Low-ash semiconductor thermal field isostatic pressing graphite material purification equipment

Abstract

The utility model provides low-ash semiconductor thermal field isostatic pressing graphite material purification equipment. Relates to the technical field of isostatic pressing graphite processing equipment. The device comprises a bottom plate, an atmosphere furnace and a turnover mechanism, a first support is arranged on the bottom plate, an annular plate is rotationally installed on the first support, a plurality of supporting plates are rotationally connected to the annular plate, push rods are arranged on the supporting plates in a sliding mode, placing plates are fixedly installed at one ends of the push rods, isostatic pressing graphite is arranged on the placing plates, and a second support is arranged on the bottom plate. An atmosphere furnace is fixedly installed on the second support and corresponds to one of the multiple pieces of isostatic pressing graphite, and the turnover mechanism is connected with the multiple supporting plates. The low-ash semiconductor thermal field isostatic pressing graphite material purification equipment provided by the utility model has the advantages that the effects of automatically conveying and taking isostatic pressing graphite can be achieved through the matching of all the parts.

Description

Technical Field

[0001] This utility model relates to the technical field of isostatic graphite processing equipment, and in particular to a purification equipment for low-ash semiconductor thermal field isostatic graphite materials. Background Technology

[0002] To remove impurities from isostatically pressed graphite, purification treatment is required to meet higher usage requirements. The purification process involves first placing the isostatically pressed graphite in a high-temperature atmosphere furnace, then introducing a purifying gas to purify it, and finally removing the graphite.

[0003] In existing technologies, since the opening of the atmosphere furnace is usually located on its front, isostatic graphite needs to be placed into the atmosphere furnace through the opening, then the furnace door is closed for purification, and the isostatic graphite is then removed after purification. This operation is quite cumbersome. To address the above problem, the document with application number 202421538804.2 discloses a device for circulating purification of isostatic graphite, which includes a base, a support, a turntable, an atmosphere furnace, an isostatic graphite carrier, and a tray. The turntable is rotatably and horizontally arranged above the base. The isostatic graphite carrier is arranged in a ring array on the turntable and can be raised and lowered. The bottom of the isostatic graphite carrier is provided with a guide rod extending downward to the bottom of the turntable. A floating plate is provided at the bottom of the guide rod. The tray is raised and lowered below the path of the floating plate. A fixed plate is provided on the support and extends horizontally to the top of the tray. The fixed plate is located above the path of the isostatic graphite carrier. The atmosphere furnace is located below the fixed plate, and the opening of the atmosphere furnace points downward to the isostatic graphite carrier.

[0004] However, a thorough review of the aforementioned patent documents reveals the following shortcomings: During the removal of isostatic graphite, detachment from the atmosphere furnace relies solely on the graphite's own gravity, which can lead to incomplete detachment. This can cause collisions between the isostatic graphite and the atmosphere furnace during graphite replacement, posing a safety hazard. Furthermore, after the isostatic graphite is removed from the atmosphere furnace, it still requires manual removal from the isostatic carrier, which is unsuitable for automated production lines and affects the purification and processing efficiency of isostatic graphite, indicating room for improvement.

[0005] Therefore, this invention provides a purification device for low-ash semiconductor thermal field isostatic pressing graphite materials to solve the above problems. Utility Model Content

[0006] To solve the above-mentioned technical problems, the present invention provides a purification device for low-ash semiconductor thermal field isostatic pressing graphite materials, comprising: a base plate, an atmosphere furnace, and a flipping mechanism;

[0007] A bracket is provided on the base plate, and a ring plate is rotatably mounted on the bracket. Multiple support plates are rotatably connected to the ring plate. Push rods slide on each of the multiple support plates, and a placement plate is fixedly mounted on one end of each of the multiple push rods. Isostatic graphite is provided on each of the multiple placement plates. A bracket is provided on the base plate, and an atmosphere furnace is fixedly mounted on the bracket. The atmosphere furnace corresponds to one of the multiple isostatic graphite pieces. The flipping mechanism is connected to the multiple support plates.

[0008] The flipping mechanism includes a motor, a transmission plate, a limiting ring, and a transmission plate. One end of each of the multiple trays is fixedly mounted with a transmission plate. Through the coordinated design of the bracket, ring plate, flipping mechanism, motor, gear, gear ring, tray, push rod, magnet, magnet, and cylinder, not only can the effect of purified isostatic graphite not being completely removed from the atmosphere furnace be avoided, thus improving safety, but it can also achieve the effect of automatic conveying and unloading of isostatic graphite, thus improving convenience and efficiency.

