Chemical vapor deposition coating device

Abstract

The utility model discloses a chemical vapor deposition coating device which is characterized in that the bottom surface of a reaction chamber is fixedly connected with a workbench, the inner bottom surface of the workbench is fixedly connected with a servo motor, the output end of the servo motor is fixedly connected with a rotating rod, the inner surface of the reaction chamber is fixedly connected with a gas conveying pipe II, and the gas conveying pipe II is fixedly connected with a gas conveying pipe II. A plurality of air nozzles are fixedly connected to the surface of the second air conveying pipe, a connecting groove is formed in the outer surface of the rotating rod, a sleeve is movably connected to the interior of the rotating rod through the connecting groove, a connecting block is fixedly connected to the inner surface of the sleeve, and a sealing cover is fixedly connected to the surface of the upper end of the sleeve through a connecting rod. The surface of the sleeve is fixedly connected with a circular storage disc, flowing and distribution of gas are improved by rotating the base material, the reactivity of the gas is improved, the reaction rate is increased, a film is evenly deposited on all areas of the base material, and therefore the deposition rate and the uniformity of the film are improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to vacuum coating technology field especially relates to a kind of chemical vapor deposition coating device. BACKGROUND

[0002] Chemical vapor deposition (Chemical Vapor Deposition, CVD) coating is an important thin film deposition technology, it is a kind of process for manufacturing surface material on substrate by chemical method, can be widely applied to semiconductor, optoelectronic, ceramic coating and other fields, when carrying out thin film deposition, precursor gas and carrier gas are mixed in gas delivery system first, then mixed gas is delivered to reaction chamber, under the high-temperature environment in reaction chamber, precursor gas decomposes, reactant adheres and deposits on substrate surface and forms thin film. Chinese patent discloses a kind of " chemical vapor deposition coating device", its application number is "201821268141.1", its device is by being provided with mixing chamber between evaporator and reaction chamber, precursor vapor in evaporator and carrier gas are mixed in mixing chamber fully, it is favorable to increase the rate of reaction, improve the deposition speed of sample surface thin film, its device can reflect the deposition speed of improving substrate surface thin film, but most of existing device adopts fixed type's placing tray or placing rack to place substrate, and mixed gas is sprayed from the top surface of reaction chamber, so gas spraying can be relatively concentrated, leading to that some areas receive higher gas concentration, while other areas can receive lower gas concentration due to gas flow obstruction, this can lead to the non-uniformity of thin film deposition, therefore, to further improve the practicability of device, we provide a kind of chemical vapor deposition coating device to solve the above problems. SUMMARY

[0003] The utility model aims at least to solve one of the technical problems existing in prior art, provide a kind of chemical vapor deposition coating device, by being provided with rotatable rotating rod, sleeve and circular placing tray in the inside of reaction chamber, utilize servo motor to provide the power of rotation, improve the flow and distribution of gas by rotating substrate, increase the reactivity of gas, improve reaction rate, reduce deposition temperature, further improve efficiency, and combine annular gas pipe two and several evenly distributed gas nozzles, so that thin film is uniformly deposited in all areas of substrate, to improve deposition rate and the uniformity of thin film.

[0004] The utility model discloses still provide with above -mentioned chemical vapor deposition coating device, include: reaction chamber, the bottom surface fixed connection of reaction chamber has workstation, the inner bottom surface fixed connection servo motor of workstation, the output fixed connection of servo motor has rotary lever, the inner surface fixed connection of reaction chamber has gas pipe no. 2, the surface fixed connection of gas pipe no. 2 has a plurality of gas jet, the outer surface of rotary lever is set with connecting groove, the inside of rotary lever is connected with the sleeve pipe of connecting groove movably, the inner surface fixed connection of sleeve pipe has connecting block, the upper end surface of sleeve pipe is fixedly connected with sealing cover through connecting rod, the surface fixed connection of sleeve pipe has circular object tray.

[0005] According to the chemical vapor deposition coating device, the upper surface of the workstation is fixedly connected with a mixing tank, and the upper surface of the mixing tank is fixedly connected with a gas inlet pipe.

[0006] According to the chemical vapor deposition coating device, the upper surface of the mixing tank is fixedly connected with a gas inlet pipe no. 1, and the gas inlet pipe no. 1 penetrates through the reaction chamber and is communicated with the gas inlet pipe no. 2.

[0007] According to the chemical vapor deposition coating device, the upper surface of the workstation is fixedly connected with a fixing frame, and the front surface of the fixing frame is provided with a moving groove.

[0008] According to the chemical vapor deposition coating device, the inside of the moving groove is slidably connected with a connecting rod through an electric sliding block, and the bottom surface of the connecting rod is fixedly connected with the top end of the sleeve pipe.

