Connection table for quantum production workshop

Abstract

The utility model discloses a connection table for a quantum production workshop, which relates to the field of connection tables and comprises a rack, a first guide rail and a movable second guide rail are arranged on the rack, two parallel first placing rollers are arranged in the relative space of the first guide rail and the second guide rail, and the two parallel second placing rollers are arranged in the relative space of the first guide rail and the second guide rail. The sides, facing the first guide rails, of the first containing rollers are provided with second containing rollers, and when the second guide rails move towards the first guide rails, the silicon wafers can be placed on the surfaces of the two first containing rollers and the surfaces of the two second containing rollers till the second guide rails are in butt joint with the silicon wafers. The stability of the silicon wafer can be kept through the first placing roller and the second placing roller until the second guide rail is in butt joint with the silicon wafer in a moving state. In the adjusting process of the second guide rail, the silicon wafer in the stable state can be used as a reference, the actual adjustment range of the second guide rail can be conveniently confirmed, the time required by repeated adjustment is shortened, and the accuracy in the butt joint process is improved.

Description

Technical Field

[0001] This utility model relates to the field of connecting platforms, and in particular to a connecting platform for quantum production workshops. Background Technology

[0002] A quantum processing workshop is a facility used to manufacture core hardware for quantum technologies, such as quantum computers, quantum sensors, and quantum communication devices. The objects processed include superconducting quantum chips, requiring the fabrication of micrometer / nanometer-scale superconducting circuits (Josephson junctions, capacitors, inductors, etc.) on silicon wafers or sapphire substrates. This involves precision semiconductor manufacturing processes such as photolithography, thin-film deposition (e.g., aluminum, niobium), etching, and ion implantation. The docking stations used in quantum production workshops are mostly for the safe transfer of wafers / silicon wafers, requiring active vibration damping platforms to prevent damage from micro-vibrations during the transfer process. Simultaneously, most docking stations integrate ion exchange bars or conductive material grippers to eliminate electrostatic interference with the superconducting quantum chips.

[0003] Most existing wafer clamping stations employ edge clamping technology to position silicon wafers, avoiding mechanical contact damage to the chip surface. The wafer moves with the rotation of the conveyor belt within the station until it reaches the designated workstation. One of the two tracks used to clamp the wafer is adjustable, allowing for adjustments to the spacing between the two tracks to accommodate wafers of different sizes. However, during track adjustment, the wafer often cannot be stably positioned. Therefore, the spacing between the two tracks cannot be precisely adjusted according to the wafer's specifications. Repeated adjustments are often required until the tracks precisely clamp the wafer, resulting in a time-consuming and inefficient process. Utility Model Content

[0004] To address the aforementioned issues, this application provides a connecting platform for a quantum production workshop.

[0005] To achieve the above objectives, this application provides the following technical solution: a connecting platform for a quantum production workshop, including a frame, on which a first guide rail and a movable second guide rail are provided. Two parallel first placement rollers are provided in the relative space between the first guide rail and the second guide rail. A second placement roller is provided on the side of the first placement roller facing the first guide rail. When the second guide rail moves toward the first guide rail, the silicon wafer can be placed on the surface of the two first placement rollers and the second placement rollers until the second guide rail is in contact with the silicon wafer.

[0006] The distance between the first placement roller and the second placement roller is adjustable. As the second guide rail moves continuously, the first placement roller can move toward the second placement roller to adapt to the adjusted distance between the second guide rail and the first guide rail.

[0007] Furthermore, the first placement roller and the second placement roller are respectively provided with a first support foot and a second support foot on one side. The first support foot and the second support foot are slidably installed with the same limiting guide rail. Both limiting guide rails are in contact with the frame. When the first support foot moves towards the second support foot along the distribution direction of the limiting guide rail, the first placement roller moves towards the second placement roller.

[0008] Furthermore, the bottom of the second guide rail is provided with two pushers. When the second guide rail moves toward the first guide rail, the two pushers can move toward the two first legs until the pushers abut against the first legs.

