Wafer box supporting frame for large-size silicon wafer spin dryer

Abstract

A wafer box supporting frame for a large-size silicon wafer spin dryer comprises a first positioning plate and a second positioning plate which are parallel to each other, a plurality of positioning rods are fixedly connected between the first positioning plate and the second positioning plate, and the first positioning plate is provided with a through hole for a silicon wafer box to pass through. The supporting frame further comprises a mounting ring fixed in a spin dryer tube of the silicon wafer spin dryer, a plurality of connecting plates are fixedly connected to the inner side of the mounting ring, a plurality of lug plates are fixedly connected to the edge of the first positioning plate, and the lug plates are fixedly connected with the connecting plates in a one-to-one correspondence mode. The utility model provides a wafer box supporting frame for a large-size silicon wafer spin dryer, which comprises a mounting structure fixedly arranged in a spin dryer spin dryer barrel and a supporting structure detachably connected with the mounting structure and used for supporting a wafer box, and only the supporting structure needs to be replaced for different wafer boxes, so that the wafer box supporting frame is simple in structure and convenient to use. And the support structure can be replaced only by connecting the lug plate and the connecting plate at the outlet of the spin dryer barrel, so that the operation is easy.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of silicon wafer production, and particularly to a wafer box support frame for a large-size silicon wafer spin dryer. BACKGROUND

[0002] As an important material for semiconductor products, the quality of silicon wafers is crucial. In order to ensure the quality of silicon wafers, the silicon wafers need to be cleaned multiple times during production, and the cleaned silicon wafers also need to be spun dry to avoid residual cleaning liquid on the surface. In the prior art, silicon wafer spinning is mainly achieved by a spin dryer. The commonly used spin dryer has multiple spin barrels, and a wafer box support frame is fixedly arranged in the spin barrel. After the silicon wafers are placed in the wafer box, the wafer box is placed in the wafer box support frame, and the spinning can start. Figure 1 As shown in the conventional wafer box support frame, it mainly comprises a first positioning plate 1 and a second positioning plate 4 which are parallel to each other, and a through hole 2 is formed in the first positioning plate 1 for the wafer box to pass through. In use, the second positioning plate 4 is fixed to the inner wall of the spin barrel by multiple fastening bolts 6. Because the depth of the spin barrel is relatively deep, and the position of the fastening bolt 6 is at the bottom of the spin barrel, the worker needs to use a very long screwdriver to operate the fastening bolt 6, which is very inconvenient and laborious. SUMMARY

[0003] In order to solve the problems in the prior art, the utility model provides a wafer box support frame for a large-size silicon wafer spin dryer, which comprises a mounting structure fixedly arranged in a spin barrel of a spin dryer and a support structure for supporting a wafer box detachably connected with the mounting structure. For different wafer boxes, only the support structure needs to be replaced, and when the support structure is replaced, only the ear plates and the connecting plates need to be connected at the outlet of the spin barrel of the spin dryer, which is easy to operate.

[0004] In order to achieve the above-mentioned purpose, the utility model adopts the specific scheme that a wafer box support frame for a large-size silicon wafer spin dryer comprises a first positioning plate and a second positioning plate which are parallel to each other, and a plurality of positioning rods are fixedly connected between the first positioning plate and the second positioning plate, a through hole is formed in the first positioning plate for a silicon wafer box to pass through, the support frame further comprises a mounting ring fixed in a spin barrel of a silicon wafer spin dryer, a plurality of connecting plates are fixedly connected to the inner side of the mounting ring, a plurality of ear plates are fixedly connected to the edge of the first positioning plate, and the ear plates are fixedly connected to the connecting plates one by one.

[0005] As a further optimization of the wafer box support frame for the large-size silicon wafer spin dryer, three ear plates are fixedly connected to the edge of the first positioning plate, and the included angle between the two ear plates and the axis of the first positioning plate is 90°.

[0006] As further optimization of the wafer box support frame of the large-size silicon wafer spin dryer: the lug plate is semicircular, and a limiting plate for limiting the position of the lug plate is fixedly arranged on the connecting plate, and the limiting plate is circular arc-shaped.

