Burner for melting and synthesizing quartz glass by CVD (chemical vapor deposition) method

Abstract

The utility model relates to a burner for melting synthetic quartz glass by a CVD (Chemical Vapor Deposition) method, belonging to the technical field of synthetic quartz glass production instruments. The quartz lamp comprises a quartz lamp body, the quartz lamp body comprises a central tube, a material holding cavity, a hydrogen cavity A, a hydrogen cavity B, an oxygen bin A, an oxygen bin B and a lamp shell, and bottom ports of the central blanking tube, the material holding cavity, the hydrogen cavity A, the hydrogen cavity B, the oxygen bin A, the oxygen bin B and the lamp shell are designed in a step manner, so that the problem that flying materials formed by returning gasified raw materials sprayed out of the central tube are deposited on the lamp shell can be effectively prevented during working; the quality of the synthesized quartz glass ingot product is improved, and the method has positive significance for synthesizing the high-quality quartz glass ingot product.

Description

Technical Field

[0001] This utility model relates to a burner for CVD melting of synthetic quartz glass, belonging to the technical field of synthetic quartz glass production equipment. Background Technology

[0002] The synthetic quartz lamp is one of the main components in the CVD process for preparing synthetic quartz glass. It is made of high-temperature resistant quartz glass and its structure includes a wick tube (silicon tetrachloride feed tube) at the center of the lamp body, a material storage tube surrounding the wick tube, and a lamp housing. The lower ends of the wick tube, material storage tube, and lamp housing are flush (see the instruction manual). Figure 1 Because the lower ends of the wick tube, wick holder, and lamp housing are flush, during the preparation of synthetic quartz glass, the gasified raw materials and combustion-supporting gases ejected from the wick tube, wick holder, and lamp housing will cause some of the gasified raw materials to velocities back after contacting the molten quartz glass deposited on the target. Simultaneously, due to the high-temperature production environment, the velocities rise and form fly material, which eventually deposits on the quartz lamp housing, forming accumulated material. As the accumulated material increases, it drips onto the molten quartz glass on the target, affecting the quality of the produced synthetic quartz glass ingots. Therefore, it is necessary to improve this process. Summary of the Invention

[0003] The purpose of this invention is to provide a burner for CVD melting of synthetic quartz glass that can effectively avoid the accumulation of material in the lamp housing and thus improve the quality of synthetic quartz glass ingots.

[0004] The technical solution of this utility model is:

[0005] A burner for CVD melting of synthetic quartz glass comprises a quartz lamp body. The quartz lamp body includes a central tube, a material storage chamber, hydrogen chamber A, hydrogen chamber B, oxygen chamber A, oxygen chamber B, and a lamp housing. The material storage chamber is arranged on the circumference of the central tube. Oxygen chamber A, hydrogen chamber A, oxygen chamber B, hydrogen chamber B, and the lamp housing are arranged sequentially on the circumference of the material storage chamber. The bottom ports of oxygen chamber A and oxygen chamber B are sealed. Multiple oxygen pipes are arranged in a ring at the bottom of oxygen chamber A and oxygen chamber B, respectively. The upper end of each oxygen pipe is connected to the corresponding oxygen chamber A and oxygen chamber B. The characteristic feature is that the lower ends of each oxygen pipe are staggered with the lower ends of hydrogen chamber A, hydrogen chamber B, and the lamp housing to prevent the vaporized raw material from returning and forming flying material.

[0006] The material storage chamber, hydrogen chamber A, hydrogen chamber B, oxygen chamber A, oxygen chamber B, and lamp housing are each equipped with an air inlet connecting pipe.

[0007] The material storage chamber, hydrogen chamber A, hydrogen chamber B, and lamp housing are all cylindrical bodies with a closed, bulging top and an open bottom.

[0008] The bottom ends of the oxygen pipes at the bottom of oxygen chambers A and B are respectively inclined inward with the central pipe as the center.

[0009] The lower end of the lamp housing is bent inward.

