Electroconductive resin composition

Abstract

To provide an electroconductive resin composition that exhibits low volume resistivity and exceptional electroconductivity when formed into an electroconductive film, that can be used as a substitute for silver paste, and that is useful as, inter alia, an electroconductive ink or circuit connection material.SOLUTION: Provided is an electroconductive resin composition containing a tin powder, a resin, and an organic acid compound.SELECTED DRAWING: None

Description

[Technical Field]

[0001] The present invention relates to a conductive resin composition. The present invention also relates to a conductive film, a conductive ink used for forming a circuit or the like by screen printing on a substrate, and a circuit connecting material used for conductively connecting an electronic component to a circuit board or the like. [Background technology]

[0002] A wide variety of conductive resin compositions are known, and they are used in a variety of applications, such as forming electronic circuits and bonding electronic components, as conductive pastes, conductive films, conductive inks, conductive paints, circuit connecting materials, conductive adhesives, etc. For example, there is a need for conductive films that are useful for forming conductive structures such as conductive circuits and electrodes. For example, there is a need for conductive inks that are adaptable to a variety of printing methods and that are useful in the manufacture of flexible plastic substrates and the like having conductive structures such as interconnects, traces, electrodes, and the like. For example, in electronic devices such as computers and mobile phones, there is a demand for circuit connection materials that enable high-density mounting and high integration of various electronic components such as LED elements, semiconductor elements, and capacitors on the same circuit board.

[0003] Until now, conductive resin compositions (conductive pastes) containing resin and conductive particles have been known as conductive compositions. However, the volume resistivity of the conductive resin compositions is not sufficiently low, and for applications requiring low volume resistivity, it has been necessary to use silver particles as the conductive particles. For example, Patent Document 1 discloses a conductive paste composition in which the conductive powder is a silver-based powder using at least silver, the resin component is at least one of a thermosetting resin and a thermoplastic resin, and the conductive paste composition further contains an ester-based compound or a salt thereof having a specific molecular weight and structure, or an ether / amine-based compound. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] Japanese Patent Publication No. 2020-205245 Summary of the Invention [Problem to be solved by the invention]

[0005] However, silver particles are very expensive and disadvantageous in terms of cost, and there are also problems such as silver being easily oxidized, etc. When conductive particles other than silver particles are used, the volume resistivity of the film of the conductive resin composition increases, and the conductivity may become insufficient. Until now, no conductive resin composition has been known that has low volume resistivity when a conductive film is formed, exhibits good conductivity, and can be used as a substitute for silver paste without using expensive silver particles.

[0006] The problem to be solved by the present invention is to provide a conductive resin composition which has low volume resistivity when a conductive film is formed, exhibits good conductivity, can be used as a substitute for silver paste, and is useful as a conductive ink, circuit connecting material, etc. [Means for solving the problem]

[0007] As a result of extensive research into solving the above problems, the present inventors have found that the above problems can be solved by using a conductive resin composition with a specific composition, and have thus completed the present invention. Specifically, it is as follows: Item 1: A conductive resin composition containing tin powder, a resin, and an organic acid compound. Item 2: The conductive resin composition according to Item 1, which contains lead-free solder powder. Item 3: The conductive resin composition according to Item 1 or 2, wherein the resin comprises at least one selected from the group consisting of polyvinyl butyral resins, resol-type phenolic resins, acrylic resins, polyester resins, phenoxy resins, polyimide resins, epoxy resins, and xylene resins. Item 4: A conductive film formed from the conductive resin composition according to any one of items 1 to 3, having a volume resistivity of 1.0 × 10 -2Conductive film with a resistance of less than Ω·cm. Item 5: A conductive ink comprising the conductive resin composition according to any one of items 1 to 3. Item 6: A circuit connecting material comprising the conductive resin composition according to any one of items 1 to 3. [Effects of the Invention]

[0008] The present invention exhibits the remarkable effect of providing a conductive resin composition which has a low volume resistivity when a conductive film is formed and exhibits good conductivity, can be used as a substitute for silver paste, and is useful as a conductive ink, circuit connecting material, etc. Furthermore, the conductive resin composition of the present invention allows the heating temperature to be lowered when forming a conductive connection, making it possible to use low-melting-point plastics as the substrate, which have not previously been used as substrates. The conductive resin composition of the present invention is useful as a printed electronics material, and is extremely useful in mass production of various electronic devices such as display devices, vehicle-related parts, IoT, and mobile communication systems. DETAILED DESCRIPTION OF THE INVENTION

[0009] The present invention relates to a conductive resin composition, a conductive film, a conductive ink, and a circuit connecting material, which will be described in detail below.

[0010] [Conductive resin composition] <Tin powder> The tin powder contained in the conductive resin composition of the present invention is a powder composed of 99.5 mass % or more of tin and unavoidable impurities. The tin content in the tin powder can be easily measured using an X-ray fluorescence analyzer (XRF) or the like. Examples of unavoidable impurities contained in tin powder include one or more other atoms selected from the group consisting of Mn, Sb, Si, K, Na, Li, Ba, Sr, Ca, Mg, Be, Zn, Pb, Cd, Tl, V, Al, Zr, W, Mo, Ti, Co, Ag, Cu, Ni, Au, B, C, N, O, Ge, In, As, Fe, etc. The content of other atoms in the tin powder is preferably less than 0.3% by mass, more preferably 0.1% by mass or less.

