Liquid mixing valve and semiconductor equipment

Abstract

The utility model discloses a liquid mixing valve and semiconductor equipment, the liquid mixing valve comprises a liquid mixing pipeline, the liquid mixing pipeline is provided with a process port and a cleaning port, the cleaning port comprises a cleaning liquid input port and a plurality of discharge ports, and the discharge ports are distributed at two sides of the cleaning liquid input port along the length direction of the liquid mixing pipeline; the liquid mixing pipeline comprises a first edge tail end and a second edge tail end in the length direction; the discharge port comprises a first discharge port located at the tail end of the first edge; the second discharge port is located at the tail end of the second edge; the plurality of process pipelines are communicated with the liquid mixing pipeline through process ports and are used for providing or discharging process liquid; the cleaning liquid supply pipeline is communicated with the liquid mixing pipeline through a cleaning liquid input port; and the plurality of discharge pipelines are communicated with the liquid mixing pipeline through discharge ports and are used for discharging the process liquid and the cleaning liquid. By cleaning the liquid supply pipeline and the discharge pipeline, cleaning dead angles are reduced, the problem of solution residue of the liquid mixing valve is solved, the cleaning effect is improved, and the problem of excessive particles in the liquid mixing valve is solved.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor manufacturing, and in particular to a mixing valve and semiconductor equipment. Background Technology

[0002] In the semiconductor manufacturing industry, the cleanliness of the process pipeline has become one of the most critical factors determining the yield and reliability of chip products.

[0003] Current wet processing equipment (such as wet cleaning equipment or wet etching equipment) generally uses an online mixing mode through a mixing valve pipeline for process liquids. After the process is completed, solution residues and accumulations are likely to occur in the pipeline. Long-term residue accumulation of solution will lead to excessive particles in the pipeline, resulting in particles on the wafer surface, which in turn affects the yield and reliability of semiconductor products.

[0004] Therefore, improving the cleaning effect of pipelines and reducing the residue of particles in the pipelines has become an urgent problem to be solved. Utility Model Content

[0005] The problem solved by this utility model embodiment is to provide a mixing valve and semiconductor device to improve the cleaning effect of pipelines and reduce the residual particles in the pipelines.

[0006] To address the aforementioned problems, this utility model provides a mixing valve, comprising: a mixing pipe having a process port and a cleaning port; the cleaning port including a cleaning liquid inlet and multiple outlets; the process port, cleaning liquid inlet, and outlets being arranged at intervals along the length of the mixing pipe, and the outlets being distributed on both sides of the cleaning liquid inlet along the length of the mixing pipe; the mixing pipe including a first edge end and a second edge end along its length; the outlets including: a first outlet located at the first edge end; a second outlet located at the second edge end; multiple process pipes communicating with the mixing pipe through the process port, the process pipes being used to supply process liquid to the mixing pipe or discharge process liquid from the mixing pipe; a cleaning liquid supply pipe communicating with the mixing pipe through the cleaning liquid inlet, the cleaning liquid supply pipe being used to supply cleaning liquid to the mixing pipe; and multiple outlet pipes communicating with the mixing pipe through the outlets, the outlet pipes being used to discharge process liquid and cleaning liquid from the mixing pipe.

[0007] Optionally, along the length of the main pipe of the mixing valve, the cleaning liquid inlet is located in the central region of the main pipe of the mixing valve.

[0008] Optionally, the process ports are distributed between the cleaning liquid inlet and the first outlet, and between the cleaning liquid inlet and the second outlet.

[0009] Optionally, the mixing pipeline also has an air supply port, which is arranged adjacent to the cleaning liquid inlet; the mixing valve further includes: a purge gas supply pipeline, which is connected to the mixing pipeline through the air supply port, and the purge gas supply pipeline is used to supply purge gas to the mixing pipeline; the discharge pipeline is also used to discharge the purge gas in the mixing pipeline.

[0010] Optionally, the purge gas supply pipeline is provided with a first on / off control device, a first flow meter, and a first flow control device in sequence along the flow direction of the purge gas; the first on / off control device is used to control the on / off of the purge gas supply pipeline, and the first flow control device is used to adjust the flow rate of the purge gas supplied by the purge gas supply pipeline to the mixing pipeline.

[0011] Optionally, the purging gas supply pipeline includes an inert gas supply pipeline or an air supply pipeline.

[0012] Optionally, the number of air supply ports is one.

