Support frame with film, support frame, and processing method for supported object

Abstract

To provide a support frame with a film that makes it easy to discharge liquid such as a cleaning liquid used for processing a processed object, from a frame unit when drying by spin drying or the like.SOLUTION: A support frame with a film includes a metal support frame having an opening part and a film affixed to the support frame to cover the opening part. The support frame includes a first surface in contact with the film, a second surface opposite to the first surface, and a third surface connected to both the first surface and the second surface and defining an opening part opening to both the first surface and the second surface. The third surface provides a support frame with a film having a portion inclined toward the first surface so that the length of the opening part in a direction parallel to the first surface is longer on the second surface side than on the first surface side.SELECTED DRAWING: Figure 2

Description

[Technical field]

[0001] The present invention relates to a support frame with a film, a support frame, and a method for treating a supported object. [Background technology]

[0002] When processing (cutting, laser processing, etc.) a workpiece such as a semiconductor wafer, the workpiece (supported object) is supported by a support frame. The support frame is, for example, a ring frame with an opening in the center. A film is attached to one surface of the support frame so as to cover the opening of the support frame. This film is then also attached to the workpiece placed in the opening, thereby forming a frame unit in which the support frame, the film, and the workpiece are integrated. The frame unit is carried into a processing device, and the workpiece is processed (see, for example, Patent Document 1).

[0003] A processing device for processing a workpiece includes, for example, a processing unit for processing the workpiece and a spinner cleaning unit for cleaning the workpiece. The spinner cleaning unit includes a holding table for holding the workpiece, and a cleaning unit for supplying a cleaning liquid to the workpiece held by the holding table to clean the workpiece. The upper surface of the holding table serves as a holding surface for applying a negative pressure to the workpiece. The holding table rotates around an axis passing through the holding surface.

[0004] After the processing of the workpiece by the processing unit is completed, the workpiece is washed and dried by the spinner cleaning unit. In the spinner cleaning unit, the workpiece is held by a holding table via a film. Then, while the holding table is rotating, liquid (cleaning liquid) is supplied to the workpiece on the frame unit, thereby spin-cleaning the workpiece. After that, while the holding table is rotating, air is supplied to the workpiece, thereby spin-drying the workpiece (see, for example, Patent Document 2). [Prior art documents] [Patent documents]

[0005] [Patent Document 1] JP 2020-178102 A [Patent Document 2] Patent Publication No. 2021-145089 Summary of the Invention [Problem to be solved by the invention]

[0006] As described above, after the liquid is supplied to the workpiece, a drying process such as spin drying is performed. In this spin drying, centrifugal force generated by the rotation of the holding table acts on the liquid remaining on the workpiece, etc., and the liquid is removed from the frame unit.

[0007] The support frame has a first surface to which the film is attached, a second surface on the opposite side, and a third surface (inner peripheral surface) that is connected to both the first and second surfaces and defines openings that open to both the first and second surfaces. This third surface is formed perpendicular to the first and second surfaces, and therefore acts as a barrier against the liquid (cleaning liquid) remaining on the workpiece or the like from proceeding to the outside of the frame unit due to centrifugal force during spin drying. In other words, the third surface prevents the liquid from being discharged from the frame unit during spin drying. As a result, liquid is likely to remain on the surface of the film near the third surface of the support frame.

[0008] The liquid remaining on the film surface may be scattered by vibrations that occur during transport of the frame unit, and may adhere to the surface of the workpiece fixed to the film or other workpieces stored nearby. When the liquid dries on the surface of the workpiece, it leaves a mark, which may cause the workpiece to have a poor appearance. In addition, chemicals such as etching liquids may be used as liquids for cleaning, and in this case, the chemicals remaining on the film may corrode the film.

[0009] Therefore, the object of the present invention is to provide a support frame with a film and a support frame having a structure that allows liquid used in processing a supported object supported by the support frame via a film to be more easily discharged from the supported object and film than conventional methods, and that makes it less likely for liquid to remain on the supported object and film after drying, as well as a method of processing a supported object using said support frame. [Means for solving the problem]

[0010] According to one aspect of the present invention, there is provided a support frame with a film, comprising a metal support frame having an opening, and a film attached to the support frame so as to cover the opening, the support frame having a first surface with which the film contacts, a second surface opposite the first surface, and a third surface connected to both the first surface and the second surface and defining the opening that opens to both the first surface and the second surface, the third surface having a portion that is inclined with respect to the first surface so that the length of the opening in a direction parallel to the first surface is greater on the second surface side than on the first surface side.