[0011] The shape of the tin powder is not particularly limited. For example, flake-like, flat, spherical, approximately spherical (for example, with a length-to-width aspect ratio of 1.5 or less), block-like, plate-like, polygonal pyramidal, polyhedral, rod-like, fibrous, needle-like, irregular, etc. can be used depending on the application. In the present invention, flake-like, spherical, approximately spherical, and flat shapes are preferred from the viewpoints of volume resistivity, dispersibility, handleability, etc.

[0012] The volume average particle diameter of the spherical tin powder is not particularly limited. D50 is, for example, 0.5 μm or more, preferably 1.0 μm or more, more preferably 3.0 μm or more, and for example, 300 μm or less, preferably 200 μm or less, more preferably 100 μm or less. When D50 is 0.5 μm or more, the dispersibility and handleability of the tin powder are improved. When D50 is 300 μm or less, the volume resistivity can be reduced, and the dispersibility and handleability are improved. The average diameter, average thickness and aspect ratio (average diameter / average thickness) of the flat or flaky tin powder are not particularly limited. The average diameter is, for example, 0.5 μm or more, preferably 1.0 μm or more, more preferably 5.0 μm or more, and for example, 500.0 μm or less, preferably 300.0 μm or less, more preferably 150.0 μm or less. The average thickness is, for example, 0.1 μm or more, preferably 0.5 μm or more, more preferably 1.0 μm or more, and for example, 50.0 μm or less, preferably 20.0 μm or less, more preferably 10.0 μm or less. The aspect ratio is, for example, 2 or more, preferably 10 or more, and more preferably 50 or more.

[0013] The content of the tin powder in the conductive resin composition is not particularly limited and can be determined appropriately from the viewpoint of the conductivity of the conductive resin composition, etc. The content is, for example, 5.0 to 97.0 mass%, preferably 60.0 to 97.0 mass%, more preferably 85.0 to 97.0 mass%, and even more preferably 90.0 to 97.0 mass%, where the total amount of all solids in the conductive resin composition is 100 mass%.

[0014] <Resin> The resin contained in the conductive resin composition of the present invention may be either a thermoplastic resin or a thermosetting resin, and one type may be used alone or two or more types may be used. Examples of the thermoplastic resin include one or more selected from the group consisting of polyvinyl butyral resins, acrylic resins, polyester resins, phenoxy resins, polyimide resins, polyolefin resins, thermoplastic polyurethane resins, polyamide resins, polycarbonate resins, polyphenylene ether resins, polyvinyl ether resins, polyvinyl alcohol resins, polyvinyl acetate resins, and ionomer resins. Examples of the thermosetting resin include one or more resins selected from the group consisting of resol-type phenolic resins, polyimide resins, epoxy resins, xylene resins, polyurethane resins, melamine resins, and urea resins. In the present invention, the resin preferably contains at least one selected from the group consisting of polyvinyl butyral resins, resol-type phenolic resins, acrylic resins, polyester-based resins, phenoxy resins, polyimide-based resins, epoxy-based resins, and xylene-based resins, and more preferably contains at least one selected from the group consisting of polyvinyl butyral resins, resol-type phenolic resins, acrylic resins, polyester-based resins, phenoxy resins, polyimide-based resins, and xylene-based resins. Among these, polyvinyl butyral resins are preferably used from the viewpoints of film formation state, connection reliability, adhesion to the substrate, and the like.

[0015] Polyvinyl butyral resins are resins in which the alcohol portion of polyvinyl alcohol is acetalized with butyraldehyde. They are generally thermoplastic resins containing vinyl butyral units represented by the following formula (1), vinyl acetate units represented by the formula (2), and vinyl alcohol units represented by the formula (3) as main repeating units. [ka]

[0016] The physical, chemical and mechanical properties of polyvinyl butyral resins vary depending on the ratio of the units of the above formulas (1) to (3) and the weight average molecular weight (degree of polymerization). For example, increasing the amount of vinyl butyral units represented by (1) in a polyvinyl butyral resin (increasing the degree of butyralization) improves compatibility and non-polar solvent solubility. Increasing the amount of vinyl acetate units represented by (2) (increasing the amount of acetyl groups) reduces the viscosity when dissolved in a solvent, thereby lowering the glass transition temperature of the resin. Increasing the amount of vinyl alcohol units represented by formula (3) improves adhesion and polar solvent solubility.

[0017] In the present invention, the ratio of butyral groups, acetyl groups, and hydroxyl groups in the polyvinyl butyral resin is not particularly limited. For example, the ratio may be 55 to 80 mol % of butyral groups, 25 mol % or less of acetyl groups, and 10 to 20 mol % of hydroxyl groups, where the total amount of these groups is 100 mol %. In the present invention, the amount of acetyl groups is preferably large, for example, it is preferable to use a polyvinyl butyral resin having an acetyl group amount of 7 to 25 mol %. The weight-average molecular weight of the polyvinyl butyral resin is not particularly limited and can be, for example, 10,000 to 250,000, and preferably 20,000 to 120,000, from the viewpoints of the mechanical properties of the conductive resin composition and compatibility with the solvent.

