Vertical furnace structure
By designing a vertical furnace structure compatible with both 6-inch and 8-inch silicon wafers, and utilizing a feeding tilting table and wafer cassette transfer robot, the problem of existing equipment only being able to process single-size wafers was solved, enabling flexible processing of multi-size silicon wafers and reducing production costs.
Patent Information
- Application Number
- CN202423304284.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-31
- Publication Date
- 2025-12-16
- Estimated Expiration
- 2034-12-31
AI Technical Summary
Existing vertical furnace equipment can only process six-inch or eight-inch silicon wafers, which is a limitation and cannot adapt to silicon wafers of multiple sizes, thus increasing production costs.
A vertical furnace structure was designed, which includes a feeding and turning table, multiple storage areas and a wafer cassette transfer robot, supporting compatibility with 6-inch and 8-inch wafer cassettes, and enabling flexible processing of silicon wafers of different sizes through the robot.
It enables compatible processing of 6-inch and 8-inch silicon wafers without the need to adjust the internal structure, greatly reducing production costs and improving the equipment's versatility and user convenience.
Smart Images
Figure CN223678204U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to vertical furnace technical field, in particular to vertical furnace structure. BACKGROUND
[0002] Vertical annealing furnace, vertical oxidation furnace, vertical LPCVD etc. are used for alloy, annealing, oxidation, LPCVD etc. process of different size wafer of integrated circuit, discrete device, MEMS device etc.
[0003] At present in similar product, research and development type equipment and production type equipment can only single six inch silicon wafer or eight inch silicon wafer processing, there is great limitation, there is great inconvenience for multi-size specification silicon wafer processing, also greatly increase the production cost of user, in order to solve this problem, therefore put forward a vertical furnace structure. UTILITY MODEL CONTENT
[0004] The utility model solves the technical problems that only single six inch silicon wafer or eight inch silicon wafer processing can be carried out, there is great limitation, there is great inconvenience for multi-size specification silicon wafer processing, also greatly increase the production cost of user.
[0005] In order to solve the above technical problem, an embodiment of the utility model adopts the technical scheme that provides a vertical furnace structure, which comprises a cabinet, a feeding turnover table is arranged in the interior of the cabinet, and the feeding turnover table is located at the middle position of the front end of the cabinet, a first feeding port is fixedly installed at the top of the feeding turnover table, a second feeding port is fixedly installed at the top of the feeding turnover table close to the first feeding port, a front storage area is fixedly installed on the upper half of the front end of the cabinet, and the interior of the front storage area is used for storing six-inch wafer box.
[0006] The upper half of the rear end of the cabinet is fixedly installed with a rear storage area, the interior of the rear storage area is used for storing eight-inch wafer box, the lower half of the rear end of the cabinet is fixedly installed with a first transfer area and a second transfer area, and a wafer box transfer mechanical hand is installed in the middle part of the cabinet.
[0007] Preferably, the interior of the first feeding port is placed with six-inch wafer box, and the interior of the second feeding port is placed with eight-inch wafer box, so that the first feeding port and the second feeding port are used to conveniently place six-inch wafer box and eight-inch wafer box respectively.
[0008] Preferably, the interior of the front storage area is divided into three rows and three columns, i.e. nine positions, and nine six-inch wafer boxes are placed in the interior of the front storage area, so that the nine six-inch wafer boxes are conveniently placed by dividing the interior of the front storage area into three rows and three columns, i.e. nine positions.
[0009] Preferably, the inner part of the rear storage area is four rows and three columns of twelve positions, and twelve eight-inch wafer boxes are placed in the inner part of the rear storage area.
[0010] Preferably, the first and second transfer areas are compatible with six-inch and eight-inch wafer boxes, and the first and second transfer areas can accommodate six-inch and eight-inch wafer boxes.
[0011] Preferably, the wafer box transfer robot can be used for multi-position adjustment, and the wafer box transfer robot can be lifted, moved left and right, and can be telescoped forward or backward, so as to take and place wafer boxes in the first and second feed openings and the front storage area, and take and place wafer boxes in the first and second transfer areas of the rear storage area.
[0012] The beneficial effects of the utility model are as follows:
[0013] The utility model discloses a novel six-inch and eight-inch compatible vertical furnace structure, which is reasonable in structure, can process six-inch silicon wafers and eight-inch silicon wafers, does not need to adjust the internal structure, can enter different operation systems according to the size of the silicon wafer during silicon wafer processing, greatly facilitates user use, and greatly reduces user production cost. BRIEF DESCRIPTION OF DRAWINGS
[0014] Fig. 1 It is a first view internal structure schematic view of the utility model vertical furnace structure.
[0015] Fig. 2 It is a side view of the utility model vertical furnace structure.
[0016] Fig. 3 It is a second view internal structure schematic view of the utility model vertical furnace structure.
[0017] In the drawing: 1, cabinet;2, feed turnover table;3, first feed opening;4, second feed opening;5, wafer box transfer robot;6, front storage area;7, rear storage area;8, first transfer area;9, second transfer area. DETAILED DESCRIPTION
[0018] The preferred embodiments of the utility model will be described in detail below with reference to the drawings, so that the advantages and characteristics of the utility model can be more easily understood by those skilled in the art, and the protection scope of the utility model can be more clearly and explicitly defined.