[0013] Optionally, a second on / off control device, a second flow meter, and a second flow control device are sequentially arranged on the cleaning liquid supply pipeline along the flow direction of the cleaning liquid; the second on / off control device is used to control the on / off of the cleaning liquid supply pipeline, and the second flow control device is used to adjust the flow rate of the cleaning liquid supplied by the cleaning liquid supply pipeline to the mixing pipeline.

[0014] Optionally, the cleaning liquid supply pipeline includes a deionized water supply pipeline or a reverse osmosis water supply pipeline.

[0015] Optionally, the mixing valve further includes an extraction device disposed on the discharge pipe, the extraction device being used to extract and discharge residual liquid from the mixing pipe.

[0016] Optionally, the extraction device includes: an airbag pump.

[0017] Optionally, the extraction device is located at the end of the discharge pipe on the side away from the mixed liquid pipe; a third on / off control device, the extraction device, and a third flow meter are sequentially arranged on the discharge pipe along the discharge flow direction; the third on / off control device is used to control the on / off of the discharge pipe.

[0018] Accordingly, this utility model embodiment also provides a semiconductor device, including the mixing valve described in any embodiment of this utility model.

[0019] Compared with the prior art, the technical solution of this utility model embodiment has the following advantages:

[0020] The mixing valve provided in this embodiment of the utility model includes: a mixing pipe having a process port and a cleaning port; the cleaning port including a cleaning liquid inlet and multiple outlets; the process port, cleaning liquid inlet, and outlets being arranged at intervals along the length direction of the mixing pipe, and the outlets being distributed on both sides of the cleaning liquid inlet along the length direction of the mixing pipe; the mixing pipe including a first edge end and a second edge end along its length direction; the outlets including: a first outlet located at the first edge end; a second outlet located at the second edge end; multiple process pipes communicating with the mixing pipe through the process port, the process pipes being used to supply process liquid to the mixing pipe or discharge process liquid from the mixing pipe; a cleaning liquid supply pipe communicating with the mixing pipe through the cleaning liquid inlet, the cleaning liquid supply pipe being used to supply cleaning liquid to the mixing pipe; and multiple outlet pipes communicating with the mixing pipe through the outlets, the outlet pipes being used to discharge process liquid and cleaning liquid from the mixing pipe. In the mixing valve provided by this utility model embodiment, since the discharge ports are distributed on both sides of the cleaning liquid inlet along the length of the mixing pipe, the cleaning liquid supply pipe provides cleaning liquid from the cleaning liquid inlet to the discharge ports distributed on both sides of the cleaning liquid inlet for cleaning, realizing a bidirectional cleaning method from the center of the mixing valve to both ends, which helps to reduce cleaning dead zones. Furthermore, since the first discharge port is located at the first edge end and the second discharge port is located at the second edge end, the discharge pipe discharges the solution between the first edge end and the second edge end of the mixing pipe, which helps to further reduce solution flow dead zones. The discharge pipe is used to discharge the process liquid and cleaning liquid in the mixing pipe, which helps to suppress the problem of solution residue in the mixing valve due to insufficient discharge. In summary, through the cleaning liquid supply pipe and discharge pipe, the problem of solution residue in the mixing valve is effectively suppressed, thereby improving the cleaning effect of the solution in the mixing valve and effectively suppressing the problem of excessive particles in the mixing valve due to the accumulation of solution residue.

[0021] In an optional embodiment, the mixing pipeline further includes an air supply port, which is adjacent to the cleaning liquid inlet. The mixing valve further includes a purge gas supply pipeline connected to the mixing pipeline via the air supply port, which provides purge gas to the mixing pipeline. The discharge pipeline is also used to discharge the purge gas from the mixing pipeline. In this embodiment, the purge gas supply pipeline provides purge gas during the cleaning process of the mixing pipeline, facilitating the pressure of the cleaning liquid and process liquid in the mixing pipeline into the discharge pipeline. This improves the cleaning effect on the solution within the mixing valve, effectively suppressing the problem of solution residue within the mixing valve, thereby effectively suppressing the problem of excessive particulate matter in the mixing valve due to solution residue accumulation. The purge gas supply pipeline also provides purge gas to the mixing pipeline for drying, which improves the dryness of the mixing valve, further suppressing the problem of excessive particulate matter residue within the mixing valve.

[0022] In an optional configuration, the process ports are distributed between the cleaning liquid inlet and the first outlet, and between the cleaning liquid inlet and the second outlet. In this embodiment, since the first outlet is located at the end of the first edge and the second outlet is located at the end of the second edge, distributing the process ports between the cleaning liquid inlet and the first outlet, and between the cleaning liquid inlet and the second outlet, facilitates the cleaning liquid's ability to clean the locations of each process port in the mixing pipe, thereby further improving the cleaning effect on the mixing valve.