[0018] The polyvinyl butyral resin may be synthesized when preparing the conductive resin composition, or a commercially available product may be used. For synthesis, known methods can be used without limitation, for example, a method in which an aqueous polyvinyl alcohol solution is reacted with butyl aldehyde in the presence of an acid catalyst, the resulting polyvinyl butyral resin slurry is neutralized with an alkali, and the resulting mixture is separated from the solvent, washed, dehydrated, and then dried to produce a powdery resin. Commercially available polyvinyl butyral resins include, for example, S-LEC series (e.g., BL-1, BL-1H, BL-2H, BL-5Z, BL-7Z, BL-10, BL-S, BM-1, BM-2, BM-5, BM-S, BM-SHZ, BH-3, BH-6, BH-A, BH-S, BX-1, BX-L, BX-3, BX-5, KS-1, KS-5) manufactured by Sekisui Chemical Co., Ltd. Z, KS-6Z, KS-10, KX-1, KX-5, KW-M, KW-10, SV-12, SV-16, SV-22, SV-26, etc.), and the Mowital series (trade name) manufactured by Kuraray Co., Ltd. (e.g., LPB16B, B20H, 30T, 30H, 30HH, 45M, 45H, 60H, 60T, 60HH, 70HH, 75H, etc.), can be used.

[0019] The resin content in the conductive resin composition is not particularly limited and can be determined appropriately from the viewpoint of the conductivity of the conductive resin composition, etc. The resin content is, for example, 1.0 to 15.0 mass%, preferably 1.0 to 12.0 mass%, more preferably 2.0 to 10.0 mass%, and even more preferably 3.0 to 10.0 mass%, where the total amount of all solids in the conductive resin composition is 100 mass%.

[0020] <Organic acid compounds> Examples of organic acid compounds include RX n (wherein R is hydrogen or an organic group having 1 to 50 carbon atoms, X is an acid group and multiple Xs may be different from each other, and n is an integer of 1 or more) Examples of the acid group represented by X include a carboxyl group (-COOH), a carboxylic anhydride group (-C(=O)-OC(=O)-), a sulfonic acid group (-SO3H), and a phosphoric acid group (-PO3H2). Examples of the organic acid compound include one or more compounds selected from the group consisting of organic carboxylic acid compounds, organic carboxylic acid anhydrides, organic sulfonic acid compounds, organic phosphonic acid compounds, etc. Preferred are organic carboxylic acid compounds and / or organic carboxylic acid anhydrides. By using an organic acid compound, the dispersibility of the tin powder is improved, allowing it to be arranged efficiently, and the reliability of the conductive connection and insulation can be improved.

[0021] (organic carboxylic acid compounds) The organic carboxylic acid compound is not particularly limited as long as it is a compound having 1 to 50 carbon atoms and one or more carboxyl groups (—COOH) in the molecular structure. Examples of organic carboxylic acid compounds include formic acid, acetic acid, propionic acid, butanoic acid, pentanoic acid, hexanoic acid, heptanoic acid, octylic acid, lauric acid, myristic acid, pentadecylic acid, palmitic acid, margaric acid, stearic acid, 12-hydroxystearic acid, ricinoleic acid, oleic acid, vaccenic acid, linoleic acid, linolenic acid, arachidic acid, behenic acid, lignoceric acid, cerotic acid, and montmorillonite. Acid, Melissic Acid, Lactic Acid, Gluconic Acid, Malic Acid, Tartaric Acid, Citric Acid, Ascorbic Acid, Abietic Acid, Malonic Acid, Succinic Acid, Glutaric Acid, Adipic Acid, Glutaconic Acid, Pimelic Acid, Suberic Acid, Azelaic Acid, Sebacic Acid, Decanedioic Acid, Dodecanedioic Acid, Eicosapentaenoic Acid, Caproic Acid, Enanthic Acid, Caprylic Acid, Pelargonic Acid, Capric Acid, Arachidonic Acid, Eicosapentaenoic Acid, Docosahexaenoic Acid Examples of the aromatic hydrocarbons include benzoic acid, dodecenyl succinic acid, citraconic acid, mesaconic acid, itaconic acid, dimethylolpropionic acid, dimethylolbutanoic acid, dimethylolbutyric acid, dimethylolvaleric acid, trimethylolpropanoic acid, trimethylolbutanoic acid, benzoic acid, salicylic acid, pyruvic acid, paramethylbenzoic acid, toluic acid, 4-ethylbenzoic acid, 4-propylbenzoic acid, 2-methylpropanoic acid, isopentanoic acid, 2-ethylhexanoic acid, acrylic acid, methacrylic acid, propiolic acid, crotonic acid, 2-ethyl-2-butenoic acid, maleic acid, fumaric acid, oxalic acid, hexanetricarboxylic acid, cyclohexylcarboxylic acid, 1,4-cyclohexyldicarboxylic acid, ethylenediaminetetraacetic acid, isophthalic acid, terephthalic acid, naphthalenedicarboxylic acid, trimellitic acid, and pyromellitic acid.

