Air flotation rotary device and epitaxial growth equipment

Abstract

This invention provides an air-floating rotation device and an epitaxial growth apparatus. The air-floating rotation device includes a tray for placing a substrate, a positioning post, a base, and a support plate. The base has an air inlet channel and an air outlet connected to the air inlet channel. The support plate is connected to the base via the positioning post. A tray is provided on the side of the support plate facing away from the base, and a set of inclined grooves is provided on the side of the support plate facing the base. The inclined grooves are used to suspend and rotate the support plate after the gas is discharged through the air outlet. This invention uses inclined grooves on the support plate as a rotating air channel, which is easier to process than irregularly shaped guide grooves. At the same time, the design of separating the support plate and the tray, with no groove structure on the tray, ensures the strength and flatness of the tray and effectively avoids bending and deformation of the tray and its gasket.

Description

Technical Field

[0001] This utility model belongs to the field of epitaxial growth technology, and more specifically, it relates to an air flotation rotating device and an epitaxial growth equipment. Background Technology

[0002] Silicon carbide epitaxial growth refers to the growth of a single-crystal layer with specific requirements and the same crystal orientation as the silicon carbide substrate on a silicon carbide substrate. The most commonly used process for growing epitaxial layers is chemical vapor deposition (CVD). The principle involves heating the substrate in a reaction chamber and introducing a silicon-containing reactive gas. Silicon atoms produced by the reduction or thermal decomposition of the silicon reactive gas grow epitaxially on the silicon surface of the substrate. In this process, the uniformity of the deposited film is mainly affected by the gas distribution within the furnace. In actual production, the uniformity of the gas flow field within the furnace is difficult to guarantee due to various factors. To improve coating uniformity, a rotating air-floating tray process is generally used.

[0003] There are two main types of air flotation transmission methods for existing air flotation pallets: one relies on the frictional force of gas flow to rotate the air flotation pallet, and the other relies on pneumatic force to rotate the air flotation pallet. Currently, the latter is the more common method. In the pneumatically driven scheme, a rotating air channel is set on the back of the air flotation pallet. When the airflow pushes the air flotation pallet upward, the rotating air channel is used to rotate the air flotation pallet. In order to make the air flotation pallet rotate smoothly, the existing technology has a relatively complex design for the rotating air channel, such as irregularly shaped guide grooves, which is inconvenient to manufacture and has a high cost. In addition, because the air flotation pallet is relatively thin, the manufacturing of the rotating air channel results in low strength of the air flotation pallet, making it prone to deformation. Utility Model Content

[0004] The purpose of this utility model is to provide an air flotation rotation device and an epitaxial growth equipment to solve the problem in the prior art that the air flotation tray is easy to deform due to the large processing difficulty and irregular flow channel on the surface of the air flotation tray.

[0005] To achieve the above objectives, the technical solution adopted by this utility model is as follows:

[0006] This utility model first provides an air-floating rotation device, including a tray for placing a substrate, a positioning post, and a base. The base has an air inlet channel and an air outlet communicating with the air inlet channel. The device is characterized by further including a support plate, which is connected to the base through the positioning post. A tray is provided on the side of the support plate facing away from the base, and an inclined groove group is provided on the side of the support plate facing the base. The inclined groove group is used to suspend and rotate the support plate after the gas is discharged through the air outlet.

[0007] Furthermore, multiple inclined grooves in the inclined groove group are located in the edge area of ​​the bearing plate and are arranged at intervals around the central area of ​​the bearing plate.

[0008] Furthermore, the projection shape of the inclined groove on the bearing plate is fan-shaped.

[0009] Furthermore, multiple air outlets are provided, and these multiple air outlets are arranged at intervals along the axial direction of the air intake channel.

[0010] Furthermore, multiple air vents are inclined in the same clockwise or counterclockwise direction.

[0011] Furthermore, it also includes a retaining ring for securing the substrate, which is fitted around the edge of the tray.

[0012] Furthermore, it also includes protective components, which include multiple protective plates disposed on the base and arranged around the support plate.

[0013] This utility model also provides an epitaxial growth device, including a cover plate, a side plate and an air flotation rotation device as described above. The cover plate, the side plate and the base together enclose a process chamber, and the tray is located in the process chamber.