[0009] According to the chemical vapor deposition coating device, the length and shape of the connecting groove are consistent with the connecting block, the shape of the gas inlet pipe no. 2 is annular, and the position of the circular object tray is close to the gas jet.

[0010] According to the chemical vapor deposition coating device, the inside of the reaction chamber is provided with an electric heating pipe, and the shape of the electric heating pipe is spiral.

[0011] The utility model discloses a chemical vapor deposition film device, the outer surface of reaction chamber is provided with observation window, the upper surface of sealing cover is fixedly connected with waste gas delivery pipe.

[0012] Beneficial effect: through setting up rotatable rotating rod, sleeve and circular tray in the inside of reaction chamber, utilize servo motor to provide the power of rotation, improve the flow and distribution of gas through rotating substrate, increase the reactivity of gas, improve the reaction rate, reduce the deposition temperature, and further improve the efficiency, and combine annular gas delivery pipe no. BRIEF DESCRIPTION OF DRAWINGS

[0013] The utility model is further described below in combination with the drawings and examples;

[0014] Figure 1 It is the overall structural drawing of chemical vapor deposition film device of the utility model;

[0015] Figure 2 It is the internal structure drawing of chemical vapor deposition film device of the utility model;

[0016] Figure 3 It is the structure drawing of rotating rod and sleeve of chemical vapor deposition film device of the utility model;

[0017] Figure 4 It is the chemical vapor deposition film device of the utility model Figure 3 The enlarged view of A in the utility model.

[0018] Legend:

[0019] 1, workbench;2, mixing jar;201, inlet pipe;3, sealing cover;301, waste gas delivery pipe;4, reaction chamber;5, gas delivery pipe one;6, fixed frame;601, moving groove;7, connecting rod;8, servo motor;9, gas delivery pipe two;10, jet nozzle;11, electric heating pipe;12, rotating rod;1201, connecting groove;13, sleeve;1301, connecting block. DETAILED DESCRIPTION

[0020] This part will describe the specific embodiment of the utility model in detail, and the preferred embodiment of the utility model is shown in the drawings, and the role of the drawings is to supplement the description of the description part with graphics, so that people can intuitively and visually understand each technical feature and overall technical scheme of the utility model, but it cannot be understood as the limitation of the protection scope of the utility model.

[0021] Reference Figures 1-4The utility model discloses a kind of chemical vapor deposition coating devices, it includes: reaction chamber 4, the place suitable for carrying out reaction and depositing film with gas and substrate, the bottom surface of reaction chamber 4 is fixedly connected with workbench 1, the component for fixing and supporting equipment, the inner bottom surface of workbench 1 is fixedly connected servo motor 8, for the rotation of rotating rod 12 and sleeve 13 is powered, the output of servo motor 8 is fixedly connected with rotating rod 12, for being combined with sleeve 13 so that carry out uniform speed rotation, the inner surface of reaction chamber 4 is fixedly connected with gas pipe two 9, for conveying gas to jet nozzle 10 in reaction to substrate, the surface of gas pipe two 9 is fixedly connected with several jet nozzle 10, so that the substrate on circular object tray can uniformly form film, the outer surface of rotating rod 12 is provided with connecting groove 1201, for being combined with connecting block 1301, neither affect the rotation of rotating rod 12 and sleeve 13, nor affect the rotation of sleeve 13 driving circular object tray, rotating rod 12 is movably connected with sleeve 13 in connecting groove 1201, the inner surface of sleeve 13 is fixedly connected with connecting block 1301, the upper end surface of sleeve 13 is fixedly connected with sealing cover 3 by connecting rod, for making the inside of reaction chamber 4 form sealed space, the surface of sleeve 13 is fixedly connected with circular object tray, for simultaneously placing several substrates that need to carry out chemical vapor deposition.

