Heavy hammer storage device for monocrystalline silicon production
By designing a weight storage device for monocrystalline silicon production, and utilizing the lifting structure of the inclined placement chamber and support platform, the problem of inconvenient storage of the weight, graphite chuck, and seed crystal assembly is solved, achieving simple retrieval and efficient dust management, which is suitable for monocrystalline silicon production processes.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- ORDOS ZHONGCHENGYU ENERGY CO LTD
- Filing Date
- 2025-05-29
- Publication Date
- 2026-04-24
AI Technical Summary
In the existing technology, the assembly of the weight, graphite chuck and seed crystal is inconvenient to operate during storage and retrieval, making it difficult to achieve simple and convenient storage and retrieval.
A weight storage device for monocrystalline silicon production was designed, including an inclined placement chamber and a support structure. The lifting and lowering of the support platform enables the inclined placement and easy removal of the assembly of the weight, graphite chuck and seed crystal. The design of the graphite inner liner ring facilitates the positioning and detachment of the assembly.
It enables centralized storage of the hammer, graphite chuck, and seed crystal assembly, making the retrieval and placement process simple and convenient. It is suitable for cooling high-temperature assemblies and dust management, thus improving operational efficiency.
Smart Images

Figure CN224160737U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of monocrystalline silicon production equipment, and in particular to a weight storage device for monocrystalline silicon production. Background Technology
[0002] In monocrystalline silicon production, the weight, graphite chuck, and seed crystal are used as a single assembly. This assembly needs to be removed and stored on a separate fixture during production. Existing technology, such as Chinese patent application CN214612843U, discloses a fixture for placing the weight and graphite chuck in a monocrystalline furnace. This fixture uses a set of longitudinally arranged fixing rings to secure the graphite chuck and weight. When removing the assembly, the fixture needs to lift it upwards until the graphite chuck detaches from the top fixing ring. This process is inconvenient. Summary of the Invention
[0003] The purpose of this invention is to provide a weight storage device for monocrystalline silicon production, used for storing weights. The technical solution adopted by this invention is as follows:
[0004] This utility model provides a weight storage device for monocrystalline silicon production, including a cabinet with a placement chamber at the front. The back plate of the placement chamber is tilted backward. A graphite chuck support and at least one weight support are provided on the back plate. The graphite chuck support includes a first support plate with multiple first placement holes, the front of which is connected to a trapezoidal notch. A frustum-shaped first graphite inner ring is embedded in the first placement hole, with a conical through hole in the center of the first graphite inner ring. A seed crystal placement notch is formed at the position of the trapezoidal notch on the first graphite inner ring. The weight support includes a second support plate with multiple second placement holes. Each second placement hole corresponds to one of the first placement holes above it and is coaxial. A semi-circular annular second graphite inner ring is embedded in each second placement hole. Multiple liftable support platforms are provided on the bottom plate of the placement chamber, each support platform corresponding to one of the first and second placement holes above it. A graphite disk is provided on the top surface of the support platform.
[0005] The beneficial effects of this utility model are as follows: This utility model provides a weight storage device for monocrystalline silicon production. The assembly of the weight, graphite chuck, and seed crystal is placed at an angle in the second placement hole of the weight support body, with the bottom end of the weight supported by a support platform. At this time, the seed crystal has passed through the trapezoidal notch and the seed crystal placement notch and is located inside the first graphite inner ring. However, the graphite chuck is still located below the first graphite inner ring. Then, the support platform is raised, lifting the assembly upwards until the graphite chuck enters the first graphite inner ring. This completes the placement process. For removal, the support platform is lowered, and the assembly moves downwards until the graphite chuck detaches from the first graphite inner ring. This device can be used for centralized storage of the assembly of the weight, graphite chuck, and seed crystal, and the retrieval process is simple and convenient. Attached Figure Description
[0006] Figure 1 The figure shown is a three-dimensional structural representation of the storage device provided in an embodiment of this application. Figure 1 .
[0007] Figure 2 The figure shown is a three-dimensional structural representation of the storage device provided in an embodiment of this application. Figure 2 .
[0008] Figure 3 The image shown is a side view of the storage device provided in an embodiment of this application.
[0009] Figure 4 The diagram shown is a partial structural view of the first placement hole in an embodiment of this application.
[0010] Figure 5 The diagram shown is a partial structural representation of the second placement hole according to an embodiment of this application.
[0011] Figure 6 The diagram shown is a structural illustration of an improved graphite disk provided in an embodiment of this application.
[0012] Figure 7 The figure shown is a three-dimensional structural representation of an improved storage device according to this application. Figure 1 .
