaped. The notch 3024 is matched with the wafer picking and placing lifting mechanism 200 to realize the picking and placing of silicon wafer 1 in the flower basket frame 302.

[0037] like Figure 6 As shown, the boat support 400 includes a support plate 401, side plates 402 and railings 403. The support plate 401 has side plates 402 symmetrically arranged at both ends, and the two side plates 402 are connected by railings 403 to form a hollow structure boat support 400, so as to avoid obstructing the periphery of the silicon wafer 1.

[0038] like Figure 6 As shown, the bottom of the side plate 402 is provided with a boat foot 404, and the boat support 400 is fixed in the reaction chamber of the furnace cabinet 600 by the boat foot 404. The side plate 402 is provided with an electrode hole 405, and a discharge electrode is inserted into the electrode hole 405 to ionize the process gas in the reaction chamber.

[0039] like Figure 5 As shown, the wafer loading and unloading lifting mechanism 200 includes a conveyor belt assembly 201, a lifting assembly 202, and a pallet 203. The conveyor belt assembly 201 is horizontally disposed inside the silicon wafer transfer mechanism 100, and the conveyor belt assembly 201 matches the notch 3024 to facilitate the entry and exit of the silicon wafer 1 into the basket frame 302. The lifting assembly 202 is vertically disposed on the side of the silicon wafer transfer mechanism 100 and located at the end of the conveyor belt assembly 201. The pallet 203 is connected to the lifting assembly 202, and driven by the lifting assembly 202, the pallet 203 drives the basket frame 302 to vertically lift and lower on the side of the silicon wafer transfer mechanism 100.

[0040] Specifically, the pallet 203 supports the flower basket frame 302, and the lifting assembly 202 controls the lifting position of the flower basket frame 302. One end of the conveyor belt assembly 201 is located at the notch 3024 at the bottom of the flower basket frame 302. When the lifting assembly 202 controls the flower basket frame 302 to a suitable position, the silicon wafer 1 can contact the conveyor belt assembly 201 and be taken out by the conveyor belt assembly 201. Conversely, the conveyor belt assembly 201, which carries the silicon wafer 1, can also be transported onto the flower basket frame 302 until the flower basket frame 302 is filled with silicon wafer 1.

[0041] like Figure 2 As shown, the boat frame transfer mechanism 300 includes a conveyor rail 301 and a robotic arm 303. The conveyor rail 301 is arranged horizontally, and the robotic arm 303 is arranged on the side of the conveyor rail 301. The conveyor rail 301 is used to transfer the boat support 400 between the boat frame transfer mechanism 300 and the purification table 500. The gripper 3031 of the robotic arm 303 is used to grasp the flower basket boat frame 302, so as to transfer the flower basket boat frame 302 between the boat support 400 and the picking and placing lifting mechanism 200.

[0042] Furthermore, the robotic arm 303 is a three-axis robotic arm, which is positioned along the length of the conveyor rail 301 on the side of the conveyor rail 301 and can drive the flower basket boat frame 302 to move along the X, Y, and Z axes. The specific structure of the three-axis robotic arm is a conventional structure in this field and will not be described in detail here.

[0043] In this embodiment, the conveyor rail 301 can receive the boat tray 400 conveyed from the clean bench 500, and can also send the boat tray 400 with silicon wafer 1 loaded into the clean bench 500. The three-axis robot can take the flower basket boat frame 302 off the boat tray 400 and place it on the wafer pick-and-place lifting mechanism 200200. At the same time, it can also take the flower basket boat frame 302 with silicon wafer 1 loaded off the wafer pick-and-place lifting mechanism 200 and place it on the boat tray 400.

[0044] In this embodiment, silicon wafers 1 are loaded using a basket-type boat frame. The silicon wafers 1 in the basket-type boat frame 302 can be directly transferred to the transfer guide rail 301 of the silicon wafer transfer mechanism 300 by the wafer picking and placing lifting mechanism 200. There is no need for a suction cup robot to transport the silicon wafers 1 into the boat frame, which eliminates the need for a suction cup robot, simplifies the structure of the loading and unloading wafer insertion machine, saves the cost and space of the wafer insertion machine, and improves the efficiency of the insertion machine.