[0011] Preferably, the portion is composed of a first portion on the first surface side and a second portion on the second surface side, and the angle between the first portion and the first surface is different from the angle between the second portion and the first surface.

[0012] Preferably, the angle between the first portion and the first surface is smaller than the angle between the second portion and the first surface.

[0013] Preferably, the third surface is liquid repellent or liquid philic.

[0014] According to another aspect of the present invention, there is provided a metal support frame having an opening, comprising a first surface with which a film comes into contact during use, a second surface opposite the first surface, and a third surface connected to both the first surface and the second surface and defining the opening that opens to both the first surface and the second surface, the third surface having a portion that is inclined with respect to the first surface such that the length of the opening in a direction parallel to the first surface is greater on the second surface side than on the first surface side.

[0015] Preferably, the portion is composed of a first portion on the first surface side and a second portion on the second surface side, and the angle between the first portion and the first surface is different from the angle between the second portion and the first surface.

[0016] Preferably, the angle between the first portion and the first surface is smaller than the angle between the second portion and the first surface.

[0017] Preferably, the third surface is liquid repellent or liquid philic.

[0018] According to another aspect of the present invention, there is provided a method for processing a supported object, in which the supported object supported by the film is processed using the support frame according to the aspect of the present invention described above, the method including a frame unit formation step of forming a frame unit consisting of the support frame, the film, and the supported object by attaching the film to the first surface of the support frame so as to cover the opening, and attaching the film to the supported object placed in the opening, a processing step of processing the supported object with a liquid by supplying the liquid to the supported object after the frame unit formation step, and a discharge step of discharging the liquid remaining on the held object or the film from the frame unit via the third surface by rotating the frame unit around a rotation axis passing through the opening after the processing step. Effect of the Invention

[0019] In the support frame with film, the support frame, and the method for processing a supported object according to one aspect of the present invention, the third surface constituting the support frame has a portion inclined with respect to the first surface such that the length of the opening in a direction parallel to the first surface is greater on the second surface side than on the first surface side. By having such an inclination of the third surface, liquid such as a cleaning liquid used in processing the object to be processed is likely to proceed along the third surface toward the outside of the frame unit due to the action of centrifugal force during spin drying. This makes it difficult for liquid such as a cleaning liquid to remain on the supported object and the film after the supported object is dried. [Brief description of the drawings]

[0020] [Figure 1] FIG. 1 is a perspective view of a first example of a frame unit. [Diagram 2] FIG. 2 is a cross-sectional view of a first example of a frame unit. [Diagram 3] FIG. 3 is a perspective view that illustrates a typical cleaning device. [Figure 4] FIG. 4 is a cross-sectional view of the frame unit etc. in the ejection step. [Diagram 5] FIG. 5 is a cross-sectional view of a second example of the frame unit. [Figure 6] FIG. 6 is a cross-sectional view of a third example of the frame unit. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0021] Hereinafter, an embodiment of the present invention will be described with reference to the accompanying drawings. Fig. 1 is a perspective view of a first example of a frame unit 25, and Fig. 2 is a cross-sectional view of the first example of the frame unit 25. As shown in Fig. 1, the frame unit 25 is composed of a supported object 11 and a support frame 23 with a film that supports the supported object 11. More specifically, the support frame 23 with a film includes a support frame 17 made of metal and a film 21 attached to the support frame 17, and the frame unit 25 is composed of the supported object 11, the film 21, and the support frame 17.

[0022] The supported object 11 is, for example, a disk-shaped wafer made of a semiconductor material such as silicon. That is, the supported object 11 is configured in a disk shape having a substantially circular first surface (front surface) 11a and a substantially circular second surface (back surface) 11b opposite to the first surface 11a. A notch 11c is formed in a part of the outer periphery (peripheral edge) of the supported object 11 to indicate the crystal orientation of the supported object 11.

[0023] However, the shape of the supported object 11 is not limited to this. Also, an orientation flat may be formed in the supported object 11 instead of the notch 11c. Furthermore, the supported object 11 does not have to have the notch 11c or the orientation flat.

[0024] A plurality of division lines 13 are set in a lattice pattern on the first surface 11a of the supported object 11. Devices 15 such as ICs (Integrated Circuits) are formed in a plurality of regions separated by the division lines 13. The supported object 11 is cut along the division lines 13 with a cutting blade or a laser beam, and is thereby divided into individual device chips, each having a device 15.