[0007] As further optimization of the wafer box support frame of the large-size silicon wafer spin dryer: the lug plate is semicircular, and a limiting plate for limiting the position of the lug plate is fixedly arranged on the connecting plate, and the limiting plate is circular arc-shaped.

[0008] As further optimization of the wafer box support frame of the large-size silicon wafer spin dryer: the lug plate is semicircular, and a limiting plate for limiting the position of the lug plate is fixedly arranged on the connecting plate, and the limiting plate is circular arc-shaped.

[0009] As further optimization of the wafer box support frame of the large-size silicon wafer spin dryer: the lug plate is semicircular, and a limiting plate for limiting the position of the lug plate is fixedly arranged on the connecting plate, and the limiting plate is circular arc-shaped.

[0010] As further optimization of the wafer box support frame of the large-size silicon wafer spin dryer: the lug plate is semicircular, and a limiting plate for limiting the position of the lug plate is fixedly arranged on the connecting plate, and the limiting plate is circular arc-shaped.

[0011] As further optimization of the wafer box support frame of the large-size silicon wafer spin dryer: the lug plate is semicircular, and a limiting plate for limiting the position of the lug plate is fixedly arranged on the connecting plate, and the limiting plate is circular arc-shaped.

[0012] As further optimization of the wafer box support frame of the large-size silicon wafer spin dryer: the lug plate is semicircular, and a limiting plate for limiting the position of the lug plate is fixedly arranged on the connecting plate, and the limiting plate is circular arc-shaped.

[0013] Beneficial effects: the support frame comprises a mounting structure fixedly arranged in a spin dryer spin barrel and a support structure for supporting a wafer box which is detachably connected with the mounting structure, and for different wafer boxes, only the support structure needs to be replaced, and when the support structure is replaced, only the lug plate and the connecting plate need to be connected at the outlet of the spin dryer spin barrel, which is easy to operate. BRIEF DESCRIPTION OF DRAWINGS

[0014] Figure 1 is a structural schematic view of an existing wafer box support frame;

[0015] Figure 2 is a schematic view of the support structure in the utility model;

[0016] Figure 3 is a schematic view of the mounting structure in the utility model;

[0017] Figure 4 is a structural schematic view of the connecting plate;

[0018] Figure 5 is a schematic view of the setting mode of the gland;

[0019] Figure 6 is a structural schematic view of the ear plate.

[0020] BRIEF DESCRIPTION OF DRAWINGS: 1 - first positioning plate, 2 - through hole, 3 - positioning rod, 4 - second positioning plate, 5 - positioning hole, 6 - fastening bolt, 7 - ear plate, 8 - mounting ring, 9 - connecting plate, 10 - limiting plate, 11 - first connecting screw hole, 12 - gland, 13 - second connecting screw hole, 14 - third connecting screw hole, 15 - fourth connecting screw hole, 16 - fifth connecting screw hole, 17 - sixth connecting screw hole. DETAILED DESCRIPTION

[0021] The technical solutions in the embodiments of the utility model will be clearly and completely described below with reference to the drawings in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, rather than all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the utility model.

[0022] As shown in Figure 2 and Figure 3 A wafer box support frame for a large-size silicon wafer spin dryer comprises a first positioning plate 1 and a second positioning plate 4 which are parallel to each other, and a plurality of positioning rods 3 are fixedly connected between the first positioning plate 1 and the second positioning plate 4. The first positioning plate 1 is provided with a through hole 2 for the silicon wafer box to pass through. The support frame further comprises a mounting ring 8 fixed in a spin dryer barrel of the silicon wafer spin dryer, and the inner side of the mounting ring 8 is fixedly connected with a plurality of connecting plates 9. The edge of the first positioning plate 1 is fixedly connected with a plurality of ear plates 7, and the ear plates 7 are fixedly connected with the connecting plates 9 one by one. The first positioning plate 1, the second positioning plate 4, the positioning rods 3 and the ear plates 7 form a support structure, and the mounting ring 8 and the connecting plates 9 form a mounting structure.

