Wafer cassette loading and unloading system for epitaxial reactor with coaxial actuation system and epitaxial reactor

Abstract

To provide a wafer cassette loading and unloading system for an epitaxial reactor with a coaxial actuation system and an epitaxial reactor.SOLUTION: A wafer cassette loading and unloading system (1) includes: a carousel platform (5) pivotally connected to an epitaxial reactor (4) around a carousel axis (7); a carousel actuator (6) for driving rotation of the carousel platform (5) around the carousel axis (7); at least one support platform (8) pivotally connected to the carousel platform (5) around a rotation axis (9) that differs from the carousel axis (7); and a rotation actuator (10) for driving rotation of the at least one support platform (8) around the rotation axis (9) relative to the carousel platform (5).SELECTED DRAWING: Figure 5

Description

[Technical Field]

[0001] The present invention relates to a wafer cassette loading and unloading system for an epitaxial reactor, and to an epitaxial reactor equipped with such a loading and unloading system. [Background technology]

[0002] Wafers intended to undergo epitaxial deposition processing of semiconductor materials are typically stored and transported in cassettes, where the wafers are stacked horizontally and spaced apart from one another.

[0003] These cassettes generally include a front side that is externally accessible for loading and unloading wafers from the cassette, and an opposite rear side that is wholly or at least partially enclosed.

[0004] They are known to the inventors as epitaxial reactors with wafer cassette loading and unloading systems.

[0005] These loading and unloading systems known to the inventors include a platform pivotally hinged to a shaft, onto which at least one wafer cassette can be loaded.

[0006] The platform is pivotable between a first operating position in which the platform faces outward from the epitaxial reactor so that wafer cassettes can be loaded or unloaded from the outside, and a second operating position in which the platform faces inward toward the epitaxial reactor so that wafers contained in the cassettes can be manipulated by automated components of the epitaxial reactor, such as a handling robot.

[0007] It is known to the inventors that at least two wafer cassettes can be loaded adjacent to each other onto the platform so that the wafers contained in one cassette are intended to be used in a test process or test, and the wafers contained in the other cassette are instead intended for final processing.

[0008] This type of wafer cassette loading and unloading system is difficult to interface with automated loading and unloading systems such as SMIF, AGV, or AMR systems (Standard Mechanical Interface, Automated Guided Vehicle, Automated Mechanical Robot). In particular, loading and unloading a second wafer cassette adjacent to a first wafer cassette is complicated or impractical. Therefore, this loading and unloading system requires an operator to manually load and unload the wafer cassette.

[0009] Additionally, this type of wafer cassette loading and unloading system requires that the front of the wafer cassette face the operator during loading and unloading. However, exposing the front of the wafer cassette to the operator is undesirable because it increases the risk of wafer contamination or dropped and damaged wafers.

[0010] Furthermore, in this type of wafer cassette loading and unloading system, the detection, optical and / or electronic systems require wiring that affects moving parts.

[0011] Therefore, there is a need for a wafer cassette loading and unloading system that can be easily interfaced with an automated loading and unloading system, such as a SMIF, AGV or AMR system, or that can also be used manually.

[0012] There is also a need for a wafer cassette loading and unloading system that simplifies the loading and unloading of one or more wafer cassettes.

[0013] There is also a need to have a wafer cassette loading and unloading system that minimizes the risk of contamination or damage to wafers that are being or have already been subjected to epitaxial deposition processing.

[0014] There is also a need for a wafer cassette loading and unloading system that has a compact automation system.

[0015] There is also a need for an assembly for non-contact wafer cassette detection, i.e., without wires interfering with moving parts, and a wafer cassette loading and unloading system including said assembly. Summary of the Invention

[0016] It is an object of the present invention to provide a wafer cassette loading and unloading system for an epitaxial reactor, and an epitaxial reactor including the loading and unloading system, to solve at least some of the problems highlighted in the prior art.

[0017] A specific object of the present invention is to provide a wafer cassette loading and unloading system for an epitaxial reactor, and an epitaxial reactor equipped with a loading and unloading system that can be easily interfaced with an automatic loading and unloading system or that can also be operated manually.

[0018] A more specific object of the present invention is to provide a wafer cassette loading and unloading system for an epitaxial reactor, and an epitaxial reactor with a loading and unloading system that simplifies the loading and unloading of one or more wafer cassettes.

[0019] A more specific object of the present invention is to provide a wafer cassette loading and unloading system for an epitaxial reactor, and an epitaxial reactor comprising the loading and unloading system, that minimizes the risk of contamination or damage to wafers that are being or have already been subjected to an epitaxial deposition process.

[0020] A further specific object of the present invention is to provide a wafer cassette loading and unloading system for an epitaxial reactor and an epitaxial reactor, which includes a loading and unloading system that has a small footprint, is of reduced complexity, and allows the wafer cassettes to be transported closer to the handling robot of the epitaxial reactor, thus avoiding undesirable stress on the handling robot.

[0021] It is an additional specific object of the present invention to make available an assembly for non-contact wafer cassette detection, a wafer cassette loading and unloading system for an epitaxial reactor comprising the non-contact wafer cassette detection assembly, and an epitaxial reactor comprising the loading and unloading system, which is intended to eliminate the problems of entanglement and undesired attraction that would result from contact detection systems.

[0022] This and other objects are achieved according to the independent claims by a wafer cassette loading and unloading system for an epitaxial reactor and an epitaxial reactor comprising the loading and unloading system.

[0023] The dependent claims relate to preferred and advantageous embodiments of the invention.

[0024] 〔drawing〕

[0025] For a better understanding of the present invention and to appreciate its advantages, some illustrative and non-limiting implementations thereof will be described below with reference to the accompanying drawings, in which: [Brief explanation of the drawings]

[0026] [Figure 1A] FIG. 1A is a schematic perspective view of a wafer cassette loading and unloading system in first and second operating positions according to the state of the art known to the inventors. [Figure 1B] FIG. 1B is a schematic perspective view of a wafer cassette loading and unloading system in first and second operating positions according to the state of the art known to the inventors. [Figure 2] FIG. 2 is a schematic perspective bottom view of a wafer cassette loading and unloading system (with the assembly for non-contact detection of the wafer cassette omitted for clarity) according to one implementation of the present invention. [Figure 3] FIG. 3 is a schematic perspective top view of the wafer cassette loading and unloading system shown in FIG. [Figure 4] FIG. 4 is a cross-sectional schematic view of the wafer cassette loading and unloading system shown in FIG. [Figure 5] FIG. 5 is a schematic side view of the wafer cassette loading and unloading system shown in FIG. [Figure 6] FIG. 6 is a schematic cross-sectional view of an assembly for contactless detection of a wafer cassette according to an implementation of the present invention, shown in two different configurations (abutting and non-abutting cassettes, respectively, from left to right). [Figure 7] FIG. 7 is a cross-sectional schematic diagram of a wafer cassette loading and unloading system according to one implementation of the present invention. [Figure 8] FIG. 8 is a cross-sectional schematic diagram of a wafer cassette loading and unloading system according to one implementation of the present invention. [Figure 9] FIG. 9 is a schematic top view of a portion of an epitaxial reactor according to one implementation of the present invention. [Figure 10] FIG. 10 is a schematic top view of a portion of an epitaxial reactor according to one implementation of the present invention. DETAILED DESCRIPTION OF THE INVENTION