[0045] The above description is merely a preferred embodiment of this utility model. The protection scope of this utility model is not limited to the above embodiments. All technical solutions falling within the scope of this utility model's concept are protected. It should be noted that for those skilled in the art, any improvements and modifications made without departing from the principle of this utility model should also be considered within the protection scope of this utility model.

Claims

1. A double-sided coating equipment, characterized in that, The system includes a silicon wafer transfer mechanism (100), a wafer loading and unloading lifting mechanism (200), a boat frame transfer mechanism (300), a purification table (500), a furnace cabinet (600), and a gas source cabinet (700) connected in sequence. The silicon wafer transfer mechanism (100) is used to load silicon wafers (1) into the flower basket boat frame (302), and the wafer loading and unloading lifting mechanism (200) and the boat frame transfer mechanism (300) are used to move the flower basket boat frame (302) loaded with silicon wafers (1). In the boat support (400), both the flower basket boat frame (302) and the boat support (400) are hollow structures, and there is a gap between adjacent silicon wafers (1). The purification table (500) is used for loading and unloading the boat support (400) and for cooling buffer. The furnace cabinet (600) is equipped with a reaction chamber. The gas source cabinet (700) is used to provide process gas. The boat support (400) loaded with the flower basket boat frame (302) enters the reaction chamber to achieve double-sided coating of silicon wafers (1).

2. The double-sided coating equipment according to claim 1, characterized in that, The furnace cabinet (600) is equipped with an adjustable discharge waveform radio frequency power supply in the reaction chamber to adjust the coating time of the front and back sides of the silicon wafer (1).

3. The double-sided coating equipment according to claim 2, characterized in that, The flower basket boat frame (302) includes a top plate (3021), a bottom plate (3022) and conductive pillars (3023). The top plate (3021) and the bottom plate (3022) are connected and fixed by multiple conductive pillars (3023), and the polarities of adjacent conductive pillars (3023) are opposite. Multiple slots for mounting silicon wafers (1) are provided on the outer side of the conductive pillars (3023) along the vertical direction.

4. The double-sided coating equipment according to claim 3, characterized in that, The flower basket boat frame (302) also includes a wire (3025) for connecting conductive posts (3023) of the same polarity.

5. The double-sided coating equipment according to claim 3, characterized in that, The bottom of the base plate (3022) is provided with a notch (3024), which is matched with the plate lifting mechanism (200).

6. The double-sided coating equipment according to claim 3, characterized in that, The boat support (400) includes a support plate (401), side plates (402) and railings (403). The support plate (401) has side plates (402) symmetrically arranged at both ends, and the two side plates (402) are connected by railings (403).

7. The double-sided coating equipment according to claim 6, characterized in that, The side plate (402) has a boat foot (404) at the bottom and an electrode hole (405) on the side plate (402).

8. The double-sided coating equipment according to claim 5, characterized in that, The wafer loading and unloading lifting mechanism (200) includes a conveyor belt assembly (201), a lifting assembly (202), and a pallet (203). The conveyor belt assembly (201) is arranged horizontally inside the wafer transfer mechanism (100), and the conveyor belt assembly (201) matches the notch (3024) to enable the wafer (1) to enter and exit the basket frame (302). The lifting assembly (202) is arranged vertically on the side of the wafer transfer mechanism (100) and located at the end of the conveyor belt assembly (201). The pallet (203) is connected to the lifting assembly (202). Under the drive of the lifting assembly (202), the pallet (203) drives the basket frame (302) to move vertically up and down on the side of the wafer transfer mechanism (100).

9. The double-sided coating equipment according to claim 8, characterized in that, The boat frame transfer mechanism (300) includes a conveying guide rail (301) and a robot arm (303). The conveying guide rail (301) is arranged in a horizontal direction, and the robot arm (303) is arranged on the side of the conveying guide rail (301). The conveying guide rail (301) is used to realize the transfer of the boat support (400) between the boat frame transfer mechanism (300) and the purification table (500). The robot arm (303) is used to realize the transfer of the flower basket boat frame (302) between the boat support (400) and the picking and placing piece lifting mechanism (200).

10. The double-sided coating equipment according to claim 9, characterized in that, The robotic arm (303) is a three-axis robotic arm, which is arranged on the side of the conveyor rail (301) along the length direction of the conveyor rail (301).

Images