Substrate processing device

Abstract

To make a turntable lighter with a simple structure while still being able to hold the substrate under normal circumstances.SOLUTION: A switching mechanism does not normally apply the magnetic field of a drive magnet to a rotating magnet 47c, and only applies the magnetic field of the drive magnet to the rotating magnet 47c when a substrate W is being transferred, thereby rotating each movable pin 29 to the transfer position. Therefore, under normal circumstances, each movable pin 29 is rotated to the holding position by the magnetic force from a fixed magnet 57. Only when the substrate W is being transferred, each movable pin 29 is rotated to the transfer position by the magnetic force of the switching mechanism. Since springs, cam plates, lifting plates, etc. are not required, the weight of the turntable can be reduced with a simple configuration.SELECTED DRAWING: Figure 7

Description

[Technical field]

[0001] The present invention relates to a substrate processing apparatus that performs predetermined processing on substrates (hereinafter simply referred to as substrates), such as semiconductor wafers, substrates for liquid crystal displays or organic EL (Electroluminescence) display devices, glass substrates for photomasks, substrates for optical disks, substrates for magnetic disks, ceramic substrates, and substrates for solar cells, while supporting the substrates on a turntable and rotating the substrates. [Background technology]

[0002] Conventionally, this type of device includes a rotating table, a motor, a processing liquid supply nozzle, multiple support pins, a first lifting plate, a spring, a cam plate, a shaft, a second lifting plate, and an air cylinder (see, for example, Patent Document 1).

[0003] The substrate processing apparatus supports the substrate on the upper surface of the turntable by a plurality of support pins. The lower surface of the substrate is spaced apart from the upper surface of the turntable. The substrate processing apparatus supplies a processing liquid from a processing liquid supply nozzle onto the substrate while rotating the substrate together with the turntable by a motor. In this way, the substrate is subjected to a predetermined processing.

[0004] A plurality of support pins are attached to the outer periphery of the rotating table so as to be rotatable around a vertical axis. Each support pin can rotate between a holding position where it abuts and supports the periphery of the substrate and a transfer position where it transfers the substrate. Each holding pin has a shaft attached to it that protrudes horizontally from the body. The shaft is inserted into a hole in the cam plate. The cam plate is connected to the first lift plate. The upper surface of the first lift plate is connected to the lower surface of the rotating table by a spring. The spring is a compression coil spring, and normally biases the first lift plate downward so as to move it away from the lower surface of the rotating table. Therefore, the first lift plate is normally biased downward. Therefore, the cam plate is moved downward, and the support pin is normally rotated to the holding position.

[0005] The first lift plate has a magnet attached to its lower surface. The second lift plate is disposed below the first lift plate at a distance. The second lift plate has a magnet attached to its upper surface. The magnets of the first lift plate and the second lift plate are disposed with their repelling poles facing each other. The second lift plate is moved by an air cylinder between a position close to the first lift plate and a position far from it. The air cylinder normally contracts its operating shaft to position the second lift plate far from the first lift plate. When transferring the substrate, the air cylinder moves the second lift plate to a position close to the first lift plate. As a result, the first lift plate is repelled by magnetic force, the spring is compressed, and the cam plate rises. Each support pin rotates to the transfer position accordingly.

[0006] In a substrate processing apparatus having such a configuration, each support pin is normally maintained in a holding position. Therefore, even if the air cylinder breaks down or a power outage occurs, causing the air cylinder's operating shaft to contract, the substrate is still held on the turntable. As a result, the substrate does not come off the turntable, which has the advantage of preventing damage to the substrate. [Prior art documents] [Patent documents]

[0007] [Patent Document 1] JP 2014-146747 A (Fig. 2) Summary of the Invention [Problem to be solved by the invention]

[0008] However, the conventional example having such a configuration has the following problems. That is, although the conventional device can hold the substrate under normal conditions, it holds the substrate by the elastic force of a spring, and releases the substrate by releasing the elastic force by magnetic force. Therefore, since a configuration such as a spring, a cam plate, and a lift plate is required, the structure of the rotating table becomes complicated and the weight becomes heavy. In addition, when performing maintenance to replace multiple support pins that need to be replaced periodically, the rotating table needs to be removed. Since the rotating table is heavy, the burden on the worker during maintenance is also large.

[0009] The present invention has been made in consideration of the above circumstances, and aims to provide a substrate processing apparatus that can hold a substrate under normal conditions while reducing the weight of the turntable with a simple configuration.

[0010] Moreover, the present invention has been made in consideration of the above circumstances, and has an object to provide a substrate processing apparatus that can hold and release a substrate by rotation using only magnetic force. [Means for solving the problem]

[0011] In order to achieve the above object, the present invention has the following configuration: That is, in a substrate processing apparatus for performing a predetermined process on a substrate, the present invention includes a turntable configured to be rotatable about a vertical axis, a rotation drive means for rotationally driving the turntable in a horizontal plane, and a holding mechanism for holding the substrate in a horizontal position while spaced apart from an upper surface of the turntable, the holding mechanism being rotatably provided on an upper surface on the outer periphery side of the turntable about the vertical axis, and including a plurality of support pins that rotate between a holding position where the substrate abuts against the edge of the substrate and restricts horizontal movement of the substrate and a transfer position where the substrate is spaced apart from the edge of the substrate and allows movement of the substrate, and a first magnetic pole that rotates each of the support pins between the holding position and the transfer position by switching a surrounding magnetic pole. a second magnetic force unit that constantly applies a magnetic field to the first magnetic force unit to rotate each of the support pins to the holding position, a third magnetic force unit having a magnetic force greater than that of the second magnetic force unit, and a switching mechanism that does not normally apply the magnetic field of the third magnetic force unit to the first magnetic force unit, and applies the magnetic field of the third magnetic force unit to the first magnetic force unit only when a substrate is transferred, to rotate each of the support pins to the transfer position, and further comprises a cover that is disposed below the turntable to cover the rotation drive means and is resistant to the processing liquid supplied to the substrate, and the third magnetic force unit is disposed within the cover.

