Exposure machine with lateral auxiliary mechanism

Abstract

The utility model discloses an exposure machine with a lateral auxiliary mechanism, which comprises a motor, a ball screw, a ball spline guide shaft, a roller bearing, a lower substrate, a first movable bottom plate, a second movable bottom plate, a ball bowl assembly, an objective table and the lateral auxiliary mechanism, the outer surface of the auxiliary guide shaft and the limiting base are sequentially abutted against any side face of the upper base plate through the elastic plug column. According to the utility model, the elastic plunger provides a lateral force to prop against the ball spline guide shaft, so that the ball spline always has the lateral force, if a gap exists in the movement of the spline, the lateral force can keep the gap in a fixed direction, and when the spline moves from the height of an alignment surface to the height of an exposure surface, the gap can be kept in the fixed direction. The purpose of high-precision alignment of the exposure surface can be achieved by firstly moving the XY direction to compensate the gap in the reverse direction, the yield and the stability are improved, and the production quality is improved.

Description

Technical Field

[0001] This utility model belongs to the field of photolithography technology, specifically relating to an exposure machine with a lateral auxiliary mechanism. Background Technology

[0002] Proximity photolithography refers to maintaining a tiny gap, approximately 0–200 μm, between the photomask and the photoresist substrate. This effectively avoids damage to the photomask caused by direct contact with the photoresist, resulting in a more durable mask and photoresist substrate, longer mask lifespan (more than 10 times longer), and fewer pattern defects. Proximity photolithography is the most widely used technique in modern photolithography processes.

[0003] Because proximity mask exposure requires precise adjustment of the gap between the mask and the wafer, it places high demands on the precision of the stage. Furthermore, exposure typically requires multiple exposures, and the pattern from each exposure must be aligned with the next, a process known as overlay. The process of an overlay-error lithography machine is as follows: All fields on the silicon wafer are exposed one by one, i.e., step-by-step exposure, and then the wafer is replaced until all wafers have been exposed. After the wafer processing is complete, the mask is replaced, and then the second layer pattern is exposed on the wafer, i.e., repeated exposure. The pattern exposed by the second mask must be accurately superimposed with the pattern exposed by the first mask, hence the term overlay. Due to semiconductor processing requirements, many exposures need to be closer to the mask, which can lead to situations where the alignment surface (overlay alignment height) and the exposure surface are not at the same height. The principle of proximity lithography is that the closer the mask is to the wafer, the better the pattern reproduction. However, due to potential deformation or warping of the wafer, the alignment surface needs to be slightly distanced for relative movement; otherwise, the photoresist will stick to the mask, causing mask contamination or damage to the wafer surface. Therefore, the exposure surface is usually moved a small distance along the Z-axis after alignment, bringing the wafer closer to the mask or even flush with it.

[0004] Currently, proximity exposure machines primarily use a motor to drive a ball screw, which in turn moves the ball splines up and down. However, due to the inherent characteristics of ball splines, their precision is extremely high (0.5 to 1 micrometer level). During the movement (Z-axis), the ball splines may also experience very small drifts (0.5, 1, or 2 micrometers) in the X and Y axes. This can cause the wafers, which were originally aligned, to become misaligned on the exposure surface, resulting in deviations in the exposure results and reducing the yield.

[0005] Therefore, an exposure machine with a lateral auxiliary mechanism is urgently needed. Utility Model Content

[0006] To address the shortcomings of existing technologies, this invention provides an exposure machine with a lateral auxiliary mechanism.

[0007] To solve the above-mentioned technical problems, this utility model provides the following technical solution:

[0008] This utility model provides an exposure machine with a lateral auxiliary mechanism, including a motor, a ball screw, a ball spline guide shaft, a roller bearing, a lower base plate, a first movable base plate, a second movable base plate, a ball cup assembly, a stage, and a lateral auxiliary mechanism. The first movable base plate is movable on the lower base plate along a first linear direction, and the second movable base plate is movable on the first movable base plate along a second linear direction. The roller bearing is mounted on the second movable base plate via a bearing seat. The motor is mounted on the bottom of the bearing seat via a motor seat. The lower end of the ball screw is connected to the output shaft of the motor. The ball spline guide shaft is installed in the roller bearing and is sleeved on the ball screw, with its inner wall connected to the nut of the ball screw. The upper end of the ball spline guide shaft is connected to the upper base plate. The ball cup assembly is mounted on the upper base plate via a leveling support block, and the stage is mounted on the ball cup assembly.