[0009] Furthermore, each of the first placement rollers is provided with a pressure spring and a follower rod located inside the pressure spring on the side facing the second placement roller. The end of the pressure spring near the second placement roller is abutted against it by a gasket. Each of the second placement rollers is provided with a channel that can accommodate the follower rod. When the first placement roller moves toward the second placement roller, the pressure spring contracts and the follower rod slides within the channel.

[0010] Furthermore, each of the two limiting guide rails is fitted with a set of limiting sleeves at one end near the first guide rail, and the second support foot abuts against the limiting sleeves. A positioning guide rail is fixed inside the frame, and the two sets of limiting sleeves on the two limiting guide rails are slidably installed with the positioning guide rails. When the two limiting guide rails slide on the positioning guide rails, the distance between the two first placement rollers and the second placement rollers can be adjusted.

[0011] Furthermore, the bottom end of the second guide rail is provided with a guide seat, and the frame is provided with a drive screw and a handle that can drive the drive screw to rotate. The guide seat is installed with the drive screw.

[0012] The frame is provided with limiting guide rods that are distributed parallel to the drive screw. The limiting guide rods pass through the guide seat. When the guide seat moves along the distribution direction of the limiting guide rods, the second guide rail moves synchronously.

[0013] In summary, the technical effects and advantages of this utility model are as follows:

[0014] This invention maintains the stability of the silicon wafer through a first and a second placement roller until the second guide rail aligns with the wafer during movement. During adjustment, the second guide rail can be referenced by the stable silicon wafer, facilitating the confirmation of the required adjustment range, reducing the time spent on repeated adjustments, and improving the accuracy of the alignment process. Furthermore, as the second guide rail moves, the first placement roller can move towards it to accommodate the adjusted gap between the second and first guide rails, supporting silicon wafers of different specifications, maintaining wafer stability, and reducing the time required for manual adjustment. Attached Figure Description

[0015] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0016] Figure 1 This is a three-dimensional structural diagram of the present invention.

[0017] Figure 2 This is a schematic diagram showing the positions of the first guide rail, the second guide rail, the first placement roller, and the second placement roller of this utility model.

[0018] Figure 3 This is a schematic diagram of the second perspective positions of the first guide rail, the second guide rail, the first placement roller, and the second placement roller of this utility model.

[0019] Figure 4 This is a schematic diagram of the connection structure between the first placement roller and the second placement roller of this utility model.

[0020] 1. Frame; 2. First guide rail; 3. Second guide rail; 31. Guide seat; 32. Push frame; 33. Drive screw; 34. Limiting guide rod; 4. Positioning guide rail; 5. First placement roller; 51. First support leg; 52. Pressure spring; 53. Shim; 54. Follower rod; 6. Second placement roller; 61. Second support leg; 7. Limiting guide rail; 71. Limiting sleeve. Detailed Implementation

[0021] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0022] Example 1: Reference Figure 1-4The diagram illustrates a docking station for a quantum manufacturing workshop, comprising a frame 1. The frame 1 has a first guide rail 2 and a movable second guide rail 3. Two parallel first placement rollers 5 are arranged within the space between the first and second guide rails 2 and 3. Each of the first placement rollers 5 has a second placement roller 6 on its side facing the first guide rail 2. When the second guide rail 3 moves towards the first guide rail 2, a silicon wafer can be placed on the surfaces of the first and second placement rollers 5 and 6. At this point, one end of the silicon wafer is aligned with the first guide rail 2 in its fixed state. The first and second placement rollers 5 and 6 maintain the stability of the silicon wafer until the second guide rail 3 aligns with it. During adjustment, the second guide rail 3 can use the stable silicon wafer as a reference, facilitating the confirmation of the actual adjustment range required for the second guide rail 3, reducing the time needed for repeated adjustments, and improving the accuracy of the docking process.

