A high-stability photolithography plate transport mechanism for a photolithography machine

Abstract

This utility model discloses a high-stability photolithography plate transport mechanism for a lithography machine, relating to the field of photolithography plate transport technology. It includes a lithography machine body, with a transport assembly inside the machine body. A placement stage is located on top of the transport assembly, and a positioning assembly is located on top of the placement stage. This high-stability photolithography plate transport mechanism uses a rodless cylinder to activate external compressed gas, which drives a magnet, causing the magnet inside the slide to move synchronously. This enables rapid movement of the slide, which in turn moves the support stage. The mechanism is responsive and smooth, significantly improving work efficiency. The support stage slides along roller grooves within the transport stage using mounted rollers. This design reduces friction during movement, making it smoother and more stable. The precise sliding structure ensures the accuracy and stability of the support stage's movement, improving the overall transport precision and providing a reliable guarantee for the stable execution of subsequent processes.

Description

Technical Field

[0001] This utility model relates to the field of photolithography plate transfer technology, specifically a high-stability photolithography plate transfer mechanism for photolithography machines. Background Technology

[0002] The lithography plate transport device is the core system for achieving precise transport and positioning of lithography plates in the lithography process. Its structure is designed with high precision, high cleanliness, and high stability as its goals. The device mainly consists of three parts: a mechanical transport module, a pre-alignment unit, and a dynamic positioning platform. The mechanical transport module uses a vacuum robot or a clean robot to grasp the lithography plate through the edge of a U-shaped vacuum suction frame. The pre-alignment unit uses optical sensors to detect the edge marks of the lithography plate and uses a multi-axis motor to achieve initial angle and position correction. The dynamic positioning platform adopts a double-layer structure, with the bottom layer being the drive stage, which is driven by a linear motor to achieve rapid positioning with a large stroke. This device provides a reliable dynamic management solution for lithography plates through the collaboration of mechanical, electrical, and optical disciplines.

[0003] In existing photolithography transport mechanisms, the workpiece stage and mask stage need to complete the stepping scanning motion at extremely high acceleration. The large inertia of the moving parts will generate strong inertial forces, causing mechanical vibration. If the vibration isolation system is not designed properly, the vibration will be directly transmitted to the transport components and thus affect the transport of the photolithography. Therefore, we need a highly stable photolithography transport mechanism for photolithography machines. Utility Model Content

[0004] The purpose of this invention is to provide a high-stability photolithography plate transport mechanism for a photolithography machine, so as to solve the existing problems mentioned in the background art.

[0005] To achieve the above objectives, this utility model provides the following technical solution: a high-stability photolithography plate conveying mechanism for a photolithography machine, comprising a photolithography machine body, a conveying component disposed inside the photolithography machine body, a placement stage disposed on the top of the conveying component, a positioning component disposed on the top of the placement stage, a photolithography plate disposed on the top of the positioning component, the conveying component comprising a support leg frame, a conveying platform fixedly connected to the top of the support leg frame, a roller groove provided on the conveying platform, a rodless cylinder disposed on one side of the conveying platform, a slide table slidably connected to the outer wall of the rodless cylinder, a support platform slidably connected to the outer wall of the slide table, and an mounting roller installed at the bottom of the support platform, the mounting roller being adapted to the roller groove.

[0006] Preferably, the rodless cylinder forms a pushing structure through a slide and a support platform, and the magnet inside the cylinder body of the rodless cylinder attracts the magnet inside the slide, and the slide is slidably connected to the outer wall of the cylinder body.

[0007] Preferably, the support platform forms a movable structure with the conveyor platform by means of mounting rollers, and the support platform moves within the roller grooves by means of the mounting rollers.

[0008] Preferably, the positioning component includes a turntable, which is rotatably connected to the placement platform. A movable rod is hinged to the top of the turntable, and a movable plate is hinged to the end of the movable rod away from the turntable. A spring is provided between the movable plate and the placement platform. A mounting base is fixedly connected to the top of the movable plate. A motor is provided on one side of the mounting base. A bidirectional screw is fixedly connected to the output end of the motor via a coupling. A movable seat is threadedly connected to the outer wall of the bidirectional screw. A slide rail is provided on the placement platform, and a support plate is fixedly connected to one side of the movable seat.