[0012] [Action and Effect] According to the present invention, the switching mechanism does not apply the magnetic field of the third magnetic part to the first magnetic part under normal circumstances, and applies the magnetic field of the third magnetic part to the first magnetic part only when the substrate is delivered, thereby rotating each support pin to the delivery position. Therefore, under normal circumstances, each support pin is rotated to the holding position by the magnetic force from the second magnetic part. On the other hand, each support pin is rotated to the delivery position by the magnetic force of the third magnetic part of the switching mechanism only when the substrate is delivered. As a result, since springs, cam plates, lifting plates, etc. are not required, the weight of the rotating table can be reduced with a simple configuration. In addition, due to the weight reduction of the rotating table, the rotating table can be easily removed during maintenance to replace multiple support pins that need to be replaced periodically. Therefore, the burden on the worker during maintenance can also be reduced.

[0013] Since the third magnetic portion is disposed inside the cover, there is no need to provide the third magnetic portion with chemical resistance, which contributes to reducing costs.

[0014] The present specification also discloses an invention relating to the following substrate processing apparatus.

[0015] In the above-described substrate processing apparatus, it is preferable that the first magnetic force unit and the second magnetic force unit are arranged on the same circumference centered on the center of rotation of the turntable in a plan view.

[0016] Both the first magnetic portion and the second magnetic portion are disposed in positions that are visible from the outer periphery, making maintenance work easy.

[0017] Furthermore, in the above-mentioned substrate processing apparatus, it is preferable that the first magnetic force section is connected to a lower end of the support pin protruding from the underside of the turntable, and the second magnetic force section is arranged to the side of the first magnetic force section on the underside of the turntable.

[0018] The magnetic force of the second magnetic portion is applied to the first magnetic portion from the side, so that the degree of rotation when the support pin is in the holding position can be easily adjusted by the position of the second magnetic portion.

[0019] Furthermore, in the above-mentioned substrate processing apparatus, it is preferable that the switching mechanism includes a lifting mechanism for raising and lowering the third magnetic section, and that the lifting mechanism moves the third magnetic section closer to the first magnetic section and rotates the support pin to the transfer position by an upward movement, and moves the third magnetic section away from the first magnetic section and rotates the support pin to the holding position by a downward movement, and that the downward movement is performed under normal circumstances.

[0020] The lifting mechanism of the switching mechanism raises the third magnetic section to rotate each support pin to the delivery position, and the lowering mechanism lowers each support pin to the holding position. Normally, the lowering operation is the normal operation, so even if the lifting mechanism stops operating due to a power outage or the like and the lowering operation is performed, each support pin is maintained in the holding position. Therefore, the substrate does not come off the turntable, and damage to the substrate can be prevented.

[0021] In the above-described substrate processing apparatus, it is preferable that the third magnetic force unit is disposed closer to a rotation center of the turntable than the first magnetic force unit and the second magnetic force unit are disposed in a plan view.

[0022] The third magnetic portion can be positioned closer to the center of rotation of the turntable, which allows the switching mechanism to be made more compact.

[0023] Furthermore, in the above-mentioned substrate processing apparatus, it is preferable that the turntable has a plurality of through holes extending from the top surface to the bottom surface, each of the support pins is inserted into the through hole, and the turntable is formed such that only the periphery of the through holes is lower than the top surface and has a cutout portion cut out toward the outer circumferential surface of the turntable.

[0024] Since the processing liquid can be easily discharged to the side from the cutout portion, the processing liquid flowing to the side from the upper surface of the turntable can be prevented from accumulating at the location where the support pin is attached, thereby preventing the generation of particles due to the accumulating processing liquid.

[0025] Furthermore, in the above-mentioned substrate processing apparatus, the turntable is provided with a support plate that supports the support pins on the underside of the position at which the support pins are positioned, and the support plate is provided with one end portion that follows the arc of the turntable, another end portion that is opposite the one end portion in the arc of the turntable, an attachment portion for the support pin formed on the one end portion side, a round screw hole portion formed on the other end portion for screwing to the turntable, and a long screw hole portion formed on the one end portion side having a long axis in the radial direction of the turntable for screwing to the turntable, and it is preferable that with the screw in the long screw hole portion loosened, the one end portion is moved in the radial direction of the turntable to adjust the position of the support pin in the radial direction of the turntable.

[0026] With the screw in the long screw hole of the support plate loosened, one end can be moved in the radial direction of the turntable to adjust the position of the support pin in the radial direction of the turntable. Therefore, adjustment can be easily made so that the support of the substrate in the radial direction is appropriate. In other words, adjustment can be easily made so that so-called core wobble is eliminated. As a result, the in-plane uniformity of processing can be improved.

