Film deposition apparatus and film deposition method
The film formation apparatus and method utilize droplet separation to enhance film quality and rate in Mist CVD by using atomization, transport, and reaction means, overcoming issues of non-uniformity and low rates in conventional methods.
JP2025181083APending Publication Date: 2025-12-11PATENTIX INC
Patent Information
- Application Number
- JP2024088844
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2024-05-31
- Publication Date
- 2025-12-11
Smart Images
Figure 2025181083000001_ABST
Abstract
To provide a film deposition apparatus having a good film quality and a film deposition rate, and a film deposition method capable of depositing a film with an industrial advantage.SOLUTION: A film deposition apparatus has at least atomization means for atomizing or making a droplet of a raw material liquid, transportation means for transporting a droplet obtained by the atomization means to a substrate using a carrier gas, and reaction means for reacting the droplet at a vicinity of the substrate. A high-quality film is formed on the substrate using the film deposition apparatus including droplet weight separation means for separating a heavy droplet and a light droplet during a transportation.SELECTED DRAWING: Figure 1
Need to check novelty before this filing date? Find Prior Art
Citation Information
Patent Citations
Crystal vibrator
JP1978097794A
Vapor phase epitaxy apparatus
JP1989257337A
Film-forming method and film-forming apparatus
JP2005307238A
Mist CVD device and method for generating mist
JP2012046772A
Process of manufacturing zinc oxide crystal layer, zinc oxide crystal layer, and mist chemical vapor deposition device
JP2014063973A