[0019] Please refer to Figs. 1 to 3A vertical furnace structure, comprising a cabinet 1, the inside of the cabinet 1 is provided with a feeding turnover table 2, and the feeding turnover table 2 is located at the middle position of the front end of the cabinet 1, the top of the feeding turnover table 2 is fixedly installed with a first feeding port 3, the top of the feeding turnover table 2 close to the first feeding port 3 is fixedly installed with a second feeding port 4, the upper half of the front end of the cabinet 1 is fixedly installed with a front storage area 6, and the inside of the front storage area 6 is used for storing six-inch wafer boxes.
[0020] The upper half of the rear end of the cabinet 1 is fixedly installed with a rear storage area 7, the inside of the rear storage area 7 is used for storing eight-inch wafer boxes, the lower half of the rear end of the cabinet 1 is fixedly installed with a first transfer area 8 and a second transfer area 9, a wafer box transfer mechanical hand 5 is installed in the middle part of the cabinet 1, the wafer box transfer mechanical hand 5 can be lifted and moved left and right and can stretch out or retract the mechanical arm forward or backward, the wafer boxes in the first feeding port 3, the second feeding port 4 and the front storage area 6 can be taken out or placed in by moving forward, and the wafer boxes in the rear storage area 7, the first transfer area 8 and the second transfer area 9 can be taken out or placed in by moving backward.
[0021] As shown in Fig. 1 and Fig. 3 , the inside of the first feeding port 3 is placed with six-inch wafer boxes, the inside of the second feeding port 4 is placed with eight-inch wafer boxes, the first feeding port 3 and the second feeding port 4 are used for conveniently placing six-inch wafer boxes and eight-inch wafer boxes respectively, the inside of the front storage area 6 is divided into three rows and three columns, nine positions, and the inside of the front storage area 6 is placed with nine six-inch wafer boxes, the inside of the front storage area 6 is divided into three rows and three columns, nine positions, so that nine six-inch wafer boxes can be conveniently placed, the inside of the rear storage area 7 is divided into four rows and three columns, twelve positions, and the inside of the rear storage area 7 is placed with twelve eight-inch wafer boxes, the inside of the rear storage area 7 is divided into four rows and three columns, twelve positions, so that twelve eight-inch wafer boxes can be conveniently placed, the first transfer area 8 and the second transfer area 9 are compatible for six-inch and eight-inch wafer boxes, and the first transfer area 8 and the second transfer area 9 can be placed with six-inch wafer boxes and eight-inch wafer boxes.
[0022] In use, the first feeding port 3 and the second feeding port 4 are used for respectively placing six-inch wafer boxes or eight-inch wafer boxes, the wafer box transfer mechanical hand 5 is used for taking the wafer boxes, the six-inch wafer boxes are placed into the front storage area 6, the eight-inch wafer boxes are placed into the rear storage area 7, and the first transfer area 8 and the second transfer area 9 can be placed with six-inch wafer boxes and eight-inch wafer boxes, so that users can select corresponding size operation systems for wafer processing according to process requirements, the whole structure is reasonable in design, does not need to replace accessories, is completely compatible, greatly facilitates the use of users, and greatly reduces production cost.
[0023] The above merely illustrates the embodiments of the present application, and does not limit the patent scope of the present application, and any equivalent structure or equivalent process transformation, or direct or indirect application in other related technical fields, which are made according to the content of the present application specification and drawings, are also included in the patent protection scope of the present application.
Claims
1. A vertical furnace structure comprising a cabinet (1), characterized in that: The inside of the cabinet (1) is provided with a feeding turnover table (2), and the feeding turnover table (2) is located at the middle position of the front end of the cabinet (1), the top of the feeding turnover table (2) is fixedly installed with a first feeding port (3), the top of the feeding turnover table (2) close to the first feeding port (3) is fixedly installed with a second feeding port (4), the upper half of the front end of the cabinet (1) is fixedly installed with a front storage area (6), and the inside of the front storage area (6) is used for storing six-inch wafer box. The upper half of the rear end of the cabinet (1) is fixedly installed with a rear storage area (7), the inside of the rear storage area (7) is used for storing eight-inch wafer box, and the lower half of the rear end of the cabinet (1) is fixedly installed with a first transfer area (8) and a second transfer area (9), and the middle part of the cabinet (1) is installed with a wafer box transfer mechanical hand (5).
2. A vertical furnace structure according to claim 1, characterized in that: The inside of the first feeding port (3) is placed with a six-inch wafer box, and the inside of the second feeding port (4) is placed with an eight-inch wafer box.
3. A vertical furnace structure as claimed in claim 1, wherein: The inside of the front storage area (6) is divided into three rows, three columns and nine positions, and the inside of the front storage area (6) is placed with nine six-inch wafer boxes.
4. A vertical furnace structure as claimed in claim 1, wherein: The inside of the rear storage area (7) is divided into four rows, three columns and twelve positions, and the inside of the rear storage area (7) is placed with twelve eight-inch wafer boxes.
5. A vertical furnace structure as claimed in claim 1, wherein: The first transfer area (8) and the second transfer area (9) are compatible with six-inch and eight-inch wafer boxes, and the first transfer area (8) and the second transfer area (9) can be placed with six-inch wafer boxes and eight-inch wafer boxes.
6. A vertical furnace structure as claimed in claim 1, wherein: The wafer box transfer mechanical hand (5) can be used for multi-position adjustment.