[0009] Preferably, a limiting ring is fixedly installed on the bracket, and the limiting ring is in contact with and connected to multiple transmission plates. Through the interaction between the limiting ring and the multiple transmission plates, the multiple pallets can be limited.

[0010] Preferably, a motor is fixedly installed on the bracket, and a transmission plate is fixedly connected to the output end of the motor. The transmission plate is connected to one of the multiple transmission plates. Through the driving of the transmission plate by the motor and the transmission between the transmission plate and the corresponding transmission plate, the corresponding tray can be rotated.

[0011] Preferably, a second motor is fixedly mounted on the first bracket, and a gear is fixedly connected to the output end of the second motor. A gear ring is meshed on the gear, and the gear ring is fixedly sleeved on the ring plate for rotating the ring plate.

[0012] Preferably, a planar bearing is fixedly installed on the bracket, and one side of the planar bearing is fixedly connected to the ring plate to facilitate the rotation of the ring plate.

[0013] Preferably, a cylinder is fixedly installed on the base plate, and a push plate is fixedly connected to one end of the cylinder. The push plate is in contact with one of the push rods, which is used to push the corresponding isostatic graphite into the atmosphere furnace and to make the placement plate abut against and seal the feed port at the bottom of the atmosphere furnace. A sealing ring is fixedly installed on one side of the placement plate and is adapted to the feed port of the atmosphere furnace.

[0014] Preferably, a magnet is fixedly installed at one end of each of the plurality of push rods, and a magnet is fixedly installed on one side of the push plate. The magnets attract each other with the plurality of magnets, which facilitates the synchronous movement of the push rods by the cylinder during the retraction drive process.

[0015] Preferably, a collection box is provided on the base plate, and the collection box corresponds to one of the multiple trays for collecting purified isostatic graphite.

[0016] Compared with related technologies, the low-ash semiconductor thermal field isostatic pressing graphite material purification equipment provided by this utility model has the following beneficial effects:

[0017] This utility model provides a purification device for low-ash semiconductor thermal field isostatic graphite materials. Through the coordinated design of the bracket, ring plate, flipping mechanism, motor, gear, gear ring, support plate, push rod, magnet one, magnet two, and cylinder, it can not only avoid the effect of the purified isostatic graphite not being able to completely leave the atmosphere furnace, thus improving safety, but also achieve the effect of automatic conveying and picking up of isostatic graphite, thus improving convenience and efficiency. Attached Figure Description

[0018] Figure 1 A three-dimensional structural schematic diagram of a low-ash semiconductor thermal field isostatic pressing graphite material purification device provided for this utility model;

[0019] Figure 2 An assembly diagram of a low-ash semiconductor thermal field isostatic pressing graphite material purification device provided by this utility model;

[0020] Figure 3 A partial explosion diagram of a low-ash semiconductor thermal field isostatic pressing graphite material purification device provided for this utility model;

[0021] Figure 4 A schematic diagram of the flipping mechanism structure of a low-ash semiconductor thermal field isostatic pressing graphite material purification equipment provided by this utility model.

[0022] The following are labeled in the diagram: 1. Base plate; 2. Support 1; 3. Ring plate; 4. Support plate; 5. Push rod; 6. Placement plate; 7. Isostatic graphite; 8. Transmission plate 1; 9. Limiting ring; 10. Motor 1; 11. Transmission plate 2; 12. Motor 2; 13. Gear; 14. Gear ring; 15. Magnet 1; 16. Magnet 2; 17. Surface bearing; 18. Collection box; 19. Atmosphere furnace; 20. Cylinder; 21. Push plate. Detailed Implementation

[0023] The present invention will be further described below with reference to the accompanying drawings and embodiments.

[0024] Please refer to the following: Figures 1-4 A purification device for low-ash semiconductor hot field isostatic pressing graphite materials includes: a base plate 1, an atmosphere furnace 19, and a flipping mechanism;

[0025] A support 1 2 is provided on the base plate 1. A ring plate 3 is rotatably mounted on the support 1 2. Multiple support plates 4 are rotatably connected to the ring plate 3. Push rods 5 slide on each of the multiple support plates 4. Placement plates 6 are fixedly mounted on one end of each of the multiple push rods 5. Isostatic graphite 7 is provided on each of the multiple placement plates 6. A support 2 is provided on the base plate 1. An atmosphere furnace 19 is fixedly mounted on the support 2. The atmosphere furnace 19 corresponds to one of the multiple isostatic graphite 7. A flipping mechanism is connected to the multiple support plates 4. Halogen or halogenated hydrocarbon purification gas is supplied into the atmosphere furnace 19 through the air inlet connection pipe on one side of the atmosphere furnace 19 for purification, thereby reducing the impurities contained in the isostatic graphite 7. Atmosphere furnaces are common in daily life and can be found in the literature. They belong to the prior art and can be implemented by the relevant technical personnel. They will not be described in detail here. The specific structure and working principle of the atmosphere furnace 19 can be referred to the literature with application number: 201410638623.1.