[0009] Preferably, the turntable and the movable plate form a linkage structure through a movable rod, and the two ends of the movable rod are respectively hinged to the turntable and the movable plate, and the movable plate is connected to the placement platform by means of a spring.

[0010] Preferably, the movable seat forms an engaging structure with the photolithography plate via a support plate, and there are four support plates, which are respectively arranged around the photolithography plate.

[0011] Preferably, the motor forms a threaded transmission structure with the movable seat via a bidirectional screw, and the outer diameter of the bidirectional screw matches the inner diameter of the movable seat. The outer wall of the bidirectional screw fits against the inner wall of the movable seat, and the movable seat moves along the slide rail.

[0012] Compared with the prior art, the beneficial effects of this utility model are: a high-stability photolithography plate transport mechanism for a photolithography machine,

[0013] (1) By starting the rodless cylinder, the magnet is driven by external compressed gas, which drives the magnet inside the slide table to move synchronously. This enables the slide table to move quickly, and the support table to move accordingly. The response is rapid and the action is smooth, which greatly improves the work efficiency. The support table slides along the roller groove inside the conveyor table by installing rollers. This design reduces the friction during the movement, making the movement more stable and smooth. At the same time, the precise sliding structure ensures the accuracy and stability of the support table movement, which is conducive to improving the precision of the entire conveying process and providing a reliable guarantee for the stable development of subsequent processes.

[0014] (2) By moving the mounting base to drive the moving plate to squeeze the spring and pull the movable rod to make the turntable rotate, the distance between the two moving plates can be flexibly adjusted, which can be adapted to the placement of photomasks of different sizes, enhancing the versatility and applicability of the equipment. On the other hand, when placing, the starting motor drives the bidirectional screw to rotate, causing the moving base to slide on the slide rail, which can quickly position the photomask. This combination of mechanical adjustment and motor-driven positioning is convenient to operate, which not only improves the efficiency of photomask placement, but also effectively improves the stability of positioning and ensures the accuracy of subsequent processing. Attached Figure Description

[0015] Figure 1 This is a schematic diagram of the main structure of the present utility model;

[0016] Figure 2 This is a schematic diagram of the conveyor table and roller groove structure of this utility model;

[0017] Figure 3 This is a schematic diagram of the placement platform and mounting base of this utility model;

[0018] Figure 4 This is a schematic diagram of the placement platform and support platform of this utility model;

[0019] Figure 5 This is a schematic diagram of the turntable and moving plate structure of this utility model;

[0020] Figure 6 This is a schematic diagram of the positioning component structure of this utility model.

[0021] In the diagram: 1. Lithography machine body; 2. Conveying assembly; 201. Support leg frame; 202. Conveying table; 203. Roller groove; 204. Rodless cylinder; 205. Slide table; 206. Support table; 207. Mounting roller; 3. Placement table; 4. Positioning assembly; 401. Turntable; 402. Movable rod; 403. Moving plate; 404. Spring; 405. Mounting base; 406. Motor; 407. Bidirectional screw; 408. Moving base; 409. Slide rail; 410. Support plate; 5. Lithography plate. Detailed Implementation

[0022] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0023] This utility model embodiment provides a high-stability photolithography plate transport mechanism for a photolithography machine, such as... Figure 1 , Figure 2and Figure 4 As shown, the system includes a lithography machine body 1, an internal conveying assembly 2, a placement stage 3 on top of the conveying assembly 2, a positioning assembly 4 on top of the placement stage 3, and a lithography plate 5 placed on top of the positioning assembly 4. The conveying assembly 2 includes a support leg 201, a conveyor table 202 fixedly connected to the top of the support leg 201, a roller groove 203 on the conveyor table 202, a rodless cylinder 204 on one side of the conveyor table 202, a slide table 205 slidably connected to the outer wall of the rodless cylinder 204, and a support... The support platform 206 has mounting rollers 207 installed at its bottom, and the mounting rollers 207 are adapted to the roller grooves 203. By activating the rodless cylinder 204, compressed gas from the outside can be delivered into the cylinder to drive the magnet to move, and can also drive the magnet inside the slide 205 to move synchronously, thereby achieving rapid movement of the slide 205. The slide 205 can then drive the support platform 206 to move, allowing the support platform 206 to slide along the roller grooves 203 inside the conveyor platform 202 by means of the mounting rollers 207.

