Optical path adjusting mechanism, laser processing head and processing equipment
By employing a detachable optical path adjustment mechanism and allowing for multiple beam adjustments, the problem of redesigning the optical path structure in optical processing equipment has been solved, improving the equipment's efficiency and adaptability, and ensuring the collimation and stability of the beam.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- HANS LASER TECH IND GRP CO LTD
- Filing Date
- 2025-05-30
- Publication Date
- 2026-05-26
AI Technical Summary
In existing technologies, when optical components need to be replaced for lasers of different wavelengths, the optical path structure needs to be redesigned and adjusted, resulting in low efficiency of optical processing equipment.
Design an optical path adjustment mechanism that uses a detachable reflector and beam expander structure, combined with a vertical adjustment unit and a sealing unit, to achieve multiple adjustments to the transmission direction and diameter of the beam, adapting to lasers of different wavelengths.
The detachable optical path components improve the working efficiency of optical processing equipment, enhance its versatility and flexibility, ensure beam collimation and stability, and reduce optical path adjustment time.
Smart Images
Figure CN224273668U_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of optical processing technology, and in particular to an optical path adjustment mechanism, a laser processing head, and processing equipment. Background Technology
[0002] With the continuous advancement of optical processing technology and the diversification of applications for optical processing equipment, the requirements for optical processing are becoming increasingly stringent. In the field of laser precision machining, ultrafast lasers are widely used due to their high peak power and ultrashort pulse width.
[0003] In existing technologies, especially when optical components need to be replaced for lasers of different wavelengths, traditional optical path structures often need to be redesigned and adjusted, which reduces the working efficiency of optical processing equipment. Utility Model Content
[0004] Therefore, it is necessary to provide an optical path adjustment mechanism, a laser processing head, and processing equipment to address the aforementioned technical problems.
[0005] An optical path adjustment mechanism, comprising:
[0006] A light source used to output a beam of light;
[0007] A first reflector disposed on one side of the light source, a second reflector disposed on one side of the first reflector, a beam expander and a third reflector disposed sequentially on one side of the second reflector, a fourth reflector disposed on one side of the third reflector, and a fifth reflector disposed on one side of the fourth reflector, wherein the first reflector, the second reflector, the third reflector, the fourth reflector, the fifth reflector and the beam expander are all detachable;
[0008] A galvanometer is disposed on one side of the fifth reflecting mirror, and a focusing objective is disposed on one side of the galvanometer. The focusing objective is directly facing the workpiece to be processed. The transmission direction of the light beam output from the light source is parallel to and opposite to the transmission direction of the light beam output from the galvanometer.
[0009] In one embodiment, the transmission direction of the light beam output via the light source is parallel to the transmission direction of the light beam output via the second reflector.
[0010] In one embodiment, the propagation direction of the light beam output via the third reflector is parallel to the propagation direction of the light beam output via the fifth reflector.
[0011] In one embodiment, a first optical path adjustment aperture is provided between the second reflector and the beam expander, and a second optical path adjustment aperture is provided between the beam expander and the third reflector.
[0012] In one embodiment, an aperture is provided between the fifth reflecting mirror and the galvanometer.
[0013] In one embodiment, the optical path adjustment mechanism further includes:
[0014] The vertical adjustment unit is connected to the fifth reflecting mirror, the galvanometer, and the focusing objective lens, and can drive the fifth reflecting mirror, the galvanometer, and the focusing objective lens to adjust their positions along the height direction of the optical path adjustment mechanism.
[0015] In one embodiment, the optical path adjustment mechanism further includes:
[0016] Mounting base;
[0017] The reflector adjustment seat, which is disposed on the mounting base, is connected to the first reflector, the second reflector, the third reflector, the fourth reflector, and the fifth reflector.
[0018] In one embodiment, the optical path adjustment mechanism further includes:
[0019] The sealing unit includes a sealing cylinder and a sealing cover. The sealing cylinder is disposed between the first reflector and the second reflector, and the sealing cover is disposed between the beam expander and the fifth reflector.