[0023] When the silicon wafer is placed on the surfaces of the first placement roller 5 and the second placement roller 6, the wafer mostly covers them. However, if a smaller wafer needs to be mated, it cannot completely cover the rollers, leaving a gap. During mating, the second guide rail 3 still needs to move a certain distance towards the first guide rail 2. As the second guide rail 3 moves, the distance between the first placement roller 5 and the second placement roller 6 becomes adjustable. With the continuous movement of the second guide rail 3, the first placement roller 5 can move towards the second placement roller 6 to accommodate the adjusted distance between the second guide rail 3 and the first guide rail 2, thus supporting the wafer, maintaining its stability, and reducing the time required for manual adjustment. The entire process has the advantage of automatic adjustment.

[0024] like Figure 2 , Figure 4 As shown, the first placement roller 5 and the second placement roller 6 are respectively provided with a first support leg 51 and a second support leg 61 on one side. Both the first support leg 51 and the second support leg 61 are slidably installed on the same limiting guide rail 7. Both limiting guide rails 7 are in contact with the frame 1. When the first support leg 51 moves towards the second support leg 61 along the distribution direction of the limiting guide rail 7, the first placement roller 5 moves towards the second placement roller 6. Therefore, when the second guide rail 3 continuously reduces its distance from the first guide rail 2 to connect with smaller silicon wafers, the first placement roller 5 can also move synchronously to adapt to the movement of the second guide rail 3 until the second guide rail 3 abuts against the silicon wafer, and the smaller silicon wafer is transferred between the second guide rail 3 and the first guide rail 2.

[0025] like Figure 3As shown, the bottom of the second guide rail 3 is provided with two pushers 32. When the second guide rail 3 moves toward the first guide rail 2, the two pushers 32 can move toward the two first legs 51 until the pushers 32 abut against the first legs 51. The combination of the pushers 32 and the first legs 51 allows the second guide rail 3 to accurately and quickly push the first legs 51 during movement, so as to drive the first placement roller 5 toward the second placement roller 6, to adapt to the adjusted distance between the second guide rail 3 and the first guide rail 2.

[0026] Specifically, each of the first placement roller 5 and the second placement roller 6 is provided with a pressure spring 52 and a follower rod 54 located inside the pressure spring 52. The end of the pressure spring 52 near the second placement roller 6 is abutted against it by a pad 53. Each of the second placement roller 6 is provided with a channel that can accommodate the follower rod 54. When the first placement roller 5 moves toward the second placement roller 6, the pressure spring 52 contracts and the follower rod 54 slides in the channel until the distance between the first placement roller 5 and the second placement roller 6 is reduced.

[0027] During the silicon wafer connection process, if the second guide rail 3 still needs to be reset, when the second guide rail 3 moves away from the first guide rail 2, the follower rod 54 can slide outward within the channel under the action of the pressure spring 52, and the first placement roller 5 moves away from the second placement roller 6. No manual adjustment is required throughout the process, offering the advantage of flexible adjustment. Therefore, the relative positions of the first placement roller 5 and the second placement roller 6 can be flexibly adjusted according to the distance between the first guide rail 2 and the second guide rail 3 to support the silicon wafer, maintain its stability, and reduce the time required for manual adjustment.

[0028] like Figure 4 As shown, each of the two limiting guide rails 7 has a set of limiting sleeves 71 embedded at one end near the first guide rail 2. The second support legs 61 abut against the limiting sleeves 71. A positioning guide rail 4 is fixed inside the frame 1. The two sets of limiting sleeves 71 on the two limiting guide rails 7 are slidably installed with the positioning guide rail 4. Before placing the silicon wafer, the limiting sleeves 71 on the two limiting guide rails 7 can be controlled to slide on the positioning guide rail 4, thereby adjusting the distance between the two first placement rollers 5 and the second placement roller 6.

[0029] After the spacing between the two first placement rollers 5 and the second placement rollers 6 is adjusted, it is adapted to smaller silicon wafers and maintains the stability of the silicon wafer when it is placed on the surface of the first placement rollers 5 and the second placement rollers 6 until the second guide rail 3 moves the first guide rail 2 to dock with the silicon wafer.

