Feeding device of single crystal furnace

Abstract

The single crystal furnace feeding device comprises a first feeding box and a second feeding box which are sequentially distributed in the vertical direction, a silicon material enters the first feeding box through a first feeding port of the first feeding box and is conveyed to a first discharging port through a conveying unit, and a second feeding port of the second feeding box is connected with the first discharging port; the silicon material enters the second charging box through the second feeding hole, passes through the stirring unit and then is conveyed to the single crystal furnace through the second discharging hole, so that the silicon material can be conveyed by the conveying unit and scattered by the stirring unit in sequence and then enters the single crystal furnace, the uniformity of adding the silicon material into the single crystal furnace is improved, and the smelting effect of the silicon material in the single crystal furnace is improved; moreover, the second feeding box further comprises a rolling unit, and the second feeding port, the stirring unit, the rolling unit and the second discharging port are sequentially distributed in the vertical direction, so that large-particle silicon materials enter the single crystal furnace after being rolled, the silicon materials can be processed in the feeding process, and the feeding efficiency is improved; and the smelting effect of the silicon material in the single crystal furnace is further improved.

Description

Technical Field

[0001] This application relates to the field of monocrystalline silicon production technology, and more specifically, to a feeding device for a monocrystalline furnace. Background Technology

[0002] In the production of monocrystalline silicon, high-purity polycrystalline silicon (silicon material) needs to be added to a monocrystalline furnace for melting. In the existing process of adding silicon material, it is usually necessary to add silicon material manually and repeatedly, which results in low uniformity of material addition and poor melting effect of silicon material in the monocrystalline furnace.

[0003] In addition, to ensure the melting effect of silicon material, it needs to be pretreated before being added, which results in low efficiency of the feeding process.

[0004] In summary, improving the uniformity of the feeding process to enhance the melting effect of silicon material in a single crystal furnace is a problem that urgently needs to be solved by those skilled in the art. Utility Model Content

[0005] In view of this, the purpose of this application is to provide a single crystal furnace feeding device to improve the uniformity of the feeding process, so as to improve the melting effect of silicon material in the single crystal furnace.

[0006] To achieve the above objectives, this application provides the following technical solution:

[0007] A single-crystal furnace feeding device includes: a first feeding box and a second feeding box; wherein, the first feeding box includes a first inlet, a transport unit and a first outlet, silicon material enters the first feeding box through the first inlet, and the transport unit is used to transport the silicon material entering through the first inlet to the first outlet; the second feeding box includes a second inlet, a stirring unit, a rolling unit and a second outlet, the second inlet is connected to the first outlet, and the second inlet, the stirring unit, the rolling unit and the second outlet are distributed sequentially along a first direction; the first feeding box and the second feeding box are distributed sequentially along the first direction; the first direction is a vertical direction.

[0008] In some embodiments, the first feed inlet is located on the top surface of the first feeding box, the first discharge outlet is located on the bottom surface of the first feeding box, and the first feed inlet, the transport unit, and the first discharge outlet are distributed sequentially along the second direction; the second feed inlet is located on the top surface of the second feeding box, and the first discharge outlet and the second feed inlet are sealed together; the first direction and the second direction form an angle.

[0009] In some embodiments, the transport unit includes a first motor, a drive wheel, a driven wheel, and a conveyor belt; the first feed inlet is distributed opposite to the conveying surface of the conveyor belt; the first motor is drivenly connected to the drive wheel, the drive wheel is drivenly connected to the driven wheel through the conveyor belt, and both the drive wheel and the driven wheel are rotatably connected inside the first feeding box; the drive wheel and the driven wheel are distributed sequentially along a second direction, and the second direction has an angle with the first direction.

[0010] In some embodiments, the first feed inlet is circular, and the width of the conveying surface of the conveyor belt is greater than the diameter of the first feed inlet.

[0011] In some embodiments, the stirring unit includes a second motor, a rotating shaft, and stirring blades; wherein the second motor is drivenly connected to the rotating shaft, and the axis of the rotating shaft is parallel to the first direction; there are at least two stirring blades along the axial direction of the rotating shaft and at least two stirring blades along the circumferential direction of the rotating shaft.

