Module for chemically processing substrate

Abstract

To provide a module for chemically processing a substrate, a method for chemically processing a substrate, and a use of a module for chemically processing a substrate, in particular a large substrate.SOLUTION: The module for chemically processing a substrate comprises an immersion chamber, a spray unit, and a motion unit. The immersion chamber is configured to receive a first liquid and the substrate, so that the substrate is immersed in the liquid. The spray unit comprises a plurality of spray nozzles, which are configured to spray a second liquid into the immersion chamber. The motion unit is configured to provide a relative motion between the substrate and the spray unit.SELECTED DRAWING: Figure 1a

Description

[Technical Field]

[0001] The present invention relates to a module for the chemical treatment of substrates, a method for chemically treating substrates and a method for treating substrates, in particular It concerns the use of modules for chemical processing of large substrates. [Background technology]

[0002] Multipurpose or so-called "all-in-one" process chambers primarily used for chemical processing of substrates Combine various process techniques (e.g., rinsing and drying functions) in the same process chamber. These processes should allow for the application of a combination of liquid spray and immersion type treatments. The chamber provides excellent substrate processing without the need to move the processed substrate from chamber to chamber. However, the realization of such a multipurpose chamber is a long way off. It presents significant problems that have hindered its adoption to date. Notable examples of problems / challenges include: It is as follows. (1) Chemical drainage is difficult due to the inability to efficiently separate chemicals at each processing step. This can result in undesirable mixing of the chemicals within the container. (2) There are many cases where chemical recovery is insufficient for partial or total reuse of chemicals. This leads to very high CoC (cost of consumables) for chemical consumption and associated equipment. (3) Insufficient and ineffective rinsing ability (complex mechanical design and implementation in the chamber) , creating areas that are difficult to effectively rinse from chemical residues and high DI (deionized) water consumption ( Chemical cross-over through chemical residues in the process chamber, leading to high CoC Contamination occurs. (4) The complexity of the exhaust system can lead to chemical cross-contamination, residues and Salt precipitates may form (especially during subsequent processing steps such as acidic and basic). (When using incompatible chemicals). Salt deposits, especially in exhaust pipes, can lead to potentially unsafe conditions and damage to the substrate. Leading to unwanted contamination. Application of solvents (flammable or non-flammable) in the process flow. Further problems arise when using a solvent (a non-ionic solvent). (5) A drying process that is insufficient and can contaminate the substrate and is very slow. , the yield is reduced, and the process time is very long, resulting in a low number of substrates processed per hour. (High CoC, cost of ownership). (6) Chemical sensitivity due to chamber and airflow design and chamber and substrate size Uneven temperature distribution and cooling effect.

[0003] Several systems have been proposed to overcome these limitations. None of the previous techniques have been successful. Summary of the Invention [Problem to be solved by the invention]

[0004] Therefore, various processes can be performed within a single processing unit to achieve superior substrate processing results. There is a need to provide a module for improved chemical treatment of substrates that allows the application of the technology. do. [Means for solving the problem]

[0005] This problem is solved by the subject matter of the independent claims, further embodiments of which are defined in the dependent claims. The following aspects of the invention are incorporated into a module for chemical treatment of a substrate, It should be noted that this also applies to methods for chemically treating substrates and the use of modules for chemically treating substrates. I want to be.

[0006] According to the invention, a module for chemical treatment of a substrate is presented. The module includes an immersion chamber, a spray unit, and a movement unit.

[0007] The immersion chamber is configured to contain a first liquid and a substrate and to immerse the substrate in the liquid. The spray unit includes a plurality of spray nozzles configured to spray the second liquid into the immersion chamber. The first and second liquids may be the same or different. The movement unit is configured to provide relative movement between the substrate and the spray unit.

[0008] The result is a liquid processing system that can integrate and combine various process technologies. An "all-in-one" multipurpose module or process chamber is provided. For example, Immersion treatment, liquid spray treatment (sequential or simultaneous / parallel) in the same chamber, and possibly In addition, ultrasonic agitation can be applied to the substrates when they are not required to be moved between different processing vessels. Efficient and effective rinsing and drying is achieved without any hassle. The Joule accelerates many steps while reducing costs and improving product quality. Furthermore, many different substrate sizes can be accommodated without requiring mechanical modifications to the chamber. It is possible to process the data.

[0009] The spray nozzle of the spray unit is configured to spray the second liquid in the thickness direction of the substrate, i.e., It is preferable that the spray be placed so as to spray onto the substantially front surface of the substrate in the thickness direction. The nozzle is configured to spray the second liquid in a direction substantially perpendicular or normal to the surface of the substrate to be processed. "Approximately perpendicular" means not parallel to the substrate, and preferably 70° to 1° with respect to the surface of the substrate. This can be understood as a spray of liquid in the range of 10°. The reduction or prevention of spots improves the uniform distribution of the second liquid on the surface of the substrate. Compared to spraying the liquid from the side, i.e. parallel to the substrate, a nearly perpendicular spray This significantly increases the impact energy of the chemical spray on the substrate surface. A significant reduction in the layer thickness is achieved. That is, the thickness of the high-viscosity layer of the first chemical liquid in contact with the surface is reduced. The reduction in the boundary layer thickness can significantly reduce the particle size embedded in this viscous boundary layer. This makes it easier to remove the particles. In this case, a thinner boundary layer results in faster chemical exchange, i.e., the second chemical and the first chemical Mixing of the chemicals can be significantly faster.

[0010] Generally, the impact energy depends on the selection of the spray amount and spray energy towards the surface. By adjusting the thickness of the boundary layer, it is possible to adjust the thickness of the boundary layer. The embedded particles are large, and a boundary layer forms on the surface with very small and fragile structures. In this case, it would be advantageous to reduce the boundary layer thickness only slightly. The second liquid can be removed by the significantly higher impact energy of the second liquid, while the first liquid still remains. In other cases, the fragile structure is protected by a sufficiently thick viscous boundary layer. Very small structures embedded within the boundary layer remain on the substrate surface, while less sensitive device structures remain. In this case, it may be necessary to remove large particles, such as near-perpendicular particles, which have very high impact energies. A chemical spray of the above would be suitable for removing such particles. For example, a slow mix of both chemicals or between the first chemical solution and one or more materials on the surface of the substrate. When a fast chemical quench is required to very rapidly slow or stop a chemical reaction; The same applies to the exchange or mixing of the first and second chemical liquids.