[0025] The support frame 23 with film has a metal support frame 17. The support frame 17 is made of a metal material such as SUS or aluminum, and is configured as a plate-like member having an opening 19 in the center. Specifically, the support frame 17 has a first surface 17a, a second surface 17b opposite to the first surface 17a, and a third surface 17c connected to both the first surface 17a and the second surface 17b. The third surface 17c defines an opening 19 that opens to both the first surface 17a and the second surface 17b.

[0026] As shown in Fig. 2, the third surface 17c of the support frame 17 is inclined with respect to the first surface 17a so that the length of the opening 19 in a direction parallel to the first surface 17a is larger on the second surface 17b side than on the first surface 17a side. For example, when the opening 19 is formed in a circular shape, the third surface 17c is inclined with respect to the first surface 17a so that the diameter of the opening 19 is larger on the second surface 17b side than on the first surface 17a side. Specifically, the third surface 17c intersects with the first surface 17a at an acute angle. That is, the support frame 17 is formed in an annular shape with the center of the disk hollowed out in a truncated cone shape.

[0027] The support frame 17 having the third surface 17c having the above-mentioned shape is manufactured by machining such as cutting, etc. For example, the support frame 17 can be manufactured by preparing the support frame 17 in which the third surface 17c is approximately perpendicular to the first surface 17a, and cutting the support frame 17 along the third surface 17c so that the third surface 17c has a shape inclined with respect to the first surface 17a.

[0028] Because the third surface 17c has the above-mentioned configuration, the width of the opening 19 (the length in a direction parallel to the first surface 17a, or the diameter if the opening 19 is circular) is larger on the second surface 17b side than on the first surface 17a side.

[0029] The smaller the angle α between the third surface 17c and the first surface 17a, the easier it is for liquid such as a cleaning liquid to be discharged to the outside of the frame unit 25 through the third surface 17c in a discharge step S3 described below. Specifically, the angle α is set to 85° or less, preferably 75° or less, and more preferably 65° or less.

[0030] Furthermore, the larger the angle α between the third surface 17c and the first surface 17a, the more the width of the support frame 17 can be prevented from becoming extremely wide when the third surface 17c is inclined. This makes it possible to suppress an increase in the size of the support frame 17 while ensuring a predetermined thickness of the support frame 17. Specifically, the angle α is set to 5° or more, preferably 15° or more, and more preferably 25° or more.

[0031] In consideration of the above, the angle α is preferably 5° or more and 85° or less, more preferably 15° or more and 75° or less, and even more preferably 25° or more and 65° or less.

[0032] 2 shows the third surface 17c formed linearly in cross section, the third surface 17c may be formed curved in cross section. In this case, the third surface 17c curved in cross section may be inclined with respect to the first surface 17a so that the angle between the tangent to the third surface 17c at a point on the third surface 17c closer to the second surface 17b than to the first surface 17a and the first surface 17a becomes larger.

[0033] A film 21 is attached to the first surface 17a of the support frame 17. The film 21 is, for example, a laminate including a base material and an adhesive layer (glue layer) provided on the surface of the base material. The base material is made of a resin such as polyolefin, polyvinyl chloride, or polyethylene terephthalate, and the adhesive layer is made of an epoxy-, acrylic-, or rubber-based adhesive. The adhesive layer may be made of an ultraviolet-curing resin that is cured by irradiation with ultraviolet rays. The configuration of the film 21 is not limited to these. For example, the film 21 may be a sheet (thermocompression sheet) that does not include an adhesive layer and can be thermocompressed to the supported object 11 and the support frame 17.

[0034] In addition, it is preferable that the third surface 17c is subjected to a surface treatment for suppressing remaining liquid. For example, the third surface 17c has liquid repellency. By making the third surface 17c liquid repellent, the contact angle between the third surface 17c and a liquid such as a cleaning liquid becomes large, and the liquid such as a cleaning liquid becomes easier to discharge to the outside of the frame unit 25 in a discharge step S3 described later. When the third surface 17c has liquid repellency, the contact angle between the third surface 17c and a liquid such as a cleaning liquid is specifically larger than 90°, preferably larger than 110°, and more preferably larger than 150°.

[0035] Examples of materials that impart liquid repellency to the third surface 17c include PTFE (polytetrafluoroethylene), TiN (titanium nitride), and DLC (diamond-like carbon). For example, a coating agent containing PTFE and a dispersion medium is applied to the third surface 17c, and the coating agent is dried, so that the third surface 17c is coated with PTFE. Also, TiN and DLC can be formed on the third surface 17c by a chemical vapor deposition (CVD) method or a physical vapor deposition (PVD) method to coat the third surface 17c.