[0030] Example 2, as Figure 2 , Figure 3As shown, in the actual use of this utility model, in order to enable the second guide rail 3 to move smoothly in the direction of the first guide rail 2, a guide seat 31 is provided at the bottom of the second guide rail 3. A drive screw 33 and a handle that can drive the drive screw 33 to rotate are provided on the frame 1. The guide seat 31 is installed with the drive screw 33. The operator can control the rotation of the drive screw 33 by rotating the handle, so as to achieve the purpose of driving the guide seat 31 and the second guide rail 3 connected to it to move synchronously.

[0031] To maintain the stability of the guide seat 31 and the second guide rail 3 during movement, a limiting guide rod 34 is provided on the frame 1, which is parallel to the drive screw 33. The limiting guide rod 34 passes through the guide seat 31. When the guide seat 31 moves along the distribution direction of the limiting guide rod 34, the second guide rail 3 moves synchronously along the straight line to maintain its own stability during movement and improve the accuracy of the second guide rail 3 in the state of docking with the silicon wafer.

[0032] Finally, it should be noted that the above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Although the present utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.

Claims

1. A connecting platform for a quantum production workshop, comprising a frame (1), characterized in that: The frame (1) is provided with a first guide rail (2) and a movable second guide rail (3). Two parallel first placement rollers (5) are provided in the relative space between the first guide rail (2) and the second guide rail (3). A second placement roller (6) is provided on the side of the first placement roller (5) facing the first guide rail (2). When the second guide rail (3) moves toward the first guide rail (2), the silicon wafer can be placed on the surface of the two first placement rollers (5) and the second placement rollers (6) until the second guide rail (3) is in contact with the silicon wafer. The distance between the first placement roller (5) and the second placement roller (6) is adjustable. As the second guide rail (3) moves continuously, the first placement roller (5) can move toward the second placement roller (6) to adapt to the distance between the second guide rail (3) and the first guide rail (2) after adjustment.

2. The connecting platform for a quantum production workshop according to claim 1, characterized in that: The first placement roller (5) and the second placement roller (6) are respectively provided with a first support (51) and a second support (61) on one side. The first support (51) and the second support (61) are slidably installed on the same limiting guide rail (7). The two limiting guide rails (7) are in contact with the frame (1). When the first support (51) moves towards the second support (61) along the distribution direction of the limiting guide rail (7), the first placement roller (5) moves towards the second placement roller (6).

3. The connecting platform for a quantum production workshop according to claim 2, characterized in that: The second guide rail (3) has two pushers (32) at its bottom. When the second guide rail (3) moves toward the first guide rail (2), the two pushers (32) can move toward the two first legs (51) until the pushers (32) abut against the first legs (51).

4. The connecting platform for a quantum production workshop according to claim 3, characterized in that: The first placement roller (5) is provided with a pressure spring (52) and a follower rod (54) located inside the pressure spring (52) on the side facing the second placement roller (6). The end of the pressure spring (52) near the second placement roller (6) is abutted against it by a gasket (53). The second placement roller (6) is provided with a channel that can accommodate the follower rod (54). When the first placement roller (5) moves toward the second placement roller (6), the pressure spring (52) contracts and the follower rod (54) slides in the channel.

5. The connecting platform for a quantum production workshop according to claim 3, characterized in that: Each of the two limiting guide rails (7) is fitted with a set of limiting sleeves (71) at one end near the first guide rail (2). The second support (61) abuts against the limiting sleeves (71). The frame (1) is fixed with a positioning guide rail (4). The two sets of limiting sleeves (71) on the two limiting guide rails (7) are slidably installed with the positioning guide rail (4). When the two limiting guide rails (7) slide on the positioning guide rail (4), the distance between the two first placement rollers (5) and the second placement rollers (6) can be adjusted.

6. The connecting platform for a quantum production workshop according to claim 1, characterized in that: The second guide rail (3) is provided with a guide seat (31) at the bottom end. The frame (1) is provided with a drive screw (33) and a handle that can drive the drive screw (33) to rotate. The guide seat (31) is installed with the drive screw (33). The frame (1) is provided with a limiting guide rod (34) that is parallel to the drive screw (33). The limiting guide rod (34) passes through the guide seat (31). When the guide seat (31) moves along the distribution direction of the limiting guide rod (34), the second guide rail (3) moves synchronously.

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