[0027] It should be understood that the present invention is not limited by the specific implementations shown in the accompanying drawings, and its scope of protection is determined solely by the content of the claims. Also, it should be noted that in this description, the same numerals refer to substantially the same elements, and the description can be made by referring to the content shown in different drawings in accordance with the above rules. In order to make the drawings clearer, not all elements are displayed and / or illustrated to scale at the time.

[0028] [Description of some preferred implementations]

[0029] This patent application of the present invention makes reference to the priority of Italian patent application 102024000028128, which is incorporated by reference in its entirety, in particular claims 1-20, figures 1-10, and paragraphs

[0167] to

[0216] and paragraphs

[0027] to

[0038] .

[0030] This patent application of the present invention also makes reference to the priority of Italian Patent Application 102024000012361, which is incorporated by reference in its entirety, and in particular claims 1-16, figures 1-7, and paragraphs

[0025] to

[0184] are incorporated by reference.

[0031] Referring to the drawings, a wafer cassette loading and unloading system is generally designated by the reference numeral 1.

[0032] The loading and unloading system 1 is configured to allow the loading and unloading of cassettes 2 of wafers 3 into an epitaxial reactor 4 .

[0033] Generally, the cassette 2 includes a front side 23 that is accessible from the outside for loading and unloading of wafers 3 from the cassette 2, and an opposite rear side 24 that is at least partially closed.

[0034] Preferably, cassette 2 allows wafers 3 to be stacked vertically one above the other when system 1 is in use.

[0035] The system 1 comprises a carousel platform 5 configured to carry at least one cassette 2 .

[0036] The carousel platform 5 may be pivotally connected to the epitaxial reactor 4 about a carousel axis 7 .

[0037] The carousel axis 7 is substantially transverse to the carousel platform 5 .

[0038] The system 1 also includes a carousel actuator 6 .

[0039] The carousel actuator 6 is configured to drive the rotation of the carousel platform 5 about the carousel axis 7. Specifically, the carousel actuator 6 is configured to actuate the rotation of the carousel platform 5 relative to the epitaxial reactor 4 about the carousel axis 7.

[0040] In this manner, the carousel platform 5 can transport at least one cassette 2 of wafers 3 from a first operating position to a second operating position via rotation of the at least one cassette 2 about the carousel axis 7. Specifically, the first operating position can correspond to a position where the cassette 2 can be loaded or unloaded from the epitaxial reactor 4 in an automated or manual manner. The second operating position can correspond to a position where the wafers 3 from the cassette 2 can be moved by automated components of the epitaxial reactor 4, such as a handling robot 11.

[0041] Rotation of the carousel platform 5 relative to the epitaxial reactor 4 specifically refers to rotation of the carousel platform 5 relative to the fixed frame of the epitaxial reactor 4 .

[0042] According to one aspect of the present invention, the system 1 also includes at least one support platform 8 adapted to support at least one cassette 2 of wafers 3 .

[0043] In particular, the support platform 8 is adapted to support a single cassette 2 from one or more cassettes 2 that may be carried by the carousel platform 5 .

[0044] At least one support platform 8 is pivotally connected to the carousel platform 5 about an axis of rotation 9 .

[0045] The rotation axis 9 is different from the carousel axis 7 .

[0046] The rotation axis 9 is essentially parallel to the carousel axis 7 .

[0047] Additionally, the system 1 includes a rotary actuator 10 .

[0048] The rotary actuator 10 is configured to actuate the rotation of the at least one support platform 8 about the axis of rotation 9. Specifically, the rotary actuator 10 is configured to actuate the rotation of the at least one support platform 8 relative to the carousel platform 5 about the axis of rotation 9.

[0049] Furthermore, the system 1 comprises a carousel shaft 16 that extends along and is coaxial with the carousel axis 7 and is configured to receive rotational motion from the carousel actuator 6 . System 1 further comprises a primary rotary shaft 27 configured to receive the rotary motion of rotary actuator 10. Primary rotary shaft 27 extends along carousel axis 7 and is coaxial with carousel axis 7 and carousel shaft 16.

[0050] The number of support platforms of the system 1 may advantageously be selected to be equal to the maximum number of cassettes intended to be kept available in the reactor 4. This number may also vary depending on the number of reaction chambers contained within the reactor.

[0051] In general, the inventors have observed that the present invention works particularly well with cassette numbers of 2 to 8 and support platform numbers of 2 to 8.

[0052] Advantageously, system 1 configured in this manner allows for easy loading and unloading of one or more wafer 3 cassettes 2, either manually or by an automated system such as an SMIF, AGV, or AMR. Indeed, system 1 configured in this manner allows for one or more cassettes 2 to be loaded or unloaded at essentially the same first operational position for each cassette 2, which can be conveniently positioned for automated or manual loading, thus simplifying loading and unloading operations.

[0053] A further advantage is that system 1 configured in this manner allows carousel platform 5 to rotate independently about carousel axis 7 and support platform 8 to rotate independently about rotation axis 9, thereby adapting to the system (automated or manual) used to handle the cassettes and / or wafers. For example, it may be advantageous to have cassette 2 in different orientations on support platform 8 during loading, unloading out of, or picking up wafers 3 from cassette 2 for insertion into (and vice versa from) the reaction chamber of epitaxial reactor 4.

[0054] In particular, the system 1 configured in this manner makes it possible to select whether loading and unloading operations of the cassette 2 are performed with the cassette 2 having a front face 23 oriented towards the outside of the carousel platform 5 or towards its inside (i.e., the carousel axis 7).

[0055] As an additional advantage, the system 1 configured in this manner minimizes the risk of contamination or damage to the wafers 3 contained in one or more cassettes 2, since the front face 23 of the cassette 2 does not need to be exposed to an operator during loading and unloading operations on the system 1. Indeed, the system 1 allows the cassette 2 to be loaded or unloaded onto the support platform 8 with the rear face 24 of the cassette 2 facing the operator. Thereafter, when the cassette 2 is placed, for example, in a second operating position, the system 1 allows the cassette 2 to be rotated via rotation of the support platform 8 supporting the cassette 2 about the rotation axis 9, thus exposing the front face 23 of the cassette 2 toward the interior of the epitaxial reactor 4, for example, toward a handling robot 11 that can handle the wafers 3 in the cassette 2.