[0011] Complex chemical (liquid, vapor, gas) and physical (mixing and transport between substrate and spray unit) The implementation of the ) system can improve many procedures for chemically processing substrates. For example, (1) photoresist development, (2) etching, and (3) photoresist removal. This allows previously unintegrable processing steps to be combined in one chamber. In particular, photoresist removal can be improved and accelerated without significant material loss in the underlying layer. It is possible.

[0012] The module is adapted to chemically process at least one substrate, which may be held in a substrate holder. The substrate holder holds two substrates. The substrate can be processed on one side or both sides. which can then be processed simultaneously by the module according to the invention. .

[0013] In one embodiment, the module for chemical treatment of the substrate comprises a first liquid in an immersion chamber. an ultrasonic unit or acoustic agitation unit configured to provide ultrasonic waves to agitate the The term "ultrasonic" is understood to refer to the frequency range from kHz to lower MHz range. The ultrasonic range is 10 kHz to 100 MHz, preferably 80 kHz to 10 MHz. Hz, and more preferably 900 kHz to 3 MHz.

[0014] The ultrasonic unit or acoustic agitation unit is a single transducer, e.g. a full-area It may contain a single transducer, or multiple smaller transducers. There may be four ultrasonic units. These are divided into two or three immersion chambers. They can be distributed over four outer surfaces, although of course a greater number is possible. (Singular or plural) are directly connected to the immersion chamber or indirectly connected to a transducer plate or the like. The device may be connected to and attached to:

[0015] In one embodiment, the ultrasonic unit is located on the exterior surface of the immersion chamber. For example, the ultrasonic unit may be connected to the nozzle bar of the spray unit or from the spray bar to the nozzle bar. or outside the immersion chamber so that acoustic transmission can be achieved through the open space between the spray bars. Of course, it can also be attached to the inside of the immersion chamber. In another embodiment, the ultrasonic unit and the spray unit are connected to the immersion chamber. At least partially disposed on a removable plate element configured to move. For example, several ultrasonic transducers and several spray nozzles may be attached to a plate element. The plate element may be disposed so as to be separate from the immersion chamber wall. It can be movable within the immersion chamber and can also be movable in and out of the immersion chamber. In this case, the ultrasonic unit may comprise multiple ultrasonic transducers positioned between adjacent spray bars. It may include a consumer.

[0016] The motion unit is configured to move the substrate and the spray unit relative to each other. Thus, the motion unit moves the substrate (possibly including the substrate holder) and / or The spray unit, in particular the spray nozzle and / or the spray bar, can be moved. do.

[0017] In one embodiment, the motion unit is based on the immersion chamber and the spray unit. The plate is configured to move in a first direction, the first direction being vertically out of the immersion chamber. In one embodiment, the movement unit may be additionally or Alternatively, the apparatus is configured to move the substrate relative to the immersion chamber in another or second direction; This direction may be understood as an X direction that is different from and in particular perpendicular to the first direction. The second or X direction is determined by the thickness of the substrate, the growth of the coating layer, and the direction from the front side to the back side of the substrate. In one embodiment, the motion unit moves the substrate relative to the immersion chamber. in yet another or third direction or the Y direction, which direction may include: The third or Y direction is perpendicular to the first and second directions and runs across the width of the substrate. Horizontal may be understood as a movement or shaking of the substrate or substrate holder in the Z and / or Y direction. Furthermore, the spray may be applied from the immersion chamber wall to the substrate, for example, through the spray bar of the spray unit. The shadowing effect of ultrasonic radiation can be reduced or eliminated across the substrate surface. The distance from the substrate to the ultrasonic radiation source is adjusted to the It can be controlled according to the wavenumber range.

[0018] The spray unit may comprise a plurality of spray nozzles configured to spray a liquid for cleaning the substrate, for example. There may be only one or two spray units. Play units are also possible.

[0019] In one embodiment, the spray nozzle is at least partially disposed in a wall of the immersion chamber. In other words, the spray nozzle is placed in an immersion chamber where it can be ultrasonically agitated. It can be incorporated into the wall.

[0020] In one embodiment, the spray unit sprays a spray onto the substrate and / or the wall of the immersion chamber. The submerged chamber is configured to spray the second liquid in a non-vertically inclined spray direction. The walls may be parallel to the substrate to be treated. The spray unit and in particular the spray nozzle may be immersed in The second liquid may be configured to spray in a spray direction towards the bottom of the chamber. The spray direction is preferably in the range of 20° to 70° relative to the substrate and / or the wall of the immersion chamber. and more preferably at an angle of about 45° to the substrate or wall. The nozzle may be tilted in the Z direction (in and out of the immersion chamber) and / or in the Y direction (to allow the substrate The nozzle may be configured to spray the second liquid in an angled spray direction (along the width of the nozzle). The tilt of the direction also allows residual chemicals to be drained by gravity from the spray nozzle after treatment. In other words, the spray nozzle is tilted downward at about 45 degrees and to the side at about 25 degrees. The spray nozzle may be fixed at an angle. or may be movable by the motion unit to indicate a change in tilt angle.