[0023] Accordingly, this utility model embodiment provides a semiconductor device, which includes the mixing valve described in this utility model embodiment. Since the mixing valve integrates the cleaning liquid supply pipe and the discharge pipe, it is beneficial to reduce cleaning dead zones and improve the cleaning effect of the solution inside the mixing valve, thereby effectively suppressing the residual accumulation of the solution and suppressing the problem of excessive particle residue inside the mixing valve. This is beneficial to improving the reliability of the semiconductor device and, correspondingly, improving the yield and reliability of semiconductor products. Attached Figure Description

[0024] Figure 1 This is a schematic diagram of the structure of a mixing valve according to an embodiment of the present invention. Detailed Implementation

[0025] As can be seen from the background technology, how to improve the cleaning effect of residual solution in pipelines and reduce the residual particles in pipelines has become an urgent problem to be solved.

[0026] To address the aforementioned technical problems, this utility model provides a mixing valve, comprising: a mixing pipe having a process port and a cleaning port; the cleaning port including a cleaning liquid inlet and multiple outlets; the process port, cleaning liquid inlet, and outlets being spaced apart along the length of the mixing pipe, and the outlets being distributed on both sides of the cleaning liquid inlet along the length of the mixing pipe; the mixing pipe including a first edge end and a second edge end along its length; the outlets including: a first outlet located at the first edge end; a second outlet located at the second edge end; multiple process pipes communicating with the mixing pipe through the process port, the process pipes being used to supply process liquid to the mixing pipe or discharge process liquid from the mixing pipe; a cleaning liquid supply pipe communicating with the mixing pipe through the cleaning liquid inlet, the cleaning liquid supply pipe being used to supply cleaning liquid to the mixing pipe; and multiple outlet pipes communicating with the mixing pipe through the outlets, the outlet pipes being used to discharge process liquid and cleaning liquid from the mixing pipe.

[0027] In the mixing valve provided by this utility model embodiment, since the discharge ports are distributed on both sides of the cleaning liquid inlet along the length of the mixing pipe, the cleaning liquid supply pipe provides cleaning liquid from the cleaning liquid inlet to the discharge ports distributed on both sides of the cleaning liquid inlet for cleaning, realizing a bidirectional cleaning method from the center of the mixing valve to both ends, which helps to reduce cleaning dead zones. Furthermore, since the first discharge port is located at the first edge end and the second discharge port is located at the second edge end, the discharge pipe discharges the solution between the first edge end and the second edge end of the mixing pipe, which helps to further reduce solution flow dead zones. The discharge pipe is used to discharge the process liquid and cleaning liquid in the mixing pipe, which helps to suppress the problem of solution residue in the mixing valve due to insufficient discharge. In summary, through the cleaning liquid supply pipe and discharge pipe, the problem of solution residue in the mixing valve is effectively suppressed, thereby improving the cleaning effect of the solution in the mixing valve and effectively suppressing the problem of excessive particles in the mixing valve due to the accumulation of solution residue.

[0028] To make the above-mentioned objectives, features and advantages of the present invention more apparent and understandable, the specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

[0029] Figure 1 This is a schematic diagram of the structure of a mixing valve according to an embodiment of the present invention.

[0030] It should be noted that, Figure 1 The dashed arrows in the diagram indicate the flow direction of the cleaning liquid and gas inside the mixing valve.

[0031] refer to Figure 1 A mixing valve includes: a mixing pipe 10, the mixing pipe 10 having a process port 21 and a cleaning port (not shown), the cleaning port including a cleaning liquid inlet 22 and multiple outlets 31, the process port 21, the cleaning liquid inlet 22 and the outlets 31 being arranged at intervals along the length direction of the mixing pipe 10, and the outlets 31 being distributed on both sides of the cleaning liquid inlet 22 along the length direction of the mixing pipe 10; the mixing pipe 10 includes a first edge end 12 and a second edge end 13 along its length direction; the outlets 31 include: a first outlet 311, located at the first edge end 12; a second outlet 311; and a third outlet 311. A discharge port 312 is located at the second edge end 13; multiple process pipes 11 are connected to the mixing pipe 10 through the process port 21, for supplying process liquid to the mixing pipe 10 or discharging process liquid from the mixing pipe 10; a cleaning liquid supply pipe 20 is connected to the mixing pipe 10 through the cleaning liquid inlet 22, for supplying cleaning liquid to the mixing pipe 10; multiple discharge pipes 30 are connected to the mixing pipe 10 through the discharge port 31, for discharging process liquid and cleaning liquid from the mixing pipe 10.

