Magnetron sputtering vacuum coating machine chamber
CN309125686SActive Publication Date: 2025-02-18CHONGQING OUYITENG INTELLIGENT EQUIP CO LTD
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Patent Information
- Application Number
- CN202430430001.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-07-10
- Publication Date
- 2025-02-18
- Estimated Expiration
- 2039-07-10
Smart Images
Figure 000007_ABST
Abstract
1. The name of the product of this design: magnetron sputtering vacuum coating machine chamber. 2. Purpose of this design product: used as the main chamber structure of a magnetron sputtering vacuum coating machine. 3. The design key point of this appearance design product lies in the shape. 4. The picture or photo that best illustrates the key points of the design: Design 1 Stereoscopic drawing 1. 5. Designate Design 1 as the base design.
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