[0036] Third surface 17c may have lyophilicity. By making third surface 17c lyophilic, the contact angle between liquid such as cleaning liquid and third surface 17c becomes small, and the liquid such as cleaning liquid is easily discharged to the outside of frame unit 25 while flowing along third surface 17c in discharge step S3 described later. When third surface 17c has lyophilicity, the contact angle between liquid such as cleaning liquid and third surface 17c is specifically 90° or less, preferably 30° or less, and more preferably 10° or less.

[0037] Examples of materials that impart lyophilicity to third surface 17c include SiO2 (silicon dioxide), TiO2 (titanium dioxide), etc. These materials can cover third surface 17c by applying a coating agent containing SiO2 or TiO2 and a dispersion medium to third surface 17c and drying it.

[0038] The material that imparts liquid repellency and liquid affinity is appropriately set according to the material of the support frame 17. Liquid repellency and liquid affinity may be imparted not only to the third surface 17c but also to the second surface 17b. This makes it easier for liquids such as cleaning liquid that have flowed over the third surface 17c during the discharge step S3 described below to be discharged to the outside of the frame unit 25 via the second surface 17b. However, liquid repellency and liquid affinity are not imparted to the first surface 17a. This is to prevent a decrease in the adhesion between the support frame 17 and the film 19.

[0039] In addition, it is preferable that the third surface 17c has a fine uneven structure on its surface. By having the surface of the third surface 17c have a fine uneven structure, the liquid repellency of the third surface 17c can be enhanced. This makes it easier for liquids such as cleaning liquid to be discharged to the outside of the frame unit 25 through the third surface 17c in the discharge step S3 described later, as in the case of forming a film having liquid repellency.

[0040] The surface treatment for forming the fine uneven structure on the third surface 17c can be appropriately selected. For example, the fine uneven structure is formed on the third surface 17c by subjecting the third surface 17c to a sandblasting treatment. In addition, when the support frame 17 is made of aluminum, the fine uneven structure is formed on the third surface 17c by subjecting the third surface 17c to an anodizing treatment.

[0041] The fine uneven structure may be provided not only on the third surface 17c but also on the second surface 17b. This makes it easier for liquids such as cleaning liquid that have flowed over the third surface 17c during the discharge step S3 described below to be discharged to the outside of the frame unit 25 via the second surface 17b. However, the fine uneven structure is not provided on the first surface 17a. This is to prevent a decrease in the adhesiveness between the support frame 17 and the film 19.

[0042] Next, a method for treating supported object 11 in which supported object 11 supported by film 21 is treated using support frame 17 according to the present embodiment will be described. The method for treating supported object 11 according to the present embodiment includes a frame unit forming step S1 in which a frame unit 25 is formed, and a treatment step S2 in which supported object 11 is treated with a liquid. Furthermore, the method for treating supported object 11 according to the present embodiment includes a discharge step S3 in which the liquid used in treatment step S2 and remaining therein is discharged from frame unit 25.

[0043] In the frame unit formation step S1, a frame unit 25 is formed. Specifically, a film 21 is attached to a first surface 17a of the support frame 17 so as to cover the opening 19. Furthermore, a supported object 11 is placed in the opening 19, and the film 21 comes into contact with the supported object 11, thereby attaching the film 21 to the supported object 11. In this way, a frame unit 25 consisting of the support frame 17, the film 21, and the supported object 11 is formed.

[0044] Next, processing step S2 is executed. In this embodiment, processing step S2 is performed on supported object 11, and a process for cleaning supported object 11 will be described as the process performed on supported object 11. For example, after frame unit formation step S1, a predetermined process (cutting process, laser process, etc.) is performed on supported object 11 supported by support frame 23 with film (processing step). Thereafter, supported object 11 is cleaned in processing step S2 while still supported by support frame 23 with film. However, processing step S2 may be performed after processing of supported object 11.

[0045] FIG. 3 is a perspective view showing a schematic view of the cleaning device 2. For convenience of explanation, some elements of the cleaning device 2 are omitted in FIG. 3. As shown in FIG. 3, the cleaning device 2 is provided with a holding table (spinner table) 4 capable of holding a frame unit 25. The holding table 4 includes a disk-shaped frame body 6 made of, for example, ceramics or metal. A recess 6a having a circular opening at the upper end is formed on the upper surface side of the frame body 6. A disk-shaped holding plate 8 that matches the shape of the recess 6a is fixed to the recess 6a of the frame body 6.