[0027] In addition, in the above-mentioned substrate processing apparatus, it is preferable that the support pin comprises a cylindrical shaft portion and a support piece formed on the upper part of the shaft portion and abutting the underside and outer edge of the outer periphery of the substrate to support the substrate, the support piece having an elliptical shape in a planar view, and when the support pin is rotated to the holding position, the long axis of the support piece is oriented along the outer edge of the turntable.

[0028] By rotating the support pin to the holding position, the long axis of the support piece is oriented along the outer periphery of the turntable. Therefore, air resistance at the support piece can be reduced when the turntable rotates, and turbulence of the air flow around the support pin can be suppressed. As a result, uneven processing of the substrate at the periphery near the support pin can be suppressed. Effect of the Invention

[0029] According to the substrate processing apparatus of the present invention, the switching mechanism does not apply the magnetic field of the third magnetic unit to the first magnetic unit under normal conditions, and applies the magnetic field of the third magnetic unit to the first magnetic unit only when the substrate is transferred, thereby rotating each support pin to the transfer position. Therefore, each support pin is rotated to the holding position by the magnetic force from the second magnetic unit under normal conditions. On the other hand, each support pin is rotated to the transfer position by the magnetic force of the third magnetic unit of the switching mechanism only when the substrate is transferred. As a result, since a spring, a cam plate, a lift plate, etc. are not required, the weight of the turntable can be reduced with a simple configuration. In addition, due to the weight reduction of the turntable, the turntable can be easily removed during maintenance to replace a plurality of support pins that need to be replaced periodically. Therefore, the burden on the worker during maintenance can also be reduced. [Brief description of the drawings]

[0030] [Figure 1] 1 is a diagram showing an overall configuration of a substrate processing apparatus according to an embodiment; [Diagram 2] 1A is a plan view showing the entire turntable, and FIG. 1B is an enlarged view of a part of the turntable. [Diagram 3] 1A is a bottom view showing the entire turntable, and FIG. 1B is an enlarged view of a portion thereof. [Figure 4] FIG. [Diagram 5] 101-101 in FIG. 4 and FIG. 6. FIG. [Figure 6] FIG. [Figure 7] FIG. 4 is a perspective view of the movable pin as viewed from below. [Figure 8] FIG. [Figure 9] 13 is a diagram showing the positional relationship of magnets when a movable pin is held in a holding position; FIG. [Figure 10] 13 is a diagram showing the positional relationship of magnets at a delivery position of the movable pin. FIG. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0031] An embodiment of the present invention will now be described with reference to the drawings.

[0032] Fig. 1 is a diagram showing the overall configuration of a substrate processing apparatus according to an embodiment. Fig. 2 is a plan view showing the entire turntable, and Fig. 3 is a bottom view showing the entire turntable, and Fig. 4 is a partially enlarged view.

[0033] The substrate processing apparatus according to the embodiment is a single-wafer processing apparatus that processes one substrate W at a time. This substrate processing apparatus includes a base unit 1, a chuck unit 3, a shatterproof cup 5, a supply nozzle 7, and a control unit 9.

[0034] The base unit 1 rotates the chuck unit 3 and releases the chuck unit 3 from its hold on the substrate W. The chuck unit 3 rotates while holding the substrate W in a horizontal position. The splash prevention cup 5 prevents the processing liquid supplied from the supply nozzle 7 to the substrate W from splashing around. The splash prevention cup 5 is raised and lowered between a processing height (solid line in FIG. 1) and a delivery height (two-dot chain line in FIG. 1) which is lower than the processing height.

[0035] The base unit 1 includes an electric motor 11 and a switching mechanism 13. The electric motor 11 and the switching mechanism 13 are disposed inside a cover 15 that is resistant to chemicals. In other words, the cover 15 covers the electric motor 11 and the switching mechanism 13. Because the electric motor 11 and the switching mechanism 13 are disposed inside the cover 15, there is no need to treat them to be resistant to processing liquids or to construct them from materials resistant to processing liquids. This allows the cost of the base unit 1 to be reduced.

[0036] The electric motor 11 has a rotating shaft 17 in the vertical direction. The rotating shaft 17 is rotated around a vertical axis P1. The rotating shaft 17 is made of a metal material having electrical conductivity. The rotating shaft 17 is electrically connected to a ground wire (not shown) so as to be conductive. The electric motor 11 outputs the rotational position of the rotating shaft 17 from an encoder 19. The rotating shaft 17 is rotatably supported by a bearing 21 and extends upward from the cover 15. A chuck unit 3 is attached to the upper part of the rotating shaft 17.

[0037] The above-mentioned chuck unit 3 corresponds to the "holding mechanism" in the present invention, and the electric motor 11 corresponds to the "rotation driving means" in the present invention.

[0038] The chuck unit 3 includes a rotating table 23 and a holding mechanism 25. As shown in Fig. 2(a), the rotating table 23 has a circular shape in a plan view. The rotating table 23 is made of, for example, a material that is resistant to the processing liquid supplied from the supply nozzle 7. Specifically, for example, fluororesin is used. More specifically, PEEK (polyether ether ketone) is used.

[0039] The holding mechanism 25 includes, for example, two fixed pins 27 and two movable pins 29. The rotating table 23 includes through holes 31 at positions corresponding to the two fixed pins 27 and the two movable pins 29. Each through hole 31 penetrates the rotating table 23 from the upper surface to the lower surface. The two fixed pins 27 and the two movable pins 29 are inserted into the through holes 31. The rotating table 23 includes a cutout portion 33 formed around the through hole 31. The cutout portion 33 is formed lower than the upper surface of the rotating table 23. The cutout portion 33 has a U-shape in a plan view.