[0032] In the mixing valve provided in this embodiment of the utility model, since the discharge ports 31 are distributed on both sides of the cleaning liquid inlet 22 along the length direction of the mixing pipe 10, the cleaning liquid supply pipe 20 provides cleaning liquid from the cleaning liquid inlet 22 to the discharge ports 31 distributed on both sides of the cleaning liquid inlet 22 for cleaning, realizing a bidirectional cleaning method from the center of the mixing valve to both ends, which helps to reduce cleaning dead angles. Furthermore, since the first discharge port 311 is located at the first edge end 12 and the second discharge port 312 is located at the second edge end 13, the discharge pipe... The discharge pipe 30 discharges the solution between the first edge end 12 and the second edge end 13 of the mixing pipe 10, which helps to further reduce the dead zone of solution flow. The discharge pipe 30 is used to discharge the process liquid and cleaning liquid in the mixing pipe 10, which helps to suppress the problem of solution residue in the mixing valve due to insufficient discharge. In summary, by using the cleaning liquid supply pipe 20 and the discharge pipe 30, the problem of solution residue in the mixing valve is effectively suppressed, thereby improving the cleaning effect of the solution in the mixing valve and effectively suppressing the problem of excessive particles in the mixing valve due to the accumulation of solution residue.

[0033] The mixing pipe 10 is used to mix the process liquids provided by the plurality of process pipes 11.

[0034] The mixing pipe 10 has a process port 21, thus enabling the mixing and transmission of process liquids to meet the requirements of normal process operations.

[0035] The mixing pipe 10 also has a cleaning port, through which the mixing pipe 10 can be cleaned.

[0036] In this embodiment, the mixing pipeline 10 has a process port 21, a cleaning liquid inlet 22 and multiple outlets 31, so that the process pipeline 11, the cleaning liquid supply pipeline 20 and the outlet pipeline 30 can all be connected to the mixing valve main pipeline 10.

[0037] In other embodiments, the mixing conduit 10 may also have other types of conduit ports.

[0038] In this embodiment, the mixing pipeline 10 also has an air supply port 41, which is arranged adjacent to the cleaning liquid inlet 22; the mixing valve further includes a purge gas supply pipeline 40, which is connected to the mixing pipeline 10 through the air supply port 41, and the purge gas supply pipeline 40 is used to supply purge gas to the mixing pipeline 10; the discharge pipeline 30 is also used to discharge the purge gas in the mixing pipeline 10.

[0039] The purging gas supply pipe 40 is used to supply purging gas into the mixing pipe 10.

[0040] In this embodiment, the purge gas supply pipe 40 can provide purge gas during the cleaning of the mixing pipe 10. By using air pressure, the cleaning liquid and process liquid in the mixing pipe 10 are forced into the discharge pipe 40, which helps to improve the cleaning effect of the solution in the mixing valve and effectively suppresses the problem of solution residue in the mixing valve. This effectively suppresses the problem of excessive particles in the mixing valve due to the accumulation of solution residue. The purge gas supply pipe 40 can also provide purge gas to the mixing pipe 10 for drying treatment, which helps to improve the dryness of the mixing valve and further helps to suppress the problem of excessive particle residue in the mixing valve.

[0041] refer to Figure 1 In this embodiment, the air supply port 41 and the cleaning liquid inlet 22 are arranged adjacent to each other, thereby improving the effect of promoting the flow of the cleaning liquid.

[0042] refer to Figure 1In this embodiment, the number of air supply ports 41 is one, which avoids multiple purge gases with different flow directions in the mixing pipe 10. This helps maintain the stability of the purge gas flow direction in the mixing pipe 10 and prevents solution fluctuations in the mixing pipe 10 due to disordered purge gas flow. In other embodiments, the number of air supply ports may also be different.

[0043] refer to Figure 1 As an example, in this embodiment, the purge gas supply pipeline 40 is provided with a first on / off control device 42, a first flow meter 43 and a first flow control device 44 in sequence along the flow direction of the purge gas.

[0044] The first on / off control device 42 is used to control the on / off of the purge gas supply pipeline 40, and the first flow control device 44 is used to adjust the flow rate of the purge gas supplied by the purge gas supply pipeline 40 to the mixing pipeline 10.

[0045] It should be noted that, along the flow direction of the purging gas, the first flow meter 43 is located downstream of the first on / off control device 42, which facilitates accurate measurement of the flow rate of the purging gas entering the purging gas supply pipe 40.