[0046] The holding plate 8 is made of a porous material such as ceramics, and its upper surface (holding surface) 8a holds the second surface 11b side of the supported object 11 via the film 21. The upper surface 8a of the holding plate 8 is configured to be approximately parallel to the X-axis and Y-axis when the holding plate 8 is fixed to the recess 6a. The X-axis and Y-axis indicate horizontal directions that are perpendicular to each other.

[0047] A flow path 6b is provided inside the frame 6, one end of which is open at the bottom of the recess 6a (see FIG. 4). On the other hand, a suction source (not shown) such as an ejector is connected to the other end of the flow path 6b via a valve (not shown) or the like. Therefore, when the valve is opened, negative pressure generated by the suction source acts on the upper surface 8a of the holding plate 8 through the flow path 6b, the recess 6a, etc.

[0048] For example, when frame unit 25 is placed on holding table 4 and film 21 attached to the first surface 17a of support frame 17 is in contact with upper surface 8a of holding plate 8, if negative pressure from a suction source is applied to this upper surface 8a, film 21 is sucked by upper surface 8a of holding plate 8. As a result, supported object 11 with film 21 attached thereto is held on holding table 4 with first surface 11a side exposed upward.

[0049] 3, a rotary drive source 12 such as a motor is connected to the lower part of the frame 6 of the holding table 4 via a cylindrical spindle 10. Therefore, the holding table 4 rotates around the axis (rotation axis) of the spindle 10, which is approximately parallel to the Z axis, by the power generated by the rotary drive source 12. The Z axis is aligned in a direction perpendicular to the X axis and the Y axis (vertical direction).

[0050] A plurality of air actuators 14 (three sets in this embodiment) are provided around the rotary drive source 12. When each air actuator 14 is operated, the holding table 4 moves up and down along the Z-axis direction together with the rotary drive source 12, the spindle 10, etc.

[0051] A plurality of (four sets in this embodiment) pressing mechanisms 16 for pressing the frame unit 25 are provided on the periphery of the frame 6 of the holding table 4. For example, the pressing mechanisms 16 are arranged at approximately equal intervals along the circumferential direction of the holding table 4. The pressing mechanisms 16 press the frame unit 25 placed on the holding table 4 from above, using centrifugal force generated when the holding table 4 is rotated. When the holding table 4 is rotated at high speed, the support frame 17 is pressed against the holding table 4 by the pressing mechanisms 16, and the frame unit 25 is appropriately held.

[0052] As shown in Fig. 3, a liquid supply unit (processing unit, cleaning unit) 18 is disposed beside the holding table 4. The liquid supply unit 18 includes a shaft 18a erected on the outside of the holding table 4, an arm 18b extending from the upper end of the shaft 18a along the upper surface 8a of the holding plate 8, and a nozzle (liquid supply nozzle, cleaning nozzle) 18c provided at the tip of the arm 18b. The shaft 18a and the arm 18b are pipe-shaped members and include a flow path through which the liquid flows. The nozzle 18c is connected to a liquid supply source (not shown) that supplies cleaning liquid via the flow path of the shaft 18a and the arm 18b.

[0053] Furthermore, the liquid supply unit 18 includes a rotation drive source (not shown) that rotates the shaft portion 18a around the Z-axis direction. By operating the rotation drive source, the nozzle 18c can be swung above the holding table 4. By operating the liquid supply source and the rotation drive source, a cleaning fluid can be sprayed from the nozzle 18c toward the first surface 11a of the supported object 11 held on the holding table 4, etc., while the nozzle 18c is swung above the holding table 4. Note that as the cleaning liquid, for example, a liquid such as pure water is used.

[0054] 3, the holding table 4 and the liquid supply unit 18 are housed in the space inside the liquid receiving container 20. The liquid receiving container 20 includes a disk-shaped bottom wall 20a and a cylindrical outer peripheral wall 20b provided along the outer periphery of the bottom wall 20a. In other words, the liquid receiving container 20 is formed in a bottomed cylindrical shape having a circular opening 20c at the upper end.

[0055] A circular opening for passing the spindle 10 is formed in the center of the disk-shaped bottom wall 20a, and a cylindrical inner peripheral wall 20d having a smaller diameter and height than the outer peripheral wall 20b is provided to surround this opening. Therefore, for example, even if the liquid sprayed from the nozzle 18c collides with the supported object 11 or the holding table 4 and scatters around, it will accumulate in an area on the bottom wall 20a between the cylindrical outer peripheral wall 20b and the cylindrical inner peripheral wall 20d.