[0040] The cutout portion 33 allows the processing liquid to be easily discharged to the side. Therefore, the processing liquid flowing to the side from the upper surface of the turntable 23 can be prevented from accumulating at the locations where the fixed pin 27 and the movable pin 29 are attached. Therefore, it is possible to prevent particles from being generated due to the accumulating processing liquid.

[0041] The fixed pin 27 and the movable pin 29 correspond to the "support pin" in the present invention.

[0042] Reference is now made to Figure 4. Figure 4 is a vertical cross-sectional view of the fixing pin.

[0043] The fixed pin 27 includes a lower pin portion 35 and an upper pin portion 37. The lower pin portion 35 is provided at the lower portion of the rotating table 23. The lower pin portion 35 is connected to the upper pin portion 37 via the through hole 31. The lower pin portion 35 includes a pin support portion 35a, a fixing screw 35b, a balance weight 35c, a cover member 35d, and a fixed seal 35e. The fixing screw 35b for fixing the upper pin portion 37 to the pin support portion 35a is screwed into the upper portion of the pin support portion 35a. The balance weight 35c is attached to the lower portion of the fixing screw 35b. The balance weight 35c is for balancing the weight with the movable pin 29. The cover member 35d is attached to the lower portion of the balance weight 35c. The cover member 35d fixes the balance weight 35c to the pin support portion 35a. Lid member 35d is fixed to pin support portion 35a by stationary seal 35e. Upper pin portion 37 is attached to the upper portion of pin support portion 35a via stationary seal 35f. Stationary seal 35f prevents processing liquid from entering the interior and corroding fixing screws 35b and the like.

[0044] The upper pin portion 37 includes a shaft portion 37a and a support piece 37b. The support piece 37b includes a protrusion 37c. The shaft portion 37a is fixed to the pin support portion 35a by a fixing screw 35b while being placed on the fixed seal 35f. The support piece 37b has an elliptical shape in a plan view. The support piece 37b abuts against the lower surface and the outer periphery of the outer periphery of the substrate W to support the substrate W. The support piece 37b has an inclined surface 37d formed on the axis P1 side. The inclined surface 37d has an inclination that gradually increases from the axis P1 toward the outer periphery of the rotating table 23. The inclined surface 37d abuts against the lower surface of the substrate W. The support piece 37b has a protrusion 37c formed on the outer periphery side of the fixing screw 35b in a plan view. The protrusion 37c abuts against the outer periphery of the substrate W to restrict the substrate W from moving outward. The fixing pin 27 is attached so that the major axis of the elliptical shape of the support piece 37b is aligned along the outer periphery of the rotating table 23.

[0045] The fixed pin 27 has a shim 39 that can be inserted into the contact portion between the upper pin portion 37 and the upper surface of the pin support portion 35a. The shim 39 is a thin plate of stainless steel. By changing the shim 39 to one with a different thickness or increasing or decreasing the number of shims 39, the height of the upper pin portion 37 of the fixed pin 27 from the upper surface of the rotating table 23 can be adjusted. This allows the support height of the substrate W to be adjusted so that the substrate W is horizontal. The fixed seals 35e and 35f are elastic members having chemical resistance. Specifically, the fixed seals 35e and 35f are preferably made of, for example, fluororubber (vinylidene fluoride type (FKM), tetrafluoroethylene-propylene type (FEPM), tetrafluoroethylene-purple vinyl ether type (FFKM), etc.

[0046] As shown in Fig. 3(a), the lower pin portion 35 of the fixed pin 27 is screwed to the lower surface of the rotating table 23 via a pin cover 41. Note that in Fig. 4, the pin cover 41 is omitted for convenience of illustration. Of the components constituting the fixed pin 27 described above, the pin support portion 35a and the support piece 37b are preferably made of a conductive material having chemical resistance. More preferably, they are made of a conductive PEEK material containing carbon nanotubes. This ensures conductivity.

[0047] A ground wire 43 is provided on the underside of the rotating table 23. Specifically, as shown in FIG. 2(a) and FIG. 3(a), four ground wires 43 are arranged so as to provide electrical continuity between the two fixed pins 27 and the two movable pins 29. The ground wires 43 are conductive. They are preferably made of a conductive PEEK material containing carbon nanotubes. The outer peripheral end of the ground wire 43 is attached to the pin support portion 35a so as to provide electrical continuity. The end of the ground wire 43 on the axis P1 side is attached to the rotating shaft 17 so as to provide electrical continuity. The rotating shaft 17 is connected to the ground wire via the electric motor 11.

[0048] Reference is now made to Fig. 5. Fig. 5 is a cross-sectional view taken along line 101-101 in Figs.

[0049] The rotating table 23 has a groove 45 formed on its underside so as to have a cross shape in a plan view. The groove 45 has a vertical cross-sectional shape of an inverted trapezoid. The above-mentioned ground wire 43 is fitted into the groove 45. The vertical cross-sectional shape of the ground wire 43 is substantially the same as that of the groove 45. The ground wire 43 is formed to have an outer shape slightly smaller than that of the groove 45. Therefore, the ground wire 43 can be attached to the groove 45 by passing the ground wire 43 through the groove 45 in the radial direction along the surface of the rotating table 23. This allows the ground wire 43 to be loosely passed through the groove 45. This prevents a phenomenon (called creep) that may occur in resin materials, in which the resin material deforms over time when a load is applied. This prevents a problem in which the ground wire 43 deforms and becomes difficult to conduct electricity.