[0024] Furthermore, such as Figure 2 As shown, the rodless cylinder 204 forms a pushing structure with the slide 205 and the support platform 206. The magnet inside the cylinder body of the rodless cylinder 204 attracts the magnet inside the slide 205. The slide 205 is sleeved on the outer wall of the cylinder body for sliding connection. The slide 205 can move along the outer wall of the cylinder body under the drive of the rodless cylinder 204, thereby driving the support platform 206 to adjust its position.

[0025] Furthermore, such as Figure 4 As shown, the support platform 206 forms a movable structure with the conveyor platform 202 by means of the mounting rollers 207, and the support platform 206 moves in the roller groove 203 by means of the mounting rollers 207. By setting the mounting rollers 207 to fit into the roller groove 203 for installation, the support platform 206 can move stably along the conveyor platform 202 by means of the bottom mounting rollers 207.

[0026] In a further preferred embodiment of this utility model, such as Figure 1 , Figure 3 , Figure 4 and Figure 6As shown, the positioning component 4 includes a turntable 401, which is rotatably connected to the placement platform 3. A movable rod 402 is hinged to the top of the turntable 401, and a movable plate 403 is hinged to the end of the movable rod 402 away from the turntable 401. A spring 404 is provided between the movable plate 403 and the placement platform 3. A mounting base 405 is fixedly connected to the top of the movable plate 403. A motor 406 is provided on one side of the mounting base 405. A double-acting screw 407 is fixedly connected to the output end of the motor 406 via a coupling. A movable seat 408 is threadedly connected to the outer wall of the double-acting screw 407. A slide rail 409 is provided on the placement platform 3. A support plate 410 is fixedly connected to one side of the movable seat 408. By moving the mounting bases 405 on both sides, the two... The mounting base 405 on the side drives the bottom movable plate 403 to move, which allows the movable plate 403 to compress the spring 404 and pull the movable rod 402 to move, and drive the turntable 401 to rotate. At this time, it is convenient to adjust the distance between the two movable plates 403, which is convenient for placing photomasks 5 of different sizes. During the placement process, the motor 406 is started at the same time, which drives the bidirectional screw 407 to rotate. The bidirectional screw 407 rotates inside the matching threaded sleeve in the movable base 408, which allows the movable base 408 to slide along the outer wall of the slide rail 409, thereby achieving rapid positioning of the photomask 5 and improving positioning stability.

[0027] Furthermore, such as Figure 5 As shown, the turntable 401 forms a linkage structure with the movable plate 403 through the movable rod 402. The two ends of the movable rod 402 are hinged to the turntable 401 and the movable plate 403 respectively. The movable plate 403 is connected to the placement platform 3 by means of the spring 404. With the support of the spring 404, the movable plate 403 can drive the movable rod 402 to move and push the turntable 401 to rotate, so as to achieve the purpose of adjusting the distance between the movable plates 403 on both sides at the same time.

[0028] Furthermore, such as Figure 6 As shown, the movable base 408 forms a locking structure with the photomask 5 through the support plate 410, and there are four support plates 410. The four support plates 410 are respectively arranged around the photomask 5. By setting the support plates 410 around the photomask 5, the positions of the four support plates 410 can be adjusted when the position of the movable base 408 is adjusted, so as to facilitate the positioning and installation of photomasks 5 of different sizes.

[0029] Furthermore, such as Figure 6As shown, the motor 406 forms a threaded transmission structure with the movable seat 408 via the bidirectional screw 407, and the outer diameter of the bidirectional screw 407 matches the inner diameter of the movable seat 408. The outer wall of the bidirectional screw 407 is fitted against the inner wall of the movable seat 408, and the movable seat 408 moves along the slide rail 409. The motor 406 can drive the bidirectional screw 407 to transmit power within the movable seat 408, allowing the movable seat 408 to slide along the outer wall of the slide rail 409.