[0009] The lateral auxiliary mechanism includes a limiting shaft mounting bracket, a limiting seat, an auxiliary guide shaft, and an elastic plunger. The limiting shaft mounting bracket is mounted on the upper end face of the roller bearing. The limiting seat is mounted on the limiting shaft mounting bracket. The lower end of the auxiliary guide shaft is mounted on the limiting shaft mounting bracket. The elastic plunger is mounted on the limiting seat and sequentially abuts the outer surface of the auxiliary guide shaft and the limiting seat against any side of the upper base plate.

[0010] Preferably, the limiting seat includes a limiting mounting plate, a limiting baffle, and a limiting boss. The limiting baffle is disposed on the limiting mounting plate and the two are arranged in an L-shape. The limiting mounting plate is mounted on a limiting shaft mounting bracket. The limiting boss is disposed on the limiting mounting plate and has a limiting groove. The limiting groove communicates with a limiting shaft mounting hole on the limiting shaft mounting plate, and the side of the limiting groove is open.

[0011] Preferably, the elastic plunger includes a plunger mounting base, a plunger rod, a roller, and a positioning pin. The plunger mounting base is mounted on the limiting mounting plate and located outside the opening of the limiting groove. The plunger rod passes through the plunger mounting base and is fastened by the positioning pin. The roller is rotatably mounted on the plunger rod.

[0012] Preferably, a stage baffle is also provided, which is disposed on the upper substrate and located on the outer side of the stage in the circumferential direction.

[0013] Preferably, the ball bowl assembly includes a ball bowl mounting plate, a hemispherical bowl, a hemisphere, and a hemispherical connecting plate. The ball bowl mounting plate is mounted on a leveling support block, the hemispherical bowl is mounted on the ball bowl mounting plate, the hemisphere is disposed in the hemispherical bowl, and the platform is connected to the hemisphere through the hemispherical connecting plate.

[0014] Preferably, a left-side locking mechanism is also provided, which includes two left-side locking cylinders mounted on the upper base plate. The two left-side locking cylinders are provided with a left-side locking shaft. A left-side locking nut is provided on the outer surface of the left-side locking shaft. A left-side compression spring is sleeved on the left-side locking shaft. A left-side top block is provided on the top of the left-side locking shaft. The left-side locking shaft is connected to the ball cup mounting plate through a left-side auxiliary leveling micro-head fixing component. The left-side top block is connected to the stage.

[0015] Preferably, a right-side locking mechanism is also provided, which includes a right-side locking cylinder and two round-headed side locks. The right-side locking cylinder is mounted on the upper base plate, and a right-side locking shaft is provided on the right-side locking cylinder. A right-side compression spring is sleeved on the right-side locking shaft, and a right-side top block is provided on the top of the right-side locking shaft. The right-side top block is connected to the stage. The two round-headed side locks are connected to the ball cup mounting plate through a right-side auxiliary leveling micro-head fixing component, and the tops of the two round-headed side locks are supported on the bottom of the stage.

[0016] Preferably, a pin mounting plate is also provided, which is mounted below the ball cup mounting plate by a spring nylon plunger.

[0017] Preferably, an anti-rotation mechanism is also provided, which includes an anti-rotation pin mounting block, a horizontal cylindrical pin, and two vertical cylindrical pins. The anti-rotation pin mounting block is L-shaped. The two vertical cylindrical pins are vertically mounted on the ball cup mounting plate with a gap between them. The horizontal cylindrical pin is mounted on the outer surface of the anti-rotation pin mounting block and is engaged between the two vertical cylindrical pins. The anti-rotation pin mounting block is also connected to the platform by screws.

[0018] Compared with the prior art, this utility model has the following advantages:

[0019] In this invention, the elastic plug provides a lateral force that presses against the ball spline guide shaft, ensuring that the ball spline always has a lateral force. If there is a gap in the movement of the spline itself, this lateral force can keep the gap in a fixed direction. Therefore, when moving from the alignment surface height to the exposure surface height, the gap can be compensated in the opposite direction by first moving in the XY direction, achieving high-precision alignment of the exposure surface, increasing yield, stability, and improving production quality. Attached Figure Description

[0020] Figure 1 This is a schematic diagram of the overall structure of an exposure machine with a lateral auxiliary mechanism according to the present invention;

[0021] Figure 2 This is a schematic diagram of the motor mounting structure in an exposure machine with a lateral auxiliary mechanism according to this utility model;

[0022] Figure 3 This is a schematic diagram of the structure of the lateral auxiliary mechanism in an exposure machine with a lateral auxiliary mechanism according to the present invention;

[0023] Figure 4 This is a schematic diagram of the structure of an elastic plug in an exposure machine with a lateral auxiliary mechanism according to this utility model;

[0024] Figure 5 This is a schematic diagram of the ball cup assembly in an exposure machine with a lateral auxiliary mechanism according to this utility model. Detailed Implementation

[0025] The preferred embodiments of the present invention will be described below with reference to the accompanying drawings. It should be understood that the preferred embodiments described herein are for illustration and explanation only and are not intended to limit the present invention.