[0056] As an additional advantage, the system 1 configured in this way also allows the wafer 3 cassettes 2 to be moved closer to the handling robot 11 within the epitaxial reactor 4 compared to state-of-the-art systems known to the inventors, thus avoiding undesirable stress on the handling robot 11.

[0057] As an added advantage, the system 1 configured in this manner allows for a more compact solution compared to systems in the art known to the inventors, due to the coaxiality of the carousel shaft 16 and the primary rotary shaft 27. This configuration also allows the carousel platform to always rotate in the same direction, allowing for less play and better repeatability of operation compared to solutions where the primary rotary shaft 27 and the carousel shaft 16 are not coaxial. This also helps to avoid twisting of the power and signal cables of the carousel actuator 6 and rotary actuator 10.

[0058] As an added advantage, the solution presented herein facilitates the containment of a clean area in which the cassette 2 is located relative to the moving parts (bearings, sprockets, sprockets) as well as the carousel actuator 6 and the rotary actuator 10, thus further minimizing the risk of contamination or damage to wafers that are or have already been subjected to epitaxial deposition processing.

[0059] According to one implementation, the primary rotating shaft 27 is hollow and comprises all or part of the carousel shaft 16 to which it is rotatably connected. Optionally, the carousel shaft 16 is also hollow.

[0060] Advantageously, the system 1 configured in this manner allows for simple grouping of the main moving parts (particularly the primary rotating shaft 27 and the carousel shaft 16), minimizing the overall dimensions and reducing the area affected by any dust or debris caused by the movement of the main moving parts.

[0061] As an added advantage, the system 1 configured in this way has lighter main moving parts, thus limiting the energy required to move the main moving parts.

[0062] According to one implementation, the system 1 comprises a set 32 ​​of coaxial shafts.

[0063] The coaxial shaft assembly 32 includes at least one stator 30 , a primary rotating shaft 27 , and a carousel shaft 16 .

[0064] The stator 30 is hollow and includes all or part of the primary rotatable shaft 27 , which in turn is hollow and includes all or part of the carousel shaft 16 .

[0065] The coaxial shaft assembly 32 may optionally include (i) one or more cover systems (shields, masks, etc.), and / or (ii) one or more sealing systems (flanges, seals, etc.), and / or (iii) one or more ball bearings 33 disposed between the stator 30 and the primary rotating shaft 27 and / or between the primary rotating shaft 27 and the carousel shaft 16, respectively.

[0066] Advantageously, the system 1 configured in this manner prevents or reduces contamination of the system 1 from any dust or dirt caused by movement of the main parts (particularly the primary rotating shaft 27 and the carousel shaft 16) and allows for effective isolation, rigidity and shielding of the coaxial shaft assembly 32 compared to other parts of the system 1.

[0067] According to one implementation, system 1 includes benches 34 adapted to further separate the clean areas of system 1 (intended for cassettes 2 containing wafers 3) from gray areas where cleaning requirements are less stringent and where carousel actuators 6 and rotary actuators 10 may be conveniently located. For example, carousel platform 5 and cassettes 2 may be located above bank 34, while carousel actuators 6 and rotary actuators 10 may be located below bank 34. Benches 34, unlike the carousel platform, are fixed elements.

[0068] According to one implementation, the system 1 includes a gear mechanism 12 .

[0069] The gear 12 connects the rotary actuator 10 , more precisely the primary rotary shaft 27 , to at least one support platform 8 .

[0070] The gear 12 is configured to rotate the support platform 8 relative to the carousel platform 5 about an axis of rotation 9 .

[0071] Advantageously, the gear 12 may be totally or partially surrounded by a casing that prevents the spread of dust or dirt generated during handling of the gear 12 .

[0072] According to one implementation, the system 1 comprises a motion transmission system connecting the rotary actuator 10 with at least one support platform 8, which may include a drive chain and / or a timing belt and / or a mechanical linkage.

[0073] According to one implementation, the system 1 includes a sprocket 13 .

[0074] The sprocket 13 is pivotally connected to the carousel platform 5 .

[0075] Furthermore, the sprocket 13 is positioned coaxially with the carousel axis 7. In this manner, the sprocket 13 can pivot relative to the carousel platform 5 about the carousel axis 7.

[0076] The system 1 also includes at least one drive wheel 14 .

[0077] At least one drive wheel 14 is mounted on each support platform 8. Furthermore, the drive wheel 14 is positioned coaxially with the rotation axis 9.

[0078] The drive wheel 14 directly engages or is connected to the sprocket 13 through one or more idler wheels 28 .

[0079] If present, one or more idler wheels 28 are designed to rotate about an idler wheel axis of rotation 29 that is substantially parallel to, and distinct from, the carousel axis 7 and the axis of rotation 9 .

[0080] Additionally, the rotary actuator 10 is operatively connected to the sprocket 13 via a primary rotary shaft 27 for actuating rotation of the sprocket 13 about the carousel axis 7 relative to the carousel platform 5 .

[0081] Advantageously, configuring the system 1 in this manner allows the cassette 2 to be transported from a first operating position to a second operating position by rotation of the carousel platform 5. Furthermore, configured in this manner, via the co-geared sprocket 13 and drive wheel 14 (directly or indirectly through one or more idler wheels 28), the cassette 2 can be rotated to expose its front face 23 or rear face independently, as desired.

[0082] As an example, a wafer cassette 2 can be loaded onto a support platform 8 in a first operating position with a rear face 24 of the cassette 2 facing an operator or automated system. The cassette 2 can then be transported from the first operating position to a second operating position by rotation of the carousel platform 5, to which the support platform 8 is connected, relative to the epitaxial reactor 4 about a carousel axis 7 driven by a carousel actuator 6. During movement between the first and second operating positions, or at the second operating position, the cassette 2 can pivot itself to expose its front face 23 toward a handling robot 11 within the epitaxial reactor 4, by rotation of the support platform 8 about a rotation axis 9 relative to the carousel platform 5, driven by a rotation actuator 10, and in particular through rotation of a drive wheel 14, which is integral to the support platform 8 and driven by rotation of a sprocket 13 to which the drive wheel 14 is geared.

[0083] According to one implementation, the sprocket 13 and the at least one drive wheel 14 are positioned essentially in the same plane.

[0084] According to one implementation, at least one drive wheel 14 is geared externally to a sprocket 13 with reference to the carousel axis 7 .