[0013] Figure 8 The figure shown is a three-dimensional structural representation of an improved storage device according to this application. Figure 2 .
[0014] Figure 9 The diagram shown is an internal structure illustration of the hinged door panel in an embodiment of this application.
[0015] Figure 10 The figure shown is a three-dimensional structural diagram of the ash collection box provided in an embodiment of this application.
[0016] Figure 11The diagram shown is a partial structural view of the third limiting hole in an embodiment of this application.
[0017] Figure 12 The diagram shown is a schematic of the third graphite inner lining ring surrounding the weight in this application.
[0018] Explanation of reference numerals in the attached drawings: Cabinet 1, placement chamber 101, back panel 102, bottom plate 103, ash discharge port 104, ash discharge space 105, rear back panel 106; Assembly 2, counterweight 201, graphite chuck 202, seed crystal 203; Graphite chuck support 3, first support plate 301, first placement hole 302, trapezoidal notch 303, first graphite inner lining ring 304, conical through hole 305, seed crystal placement notch 306; Counterweight support 4, second support plate 401 Second placement hole 402, second graphite inner lining ring 403; support platform 5, graphite disc 6, stop part 601; swing door panel 7, hinge 8, rotary joint 9, air supply duct 10, air outlet 1001, hose 11, air cooler 12, air outlet louver 13; dust collection box 14, air outlet 1401, grille plate 15, prism 1501; counterweight limit body 16, third support plate 1601, third limit hole 1602, third graphite inner lining ring 1603, baffle 1604. Detailed Implementation
[0019] The embodiments of this utility model are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this utility model, and should not be construed as limiting this utility model.
[0020] In the description of this utility model, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this utility model and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model.
[0021] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this utility model, unless otherwise stated, "a plurality of" means two or more.
[0022] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.
[0023] This application provides a hammer storage device for monocrystalline silicon production. See [link to relevant documentation]. Figure 1 The figure shown is a three-dimensional structural representation of the storage device provided in an embodiment of this application. Figure 1 . Figure 2 The figure shown is a three-dimensional structural representation of the storage device provided in an embodiment of this application. Figure 2 .in, Figure 1 The storage device is in the state where assembly 2 is placed. Figure 2 The storage device is in a state where assembly 2 is not placed. Figure 3 The image shown is a side view of the storage device provided in an embodiment of this application.
[0024] like Figures 1 to 3 As shown in the figure, the storage device of this application mainly includes a cabinet 1, and a storage chamber 101 is provided in front of the cabinet 1; Figure 3 In the illustrated embodiment, the placement chamber 101 is a rearward-inclined cuboid space, enclosed by five plates: top, bottom, left, right, and back plate 102. The back plate 102 of the placement chamber 101 is angled rearward. The counterweight 201, graphite chuck 202, and seed crystal 203 are assembled as a single unit 2, placed at an angle on the support structure of the placement chamber 101. During placement, the seed crystal 203 faces upward. Figure 2 As shown, the support structure within the placement chamber 101 includes: a graphite chuck support 3 and at least one counterweight support 4. The graphite chuck support 3 is positioned above the counterweight support 4. In the embodiment shown, two counterweight supports 4 are arranged parallel to each other below the graphite chuck support 3. The graphite chuck support 3 is used to clamp and fix the graphite chuck 202, and the counterweight support 4 is used to support the counterweight 201. Figure 3 As shown, the graphite chuck support 3 and the counterweight support 4 are perpendicular to the back plate 102 of the placement chamber 101. The graphite chuck support 3 has the following structure: the graphite chuck support 3 includes a first support plate 301, which is connected to the inner wall of the placement chamber 101. The first support plate 301 is provided with a plurality of first placement holes 302. Figure 2 In the illustrated embodiment, five first placement holes 302 are equidistantly arranged on the first support plate 301. For example... Figure 4The diagram shown is a partial structural representation of the first placement hole 302 according to an embodiment of this application. The first placement hole 302 is a circular through hole, and a trapezoidal notch 303 is connected to the front side of the first placement hole 302. The trapezoidal notch 303 extends to the front edge of the first support plate 301, forming a through opening structure. The connection between the trapezoidal notch 303 and the first placement hole 302 is narrower than the opening width of the trapezoidal notch 303 at the front edge of the first support plate 301. A frustum-shaped first graphite inner liner ring 304 is embedded in the first placement hole 302. A conical through hole 305 is formed in the center of the first graphite inner liner ring 304. The size of the conical through hole 305 matches the shape of the graphite chuck 202, and the conical through hole 305 can accommodate the graphite chuck 202. In addition, a seed crystal placement notch 306 is formed at the position of the trapezoidal notch 303 in the first graphite inner liner ring 304. The seed crystal placement notch 306 is used for the seed crystal 203 to pass through directly during the placement and removal process.