[0030] Working principle: During use, by moving the mounting seats 405 on both sides, the bottom movable plate 403 can be moved. The movable plate 403 compresses the spring 404, simultaneously pulling the movable rod 402 and causing the turntable 401 to rotate. At this time, the distance between the two movable plates 403 can be adjusted to facilitate the placement of photolithography plates 5 of different sizes. During placement, the motor 406 is started simultaneously, driving the bidirectional screw 407 to rotate, so that the bidirectional screw 407 matches within the movable seat 408. The threaded sleeve rotates inside, and the moving seat 408 slides along the outer wall of the slide rail 409, thereby enabling rapid positioning of the photomask 5 and improving positioning stability. At the same time, when transporting the photomask 5, the rodless cylinder 204 can be activated, and the magnet is driven by the external compressed gas supplied to the cylinder. This drives the magnet inside the slide table 205 to move synchronously, enabling the slide table 205 to move rapidly. The slide table 205 drives the support table 206 to move, and the support table 206 slides along the roller groove 203 inside the conveyor table 202 by the mounting rollers 207.

[0031] It will be apparent to those skilled in the art that this invention is not limited to the details of the exemplary embodiments described above, and that it can be implemented in other specific forms without departing from the spirit or essential characteristics of this invention. Therefore, the embodiments should be considered illustrative and non-limiting in all respects, and the scope of this invention is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within this invention. No reference numerals in the claims should be construed as limiting the scope of the claims.

Claims

1. A high-stability photolithography plate transport mechanism for a photolithography machine, comprising a photolithography machine body (1), characterized in that: The lithography machine body (1) is equipped with a conveying assembly (2) inside. A placement stage (3) is provided on the top of the conveying assembly (2). A positioning assembly (4) is provided on the top of the placement stage (3). A photomask (5) is placed on the top of the positioning assembly (4). The conveying assembly (2) includes a support leg frame (201). A conveying platform (202) is fixedly connected to the top of the support leg frame (201). A roller groove (203) is provided on the conveying platform (202). A rodless cylinder (204) is provided on one side of the conveying platform (202). A slide table (205) is slidably connected to the outer wall of the rodless cylinder (204). A support platform (206) is slidably connected to the outer wall of the slide table (205). An installation roller (207) is installed at the bottom of the support platform (206), and the installation roller (207) is adapted to the roller groove (203).

2. The high-stability photolithography plate conveying mechanism for a photolithography machine according to claim 1, characterized in that: The rodless cylinder (204) forms a pushing structure through the slide (205) and the support platform (206). The magnet inside the cylinder body of the rodless cylinder (204) attracts the magnet inside the slide (205), and the slide (205) is sleeved on the outer wall of the cylinder body for sliding connection.

3. The high-stability photolithography plate conveying mechanism for a photolithography machine according to claim 1, characterized in that: The support platform (206) forms a movable structure with the conveyor platform (202) by means of the mounting rollers (207), and the support platform (206) moves in the roller groove (203) by means of the mounting rollers (207).

4. The high-stability photolithography plate conveying mechanism for a photolithography machine according to claim 1, characterized in that: The positioning component (4) includes a turntable (401), and the turntable (401) is rotatably connected to the placement platform (3). A movable rod (402) is hinged to the top of the turntable (401). A movable plate (403) is hinged to the end of the movable rod (402) away from the turntable (401). A spring (404) is provided between the movable plate (403) and the placement platform (3). A mounting base (405) is fixedly connected to the top of the movable plate (403). A motor (406) is provided on one side of the mounting base (405). A bidirectional screw (407) is fixedly connected to the output end of the motor (406) through a coupling. A movable seat (408) is threadedly connected to the outer wall of the bidirectional screw (407). A slide rail (409) is provided on the placement platform (3). A support plate (410) is fixedly connected to one side of the movable seat (408).

5. A high-stability photolithography plate conveying mechanism for a photolithography machine according to claim 4, characterized in that: The turntable (401) is linked to the movable plate (403) via the movable rod (402), and the two ends of the movable rod (402) are hinged to the turntable (401) and the movable plate (403) respectively. The movable plate (403) is connected to the placement platform (3) by means of a spring (404).

6. The high-stability photolithography plate conveying mechanism for a photolithography machine according to claim 4, characterized in that: The movable seat (408) forms a locking structure with the photomask (5) through the support plate (410), and there are four support plates (410), which are respectively arranged around the photomask (5).

7. A high-stability photolithography plate conveying mechanism for a photolithography machine according to claim 4, characterized in that: The motor (406) forms a threaded transmission structure with the movable seat (408) through the bidirectional screw (407), and the outer diameter of the bidirectional screw (407) matches the inner diameter of the movable seat (408). The outer wall of the bidirectional screw (407) is fitted to the inner wall of the movable seat (408), and the movable seat (408) moves along the slide rail (409).

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