[0020] A laser processing head, comprising:
[0021] Such as the optical path adjustment mechanism described above.
[0022] A processing device, comprising:
[0023] Such as the optical path adjustment mechanism described above.
[0024] The technical effects of the embodiments provided in this application are as follows:
[0025] The aforementioned optical path adjustment mechanism, when optical processing of the workpiece is required, adjusts the beam transmission direction of the light source output by the first detachable reflecting mirror, then by the second detachable reflecting mirror, followed by beam diameter enlargement by the detachable beam expander, then by the third detachable reflecting mirror, then by the fourth detachable reflecting mirror, then by the fifth detachable reflecting mirror, and finally by the sixth galvanometer mirror, until the beam transmission direction is parallel to and opposite to the transmission direction of the light source output before being incident on the focusing lens. The focusing lens then focuses the beam onto the workpiece. The detachable design of each reflecting mirror and beam expander allows for the replacement of optical path components to adapt to different light sources (such as lasers of different wavelengths) without redesigning the optical path structure, effectively improving the working efficiency of the optical processing equipment. Attached Figure Description
[0026] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0027] Figure 1 This is a schematic diagram of the optical path adjustment mechanism in one embodiment;
[0028] Figure 2 This is a schematic diagram of the optical path adjustment mechanism in one embodiment;
[0029] Figure 3 This is a schematic diagram of the optical path adjustment mechanism in one embodiment;
[0030] Figure 4 This is a schematic diagram of the optical path adjustment mechanism in one embodiment. Detailed Implementation
[0031] To make the objectives, technical solutions, and advantages of this application clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the scope of this application.
[0032] It should be noted that when a component is referred to as being "fixed to" or "set on" another component, it can be directly on or indirectly on that other component. When a component is referred to as being "connected to" another component, it can be directly connected to or indirectly connected to that other component.
[0033] It should be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.
[0034] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this application, "multiple" means two or more, unless otherwise explicitly specified.
[0035] Figures 1 to 4 This is a schematic diagram of the optical path adjustment mechanism in one embodiment.
[0036] In this embodiment, as Figures 1 to 4 As shown, the optical path adjustment mechanism includes a light source 10, a first reflecting mirror 20, a second reflecting mirror 30, a third reflecting mirror 40, a fourth reflecting mirror 50, a fifth reflecting mirror 60, a beam expander 70, a galvanometer 80, a focusing objective lens 90, an aperture stop 100, a vertical adjustment unit 110, a mounting base 120, a reflecting mirror adjustment seat 130, and a sealing unit 140. Optionally, the mounting base 120 can be a marble base.
[0037] The first reflector 20, the second reflector 30, the beam expander 70 and the third reflector 40, the fourth reflector 50, and the fifth reflector 60 are all disposed on one side of the light source 10. The first reflector 20, the second reflector 30, the third reflector 40, the fourth reflector 50, the fifth reflector 60 and the beam expander 70 are all detachable.
[0038] A galvanometer 80 is disposed on one side of the fifth reflecting mirror 60, and a focusing objective lens 90 is disposed on one side of the galvanometer 80. The focusing objective lens 90 is directly facing the workpiece 200 to be processed. The transmission direction of the light beam output by the light source 10 is parallel to and opposite to the transmission direction of the light beam output by the galvanometer 80.
[0039] The transmission direction of the light beam output by the light source 10 is parallel to the transmission direction of the light beam output by the second reflector 30; the transmission direction of the light beam output by the third reflector 40 is parallel to the transmission direction of the light beam output by the fifth reflector 60.
[0040] The light source 10 can be a functional structure disposed on one side of the first reflector 20, capable of generating light beams of different wavelengths and transmitting the light beams to the first reflector 20. The first reflector 20 can be a functional structure disposed between the light source 10 and the second reflector 30, capable of receiving the light beam output from the light source 10, performing a first transmission direction adjustment on the light beam, and transmitting the first transmission direction-adjusted light beam to the second reflector 30. The second reflector 30 can be a functional structure disposed between the first reflector 20 and the beam expander 70, capable of receiving the light beam output from the first reflector 20, performing a second transmission direction adjustment on the light beam, and transmitting the second transmission direction-adjusted light beam to the beam expander 70.