[0046] It should also be noted that, along the flow direction of the purge gas, the first flow control device 44 is located downstream of the first flow meter 43. The first flow control device 44 adjusts the flow rate of the purge gas supplied by the purge gas supply pipeline 40 to the mixing pipeline 10 according to the process requirement parameters. This allows the purge gas supply pipeline 40 to accurately and timely adjust the flow rate of the purge gas according to different process requirements, which helps to improve the accuracy of the purge gas flow rate provided by the purge gas supply pipeline 40. This, in turn, helps to improve the purging effect on the solution in the mixing valve and effectively suppresses the problem of excessive particles in the mixing valve due to the residual accumulation of the solution.

[0047] In other embodiments, the first on / off control device, the first flow meter, and the first flow control device may be arranged in other orders.

[0048] In this embodiment, the first on / off control device 42 includes a first pressure vacuum valve.

[0049] The first pressure vacuum valve will only open when the pressure of the purge gas reaches a preset threshold, preventing gas or liquid from other process pipelines from flowing into the closed purge gas supply pipeline 40. This effectively suppresses the problem of other liquids or gases entering the mixing pipeline 10 through the purge gas supply pipeline 40 and causing pollution, which helps to improve the reliability of the mixing valve.

[0050] Specifically, the first pressure vacuum valve is also used to allow air or inert gas to enter the mixing valve to balance the internal and external pressure difference when the mixing valve forms a negative pressure due to the rapid discharge of fluid, effectively suppressing accidents such as collapse or cavitation of the mixing valve, and improving the safety of the mixing valve.

[0051] In other embodiments, the first on / off control device may also employ other valves capable of controlling the on / off state of the purging gas supply line 40.

[0052] In this embodiment, the purging gas supply pipe 40 is an inert gas supply pipe.

[0053] The purging gas supply pipe 40 provides inert gas to the mixing pipe 10 for purging. Since the inert gas has the characteristic of being chemically inactive, it avoids accidental reactions with the process liquid and cleaning liquid in the mixing pipe 10, effectively suppresses the problem of accidental contamination in the mixing valve, and helps to improve the reliability of the mixing valve.

[0054] In this embodiment, the purge gas supply pipe 40 is a nitrogen supply pipe, which helps reduce costs. In other embodiments, the purge gas supply pipe can also be a supply pipe for other inert gases or air.

[0055] The process pipeline 11 is used to supply process liquid to the mixing pipeline 10 or to discharge process liquid from the mixing pipeline.

[0056] In this embodiment, part of the process pipe 11 is used to supply process liquid to the mixing pipe 10, and the remaining process pipe 11 is used to discharge the process liquid in the mixing pipe 10.

[0057] The process liquid enters the mixing pipe 10 through the process pipe 11 for supplying the process liquid to the mixing pipe 10, and is then transferred to other pipes or equipment through the process pipe 11 for discharging the process liquid from the mixing pipe 10.

[0058] For example, a process pipe 11 is used to provide SC2 solution, a process pipe 11 is used to provide hydrochloric acid solution, a process pipe 11 is used to provide hydrogen peroxide, a process pipe 11 is used to provide ammonia, and a process pipe 11 is used to discharge the process liquid that enters the mixing pipe 10.

[0059] SC2 solution refers to a mixed solution of hydrochloric acid, hydrogen peroxide, and water.

[0060] It should be noted that the solutions provided by each process pipeline 11 are only examples, and the specific configuration can be adjusted according to actual conditions.

[0061] In this embodiment, process pipe 11 corresponds one-to-one with process port 21.

[0062] like Figure 1 As shown, as an example, the number of process pipes 11 is eight. In other embodiments, the number of process pipes may be other numbers depending on actual needs.

[0063] The cleaning liquid supply pipe 20 is used to supply cleaning liquid to the mixing pipe 10, and the cleaning liquid supply pipe 20 is connected to the cleaning liquid inlet 22.

[0064] In this embodiment, along the length of the mixing pipe 10, the cleaning liquid inlet 22 is located in the central region of the mixing pipe 10.

[0065] Correspondingly, the cleaning liquid supply pipe 20 provides cleaning liquid from the central area of ​​the mixing pipe 10 along its length to the edge end for cleaning, realizing a bidirectional cleaning method from the center of the mixing valve to both ends, which helps to reduce cleaning dead angles and thus improves the cleaning effect of the solution in the mixing valve.

[0066] In other embodiments, the cleaning liquid inlet may also be located at other locations in the mixing pipe.