[0025] The structure of the counterweight support 4 is as follows: The counterweight support 4 includes a second support plate 401, which is connected to the inner wall of the placement chamber 101. The second support plate 401 is provided with a plurality of second placement holes 402. Figure 2 In the illustrated embodiment, five second placement holes 402 are equidistantly arranged on the second support plate 401. The second placement holes 402 on the second support plate 401 correspond one-to-one with the first placement holes 302 on the first support plate 301 above it, and are coaxial. Figure 5 The diagram shown is a partial structural representation of the second placement hole 402 in an embodiment of this application. In one specific embodiment, the width of the second support plate 401 is half the width of the first support plate 301. A semi-circular second placement hole 402 is formed on the front edge of the second support plate 401; that is, the second placement hole 402 is a semi-circular notch located on the front edge of the second support plate 401, and its axis is collinear with the axis of the first placement hole 302 directly above it. A semi-circular annular second graphite inner liner ring 403 is embedded within the second placement hole 402. The second graphite inner liner ring 403 is used to support the side of the counterweight 201. Figure 1 As shown in the figure, in this embodiment, the weight 201 is supported by two parallel weight support bodies 4.
[0026] like Figure 1 As shown, a plurality of liftable support platforms 5 are provided on the lower base plate 103 of the placement chamber 101, each support platform 5 corresponding to the first placement hole 302 and the second placement hole 402 above it. The support platforms 5 can be lifted and lowered by hydraulic drive or mechanical drive, and this application does not limit this. The lifting and lowering of each support platform 5 is controlled independently. In addition, a circular graphite disk 6 is provided on the top surface of the support platform 5.
[0027] Reference Figure 1The method of using the storage device described in this application is as follows: First, the assembly 2 consisting of the hammer 201, graphite chuck 202, and seed crystal 203 is placed at an angle in the second placement hole 402 of the hammer support 4, with the bottom end of the hammer 201 supported by the support platform 5. At this time, the seed crystal 203 has passed through the trapezoidal notch 303 and the seed crystal placement notch 306 and is located inside the first graphite inner ring 304; however, the graphite chuck 202 is still located below the first graphite inner ring 304. Then, the support platform 5 is raised to lift the assembly 2 upwards until the graphite chuck 202 enters the first graphite inner ring 304. This completes the placement process. When removing the assembly, the support platform 5 is lowered, and the assembly 2 moves downwards until the graphite chuck 202 disengages from the first graphite inner ring 304. This device can be used for centralized storage of the assembly 2 consisting of the hammer 201, graphite chuck 202, and seed crystal 203, and the retrieval process is simple and convenient.
[0028] Furthermore, the graphite disk 6 on the support platform 5 mentioned above can be improved to... Figure 6 The shape in the middle. Figure 6 The diagram shown is a structural illustration of an improved graphite disk 6 provided in an embodiment of this application. A semi-circular annular stop portion 601 is formed on the rear side of the upper surface of the graphite disk 6, and the stop portion 601 protrudes from the upper surface of the graphite disk 6. During placement, the bottom end of the counterweight 201 can first rest against the groove formed by the stop portion 601, and then the assembly 2 is tilted against the counterweight support 4.
[0029] The storage device described above in this application can be further improved to place the high-temperature assembly 2 disassembled from the single crystal furnace and to cool it down; the specific scheme is as follows.
[0030] like Figure 7 The figure shown is a three-dimensional structural representation of an improved storage device according to this application. Figure 1 . Figure 8 The figure shown is a three-dimensional structural representation of an improved storage device according to this application. Figure 2 As shown in the figure, an openable door panel is provided on the front side of the placement chamber 101; in the embodiment shown, the door panel is a double door, consisting of two hinged door panels 7. The side edges of each hinged door panel 7 are rotatably connected to the cabinet body 1 via hinges 8. A swivel joint 9 is provided on the top of the hinged door panel 7, near the hinge 8. Figure 9 The diagram shown is an internal structure illustration of the hinged door panel 7 in an embodiment of this application. An air supply duct 10 extending along the length of the door panel is provided on one side inside the hinged door panel 7. Figure 9The central air supply duct 10 is located on one side of the rotary joint 9. The air supply duct 10 has a rectangular cross-section, and its top end is connected to one end of the rotary joint 9. An air outlet 1001 is provided on the side of the air supply duct 10 along its length. The other end of the rotary joint 9 is connected to the air cooler 12 via a flexible hose 11. The air cooler 12 can be installed on the ground or on the cabinet 1. Figure 9 In the illustrated embodiment, the air cooler 12 is mounted on the top of the cabinet 1. An air outlet is located on the side of the mounting chamber 101 of the hinged door panel 7, and air outlet louvers 13 are installed inside the air outlet. The air outlet covers most of the area of the mounting chamber 101, enabling it to cool all the assemblies within the mounting chamber 101.