[0056] The bottom wall 20a is provided with a drainage port 20e penetrating the bottom wall 20a in the thickness direction. A drain hose 24 is connected to the drainage port 20e, and liquid accumulated in the liquid receiving container 20 is discharged to the outside of the cleaning device 2 through the drainage port 20e and the drain hose 24.

[0057] A cylindrical cover 22 that surrounds the spindle 10 is provided below the holding table 4. Furthermore, legs 26 that support the liquid receiving container 20 are provided below the liquid receiving container 20. The height of the liquid receiving container 20 is adjusted according to the height of the holding table 4, etc.

[0058] The cleaning apparatus 2 also has one or more transport mechanisms (not shown) capable of transporting the above-mentioned frame unit 25 to the holding table 4 or the like. The transport mechanism is, for example, a robot arm. The frame unit 25 is carried into the holding table 4 by this transport mechanism, and is placed on the holding table 4 so that the first surface 11a side of the supported object 11 is exposed. The frame unit 25 is also carried out from the holding table 4 to the outside by the transport mechanism.

[0059] A controller (not shown) is connected to the various components of the cleaning device 2 described above. The operation of each component is controlled by this controller. The controller is configured by a computer including a processing device (not shown) such as a CPU (Central Processing Unit) and a storage device (not shown) consisting of a main storage device such as a DRAM (Dynamic Random Access Memory) and / or an auxiliary storage device such as a hard disk drive or a flash memory.

[0060] The functions of the controller are realized by the processing device operating in accordance with a program (software) stored in the storage device, although the controller may also be realized by hardware alone.

[0061] In processing step S2, the frame unit 25 is transported to the holding table 4 by the transport mechanism of the cleaning device 2, and the film 21 is placed on the holding table 4 so that it contacts the upper surface 8a of the holding plate 8. Next, the suction source is operated and the valve is opened, so that negative pressure generated by the suction source acts on the upper surface 8a of the holding plate 8 through the flow path 6b, the recess 6a, etc. As a result, the film 21 is sucked through the upper surface 8a. That is, the frame unit 25 is held on the holding table 4 with the first surface 11a side of the supported object 11 exposed upward.

[0062] After that, the controller moves the nozzle 18c above the frame unit 25, and rotates the holding table 4 by the rotary drive source 12 while dropping liquid from the nozzle 18c. As a result, the liquid is supplied to the first surface 11a side of the supported object 11. Then, the liquid supplied to the supported object 11 spreads radially toward the outer periphery side of the supported object 11 due to the centrifugal force of the rotating supported object 11. As a result, the liquid flows along the first surface 11a of the supported object 11, and foreign matter such as machining chips adhering to the first surface 11a side of the supported object 11 is washed away. In this way, the first surface 11a side of the supported object 11 is cleaned by the liquid.

[0063] The liquid supplied to the supported object 11 is scattered and discharged to the outside of the frame unit 25 by the centrifugal force of the frame unit 25. However, between the supported object 11 and the support frame 17, an annular groove is formed by the side surface of the supported object 11, the third surface 17c of the support frame 17, and the film 21. Therefore, after the completion of the processing step S2, the cleaning liquid may accumulate in the annular groove.

[0064] Next, a discharge step S3 is executed. Fig. 4 is a cross-sectional view of the frame unit 25 etc. in the discharge step S3. The controller stops the dripping of the liquid from the nozzle 18c, and then rotates the holding table 4 by the rotary drive source 12. At this time, the frame unit 25 rotates around the rotation axis passing through the opening 19.

[0065] When the frame unit 25 is rotated, the liquid 47 remaining on the supported object 11 or the film 21 moves toward the support frame 17 due to the centrifugal force generated by the rotation of the holding table 4. The liquid then flows down the third surface 17c and splashes to the outside of the support frame 17. As a result, the liquid 47 adhering to the supported object 11 or the film 21 is discharged from the frame unit 25.

[0066] As described above, liquid 47 tends to accumulate in the annular groove (on film 21) formed between supported object 11 and support frame 17. Also, in frame unit 25, a step is formed by third surface 17c of support frame 17 and film 21. If third surface 17c were configured to rise perpendicularly to the upper surface of film 21, the step would tend to prevent liquid 47 accumulated in the annular groove from being discharged.

[0067] On the other hand, according to this embodiment, as shown in Fig. 4, the third surface 17c of the support frame 17 has a portion inclined with respect to the first surface 17a so that the length of the opening 19 in a direction parallel to the first surface 17a is larger on the second surface 17b side than on the first surface 17a side. When the third surface 17c has a portion inclined with respect to the first surface 17a, when the centrifugal force generated by the rotation of the frame unit 25 acts on the liquid 47 present between the supported object 11 and the support frame 17 and the liquid 47 reaches the third surface 17c, the progress of the liquid 47 is not hindered by the third surface 17c, and the liquid 47 is guided along the third surface 17c to the outer periphery side of the support frame 17. This makes it possible to prevent the liquid 47 from accumulating near the third surface 17c, and the liquid 47 is easily discharged via the third surface 17c.