[0050] When the turntable 23 is made of a non-conductive material such as PEEK, the attached particles may become difficult to detach due to charging. This may cause the substrate W to be contaminated with particles. In this embodiment, the fixed pin 27 and the movable pin 29 described below are grounded by arranging a ground wire 43. This prevents charging, and therefore the above-mentioned problems. Furthermore, although the conductive PEEK material containing carbon nanotubes is very expensive, in this embodiment, only a part of the turntable 23 that is cross-shaped in plan view is made of the conductive PEEK material, rather than the entire turntable 23. This prevents the above-mentioned problems while keeping costs down.

[0051] Next, reference is made to Fig. 6. Fig. 6 is a vertical cross-sectional view of the movable pin.

[0052] The movable pin 29 includes a lower pin portion 47 and an upper pin portion 49. The lower pin portion 47 is provided at the lower portion of the rotating table 23. The lower pin portion 47 is connected to the upper pin portion 49 via the through hole 31. The lower pin portion 47 includes a pin support 47a, a rotary magnet 47c, a cover member 47d, a fixed seal 47e, a bearing 47f, a fixed seal 47g, and a cylindrical member 47h.

[0053] A fixing screw 47b is screwed into the upper part of the pin support part 47a to fix the upper pin part 49 to the pin support part 47a. A rotary magnet 47c is attached to the lower part of the fixing screw 47b. The rotary magnet 47c is connected to the lower end of the movable pin 29. As described later, the rotary magnet 47c rotates the movable pin 29 by switching the surrounding magnetic poles. A cover member 47d is attached to the lower part of the rotary magnet 47c. The cover member 47d fixes the rotary magnet 47c to the pin support part 47a. The cover member 47d is fixed to the pin support part 47a by a fixed seal 47e. The pin support part 47a is attached to the through hole 31 by a fixed seal 47g via a bearing 47f and a cylindrical member 47f. The pin support part 47a is fixed only to the inner ring of the bearing 47f, and is not fixed to the outer ring of the bearing 47f. The outer ring of the bearing 47f is fixed to the through hole 31. The cylindrical member 47 is attached to the upper part of the pin support portion 47a with the lower surface thereof spaced apart from the upper surface of the pin support portion 47a.

[0054] The cylindrical member 47h is fixed only to the outer ring of the bearing 47f and the lower surface of the rotating table 23. The lower surface of the cylindrical member 47h is disposed away from the pin support portion 47a. The bearing 47f does not have a seal member between the inner ring and the outer ring. Therefore, the bearing 47f allows the fluid to pass through between the inner ring and the outer ring. The bearing 47f is made of a material that is resistant to the processing liquid. For example, the inner ring and the outer ring of the bearing 47f are preferably made of a conductive resin. The bearing 47f is preferably made of a conductive PEEK material mixed with carbon nanotubes. In addition, the rolling element of the bearing 47f is preferably made of SiC (silicon carbide) in terms of ensuring wear resistance and conductivity. The fluid that flows down the bearing 47f is discharged to the surroundings through a flow path 47i in the gap between the lower surface of the cylindrical member 47h and the pin support portion 47a. Therefore, in combination with the effect of the cutout portion 33, it is possible to more effectively prevent the processing liquid from accumulating at the base of the movable pin 29 on the turntable 23.

[0055] The upper pin portion 49 includes a shaft portion 49a and a support piece 49b. The support piece 49b includes a protrusion 49c. The shaft portion 49a is fixed to the pin support portion 47a by a fixing screw 47b while being placed on the fixed seal 47g. The support piece 47b has an elliptical shape in a plan view. The support piece 47b abuts against the lower surface and the outer periphery of the outer periphery side of the substrate W to support the substrate W. The support piece 47b has an inclined surface 49d formed on the axis P1 side. The inclined surface 49d is formed to have a gradually increasing inclination from the axis P1 toward the outer periphery side of the rotating table 23. The inclined surface 49d abuts against the lower surface of the substrate W. The support piece 49b has a protrusion 49c formed on the outer periphery side of the fixing screw 47b in a plan view. The protrusion 49c abuts against the outer periphery of the substrate W to restrict the substrate W from moving outward. In addition, in the movable pin 29, a shim 51 can be inserted into the contact portion between the upper pin portion 49 and the upper surface of the pin support portion 47a, similar to the fixed pin 27. By changing the shims 51 to ones with different thicknesses or increasing or decreasing the number of shims 51, the height of the upper pin portion 49 of the movable pin 29 from the upper surface of the turntable 23 can be adjusted. This allows the surface height of the substrate W to be adjusted. This is also called surface wobble adjustment. In addition, the material of the fixed seals 47e, 47g is preferably the same as that of the fixed seals 35e, 35f described above. The movable pin 29 is configured to be rotatable around the axis P2 by the bearing 47f.

[0056] As shown in Figures 3(a) and (b), the lower pin portion 47 of the movable pin 29 is fixed to the underside of the rotating table 23 by a support plate 53 with screws. Note that the support plate 53 is not shown in Figure 6 for the sake of illustration. Of the components constituting the movable pin 29 described above, the lower pin portion 47 and the upper pin portion 37 are preferably made of a conductive material having chemical resistance. More preferably, they are made of a conductive PEEK material containing carbon nanotubes. This ensures conductivity.