[0021] In one embodiment, the spray nozzles may be mounted as an alternative or in addition to being integrated into the chamber wall. and at least partially disposed on a spray bar disposed within the submerged chamber. The term "spray bar" refers to a hollow rod and / or nozzle having a plurality of openings that act as spray nozzles. a hollow rod having at least one slit extending at least partially along the length of the rod; In one embodiment, the exercise unit or another device may be understood as a bar (slit bar). At least some of the spray bars may be moved relative to the substrate or the wall of the immersion chamber. The movement of the spray bar is configured to allow for the discharge of liquid from the spray bar. Therefore, the movement unit can move at least some of the spray bars in a non-aqueous manner. It can be configured to rotate and tilt to a flat position. 360° rotation is also possible. The liquid can be drained, for example, into a recirculation tank, before being cleaned with, for example, water. This is due to the insufficient recovery of chemicals for partial or total reuse, resulting in a large number of chemicals being wasted. This leads to very high CoC (Consumables Cost) for the fluid consumption and associated equipment. This can help to avoid

[0022] As mentioned above, the motion unit or other device may move the spray bar or spray nozzle to the substrate. or by moving the spray bar in a rotational motion about the longitudinal axis of the spray bar relative to the wall of the immersion chamber. The motion unit or other device may additionally or alternatively be a spray bar or The spray nozzle is positioned relative to the longitudinal axis of the spray bar relative to the substrate or the wall of the immersion chamber. This allows the substrate to be moved in a vertical fan-out motion in the Y direction (the distance between the substrate and the immersion chamber). Side-to-side movement when viewed along the width and / or Z direction (in and out of the immersion chamber) The fan-opening range is 10° to 40°, preferably 20°. The rotational and fanning movements can be performed simultaneously or alternately, i.e., in combination. This movement allows the spray nozzle to descend after the treatment is completed. At this point, residual chemicals can be drained from the spray nozzle, i.e., Empty the spray bar before use to reduce chemical dilution and waste. The advantage is that movement or shaking of the substrate holder and substrate along the Y direction can be reduced or completely avoided. This makes the handling system easier to design and manufacture.

[0023] tilting the spray nozzle or spray bar to an inclined position or The spray bar movement allows efficient application of chemicals from the spray bar prior to a cleaning rinse with water, for example. There are several options for achieving this tilt. The spray nozzle is tilted relative to the spray bar or the spray nozzle is tilted relative to the chamber wall. or tilting the spray bar relative to the chamber wall. It is also possible to

[0024] In one embodiment, adjacent first, second, and third rows of spray nozzles The second spray nozzle is inclined in the same direction relative to the third spray nozzle, while the third spray nozzle is inclined in the same direction relative to the second spray nozzle. The nozzle is positioned and tilted differently from the first and third spray nozzles. The spray nozzle rows may extend along the Z and / or Y directions. The differently oriented spray nozzles may be nozzles positioned above or below each other or side by side.

[0025] The spray nozzle arrangement may consist of multiple rows of spray nozzles (located on the submerged chamber wall or spray bar). If spray nozzles are included, the spray nozzles may be aligned horizontally and vertically. The spray nozzles may be aligned vertically on every other spray row or spray bar. Between spray nozzles in adjacent spray rows, e.g., adjacent spray nozzles in the same spray row In some cases there is a displacement of half the distance between the zuls.

[0026] The spray unit or spray nozzle or spray bar is located within the immersion chamber. These can be extended along the substrate to be treated. On the other hand, "standard" spray nozzles or An additional cleaning unit, bar, or nozzle extends above the spray bar and the unprocessed substrate. This additional cleaning unit, bar, or nozzle may be located below the "standard" spray The nozzle or spray bar may be configured to clean the substrate. The cleaning unit, bar, or nozzle may be a row of nozzles facing the opening of the immersion chamber and / or another and / or Or it may have the fanning motion capability as described above.

[0027] The module for chemical treatment of the substrate includes a rapid filling module configured to rapidly fill the immersion chamber. It may further comprise a fill port or valve. The term "high speed" in this context refers to a high speed liquid, e.g., 20 liters of liquid. A module for chemical treatment of the substrate may alternatively or additionally be used. and can be filled by spray units and in particular spray bars.

[0028] In one embodiment, a module for chemical treatment of a substrate comprises a valve unit having a plurality of valves. Each valve is connected to a separate tank or drain. The valve unit can be configured for rapid drainage to enhance process uniformity. In this situation, rapid means, for example, 10 seconds, 5 seconds, or 40 to 60 liters of liquid. or less than 3 seconds. The valve unit efficiently distributes chemicals for each individual processing step. This helps to avoid undesirable mixing of chemicals in the chemical drain that can occur due to inability to separate. The valve unit is a valve block for drainage control, especially the so-called quick dump rinsing (Q DR) may be a valve block.

[0029] The valve unit or valve may be located at the bottom or lower end of the immersion chamber. The lowest point of the liquid in the module may be within the valve. Gravity drainage is used and can be further enhanced with optional suction to increase the rate of drainage. There may be one, two or three valves. More are possible. Generally, n is used to There can be at least n+1 valves for the number of liquids used. There may be n+3 valves. The additional valve(s) may be located on the side of the immersion chamber, for example. There may be one or more exhaust valves per wall.

[0030] In one embodiment, the module for chemical treatment of substrates further comprises an exhaust unit The exhaust unit prevents chemical fumes from contaminating the outside of the processing chamber and, in the worst case scenario, the production level. To avoid this, a predetermined gas flow is required from the outside of the processing chamber to the fabrication level waste system. Providing a pressure gradient can result in effective and efficient exhaust flow during, for example, substrate drying. A production level is defined as an environment in which one, several, or many tools operate simultaneously. Potentially unsafe conditions and consequences of well-functioning exhaust units at the equipment level Within the equipment, which can lead to contamination of the substrate, especially through the exhaust system from the equipment level to the fabrication level. This avoids chemical cross-contamination, chemical residues, and salt formation in the exhaust pipe. The exhaust system may include one, two, at least two or more exhaust systems. In one example, an upper and lower exhaust system These can be used depending on the operating mode. An upper exhaust system is used, which is located directly above or above the immersion chamber. It may be a "total" exhaust system in the upper region, preferably just below the idle exhaust system. In this mode, a bottom exhaust device located at the bottom of the immersion chamber may be preferably used. stomach.

[0031] Each exhaust device, especially the bottom exhaust device, may include one or more exhaust valves. Each exhaust valve can be opened and closed, or in other words switched between an open and closed state. It is possible to mix different and incompatible chemical solutions in an all-in-one chamber. In this case, the exhaust valve(s) can be used in combination with other exhaust valves, e.g., acidic, basic, At least one or all of the valves may be two-way or The valve may be a rinsable, closable, and / or three-way valve or a combination thereof. Or it is breathable.