[0068] As described above, facilitating the discharge of liquid 47 from frame unit 25 suppresses poor appearance caused by liquid 47 drying and leaving marks on first surface 11a of supported object 11. Furthermore, particularly when liquid 47 is a chemical liquid such as an etching solution, it is possible to prevent film 21 from being corroded by liquid 47 remaining on film 21.

[0069] The cleaning device 2 may further include a gas supply unit that supplies drying gas to the frame unit 25. For example, the gas supply unit includes a nozzle that sprays gas such as dry air. Then, in the discharge step S3, the controller rotates the holding table 4 and causes the nozzle of the gas supply unit to spray gas onto the frame unit 25. For example, the nozzle is positioned so as to overlap with the supported object 11 of the frame unit 25, and supplies gas to the supported object 11. As a result, the gas that has reached the supported object 11 flows toward the outer periphery of the frame unit 25, facilitating the discharge of the liquid from the frame unit 25.

[0070] Also, the processing step S2 and the discharge step S3 may be performed in different devices. For example, after performing the processing step S2 in the cleaning device 2, the frame unit 25 may be transported from the cleaning device 2 to a drying device, and the discharge step S3 may be performed in the drying device. Also, when processing the supported object 11 using a processing device after the frame unit formation step S1, the processing device may be equipped with the cleaning device 2. In this case, after processing the supported object 11, the processing step S2 and the discharge step S3 are subsequently performed by the cleaning device 2 in the processing device.

[0071] Next, a frame unit 35 according to a second example will be described. FIG. 5 is a cross-sectional view of the second example of the frame unit 35. The frame unit 35 according to the second example includes a support frame 27 having an opening 29, a film 31, and a supported object 11, similar to the frame unit 25 according to the first example described above. The support frame 27 and the film 31 form a support frame 33 with a film. In the frame unit 35 according to the second example, the shape of the third surface 27c of the support frame 27 is different from the third surface 17c of the support frame 17 of the frame unit 25 according to the first example.

[0072] 5, the support frame 37, like the support frame 17 according to the first example, includes a first surface 27a, a second surface 27b opposite to the first surface 27a, and a third surface 27c connected to both the first surface 27a and the second surface 27b. The third surface 27c defines an opening 29 that opens to both the first surface 27a and the second surface 27b.

[0073] The third surface 27c has a portion (inclined portion) 27d disposed on the second surface 27b side and inclined with respect to the first surface 27a, and a portion (vertical portion) 27e disposed on the first surface 27a side and substantially perpendicular to the first surface 27a. That is, a part of the third surface 27c is inclined with respect to the first surface 27a.

[0074] In order to obtain the effect of facilitating the discharge of liquid such as the cleaning liquid to the outside of the frame unit 35 in the discharge step S3, it is preferable that 50% or more of the third surface 27c is inclined with respect to the first surface 27a. That is, it is preferable that the area of ​​the inclined portion 27d of the third surface 27c is equal to or larger than the area of ​​the vertical portion 27e.

[0075] Next, a frame unit 45 according to a third example will be described. FIG. 6 is a cross-sectional view of the frame unit 45 according to the third example. The frame unit 45 according to the third example includes a support frame 37 having an opening 39, a film 41, and a supported object 11, similar to the frame unit 25 according to the first example and the frame unit 35 according to the second example described above. The support frame 37 and the film 41 form a support frame 43 with a film. In the frame unit 45 according to the third example, the shape of the third surface 37c of the support frame 37 is different from the third surface 17c of the support frame 17 of the frame unit 25 according to the first example.

[0076] 6, like the support frame 17 according to the first example and the support frame 27 according to the second example, the support frame 37 includes a first surface 37a, a second surface 37b opposite to the first surface 37a, and a third surface 37c connected to both the first surface 37a and the second surface 37b. The third surface 37c defines an opening 39 that opens to both the first surface 37a and the second surface 37b.

[0077] The third surface 37c is composed of a first portion 37d arranged on the first surface 37a side and a second portion 37e arranged on the second surface 37b side. The angle between the first portion 37d and the first surface 37a is different from the angle between the second portion 37e and the first surface 37a.