[0085] According to one implementation, at least one drive wheel 14 is geared inside a sprocket 13 with reference to the carousel axis 7 .

[0086] According to one implementation, at least one idler wheel 28 is interposed between the sprocket 13 and the drive wheel 14. In this case, it is geared to both the sprocket 13 and the drive wheel 14, allowing the latter to rotate in the same direction, either clockwise or counterclockwise.

[0087] According to one implementation, the rotary actuator 10 comprises a drive gear 15. The drive wheel 15 may also be a pinion.

[0088] The drive wheel 15 is geared with a second sprocket 31 which is different from the sprocket 13 .

[0089] A second sprocket 31 is attached to the primary rotating shaft 27 and is integral with the sprocket 13 .

[0090] The second sprocket 31 , the primary rotating shaft 27 and the sprocket 13 are adapted to rotate about the carousel axis 7 .

[0091] The drive gear 15 is therefore arranged to indirectly command the rotation of the sprocket 13 about the carousel axis 7 .

[0092] According to one implementation, the sprocket 13 and the at least one drive wheel 14 are positioned essentially in the same plane.

[0093] According to one implementation, the at least one drive gear 15 externally engages and is flush with the second sprocket 31 with reference to the carousel axis 7 .

[0094] According to one implementation, the at least one drive gear 15 internally engages with the second sprocket 31 with reference to the carousel axis 7 .

[0095] According to one implementation, the sprocket 13, the second sprocket 31, the at least one drive wheel 14, and the drive gear 15 have cylindrical or helical teeth.

[0096] According to one implementation, the carousel shaft 16 is attached to the carousel platform 5 .

[0097] Furthermore, the carousel shaft 16 is interposed between the carousel actuator 6 and the carousel platform 5 .

[0098] In particular, the carousel shaft 16 is configured to receive rotational motion from the carousel actuator 6 and to impart rotational motion to the carousel platform 5 so as to drive rotation of the carousel platform 5 about the carousel axis 7 .

[0099] According to one implementation, the carousel shaft 16 extends through the sprocket 13 .

[0100] According to one implementation, the carousel shaft 16 is positioned on the opposite side of the support platform 8 relative to the carousel platform 5 .

[0101] According to one implementation, each support platform 8 comprises a respective secondary rotation shaft 25. The secondary rotation shaft 25 extends coaxially with the respective rotation axis 9.

[0102] The secondary rotating shafts 25 are attached to the support platform 8 and to the respective drive wheels 14 .

[0103] According to one implementation, the secondary rotating shaft 25 extends through the carousel platform 5. In this manner, the secondary rotating shaft 25 integrally connects the support platform 8 to respective drive wheels 14 positioned opposite each other relative to the carousel platform 5.

[0104] According to one implementation, the carousel actuator 6 is a servo motor.

[0105] According to one implementation, the carousel actuator 6 is connected to one end of the carousel shaft 16 opposite the one end of the carousel shaft 16 to which the carousel platform 5 is connected.

[0106] According to one implementation, the rotary actuator 10 is a servo motor.

[0107] According to one implementation, the carousel actuator 6 and / or the rotary actuator 10 are equipped with motor conditioners (encoders) to know the absolute position of the cassette 2 .

[0108] According to one implementation, the carousel platform 5 is a plate, for example circular in shape, coaxial with the carousel axis 7 .

[0109] The term "platter" refers to a regular rod or prism with parallel bases and circular or polygonal shaped flat surfaces.

[0110] According to one implementation, the thickness of the platter is less than the side of a square having an area equal to the area of ​​the base of the plate.

[0111] According to one implementation, the support platform 8 is a plate. According to one implementation, the support platform 8 is a plate that is circular or prismatic or essentially shaped to mirror the shape of the bottom wall of the cassette 2.

[0112] According to one implementation, the at least one support platform 8 is positioned opposite the sprocket 13 and the at least one drive wheel 14 relative to the carousel platform 5 .

[0113] According to one implementation, the system 1 comprises a plurality of support platforms 8 pivotally connected to the carousel platform 5 about respective separate axes of rotation 9 .

[0114] The respective rotation axes 9 are parallel to each other and to the carousel axis 7 .

[0115] According to one implementation, the system 1 comprises three support platforms 8 .

[0116] Advantageously, one of the three support platforms 8 may be intended to support and transport wafer 3 cassettes 2 for test procedures or testing, another of the three support platforms 8 may be intended to support and transport wafer 3 cassettes 2 to be subjected to final processing in the epitaxial reactor reaction chamber 4, and another of the three support platforms 8 may be intended to support and transport wafer 3 cassettes 2 into the epitaxial reactor reaction chamber 4. Thus, the system 1 configured in this way can be used in epitaxial reactors 4 having two or more reaction chambers, allowing for quick and easy replenishment or withdrawal of wafers 3 to be processed or treated.

[0117] According to one implementation, the support platforms 8 are positioned on the carousel platform 5 at angularly equidistant intervals from one another.

[0118] According to one implementation, three support platforms 8 are positioned on the carousel platform 5 at essentially 180° equidistant from each other.

[0119] According to one implementation, three support platforms 8 are positioned on the carousel platform 5 at essentially 90° equidistant from each other.

[0120] According to one implementation, three support platforms 8 are positioned on the carousel platform 5 at essentially 120° equidistant from each other.

[0121] According to one implementation, the drive wheels 14 of each of the multiple support platforms 8 engage the same sprocket 13 .

[0122] Advantageously, this configuration allows the rotation of all support platforms 8 to be driven solely by the rotation of the sprocket 13 to which the drive wheel 14 connected to each support platform 8 is geared.

[0123] According to one implementation, the drive wheel 14 of each of the multiple support platforms 8 engages an idler wheel 28 , and each idler wheel 28 engages the same sprocket 13 .

[0124] Advantageously, such an arrangement allows the drive wheels 14 to rotate in the same rotational direction as the sprocket 13 when there is an odd number of idler wheels 28 on each drive wheel 14. Preferably, only one idler wheel 28 engages each drive wheel 14 and sprocket 13.

[0125] As a further advantage, the configuration described herein allows all of the rotation of the support platform 8 to be actuated solely by the rotation of the sprocket 13. As a further advantage, the configuration described herein allows the ratio between the diameter of the sprocket 13 and the diameter of the drive wheel 14 to be reduced.

[0126] According to one implementation, a primary rotary shaft 27 is attached to sprocket 13 and a secondary sprocket 31 and is interposed between rotary actuator 6 and carousel platform 5 .

[0127] The primary rotating shaft 27 is configured to impart rotational motion to the gear 12 so as to drive rotation of the secondary rotating shaft 25 about the axis of rotation 9 and, in turn, rotation of the support platform 8 .