[0012] In some embodiments, the compaction unit includes a compaction rod and a filter plate; wherein, there is at least one compaction rod along the circumference of the rotating shaft, the compaction rod is located at the top of the filter plate, and the compaction rod is in contact with the filter plate; the filter plate is fixedly connected to the bottom end of the second feeding box, and the filter plate has filter holes; the second motor is located at the bottom end of the filter plate, and the rotating shaft passes through the filter plate and is rotatably connected to the filter plate.

[0013] In some embodiments, the bottom of the crushing rod is provided with bristles, the diameter of which is smaller than the diameter of the filter hole.

[0014] In some embodiments, a connecting block is further included, which drivesly connects the second motor and the rotating shaft, and the rolling rod is fixedly connected to the connecting block, which can cover the second motor;

[0015] And / or, the second motor is placed in a placement box located at the bottom of the filter plate.

[0016] In some embodiments, the device further includes a mounting base and a support base; wherein the mounting base is fixedly connected to the bottom end of the second feeding box, and the mounting base has a through hole for discharging material from the second discharge port; the support base is fixedly connected to the end of the mounting base away from the second feeding box, and the support base is used to support the first feeding box.

[0017] In some embodiments, a control box is also included, which includes a controller and a timer; the timer, the transport unit, the mixing unit, and the crushing unit are all electrically connected to the controller.

[0018] The single crystal furnace feeding device provided in this application includes a first feeding box and a second feeding box arranged vertically. Silicon material enters the first feeding box through the first inlet and is transported to the first outlet by a transport unit. The second inlet of the second feeding box is connected to the first outlet, allowing the silicon material to enter the second feeding box through the second inlet and be transported to the single crystal furnace through the second outlet after passing through a stirring unit. This allows the silicon material to be transported by the transport unit and dispersed by the stirring unit before entering the single crystal furnace, improving the uniformity of silicon material added in the single crystal furnace and enhancing the melting effect of silicon material in the single crystal furnace. Furthermore, the second feeding box also includes a rolling unit. The second inlet, stirring unit, rolling unit, and second outlet are arranged vertically, allowing large silicon particles to be rolled before entering the single crystal furnace. This enables the silicon material to be processed during the feeding process, improving the feeding efficiency and further enhancing the melting effect of silicon material in the single crystal furnace. Attached Figure Description

[0019] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only embodiments of this application. For those skilled in the art, other drawings can be obtained based on the provided drawings without creative effort.

[0020] Figure 1 An isometric view of the single crystal furnace feeding device provided in the embodiments of this application;

[0021] Figure 2 for Figure 1 A cross-sectional view of the single crystal furnace feeding device shown;

[0022] Figure 3 for Figure 1 A top view of the single crystal furnace feeding device shown;

[0023] Figure 4 This is a schematic diagram of the internal structure of the first feeding box in the single crystal furnace feeding device provided in the embodiments of this application.

[0024] Explanation of reference numerals in the attached figures:

[0025] 100 - Mounting base, 110 - Mounting hole;

[0026] 200-Support base;

[0027] 300-First feeding box, 301-First feed inlet, 302-First discharge outlet, 303-First motor, 304-Drive wheel, 305-Driven wheel, 306-Conveyor belt;

[0028] 400-Second feeding box, 401-Second feed inlet, 402-Second discharge outlet, 403-Second motor, 404-Placement box, 411-Rotating shaft, 412-Stirring blade, 413-Connecting block, 414-Crushing rod, 415-Filter plate;

[0029] 500 - Control box, 501 - Touch screen, 502 - Controller, 503 - Timer. Detailed Implementation

[0030] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0031] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. The terminology used in the following embodiments is for the purpose of describing specific embodiments only and is not intended to be a limitation of this application. As used in the specification and appended claims of this application, the singular expressions "a," "an," "the," "the," "the," and "this" are intended to also include expressions such as "one or more," unless the context clearly indicates otherwise. It should also be understood that in the embodiments of this application, "one or more" refers to one, two, or more; "and / or" describes the relationship between related objects, indicating that three relationships may exist; for example, A and / or B can represent: A alone, A and B simultaneously, or B alone, where A and B can be singular or plural. The character " / " generally indicates that the preceding and following related objects are in an "or" relationship.