[0026] In the description of this utility model, it should be understood that the terms "upper," "lower," "left," "right," etc., indicating the orientation or positional relationship are all based on the accompanying drawings. Figure 1 The orientations or positional relationships shown are for the convenience of describing this utility model and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model.

[0027] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a direct connection or an indirect connection through an intermediate medium. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0028] like Figures 1 to 5As shown, this embodiment provides an exposure machine with a lateral auxiliary mechanism, including a motor 1, a ball screw 2, a ball spline guide shaft 3, a roller bearing 4, a lower substrate 50, a first movable base plate 51, a second movable base plate 52, an upper substrate 53, a ball cup assembly 6, a stage 7, and a lateral auxiliary mechanism 8. The first movable base plate 51 is mounted on the lower substrate 50 via a linear guide rail along a first linear direction, and the second movable base plate 52 is mounted on the first movable base plate 51 via a linear guide rail along a second linear direction. The first linear direction is the X direction, the second linear direction is the Y direction, and the X and Y directions are horizontal and perpendicular. The roller bearing 4 is mounted on the second movable base plate 52 via bearing housing 41. The motor 1 is mounted on the bottom of bearing housing 41 via motor housing 11. The lower end of the screw of the ball screw 2 is connected to the output shaft of the motor. The ball spline guide shaft 3 is mounted in the roller bearing 4. The ball spline guide shaft 3 is sleeved on the ball screw 2 and its inner wall is connected to the nut of the ball screw 2. The upper end of the ball spline guide shaft 3 is connected to the upper base plate 53. The ball cup assembly 6 is mounted on the upper base plate 53 via leveling support block 61. The stage 7 is mounted on the ball cup assembly 6.

[0029] like Figures 1 to 4 As shown, the lateral auxiliary mechanism 8 includes a limiting shaft mounting bracket 80, a limiting seat 81, an auxiliary guide shaft 82, and an elastic plunger 83. The limiting shaft mounting bracket 80 is mounted on the upper end face of the roller bearing 4. The limiting seat 81 is mounted on the limiting shaft mounting bracket 80. The lower end of the auxiliary guide shaft 82 is mounted on the limiting shaft mounting bracket 80. The elastic plunger 83 is mounted on the limiting seat 81 and the outer surface of the auxiliary guide shaft 82 and the limiting seat 81 are sequentially pressed against the right side face of the upper base plate 53.

[0030] Specifically, the limiting seat 81 includes a limiting mounting plate 810, a limiting baffle 811, and a limiting boss 812. The limiting baffle 811 is disposed on the limiting mounting plate 810 and the two are arranged in an L-shape. The limiting mounting plate 810 is mounted on the limiting shaft mounting bracket 80. The limiting boss 812 is disposed on the limiting mounting plate 810 and is provided with a limiting groove. The limiting groove communicates with the limiting shaft mounting hole on the limiting shaft mounting plate, and the side of the limiting groove is open.

[0031] Specifically, the elastic plunger 83 includes a plunger mounting base 830, a plunger rod 831, a roller 832, and a positioning pin 833. The plunger mounting base 830 is mounted on the limiting mounting plate 810 and is located outside the opening of the limiting groove. The plunger rod 831 passes through the plunger mounting base 830, and a compression spring is provided between its end and the plunger mounting base 830. The circumferential surface of the plunger rod 831 is also fastened by the positioning pin 833. The roller 832 is rotatably mounted on the plunger rod 831.

[0032] like Figure 1 As shown, a stage baffle 71 is also provided, which is disposed on the upper substrate 53 and located on the outer side of the stage in the circumferential direction.

[0033] like Figure 5 As shown, the ball bowl assembly 6 includes a ball bowl mounting plate 60, a hemispherical bowl 62, a hemisphere, and a hemispherical connecting plate. The ball bowl mounting plate 60 is mounted on the leveling support block 61, the hemispherical bowl 62 is mounted on the ball bowl mounting plate 60, and the hemisphere is disposed in the hemispherical bowl 62. The platform 7 is connected to the hemisphere through the hemispherical connecting plate.