[0022] (organic carboxylic acid anhydride) The organic carboxylic acid anhydride is not particularly limited as long as it is a compound having one or more carboxylic acid anhydride groups (-C(=O)-OC(=O)-) in its molecular structure. The organic carboxylic acid anhydride is obtained by intermolecular dehydration of two organic carboxylic acid molecules and / or intramolecular dehydration of one organic carboxylic acid molecule. In the present invention, for example, among the organic carboxylic acids, one or more selected from the group consisting of those obtained by intermolecular dehydration of organic monocarboxylic acids and those obtained by molecular dehydration of organic polycarboxylic acids can be used. Preferred examples include one or more selected from the group consisting of acetic anhydride, propionic anhydride, oxalic anhydride, maleic anhydride, phthalic anhydride, benzoic anhydride, succinic anhydride, 2-methylsuccinic anhydride, trimellitic anhydride, and the like.

[0023] (organic sulfonic acid compounds) The organic sulfonic acid compound is not particularly limited as long as it has one or more sulfonic acid groups (-SO3H) in its molecular structure. For example, benzenesulfonic acid, n-butylbenzenesulfonic acid, n-octylbenzenesulfonic acid, n-dodecylbenzenesulfonic acid, pentadecylbenzenesulfonic acid, 2,5-dimethylbenzenesulfonic acid, p-chlorobenzenesulfonic acid, 2,5-dichlorobenzenesulfonic acid, p-phenolsulfonic acid, cumenesulfonic acid, xylenesulfonic acid, o-cresolsulfonic acid, m-cresolsulfonic acid, p-cresolsulfonic acid, p-toluenesulfonic acid, 2-naphthalenesulfonic acid, 1-naphthalenesulfonic acid, styrenesulfonic acid, 4,4-biphenyldisulfonic acid, anthraquinone-2-sulfonic acid, m-benzenedisulfonic acid, Examples thereof include one or more selected from the group consisting of aromatic sulfonic acid compounds such as aniline-2,4-disulfonic acid, anthraquinone-1,5-disulfonic acid, and polystyrene sulfonic acid; aliphatic sulfonic acid compounds such as methanesulfonic acid, ethanesulfonic acid, 1-propanesulfonic acid, n-octylsulfonic acid, pentadecylsulfonic acid, trifluoromethanesulfonic acid, trichloromethanesulfonic acid, 1,2-ethanedisulfonic acid, 1,3-propanedisulfonic acid, aminomethanesulfonic acid, and 2-aminoethanesulfonic acid; and alicyclic sulfonic acid compounds such as cyclopentanesulfonic acid, cyclohexanesulfonic acid, and 3-cyclohexylaminopropanesulfonic acid. Preferably, one or more selected from the group consisting of benzenesulfonic acid, dodecylbenzenesulfonic acid, methanesulfonic acid, p-phenolsulfonic acid, p-toluenesulfonic acid, and (poly)styrenesulfonic acid are used.

[0024] (organic phosphonic acid compounds) The organic phosphonic acid compound is not particularly limited as long as it has one or more phosphate groups (-PO3H2) in its molecular structure. For example, 1-hydroxyethylidene-1,1-diphosphonic acid, 1-hydroxypropylidene-1,1-diphosphonic acid, 1-hydroxybutylidene-1,1-diphosphonic acid, aminotrimethylenephosphonic acid, methyldiphosphonic acid, nitrotrimethylenephosphonic acid, ethylenediaminetetramethylenephosphonic acid, ethylenediaminebismethylenephosphonic acid, hexamethylenediaminetetramethylenephosphonic acid, diethylenetriaminepentamethylenephosphonic acid, cyclohexanediaminetetramethylenephosphonic acid, and at least one selected from the group consisting of phosphonic acid, carboxyethylphosphonic acid, phosphonoacetic acid, 2-phosphonobutane-1,2,4-tricarboxylic acid, 2,3-dicarboxypropane-1,1-diphosphonic acid, phosphonobutyric acid, phosphonopropionic acid, sulfonylmethylphosphonic acid, N-carboxymethyl-N,N-dimethylenephosphonic acid, N,N-dicarboxymethyl-N-methylenephosphonic acid, 2-ethylhexyl acid phosphate, stearyl acid phosphate, benzenephosphonic acid, and the like.

[0025] The organic phosphonic acid compound may be a surfactant having a phosphate group in its molecular structure. The surfactant having a phosphate group is preferably one having a polyoxyethylene group or a phenyl group in its molecular structure, such as one or more selected from the group consisting of polyoxyethylene alkylphenyl ether phosphate, polyoxyethylene alkyl ether phosphate, dipolyoxypropylene lauryl ether phosphate, dipolyoxyethylene oleyl ether phosphate, dipolyoxyethylene oxypropylene lauryl ether phosphate, dipolyoxypropylene oleyl ether phosphate, ammonium lauryl phosphate, ammonium octyl ether phosphate, ammonium cetyl ether phosphate, polyoxyethylene lauryl ether phosphate, polyoxyethylene oxypropylene lauryl ether phosphate, polyoxypropylene lauryl ether phosphate, polyoxyethylene tristyrylphenyl ether phosphate, polyoxyethylene oxypropylene tristyrylphenyl ether phosphate, polyoxypropylene tristyrylphenyl ether phosphate, and the like. As the surfactant having a phosphate group, one or more selected from the group consisting of commercially available products such as Phosphanol (trade name) manufactured by Toho Chemical Industry Co., Ltd. and Disperbyk (trade name) manufactured by BYK Japan KK can be used.