[0032] References to "one embodiment" or "some embodiments" as described in this specification mean that one or more embodiments of this application include a specific feature, structure, or characteristic described in connection with that embodiment. Therefore, the phrases "in one embodiment," "in some embodiments," "in other embodiments," "in still other embodiments," etc., appearing in different parts of this specification do not necessarily refer to the same embodiment, but rather mean "one or more, but not all, embodiments," unless otherwise specifically emphasized. The terms "comprising," "including," "having," and variations thereof mean "including but not limited to," unless otherwise specifically emphasized.

[0033] The "multiple" mentioned in the embodiments of this application refers to two or more. It should be noted that in the description of the embodiments of this application, terms such as "first" and "second" are used only for the purpose of distinguishing descriptions and should not be construed as indicating or implying relative importance, nor should they be construed as indicating or implying order.

[0034] The terms "parallel" and "perpendicular" used in this application refer to "basically parallel" and "basically perpendicular" in practical operation. "Basically parallel" can be understood as parallelism with a certain degree of error, and similarly, "basically perpendicular" can be understood as perpendicularity with a certain degree of error.

[0035] like Figures 1-4 As shown, the single crystal furnace feeding device provided in this application embodiment includes: a first feeding box 300 and a second feeding box 400, which are sequentially distributed along a first direction. The first feeding box 300 includes a first inlet 301, a transport unit, and a first outlet 302. Silicon material enters the first feeding box through the first inlet 301 and is then transported to the first outlet 302 by the transport unit. The second feeding box 400 has a second inlet 402 connected to the first outlet 302, allowing silicon material to enter the second feeding box 400 from the first outlet 302 through the second inlet 401. The second feeding box includes a second inlet 401, a stirring unit, a rolling unit, and a second outlet 402 distributed along the first direction. This allows the silicon material to be transported by the transport unit, dispersed by the stirring unit, and then enter the single crystal furnace, improving the uniformity of silicon material added within the single crystal furnace and enhancing the melting effect of the silicon material within the furnace.

[0036] After the silicon material is broken up by the stirring unit, it will be rolled by the rolling unit so that the large silicon material particles can be rolled before entering the single crystal furnace. In this way, the silicon material can be processed during the feeding process, which improves the feeding efficiency. Furthermore, since the silicon material is rolled into small particles, the melting effect and melting efficiency of the silicon material in the single crystal furnace are further improved.

[0037] It should be noted that, as Figure 2 As shown, the first direction is vertical, which makes the silicon material feeding process smoother and improves the silicon material feeding efficiency.

[0038] like Figures 1-4 As shown, the first feed inlet 301 is located on the top surface of the first feeding box 300, and the first discharge outlet is located on the bottom surface of the first feeding box 300. The first feed inlet 301, the transport unit, and the first discharge outlet 302 are distributed sequentially along the second direction, so that the silicon material can be transported by the transport unit and then pass through the first discharge outlet 302. In this way, the feeding rate of the silicon material can be adjusted according to the transport speed of the transport unit, thereby improving the uniformity of the silicon material feeding process.

[0039] It should be noted that there is an angle between the first direction and the second direction, which can be an acute angle, an obtuse angle, or a right angle. In this embodiment, in order to ensure that the transport unit can more accurately control the feeding rate of silicon material, the first direction is perpendicular to the second direction.

[0040] like Figure 1 As shown, the single crystal furnace feeding device provided in this embodiment of the application further includes a mounting base 100 and a support base 200. The mounting base 100 is used to fix the entire feeding device to the inlet of the single crystal furnace. The mounting base 100 is fixedly connected to the bottom end of the second feeding box 400. The mounting base 100 has a through hole for the second discharge port 402 to discharge, and the through hole is aligned with the inlet of the single crystal furnace to ensure normal feeding of silicon material; Figure 3 As shown, mounting holes 110 are provided at the four corners of the mounting base 100, so that the mounting base 100 can be fixed to the feed port of the single crystal furnace through the mounting holes 110 and threaded fasteners to ensure the stable operation of the feeding device.