[0034] like Figure 5 As shown, a left-side locking mechanism is also provided. The left-side locking mechanism includes two left-side locking cylinders 91 mounted on the upper base plate 53. The two left-side locking cylinders 91 are provided with a left-side locking shaft 92. A left-side locking nut 93 is provided on the outer surface of the left-side locking shaft 92. A left-side compression spring is sleeved on the left-side locking shaft 92. A left-side top block 94 is provided on the top of the left-side locking shaft 92. The left-side locking shaft 92 is connected to the ball cup mounting plate 60 through a left-side auxiliary leveling micro-head fixing part 90. The left-side top block 94 is connected to the stage 7.

[0035] like Figure 5 As shown, a right-side locking mechanism is also provided, which includes a right-side locking cylinder 101 and two round-headed side locks 103. The right-side locking cylinder 101 is mounted on the upper base plate 53. A right-side locking shaft 102 is provided on the right-side locking cylinder 101. A right-side compression spring is sleeved on the right-side locking shaft 102. A right-side top block 104 is provided on the top of the right-side locking shaft 102. The right-side top block 104 is connected to the stage 7. The two round-headed side locks 103 are connected to the ball cup mounting plate 60 through a right-side auxiliary leveling micro-head fixing part 100. The tops of the two round-headed side locks 103 are supported on the bottom of the stage 7.

[0036] like Figure 5 As shown, a pin mounting plate 63 is also provided, which is mounted below the ball cup mounting plate 60 via a spring nylon plunger 64.

[0037] like Figure 5 As shown, an anti-rotation mechanism is also provided, which includes an anti-rotation pin mounting block 65, a horizontal cylindrical pin 66, and two vertical cylindrical pins 67. The anti-rotation pin mounting block 65 is L-shaped. The two vertical cylindrical pins 67 are vertically mounted on the ball cup mounting plate 60 with a gap between them. The horizontal cylindrical pin 66 is mounted on the outer surface of the anti-rotation pin mounting block and is engaged between the two vertical cylindrical pins 67. The anti-rotation pin mounting block 65 is also connected to the platform 7 by screws.

[0038] The working principle of this embodiment will be further explained below:

[0039] The motor drives the ball screw to rotate via a coupling, causing the ball screw nut to move up and down, which in turn moves the ball spline guide shaft up and down. An elastic plunger provides a lateral force, holding the ball spline guide shaft in place, ensuring the ball spline always has a lateral force. If there is backlash in the spline's movement, this lateral force keeps the backlash in a fixed direction. Therefore, when moving from the alignment surface height to the exposure surface height, this backlash can be compensated for in the opposite direction by first moving in the XY direction, achieving high-precision alignment of the exposure surface, increasing yield, stability, and improving production quality.

[0040] Finally, it should be noted that the above description is merely a preferred embodiment of this utility model and is not intended to limit the utility model. Although the utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this utility model should be included within the protection scope of this utility model.

Claims

1. An exposure machine with a lateral auxiliary mechanism, characterized in that, The system includes a motor (1), a ball screw (2), a ball spline guide shaft (3), a roller bearing (4), a lower base plate (50), a first movable base plate (51), a second movable base plate (52), an upper base plate (53), a ball cup assembly (6), a stage (7), and a lateral auxiliary mechanism (8). The first movable base plate (51) is movable on the lower base plate (50) along a first linear direction, and the second movable base plate (52) is movable on the first movable base plate (51) along a second linear direction. The roller bearing (4) is mounted on the second movable base plate (52) via a bearing seat (41). The motor (1) is mounted on the bottom of the bearing seat (41) via the motor seat (11). The lower end of the screw of the ball screw (2) is connected to the output shaft of the motor. The ball spline guide shaft (3) is mounted in the roller bearing (4). The ball spline guide shaft (3) is sleeved on the ball screw (2) and its inner wall is connected to the nut of the ball screw (2). The upper end of the ball spline guide shaft (3) is connected to the upper base plate (53). The ball cup assembly (6) is mounted on the upper base plate (53) via the leveling support block (61). The stage (7) is mounted on the ball cup assembly (6). The lateral auxiliary mechanism (8) includes a limiting shaft mounting bracket (80), a limiting seat (81), an auxiliary guide shaft (82), and an elastic plunger (83). The limiting shaft mounting bracket (80) is mounted on the upper end face of the roller bearing (4). The limiting seat (81) is mounted on the limiting shaft mounting bracket (80). The lower end of the auxiliary guide shaft (82) is mounted on the limiting shaft mounting bracket (80). The elastic plunger (83) is mounted on the limiting seat (81) and the outer surface of the auxiliary guide shaft (82) and the limiting seat (81) are sequentially pressed against any side of the upper base plate (53).