[0032] The exhaust unit shall also have at least one exhaust line that can be rinsed, cleaned, or filled with a liquid or gas. In one example, an exhaust line to a switch point between the equipment level and the fabrication floor level may be This can be done by flushing the exhaust line with water or by flushing the exhaust line with water from the process chamber. or by spraying water or other liquids into the exhaust line. In the case of two or more exhaust lines, the exhaust valves can be switched to different exhaust lines. In other words, the exhaust valve can be disposed between the first exhaust line and the second exhaust line. It can be switched.

[0033] A drain line may be provided to remove cleaning water or other cleaning fluids from the exhaust line. It can be provided and connected to the exhaust line (preferably at the lowest point and / or the lowest common point of the exhaust line). The drain line may be switched by a valve configured to turn the drain on and off. The exhaust can be switched on and off, for example between acid and base. Since it can be replaced, the load on the exhaust line at the manufacturing level can change significantly. is a problem for the overall management of the exhaust system at the manufacturing level including other systems and tools. To mitigate this situation, an equipment-level exhaust unit is installed to can be opened if not in use and / or equipment level exhaust control depending on the exhaust load It may further include a bypass that can be adjusted by the node system.

[0034] The module for chemical treatment of the substrate is arranged in the lower part of the module and exhaust unit. The liquid separator may further comprise a liquid separator, which preferably does not even require a rinse unit. This can help to avoid clogging of the system and especially the exhaust unit.

[0035] In one embodiment, the module for chemical treatment of the substrate comprises a drain-rinse-dry unit. The drainage, rinsing and drying unit further includes: In other words, it is not necessary for all functions to be provided. Drain-rinse-dry units are available with or without spray rinse and ultrasonic agitation. - Flow rinse, combination of spray and overflow rinse, waterfall rinse Waterfall chemical treatment, waterfall quench, etc. The rinse and dry unit can be configured for rinsing between applications. For example, a drain-rinse-dry unit may include four valves arranged on the side of the drain-rinse-dry unit. Additionally or alternatively, it may provide for waterfall chemical processing of the substrate; The water or chemical solution can be drained from the top to the bottom of the substrate by gravity. Drying units can be used to quench or stop chemical reactions.

[0036] The drain-rinse-dry unit may also be configured to rinse and clean the soaking chamber. At least a portion of the drain-rinse-dry unit is located at the top or upper portion of the immersion chamber. and / or located on the top or upper portion of the chamber cover unit to cover the immersion chamber and / or Or, it is possible to clean the chamber cover unit. This means that the top or additional spray or nozzle bar can be moved around the cover. This can be implemented for the rinse of the raw material. This is done by flooding the liquid below the top two spray or nozzle bars. In other words, the cover unit can be mounted in a double-sided spray direction. The top spray or nozzle bar for rinsing the nozzle is configured for two different spray directions. A second spray or nozzle bar, one below the top, may spray in the direction of the substrate. The top two spray or nozzle bars may alternatively also have the fanning motion capability as described above. It can guide the liquid or gas provided by the drain, rinse and dry unit and There may be guide plates configured to improve flow. The nozzle can help avoid chemical cross-contamination through chemical residues in the process chamber. This is achieved through its efficient and effective rinsing ability, which is traditionally achieved by using Residual liquid is difficult to rinse, leading to high DI (deionized) water consumption and high CoC. Complex mechanical designs within different chambers can also be accommodated.

[0037] The drain-rinse-dry unit transfers liquid and and / or gas is blown into and / or liquid and / or liquids are removed from the immersion chamber and / or spray unit. The drain-rinse-dry unit may be further configured to extract gases and / or to remove the gases. Allowing for example back-suction of liquid from the spray bar and / or spray nozzle. The drain-rinse-dry unit may be used in addition or as an alternative to a spray bar or any It is possible to spray chemicals from any type of nozzle tube. The nozzle may also allow for back suction and blow-out simultaneously. Efficient chemical recovery for partial or total reuse is possible, meaning chemical consumption is reduced and C is reduced.

[0038] The drain-rinse-dry unit further provides efficient and effective cleaning of the substrates and / or substrate holders. This allows the substrate and / or substrate holder to be placed in a drying section at the top of the immersion chamber. This can be done, for example, by laminar flow from top to bottom while passing (repeatably) through the zone. The air knife can be understood to be capable of handling different substrates and Depending on the plate holder shape, it may be fixed or non-fixed / movable. A gas knife with gases can be used. A gas knife can be used behind the air knife for optimal evacuation during drying. There may be additional exhaust opening(s). In addition, there may be additional exhaust opening(s) during the drying-only step. There may be two additional valves, for example, on the bottom side of the immersion chamber for ventilation. These additional valves can be closed during other process steps. As a result, an insufficient drying process and / or avoiding drying processes that may contaminate the substrate and / or are slow This shortens the process time and increases the amount of substrates processed per hour.

[0039] In one embodiment, the drain-rinse-dry unit comprises a soak chamber and / or a spray chamber. - Heating or cooling liquids and / or gases blown or drawn through the unit The temperature control element may be configured to, for example, heat the pre-rinse liquid. The temperature control element can be configured to bring the entire module to the temperature before dispensing the actual chemical. For example, post-rinse solutions can be heated to cool the entire module between different process steps. The temperature control element may also be configured to heat at least one of the chamber walls to prevent cooling. It can also be a chamber heating device that heats or cools the substrate surface. to avoid uneven temperature distribution along the In particular, the temperature control element is sensitive to the chamber and airflow design, chamber and substrate size. The cooling effect on the chemical caused by the chemical or the cooling effect through the chemical Helps to avoid.

[0040] In one embodiment, the module for chemical treatment of substrates comprises a plurality of cover elements, preferably The chamber cover unit further includes a movable cover element, for example, four cover elements. The cover element is configured to close the opening of the immersion chamber in the closed position. The cover element is further configured to closely surround the substrate in the transfer position during transfer through the opening. The cover element is further configured to open the opening to an open position, i.e., the cover element moves laterally or It can be flipped over to open the opening.