[0067] refer to Figure 1 As an example, the cleaning liquid supply pipeline 20 is provided with a second on / off control device 23, a second flow meter 24 and a second flow control device 25 in sequence along the flow direction of the cleaning liquid.

[0068] The second on / off control device 23 is used to control the on / off of the cleaning liquid supply pipe 20, and the second flow control device 25 is used to adjust the flow rate of the cleaning liquid supplied by the cleaning liquid supply pipe 20 to the mixing pipe 10.

[0069] It should be noted that, along the flow direction of the cleaning liquid, the second flow meter 24 is located downstream of the second on / off control device 23, and measures the flow rate of the cleaning liquid in the cleaning liquid supply pipeline 20.

[0070] It should also be noted that, along the flow direction of the cleaning liquid, the second flow control device 25 is located downstream of the second flow meter 24. The second flow control device 25 adjusts the flow rate of the cleaning liquid supplied by the cleaning liquid supply pipe 20 to the mixing pipe 10 according to the process requirement parameters, so that the cleaning liquid supply pipe 20 can accurately and timely adjust the flow rate of the cleaning liquid according to different process requirements. This is beneficial to improving the accuracy of the flow rate of the cleaning liquid supplied by the cleaning liquid supply pipe 20, thereby improving the cleaning effect of the solution in the mixing valve and effectively suppressing the problem of excessive particles in the mixing valve due to the residual accumulation of the solution.

[0071] In other embodiments, the second on / off control device, the second flow meter, and the second flow control device may be arranged in other orders.

[0072] In this embodiment, the second on / off control device includes a second pressure vacuum valve.

[0073] The second pressure vacuum valve will only open when the flow rate of the cleaning liquid reaches a preset threshold, preventing gas or liquid from other process pipelines from flowing into the closed cleaning liquid supply pipeline 20. This effectively suppresses the problem of other process liquids or gases entering the mixing pipeline 10 through the cleaning liquid supply pipeline 20 and causing pollution, which helps to improve the reliability of the mixing valve.

[0074] Specifically, the second pressure vacuum valve is also used to allow air or inert gas to enter the mixing valve to balance the internal and external pressure difference when the mixing valve forms a negative pressure due to the rapid discharge of fluid, effectively suppressing accidents such as collapse or cavitation of the mixing valve, and improving the safety of the mixing valve.

[0075] In other embodiments, the first on / off control device may also employ other valves capable of controlling the on / off state of the cleaning liquid supply pipeline 20.

[0076] In this embodiment, the cleaning liquid supply pipe 20 is a deionized water supply pipe.

[0077] The cleaning liquid supply pipe 20 is used to supply deionized water to the mixing pipe 10 for cleaning. The deionized water is less likely to react with other process liquids, thus avoiding accidental reactions between the cleaning liquid and the process liquid and purging gas in the mixing pipe 10. This effectively suppresses the problem of accidental contamination in the mixing valve and helps to improve the reliability of the mixing valve.

[0078] In other embodiments, the cleaning liquid supply line may also be other liquid supply lines, for example, the cleaning liquid supply line may also be a reverse osmosis water supply line.

[0079] The discharge pipe 30 is used to discharge the process liquid, cleaning liquid and purging gas in the mixed liquid pipe 10.

[0080] It should be noted that the cleaning liquid supply pipe 20 is used to supply cleaning liquid to the mixing pipe 10. Therefore, through the discharge pipe 30, not only the cleaning liquid can be discharged, but also the residual cleaning liquid in the mixing pipe 10 can be discharged, thereby achieving the cleaning of the mixing pipe 10.

[0081] It should also be noted that the mixing pipeline 10 is equipped with an independent discharge port 31. The discharge port 31 and the process port 21 are independent of each other, thereby avoiding the impact on the normal process.

[0082] In this embodiment, the mixing pipe 10 includes a first edge end 12 and a second edge end 13 along its length; the discharge port 31 includes: a first discharge port 311 located at the first edge end 12; and a second discharge port 312 located at the second edge end 13.

[0083] In this embodiment, since the first discharge port 311 is located at the first edge end 12 and the second discharge port 312 is located at the second edge end 13, the discharge pipe 30 discharges the solution at the first edge end 12 and the second edge end 13 of the mixing pipe 10. This helps to reduce dead zones in solution flow, effectively suppresses the problem of liquid stagnation, thereby improving the discharge effect in the mixing valve and effectively suppressing the problem of solution residue in the mixing valve due to insufficient discharge. This further effectively suppresses the problem of excessive particles in the mixing valve caused by the accumulation of residual solution.