[0026] (Content) The content of the organic acid compound in the conductive resin composition is not particularly limited. It can be determined appropriately from the viewpoint of the conductivity, stability, etc. of the conductive resin composition. When the total amount of all solids in the conductive resin composition is taken as 100 mass%, the content is, for example, 0.1 to 10.0 mass%, preferably 0.1 to 8.0 mass%, more preferably 0.5 to 7.0 mass%, and even more preferably 0.5 to 4.0 mass%.

[0027] <Lead-free solder powder> The conductive resin composition of the present invention may contain lead-free solder powder. The lead-free solder is not particularly limited as long as it does not contain more lead than the amount that is unavoidably contained in consideration of the effects on workers, users, the environment, etc. The melting point of the lead-free solder powder is preferably 300°C or lower, more preferably 220°C or lower, and even more preferably 50 to 220°C. If the melting point of the lead-free solder powder exceeds 300°C, connected members such as circuit boards and electronic components may be thermally destroyed or thermally deteriorated. If the melting point is lower than 50°C, the mechanical strength may be weakened, and the reliability of the conductive connection may be reduced.

[0028] Examples of lead-free solder powders include lead-free solder powders based on tin (Sn) and containing one or more elements selected from the group consisting of silver (Ag), bismuth (Bi), zinc (Zn), copper (Cu), indium (In), aluminum (Al), and antimony (Sb) (e.g., Sn-Bi, Sn-Cu, Sn-Sb, Sn-Zn, Sn-Ag, Sn-Ag-Cu, Sn-Zn-Bi, Sn-Ag-In-Bi, Sn-Zn-Al, Sn-Ag-Bi, Sn-Ag-Cu-Bi, Sn-Ag-Cu-Bi-In-Sb, etc.), Bi-based lead-free solder powders (Bi-In, etc.), and In-based lead-free solder powders (In-Ag, In-Bi, etc.).

[0029] The shape of the lead-free solder powder is not particularly limited. Spherical, nearly spherical (for example, with a length-to-width aspect ratio of 1.5 or less), flat, polyhedral, flaky, fibrous, irregular, and other shapes can be used depending on the application. In the present invention, spherical, nearly spherical, flat, or flaky shapes are preferred from the viewpoints of connection stability, volume resistivity, dispersibility, ease of handling, and the like.

[0030] The volume average particle size of the lead-free solder powder is not particularly limited. For example, D50 can be 0.5 μm to 50 μm, preferably 1 μm to 40 μm, and more preferably 3 μm to 30 μm. If D50 is less than 0.5 μm, the dispersibility and handleability of the lead-free solder powder may be reduced. If D50 exceeds 50 μm, the connection stability may be reduced, the volume resistivity may be increased, and dispersibility and handleability may be reduced.

[0031] The content of the lead-free solder powder in the conductive resin composition is not particularly limited and can be determined appropriately from the viewpoint of the conductivity of the conductive resin composition, etc. The content is, for example, 5.0 to 85.0 mass%, preferably 10.0 to 82.0 mass%, more preferably 20.0 to 80.0 mass%, and even more preferably 25.0 to 80.0 mass%, where the total amount of all solids in the conductive resin composition is 100 mass%.

[0032] <Other ingredients> The conductive resin composition of the present invention may be mixed with one or more additives selected from the group consisting of solvents, pigments, conductive powders other than tin powder and lead-free solder powder, fillers, antioxidants, corrosion inhibitors, antifoaming agents, dispersants, viscosity modifiers (thixotropy modifiers), adhesion promoters, coupling agents, anti-settling agents, leveling agents, etc., as needed.

[0033] (solvent) The conductive resin composition of the present invention may contain a solvent. This can improve the fluidity of the conductive resin composition and contribute to improving workability. Furthermore, by mixing the conductive resin composition with a solvent, a conductive resin paste, a conductive ink, or a circuit connecting agent can be produced.

[0034] The solvent may be any one or more selected from the group consisting of water and various organic solvents. Examples of the organic solvent include alcohols such as ethyl alcohol, propyl alcohol, butyl alcohol, pentyl alcohol, hexyl alcohol, heptyl alcohol, octyl alcohol, nonyl alcohol, decyl alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, methyl methoxybutanol, α-terpineol, β-terpineol, hexylene glycol, benzyl alcohol, 2-phenylethyl alcohol, isopalmityl alcohol, isostearyl alcohol, lauryl alcohol, ethylene glycol, propylene glycol, and glycerin; acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, diacetone alcohol (4-hydroxy-4-methyl-2-pentanone), 2-octadecyl methyl ether, methyl methyl ketone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, diacetone alcohol (4-hydroxy-4-methyl-2-pentanone), 2-octadecyl methyl ether, methyl ... Ketone solvents such as methylpropanol, isophorone (3,5,5-trimethyl-2-cyclohexen-1-one) or diisobutyl ketone (2,6-dimethyl-4-heptanone); ester solvents such as ethyl acetate, butyl acetate, diethyl phthalate, dibutyl phthalate, acetoxyethane, methyl butyrate, methyl hexanoate, methyl octanoate, methyl decanoate, methyl cellosolve acetate, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, 1,2-diacetoxyethane; tetrachloroethylene, ... Ether solvents such as hydrofuran, dimethyl ether, diethyl ether, dipropyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, propylene glycol dimethyl ether, ethoxyethyl ether, 1,2-bis(2-diethoxy)ethane or 1,2-bis(2-methoxyethoxy)ethane; ester ethers such as 2-(2-butoxyethoxy)ethane acetic acid; ether alcohol solvents such as 2-(2-methoxyethoxy)ethanol;Examples of the solvent include one or more selected from the group consisting of hydrocarbon solvents such as benzene, toluene, xylene, n-paraffin, isoparaffin, dodecylbenzene, turpentine oil, kerosene, and light oil; nitrile solvents such as acetonitrile and propionitrile; nitrogen-containing polar solvents such as dimethylacetamide, N,N-dimethylformamide, and N-methyl-2-pyrrolidone; and silicone oil solvents. When a solvent is used, the amount used is not particularly limited, and may be appropriately adjusted so that the viscosity of the conductive resin composition is such that it can be appropriately applied, printed, etc. onto a substrate and / or can be appropriately impregnated into a porous body.