[0026] The flipping mechanism includes a motor 10, a transmission plate 2 11, a limiting ring 9, and a transmission plate 8. One end of each of the multiple pallets 4 is fixedly mounted with a transmission plate 8. Through the coordinated design of the bracket 12, ring plate 3, flipping mechanism, motor 2 12, gear 13, gear ring 14, pallet 4, push rod 5, magnet 15, magnet 2 16, and cylinder 20, it can not only avoid the effect of the purified isostatic graphite 7 not being able to completely leave the atmosphere furnace 19, thus improving safety, but also achieve the effect of automatic conveying and picking up of isostatic graphite 7, thus improving convenience and efficiency.

[0027] In this method, a limiting ring 9 is fixedly installed on the bracket 2. The limiting ring 9 is in contact with multiple transmission plates 8. Through the interaction between the limiting ring 9 and the multiple transmission plates 8, the effect of limiting the multiple pallets 4 can be achieved.

[0028] In this method, a motor 10 is fixedly installed on the bracket 2. The output end of the motor 10 is fixedly connected to a transmission plate 11. The transmission plate 11 is connected to one of the multiple transmission plates 8. Through the driving of the transmission plate 11 by the motor 10 and the transmission between the transmission plate 11 and the corresponding transmission plate 8, the corresponding support plate 4 can be rotated.

[0029] In this method, a second motor 12 is fixedly installed on the bracket 2, and a gear 13 is fixedly connected to the output end of the second motor 12. A gear ring 14 is meshed on the gear 13, and the gear ring 14 is fixedly sleeved on the ring plate 3 for rotating the ring plate 3.

[0030] In this method, a plane bearing 17 is fixedly installed on the bracket 2, and one side of the plane bearing 17 is fixedly connected to the ring plate 3 to facilitate the rotation of the ring plate 3.

[0031] In this method, a cylinder 20 is fixedly installed on the base plate 1. A push plate 21 is fixedly connected to one end of the cylinder 20. The push plate 21 is in contact with one of the multiple push rods 5, which is used to push the corresponding isostatic graphite 7 into the atmosphere furnace 19 and make the placement plate 6 abut against and seal the feed port at the bottom of the atmosphere furnace 19.

[0032] In this method, a magnet 15 is fixedly installed at one end of each of the multiple push rods 5, and a magnet 26 is fixedly installed on one side of the push plate 21. The magnet 26 and the multiple magnets 15 attract each other, which facilitates the synchronous movement of the push rods 5 by the cylinder 20 during the retraction drive process.

[0033] In this method, a collection box 18 is provided on the base plate 1, and the collection box 18 corresponds to one of the multiple trays 4, which is used to collect the purified isostatic graphite 7.

[0034] The working principle of the low-ash semiconductor thermal field isostatic pressing graphite material purification equipment provided by this utility model is as follows:

[0035] In use, isostatic graphite 7 is first placed in the placement slot on the placement plate 6. Then, the gear 13 is rotated by the drive of the motor 12 and meshes with the gear ring 14. With the cooperation of the plane bearing 17, the ring plate 3 drives the isostatic graphite 7 to rotate intermittently through the transmission of multiple support plates 4, push rods 5 and placement plate 6, thereby conveying it to the bottom of the atmosphere furnace 19. The magnet 15 at one end of the push rod 5 is magnetically connected to the magnet 16 on one side of the push plate 21, thereby achieving the effect of automatic conveying of isostatic graphite 7.

[0036] Then, driven by cylinder 20 and driven by push plate 21, magnet 15, magnet 26 and push rod 5, the placement plate 6 moves isostatic graphite 7 into atmosphere furnace 19, and the sealing ring on one side of the placement plate 6 abuts against the feed port of atmosphere furnace 19, thereby achieving the effect of automatic feeding.

[0037] Then, halogen or halogenated hydrocarbon purification gas is supplied into the atmosphere furnace 19 through the gas inlet connection pipe on one side of the atmosphere furnace 19 for purification, and then the exhaust gas is transported to the exhaust gas treatment equipment through the exhaust connection pipe on the other side, thereby achieving the effect of purifying isostatic graphite 7.

