Wafer vacuum transmission device for multiple systems
By designing a multi-system wafer vacuum transfer device, and utilizing a robotic pulley assembly and a magnetic coupling transfer mechanism, the problem of low multi-system transfer efficiency in existing technologies has been solved, enabling rapid wafer transfer and device interconnection between multiple systems.
Patent Information
- Application Number
- CN202423098415.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-13
- Publication Date
- 2025-12-02
- Estimated Expiration
- 2034-12-13
AI Technical Summary
Existing wafer transfer devices are mostly single-system devices, which cannot achieve vacuum transfer between multiple systems, resulting in low wafer transfer efficiency between multiple magnetron sputtering devices and multiple pulsed laser deposition devices or other deposition devices.
A wafer vacuum transfer device was designed, comprising a transfer chamber, a transfer chamber sample stage, a transfer chamber, a transfer chamber sample stage, a magnetic coupling transfer mechanism, a V-shaped vacuum track, a robotic arm pulley assembly, a vacuum external gear rack drive system, and a photoelectric sensor. Through the cooperation of the robotic arm pulley assembly and the magnetic coupling transfer mechanism, the wafer can be rapidly transferred between multiple systems.
It enables rapid wafer transfer between multiple systems, improves the transfer efficiency between the process vacuum system and the transfer vacuum system, and supports the interconnection process requirements of multiple devices.
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Figure CN223624955U_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of thin film deposition technology, and more specifically, to a wafer vacuum transport device for multi-system applications. Background Technology
[0002] It is known that when multiple magnetron sputtering devices are interconnected with multiple pulsed laser deposition devices or other deposition devices, in order to facilitate the entry and exit of wafers in the process vacuum system and the sample preparation vacuum system, it is usually necessary to first load the wafers into the sample loading chamber, then evacuate the sample loading chamber, and then transfer the wafers in the process vacuum system and the transfer vacuum system within the vacuum system.
[0003] However, in practical applications, existing wafer transfer devices are mostly single-system transfer devices and lack the ability to realize multi-system vacuum transfer. Therefore, a wafer vacuum transfer device for multi-system transfer is proposed as a further improvement. Utility Model Content
[0004] In order to overcome the above-mentioned defects of the prior art, the embodiments of this utility model provide a wafer vacuum transfer device for multiple systems to solve the problems mentioned in the background art.
[0005] To achieve the above objectives, this utility model provides the following technical solution: a wafer vacuum transfer device for multiple systems, the wafer vacuum transfer device comprising: a transfer chamber, a transfer chamber sample stage, a transfer chamber, a transfer chamber sample stage, a magnetic coupling transfer mechanism, a V-shaped vacuum track, a robotic arm pulley assembly, a vacuum external gear rack drive system, and a photoelectric sensor;
[0006] The transfer chamber is fixedly installed at the end of the transmission chamber. The sample stage of the transfer chamber and the sample stage of the transmission chamber are respectively set on the transfer chamber and the transmission chamber. The vacuum external gear rack drive system is fixedly installed on the top of the transmission chamber. The V-shaped vacuum track is fixedly installed inside the transmission chamber. The robot pulley assembly is set on the V-shaped vacuum track and is movably connected to the V-shaped vacuum track. The vacuum external gear rack drive system is connected to the robot pulley assembly through a magnetic coupling transmission mechanism. The photoelectric sensor is fixedly installed inside the transmission chamber.
[0007] Furthermore, the transfer chamber includes: a chamber body and a viewing window.
[0008] The chamber body is sealed to the transmission chamber via a flange, and the viewing window is fixedly installed on the side of the chamber body.
[0009] Furthermore, the transfer chamber sample stage includes: a first transition flange, a first welded bellows, a first displacement drive screw and guide rod, and a first sample stage.
[0010] The top of the first adapter flange is fixedly installed at the bottom of the chamber body, the first welded bellows is fixedly installed on the first displacement drive screw and guide rod, the first displacement drive screw and guide rod are fixedly installed at the bottom of the first adapter flange, and the first sample stage is fixedly installed at the end of the output shaft of the first displacement drive screw and guide rod that passes through the chamber body.
[0011] Furthermore, the transmission chamber includes: a vacuum transmission pipe, a vacuum pump system, and an observation window.