[0035] <Properties of the conductive resin composition> The conductive resin composition of the present invention may be in any form, such as powder, solid, paste, liquid (varnish), etc. When used as a conductive ink or circuit connecting material, it is preferable that the composition is in a paste or liquid (varnish) form at room temperature (20°C).

[0036] <Characteristics of the conductive resin composition> The conductive resin composition of the present invention has excellent conductivity. The conductivity of the conductive resin composition is such that the volume resistivity of a conductive film obtained by casting or applying the conductive resin composition onto a release substrate, drying it, and then peeling it off is 1.0 × 10 -2 The volume resistivity of the conductive film is preferably less than 8.0×10 -3 Less than Ω·cm, preferably 1.0×10 -3 The volume resistivity is less than Ω·cm. Here, the volume resistivity is obtained by the method described in the examples. The conductive resin composition of the present invention has excellent adhesion to various substrates, and in particular, when it contains a polyvinyl butyral resin, it has excellent adhesion to glass or PET. The conductive resin composition of the present invention can be made excellent in storage stability, for example, without any change in viscosity such as thickening or the like, and without any occurrence of precipitation, before and after storage for 60 days.

[0037] <Method for preparing conductive resin composition> The conductive resin composition of the present invention can be prepared by adding tin powder, resin, and organic acid compound as essential ingredients, and optionally adding lead-free solder powder, solvent, etc., to a mixing vessel in any order and mixing them. For mixing, a suitable mixing method can be used, for example, a centrifugal mixer, ball mill, roll mill, bead mill, planetary mixer, tumbler, stirrer, agitator, mechanical homogenizer, ultrasonic homogenizer, high-pressure homogenizer, paint shaker, V-type blender, Nauta mixer, Banbury mixer, kneading roll, single-screw or twin-screw extruder, or the like.

[0038] The temperature at which the conductive resin composition is prepared (the temperature at which each component is mixed) is not particularly limited. Heating or the like can be performed as necessary, and the temperature can be, for example, 10 to 100°C. The atmosphere in which the conductive resin composition is prepared is not particularly limited, and the preparation can be carried out in air or in an inert atmosphere.

[0039] <Uses of the conductive resin composition> The conductive resin composition of the present invention is used in the manufacture of a conductive object, which may contain other components in addition to the conductive resin composition. Examples of the conductive object include one or more selected from the group consisting of conductive ink, circuit connecting material, conductive paste, conductive film, conductive fiber, conductive paint, conductive material for semiconductor packaging, conductive material for microelectronic devices, antistatic material, electromagnetic wave shielding material, anisotropic conductive adhesive (die attach adhesive, etc.), die attach paste, actuator, sensor, and conductive resin molded product.

[0040] For example, by using a solvent as a component of a conductive resin composition, it is possible to prepare a conductive ink, a conductive paste, a conductive paint, etc. The viscosity of the conductive resin composition is not particularly limited, and the composition can be in the form of a low-viscosity varnish or a high-viscosity paste, etc., depending on the application. For example, a conductive resin composition, optionally containing a solvent, can be applied to a substrate by casting, dipping, bar coating, dispenser coating, roll coating, gravure coating, screen printing, flexographic printing, spray coating, spin coating, inkjet printing, or the like, and then dried by heating at a temperature of 300°C or less to form a conductive film. The drying atmosphere can be one or more selected from the group consisting of air, inert gas, vacuum, reduced pressure, etc. In particular, from the viewpoint of suppressing deterioration of the conductive film (preventing oxidation of tin powder, lead-free solder powder, etc.), an inert gas atmosphere such as nitrogen or argon is preferred.

[0041] The conductive resin composition of the present invention can be molded by a molding method such as extrusion molding, injection molding, compression molding, etc. and used as a molded article. Examples of the molded article include electronic device parts, automobile parts, mechanical parts, food containers, films, sheets, fibers, etc.