[0041] The beam expander 70 can be a functional structure disposed between the second reflector 30 and the third reflector 40, capable of receiving the light beam output from the second reflector 30, expanding the diameter of the light beam, and transmitting the expanded light beam to the third reflector 40. The third reflector 40 can be a functional structure disposed between the beam expander 70 and the fourth reflector 50, capable of receiving the light beam output from the beam expander 70, adjusting the light beam's transmission direction a third time, and transmitting the adjusted light beam to the fourth reflector 50. The fourth reflector 50 can be a functional structure disposed between the third reflector 40 and the fifth reflector 60, capable of receiving the light beam output from the third reflector 40, adjusting the light beam's transmission direction a fourth time, and transmitting the adjusted light beam to the fifth reflector 60.
[0042] The fifth reflecting mirror 60 can be positioned between the fourth reflecting mirror 50 and the galvanometer 80, and is a functional structure capable of receiving the light beam output from the fourth reflecting mirror 50, performing a fifth transmission direction adjustment on the light beam, and transmitting the fifth-adjusted light beam to the galvanometer 80. The galvanometer 80 can be positioned between the fifth reflecting mirror 60 and the focusing objective lens 90, and is a functional structure capable of receiving the light beam output from the fifth reflecting mirror 60, performing a sixth transmission direction adjustment on the light beam, and transmitting the sixth-adjusted light beam to the objective lens. The focusing objective lens 90 can be positioned between the galvanometer 80 and the workpiece 200, and is a functional structure capable of receiving the light beam output from the galvanometer 80 and focusing the light beam onto the workpiece 200.
[0043] A first optical path adjustment aperture 150 is provided between the second reflector 30 and the beam expander 70; a second optical path adjustment aperture 160 is provided between the beam expander 70 and the third reflector 40; and an aperture stop 100 is provided between the fifth reflector 60 and the galvanometer 80.
[0044] The first optical path adjustment aperture 150 can be an aperture structure capable of adjusting the optical path of the beam output from the second reflector 30 to the beam expander 70 to ensure the collimation of the beam after the second transmission direction adjustment. The second optical path adjustment aperture 160 can be an aperture structure capable of adjusting the optical path of the beam output from the beam expander 70 to the third reflector 40 to ensure the collimation of the beam after the diameter is enlarged. The aperture stop 100 can be a constraint structure capable of adjusting the throughput, shape, and quality of the beam output from the fifth reflector 60 to the galvanometer 80.
[0045] The vertical adjustment unit 110 is connected to the fifth reflecting mirror 60, the galvanometer 80 and the focusing objective lens 90, and can drive the fifth reflecting mirror 60, the galvanometer 80 and the focusing objective lens 90 to adjust their positions along the height direction of the optical path adjustment mechanism; the reflecting mirror adjustment seat 130, which is provided on the mounting base 120, is connected to the first reflecting mirror 20, the second reflecting mirror 30, the third reflecting mirror 40, the fourth reflecting mirror 50 and the fifth reflecting mirror 60.
[0046] The vertical adjustment unit 110 can be disposed on one side of the fifth reflecting mirror 60, galvanometer 80, and focusing objective lens 90, and can drive the fifth reflecting mirror 60, galvanometer 80, and focusing objective lens 90 to adjust their positions along their respective height directions, so as to adjust the light beam transmitted through the fifth reflecting mirror 60, galvanometer 80, and focusing objective lens 90. The mounting base 120 is a functional structure that provides support and load-bearing function for the reflecting mirror adjustment seat 130. The reflecting mirror adjustment seat 130 can be a functional structure that provides support and load-bearing function for the first reflecting mirror 20, second reflecting mirror 30, third reflecting mirror 40, fourth reflecting mirror 50, and fifth reflecting mirror 60.