[0012] The sample stage and vacuum pump system of the transfer chamber are both fixedly installed at the bottom of the vacuum transfer pipeline, and the observation window is fixedly installed on the side of the vacuum transfer pipeline; the chamber body is fixedly connected to the vacuum transfer pipeline through a flange.
[0013] The photoelectric sensor is fixedly installed inside the vacuum transmission pipeline.
[0014] Furthermore, the transfer chamber sample stage includes: a second adapter flange, a second welded bellows, a second displacement drive screw and guide rod, and a second sample stage.
[0015] The top of the second adapter flange is fixedly installed at the bottom of the vacuum transmission pipeline; the second welded bellows is fixedly installed on the second displacement drive screw and guide rod; the second displacement drive screw and guide rod are fixedly installed at the bottom of the second adapter flange; the second sample stage is fixedly installed at the end of the output shaft of the second displacement drive screw and guide rod that passes through the vacuum transmission pipeline; the observation window is close to the second sample stage.
[0016] Furthermore, the magnetic coupling transmission mechanism includes: an outer vacuum magnet, an inner vacuum magnet, and a magnet distance adjustment cylinder.
[0017] The bottom of the magnet distance adjustment cylinder used to activate the magnetic coupling is fixedly connected to the top of the vacuum outer magnet via a magnetic yoke. The bottom of the vacuum inner magnet is fixedly connected to the robot pulley assembly via a magnetic yoke. The vacuum outer magnet and the vacuum inner magnet are magnetically connected to the vacuum transmission pipe.
[0018] Furthermore, the V-shaped vacuum track includes: a V-shaped guide rail, a guide rail reference mounting plate, and a guide rail reference mounting plate support rod;
[0019] The guide rail reference mounting plate is fixedly installed inside the vacuum transmission pipeline by the guide rail reference mounting plate support rod, and the V-shaped guide rail is fixedly installed on the side of the guide rail reference mounting plate.
[0020] Furthermore, the robotic arm pulley assembly includes: a V-shaped guide rail slider, a robotic arm, a sample holder, and a limiting stop;
[0021] The V-shaped guide rail slider is fixedly installed on the upper surface of the robotic arm, the sample holder is fixedly installed on the lower surface of the end of the robotic arm, and the limiting baffle is fixedly installed on the side of the robotic arm.
[0022] The V-shaped guide rail slider is slidably connected to the V-shaped guide rail, and the bottom of the vacuum magnet is fixedly connected to the robotic arm via a magnetic yoke.
[0023] Furthermore, the vacuum external gear rack drive system includes: a linear guide rail, a guide rail mounting reference component, a rack, a gear, a servo motor, and a cable chain;
[0024] The guide rail mounting reference component is fixedly installed on the top of the vacuum transmission pipeline. The linear guide rail and the rack are respectively fixedly installed on both sides of the upper surface of the guide rail mounting reference component. The servo motor is fixedly installed on the side of the magnet inside the vacuum through a connecting bracket. The output shaft of the servo motor is fixedly sleeved with a gear that meshes with the rack. The cable chain that gathers the relevant cables is fixedly installed on the side of the rack away from the linear guide rail.
[0025] The technical effects and advantages of this utility model are as follows:
[0026] Compared with existing technologies, by setting up transfer chambers and intermediate chambers, the sample holder on the robotic arm in the robotic pulley assembly can pick up the sample wafer from the first sample stage on the sample stage of the intermediate chamber; the magnetic coupling transfer mechanism quickly drives the robotic pulley assembly to adjust its position, thereby transferring the sample wafer to the second sample stage on the sample stage of the transfer chamber; the position adjustment of the robotic arm and sample holder in the interconnect system can be quickly realized; therefore, multiple intermediate chambers facilitate the transfer of wafers in the process vacuum system and the intermediate transfer vacuum system when multiple deposition equipment are interconnected; and wafer vacuum transfer of multiple interconnect systems can be quickly realized. Attached Figure Description
[0027] Figure 1 This is a schematic diagram of the overall structure of the present invention. Figure 1 .
[0028] Figure 2 This is a schematic diagram of the overall structure of the present invention. Figure 2 .