[0128] According to one implementation, the primary rotating shaft 27 is positioned on the opposite side of the support platform 8 relative to the carousel platform 5 .

[0129] According to one implementation, the carousel platform 5 comprises an upper wall 17 and an opposite lower wall 18 .

[0130] An upper wall 17 of the carousel platform 5 faces at least one support platform 8. Specifically, the support platform 8 is positioned above the upper wall 17 of the carousel platform 5.

[0131] A lower wall 18 of the carousel platform 5 faces the sprocket 13. According to one implementation, the lower wall 18 also faces at least one drive wheel 14, an idler wheel 28, if present, and the carousel shaft 16.

[0132] According to one implementation, the system 1 comprises a reflector element 19 .

[0133] The reflector element 19 comprises at least one reflective surface 20 .

[0134] According to one implementation, the reflective surface 20 is positioned essentially parallel to the carousel axis 7 .

[0135] Advantageously, the reflector element 19 is adapted to reflect a laser beam emitted by, for example, the handling robot 11 from the epitaxial reactor 4 and is used to detect the wafers 3 contained in the cassette 2 supported by the support platform 8. For example, the laser beam emitted by the handling robot 11 may be reflected by the reflector 19 towards the partially open rear face 24 of the cassette 2 in order to detect the number and arrangement of the wafers 3 contained in the cassette 2.

[0136] According to one implementation, the reflector element 19 comprises a number of reflective surfaces 20 equal to the number of support platforms 8 connected to the same carousel platform 5 .

[0137] According to one implementation, each reflective surface 20 extends in a plane parallel to the carousel axis 7 .

[0138] According to one implementation, each reflective surface 20 is positioned in line with a respective support platform 8 facing the respective support platform 8 .

[0139] According to one implementation, each reflective surface is positioned between the carousel axis 7 and the support platform 8 .

[0140] According to an implementation in which the system includes three support platforms 8, the reflector element 19 is positioned parallel to the carousel axis 7 and comprises three reflective surfaces 20 arranged in the shape of an essentially equilateral triangle.

[0141] According to an implementation in which the carousel platform 5 is a circular plate, each reflective surface 20 is positioned parallel to the carousel axis 7 and transverse to the radial axis of the carousel platform 5 .

[0142] According to an implementation in which the carousel platform 5 is a triangular plate with three sides of equal length, each reflective surface 20 is positioned parallel to the carousel axis 7 and parallel to a side of the triangular carousel platform 5 .

[0143] According to one implementation, the reflector element 19 includes a support suitable for supporting one or more reflective surfaces 20 .

[0144] According to one implementation, the reflector element 19 is positioned on the top wall 17 of the carousel platform 5 .

[0145] According to one implementation, the reflector element 19 is positioned on the carousel axis 7 .

[0146] According to one implementation, the reflector element 19 is positioned essentially concentric with the carousel axis 7 .

[0147] According to one implementation, the reflector element 19 is connected to the top wall 17 of the carousel platform 5 .

[0148] According to one implementation, the reflector element 19 extends along the carousel axis 7 opposite the lower wall 18 of the carousel platform 5 .

[0149] According to one implementation, the carousel actuator 6 and the rotary actuator 10 are positioned on opposite sides of the support platform 8 relative to the carousel platform 5 .

[0150] According to one implementation, the carousel actuator 6 and the rotary actuator 10 are positioned within the footprint occupied vertically, i.e., below a lower wall 18 provided in the direction of the carousel axis 7 relative to the carousel platform 5 .

[0151] According to one implementation, the system 1 includes a detection system 21 .

[0152] The detection system 21 is configured to detect the positioning and / or orientation of one or more support platforms 8 , or one or more cassettes 2 supported by each support platform 8 , relative to the carousel platform 5 .

[0153] Advantageously, during the cassette handling and transport phases, the detection system 21 can check that the cassette 2 supported by the support platform 8 is correctly oriented. By way of example, the detection system 21 can detect whether the cassette 2 is correctly positioned with its front face 23 facing the handling robot 11 when the cassette 2 is in the second operating position, or whether the cassette 2 is correctly positioned with its rear face 24 facing the operator when the cassette 2 is in the first operating position.

[0154] According to one implementation, the detection system 21 comprises at least one detection device, such as a laser sensor or an image detector.

[0155] According to one implementation, one or more detection devices are positioned above one or more support platforms 8 , with the carousel platform 5 facing the support platforms 8 .

[0156] According to an additional implementation, one or more detection devices are positioned in line with the upper wall 17 of the carousel platform 5 facing the support platform 8 .

[0157] According to an alternative and advantageous implementation, the one or more detection devices are positioned below the one or more support platforms 8 , with the carousel platform 5 facing the support platforms 8 .

[0158] According to one implementation, the cassette loading and unloading system 1 includes at least one assembly 36 for non-contact detection of the presence of a wafer 3 cassette 2 located within the support platform housing 8 .

[0159] The assembly 36 may advantageously be implemented in all implementations of the cassette loading and unloading system 1 described above.

[0160] In particular, assembly 36 may be used as an alternative to or in addition to detection system 21 .

[0161] The assembly 36 may also constitute a particular implementation of the detection system 21 .

[0162] The assembly 36 comprises: a first movable element 37 adapted to (i) assume at least a first predetermined position in the absence of a cassette, and (ii) assume at least a second predetermined position when the cassette is properly positioned within the housing; an actuation mechanism 38 (preferably incorporated into the support platform 8) adapted to contact the cassette when located within the housing and adapted to move the first movable element from a first predetermined position to a second predetermined position upon contact with the cassette when properly positioned within the housing; a source of electromagnetic radiation 39; a sensor 40 adapted to detect said electromagnetic radiation; A reflector 41 connected to or integral with the first movable element.

[0163] The source 39, the sensor 40, and the reflector 41 are positioned and oriented relative to one another such that the reflector receives the electromagnetic radiation emitted from the source 39 and reflects it onto the sensor 40 when at least the movable element 37 is located in the second predetermined position.

[0164] The sensor 40, by detecting the electromagnetic radiation signal emitted by the source 39, is able to convert said signal into position data of the reflector 41, for example by triangulation calculations.

[0165] Preferably, the first movable element 37 is connected to or integral with the support platform 8 .

[0166] Preferably, source 39 and / or sensor 40 do not contact or are physically connected to either support platform 8 or carousel platform 5. Preferably, source 39 and / or sensor 40 are not integral with either support platform 8 or carousel platform 5. They are preferably located in predetermined fixed positions, for example, as determined during instrument calibration. When used with system 1, they may advantageously be positioned on bench 34.