[0041] In one embodiment, the chamber cover unit further includes a mechanism for fully opening the opening to a fully open position. Unlike the standard "open" position described above, the chamber cover unit may have a Open the immersion chamber completely to avoid turbulent areas in the upper corners of the immersion chamber An additional degree of freedom is provided for the "fully open" position. The additional degree of freedom is provided by the Y-motion unit and and its immersion chamber in addition to Y-direction cover movement leading to substrate handling / shaking To fully open the top of the device, separate the motion unit and its substrate handling / shaking mechanism. This means that additional cover movement in the X and / or Y directions is possible. is particularly suitable for drying, loading and unloading of substrates, maintenance, module maintenance and repair, etc.

[0042] The movable cover elements may be moved relative to the immersion chamber, relative to each other, and / or relative to the immersion chamber. The pressing force can be generated by at least a spring, a pneumatic cylinder, and the like. The movable cover element can be applied by a hydraulic cylinder or the like. A gap may occur between the movable cover element and the rim of the immersion chamber. Instead of being sealed, the immersion chamber is sealed to prevent the flow of contaminant gases from the inside to the outside. The seal air / gas flow can be controlled by the flow of air or a separate seal gas. The seal air / gas flow can be directed from the outside to the inside of the immersion chamber. The velocity of the movable cover element and the immersion chamber may be in the range of 0 m / s, preferably about 5 m / s. Another option for controlling the gap between the immersion chamber and the workpiece is to use an exhaust unit to control the gap between the immersion chamber and the workpiece. Provides sealing air / gas flow from the outside to the inside of the chamber to prevent contaminated gas flow from the inside to the outside The key is to stop it.

[0043] The cover element is sealed against the immersion chamber or the rim or contact surface of the immersion chamber. The seal may comprise at least a sealing element such as a resilient lip, a labyrinth seal, etc. The seal may be liquid-tight and / or air-tight. The chamber cover unit prevents chemical contamination of the environment, especially the area outside the immersion chamber. This can reduce or eliminate droplets of chemical solution onto the affected area.

[0044] In one embodiment, the chamber cover unit is an interface between the substrate and the spray unit. the chamber cover element in response to motion data received from a motion unit controlling the pair motion. In other words, the cover unit or The element(s) may be integral with or in conjunction with the substrate motion system, e.g. For example, the actuators can move in the X and / or Y directions. This relative movement is achieved by mechanical coupling. or at least motor control, e.g. an electric motor that moves the chamber cover element. The motion data may be based on the motion data transmitted by the

[0045] In one embodiment, the module for chemical treatment of the substrate comprises at least one immersion chamber. A holding member configured to lift a top, side or corner to expel liquid from the spray unit. The lifting unit can lift, for example, one side of the immersion chamber by several degrees in the Y direction. This allows the liquid or chemical to flow out of the "initially" horizontal tube or bar by gravity. , which are then tilted non-horizontally. As a result, the immersion chamber is lifted or Tilting allows for drainage of dip chambers, spray bars, etc. to conserve chemicals Therefore, chemical recovery for partial or total reuse of chemicals becomes much more efficient. This means that chemical consumption is reduced and CoC is reduced.

[0046] In one embodiment, a module for chemical treatment of a substrate comprises an array of spray nozzles. The shielding unit may further include a shielding unit configured to shield the fluid or gas. Directing the flow of gas, e.g. to protect specific areas, rinse hard-to-reach areas, It is also possible to drain liquid in a direction.

[0047] The present invention also provides a method for chemically treating a substrate, the method comprising: Not necessarily in that order, but inserting a first liquid and a substrate into an immersion chamber such that the substrate is immersed in the liquid; removing the first liquid from the immersion chamber; A second liquid is sprayed into the immersion chamber by a spray unit including a spray nozzle. Steps and Relatively moving the substrate and / or the spray unit by the motion unit; Includes.

[0048] In one embodiment, a method for chemically treating a substrate includes providing ultrasound to agitate a first liquid. The method further includes the step of:

[0049] In one embodiment, the step of spraying the second liquid includes at least one step of immersing the substrate in the first liquid. The spraying is also carried out during partial immersion; that is, immersion and spraying can be carried out simultaneously. The misting may be performed before removing the first liquid from the immersion chamber.

[0050] In one embodiment, the method for chemically treating a substrate includes immersion chambers for subsequent processing of the same substrate. The method further includes removing the substrate from the immersion chamber while the chamber is being rinsed or cleaned. Furthermore, the substrate is placed in an empty immersion chamber and outside the immersion chamber or through an opening in the immersion chamber. A rinsing and / or drying step of the substrate is also possible during the passage. It may continue to be sprayed during removal from the chamber. can be changed, for example, first with a chemical solution and then with water. It is possible to quench (stop) a chemical reaction (when changing liquids), cool or heat the substrate.

[0051] According to the invention, the use of said module for chemical treatment of substrates is also proposed. The roll is particularly suitable for large substrates having dimensions in the range of 300mm x 300mm and above. Preferably, the diagonal or diameter is 350 mm or more, more preferably 500 mm or more. more preferably 800 mm or more, and even more preferably 1000 mm or more is.

[0052] The modules, uses and methods according to the independent claims are particularly suited to the same and related applications according to the dependent claims. It is understood that the present invention has the same preferred embodiment as the present invention. It is to be understood that any combination of the dependent claims with the respective independent claims is also possible.

[0053] These and other aspects of the invention will be apparent from and elucidated with reference to the embodiments described hereinafter. It will be explained with reference to the accompanying drawings.