[0029] Figure 3 For this Figure 2 A schematic diagram of the cross-sectional structure.
[0030] Figure 4 This is a schematic diagram of the transfer chamber and the sample stage of the transfer chamber of this utility model.
[0031] Figure 5 This is a schematic diagram of the transmission chamber of this utility model.
[0032] Figure 6 This is a schematic diagram of the structure of the sample stage of the transfer chamber of this utility model.
[0033] The attached figures are labeled as follows:
[0034] 1. Transfer chamber; 11. Chamber body; 12. Viewing window;
[0035] 2. Transfer chamber sample stage;
[0036] 21. First transition flange; 22. First welded bellows; 23. First displacement drive screw and guide rod;
[0037] 24. First sample stage;
[0038] 3. Transfer chamber; 31. Vacuum transfer pipeline; 32. Vacuum pump system; 33. Observation window;
[0039] 4. Transfer chamber sample stage;
[0040] 41. Second transition flange; 42. Second welded bellows; 43. Second displacement drive screw and guide rod;
[0041] 44. Second sample stage;
[0042] 5. Magnetic coupling transmission mechanism;
[0043] 51. Vacuum external magnet; 52. Vacuum internal magnet; 53. Magnet distance adjustment cylinder; 54. Magnetic yoke; 6. V-shaped vacuum track;
[0044] 61. V-shaped guide rail; 62. Guide rail reference mounting plate; 63. Guide rail reference mounting plate support rod;
[0045] 7. Robotic arm pulley assembly;
[0046] 71. V-shaped guide rail slider; 72. Robotic arm; 73. Sample holder; 74. Limiting stop plate;
[0047] 8. Vacuum external gear rack drive system;
[0048] 81. Linear guide rail; 82. Guide rail mounting reference component; 83. Rack; 84. Gear;
[0049] 85. Servo motor; 86. Cable chain. Detailed Implementation
[0050] To make the objectives, technical solutions, and advantages of this utility model clearer, the present utility model will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present utility model and are not intended to limit the present utility model.
[0051] As attached Figure 1-6 The wafer vacuum transfer device shown is for a multi-system application. The wafer vacuum transfer device includes: a transfer chamber 1, a transfer chamber sample stage 2, a transfer chamber 3, a transfer chamber sample stage 4, a magnetic coupling transfer mechanism 5, a V-shaped vacuum track 6, a robotic arm pulley assembly 7, a vacuum external gear rack drive system 8, and a photoelectric sensor.
[0052] The transmission chamber 3 is equipped with a photoelectric sensor, which controls the real-time position of the robot pulley assembly through the servo motor 85 in the vacuum external gear rack drive system 8.
[0053] The transfer chamber 1 is fixedly installed at the end of the transmission chamber 3. The transfer chamber sample stage 2 and the transmission chamber sample stage 4 are respectively set on the transfer chamber 1 and the transmission chamber 3. The vacuum external gear rack drive system 8 is fixedly installed on the top of the transmission chamber 3. The V-shaped vacuum track 6 is fixedly installed inside the transmission chamber 3. The robot pulley assembly 7 is set on the V-shaped vacuum track 6 and is movably connected to the V-shaped vacuum track 6. The vacuum external gear rack drive system 8 is connected to the robot pulley assembly 7 through the magnetic coupling transmission mechanism 5. The photoelectric sensor is fixedly installed inside the transmission chamber 3.
[0054] Example: Transfer chamber 1 is fixedly installed at both ends of the transmission chamber 3; wherein, the transfer chamber 1 and the transmission chamber 3 are sealed with CF knife-edge flanges and share the same vacuum pumping system;
[0055] In a preferred embodiment, as shown in the appendix Figure 1-6 As shown, the transfer chamber 1 includes: a chamber body 11 and a viewing window 12.
[0056] The chamber body 11 is sealed to the transmission chamber 3 via a flange, and the viewing window 12 is fixedly installed on the side of the chamber body 11.
[0057] In a preferred embodiment, as shown in the appendix Figure 1-6 As shown, the transfer chamber sample stage 2 includes: a first transition flange 21, a first welded bellows 22, a first displacement drive screw and guide rod 23, and a first sample stage 24.