[0031] Furthermore, such as Figure 8 As shown, the back panel 102 of the cabinet 1 is provided with multiple strip-shaped ash discharge ports 104; one ash discharge port 104 corresponds to the rear edge of the bottom plate 103; and one ash discharge port 104 corresponds to the rear edge of the first support plate 301 and the second support plate 401, respectively. A ash discharge space 105 is formed behind the back panel 102 of the cabinet 1, and a cuboid-shaped ash collection box 14 is provided at the bottom of the ash discharge space 105. The ash collection box 14 can be pulled out from the bottom opening of the back panel 106 of the cabinet 1. Figure 10 The diagram shows a three-dimensional view of the dust collection box 14 provided in this embodiment. The dust collection box 14 is a rectangular box with an opening at the top to collect falling dust. A detachable grid plate 15 is placed inside the dust collection box 14. The grid plate 15 has elongated slits through which dust falls into the dust collection box 14. Between adjacent elongated slits is a triangular prism 1501 with the pointed corners facing upwards and the sides being beveled. The grid plate 15 is used to suppress dust from being stirred up inside the dust collection box 14. In addition, an air outlet 1401 is provided on the side of the dust collection box 14. The air outlet 1401 is covered by a filter screen. Air inside the cabinet 1 is discharged through the filter screen, while dust remains inside the dust collection box 14.
[0032] Furthermore, to further secure the counterweight 201, in one specific embodiment of this application, a counterweight limiting body 16 is provided on the counterweight support 4. For example... Figure 11 As shown, the counterweight limiting body 16 includes a third support plate 1601, which is connected to the inner wall of the placement chamber 101 and located on the upper surface of the second support plate 401. The third support plate 1601 has a plurality of third limiting holes 1602. The number of third limiting holes 1602 is the same as the number of second placement holes 402 on the second support plate 401, and they correspond one-to-one. Figure 2 In the embodiment shown, five third limiting holes 1602 are equidistantly arranged on the third support plate 1601.
[0033] like Figure 11The diagram shown is a partial structural view of the third limiting hole 1602 in an embodiment of this application. In one specific embodiment of this application, the width of the third support plate 1601 is the same as the width of the second support plate 401, and they are stacked together. A semi-circular third limiting hole 1602 is formed on the front edge of the third support plate 1601. That is, the third limiting hole 1602 is a semi-circular notch located on the front edge of the third support plate 1601, and its axis is on the same straight line as the axis of the second placement hole 402 directly below it. A third graphite inner liner ring 1603 that can rotate around the axis is embedded in the third limiting hole 1602. The third graphite inner liner ring 1603 is semi-circular and its central hole diameter is larger than the central hole diameter of the second graphite inner liner ring 403. When the side of the hammer 201 rests against the inner wall of the second graphite inner ring 403, a gap remains between the side of the hammer 201 and the inner wall of the third graphite inner ring 1603. Rotating the third graphite inner ring 1603 causes it to surround and encircle the hammer 201. Figure 12 The diagram shown is a schematic of the third graphite inner lining ring 1603 surrounding the weight 201 in this application. By surrounding the weight 201 with three graphite inner lining rings, the weight 201 is limited and prevented from falling.
[0034] Furthermore, in order to allow the third graphite inner ring 1603 to rotate back to its original position, a baffle 1604 is provided at the left opening position of the third limiting hole 1602. When the third graphite inner ring 1603 returns to its original position, the left side of the third graphite inner ring 1603 abuts against the baffle 1604.
[0035] It is understood that this utility model has been described through some embodiments, and those skilled in the art will recognize that various changes or equivalent substitutions can be made to these features and embodiments without departing from the spirit and scope of this utility model. Furthermore, under the teachings of this utility model, these features and embodiments can be modified to adapt to specific situations and materials without departing from the spirit and scope of this utility model. Therefore, this utility model is not limited to the specific embodiments disclosed herein, and all embodiments falling within the scope of the claims of this application are within the protection scope of this utility model.