[0022] The upper surface of workbench 1 is fixedly connected with mixing tank 2, the upper surface of mixing tank 2 is fixedly connected with gas inlet pipe 201, for uniformly mixing precursor gas, and ensuring that gas is uniformly delivered to reaction chamber 4, so that reaction gas can uniformly cover substrate, improve deposition rate and film uniformity. The upper surface of mixing tank 2 is fixedly connected with gas pipe one 5, gas pipe one 5 penetrates reaction chamber 4 and is communicated with gas pipe two 9, for ensuring that gas mixed in mixing tank 2 is uniformly delivered to reaction chamber 4. The upper surface of workbench 1 is fixedly connected with fixing frame 6, the front surface of fixing frame 6 is provided with moving groove 601, for driving connecting rod 7 and sealing cover 3 to move, so that sealing cover 3 is combined with the tank body of reaction chamber 4, connecting rod 7 is slidably connected with moving groove 601 in the inside, the bottom surface of connecting rod 7 is fixedly connected with the top end of sleeve 13, for fixing sealing cover 3, and enhancing the stability of its movement, the length and shape of connecting groove 1201 are consistent with connecting block 1301, the shape of gas pipe two 9 is annular, the position of circular object tray is close to jet nozzle 10, for making the gas sprayed by jet nozzle 10 uniform, ensuring that the surface of substrate is more flat. The inside of reaction chamber 4 is provided with electric heating tube 11, the shape of electric heating tube 11 is spiral, for heating reaction chamber 4, improving reaction temperature to promote deposition process, and ensuring temperature uniformity, the outside of reaction chamber 4 is provided with observation window, the upper surface of sealing cover 3 is fixedly connected with waste gas delivery pipe 301, for timely treating waste gas in the inside of reaction chamber 4 during reaction process, while also avoiding repeated circulation of waste gas in reaction chamber 4 affecting the quality of film.

[0023] Working principle: when using the chemical vapor deposition coating device, first place the substrate on the circular tray, through the electric sliding block drive connecting rod 7 connecting the sealing cover 3 in the moving groove 601 downward movement, make it with the reaction chamber 4 is connected, at the same time, the sealing cover 3 connecting sleeve 13 sleeve rotating rod 12, sleeve 13 through the connecting block 1301 with the connecting groove 1201 coincident connection, so that both in rotation ensures the stability of the sleeve 13, then the gas from the gas inlet pipe 201 to the mixing tank 2, after mixing is completed again through the gas pipe 5 to the reaction chamber 4 inside the gas pipe two 9 inside, again by the gas nozzle 10 on the circular tray on the substrate for spraying, at the same time, the use of servo motor 8 drive rotating rod 12 and sleeve 13 rotation, circular tray also with the rotation, through the electric heating tube 11 on the reaction chamber 4 in heating, help to improve the deposition efficiency and film quality, in the process of reaction, in time from the exhaust gas delivery pipe 301 exhaust.

[0024] The above embodiment of the present application is described in detail in combination with the drawings, but the present application is not limited to the above embodiment, and various changes can be made within the knowledge range possessed by those skilled in the art without departing from the purpose of the present application.

Claims

1. A chemical vapor deposition coating device, characterized by comprising: Include: The reaction chamber (4), the bottom surface of the reaction chamber (4) is fixedly connected with the workbench (1), the inner bottom surface of the workbench (1) is fixedly connected with the servo motor (8), the output end of the servo motor (8) is fixedly connected with the rotating rod (12), the inner surface of the reaction chamber (4) is fixedly connected with the gas pipe two (9), the surface of the gas pipe two (9) is fixedly connected with several gas nozzles (10), the outer surface of the rotating rod (12) is provided with a connecting groove (1201), the inside of the rotating rod (12) is movably connected with the sleeve (13) through the connecting groove (1201), the inner surface of the sleeve (13) is fixedly connected with the connecting block (1301), the upper end surface of the sleeve (13) is fixedly connected with the sealing cover (3) through the connecting rod, the surface of the sleeve (13) is fixedly connected with the circular object tray.

2. The apparatus according to claim 1, wherein The upper surface of the workbench (1) is fixedly connected with the mixing tank (2), and the upper surface of the mixing tank (2) is fixedly connected with the air inlet pipe (201).

3. The apparatus according to claim 2, wherein The upper surface of the mixing tank (2) is fixedly connected with the gas pipe one (5), and the gas pipe one (5) penetrates the reaction chamber (4) and is communicated with the gas pipe two (9).

4. The apparatus according to claim 1, wherein The upper surface of the workbench (1) is fixedly connected with the fixing frame (6), and the front surface of the fixing frame (6) is provided with the moving groove (601).

5. The apparatus according to claim 4, wherein The inside of the moving groove (601) is slidably connected with the connecting rod (7) through the electric sliding block, and the bottom surface of the connecting rod (7) is fixedly connected with the top end of the sleeve (13).

6. The apparatus according to claim 1, wherein The length and shape of the connecting groove (1201) are consistent with the connecting block (1301), the shape of the gas pipe two (9) is annular, and the position of the circular object tray is close to the gas nozzle (10).

7. The apparatus according to claim 1, wherein The inside of the reaction chamber (4) is provided with the electric heating pipe (11), and the shape of the electric heating pipe (11) is spiral.

8. The apparatus according to claim 1, wherein The outer surface of the reaction chamber (4) is provided with an observation window, and the upper surface of the sealing cover (3) is fixedly connected with the waste gas conveying pipe (301).

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