[0023] The through hole 2 on the first positioning plate 1 needs to be matched with the shape of the wafer box, the shape of the through hole 2 can be determined according to the actual structure of the wafer box, and then a plurality of first positioning plates 1 with different through holes 2 can be manufactured in advance, and a plurality of support structures suitable for wafer boxes of different sizes can be assembled. It should be noted that the difference between different support structures is only that the shape and size of the through hole 2 are different, and the remaining components, including the first positioning plate 1, the second positioning plate 4, the positioning rod 3, the mounting ring 8, the connecting plate 9 and the ear plate 7, are all completely the same, so that they can be smoothly put into the silicon wafer spin dryer. In use, the mounting structure is fixed in the spin dryer barrel of the silicon wafer spin dryer. In the process of using the silicon wafer spin dryer to spin dry the silicon wafer, after selecting the corresponding support structure according to the size of the wafer box, the support structure is placed into the spin dryer barrel, and the ear plate 7 and the connecting plate 9 are fixedly connected one by one, and finally the wafer box is put into the support structure through the through hole 2. In the process of connecting the support structure and the mounting structure, only the ear plate 7 and the connecting plate 9 need to be connected at the opening of the spin dryer barrel, which is simple, convenient and easy to operate.

[0024] The support frame of the utility model includes mounting structure fixedly arranged in spin dryer barrel of spin dryer and support structure for supporting wafer box which is detachably connected with mounting structure, for different wafer box, only need to replace support structure, and only need to connect ear plate 7 and connecting plate 9 at the outlet of spin dryer barrel when replacing support structure, easy to operate.

[0025] When the wafer box is put into the support structure through the through hole 2, the opening of the wafer box needs to be upward, otherwise the silicon wafer may be damaged, in order to avoid that the installation direction of the support structure is wrong and the wafer box cannot be put into the support structure correctly, three ear plates 7 are fixedly connected at the edge of the first positioning plate 1, and the included angle between the two ear plates 7 and the axis of the first positioning plate 1 is 90°. Correspondingly, in the mounting structure, the included angle between the two connecting plates 9 and the axis of the mounting ring 8 is also 90°. Based on the setting, if the direction of the first positioning plate 1 is wrong, the ear plate 7 cannot be connected with the connecting plate 9 smoothly, so that the installation error of the support structure is avoided to cause that the wafer box cannot be put into the support structure smoothly. The position and angle of the third ear plate 7 and the third connecting plate 9 do not need special setting, and the position can be determined flexibly.

[0026] Further, in order to fully ensure the position accuracy of the mounting structure and avoid that the mounting structure is inclined to cause that the wafer box is unstable in the spinning process, the ear plate 7 is semicircular, the connecting plate 9 is fixedly provided with a limiting plate 10 for limiting the position of the ear plate 7, and the limiting plate 10 is arc-shaped. The limiting plate 10 can limit the ear plate 7, and a plurality of limiting plates 10 can limit the mounting structure from multiple directions, so that the position stability of the mounting structure is fully ensured, and displacement does not occur.

[0027] In view of the fact that repeated disassembly of the mounting structure and the supporting structure can cause damage to the mounting structure or the supporting structure, in order to prolong the service life of the mounting structure and the supporting structure, the utility model discloses three connecting modes between the lug plate 7 and the connecting plate 9, which are as follows.

[0028] As shown in Figure 4 and Figure 6 , the first connecting mode is that the connecting plate 9 is bolted with the lug plate 7, the first connecting hole 11 is formed on the connecting plate 9, and the fifth connecting hole 16 is formed on the lug plate 7. Based on the first connecting hole 11 and the fifth connecting hole 16, the connecting plate 9 and the lug plate 7 can be bolted, and since the connecting operation is performed at the outlet of the spin-dryer barrel, the operation is not complicated, and a tool with an excessively long length is not required.

[0029] As shown in Figure 5 and Figure 6 , the second connecting mode is that the limiting plate 10 is fixedly connected with the gland 12, the gland 12 is parallel to the connecting plate 9, and the accommodating space for accommodating the lug plate 7 is formed between the gland 12 and the connecting plate 9. Further, the limiting plate 10 is bolted with the gland 12, at least one second connecting hole 13 is formed on the gland 12, and at least one third connecting hole 14 corresponding to the second connecting hole 13 is formed on the limiting plate 10.

[0030] As shown in Figure 5 and Figure 6 , the third connecting mode is that the limiting plate 10 is bolted with the lug plate 7, the fourth connecting hole 15 is formed on the limiting plate 10, and the sixth connecting hole 17 corresponding to the fourth connecting hole 15 is formed on the lug plate 7.