[0054] Exemplary embodiments of the present invention are described below with reference to the accompanying drawings. [Brief explanation of the drawings]

[0055] [Figure 1a] 1 shows a schematic and exemplary embodiment of a module for chemical treatment of a substrate according to the invention; [Figure 1b] 1 shows a schematic and exemplary embodiment of a module for chemical treatment of a substrate according to the invention; [Figure 2a] 1 shows a schematic and exemplary cross-section of a module for chemical treatment of substrates according to the invention; [Figure 2b] 1 shows a schematic and exemplary side view of a module for chemical treatment of substrates according to the invention; [Figure 2c] 1 shows a schematic and exemplary cross-section of a module for chemical treatment of substrates according to the invention; [Figure 3] 2b shows a schematic and exemplary detail of FIG. 2a focusing on the spray unit; [Figure 4] 1 shows a detailed view focusing on a valve unit, in a schematic and exemplary manner. [Figure 5] 10 shows a detailed view focusing on a chamber cover unit, in a schematic and exemplary manner. DETAILED DESCRIPTION OF THE INVENTION

[0056] 1a and 1b show an embodiment of a module 10 for chemical treatment of a substrate 20 according to the invention. 2a, 2b and 2c show various embodiments of the present invention in a substrate 2 1 shows a schematic and exemplary cross-sectional view, a side view and another cross-section of a module 10 for chemical processing of The module 10 for chemical treatment of a substrate 20 comprises an immersion chamber 11, a spray unit 13 , and a movement unit 14.

[0057] The substrate 20 is held in a substrate holder 21 or chuck and inserted into the immersion chamber 11. The immersion chamber 11 can contain a chemical liquid as the first liquid, so that the substrate 20 The substrate 20 can be treated on one side or both sides. A face or two surfaces of the substrate opposite each other can be treated.

[0058] The spray unit 13 includes a plurality of spray nozzles 15 which spray the second liquid 22 The second liquid 22 is sprayed into the immersion chamber 11 and onto the substrate 20, and the second liquid 22 is sprayed onto both sides of the substrate 20. The first and second liquids 22 are directly applied to the two opposite sides of the substrate to process / process them. The spray nozzles 15 may be the same or different. The spray nozzles 15 are arranged in spray bars 16 arranged along the two long side walls. The substrate 20 is disposed between the nozzles, so that the spray nozzles are The liquid is sprayed approximately perpendicularly onto two opposite surfaces of the substrate 20. "Approximately perpendicular" means that the liquid is not parallel to the substrate, Preferably, the liquid is sprayed at an angle of 70° to 110° relative to the surface of the substrate 20. The spray nozzles 15 may also be arranged on the wall of the immersion chamber 11. 3 shows a detailed view of the spray unit 13 in a schematic and exemplary manner. 15 is a substrate 20 or immersion chamber to direct the spray or allow drainage. 11. There are several options for achieving this tilt. For example, - Incline the nozzle 15 relative to the spray bar 16 or position the spray nozzle 15 in the chamber. or the spray bar 16 may be tilted relative to the chamber wall. Combinations are also possible. The tilting motion can be combined with rotation around the Y and / or Z axes (see Figure 1). It is preferable to accommodate exercise.

[0059] As shown in FIGS. 1a, 1b, 2a, 2b, and 2c, the exercise unit 14 is The plate 20 and the spray unit 13 can be moved relative to each other. The spray unit 14 moves the substrate 20 including the substrate holder 21 and / or the spray unit 13. In order to move the substrate 20 including the substrate holder 21, a motion unit The platform 14 is illustrated as a gate or framework that allows the substrate 20 to move up and down in the Z direction. .

[0060] Moving the spray unit 13 involves moving the spray nozzle 11 of the spray unit 13. 5 and / or the spray bar 16 relative to the substrate 20 or the wall of the immersion chamber 11. It can be understood that the spray nozzle 15 and / or the spray bar 16 can be moved to spray the liquid. The spray of the body can be directed at a particular angle onto the substrate 20 or into the immersion chamber 11 . The purpose is to chemically process the substrate 20 or to separate the substrate 20, the immersion chamber 11, and / or the module 1. The purpose may be to clean the spray nozzle 15 and / or other components of the spray nozzle 15. It may also be possible to allow gravity drainage of liquid from the lever 16. The spray bars 16 can be rotated about their respective longitudinal axes. A fanning motion perpendicular to the longitudinal axis of the substrate 16 can also be performed. This can be understood as a side-to-side movement when viewed along the width of the immersion chamber 11.

[0061] Moving the substrate 20 includes: a first Z direction vertically into and out of the immersion chamber 11; in a second X direction parallel to the thickness of the substrate from the front side to the back side of the substrate 20; and / or In the Y direction parallel to the width direction of the substrate 20, The substrate 20 including the substrate holder 21 is transferred relative to the immersion chamber 11 and the spray unit 13. This can be understood as moving the

[0062] The module 10 for chemical treatment of a substrate 20 comprises a first liquid in an immersion chamber 11, which is agitated. The ultrasonic unit 12 further includes an ultrasonic unit 12 for supplying ultrasonic waves. It may include a full area transducer or multiple smaller transducers, where As shown in the figure, two full-area transducers are provided as an ultrasound unit 12. The transducer(s) may be connected directly to the immersion chamber 11 or The transducer(s) may be indirectly connected by a transducer plate. The spray unit 13 may be located on the outer surface of the soaking chamber 11 or adjacent spray 16. Here, as shown, two transducers of the ultrasound unit 12 are arranged between the transducers. The transducer is disposed on the outer (outer) surface of the immersion chamber 11 .

[0063] The result is an "all-in" solution for liquid handling that can incorporate a variety of process technologies. A multi-purpose module 10 or process chamber is provided. Immersion treatment in chambers, liquid spray treatment (sequential or simultaneous / parallel), and application of ultrasonic agitation Furthermore, it is possible to efficiently and effectively process the substrate 20 without having to move it between different processing chambers. Effective rinsing and drying are achieved. The "all-in-one" multi-purpose module 10 It can reduce costs, speed up many steps and improve product quality at the same time. Additionally, many different substrate sizes can be processed without requiring mechanical modifications to the chamber. It is possible.

[0064] As shown in Figures 1b, 2b and 2c, a module 10 for chemical treatment of a substrate 20 comprises: The apparatus further includes an exhaust unit 25 for exhaust flow during, for example, substrate drying. Here, it includes a bottom exhaust pipe disposed at the bottom of the immersion chamber 11. The exhaust unit 25 includes: The exhaust valve and a plurality of exhaust lines 26 are provided. The exhaust lines 26 can be rinsed or cleaned with a liquid or gas. The exhaust valve can now be switched between different exhaust lines 26. do.