[0041] Since the first feeding box 300 has a certain length, in order to ensure the stable operation of the first feeding box 300, such as Figures 1-2 As shown, the support base 200 is fixedly connected to the mounting base 100 and the end of the first feeding box 300 away from the second feeding box 400, so that the support base 200 can support the first feeding box 300 and ensure the stable operation of the first feeding box 300.

[0042] like Figure 2 As shown, the transport unit includes a first motor 303, a drive wheel 304, a driven wheel 305, and a conveyor belt 306. The first feed inlet 301 and the conveying surface of the conveyor belt 306 are distributed opposite to each other, so that the silicon material can fall onto the conveying surface of the conveyor belt 306 to ensure that the silicon material can be transported by the transport unit.

[0043] The first motor 303 is driven by the drive wheel 304, which is driven by the driven wheel 305 via the conveyor belt 306. Both the drive wheel 304 and the driven wheel 305 are rotatably connected inside the first feeding box 300. The drive wheel 304 and the driven wheel 305 are distributed sequentially along the second direction so that the conveyor belt 306 can transport silicon material in the horizontal direction, thereby ensuring that the transport unit can more accurately control the feeding rate of silicon material.

[0044] In practice, the drive wheel 304 is fixedly connected to the drive shaft, and the two ends of the drive shaft are rotatably engaged with the first feeding box 300 through bearings. The drive shaft is also driven by the output shaft of the first motor 303. The driven wheel 305 is fixedly connected to the driven shaft, and the two ends of the driven shaft are rotatably engaged with the first feeding box 300 through bearings to ensure the normal operation of the transport unit.

[0045] In some embodiments, such as Figure 3As shown, the first feed inlet 301 is circular, and the width of the conveying surface of the conveyor belt 306 is greater than the diameter of the first feed inlet 301, so as to reduce the amount of silicon material that is not conveyed to the conveyor belt 306 during the process of passing through the first feed inlet 301 to the conveyor belt 306, so as to ensure the transportation efficiency of the transportation unit.

[0046] In some other embodiments, the first feed inlet 301 may also be square, polygonal, etc., as long as the width of the conveying surface of the conveyor belt 306 is greater than the maximum width of the first feed inlet 301. This application embodiment does not limit this.

[0047] like Figures 2-4 As shown, to ensure the efficient conveying of silicon material from the first feeding box 300 to the second feeding box 400, a second inlet 401 is provided on the top surface of the second feeding box 400, and a first outlet 302 is sealed to the second inlet 401. Specifically, the shapes of the first outlet 302 and the second inlet 401 are matched, and a sealing structure is provided between the first outlet 302 and the second inlet 401 to ensure the efficient conveying of silicon material, reduce the entry of impurities from the external environment into the second feeding box 400, and further ensure the smelting effect of silicon material.

[0048] like Figure 2 As shown, the stirring unit includes a second motor 403, a rotating shaft 411, and stirring blades 412. The second motor 403 is connected to the rotating shaft 411 to drive the rotating shaft 411 to rotate, and the axis of the rotating shaft 411 is parallel to the first direction. There are at least two stirring blades 412 along the axial direction of the rotating shaft 411 and at least two stirring blades 412 along the circumferential direction of the rotating shaft 411 to ensure the stirring unit's dispersing effect on the silicon material, so that the silicon material can be more evenly transported into the single crystal furnace.

[0049] In some embodiments, such as Figure 2 As shown, six stirring blades 412 are distributed along the axial direction of the rotating shaft 411, and four stirring blades 412 are distributed along the circumferential direction of the rotating shaft 411, which further improves the stirring unit's effect on dispersing silicon material.

[0050] like Figure 2As shown, the rolling unit includes a rolling rod 414 and a filter plate 415. There is at least one rolling rod 414 along the circumference of the rotating shaft 411. The rolling rod 414 is located at the top of the filter plate 415 and is in contact with the filter plate 415, so that the second motor 403 drives the rotating shaft 411 to rotate, thereby driving the rolling rod 414 to rotate and cooperate with the filter plate 415 to achieve the rolling of large silicon particles. The filter plate 415 is fixedly connected to the bottom of the second feeding box 400, and the filter plate 415 is provided with filter holes, so that silicon particles smaller than the filter holes can enter the single crystal furnace through the filter holes, which improves the melting effect and melting efficiency of silicon in the single crystal furnace. In this way, the processing of large silicon particles is realized during the feeding process, and the feeding efficiency is improved.