[0167] Preferably, the reflector 41 is integral with the first movable element 37 .

[0168] A reflector is an element that is capable of modifying the direction of electromagnetic radiation emitted by a source and incident thereon. A reflector may, for example, comprise a reflective surface.

[0169] Preferably, the drive mechanism 38 does not require electrical power, for example it may be a mechanism consisting essentially of mechanical gears.

[0170] Advantageously, the above-described assembly 36 allows for operation in a contactless manner, avoiding the presence of power and drive cables.

[0171] In particular, the assembly 36 does not require wiring to the support platform 8 and / or the carousel platform 5 .

[0172] Assembly 36 therefore has advantages over known detection systems, particularly when included in system 1. Indeed, due to the multiple rotational motions affecting various elements of system 1 (due to the combined motions about carousel axis 7 and rotation axis 9), the presence of cables on support platform 8 and / or carousel platform 5 can create undesirable obstructions, unwanted tension, and interference with the operation of system 1.

[0173] Advantageously, the system 1 may comprise an assembly 36 of each cassette, ie its respective housing, on the support platform 8, for verifying the presence and / or correct positioning.

[0174] Alternatively, system 1 may include a first assembly 36 for the first cassette and a number of modified assemblies corresponding to the number of remaining cassettes, if any. These modified assemblies, or contact detection devices, correspond to dedicated assemblies 36 of sources 39 and sensors 40. They may use the sources 39 and sensors 40 of assemblies 36 as support platform 8 rotates about carousel axis 7.

[0175] Generally, the sensor 40 can be connected via wired or wireless communication to a data transmission system to track, record, and / or process the position of the reflector 41 and / or output a signal reporting the absence and / or presence of a cassette based on said position.

[0176] Due to its connection with the first movable element, the reflector 41 can undergo a shift based on different positions Δ taken by the first movable element 37, for example as illustrated in FIG.

[0177] In general, the first movable element 37 may advantageously be adapted to assume a plurality of predetermined positions.

[0178] For example, bypassing the first predetermined location in the absence of a cassette allows for identifying several predetermined locations when a cassette is properly positioned within the slot. One location may correspond to when a cassette is present but empty. Another location may correspond to when a cassette is present and loaded with wafers. In the latter case, additional predetermined locations may be distinguished depending on the size and weight of the wafers (e.g., 6 inch vs. 8 inch).

[0179] According to one implementation, source 39 is a source of collimated electromagnetic radiation, preferably a visible or infrared emitting laser.

[0180] According to one implementation, the actuation mechanism 38 is a push button mechanism that is preferably actuated by the weight of the cassette when it is on the support platform 8 and properly positioned within its housing.

[0181] Generally, it should be noted that in all implementations described herein, each support platform 8 may advantageously be provided with at least one housing, each housing configured to accommodate a cassette.

[0182] For example, the housing may be configured to position and secure the cassette during use in the system 1.

[0183] To this end, the housing may comprise one or more protrusions and / or one or more recesses adapted to mechanically connect (e.g., by hooks or interlocks) with corresponding, respective recesses and / or protrusions 48 of the cassette. Typically, the cassettes in the region of interest are standardized and comprise an element known as an "H-bar" that protrudes from the body of the cassette at its base.

[0184] The housing for the cassette in the support platform 8 of the system 1 may advantageously be provided with a recess (such as opening 44) of a shape and size suitable to receive and accommodate an "H-bar" that helps secure the cassette to the support platform until it is removed after use.

[0185] According to an implementation in which the system comprises a secondary rotating shaft 25 , the latter is hollow and the first movable member 37 is a shaft extending within the secondary rotating shaft 25 .

[0186] This implementation provides a particularly compact form of assembly 36, minimizing weight and footprint and simplifying assembly.

[0187] In this case, the assembly 36 may further advantageously comprise at least one guide and / or at least one spacer 42 for positioning the first movable element 37 in the secondary rotating shaft 25 .

[0188] Assembly 36 may include at least one elastic potential energy device 47 preloaded and adapted to maintain first movable element 37 in a first predetermined position in the absence of a cassette.

[0189] The elastic potential energy device 47 may be a spring compressed via a spring preload element 45 .

[0190] According to one implementation, the drive mechanism 38 is a push button mechanism and comprises: a cavity 46 obtained within the one or more support platforms 8 and a second movable element 43, which is optionally resilient.

[0191] The cavity 46 has an opening 44 that is located within the cassette housing of the support platform 8. The opening may be configured to receive a protrusion 48 of the cassette 2, for example, an "H-bar" of the cassette.

[0192] The second movable element 43 is positioned in the opening 44 and is adapted to receive pressure under the weight of the cassette positioned in the opening 44 and, in response thereto, move the first movable element 37 from the first predetermined position to the second predetermined position or the third predetermined position.

[0193] These last default positions refer to the cassette being in empty or loading mode (or vice versa) for a given wafer size and do not exclude the possibility of additional default positions per loaded cassette for different wafer sizes.

[0194] The pressure exerted on the second movable element 43 by the weight force of the cassette may be caused by pushing a protrusion 48 of the cassette through an opening 44 in the cavity 46. The opening 44 actually faces the upper surface of the support platform 8 in the cassette housing.

[0195] The source 39 and sensor 40 may advantageously be combined into a single photodetector device and positioned on the bench 34 .

[0196] In the implementation shown in FIG. 6 , the second movable element 43 is a resilient sheet metal plate that is fixed at one end and connected at the other end to one end of the first movable element 37 that extends partially into the cavity 46.

[0197] The second movable element in this case acts as a lever of the third type.

[0198] Advantageously, in the case of a second elastic movable element, the latter may be able to independently return to its initial equilibrium position when the pressure exerted by the cassette ceases, e.g. when the cassette is removed or incorrectly positioned.

[0199] In a further aspect, the present invention relates to an assembly 36 for contactless detection of the presence of a wafer 3 cassette 2 located within a housing of a support platform 8 according to any of the configurations described above and as set out in the appended claims which form an integral part of this specification.

[0200] According to a further aspect of the present invention, the epitaxial reactor 4 comprises at least one reaction chamber.

[0201] The wafer 3 can be inserted inside the reaction chamber and subjected to an epitaxial deposition process of semiconductor material.

[0202] The epitaxial reactor 4 also includes at least one loading and unloading system 1 for cassettes 2 of wafers 3, as previously described.

[0203] According to one implementation, the reactor 4 includes a handling robot 11 .

[0204] The handling robot 11 is configured to move the wafers 3 contained in each cassette 2 .

[0205] Furthermore, the handling robot 11 is configured to handle the wafer carriers contained within the respective carrier cassettes 26 .