[0078] 6, the angle between the first portion 37d and the first surface 37a is smaller than the angle between the second portion 37e and the first surface 37a (the angle between a plane parallel to the first surface 37a and a plane parallel to the second portion 37e). For example, the angle between the first portion 37d and the first surface 37a is 5° or more and 30° or less, and the angle between the second portion 37e and the first surface 37a is 60° or more and 85° or less.

[0079] By configuring the third surface 37c of the support frame 37 with two portions having different inclination angles, it is possible to easily discharge liquid such as cleaning liquid to the outside of the frame unit 25 when the discharge step S3 is performed while suppressing an increase in the width of the support frame 37. Note that the third surface 37c of the support frame 37 may be configured with three or more portions each inclined at a different angle with respect to the first surface 37a.

[0080] In addition, the structures, methods, and the like according to the above-described embodiments and modifications may be modified and implemented without departing from the scope of the present invention. [Explanation of symbols]

[0081] 11: Supported object 11a: 1st side (front) 11b: 2nd side (back side) 11c: Notch 13: Planned division line 15: Device 17: Support frame 17a: 1st page 17b: 2nd side 17c:Side 3 19: Opening 21:Film 23: Support frame with film 25: Frame unit 27: Support frame 27a: 1st page 27b: 2nd side 27c: 3rd page 27d: Slanted part 27e :Vertical part 29: Opening 31: Film 33: Support frame with film 35: Frame unit 37: Support frame 37a: 1st page 37b: 2nd side 37c: 3rd page 37d: 1st part 37e :Second part 39: Opening 41: Film 43: Support frame with film 45: Frame unit 47 :Liquid 2: Cleaning equipment 4: Holding table (spinner table) 6: Frame 6a: Recess 6b: Flow path 8: Holding plate 8a:Top surface (holding surface) 10: Spindle 12: Rotation drive source 14: Air actuator 16: Pressing mechanism 18: Liquid supply unit (processing unit, cleaning unit) 18a:Shaft part 18b: Arm 18c: Nozzle (cleaning liquid supply nozzle, cleaning nozzle) 20: Liquid receiving container 20a: Bottom wall 20b: Outer wall 20c: opening 20d: Inner wall 20e: Drainage port 22: Cover 24: Drain hose 26: Legs

Claims

1. A support frame with a film, comprising: a metal support frame having an opening; and a film attached to the support frame so as to cover the opening, The support frame has a first surface that contacts the film, a second surface opposite to the first surface, and a third surface connected to both the first surface and the second surface and surrounding the opening that opens to both the first surface and the second surface; A support frame with a film, characterized in that the third surface has a portion inclined with respect to the first surface so that the length of the opening in a direction parallel to the first surface is greater on the second surface side than on the first surface side.

2. The portion includes a first portion on the first surface side and a second portion on the second surface side, 2. The support frame with a film according to claim 1, wherein an angle between the first portion and the first surface is different from an angle between the second portion and the first surface.

3. 3. The support frame with a film according to claim 2, wherein an angle between the first portion and the first surface is smaller than an angle between the second portion and the first surface.

4. 4. The support frame with a film according to claim 1, wherein the third surface has liquid repellency or liquid affinity.

5. A metal support frame having an opening, a first surface that is in contact with the film during use; a second surface opposite the first surface; and a third surface connected to both the first surface and the second surface and defining the opening that opens to both the first surface and the second surface; A support frame, wherein the third surface has a portion that is inclined with respect to the first surface such that the length of the opening in a direction parallel to the first surface is greater on the second surface side than on the first surface side.

6. The portion includes a first portion on the first surface side and a second portion on the second surface side, 6. The support frame of claim 5, wherein an angle between the first portion and the first surface is different from an angle between the second portion and the first surface.

7. 7. The support frame of claim 6, wherein an angle between the first portion and the first surface is less than an angle between the second portion and the first surface.

8. 8. The support frame according to claim 5, wherein the third surface is liquid repellent or liquid-philic.

9. A method for treating a supported object, comprising the steps of: treating the supported object supported by the film using the support frame according to any one of claims 5 to 7; a frame unit forming step of forming a frame unit including the support frame, the film, and the supported object by attaching the film to the first surface of the support frame so as to cover the opening and attaching the film to the supported object disposed in the opening; a processing step of treating the supported object with a liquid by supplying the liquid to the supported object after the frame unit forming step; A method for processing a supported object, comprising: a discharge step, after the processing step, of rotating the frame unit around a rotation axis passing through the opening, thereby discharging the liquid remaining on the supported object or the film from the frame unit by centrifugal force.

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