[0057] The movable pin 29 is attached such that, when rotated to the holding position, the long axis of the elliptical shape of the support piece 49b is oriented along the outer periphery of the turntable 23, similar to the fixed pin 27. Therefore, when the movable pin 29 is rotated to the holding position, the long axes of the support pieces 37b, 49b are oriented along the outer periphery of the turntable 23. Therefore, air resistance at the support pieces 37b, 49b can be reduced when the turntable 23 rotates, and turbulence of the airflow around the fixed pin 27 and the movable pin 29 can be suppressed. As a result, uneven processing at the peripheral portion of the substrate W near the fixed pin 27 and the movable pin 29 can be suppressed.

[0058] 2(a) and 3(a), the end of the ground wire 43 on the outer circumferential side is attached so as to be conductive to the lower pin portion 47. The end of the ground wire 43 on the axis P1 side is attached so as to be conductive to the rotating shaft 17.

[0059] Please refer to Figures 3 and 7. Figure 7 is a perspective view of the movable pin as seen from below.

[0060] The support plate 53 includes one end 53a, the other end 53b, an attachment portion 53c, a round screw hole portion 53d, and a long screw hole portion 53e. The support plate 53 is made of a material that is resistant to the processing liquid. The material is preferably a fluororesin. More preferably, it is PEEK.

[0061] One end 53a is a portion of the support plate 53 along the arc that corresponds to the outer periphery of the rotating table 23. The other end 53b is a portion on the opposite side of the one end 53a in the arc that corresponds to the outer periphery of the rotating table 23. The mounting portion 53c is a portion to which the movable pin 29 formed on the one end 53a side is attached. The round screw hole portion 53d is formed on the other end 53b side and is a mounting hole for screwing to the rotating table 23. The long screw hole portion 53e is formed on the one end 53a side and is a mounting hole for screwing to the rotating table 23. The hole is an elongated hole having a long axis in the radial direction of the rotating table 23.

[0062] As described above, the support plate 53 has the long screw hole 53e. Therefore, with the screw of the long screw hole 53e loosened, the one end 53a can be moved in the radial direction of the turntable 23 to adjust the position of the movable pin 29 in the radial direction of the turntable 23. This allows easy adjustment so that the support of the substrate W in the radial direction of the turntable 23 is appropriate. In other words, it can be easily adjusted so that the center of rotation of the turntable 23 and the center of the substrate W coincide with each other, eliminating so-called "core wobble." As a result, the in-plane uniformity of the processing on the substrate W can be improved.

[0063] The support plate 53 has a storage section 55 formed at a position adjacent to the mounting section 53c. The storage section 55 is located on the lower surface of the turntable 23 and is formed to the side of the rotating magnet 47c. The storage section 55 stores the fixed magnet 57. The fixed magnet 57 always applies a magnetic field to the rotating magnet 47c. The rotating magnet 47c to which the magnetic field is applied by the fixed magnet 57 is attracted by the magnetic force of the fixed magnet 57 and rotates, and stops in a stable state. Therefore, the movable pin 29 rotates around the axis P2 and stops. This position is the holding position. The holding position is a position where the protrusion 49c abuts against the edge of the substrate W, as shown by the solid line in FIG. 2(b). On the other hand, the delivery position is a state where the movable pin 29 rotates around the axis P2, the protrusion 49c is separated from the edge of the substrate W, and the lower peripheral edge of the substrate W abuts against the inclined surface 49d and is supported, as shown by the two-dot chain line in FIG. 2(b). Therefore, when the movable pin 29 is in the delivery position, a transport arm (not shown) can deliver the substrate W. Since the fixed magnet 57 is disposed to the side of the rotating magnet 47c, the degree of rotation when the movable pin 29 reaches the holding position can be easily adjusted by the position of the fixed magnet 57.

[0064] As shown in Figures 3(a) and 3(b), the fixed magnet 57 and the rotating magnet 47c are arranged on the same circumference centered on the rotation center P1 of the turntable 23 in a plan view. Because of this arrangement, the fixed magnet 57 and the rotating magnet 47c can both be seen from the outer periphery as shown in Figure 7. This makes it easy to perform maintenance work.

[0065] Please refer to Fig. 1 and Fig. 8 to Fig. 10. Fig. 8 is a plan view of the switching mechanism. Fig. 9 is a diagram showing the positional relationship of the magnets in the movable pin holding position. Fig. 10 is a diagram showing the positional relationship of the magnets in the movable pin delivery position.

[0066] The switching mechanism 13 includes an air cylinder 59, a support arm 61, and a drive magnet 63. The air cylinder 59 includes an operating shaft 65 that expands and contracts in the vertical direction. The support arm 61 is attached to the operating shaft 65. The support arm 61 has a length that spans the two movable pins 29. Drive magnets 63 are attached to both ends of the support arm 61. The drive magnet 63 is located on the inner periphery side of the turntable 23 relative to the rotating magnet 47c in a plan view. In other words, the drive magnet 63 is disposed closer to the axis P1 side of the turntable 23 relative to the rotating magnet 47c and the fixed magnet 57. The drive magnet 63 generates a stronger magnetic force than the fixed magnet 57.