Claims
1. A weight storage device for monocrystalline silicon production, characterized in that, Includes a cabinet (1), with a placement chamber (101) at the front of the cabinet (1); the back plate (102) of the placement chamber (101) is tilted backward; a graphite chuck support (3) and at least one counterweight support (4) are provided on the back plate (102); the graphite chuck support (3) includes a first support plate (301), with multiple first placement holes (302) provided on the first support plate (301), and a trapezoidal notch (303) connecting the front side of the first placement hole (302); a frustum-shaped first graphite inner ring (304) is embedded in the first placement hole (302), and a conical through hole (305) is formed in the center of the first graphite inner ring (304). 4) A seed crystal placement notch (306) is opened at the trapezoidal notch (303); the weight support body (4) includes a second support plate (401), and a plurality of second placement holes (402) are provided on the second support plate (401); the second placement holes (402) correspond one-to-one with the first placement holes (302) above them and are coaxial; a semi-circular annular second graphite inner lining ring (403) is embedded in the second placement hole (402); a plurality of lifting support platforms (5) are provided on the bottom plate (103) of the placement chamber (101), and each support platform (5) corresponds to the first placement hole (302) and the second placement hole (402) above it; a graphite disk (6) is provided on the top surface of the support platform (5).
2. The weight storage device for monocrystalline silicon production according to claim 1, characterized in that, The support platform (5) is raised and lowered by hydraulic drive or by mechanical drive.
3. The weight storage device for monocrystalline silicon production according to claim 1, characterized in that, A semi-circular stop (601) is formed on the rear side of the upper surface of the graphite disk (6), and the stop (601) protrudes from the upper surface of the graphite disk (6).
4. The weight storage device for monocrystalline silicon production according to claim 1, characterized in that, The front side of the placement chamber (101) is provided with an openable door panel. The door panel is a double door, consisting of two hinged door panels (7). The side edge of each hinged door panel (7) is rotatably connected to the cabinet (1) via a hinge (8).
5. The weight storage device for monocrystalline silicon production according to claim 4, characterized in that, A rotary joint (9) is provided at the top of the hinged door panel (7) near the hinge (8); an air supply pipe (10) extending along the length of the door panel is provided on one side inside the hinged door panel (7); the air supply pipe (10) is located on one side of the rotary joint (9), and the top end of the air supply pipe (10) is connected to one end of the rotary joint (9); the other end of the rotary joint (9) is connected to the air cooler (12) through a hose (11); the air supply pipe (10) is a rectangular cross-section pipe, and an air outlet (1001) is provided on the side of the air supply pipe (10) along the length; an air outlet is provided on the side of the hinged door panel (7) facing the placement chamber (101), and an air outlet louver (13) is installed in the air outlet.
6. The weight storage device for monocrystalline silicon production according to claim 5, characterized in that, The air cooler (12) is installed on the ground or on the cabinet (1).
7. The weight storage device for monocrystalline silicon production according to claim 1, characterized in that, The cabinet (1) has multiple strip-shaped ash discharge ports (104) on its back panel (102); the rear edge of the bottom plate (103) corresponds to one ash discharge port (104), and the rear edges of the first support plate (301) and the second support plate (401) each correspond to one ash discharge port (104).
8. The weight storage device for monocrystalline silicon production according to claim 7, characterized in that, A dust discharge space (105) is formed behind the back panel (102) of the cabinet (1). A cuboid dust collection box (14) is provided at the bottom of the dust discharge space (105). The dust collection box (14) can be pulled out from the bottom opening of the back panel (106) of the cabinet (1).
9. The weight storage device for monocrystalline silicon production according to claim 8, characterized in that, A grating plate (15) is detachably placed inside the ash collection box (14). The grating plate (15) has long strip-shaped gaps. Between adjacent long strip-shaped gaps is a strip-shaped prism (1501) with a triangular cross-section. The sharp corner of the prism (1501) faces upward, and the two sides are inclined. An air outlet (1401) is provided on the side of the ash collection box (14), and the air outlet (1401) is covered by a filter screen.
10. The weight storage device for monocrystalline silicon production according to claim 1, characterized in that, It also includes a counterweight limiting body (16), which includes a third support plate (1601). The third support plate (1601) is connected to the inner wall of the placement chamber (101) and is located on the upper surface of the second support plate (401). A semi-circular third limiting hole (1602) is opened on the front edge of the third support plate (1601). The number of third limiting holes (1602) is the same as the number of second placement holes (402) on the second support plate (401) and they correspond one to one. A third graphite inner liner ring (1603) that can rotate around the axis is embedded in the third limiting hole (1602). The third graphite inner liner ring (1603) is semi-circular and its central hole diameter is larger than that of the central hole of the second graphite inner liner ring (403).
Citation Information
Patent Citations
Heavy hammer and graphite chuck placing tool for single crystal furnace
CN214612843U