[0065] The module 10 for chemical treatment of substrates 20 further comprises a draining, rinsing and drying unit. Drain-rinse-dry units are used to drain, rinse, and dry e.g. between chemicals or after the completion of a process step. The drain, rinse and dry unit is configured to control the liquid, rinse and / or dry. , by injecting liquid and / or gas into the immersion chamber 11 and / or the spray unit 13; and / or sucking liquid and / or gas from the immersion chamber 11 and / or the spray unit 13. By way of example, the drain-rinse-dry unit may be further configured to spray - 16 and / or backsuction and / or spray of liquid from the spray nozzle 15 The chemical liquids can be sprayed from the bars 16 sequentially or simultaneously.

[0066] As shown in Figures 1b, 2b, and 2c, the drain-rinse-dry unit is used to Here it further includes an air knife 32 for drying the substrate holder 20 and / or the substrate holder 21. 2c, where the substrate 20 and / or the substrate holder 21 are positioned in the immersion chamber 11. Provides top-to-bottom laminar flow while (repeatable) passing through the top drying zone.

[0067] The drain-rinse-dry unit further comprises waterfall elements 33, 34, The waterfall elements 33, 34 are spray or nozzles that dispense liquid in the form of a waterfall. The upper waterfall element 33 can be understood as a slit bar or a slit bar. The chamber cover unit 17 is disposed in the upper part of the chamber cover unit 17 and is movable. Allows cleaning of the cover element 18 and / or the immersion chamber 11. The water elements 34 are arranged in the immersion chamber 11, for example on two opposite sides, Waterfall rinse, waterfall chemical treatment, waterfall quench, etc. The lower waterfall element 34 allows the water or chemical solution to flow from the top to the bottom of the substrate by gravity. These can also be used to rinse and clean the immersion chamber 11. The drain-rinse-dry unit is, for example, equipped with the top two water hole sprays or nozzles. Here, an overflow portion 35 is further included below the louvers 33 and 34 as a liquid surface overflow portion.

[0068] The module 10 for chemical treatment of a substrate 20 further comprises a valve unit 30. A detailed view of the valve unit 30 is shown in a schematic and exemplary manner. The valve unit 30 is used here for drainage and The valve unit 30 is a quick damper rinsing (QDR) valve block for exhaust and discharge. Each valve 31 is connected to a separate tank or drain. The lowest point of the liquid in module 10 is located at the bottom or lower end of chamber 11. As a result, gravity drainage can be used.

[0069] 5 shows a detailed view of the chamber cover unit 17 in a schematic and exemplary manner. The chemical processing module 10 includes a chamber cover unit including four movable cover elements 18. A movable cover element 18 is provided to close the top opening of the immersion chamber 11 in a closed position. The movable cover element 18 can also be adapted to secure the substrate 20 during transport through the opening. The movable cover element 18 can be tightly enclosed in the transport position. The movable cover element 18 can be moved by means of, for example, a pneumatic cylinder 19 to the base plate 20 or the substrate 21. It is pressed against the plate holder 21.

[0070] In the closed position, the movable cover element 18 is in contact with the immersion chamber 11 or the rim or or can be sealed against the contact surface. The seal is essentially liquid-tight and / or gas-tight to avoid the escape of, for example, toxic gases The seal may be formed by at least one sealing element, such as a resilient lip, a labyrinth seal, etc. The seal can be Stretchable seals, particularly easy to implement Enclosure of the upper area or tank, which can be easily and completely sealed, Collar joint with a reservoir that can easily accommodate any kind of movement of the module 10 hand, Adjustable cover, Covers essentially the entire upper part of the substrate holder 21 and includes e.g. rails and step motors and a cover that is movable horizontally and vertically by a movable nozzle; Spring-loaded vertical plates, for example connected to the substrate holder 21, can be easily and completely sealed. BLIND, It can be easily and completely sealed and easily accommodates any kind of movement of the module 10. full encapsulation of the motion unit 14 and the loading position of the substrate holder 21, -Air curtains that allow for greater mobility; Multiple slides that can be moved, tilted, and / or rotated to any position and controlled independently a simple cover for a fixed substrate holder 21 with a pre-nozzle 15; The spray nozzles 15 are arranged in the immersion chamber 11. and can be displaced horizontally and vertically, for example by means of a plunger. Alternatively, a simple cover for the fixed substrate holder 21 may be used. ·others It can also be done by

[0071] In the transfer position, the movable cover element presses against the substrate, and the movable cover element and the immersion chamber A gap is created between the rim and the chamber. The gap prevents the flow of contaminant gases from the inside to the outside of the immersion chamber. The gap is mechanically closed and controlled by the flow of seal gas from the outside to the inside. It is not that.

[0072] It should be noted that embodiments of the present invention are described with reference to various subject matter. In particular, methods Some embodiments are described with reference to claims, whereas others are described with reference to apparatus claims. However, from the above and following descriptions, unless otherwise specified, Any combination of features belonging to one type of subject, plus features relating to different subjects It will be understood by those skilled in the art that any combination between the above is also considered to be disclosed herein. However, by combining all the features, a synergistic effect that exceeds the mere sum of the features can be achieved. can be provided.

[0073] Although the present invention has been illustrated and described in detail in the drawings and foregoing description, such illustration and description are for illustrative purposes only. The following is intended to be illustrative and not limiting. The present invention is not limited to the embodiments disclosed herein. A person skilled in the art who practices the claimed invention would understand the principles of the invention after examining the drawings, disclosure and dependent claims. Other variations to the embodiments of the present disclosure can be understood and achieved from the discussion.

[0074] In the claims, the word "comprising" does not exclude other elements or steps. The indefinite article "a" or "an" does not exclude a plurality. A component or other unit may fulfill the functions of several items recited in the claims. A combination of these measures is not expressly granted in any way merely because the measures are recited in mutually different dependent claims. Any reference signs in the claims do not indicate that they cannot be used to advantage. should not be construed as limiting the scope.