[0038] Subsequently, through the reverse drive of cylinder 20 and the magnetic force between magnet 15 and magnet 26, as well as the transmission of push rod 5, cylinder 20 drives isostatic graphite 7 downward through placement plate 6 and removes it from atmosphere furnace 19, thereby achieving automatic material discharge.

[0039] Then, driven by motor 12, the transmission plate 8 at one end of the tray 4 is connected to transmission plate 11, and the purified isostatic graphite 7 is moved above the collection box 18. Motor 10 is then started. At this time, driven by motor 10, transmission plate 11 rotates 180°. Simultaneously, transmission plate 11 and transmission plate 8 drive the tray 4 to rotate 180° synchronously on the ring plate 3. Then, driven by push rod 5, the placement plate 6 rotates synchronously, and the purified isostatic graphite 7 falls into the collection box 18, thus achieving the effect of automatic material handling. Afterward, driven by motor 10, the tray 4 rotates 180° again, so that the tray 4, placement plate 6 and push rod 5 return to their original positions.

[0040] Compared with related technologies, the low-ash semiconductor thermal field isostatic pressing graphite material purification equipment provided by this utility model has the following beneficial effects: through the cooperation of various components, it can not only avoid the effect that the purified isostatic pressing graphite 7 cannot completely leave the atmosphere furnace 19, thus improving safety, but also achieve the effect of automatic conveying and picking up of isostatic pressing graphite 7, improving convenience and efficiency. Moreover, the structure is simple and the practicality is higher.

[0041] The above are merely embodiments of this utility model and do not limit the patent scope of this utility model. Any equivalent structural or procedural transformations made based on the description and drawings of this utility model, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of this utility model.

Claims

1. A purification device for low-ash semiconductor thermal field isostatic pressing graphite materials, characterized in that, Includes a base plate (1), an atmosphere furnace (19), and a tilting mechanism; A bracket (2) is provided on the base plate (1). A ring plate (3) is rotatably installed on the bracket (2). Multiple trays (4) are rotatably connected to the ring plate (3). Push rods (5) slide on each of the multiple trays (4). A placement plate (6) is fixedly installed at one end of each of the multiple push rods (5). Isostatic graphite (7) is provided on each of the multiple placement plates (6). A bracket (2) is provided on the base plate (1). An atmosphere furnace (19) is fixedly installed on the bracket (2). The atmosphere furnace (19) corresponds to one of the multiple isostatic graphite (7). The flipping mechanism is connected to the multiple trays (4). The flipping mechanism includes a motor (10), a transmission plate (11), a limiting ring (9), and a transmission plate (8). One end of each of the multiple trays (4) is fixedly installed with a transmission plate (8).

2. The purification equipment for low-ash semiconductor thermal field isostatic pressing graphite materials according to claim 1, characterized in that, A limiting ring (9) is fixedly installed on the bracket (2), and the limiting ring (9) is in contact with and connected to the multiple transmission plates (8).

3. The purification equipment for low-ash semiconductor thermal field isostatic pressing graphite materials according to claim 2, characterized in that, A motor (10) is fixedly installed on the bracket (2). The output end of the motor (10) is fixedly connected to a transmission plate (11). The transmission plate (11) is connected to one of the multiple transmission plates (8).

4. The purification equipment for low-ash semiconductor thermal field isostatic pressing graphite materials according to claim 1, characterized in that, A second motor (12) is fixedly installed on the bracket (2). A gear (13) is fixedly connected to the output end of the second motor (12). A gear ring (14) is meshed on the gear (13). The gear ring (14) is fixedly sleeved on the ring plate (3).

5. The purification equipment for low-ash semiconductor thermal field isostatic pressing graphite materials according to claim 4, characterized in that, A planar bearing (17) is fixedly installed on the bracket (2), and one side of the planar bearing (17) is fixedly connected to the ring plate (3).

6. The purification equipment for low-ash semiconductor thermal field isostatic pressing graphite materials according to claim 1, characterized in that, A cylinder (20) is fixedly installed on the base plate (1). A push plate (21) is fixedly connected to one end of the cylinder (20). The push plate (21) is in contact with one of the multiple push rods (5).

7. The purification equipment for low-ash semiconductor thermal field isostatic pressing graphite materials according to claim 6, characterized in that, One end of each of the push rods (5) is fixedly equipped with a magnet (15), and one side of the push plate (21) is fixedly equipped with a magnet (16). The magnet (16) and the magnets (15) attract each other.

8. The purification equipment for low-ash semiconductor thermal field isostatic pressing graphite materials according to claim 1, characterized in that, A collection box (18) is provided on the base plate (1), and the collection box (18) corresponds to one of the multiple trays (4).

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