[0051] In some embodiments, there are two, three, or four rolling rods 414 along the circumference of the rotating shaft 411, which improves the rolling effect of the rolling rods 414 on large silicon particles. This application embodiment does not limit this.

[0052] To ensure that the silicon material can pass smoothly through the filter plate 415, the bottom of the rolling rod 414 is provided with bristles, and the diameter of the bristles is smaller than the diameter of the filter hole. This allows the bristles to penetrate into the filter hole and clean it during the rotation of the rolling rod 414, ensuring the filter plate 415 effectively filters silicon material particles and ensuring the smooth and stable silicon material feeding process.

[0053] To ensure the normal operation of the mixing unit and the compaction unit, the second motor 403 is located at the bottom of the filter plate 415, and the rotating shaft 411 passes through the filter plate 415 and is rotatably connected to the filter plate 415, so that the second motor 403 can drive the rotating shaft 411 to rotate, thereby driving the mixing blade 412 and the compaction rod 414 to rotate.

[0054] Since the second motor 403 is located at the bottom of the filter plate 415, in order to reduce the impact of the silicon material feeding process after passing through the filter plate 415 on the second motor 403, in some embodiments, such as Figure 2 As shown, the output shaft of the second motor 403 is driven by a connecting block 413, which is driven by a rotating shaft 411, so that the second motor 403 can drive the rotating shaft 411 to rotate through the connecting block 413. The rolling rod 414 is fixedly connected to the connecting block 413, and the connecting block 413 can cover the second motor 403. In this way, under the shielding effect of the connecting block 413, the silicon material passing through the filter plate 415 can fall from the periphery of the second motor 403, reducing the impact of silicon material feeding on the second motor 403.

[0055] In some other embodiments, a placement box 404 is fixedly connected to the bottom end of the filter plate 415, and the second motor 403 is placed inside the placement box 404. The placement box 404 may be provided with a top cover through which the output shaft of the second motor 403 passes. In this way, the impact of silicon material feeding on the second motor 403 can be reduced. At the same time, by placing the second motor 403 inside the placement box 404, the working stability of the second motor 403 is improved.

[0056] In other embodiments, such as Figure 2 As shown, the second motor 403 is placed inside the placement box 404 and has a connecting block 413 that can cover the second motor 403, further ensuring the working stability of the second motor 403.

[0057] like Figures 1-3 As shown, the single crystal furnace feeding device provided in this embodiment of the application also includes a control box 500. The control box 500 is installed on the top surface of the mounting base 100. The control box 500 includes a controller 502 and a timer 503. The timer 503, the first motor 303, and the second motor 403 are all electrically connected to the controller 502 so that the controller 502 and the timer 503 can start the first motor 303 and the second motor 403 according to the set time to control the operation of the transport unit, the stirring unit, and the crushing unit, thereby improving the intelligence of the feeding process.

[0058] In some embodiments, such as Figure 3 As shown, a touch screen 501 is provided on the top of the control box 500 so that the operator can operate the touch screen 501 to set the running time of the first motor 303 and the second motor 403; of course, it can also be set by operating the buttons, and this application embodiment does not limit this.

[0059] When the single crystal furnace feeding device provided in this application embodiment is working, firstly, the mounting base 100 is fixed to the inlet of the single crystal furnace, and the feeding device is turned on by operating the touch screen 501. The running time of the first motor 303 and the second motor 403 is set. Then, the silicon material is fed through the first inlet 301. After passing through the transport unit, the silicon material enters the second feeding box 400 through the second inlet 401. After being dispersed by the stirring unit and crushed by the rolling unit, the small silicon particles can be uniformly transported into the single crystal furnace, which improves the uniformity of feeding in the single crystal furnace and improves the melting effect of the silicon material in the single crystal furnace.