[0014] Furthermore, it also includes a first arc-shaped plate and a second arc-shaped plate. The first arc-shaped plate is disposed on the side of the cover plate facing away from the process chamber, and the first arc-shaped plate and the cover plate enclose to form a first hollow cavity. The second arc-shaped plate is disposed on the side of the base facing away from the process chamber, and the second arc-shaped plate and the base enclose to form a second hollow cavity.

[0015] Furthermore, it also includes a first thermal insulation cover and a second thermal insulation cover, the first thermal insulation cover covering the first arc-shaped plate, and the second thermal insulation cover covering the second arc-shaped plate.

[0016] Compared with the prior art, the beneficial effects of the air flotation rotation device and epitaxial growth equipment provided by this utility model are as follows: This utility model uses a sloping groove on the support plate as a rotating air channel, which is easier to process than an irregularly shaped guide groove; at the same time, through the design of separating the support plate and the tray, the tray has no groove structure, which ensures the strength and flatness of the tray and effectively avoids the bending and deformation of the tray and its liner. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in the embodiments of this utility model, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0018] Figure 1 This is an exploded view of the epitaxial growth equipment in this utility model;

[0019] Figure 2 This is a cross-sectional schematic diagram of the epitaxial growth equipment in this utility model;

[0020] Figure 3 This is a three-dimensional schematic diagram of the base and the second arc-shaped plate assembled in this utility model;

[0021] Figure 4 This is a side view of the base and the second arc-shaped plate after assembly in this utility model;

[0022] Figure 5 This is a side view of the carrier plate in this utility model;

[0023] Figure 6 This is a bottom view of the support plate in this utility model;

[0024] The main markings in the attached figures are as follows:

[0025] 1. Cover plate; 2. Pallet; 3. Base; 4. Support plate; 5. Positioning post; 6. Retaining ring; 7. Protective components;

[0026] 31. Air inlet channel; 32. Air outlet; 41. sloping groove; 51. Mounting hole; 81. First arc-shaped plate; 82. Second arc-shaped plate; 91. First thermal insulation cover; 92. Second thermal insulation cover. Detailed Implementation

[0027] To make the technical problems, technical solutions, and beneficial effects of this utility model clearer, the present utility model will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present utility model and are not intended to limit the present utility model.

[0028] Please refer to the following: Figure 1 and Figure 2 The epitaxial growth equipment proposed in this utility model mainly includes an air-floating rotation device, a cover plate 1, and side plates. The air-floating rotation device mainly includes a tray 2, a base 3, a bearing plate 4, and a positioning column 5. The cover plate 1, the side plates, and the base 3 together enclose a process chamber, and the tray 2 is located inside the process chamber.

[0029] like Figures 2 to 6 As shown, in the air flotation rotating device, the base 3 has an air inlet channel 31 and multiple air outlets 32 connected to the air inlet channel 31. The bearing plate 4 is connected to the base 3 through a positioning column 5. A tray 2 is provided on the side of the bearing plate 4 facing away from the base 3. An inclined groove group is provided on the side of the bearing plate 4 facing the base 3. The inclined groove group consists of multiple inclined grooves 41. The inclined groove group is used to make the bearing plate 4 suspend and rotate after the gas is discharged through the air outlets 32.

[0030] It should be noted that the substrate is placed on tray 2, which in turn is placed on carrier plate 4. Carrier plate 4 and tray 2 are fixedly connected by a snap-fit ​​mechanism. Carrier plate 4 is mounted on base 3 via positioning pins 5. Both carrier plate 4 and base 3 have a mounting hole 51 at their center, and the positioning pins 5 are installed within these holes 51, thus connecting base 3 and carrier plate 4. Tray 2 can be made of graphite material, which has good thermal conductivity. Carrier plate 4 can be made of a high-strength material, facilitating the machining of the inclined groove 41.