[0047] Optionally, the vertical adjustment unit 110 includes a high-precision servo motor 1110 and a servo motor mounting plate 1120, with the high-precision servo motor 1110 mounted on the servo motor mounting plate 1120.
[0048] The sealing unit 140 includes a sealing cylinder 1410, a sealing cover 1420, and a sealing ring 1430. The sealing cylinder 1410 is disposed between the first reflector 20 and the second reflector 30, the sealing cover 1420 is disposed between the beam expander 70 and the fifth reflector 60, and the sealing ring 1430 is disposed between the light source 10 and the first reflector 20, and between the second reflector 20 and the beam expander 70.
[0049] The sealing unit 140 can be a functional unit that provides a sealed space for the light beam output from the first reflector 20 to the second reflector 30 and the light beam output from the beam expander 70 to the fifth reflector 60, thereby ensuring the cleanliness of the internal optical path. The sealing cylinder 1410 can be a functional structure that provides a sealed optical path space for the light beam between the first reflector 20 and the second reflector 30, thereby ensuring the cleanliness of the internal optical path. The sealing cover 1420 can be a functional structure that provides a sealed optical path space for the light beam between the beam expander 70 and the fifth reflector 60, thereby ensuring the cleanliness of the internal optical path. The sealing ring 1430 can be a functional structure that provides a sealed optical path space for the light beam between the light source 10 and the first reflector 20, and between the second reflector 20 and the beam expander 70, thereby ensuring the cleanliness of the internal optical path.
[0050] When optical processing is required on the workpiece 200, such as Figure 4 As shown, the beam output from the light source 10 undergoes a first beam transmission direction adjustment under the action of the detachable first reflecting mirror 20, followed by a second beam transmission direction adjustment under the action of the detachable second reflecting mirror 30, then beam diameter expansion under the action of the detachable beam expander 70, a third beam transmission direction adjustment under the action of the detachable third reflecting mirror 40, a fourth beam transmission direction adjustment under the action of the detachable fourth reflecting mirror 50, a fifth beam transmission direction adjustment under the action of the detachable fifth reflecting mirror 60, and a sixth beam transmission direction adjustment under the action of the galvanometer 80, until the beam transmission direction is parallel to and opposite to the beam transmission direction output from the light source 10 before being incident on the focusing objective lens 90, and focused under the action of the focusing lens and applied to the workpiece 200 to be processed.
[0051] The arrangement of the first reflector 20, the second reflector 30, the third reflector 40, the fourth reflector 50, and the fifth reflector 60 forms a U-shaped optical path structure, effectively saving space occupied by the optical path adjustment mechanism. The optical components (such as reflectors, beam expanders 70, etc.) adopt a detachable modular design, which facilitates quick replacement and adjustment. Moreover, for lasers of different wavelengths, only the corresponding optical components need to be replaced, without redesigning the entire optical path, thus improving the versatility and flexibility of the equipment.
[0052] Furthermore, the optical path can be quickly and accurately adjusted by adjusting the optical path through the optical path adjustment apertures (such as the first optical path adjustment aperture 150 and the second optical path adjustment aperture 160) and the reflector adjustment seat 130, ensuring the collimation and stability of the laser beam. The use of the mounting base 120 (such as a marble base) and the vertically arranged high-precision servo motor 1110 ensures the stability of the optical path during long-term operation. All connections of the optical path are sealed with sealing rings 1430, and the parts with large spans and those that need to move are sealed with sealing cylinders 1410 and flexible sealing covers 1420 to ensure the cleanliness of the inside of the optical path.
[0053] This application also provides a laser processing head, which includes the optical path adjustment mechanism described in the above embodiments.
[0054] This application also provides a processing device, which includes the optical path adjustment mechanism described in the above embodiments.