[0067] At the holding position for holding the substrate W, the switching mechanism 13 contracts the operating shaft 65 of the air cylinder 59 so that the drive magnet 63 is located at the lowered position shown by the solid line in Fig. 1. This state is the position in the normal state, and is the state when the power supply is cut off due to a power outage or power supply trouble, for example. In addition, in a plan view, the positional relationship is as shown in Fig. 9. That is, a magnetic force is applied to the rotating magnet 47c of the movable pin 29 by only the fixed magnet 57, and the rotating magnet 47c and the fixed magnet 57 are attracted to each other by the magnetic force, and the movable pin 29 is rotated to the holding position.

[0068] On the other hand, at the transfer position where the substrate W is released, the switching mechanism 13 extends the operating shaft 65 of the air cylinder 59 so that the drive magnet 63 is located at the raised position shown by the two-dot chain line in Fig. 1. In addition, in a plan view, the positional relationship is as shown in Fig. 10. That is, a magnetic force greater than that of the fixed magnet 57 applied to the rotary magnet 47c of the movable pin 29 is applied from the drive magnet 63 to the rotary magnet 47c. Then, the rotary magnet 47c is attracted to the drive magnet 63, and the movable pin 29 is rotated to the transfer position.

[0069] The above-mentioned rotating magnet 47c, fixed magnet 57, and drive magnet 63 are preferably neodymium magnets. Neodymium magnets are rare earth magnets whose main components are neodymium, iron, and boron. Neodymium magnets generate a strong magnetic field.

[0070] In a plan view, the switching mechanism 13 is disposed closer to the axis P1 of the turntable 23 than the rotary magnet 47c and the fixed magnet 57. Therefore, the drive magnet 63 can be disposed closer to the axis P1 of the turntable 23. Therefore, the switching mechanism 13 can be made more compact.

[0071] The above-mentioned rotating magnet 47c corresponds to the "first magnetic force portion" in the present invention, the fixed magnet 57 corresponds to the "second magnetic force portion" in the present invention, and the drive magnet 63 corresponds to the "third magnetic force portion" in the present invention.

[0072] The control unit 9 is composed of a CPU, a memory, and the like. The control unit 9 controls the supply of the processing liquid from the supply nozzle 7 and the swinging of the supply nozzle 7 between the standby position and the supply position. The standby position is a position where the discharge port of the supply nozzle 7 corresponds to above the axis P1 as shown in FIG. 1. The standby position is a position where the discharge port of the supply nozzle 7 is laterally removed from the splash prevention cup 5. The control unit 9 controls the elevation of the splash prevention cup 5 between the processing height and the delivery height. The control unit 9 controls the rotation of the electric motor 11. For example, the control unit 9 increases the rotation speed at a predetermined acceleration toward the processing speed, and when the processing speed is reached, maintains the processing speed for the processing time. When the processing time has elapsed, the control unit 9 decreases the rotation speed at a predetermined negative acceleration and stops it. The control unit 9 receives a signal from the encoder 19. When stopping the electric motor 11, the control unit 9 refers to the output from the encoder 19. The control unit 9 stops the electric motor 11 so as to achieve the positional relationship shown in FIG. 8. Specifically, the rotation of the electric motor 11 is controlled so that the rotary magnets 47c of the two movable pins 29 and the drive magnet 63 of the switching mechanism 13 face each other in the radial direction of the turntable 23. The control unit 9 controls the elevation and lowering of the drive magnet 63 by the switching mechanism 13.

[0073] The substrate processing apparatus having the above-mentioned configuration processes the substrate W, for example, as follows. Note that, under normal circumstances, the control unit 9 does not operate the switching mechanism 13. That is, the drive magnet 63 is located in the lowered position shown by the solid line in Fig. 1. Under normal circumstances, the rotating magnet 47c is attracted and rotated by the magnetic force of the fixed magnet 57, as shown in Fig. 9. Therefore, the movable pin 29 is in the holding position shown by the solid line in Fig. 2(b).

[0074] The control unit 9 moves the shatterproof cup to the delivery height, and operates the switching mechanism 13 to move the drive magnet 63 to the raised position. The raised position is the position shown by the two-dot chain line in Fig. 1. Then, as shown in Fig. 10, the rotating magnet 47c is attracted by the drive magnet 63. Therefore, the movable pin 29 is brought to the delivery position shown by the two-dot chain line in Fig. 2(b).

[0075] The control unit 9 moves a transport arm (not shown) holding the substrate W to be processed above the turntable 23, and then lowers the transport arm to place the substrate W on the inclined surface 37d of the fixed pin 27 and the inclined surface 49d of the movable pin 29.

[0076] The above operation corresponds to the "transfer process" in the present invention.

[0077] After the transport arm retracts outward, the control unit 9 raises the anti-scattering cup to the processing height. The control unit 9 operates the switching mechanism 13 to lower the drive magnet 63 to the lowered position shown by the solid line in Fig. 1. Then, as shown in Fig. 9, the rotating magnet 47c is released from the attraction by the drive magnet 63. Therefore, the rotating magnet 47c is attracted by the magnetic force of the fixed magnet 57 and rotated. This brings the movable pin 29 to the holding position shown by the solid line in Fig. 2(b).

[0078] The above operation corresponds to the "holding process" of the present invention.

[0079] The control unit 9 operates the supply nozzle 7 to swing the supply nozzle 7 from the standby position to the processing position. Then, while rotating the electric motor 11 at a processing speed, the supply nozzle 7 supplies the processing liquid to the substrate W for the processing time, thereby performing processing.

[0080] The above operations correspond to the "processing steps" of the present invention.

[0081] After a predetermined time has elapsed, the substrate W is unloaded by reversing the above series of operations.