[0031] In the above three connecting modes, one of them can be selected as the main connecting mode, for example, the first connecting mode is selected as the main connecting mode. After being used for a period of time, the first connecting hole 11 and the fifth connecting hole 16 can be damaged, which can cause the connection stability between the lug plate 7 and the connecting plate 9 to decrease, at which time the second connecting mode can be used. When the second connecting hole 13 and the third connecting hole 14 are also damaged, the third connecting mode is used. The three connecting modes are complementary, which can sufficiently prolong the service life of the supporting structure. Moreover, the three connecting modes can be operated at the outlet of the spin-dryer barrel, and the mounting and dismounting processes are very convenient.

[0032] Further, in order to ensure the mounting precision of the mounting structure, the middle part of the second positioning plate 4 is provided with the positioning hole 5 capable of cooperating with the internal positioning column of the silicon wafer spin-dryer, and the positioning rod 3 is located at the edge of the through hole 2.

[0033] The above description of disclosed embodiments enables one of ordinary skill in the art to make or use the application. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein can be applied to other embodiments without departing from the spirit or scope of the application. Thus, the present application is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A wafer box support frame for a large-size silicon wafer spin dryer, comprising a first positioning plate (1) and a second positioning plate (4) parallel to each other, and a plurality of positioning rods (3) fixedly connected between the first positioning plate (1) and the second positioning plate (4), a through hole (2) for a silicon wafer box to pass through being formed in the first positioning plate (1), characterized in that, The support frame further comprises a mounting ring (8) fixed in a spin-drying barrel of a silicon wafer spin-dryer, and a plurality of connecting plates (9) are fixedly connected to the inner side of the mounting ring (8); a plurality of lug plates (7) are fixedly connected to the edges of the first positioning plate (1), and the lug plates (7) are fixedly connected to the connecting plates (9) one by one.

2. A wafer cassette support frame for a large size silicon wafer spin-dryer as defined in claim 1, wherein The edges of the first positioning plate (1) are fixedly connected to three lug plates (7), and the included angle between the two lug plates (7) and the axis of the first positioning plate (1) is 90°.

3. A wafer cassette support frame for a large size silicon wafer spin-dryer as defined in claim 1, wherein The lug plate (7) is semicircular, and a limiting plate (10) for limiting the position of the lug plate (7) is fixedly arranged on the connecting plate (9), and the limiting plate (10) is in the shape of a circular arc.

4. A wafer cassette support frame for a large size silicon wafer spin-dryer as defined in claim 3, wherein The connecting plate (9) is bolted to the lug plate (7), and a first connecting screw hole (11) is formed in the connecting plate (9); and a fifth connecting screw hole (16) matched with the first connecting screw hole (11) is formed in the lug plate (7).

5. A wafer cassette support frame for a large size silicon wafer spin-dryer as defined in claim 3, wherein The limiting plate (10) is fixedly connected to a gland (12), the gland (12) is parallel to the connecting plate (9), and the connecting plate (9) and the gland (12) form an accommodating space for accommodating the lug plate (7).

6. A wafer cassette support frame for a large size silicon wafer spin-dryer as defined in claim 5, wherein The limiting plate (10) is bolted to the gland (12), and at least one second connecting screw hole (13) is formed in the gland (12); and at least one third connecting screw hole (14) matched with the second connecting screw hole (13) is formed in the limiting plate (10).

7. A wafer cassette support frame for a large size silicon wafer spin-dryer as defined in claim 3, wherein The limiting plate (10) is bolted to the lug plate (7), a fourth connecting screw hole (15) is formed in the limiting plate (10), and a sixth connecting screw hole (17) matched with the fourth connecting screw hole (15) is formed in the lug plate (7).

8. A wafer cassette support frame for a large size silicon wafer spin-dryer as defined in claim 1, wherein The middle part of the second positioning plate (4) is provided with a positioning hole (5) matched with an internal positioning column of the silicon wafer spin-dryer.

9. A wafer cassette support frame for a large size silicon wafer spin-dryer as defined in claim 1, wherein The positioning rod (3) is located at the edge of the through hole (2).

Images