[0058] The top of the first adapter flange 21 is fixedly installed at the bottom of the chamber body 11. The first welded bellows 22 is fixedly installed on the first displacement drive screw and guide rod 23. The first displacement drive screw and guide rod 23 is fixedly installed at the bottom of the first adapter flange 21. The first sample stage 24 is fixedly installed at the end of the output shaft of the first displacement drive screw and guide rod 23 that passes through the chamber body 11.
[0059] In a preferred embodiment, as shown in the appendix Figure 1-6 As shown, the transfer chamber 3 includes: a vacuum transfer pipe 31, a vacuum pump system 32, and an observation window 33.
[0060] The sample stage 4 of the transfer chamber and the vacuum pump system 32 are both fixedly installed at the bottom of the vacuum transfer pipe 31, and the observation window 33 is fixedly installed on the side of the vacuum transfer pipe 31; the chamber body 11 is fixedly connected to the vacuum transfer pipe 31 through a flange.
[0061] The photoelectric sensor is fixedly installed inside the vacuum transmission pipe 31.
[0062] The vacuum transmission pipeline 31 is connected to the turbomolecular pump in the vacuum pump system 32, the turbomolecular pump is connected to the vortex dry pump, and the transmission pipeline 31 also has a vacuum machine interface, so the working vacuum value in the transmission pipeline 31 can be read by the vacuum machine.
[0063] In a preferred embodiment, as shown in the appendix Figure 1-6 As shown, the transfer chamber sample stage 4 includes: a second adapter flange 41, a second welded bellows 42, a second displacement drive screw and guide rod 43, and a second sample stage 44.
[0064] The top of the second adapter flange 41 is fixedly installed at the bottom of the vacuum transmission pipe 31. The second welded bellows 42 is fixedly installed on the second displacement drive screw and guide rod 43. The second displacement drive screw and guide rod 43 is fixedly installed at the bottom of the second adapter flange 41. The second sample stage 44 is fixedly installed at the end of the output shaft of the second displacement drive screw and guide rod 43 that passes through the vacuum transmission pipe 31. The observation window 33 is close to the second sample stage 44.
[0065] In a preferred embodiment, as shown in the appendix Figure 1-6 As shown, the magnetic coupling transmission mechanism 5 includes: an external vacuum magnet 51, an internal vacuum magnet 52, and a magnet distance adjustment cylinder 53.
[0066] The bottom of the magnet distance adjustment cylinder 53 used to open the magnetic coupling is fixedly connected to the top of the vacuum outer magnet 51 via a corresponding magnetic yoke 54. The bottom of the vacuum inner magnet 52 is fixedly connected to the robot pulley assembly 7 via a corresponding magnetic yoke 54. The vacuum outer magnet 51 and the vacuum inner magnet 52 of the spacer vacuum transmission pipe 31 are magnetically connected.
[0067] Among them, the magnet distance adjustment cylinder 53 realizes the opening or closing of the magnetic coupling between the vacuum external magnet 51 and the vacuum internal magnet 52;
[0068] In a preferred embodiment, as shown in the appendix Figure 1-6 As shown, the V-shaped vacuum track 6 includes: a V-shaped guide rail 61, a guide rail reference mounting plate 62, and a guide rail reference mounting plate support rod 63;
[0069] The guide rail reference mounting plate 62 is fixedly installed inside the vacuum transmission pipeline 31 by the guide rail reference mounting plate support rod 63, and the V-shaped guide rail 61 is fixedly installed on the side of the guide rail reference mounting plate 62.
[0070] Among them, the guide rail reference mounting plate support rod 63 is used to assist in supporting the guide rail reference mounting plate 62;
[0071] In a preferred embodiment, as shown in the appendix Figure 1-6 As shown, the robotic arm pulley assembly 7 includes: a V-shaped guide rail slider 71, a robotic arm 72, a sample holder 73, and a limiting stop 74;
[0072] V-shaped guide rail slider 71 is fixedly installed on the upper surface of robotic arm 72, sample holder 73 is fixedly installed on the lower surface of the end of robotic arm 72, and limiting baffle 74 is fixedly installed on the side of robotic arm 72.