[0010] The beneficial effects of this utility model are as follows:

[0011] The central feeding pipe, material storage chamber, hydrogen chamber A, hydrogen chamber B, oxygen chamber A, oxygen chamber B, and the bottom port of the lamp housing of this utility model are designed in a stepped manner, with each port shortening sequentially from the outside to the inside. This effectively prevents the problem of flying material formed by the backflow of gasified raw materials ejected from the central pipe from depositing on the lamp housing during operation, thereby improving the quality of the synthetic quartz glass ingot product and having a positive significance for the synthesis of high-quality quartz glass ingot products. Attached Figure Description

[0012] Figure 1 A schematic diagram of the structure and gas flow field of an existing quartz lamp;

[0013] Figure 2 This is a schematic diagram of the structure of this utility model;

[0014] Figure 3 for Figure 2 Enlarged diagram of point A in the diagram;

[0015] Figure 4 This is a schematic diagram of the gas flow field during the operation of this utility model;

[0016] Figure 5 A simulation diagram of the gas flow field of an existing burner;

[0017] Figure 6 This is a simulation diagram of the gas flow field of this utility model.

[0018] In the diagram: 1. Central tube, 2. Material storage chamber, 3. Oxygen chamber A, 4. Hydrogen chamber A, 5. Oxygen chamber B, 6. Hydrogen chamber B, 7. Lamp housing, 8. Inlet connecting pipe, 9. Oxygen pipe. Detailed Implementation

[0019] The burner used for CVD melting of synthetic quartz glass consists of a quartz lamp body; the quartz lamp body includes a central tube 1, a material storage chamber 2, an oxygen chamber A3, a hydrogen chamber A4, an oxygen chamber B5, a hydrogen chamber B6, and a lamp housing 7. The material storage chamber 2 is arranged on the circumference of the central tube 1, and the oxygen chamber A3, hydrogen chamber A4, oxygen chamber B5, hydrogen chamber B6, and lamp housing 7 are arranged sequentially on the circumference of the material storage chamber 2. The central tube 1, material storage chamber 2, oxygen chamber A3, hydrogen chamber A4, oxygen chamber B5, hydrogen chamber B6, and lamp housing 7 are independent and sealed from each other. The central tube 1 is connected to the material storage chamber. Each of the material storage chamber 2, oxygen chamber A3, hydrogen chamber A4, oxygen chamber B5, hydrogen chamber B6, and lamp housing 7 is equipped with an air inlet connecting pipe 8. Hydrogen chambers A4 and B6 are connected to a hydrogen source via the air inlet connecting pipe 8, and the material storage chamber 2, oxygen chamber A3, oxygen chamber B5, and lamp housing 7 are connected to an oxygen source via the air inlet connecting pipe 8. The material storage chamber 2, hydrogen chamber A4, hydrogen chamber B6, and lamp housing 7 are cylindrical, with a closed, bulging top and an open bottom.

[0020] Oxygen chambers A3 and B5 are both bulging-shaped cups. The bottom ports of oxygen chambers A3 and B5 are sealed. Multiple oxygen tubes 9 are arranged in a ring at the bottom of oxygen chambers A3 and B5, and the upper end of each oxygen tube 9 is connected to the corresponding oxygen chamber A3 or oxygen chamber B5. Among them, the oxygen tubes 9 at the bottom of oxygen chamber B5 are arranged in a double layer, inside and out.

[0021] The lower ends of each oxygen tube 9 are staggered with the lower ends of hydrogen chambers A4, B6, and lamp housing 7. Specifically, the lower end of the oxygen tube 9 in oxygen chamber A3 is flush with the lower ends of the central tube 1 and hydrogen chamber A4; the lower end of the oxygen tube 9 in oxygen chamber B5 is flush with the lower end of hydrogen chamber B6; and the lower ends of the oxygen tube 9 in oxygen chamber B5 and hydrogen chamber B6 are higher than the lower end of lamp housing 7. The lower ends shorten sequentially from the outside to the inside, forming three stepped surfaces: high, medium, and low. The bottom ends of the oxygen tubes 9 are slightly inclined inward with the central tube 1 as the center point, and the lower end of the lamp housing 7 is bent inward.