[0060] The above description of the disclosed embodiments enables those skilled in the art to make or use this application. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of this application. Therefore, this application is not to be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A single crystal furnace feeding device, characterized in that, include: First feeding box (300) and second feeding box (400); The first feeding box (300) includes a first inlet (301), a transport unit and a first outlet (302). Silicon material enters the first feeding box (300) through the first inlet (301), and the transport unit is used to transport the silicon material entering through the first inlet (301) to the first outlet (302). The second feeding box (400) includes a second feeding port (401), a stirring unit, a rolling unit, and a second discharging port (402). The second feeding port (401) is connected to the first discharging port (302). The second feeding port (401), the stirring unit, the rolling unit, and the second discharging port (402) are distributed sequentially along a first direction. The first feeding box (300) and the second feeding box (400) are distributed sequentially along the first direction; the first direction is the vertical direction.

2. The single crystal furnace feeding device according to claim 1, characterized in that, The first feed inlet (301) is located on the top surface of the first feeding box (300), and the first discharge outlet (302) is located on the bottom surface of the first feeding box (300). The first feed inlet (301), the transport unit, and the first discharge outlet (302) are distributed sequentially along the second direction. The second feed inlet (401) is located on the top surface of the second feeding box (400), and the first discharge outlet (302) is sealed to the second feed inlet (401); The first direction and the second direction form an angle.

3. The single crystal furnace feeding device according to claim 1, characterized in that, The transport unit includes a first motor (303), a drive wheel (304), a driven wheel (305), and a conveyor belt (306). The first feed inlet (301) is distributed opposite to the conveying surface of the conveyor belt (306); The first motor (303) is driven by the drive wheel (304), and the drive wheel (304) is driven by the driven wheel (305) through the conveyor belt (306). Both the drive wheel (304) and the driven wheel (305) are rotatably connected inside the first feeding box (300). The driving wheel (304) and the driven wheel (305) are distributed sequentially along a second direction, which has an angle with the first direction.

4. The single crystal furnace feeding device according to claim 3, characterized in that, The first feed inlet (301) is circular, and the width of the conveying surface of the conveyor belt (306) is greater than the diameter of the first feed inlet (301).

5. The single crystal furnace feeding device according to claim 1, characterized in that, The stirring unit includes a second motor (403), a rotating shaft (411), and stirring blades (412). The second motor (403) is connected to the rotating shaft (411) in a transmission connection, and the axis of the rotating shaft (411) is parallel to the first direction; There are at least two stirring blades (412) along the axial direction of the rotating shaft (411) and at least two stirring blades (412) along the circumferential direction of the rotating shaft (411).

6. The single crystal furnace feeding device according to claim 5, characterized in that, The compaction unit includes a compaction rod (414) and a filter plate (415). There is at least one rolling rod (414) along the circumference of the rotating shaft (411), the rolling rod (414) is located at the top of the filter plate (415), and the rolling rod (414) is in contact with the filter plate (415); The filter plate (415) is fixedly connected to the bottom end of the second feeding box (400), and the filter plate (415) has filter holes. The second motor (403) is located at the bottom end of the filter plate (415), and the rotating shaft (411) passes through the filter plate (415) and is rotatably connected to the filter plate (415).

7. The single crystal furnace feeding device according to claim 6, characterized in that, The bottom of the rolling rod (414) is provided with bristles, the diameter of which is smaller than the diameter of the filter hole.

8. The single crystal furnace feeding device according to claim 6, characterized in that, It also includes a connecting block (413), which is connected to the second motor (403) and the rotating shaft (411). The rolling rod (414) is fixedly connected to the connecting block (413), and the connecting block (413) can cover the second motor (403). And / or, the second motor (403) is placed in a placement box (404) located at the bottom of the filter plate (415).

9. The single crystal furnace feeding device according to claim 1, characterized in that, It also includes a mounting base (100) and a support base (200); The mounting base (100) is fixedly connected to the bottom end of the second feeding box (400), and the mounting base (100) has a through hole for the second discharge port (402) to discharge material; The support base (200) is fixedly connected to the mounting base (100) and the end of the first feeding box (300) away from the second feeding box (400), and the support base (200) is used to support the first feeding box (300).

10. The single crystal furnace feeding device according to any one of claims 1-9, characterized in that, It also includes a control box (500), which contains a controller (502) and a timer (503); The timer (503), the transport unit, the mixing unit, and the crushing unit are all electrically connected to the controller (502).

Images