[0084] In other embodiments, the discharge port may also be located at other locations in the mixing pipeline.

[0085] In this embodiment, the mixing valve further includes an extraction device 33, which is disposed on the discharge pipe 30. The extraction device 33 is used to extract and discharge the residual liquid in the mixing pipe 10.

[0086] refer to Figure 1 The extraction device 33 provides suction to the process liquid and cleaning liquid in the mixing pipe 10 through the suction principle, thereby extracting and discharging the residual liquid in the mixing pipe 10. This helps to improve the discharge effect of the discharge pipe 30, effectively suppresses the problem of residual solution in the mixing valve, and thus effectively suppresses the problem of excessive particles in the mixing valve caused by the accumulation of residual solution.

[0087] The extraction device 33 can be a liquid vacuum pump. As an example, the extraction device 33 is a wind bag pump.

[0088] In other embodiments, the extraction device may also employ other types of devices.

[0089] In this embodiment, the extraction device 33 is located at the end of the discharge pipe 30 on the side away from the mixing pipe 10.

[0090] In one specific embodiment, a third on / off control device 32, a third flow meter 34, and the extraction device 33 are sequentially arranged on the discharge pipe 30 along the discharge direction; the third on / off control device 32 is used to control the on / off of the discharge pipe 30.

[0091] It should be noted that, since the solution in the discharge pipe 30 will experience flow fluctuations before and after passing through the extraction device 33, the extraction device 33 is located downstream of the third flow meter 34 and at the end of the discharge pipe 30 on the side away from the mixing pipe 10 along the discharge direction. This avoids the third flow meter 34 measuring the flow rate of the solution in the discharge pipe 30 after being discharged through the extraction device 33, effectively suppressing the flow fluctuations caused by the extraction device 33 from interfering with the flow data measurement of the third flow meter 34. This helps to improve the accuracy of the flow measurement of the third flow meter 34, and further helps to improve the stability of controlling the flow rate of the solution in the discharge pipe 30 based on the flow data measured by the third flow meter 34.

[0092] In other embodiments, the extraction device may also be located at other positions on the discharge pipe, and the third on / off control device, the third flow meter, and the extraction device may be arranged in other orders.

[0093] refer to Figure 1 In this embodiment, the process port 21 is distributed between the cleaning liquid inlet 22 and the first outlet 311, and between the cleaning liquid inlet 22 and the second outlet 312.

[0094] The first discharge port 311 is located at the first edge end 12, and the second discharge port 312 is located at the second edge end 13. Therefore, distributing the process ports 21 between the cleaning liquid inlet 22 and the first discharge port 311, and between the cleaning liquid inlet 22 and the second discharge port 312, is beneficial for the cleaning liquid to clean the positions of each process port 21 in the mixing pipe 10, thereby further improving the cleaning effect on the mixing valve.

[0095] Correspondingly, the process pipe 11 supplies process liquid to the mixing pipe 10 at a location between the cleaning liquid inlet 22 and the outlet 31. This is beneficial for increasing the coverage of the process pipe 11 by the cleaning liquid supply pipe 20 during the cleaning process, which supplies cleaning liquid from the central area to the edge end of the mixing pipe 10 along its length. This also helps reduce cleaning dead zones, thereby improving the cleaning effect on the solution inside the mixing valve and effectively suppressing the problem of excessive particles inside the mixing valve due to residual accumulation of solution.

[0096] In other embodiments, the process port may also be located in other positions.

[0097] In this embodiment, along the length of the mixing pipe 10, the cleaning liquid inlet 22 is located in the central region of the mixing pipe 10, and the air supply port 41 is arranged adjacent to the cleaning liquid inlet 22. Correspondingly, the air supply port 41 is also located in the central region of the mixing pipe 10 along its length. Therefore, the purging gas supply pipe 40 provides purging gas from the central region of the mixing pipe 10 along its length to the edge end for purging, realizing the purging method from the center of the mixing valve to both ends. This helps to reduce purging dead angles, thereby improving the purging effect on the solution inside the mixing valve, further improving the cleaning effect on the mixing valve, and effectively suppressing the problem of excessive particles inside the mixing valve due to the residual accumulation of solution.

[0098] In other embodiments, the gas supply port may also be located at other locations in the mixing pipeline.

[0099] Accordingly, this utility model embodiment also provides a semiconductor device, which includes the mixing valve described in any of the foregoing embodiments.