[0073] Example: Sample holders 73 are installed at both ends of the robotic arm 72;
[0074] Among them, the limiting stop 74 is used in conjunction with the photoelectric sensor to play a positioning role;
[0075] V-shaped guide rail slider 71 is slidably connected to V-shaped guide rail 61, and the bottom of vacuum magnet 52 is fixedly connected to robotic arm 72 through magnetic yoke 54.
[0076] In a preferred embodiment, as shown in the appendix Figure 1-6 As shown, the vacuum external gear rack drive system 8 includes: a linear guide rail 81, a guide rail mounting reference component 82, a rack 83, a gear 84, a servo motor 85, and a cable chain 86;
[0077] The guide rail mounting reference component 82 is fixedly installed on the top of the vacuum transmission pipeline 31. The linear guide rail 81 and the rack 83 are respectively fixedly installed on both sides of the upper surface of the guide rail mounting reference component 82. The servo motor 85 is fixedly installed on the side of the vacuum magnet 52 through the connecting bracket. The output shaft of the servo motor 85 is fixedly sleeved with a gear 84 that meshes with the rack 83. The cable chain 86 used to gather related cables is fixedly installed on the side of the rack 83 away from the linear guide rail 81.
[0078] The working principle of this utility model is as follows: During operation, a wafer from any process chamber is sampled by a sample transfer rod and placed into the first sample stage 24 on the sample stage 2 of the transfer chamber 1. At this time, the sample stage 2 of the transfer chamber cooperates with the magnetic coupling transmission mechanism 5 and the robotic arm pulley assembly 7 to place the sample in the transfer chamber 1 into the sample holder 73 in the robotic arm pulley assembly 7. Then, the robotic arm pulley assembly 7 is driven by the magnetic coupling transmission mechanism 5 to move to the middle position of the vacuum transmission pipe 31. The sample holder 73 in the robotic arm pulley assembly 7 needs to be exchanged at both ends by the second sample stage 44 on the sample stage 4 of the transfer chamber. After the position exchange is completed, the sample can be transferred in another direction until it is transferred to the transfer chamber 1 at the other end. Then, the sample can be picked up by the sample transfer rod of other process chambers. This cycle can be repeated to perform different process methods on the sample under different process requirements, such as process switching between PLD, PVD, and MBE.
[0079] It should be noted that, in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article, or apparatus.
[0080] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the appended claims and their equivalents.
Claims
1. A wafer vacuum transport device for multiple systems, characterized in that: The wafer vacuum transfer device includes: a transfer chamber (1), a transfer chamber sample stage (2), a transfer chamber (3), a transfer chamber sample stage (4), a magnetic coupling transfer mechanism (5), a V-shaped vacuum track (6), a robotic arm pulley assembly (7), a vacuum external gear rack drive system (8), and a photoelectric sensor; The transfer chamber (1) is fixedly installed at the end of the transmission chamber (3). The transfer chamber sample stage (2) and the transmission chamber sample stage (4) are respectively set on the transfer chamber (1) and the transmission chamber (3). The vacuum external gear rack drive system (8) is fixedly installed on the top of the transmission chamber (3). The V-shaped vacuum track (6) is fixedly installed inside the transmission chamber (3). The manipulator pulley assembly (7) is set on the V-shaped vacuum track (6). The manipulator pulley assembly (7) is movably connected to the V-shaped vacuum track (6). The vacuum external gear rack drive system (8) is connected to the manipulator pulley assembly (7) through the magnetic coupling transmission mechanism (5). The photoelectric sensor is fixedly installed inside the transmission chamber (3).
2. The wafer vacuum transport device for multiple systems according to claim 1, characterized in that: The transfer chamber (1) includes: a chamber body (11) and a viewing window (12). The chamber body (11) is sealed to the transmission chamber (3) via a flange, and the viewing window (12) is fixedly installed on the side of the chamber body (11).
3. A wafer vacuum transport device for multiple systems according to claim 2, characterized in that: The transfer chamber sample stage (2) includes: a first transfer flange (21), a first welded bellows (22), a first displacement drive screw and guide rod (23), and a first sample stage (24). The top of the first adapter flange (21) is fixedly installed at the bottom of the chamber body (11), the first welded bellows (22) is fixedly installed on the first displacement drive screw and guide rod (23), the first displacement drive screw and guide rod (23) is fixedly installed at the bottom of the first adapter flange (21), and the first sample stage (24) is fixedly installed at the end of the output shaft of the first displacement drive screw and guide rod (23) that passes through the chamber body (11).