[0082] According to this embodiment, the switching mechanism 13 does not normally apply the magnetic field of the driving magnet 63 to the rotating magnet 47c, and applies the magnetic field of the driving magnet 63 to the rotating magnet 47c only when the substrate W is transferred, thereby rotating each movable pin 29 to the transfer position. Therefore, each movable pin 29 is rotated to the holding position by the magnetic force from the fixed magnet 57 in normal times. On the other hand, each movable pin 29 is rotated to the transfer position by the magnetic force of the driving magnet 63 of the switching mechanism 13 only when the substrate W is transferred. As a result, since a spring, a cam plate, a lift plate, etc. are not required, the weight of the turntable can be reduced with a simple configuration. In addition, with the weight reduction of the turntable 23, the turntable 23 can be easily removed during maintenance to replace the two fixed pins 27 and the two movable pins 29 that need to be replaced periodically. Therefore, the burden on the worker during maintenance can also be reduced.

[0083] The present invention is not limited to the above-described embodiment, but can be modified as follows.

[0084] (1) In the embodiment described above, the rotary magnet 47c and the fixed magnet 57 are arranged on the same circumference centered on the axis P1. However, the present invention is not limited to this configuration. In other words, the rotary magnet 47c and the fixed magnet 57 may be arranged in the radial direction of the rotating table 23.

[0085] (2) In the above-described embodiment, the fixed magnet 57 is disposed to the side of the rotating magnet 47c. However, the present invention is not limited to this configuration. In other words, the position of the fixed magnet 57 is not limited as long as it can rotate the movable pin 29 to the holding position by applying a magnetic field to the rotating magnet 47c.

[0086] (3) In the above embodiment, the switching mechanism 13 is configured with the air cylinder 59, but the present invention is not limited to such a configuration. In other words, any configuration may be used as long as it can move the drive magnet 63 between a position close to the rotary magnet 47c and a position away from the rotary magnet 47c.

[0087] (4) In the above embodiment, the rotating table 23 has the notch 33, but such a configuration is not essential to the present invention.

[0088] (5) In the above-described embodiment, the movable pin 29 is configured to be able to adjust the position in the radial direction of the turntable 23 by the support plate 53. However, this configuration is not essential to the present invention. If the so-called core runout does not significantly affect the processing, this configuration may be omitted to reduce costs.

[0089] (6) In the above-described embodiment, the support pieces 37b and 49b of the fixed pin 27 and the movable pin 29 have an elliptical shape in a plan view. However, the present invention is not limited to this configuration. For example, the support pieces 37b and 49b may have a circular shape in a plan view.

[0090] (7) In the above-described embodiment, the chuck unit 3 is provided with two fixed pins 27 and two movable pins 29. However, the present invention is not limited to this number.

[0091] (8) In the above-described embodiment, the substrate processing apparatus performs processing by supplying a processing liquid through the supply nozzle 7. However, the present invention can be applied to any substrate processing apparatus that performs a predetermined process while rotating the substrate W. [Industrial Applicability]

[0092] INDUSTRIAL APPLICABILITY As described above, the present invention is suitable for a substrate processing apparatus and a substrate processing method that perform a predetermined process on a substrate while the substrate is supported on a turntable. [Explanation of symbols]

[0093] W … Substrate 1 … Base unit 3 … Chuck unit 5 … Shatterproof cup 7 … Supply nozzle 9 … Control section 11 … Electric motor 13...Switching mechanism 15 … Cover 17 … Rotation axis 23 ... Rotating table 25 … Retention mechanism 27 ... Fixing pin 29 ... Movable pin 31 ... Through hole 33 ... Cutout 35 ... Lower pin part 37 … Upper pin section 37a … Shaft part 37b … Support piece 37d… Slanted surface 41 ... Pin cover 43 … Ground wire 47 … Lower pin part 47c … Rotating magnet 49 … Upper pin section 49a … Shaft 49b … Support piece 49d … Inclined surface 53 … Support plate 57 ... Fixed magnet 59 ... Air cylinder 63 ... Drive magnet

Claims

[Claim 1] A substrate processing apparatus for performing a predetermined process on a substrate, A rotation base configured to be rotatable around a vertical axis; A rotation drive means for rotating the rotary table in a horizontal plane; a holding mechanism that holds the substrate in a horizontal position while being spaced apart from an upper surface of the rotation table; Equipped with The holding mechanism includes: a plurality of support pins that are rotatably provided on an upper surface of the outer periphery of the turntable around a vertical axis and rotate between a holding position where the support pins abut against the peripheral edge of the substrate to restrict horizontal movement of the substrate and a transfer position where the support pins are spaced apart from the peripheral edge of the substrate to allow movement of the substrate; a first magnetic portion that rotates each of the support pins between the holding position and the delivery position by switching a surrounding magnetic pole; a second magnetic portion that constantly applies a magnetic field to the first magnetic portion to rotate each of the support pins to the holding position; Equipped with a switching mechanism including a third magnetic force unit having a magnetic force greater than that of the second magnetic force unit, which does not normally apply a magnetic field of the third magnetic force unit to the first magnetic force unit, and applies a magnetic field of the third magnetic force unit to the first magnetic force unit only when a substrate is transferred, thereby rotating each of the support pins to the transfer position; Equipped with a cover disposed below the turntable to cover the rotation drive means and having resistance to a processing liquid supplied to the substrate; The substrate processing apparatus according to claim 1, wherein the third magnetic portion is disposed inside the cover.

Images