Claims

1. A module (10) for chemical treatment of a substrate (20), comprising: an immersion chamber (11); a spray unit (13); Motor unit (14) and The immersion chamber (11) contains a first liquid and the substrate (20), configured to immerse a substrate (20) in the first liquid; The spray unit (13) sprays a second liquid (22) into the immersion chamber (11). a plurality of spray nozzles (15) configured to spray The motion unit (14) connects the substrate (20) and the spray unit (13). A module for chemical treatment of a substrate configured to be in relative motion.

2. 2. The module (10) according to claim 1, wherein in the immersion chamber (11) a first The apparatus further comprises an ultrasonic unit (12) configured to provide ultrasonic waves to agitate the liquid. Module.

3. 3. The module (10) of claim 2, wherein the ultrasonic unit (12) comprises: A module placed on the outer surface of the immersion chamber (11).

4. 3. The module (10) of claim 2, wherein the ultrasonic unit (12) and the The spray unit (13) is configured to move relative to the immersion chamber (11). The module is at least partially disposed on a removable plate element.

5. A module (10) according to any one of claims 1 to 4, wherein the first liquid An upper exhaust device disposed above and a lower exhaust device disposed at the bottom of the immersion chamber The module further comprises an exhaust unit (25) preferably comprising:

6. A module (10) according to any one of claims 1 to 5, wherein the movement unit (14) moves the substrate (20) in a first direction (Z) into and out of the immersion chamber (11). ) relative to said immersion chamber (11).

7. A module (10) according to any one of claims 1 to 6, wherein the movement unit (14) is a second direction perpendicular to the first direction, and the substrate (20) is immersed in the immersion chamber. A module configured to move relative to the chamber (11).

8. A module (10) according to any one of claims 1 to 7, wherein the spray nozzle The module (15) is at least partially arranged in the wall of the immersion chamber (11). Lu.

9. A module (10) according to any one of claims 1 to 8, wherein the spray nozzle The spray bar (15) is positioned in the immersion chamber (11) and is at least A module that is also partially placed.

10. A module (10) according to any one of claims 1 to 9, wherein the movement unit (14) directs at least some of the spray bars (16) toward the substrate (20). A module configured to move the object.

11. In the module (10) according to claims 2 to 4 and 9 or 10, the ultrasonic unit The spray bar (12) includes a plurality of ultrasonic transducers disposed between adjacent spray bars (16). The module containing the server.

12. A module (10) according to any one of claims 1 to 11, wherein the spray unit The knit (13) is preferably at an angle of 20° to 70° to the wall of said immersion chamber (11). The wall of the immersion chamber (11) is inclined non-perpendicularly to the wall of the immersion chamber (11) in the range 1) in a spray direction towards the bottom of the Module.

13. A module (10) according to any one of claims 1 to 12, wherein adjacent first, A second and third row of spray nozzles (15) are arranged to connect the first and third spray nozzles. The second spray nozzle (15) is inclined in the same manner, and the second spray nozzle is inclined relative to the first and third spray nozzles. A module with a different arrangement than the Rehnock (15).

14. A module (10) according to any one of claims 1 to 13, wherein the immersion chamber The opening of the bar (11) is closed in a closed position and a substrate ( a chamber including a plurality of cover elements (18) configured to closely surround a transfer position of the chamber; The module further comprises a cover unit (17).

15. A module (10) according to any one of the preceding claims, wherein the cover element and the rim of the submerged chamber is controlled by a seal gas flow.

16. 16. A module (10) according to claim 14 or 15, wherein the chamber cover unit The module (17) is further configured to substantially fully open the opening in the open position.

17. A module (10) according to any one of claims 14 to 16, wherein the chamber The cover unit (17) is disposed between the substrate (20) and the spray unit (13). The control unit (14) controls the relative motion of the The module further includes a processing element configured to control the movement of the chamber cover element (18). Rule.

18. A module (10) according to any one of claims 1 to 17, comprising a plurality of valves (31 ) and each valve (31) is connected to a separate tank or drain. and said valve (31) is configured for drainage and evacuation.

19. A module (10) according to any one of claims 1 to 18, wherein the immersion chamber The spray unit (13) is blown with a liquid and / or gas. and / or from the immersion chamber (11) and / or the spray unit (13) The module further comprises a draining, rinsing and drying unit configured to extract and / or gas. Rule.

20. The module (10) according to any one of claims 1 to 19, wherein the drainage and phosphorus The rinse and dry unit is used for waterfall rinse, waterfall chemical treatment, and / or or a module configured for waterfall quench.

21. 21. A module (10) according to claim 19 or 20, wherein the drain, rinse and dry unit The knit is passed through the immersion chamber (11) and / or the spray unit (13). configured to heat or cool liquids and / or gases being blown in or drawn out A module containing a temperature control element.

22. A module (10) according to any one of claims 1 to 21, wherein the immersion chamber At least a part of the spray unit (13) is lifted to allow the liquid to drain from the spray unit (13). The module further comprises a lifting unit configured as follows:

23. A method of chemically treating a substrate (20) comprising, but not necessarily in this order: A first liquid and a substrate (20) are inserted into an immersion chamber (11) and the substrate (20) is immersing in the first liquid; Removing the first liquid from the immersion chamber (11); The immersion chamber (1) is sprayed with a spray unit (13) including a spray nozzle (15). spraying a second liquid (22) into the nozzle (1); The substrate (20) and the spray unit (13) are moved relative to each other by a motion unit (14). Pair of moving steps and A method comprising:

24. 24. The method according to claim 23, wherein the step of atomizing the second liquid (22) comprises: While the substrate (20) is at least partially immersed in the first liquid, A method carried out before removing liquid from said immersion chamber (11).

25. 25. The method according to claim 23 or 24, wherein the substrate (20) is further processed by the method according to claim 24, The substrate (20) is removed from the immersion chamber (11) during rinsing of the immersion chamber (11). The method further comprises the step of:

26. The substrate (20), in particular, has a diagonal or diameter of 300 mm or more, preferably 800 mm or more. The method according to claims 1 to 4 for chemical treatment of large substrates (20), preferably in the range of 1000 mm or more.

23. Use of a module (10) according to any one of claims 22.

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