Tubular ALD (Atomic Layer Deposition) equipment with grid tray structure in furnace tail air exhaust cavity

Abstract

The utility model relates to a tubular ALD (atomic layer deposition) device with a grid plate structure in a furnace tail air exhaust cavity, which structurally comprises a cavity, a carrier, a grid plate structure and an air exhaust cavity, the carrier is arranged in the cavity, the tail of the cavity is connected with the air exhaust cavity, and the grid plate structure with adjustable density is arranged at the joint of the tail of the cavity and the air exhaust cavity. The utility model has the advantages that: the structural design is reasonable, and by additionally arranging the grid blade plate structure capable of adjusting the density in the furnace tail air exhaust cavity of the tubular ALD, the air flow distribution of the air exhaust cavity is optimized and adjusted as required, so that the deposition effect of an Al2O3 film is improved, and the uniformity of the film can be improved.

Description

Technical Field

[0001] This utility model relates to a tubular ALD device, specifically a tubular ALD device with a grid structure in the tail exhaust chamber. Background Technology

[0002] Al₂O₃ prepared by the ALD method exhibits high density and excellent passivation properties, leading to its widespread application in the photovoltaic field. However, the performance of Al₂O₃ is closely related to the preparation method and the uniformity of the thin film.

[0003] ALD equipment is mainly divided into two types: tubular ALD and plate ALD. Plate ALD has better overall uniformity and less noticeable wrap-around coating, but its output is lower. Tubular ALD has poorer overall uniformity due to differences in its power supply method and carrier, especially the Al2O3 film in different positions of the cavity or carrier often has significant differences.

[0004] Existing tubular ALD (Alternating Current Deposition) equipment primarily employs intermittent gas supply at the furnace opening. This involves four steps: first, the main reactive gas is introduced; second, inert gas is used for purging; third, secondary reactive gas is introduced; and fourth, inert gas is introduced again for purging. One cycle completes the deposition of one film layer, and the film growth, or deposition thickness, is ultimately controlled by the number of cycles. However, this furnace opening method can lead to an excess of gas at the furnace opening and a small or even no gas supply at the furnace tail, resulting in various ALD-related quality defects.

[0005] On the other hand, the design of the carrier is mainly divided into two types according to the different cavities: vertical carriers for horizontal placement of silicon wafers (such as...). Figure 1 (as shown) and horizontal carriers for vertically placed silicon wafers (such as...) Figure 2 (As shown). Regardless of the carrier, as the silicon wafer size increases and the single-tube loading increases, the evacuation chamber of tubular ALD is usually a simple single-pipe design, which leads to severe uneven airflow distribution inside the chamber at the furnace tail, resulting in film thickness differences at different carrier locations.

[0006] Existing conventional air extraction chamber structural designs are mainly divided into three types (such as...) Figure 3 As shown in the figure, the structure of type ① results in a relatively uniform distribution of airflow at the tail of the cavity, with weaker airflow collision or shadowing phenomena; in type ②, the airflow in the middle is split and rebounded, resulting in poor airflow in the middle and abnormal film thickness uniformity; type ③ also causes gas splitting and rebound in the upper and lower parts, and in severe cases, even produces airflow shadow areas, leading to complex gas composition and reactions in the shadow areas, ultimately resulting in abnormal film thickness or defects. Utility Model Content

[0007] This utility model proposes a tubular ALD device with a grid structure in the tail exhaust chamber, which aims to overcome the above-mentioned shortcomings of the existing technology and improve the product yield.

[0008] The technical solution of this utility model is a tubular ALD device with a grid structure in the tail exhaust chamber. Its structure includes a cavity, a carrier, a grid structure, and an exhaust chamber. The carrier is housed within the cavity, and the exhaust chamber is connected to the tail of the cavity. A grid structure with adjustable density separates the tail of the cavity from the exhaust chamber. The airflow distribution in the exhaust chamber can be optimized and adjusted as needed, thereby improving the Al2O3 thin film deposition effect and enhancing film uniformity.

[0009] Preferably, the grid structure includes grid blades, mounting rods, and gaskets. Several identical and parallel grid blades are arranged along the height direction of the connection between the rear of the cavity and the extraction cavity. The grid blades are connected to several parallel and spaced mounting rods. Gaskets are provided on the mounting rods between adjacent grid blades.

[0010] Preferably, the number of air extraction chambers is one or more, and the spacing between the grid blades near the air extraction chamber is smaller than the spacing between the grid blades away from the air extraction chamber.

[0011] Preferably, the thickness of the gasket is 1-6 mm. The spacing between the metal gaskets can be changed by selecting metal gaskets of different thicknesses or by stacking several metal gaskets, thereby achieving grid structures with different density distributions.

[0012] The advantages of this invention are: reasonable structural design, by adding an adjustable grid plate structure to the exhaust chamber at the tail of the tubular ALD, the airflow distribution in the exhaust chamber can be optimized and adjusted as needed, thereby improving the Al2O3 thin film deposition effect and enhancing the uniformity of the film. Attached Figure Description

[0013] Figure 1 This is a schematic diagram of a vertical vehicle based on existing technology.