[0022] During operation, the gasified feedstock (silicon tetrachloride) ejected from the central tube 1 melts on the target to form a quartz slurry. Oxygen ejected from the feed chamber 2 forms the first air curtain; oxygen ejected from oxygen pipe 9 in oxygen chamber A3 and hydrogen ejected from hydrogen chamber A4 form the second air curtain; oxygen ejected from oxygen pipe 9 in oxygen chamber B5 and hydrogen ejected from hydrogen chamber B6 form the third air curtain; and oxygen ejected from lamp housing 7 forms the fourth air curtain. Simultaneously, because the lower ends of each oxygen pipe 9 are staggered with the lower ends of hydrogen chambers A4, B6, and 7, and the lower end of lamp housing 7 is bent inwards, the gasified feedstock and airflow are forced to turn back towards the center, reducing the central feedstock flow rate, increasing the feedstock reaction time, and ensuring that the gasified feedstock and airflow remain within the working area of ​​lamp housing 7. This prevents the influence of swirling airflow and reduces the feedstock flow rate, increasing the reaction time and minimizing the amount of fly-through formed by the gasified feedstock ejected from the central tube 1. (See attached instruction manual) Figure 5 , 6 As can be seen, existing burners have a higher SiO2 distribution than those that disperse flyaway material. This application demonstrates that by staggering the gas pipes, gas chambers, and the lower end of the lamp housing, the raw material SiCl4 can react earlier, while the airflow further restricts the reaction, ultimately confining more SiO2 within the target area. This solves the problem of flyaway material formed by the return of gasified raw material ejected from the central tube of existing quartz lamps easily depositing on the lamp housing, thereby improving the quality of synthesized quartz glass ingots and having a positive impact on the synthesis of high-quality quartz glass ingots.

Claims

1. A burner for CVD method melting synthetic quartz glass, which is composed of a quartz lamp body; the quartz lamp body comprises a center tube (1), a material holding cavity (2), a hydrogen cavity A (4), a hydrogen cavity B (6), an oxygen bin A (3), an oxygen bin B (5) and a lamp shell (7), the circumference of the center tube (1) is provided with the material holding cavity (2), the circumference of the material holding cavity (2) is sequentially provided with the oxygen bin A (3), the hydrogen cavity A (4), the oxygen bin B (5), the hydrogen cavity B (6) and the lamp shell (7), the bottom ports of the oxygen bin A (3) and the oxygen bin B (5) are respectively in a plugging shape, the bottoms of the oxygen bin A (3) and the oxygen bin B (5) are respectively provided with a plurality of oxygen pipes (9) in an annular shape, and the upper ends of the oxygen pipes (9) are respectively communicated with the corresponding oxygen bin A (3) and oxygen bin B (5), characterized in that: The lower end port of each oxygen pipe (9) is staggered with the lower port of hydrogen cavity A (4), hydrogen cavity B (6) and lamp shell (7) to avoid the fly material formed by the return of the gasified raw material.

2. A burner for use in the CVD process for melting synthetic quartz glass according to claim 1, characterized in that The air inlet communication pipes (8) are arranged on the material holding cavity (2), hydrogen cavity A (4), hydrogen cavity B (6), oxygen bin A (3), oxygen bin B (5) and lamp shell (7) respectively.

3. A burner for use in the CVD process for melting synthetic quartz glass according to claim 1, characterized in that: The material holding cavity (2), hydrogen cavity A (4), hydrogen cavity B (6) and lamp shell (7) are cylindrical bodies, the top of which is in the shape of a closed drum and the bottom of which is in the shape of an open mouth.

4. A burner for use in the CVD process for melting synthetic quartz glass according to claim 1, characterized in that: The bottom end of the oxygen pipe (9) of the oxygen bin A (3) and oxygen bin B (5) is arranged inwards with the center pipe (1) as the center.

5. A burner for use in the CVD process for melting synthetic quartz glass according to claim 1, characterized in that: The lower port of the lamp shell (7) is arranged inwards.

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