[0042] [Conductive film] The conductive film of the present invention is formed from the conductive resin composition and has a volume resistivity of 1.0×10 -2 The volume resistivity of the conductive film is preferably less than 8.0×10 -3 Less than Ω·cm, preferably 1.0×10 -3 The conductive film of the present invention has a resistivity of less than 1.0×10 -4 Less than Ω·cm (10 -5 It is possible to achieve a volume resistivity of the order of Ω·cm, which is comparable to that of conductive films formed from silver paste. Here, the volume resistivity is obtained by the method described in the examples. The method for forming a conductive film from the conductive resin composition is not particularly limited. For example, the conductive resin composition may be made to contain a solvent, and the conductive film may be formed by applying the solvent to a substrate and drying the substrate. Alternatively, the conductive film may be obtained by casting or applying the conductive resin composition onto a peelable substrate, drying the composition, and then peeling the coated substrate. The conditions for forming the conductive film are not particularly limited and can be set appropriately depending on the substrate, etc. The temperature during drying, etc. after applying the conductive resin composition is, for example, 50° C. or higher, preferably 90° C. or higher, and, for example, 250° C. or lower, preferably 220° C. or lower. The drying time is, for example, 5 minutes or higher, preferably 7 minutes or higher, and, for example, 300 minutes or lower, preferably 200 minutes or lower. The dry thickness of the conductive film is not particularly limited and can be adjusted appropriately depending on the application, etc. For example, it is 10 μm or more, preferably 30 μm or more, and for example, 1000 μm or less, preferably 500 μm or less.

[0043] [Conductive ink] The conductive ink of the present invention can be obtained by dissolving and / or dispersing the conductive resin composition in a solvent. The conductive ink of the present invention contains tin powder, resin, organic acid compound and solvent, and optionally contains additive components such as lead-free solder powder, surfactant, pH adjuster (amine compound), leveling agent, pigment, UV absorber, antioxidant, flame retardant, etc. The conductive ink can be obtained by placing the above components in a mixing container, mixing them using one or more mixers selected from the group consisting of a rotation-revolution mixer, a ball mill, a roll mill, a bead mill, a planetary mixer, a tumbler, a stirrer, a mixer, a mechanical homogenizer, an ultrasonic homogenizer, a high-pressure homogenizer, a paint shaker, and the like, to form a varnish or paste.

[0044] The conductive ink of the present invention can be used, for example, as a conductive ink for printing to form wiring. The printing method can be, for example, one or more methods selected from the group consisting of screen printing, inkjet printing, flexographic printing, gravure printing, etc. In the present invention, it is preferable to use one or more printing methods selected from the group consisting of screen printing, inkjet printing, etc., because they have excellent printability and shape retention. Here, the mesh used in the screen printing method can be selected as appropriate, and it is preferable to use a mesh that does not remove excessive amounts of conductive powder in the conductive ink or lead-free solder powder.

[0045] The thickness of the coating film obtained by applying the conductive ink of the present invention can be adjusted to an appropriate thickness depending on the intended use, for example, 1 μm or more, preferably 2 μm or more, more preferably 5 μm or more, and 100 μm or less. The conductive ink of the present invention is excellent in one or more properties selected from the group consisting of conductivity, adhesion to various substrates, storage stability, leveling (surface smoothness), printability, and the like.

[0046] [Circuit connecting materials] The circuit connecting material of the present invention is used for conductive connections between various electronic components and circuit boards, and for connecting (adhering) electric and electronic circuits together. The form of the circuit connecting material is not particularly limited, but it is preferably in the form of a liquid or film. The liquid circuit connecting material can be obtained, for example, by mixing the conductive resin composition of the present invention with a solvent such as an organic solvent to liquefy it. The film-like circuit connecting material can be obtained, for example, by directly casting and applying the liquefied conductive resin composition of the present invention onto a release substrate to form a film, drying the film to remove the solvent, and then peeling the film off from the release substrate. Furthermore, a film-like circuit connecting material can be obtained, for example, by impregnating a nonwoven fabric or the like with the liquefied conductive resin composition of the present invention, forming the nonwoven fabric on a releasable substrate, drying the nonwoven fabric to remove the solvent, and then peeling the nonwoven fabric off the releasable substrate.

[0047] The electrical connection method using the circuit connecting material of the present invention is not particularly limited. For example, the circuit connecting material is placed between an electrode of an electronic component or circuit and an electrode on a substrate facing the electrode, and heated to electrically connect and bond the electrodes. Pressure can be applied during heating, if necessary. The method for providing the circuit connecting material between the opposing electrodes is not particularly limited, and examples thereof include a method of applying a liquid circuit connecting material and a method of sandwiching a film-like circuit connecting material. Furthermore, when electrically connecting a pin of an electronic component or the like to a circuit, there is also a method of providing a circuit connection material at the base of the pin and butt-joining the pin to form an electrically conductive connection.