[0014] Figure 2 This is a schematic diagram of a lateral vehicle based on existing technology.

[0015] Figure 3 These are schematic diagrams of three embodiments of the existing air extraction chamber structure.

[0016] Figure 4 These are schematic diagrams of three embodiments of the tubular ALD device with a grid plate structure in the tail exhaust chamber of this utility model.

[0017] Figure 5 yes Figure 4 A schematic diagram of the middle grid structure.

[0018] Figure 6 yes Figure 5 A sectional view along the AA direction.

[0019] In the diagram, 1 is the cavity, 2 is the carrier, 3 is the grid structure, 4 is the extraction chamber, 5 is the grid blade, 6 is the mounting rod, 7 is the gasket, and 8 is the airflow distribution direction. Detailed Implementation

[0020] The present invention will be further described in detail below with reference to embodiments and specific implementation methods.

[0021] like Figure 4 As shown, the tubular ALD device with a grid structure in the tail exhaust chamber includes a cavity 1, a carrier 2, a grid structure 3 and an exhaust chamber 4. The carrier 2 is installed inside the cavity 1, and the tail of the cavity 1 is connected to the exhaust chamber 4. The connection between the tail of the cavity 1 and the exhaust chamber 4 is separated by a grid structure 3 with adjustable density.

[0022] Based on the above structure, the airflow distribution in the extraction chamber 4 can be optimized and adjusted as needed to improve the Al2O3 thin film deposition effect and enhance the film uniformity.

[0023] like Figure 5 , 6 As shown, the grid structure 3 specifically includes grid blades 5, mounting rods 6 and gaskets 7. Several identical and parallel grid blades 5 are arranged along the height direction of the connection between the tail of the cavity 1 and the extraction cavity 4. The grid blades 5 are connected to several parallel and spaced mounting rods 6. Gaskets 7 are provided on the mounting rods 6 between adjacent grid blades 5. The thickness of the gaskets is 1-6mm.

[0024] The number of air extraction chambers 4 is one or more, and the spacing of the grid blades 5 near the air extraction chamber 4 is smaller than the spacing of the grid blades 5 away from the air extraction chamber 4.

[0025] Both the mounting rod 6 and the washer 7 are preferably made of metal.

[0026] Based on the above structure, specifically, for different structures of the extraction chamber 4, after adding the grid structure 5, by adjusting the density of the grid blades 5, the resistance of the airflow through different positions of the grid structure 5 is controlled, thereby achieving the effect of redistributing the airflow, ensuring the stability of the furnace tail airflow, making the source distribution at the furnace tail more uniform during the ALD deposition process, and ultimately ensuring the uniformity of the furnace tail film thickness and the yield of the product.

[0027] In actual manufacturing, the grid structure 3 consists of a series of grid blades 5, which are fixed by several mounting rods 6 (metal rods) strung together. The grid blades 5 are spaced apart by gaskets 7 (metal gaskets). The thickness of the metal gaskets can be selected from 1 to 6 mm. The spacing between the metal gaskets can be changed by selecting metal gaskets of different thicknesses or by stacking several metal gaskets, thereby achieving grid structures with different density distributions.

[0028] All of the components described above are existing technologies, and those skilled in the art can use any model and existing design that can achieve their corresponding functions.

[0029] The above description is only a preferred embodiment of the present utility model. It should be noted that for those skilled in the art, several modifications and improvements can be made without departing from the inventive concept of the present utility model, and these all fall within the protection scope of the present utility model.

Claims

1. A tubular ALD apparatus with a furnace tail exhaust cavity with a grid structure, characterized in that, It comprises a cavity (1), a carrier (2), a grid structure (3) and a pumping cavity (4), wherein the carrier (2) is arranged in the cavity (1), the tail of the cavity (1) is connected with the pumping cavity (4), and the tail of the cavity (1) is separated from the connecting part of the cavity (1) and the pumping cavity (4) and is provided with the grid structure (3) with adjustable density.

2. The furnace exhaust gas cavity zone plate structure's tubular ALD apparatus according to claim 1, wherein, The grid structure (3) comprises a grid leaf plate (5), a mounting rod (6) and a gasket (7), a plurality of grid leaf plates (5) which are the same and parallel to each other are arranged along the height direction of the connecting part of the tail of the cavity (1) and the pumping cavity (4), the grid leaf plates (5) are connected to a plurality of mounting rods (6) which are parallel to each other and arranged at intervals, and the mounting rods (6) between adjacent grid leaf plates (5) are provided with the gasket (7).

3. The furnace exhaust gas cavity zone plate structure's tubular ALD apparatus according to claim 2, wherein, The number of the pumping cavities (4) is one or more than one, and the spacing between the grid leaf plates (5) near the pumping cavities (4) is smaller than the spacing between the grid leaf plates (5) away from the pumping cavities (4).

4. The tubular ALD device with a grid structure in the tail exhaust chamber as described in claim 2 or 3, characterized in that, The thickness of the gasket is 1-6 mm.

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