[0206] According to one implementation, the epitaxial reactor 4 comprises at least two systems 1. According to one implementation, the epitaxial reactor 4 comprises at least two reaction chambers.

[0207] According to one implementation, the epitaxial reactor 4 comprises two reaction chambers and two systems 1 .

[0208] Advantageously, one of the two systems 1 can be used to handle cassettes 2 of wafers 3 to be provided or that have been subjected to an epitaxial deposition process, while the other of the two systems 1 can be used to handle cassettes for supports 26 that house wafer holders.

[0209] According to one implementation, the handling robot 11 is positioned essentially interposed between the two systems 1 .

[0210] According to one implementation, the epitaxial reactor 4 includes a loading station 22 or "centering unit (CU)," also called a wafer support, for loading and centering the wafer 3 on a wafer holder.

[0211] According to one implementation, the loading station 22 is located on the handling robot 11. Hereinafter, the term "corresponding" means "directly accessible", in this case directly accessible by the handling robot 11.

[0212] According to one implementation, the loading station 22 is positioned interposed between the two systems 1 .

[0213] Advantageously, in an epitaxial reactor 4 configured in this way, the handling robot 11 can pick up a wafer holder from the respective support cassette 26 of the first system 1 and place the wafer holder on the loading station 22. Thereafter, the handling robot 11 can pick up a wafer 3 from the respective cassette 2 of the second system 1 and place the wafer 3 on the wafer holder previously placed on the loading station 22. In this way, the wafer supported by the wafer holder can be moved by the handling robot 11 and transported towards the reaction chambers of one or more epitaxial reactors 4.

[0214] Advantageously, in an epitaxial reactor 4 configured in this manner, the cassettes 2 for wafers 3 and the cassettes for supports 26 can be loaded onto the same system 1. The handling robot 11 can then pick up wafer holders from the respective support cassettes 26 in the system 1 and place the wafer holders on the loading station 22. The handling robot can then pick up wafers 3 from the respective cassettes 2 from the same system 1 and place the wafers 3 onto the wafer holders previously placed on the loading station 22. As an additional benefit, this configuration reduces the footprint of the epitaxial reactor 4.

[0215] According to one implementation, the epitaxial reactor 4 comprises a single system 1 .

[0216] According to one implementation, the epitaxial reactor 4 comprises two reaction chambers and a single system 1 .

[0217] According to one implementation, the handling robot 11 is positioned in line with the system 1 .

[0218] According to one implementation, the handling robot 11 is positioned equidistant between the two reaction chambers.

[0219] According to one implementation, the loading station 22 is positioned in line with the handling robot 11 and the system 1 .

[0220] According to one implementation, the epitaxial reactor 4 comprises one or more shelves 35 for wafer support devices. The number of shelves 35 can advantageously be selected to be equal to the number of reaction chambers in the reactor.

[0221] According to one implementation, each wafer support device shelf 35 is positioned in correspondence with a handling robot 11. Advantageously, the wafer support device shelves 35 may be vertically distributed above and below each other, ensuring space between the wafer support device shelves.

[0222] According to the implementation of the reactor 4, the system 1 comprises a bench 34. In this case, the handling robot 11, the load station 22 and two shelves 35 for wafer support devices may be positioned on the bench 34.

[0223] Advantageously, in an epitaxial reactor 4 configured in this manner, the cassettes 2 for wafers 3 and the wafer support devices on shelves 35 are accessible to the same handling robot 11. The latter can then pick up the wafer carrier devices from shelves 35 and place the wafer carriers on loading stations 22. The handling robot can then pick up wafers 3 from their respective cassettes 2 from system 1 and place the wafers 3 on the wafer holders previously placed on loading stations 22. As a further advantage, such a configuration reduces the footprint of the epitaxial reactor 4, allowing a single system 1 to be used to effectively manage reactors 4 having one, two, or more reaction chambers.

[0224] Naturally, those skilled in the art may make modifications or adaptations to the present invention without departing from the scope of the claims set out below.

[0225] Thus, the present invention includes all variations and combinations of the above implementations.

[0226] In the claims, it should be understood that the use of reference numerals used in the accompanying drawings is for ease of understanding only and does not imply any limitation to the specific form of construction shown. [Explanation of symbols]

[0227] 1. Wafer Cassette Loading and Unloading System 2 cassettes 3 wafers 4. Epitaxial reactor 5. Carousel Platform 6 Carousel Actuator 7 Carousel Axis 8 Support Platform 9 Rotation Axis 10 Rotary Actuator 11 Handling robot 12 gears 13 sprockets 14 drive wheels 15 Drive gear 16 Carousel Shaft 17 Carousel Platform Upper Wall 18 Carousel Platform Lower Wall 19 Reflector element 20 reflective surface 21 Detection System 22 Loading Station 23 Front of the cassette 24 Rear of the cassette 25 Secondary rotating shaft 26 Support cassette 27 Primary rotating shaft 28 Idler Wheel 29 Idler wheel rotating shaft 30 Stator 31 Second sprocket 32 Coaxial shaft assembly 33 Ball bearings 34 Bench 35 Shelf for wafer support device 36 Wafer cassette non-contact detection assembly 37 First Movable Element 38 Operating mechanism 39 source 40 sensors 41 Reflector 42 Guides and / or spacers 43 Second Movable Element 44 Opening 45 spring preload element 46 Cavity 47 Elastic Potential Energy Device 48 Convex

Claims

1. A system (1) for loading and unloading wafer (3) cassettes (2) for an epitaxial reactor (4), comprising: a carousel platform (5) configured to transport at least one cassette (2), the carousel platform (5) being pivotally connectable to said epitaxial reactor (4) about a carousel axis (7); a carousel actuator (6) configured to drive the rotation of the carousel platform (5) about the carousel axis (7) relative to the epitaxial reactor (4); at least one support platform (8) adapted to support at least one cassette (2), wherein the at least one support platform (8) is pivotally connected to the carousel platform (5) about an axis of rotation (9) different from the carousel axis (7); a rotation actuator (10) configured to actuate the rotation of at least one support platform (8) about said axis of rotation (9) relative to said carousel platform (5); a carousel shaft (16) extending along the carousel axis (7), coaxial with the carousel axis (7), and configured to receive rotational motion from the carousel actuator (6); a primary rotary shaft (27) extending along the carousel axis (7) and coaxial with the carousel axis (7) and the carousel shaft (16), configured to receive the rotary movement of the rotary actuator (10); A system (1) comprising:

2. 2. The system (1) according to claim 1, wherein the primary rotating shaft (27) is hollow and has all or part of the carousel shaft (16) rotatably connected thereto.