[0031] During ventilation, gas enters through the air inlet channel 31 in the base 3 and is blown towards the support plate 4 through the air outlet 32. Since the support plate 4 has a set of inclined grooves, it is driven by pneumatic force. The pneumatic force generates a component force in the inclined groove 41. The vertical component force lifts the support plate 4, and the tangential component force (i.e., the horizontal component force perpendicular to the radius of the support plate) generates a torque on the support plate 4, causing it to rotate. The rotation of the support plate 4 drives the tray 2 and the pads on it to rotate.

[0032] In addition, a gap is left between the inner wall of the base 3 and the side circumference of the bearing plate 4, so that the bearing plate 4 will not come into contact with the inner wall of the base 3 when it rotates, thus ensuring the smooth rotation of the bearing plate 4 and extending its service life.

[0033] This utility model uses a sloping groove 41 on the bearing plate 4 as a rotating air passage. Compared with the irregular guide groove, the sloping groove 41 is easier to process. At the same time, the bearing plate 4 and the tray 2 are separated by design, and the tray 2 has no groove structure, which ensures the strength and flatness of the tray 2 and effectively avoids the bending and deformation of the tray 2 and the gasket on it.

[0034] like Figure 6 As shown, multiple inclined grooves 41 are located in the edge area of ​​the bearing plate 4 and are arranged at intervals around the central area of ​​the bearing plate 4, and the projection shape of each inclined groove 41 on the bearing plate 4 is fan-shaped.

[0035] It should be noted that the present invention does not limit the number of inclined grooves 41. Preferably, the inclined groove group consists of 10 inclined grooves 41. The plane on which the inclined groove 41 is located coincides with one radius of the bearing plate 4, and the plane on which the inclined groove 41 is located forms a certain angle with the surface of the bearing plate 4, that is, the inclination angle of the inclined groove 41. The present invention also does not limit the inclination angle of the inclined groove 41.

[0036] This invention positions the inclined groove 41 at a larger radius of the support plate 4, rather than at the center. The same amount of air force will generate a larger torque at a larger radius, making it easier to drive the support plate 4 to rotate. Furthermore, the inclined groove 41 adopts a fan-shaped structure, which makes airflow guidance more efficient and can evenly distribute gas pressure, thereby providing a more stable rotational torque.

[0037] like Figure 3, Figure 4 As shown, multiple air outlets 32 are provided, and the multiple air outlets 32 are arranged at intervals along the axial direction of the air intake channel 31. The multiple air outlets 32 are inclined in the same clockwise or counterclockwise direction.

[0038] It should be noted that the present invention does not limit the number of air outlets 32. Preferably, there are two air outlets 32, and the inclination direction of the two air outlets 32 is symmetrical about the radial direction of the air inlet channel 31 to achieve oblique air outlet.

[0039] This invention, by arranging multiple air outlets 32 at intervals along the axial direction of the air inlet channel 31, makes it easier to achieve the suspension and rotation of the support plate 4. In addition, the multiple air outlets 32 can be tilted in the same clockwise or counterclockwise direction to further optimize the tangential force distribution of the airflow, ensure the continuity and balance of the rotational torque, and thus make the rotation of the support plate 4 more stable.

[0040] like Figure 1 , Figure 2 As shown, the air-floating rotation device also includes a fixing ring 6 for fixing the substrate. The fixing ring 6 is sleeved on the edge of the tray 2 and can be made of graphite material, which has good thermal conductivity. By adding the fixing ring 6, this invention prevents the substrate from shifting due to centrifugal force or airflow disturbance during rotation, thus ensuring the positioning accuracy of the epitaxial layer deposition.

[0041] like Figure 1 As shown, the air-floating rotation device also includes a protective component 7, which comprises multiple protective plates arranged on the base 3 and surrounding the support plate 4. The number and shape of the protective plates can be set according to actual needs. Preferably, the protective component 7 consists of 5 protective plates of different shapes, each of which provides protection for the base 3.

[0042] In addition, such as Figure 1 , Figure 2 As shown, the epitaxial growth equipment also includes a first arc plate 81 and a second arc plate 82. The first arc plate 81 is disposed on the side of the cover plate 1 facing away from the process chamber, and the first arc plate 81 and the cover plate 1 enclose to form a first hollow cavity. The second arc plate 82 is disposed on the side of the base 3 facing away from the process chamber, and the second arc plate 82 and the base 3 enclose to form a second hollow cavity.