4. A wafer vacuum transport device for multiple systems according to claim 3, characterized in that: The transmission chamber (3) includes: a vacuum transmission pipe (31), a vacuum pump system (32), and an observation window (33). The sample stage (4) of the transfer chamber and the vacuum pump system (32) are both fixedly installed at the bottom of the vacuum transfer pipe (31), and the observation window (33) is fixedly installed on the side of the vacuum transfer pipe (31); the chamber body (11) is fixedly connected to the vacuum transfer pipe (31) through a flange; The photoelectric sensor is fixedly installed inside the vacuum transmission pipe (31).
5. A wafer vacuum transport device for multiple systems according to claim 4, characterized in that: The transfer chamber sample stage (4) includes: a second adapter flange (41), a second welded bellows (42), a second displacement drive screw and guide rod (43), and a second sample stage (44). The top of the second adapter flange (41) is fixedly installed at the bottom of the vacuum transmission pipe (31), the second welded bellows (42) is fixedly installed on the second displacement drive screw and guide rod (43), the second displacement drive screw and guide rod (43) is fixedly installed at the bottom of the second adapter flange (41), and the second sample stage (44) is fixedly installed at the end of the output shaft of the second displacement drive screw and guide rod (43) that passes through the vacuum transmission pipe (31); the observation window (33) is close to the second sample stage (44).
6. A wafer vacuum transport device for multiple systems according to claim 5, characterized in that: The magnetic coupling transmission mechanism (5) includes: an external vacuum magnet (51), an internal vacuum magnet (52), and a magnet distance adjustment cylinder (53). The bottom of the magnet distance adjustment cylinder (53) used to activate the magnetic coupling is fixedly connected to the top of the vacuum outer magnet (51) via a magnetic yoke (54), and the bottom of the vacuum inner magnet (52) is fixedly connected to the robot pulley assembly (7) via a magnetic yoke (54). The vacuum outer magnet (51) and the vacuum inner magnet (52) of the spacer vacuum transmission pipe (31) are magnetically connected.
7. A wafer vacuum transport device for multiple systems according to claim 6, characterized in that: The V-shaped vacuum track (6) includes: a V-shaped guide rail (61), a guide rail reference mounting plate (62), and a guide rail reference mounting plate support rod (63); The guide rail reference mounting plate (62) is fixedly installed inside the vacuum transmission pipeline (31) by the guide rail reference mounting plate support rod (63), and the V-shaped guide rail (61) is fixedly installed on the side of the guide rail reference mounting plate (62).
8. A wafer vacuum transport device for multiple systems according to claim 7, characterized in that: The robotic arm pulley assembly (7) includes: a V-shaped guide rail slider (71), a robotic arm (72), a sample holder (73), and a limiting stop (74); The V-shaped guide rail slider (71) is fixedly installed on the upper surface of the robotic arm (72), the sample holder (73) is fixedly installed on the lower surface of the end of the robotic arm (72), and the limiting baffle (74) is fixedly installed on the side of the robotic arm (72). The V-shaped guide rail slider (71) is slidably connected to the V-shaped guide rail (61), and the bottom of the vacuum magnet (52) is fixedly connected to the robotic arm (72) through the magnetic yoke (54).
9. A wafer vacuum transport device for multiple systems according to claim 8, characterized in that: The vacuum external gear rack drive system (8) includes: a linear guide rail (81), a guide rail mounting reference component (82), a rack (83), a gear (84), a servo motor (85), and a cable chain (86); The guide rail mounting reference (82) is fixedly mounted on the top of the vacuum transmission pipe (31). The linear guide rail (81) and the rack (83) are respectively fixedly mounted on both sides of the upper surface of the guide rail mounting reference (82). The servo motor (85) is fixedly mounted on the side of the vacuum magnet (52) through the connecting bracket. The output shaft of the servo motor (85) is fixedly sleeved with a gear (84) that meshes with the rack (83). The drag chain (86) used to concentrate the relevant cables is fixedly mounted on the side of the rack (83) away from the linear guide rail (81).