3. 3. A system (1) according to claim 1 or 2, comprising a coaxial shaft assembly (32), said coaxial shaft assembly (32) comprising at least one stator (30), said primary rotating shaft (27) and said carousel shaft (16) being wholly or partly contained within said stator (30).

4. 2. The system (1) of claim 1, further comprising a gear (12) connecting the primary rotating shaft (27) with at least one support platform (8), the gear (12) being configured to effect rotation of the support platform (8) relative to the carousel platform (5) around the rotation axis (9).

5. a sprocket (13) rotatably connected to the carousel platform (5), the sprocket (13) being positioned coaxially with the carousel axis (7); The system (1) includes at least one drive wheel (14) mounted on at least one support platform (8); The drive wheel (14) is positioned coaxially with the rotation axis (9), The drive wheel (14) directly engages the sprocket (13) or the drive wheel (14) connects to the sprocket (13) through one or more idler wheels (28); 2. The system (1) of claim 1, wherein the rotary actuator (10) is operatively connected to the sprocket (13) via the primary rotary shaft (27) to initiate rotation of the sprocket (13) about the carousel axis (7) relative to the carousel platform (5).

6. the rotary actuator (10) includes a drive wheel (15) geared with a second sprocket (31) other than the sprocket (13); the second sprocket (31) is attached to the primary rotating shaft (27) and is integral with the sprocket (13); 6. The system (1) according to claim 5, wherein the drive wheel (15) is configured to rotate the sprocket (13) around the carousel axis (7).

7. the carousel shaft (16) is attached to the carousel platform (5) and is interposed between the carousel actuator (6) and the carousel platform (5), the carousel shaft (16) being configured to transmit a rotational motion to the carousel platform (5) so as to drive the rotation of the carousel platform (5) about the carousel axis (7); The carousel shaft (16) extends through the sprocket (13); Optionally, the carousel shaft (16) is positioned on an opposite side of the support platform (8) relative to the carousel platform (5).

8. each support platform (8) comprising a respective secondary rotation shaft (25) extending coaxially with said respective rotation axis (9); the secondary rotating shaft (25) is attached to the support platform (8) and to each drive wheel (14); 8. The system (1) according to claim 7, wherein the secondary rotating shaft (25) extends through the carousel platform (5).

9. the primary rotary shaft (27) is attached to the sprocket (13) and the second sprocket (31) and is interposed between the rotary actuator (10) and the carousel platform (5); the primary rotating shaft (27) is configured to transmit rotational motion to a gear (12) so as to drive rotation of the secondary rotating shaft (25) about the rotation axis (9); 7. The system (1) of claim 6, wherein optionally, the primary rotating shaft (27) is positioned on an opposite side of the support platform (8) relative to the carousel platform (5).

10. The carousel actuator (6) is a servo motor, and / or the rotary actuator (10) is a servo motor.

11. three support platforms (8) rotatably connected to the carousel platform (5) about respective different axes of rotation (9); the respective rotation axes (9) are parallel to each other and to the carousel axis (7); Optionally, said support platforms (8) are positioned on said carousel platform (5) at equal angular distances from each other; Optionally, the drive wheels (14) of each of the plurality of support platforms (8) are geared to the same sprocket (13); Optionally, said carousel platform (5) is a plate coaxial with said carousel axis (7), and said support platform (8) is a plate; Optionally, at least one support platform (8) is positioned on the opposite side of the drive wheel (14) relative to the carousel platform (5).

12. the carousel platform (5) comprises an upper wall (17) and an opposite lower wall (18), the upper wall (17) of the carousel platform (5) facing at least one support platform (8); the system (1) comprises a reflector element (19) with at least one reflective surface (20) positioned parallel to the carousel axis (7), the reflector element (19) is connected to the upper wall (17) of the carousel platform (5) at the carousel axis (7), the reflector element (19) extending along the carousel axis (7) opposite the lower wall (18) of the carousel platform (5); Optionally, the reflector (19) comprises a number of reflective surfaces (20) equal to the number of said support platforms (8) connected to the same said carousel platform (5); Optionally, each reflective surface (20) extends in a plane parallel to the carousel axis (7) and is positioned in line with a respective support platform (8) so as to face the respective support platform (8).

13. an assembly (36) for contactless detection of the presence of a wafer (3) cassette (2) located within a support platform housing (8), said assembly comprising: a first movable element (37) intended to assume at least a first predetermined position in the absence of said cassette and at least a second predetermined position when said cassette is properly positioned within said support platform housing; an actuation mechanism (38) intended to contact the cassette and, upon said contact, to move the first movable element from the first predetermined position to the second predetermined position; a source of electromagnetic radiation (39); a sensor (40) intended to detect said electromagnetic radiation; a reflector (41) connected to or integrated with said first movable element; Equipped with 2. The system (1) of claim 1, wherein the source, the sensor, and the reflector are arranged together such that, at least when the first movable element is located at the second predetermined position, the reflector receives the electromagnetic radiation emitted from the source and reflects the received electromagnetic radiation onto the sensor.

14. 14. The system (1) according to claim 13, wherein the actuation mechanism (38) of the assembly (36) is integrated into at least one support platform (8), and preferably the first movable element (37) is connected to or integrated with the support platform (8).

15. 15. The system (1) according to claim 13 or 14, wherein the source (39) is a source of collimated electromagnetic radiation, preferably a visible or infrared emitting laser.

16. 14. The system (1) of claim 13, wherein the secondary rotating shaft (25) is hollow and the first movable element (37) is a shaft extending within the secondary rotating shaft (25).

17. 14. The system (1) according to claim 13, wherein the assembly (36) comprises at least one guide and / or at least one spacer (42) for positioning the first movable element (37) in the secondary rotating shaft (25).

18. 18. The system (1) of claim 17, wherein the assembly (36) is preloaded and comprises at least one elastic potential energy device (47) adapted to maintain the first movable element (37) in the first predetermined position in the absence of a cassette.

19. the actuation mechanism (38) is a push button mechanism; a cavity (46) located within one or more support platforms (8), said cavity (46) having an opening (44) located within a cassette housing of said support platform (8); a second movable element (43), optionally resilient, located in said opening (44) and adapted to be subjected to pressure under the weight of a cassette located in said opening (44) and in response thereto to actuate said first movable element (37) and move said first movable element (37) from said first predetermined position to said second predetermined position; The system (1) according to claim 13, comprising:

20. at least one reaction chamber; a system (1) for loading and unloading wafer (3) cassettes (2) for at least one epitaxial reactor (4) according to claim 1; An epitaxial reactor (4) comprising: Optionally, said epitaxial reactor (4) comprises a handling robot (11) configured to handle said wafers (3) contained in each said cassette (2).

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