[0048] The circuit connecting material of the present invention can be used substantially as an anisotropic conductive material, and can also be used in an electrode connection method in which the circuit connecting material with excellent adhesiveness is formed between opposing electrodes on a substrate, and then heated and pressurized to bring the electrodes into contact and bond the substrates together. The substrate on which the electrodes are formed can be inorganic, such as semiconductor, glass, or ceramic; organic, such as polyimide or polycarbonate; or a composite combination of these, such as glass / epoxy. Furthermore, since the circuit connecting material of the present invention contains solder powder that melts at low temperatures, it is possible to achieve conductive connection at temperatures as low as 250°C or less, for example, 200°C or less. [Example]

[0049] The present invention will be described in more detail below with reference to examples. However, the present invention is not limited to these examples. Unless otherwise specified, "%" means "% by mass" and "parts" means "parts by mass." The tin powder, resin, organic acid compound and lead-free solder powder used in the examples and comparative examples are as follows: <Tin powder> Tin powder 1: Stamped tin flake powder (more than 70% by mass has a particle size of less than 45 μm) Tin powder 2: Gas atomized tin powder (D50 = 73.5 μm, Sn ≧ 99.9 mass%) Tin powder 3: Spherical tin powder (D50=5.5μm, Sn≧99.5% by mass) <Lead-free solder powder> Lead-free solder 1: Sn42-Bi58 (type 5) (manufactured by Mitsui Mining & Smelting Co., Ltd.) Lead-free solder 2: Sn42-Bi58 (type 4) (manufactured by Mitsui Mining & Smelting Co., Ltd.) Lead-free solder 3: Sn42-Bi58 (type 9) (manufactured by 5N Plus) <Resin> Resin 1: Polyvinyl butyral resin (Sekisui Chemical Co., Ltd., S-LEC BH-A) <Organic acid compounds> Organic Acid 1: Glutaric Acid Organic acid 2: dodecanedioic acid (Okamoto Oil Mills, SL-12) Organic acid 3: Eicosanedioic acid (Okamoto Oil Mills, SL-20) Organic acid 4: Stearic acid

[0050] In the examples and comparative examples, the volume resistivity of the conductive film formed from the conductive resin composition was measured and evaluated by the method shown below. <Conductivity> A conductive resin composition was spin-coated using a spin coater to form a wet coating on a plastic film substrate, and then the film was baked to form a conductive film whose film thickness after baking (baked film thickness) is shown in Tables 1 and 2. The volume resistivity of the conductive film was measured using a resistivity meter "Loresta GP-MCP T610" (manufactured by Nitto Seiko Analytech Co., Ltd.). In the present invention, the volume resistivity of the conductive film is 1.0×10 -2 Those with a resistance of less than Ω·cm were considered to have passed.

[0051] [Example 1] A varnish was obtained by mixing 0.84 parts of resin 1 with 5.00 parts of diethylene glycol monoethyl ether acetate (EDGAC). 5.84 parts of the prepared varnish, 15.00 parts of tin powder 1, and 0.4 parts of organic acid 1 were mixed and stirred using a planetary centrifugal mixer (Thinky Corporation, "Awatori Rentaro AR-100") to obtain a conductive resin composition. The solid contents of the tin powder, resin, and organic acid in the obtained conductive resin composition are shown in Table 1. The obtained conductive resin composition was spin-coated on a substrate at 500 rpm for 5 seconds, then at 2000 rpm for 30 seconds, and heated to prepare a conductive film with a dry thickness of 100 μm. The conductivity (volume resistivity) was measured. The results are shown in Tables 1 and 2.

[0052] [Examples 2 to 20, Comparative Examples 1 and 2] A conductive resin composition and a conductive film were prepared in the same manner as in Example 1, except that the constituent components of the conductive resin composition, the solid content thereof, and the fired film thickness of the conductive film were as shown in Tables 1 and 2, respectively. The volume resistivity of the conductive film formed from the obtained conductive resin composition was evaluated. The results are also shown in Tables 1 and 2.

[0053] [Table 1]

[0054] [Table 2]

[0055] As can be seen from Tables 1 and 2, the conductive films formed from the conductive resin compositions according to Examples 1 to 20 all had a volume resistivity of 1.0×10 -2 (Ω·cm), in some cases less than 1.0×10 -4 The results showed that the resin composition exhibited excellent conductivity, with a resistance of less than 100 Ω·cm, which was equal to or greater than that of silver paste. This indicates that a conductive resin composition was formed that was lower in cost than silver paste and exhibited high conductivity equivalent to that of silver paste. Furthermore, as can be seen from Examples 1, 2, 10, and 11, the conductive film formed from the conductive resin composition of the present invention can have a low volume resistivity even if the firing film thickness conditions during the production of the conductive film are varied. On the other hand, the conductive films formed from the conductive resin compositions of Comparative Examples 1 and 2, which did not contain any organic acid compound, had poor conductivity and the volume resistivity was unmeasurable.

Claims

1. A conductive resin composition comprising tin powder containing 99.5% by mass or more of tin, a resin, and an organic acid compound, wherein the content of the tin powder is 90.0 to 97.0% by mass, where the total amount of all solids in the conductive resin composition is 100% by mass.

2. The conductive resin composition according to claim 1 , further comprising a lead-free solder powder.

3. 3. The conductive resin composition according to claim 1, wherein the resin comprises at least one selected from the group consisting of polyvinyl butyral-based resins, resol-type phenol-based resins, acrylic-based resins, polyester-based resins, phenoxy resins, polyimide-based resins, epoxy-based resins, and xylene-based resins.

4. A conductive film having a volume resistivity of 1.0×10 formed from the conductive resin composition according to any one of claims 1 to 3. －２ A conductive film having a resistivity of less than Ω·cm.

5. A conductive ink comprising the conductive resin composition according to any one of claims 1 to 3.

6. A circuit connecting material comprising the conductive resin composition according to any one of claims 1 to 3.

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