2. The exposure machine with a lateral assist mechanism according to claim 1, characterized in that, The limiting seat (81) includes a limiting mounting plate (810), a limiting baffle (811), and a limiting boss (812). The limiting baffle (811) is disposed on the limiting mounting plate (810) and the two are arranged in an L-shape. The limiting mounting plate (810) is mounted on the limiting shaft mounting bracket (80). The limiting boss (812) is disposed on the limiting mounting plate (810). The limiting boss (812) is provided with a limiting groove. The limiting groove is connected to the limiting shaft mounting hole on the limiting shaft mounting plate. The side of the limiting groove is open.

3. The exposure machine with a lateral assist mechanism according to claim 2, characterized in that, The elastic plunger (83) includes a plunger mounting seat (830), a plunger rod (831), a roller (832), and a positioning pin (833). The plunger mounting seat (830) is mounted on the limiting mounting plate (810) and located outside the opening of the limiting groove. The plunger rod (831) passes through the plunger mounting seat (830) and is fastened by the positioning pin (833). The roller (832) is rotatably mounted on the plunger rod (831).

4. The exposure machine with a lateral assist mechanism according to claim 3, characterized in that, It also includes a stage baffle (71), which is disposed on the upper substrate (53) and located on the outer side of the stage in the circumferential direction.

5. The exposure apparatus having a side auxiliary mechanism according to claim 4, wherein The ball bowl assembly (6) includes a ball bowl mounting plate (60), a hemispherical bowl (62), a hemisphere, and a hemispherical connecting plate. The ball bowl mounting plate (60) is mounted on a leveling support block (61), the hemispherical bowl (62) is mounted on the ball bowl mounting plate (60), and the hemisphere is disposed in the hemispherical bowl (62). The platform (7) is connected to the hemisphere through the hemispherical connecting plate.

6. The exposure machine with a lateral assist mechanism according to claim 5, characterized in that, A left-side locking mechanism is also provided, which includes two left-side locking cylinders (91) mounted on the upper base plate (53). The two left-side locking cylinders (91) are provided with a left-side locking shaft (92). A left-side locking nut (93) is provided on the outer surface of the left-side locking shaft (92). A left-side compression spring is sleeved on the left-side locking shaft (92). A left-side top block (94) is provided on the top of the left-side locking shaft (92). The left-side locking shaft (92) is connected to the ball cup mounting plate (60) through the left-side auxiliary leveling micro-head fixing part (90). The left-side top block (94) is connected to the stage (7).

7. The exposure machine with a lateral assist mechanism according to claim 6, characterized in that, A right-side locking mechanism is also provided, which includes a right-side locking cylinder (101) and two round-headed side locks (103). The right-side locking cylinder (101) is mounted on the upper base plate (53). The right-side locking cylinder (101) is provided with a right-side locking shaft (102). A right-side compression spring is sleeved on the right-side locking shaft (102). A right-side top block (104) is provided on the top of the right-side locking shaft (102). The right-side top block (104) is connected to the stage (7). The two round-headed side locks (103) are connected to the ball cup mounting plate (60) through the right-side auxiliary leveling micro-head fixing part (100). The top of the two round-headed side locks (103) is supported on the bottom of the stage (7).

8. The exposure machine with a lateral auxiliary mechanism according to claim 7, characterized in that, It also includes a ejector pin mounting plate (63), which is mounted below the ball cup mounting plate (60) via a spring nylon plunger (64).

9. The exposure machine with a lateral assist mechanism according to claim 8, characterized in that, An anti-rotation mechanism is also provided, which includes an anti-rotation pin mounting block (65), a horizontal cylindrical pin (66), and two vertical cylindrical pins (67). The anti-rotation pin mounting block (65) is L-shaped. The two vertical cylindrical pins (67) are vertically mounted on the ball cup mounting plate (60) with a gap between them. The horizontal cylindrical pin (66) is mounted on the outer surface of the anti-rotation pin mounting block and is locked between the two vertical cylindrical pins (67). The anti-rotation pin mounting block (65) is also connected to the platform (7) by screws.

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