[0100] Because this mixing valve integrates the cleaning liquid supply pipeline, the purging gas supply pipeline, and the discharge pipeline, it helps to reduce cleaning dead zones and improve the cleaning effect of the solution inside the mixing valve. This effectively inhibits the accumulation of residual solution and the problem of excessive particulate residue inside the mixing valve, thereby effectively preventing residual particulate contamination of semiconductor products and improving the yield and reliability of semiconductor products.

[0101] The semiconductor device can be a wet processing device.

[0102] In this embodiment, the wet processing equipment can be a wet cleaning equipment, such as a single-wafer wet cleaning equipment. In other embodiments, the wet processing equipment can also be a wet etching equipment.

[0103] While the present invention has been disclosed above, it is not limited thereto. Any person skilled in the art can make various modifications and alterations without departing from the spirit and scope of the present invention; therefore, the scope of protection of the present invention should be determined by the scope defined in the claims.

Claims

1. A mixing valve, characterized in that, include: A mixing pipe having a process port and a cleaning port, the cleaning port including a cleaning liquid inlet and multiple outlets, the process port, the cleaning liquid inlet and the outlets being arranged at intervals along the length of the mixing pipe, and the outlets being distributed on both sides of the cleaning liquid inlet along the length of the mixing pipe. The mixing pipe includes a first edge end and a second edge end along its length; the discharge port includes: a first discharge port located at the first edge end; and a second discharge port located at the second edge end. Multiple process pipes are connected to the mixing pipe through the process port. The process pipes are used to supply process liquid to the mixing pipe or discharge process liquid from the mixing pipe. A cleaning liquid supply pipeline is connected to the mixing pipeline through the cleaning liquid inlet, and the cleaning liquid supply pipeline is used to supply cleaning liquid to the mixing pipeline; Multiple discharge pipes are connected to the mixing pipe through the discharge port. The discharge pipes are used to discharge the process liquid and cleaning liquid in the mixing pipe.

2. The mixing valve as described in claim 1, characterized in that, Along the length of the mixing pipe, the cleaning liquid inlet is located in the central region of the mixing pipe.

3. The mixing valve as described in claim 1 or 2, characterized in that, The process ports are located between the cleaning liquid inlet and the first outlet, and between the cleaning liquid inlet and the second outlet.

4. The mixing valve as described in claim 1 or 2, characterized in that, The mixing pipeline also has an air supply port, which is arranged adjacent to the cleaning liquid inlet. The mixing valve further includes a purge gas supply pipe, which is connected to the mixing pipe through the gas supply port, and the purge gas supply pipe is used to supply purge gas to the mixing pipe. The discharge pipe is also used to discharge the purging gas in the mixed liquid pipe.

5. The mixing valve as described in claim 4, characterized in that, The purge gas supply pipeline is provided with a first on / off control device, a first flow meter and a first flow control device in sequence along the flow direction of the purge gas; The first on / off control device is used to control the on / off of the purge gas supply pipeline, and the first flow control device is used to adjust the flow rate of the purge gas supplied by the purge gas supply pipeline to the mixing pipeline.

6. The mixing valve as described in claim 4, characterized in that, The purging gas supply pipeline includes an inert gas supply pipeline or an air supply pipeline.

7. The mixing valve as described in claim 4, characterized in that, The number of gas supply ports is one.

8. The mixing valve as described in claim 1, characterized in that, The cleaning liquid supply pipeline is provided with a second on / off control device, a second flow meter and a second flow control device in sequence along the flow direction of the cleaning liquid. The second on / off control device is used to control the on / off of the cleaning liquid supply pipeline, and the second on / off control device is used to adjust the flow rate of the cleaning liquid supplied by the cleaning liquid supply pipeline to the mixing pipeline.

9. The mixing valve as described in claim 1, characterized in that, The cleaning liquid supply pipeline includes a deionized water supply pipeline or a reverse osmosis water supply pipeline.

10. The mixing valve as described in claim 1, characterized in that, The mixing valve further includes an extraction device disposed on the discharge pipe, the extraction device being used to extract and discharge residual liquid from the mixing pipe.

11. The mixing valve as described in claim 10, characterized in that, The extraction device includes: an airbag pump.

12. The mixing valve as described in claim 10, characterized in that, The extraction device is located at the end of the discharge pipe on the side away from the mixed liquid pipe; The discharge pipeline is sequentially equipped with a third on / off control device, a third flow meter, and the extraction device along the discharge flow direction. The third on / off control device is used to control the on / off state of the discharge pipe.

13. A semiconductor device, characterized in that, Includes the mixing valve as described in any one of claims 1 to 12.

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