[0043] It should be noted that the first arc-shaped plate 81 and the cover plate 1 can be detachably connected or integrally formed, and the second arc-shaped plate 82 and the base 3 can also be detachably connected or integrally formed. Heating wires can be provided on the first arc-shaped plate 81, the second arc-shaped plate 82, the cover plate 1, and the base 3 to create a high-temperature environment to heat the process gas entering the process chamber, thereby facilitating the epitaxial process of the substrate. Simultaneously, the first arc-shaped plate 81 and the cover plate 1 enclose a first hollow cavity, and the second arc-shaped plate 82 and the base 3 enclose a second hollow cavity, satisfying the high-temperature environment required for the epitaxial process while also making it easier to integrate other auxiliary equipment, such as temperature sensors, thus improving adaptability.

[0044] In addition, such as Figure 1 , Figure 2 As shown, the epitaxial growth equipment also includes a first thermal insulation cover 91 and a second thermal insulation cover 92. The first thermal insulation cover 91 covers the first arc-shaped plate 81, and the second thermal insulation cover 92 covers the second arc-shaped plate 82. By adding the first and second thermal insulation covers 92 to the first and second arc-shaped plates 82 to form a hot wall, a high-temperature and stable thermal field can be easily achieved.

[0045] This invention utilizes an air-floating rotation device comprising an independently designed support plate. A sloping groove is cut into the support plate to serve as the rotation air passage; compared to irregularly shaped guide grooves, the sloping groove is easier to manufacture. During airflow, air force is applied to the sloping groove of the support plate. The vertical component lifts the support plate, while the tangential component generates a torque on the support plate, causing it to rotate.

[0046] The above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.

Claims

1. An air-floating rotation device, comprising a tray for placing a substrate, a positioning post, and a base, wherein the base has an air inlet channel and an air outlet communicating with the air inlet channel, characterized in that, Also includes: The support plate is connected to the base via the positioning column. The tray is provided on the side of the support plate facing away from the base. The support plate has a set of inclined grooves on the side facing the base. The inclined grooves are used to suspend and rotate the support plate after the gas is discharged through the gas outlet.

2. The air-floating rotating device as described in claim 1, characterized in that, In the inclined groove group, multiple inclined grooves are located in the edge area of ​​the bearing plate and are arranged at intervals around the central area of ​​the bearing plate.

3. The air-floating rotating device as described in claim 2, characterized in that, The projection shape of the inclined groove on the bearing plate is fan-shaped.

4. The air-floating rotating device as described in any one of claims 1-3, characterized in that, The air outlet is configured as a plurality of outlets, which are arranged at intervals along the axial direction of the air inlet channel.

5. The air-floating rotating device as described in claim 4, characterized in that, The multiple air vents are arranged at an angle along the same clockwise or counterclockwise direction.

6. The air-floating rotating device as described in claim 1, characterized in that, It also includes a retaining ring for securing the substrate sheet, the retaining ring being fitted around the edge of the tray.

7. The air-floating rotating device as described in claim 1, characterized in that, It also includes a protective assembly comprising a plurality of protective plates disposed on the base and arranged around the support plate.

8. An epitaxial growth apparatus, characterized in that, The device includes a cover plate, a side plate, and an air-floating rotation device as described in any one of claims 1-7, wherein the cover plate, the side plate, and the base together enclose a process chamber, and the tray is located within the process chamber.

9. The epitaxial growth apparatus as described in claim 8, characterized in that, It also includes a first arc-shaped plate and a second arc-shaped plate. The first arc-shaped plate is disposed on the side of the cover plate opposite to the process chamber, and the first arc-shaped plate and the cover plate enclose a first hollow cavity. The second arc-shaped plate is disposed on the side of the base opposite to the process chamber, and the second arc-shaped plate and the base enclose a second hollow cavity.

10. The epitaxial growth apparatus as described in claim 9, characterized in that, It also includes a first thermal insulation cover and a second thermal insulation cover, wherein the first thermal insulation cover covers the first arc-shaped plate and the second thermal insulation cover covers the second arc-shaped plate.

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