[0055] The division of the various modules in the above-described optical path adjustment mechanism is only for illustrative purposes. In other embodiments, the optical path adjustment mechanism can be divided into different modules as needed to complete all or part of the functions of the above-described optical path adjustment mechanism.
[0056] The optical path adjustment mechanism, laser processing head, and processing equipment provided in the above embodiments, when optical processing of the workpiece is required, the beam output from the light source undergoes a first beam transmission direction adjustment under the action of a detachable first reflecting mirror, followed by a second beam transmission direction adjustment under the action of a detachable second reflecting mirror, then beam diameter expansion under the action of a detachable beam expander, a third beam transmission direction adjustment under the action of a detachable third reflecting mirror, a fourth beam transmission direction adjustment under the action of a detachable fourth reflecting mirror, a fifth beam transmission direction adjustment under the action of a detachable fifth reflecting mirror, and a sixth beam transmission direction adjustment under the action of a galvanometer mirror, until the beam transmission direction is parallel to and opposite to the beam transmission direction output from the light source before being incident on the focusing lens, and focused on the workpiece under the action of the focusing lens. Through the detachable design of each reflecting mirror and beam expander, the optical path components can be replaced to adapt to different light sources (such as lasers of different wavelengths) without redesigning the optical path structure, effectively improving the working efficiency of the optical processing equipment, and has significant economic value and practical application value.
[0057] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.
[0058] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the patent application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this patent application should be determined by the appended claims.
Claims
1. An optical path adjusting mechanism characterized by comprising: include: A light source used to output a beam of light; A first reflector disposed on one side of the light source, a second reflector disposed on one side of the first reflector, a beam expander and a third reflector disposed sequentially on one side of the second reflector, a fourth reflector disposed on one side of the third reflector, and a fifth reflector disposed on one side of the fourth reflector, wherein the first reflector, the second reflector, the third reflector, the fourth reflector, the fifth reflector and the beam expander are all detachable; A galvanometer is disposed on one side of the fifth reflecting mirror, and a focusing objective is disposed on one side of the galvanometer. The focusing objective is directly facing the workpiece to be processed. The transmission direction of the light beam output from the light source is parallel to and opposite to the transmission direction of the light beam output from the galvanometer.
2. The optical path adjusting mechanism according to claim 1, characterized by, The transmission direction of the light beam output through the light source is parallel to the transmission direction of the light beam output through the second reflector.
3. The optical path adjusting mechanism according to claim 1, wherein The propagation direction of the light beam output via the third reflector is parallel to the propagation direction of the light beam output via the fifth reflector.
4. The optical path adjusting mechanism according to claim 1, wherein A first optical path adjustment aperture is provided between the second reflector and the beam expander, and a second optical path adjustment aperture is provided between the beam expander and the third reflector.
5. The optical path adjusting mechanism according to claim 1, wherein An aperture is provided between the fifth reflecting mirror and the galvanometer.
6. The optical path adjusting mechanism according to claim 1, wherein The optical path adjustment mechanism further includes: The vertical adjustment unit is connected to the fifth reflecting mirror, the galvanometer, and the focusing objective lens, and can drive the fifth reflecting mirror, the galvanometer, and the focusing objective lens to adjust their positions along the height direction of the optical path adjustment mechanism.
7. The optical path adjusting mechanism according to claim 1, wherein The optical path adjustment mechanism further includes: Mounting base; The reflector adjustment seat, which is disposed on the mounting base, is connected to the first reflector, the second reflector, the third reflector, the fourth reflector, and the fifth reflector.
8. The optical path adjusting mechanism according to claim 1, wherein The optical path adjustment mechanism further includes: The sealing unit includes a sealing cylinder and a sealing cover. The sealing cylinder is disposed between the first reflector and the second reflector, and the sealing cover is disposed between the beam expander and the fifth reflector.
9. A laser processing head, characterized in that, include: The optical path adjustment mechanism as described in any one of claims 1 to 8.
10. A processing device, characterized in that, include: The optical path adjustment mechanism as described in any one of claims 1 to 8.