Methods and apparatus for thermal uniformity

Abstract

To provide methods and apparatus for thermal uniformity.SOLUTION: Various embodiments of the present technology may provide a gas distribution system having a top portion and a bottom portion. The top portion contains a cooling ring with a channel, a first heating ring above a showerhead region, a second heating element along an edge of the top portion, and a third heating element along an edge of the top portion. The bottom portion contains a plurality of heating elements arranged along the perimeter of the bottom portion, radially outwards from the showerhead region.SELECTED DRAWING: Figure 2

Description

[Technical Field]

[0001] The present disclosure relates generally to methods and apparatus for thermal uniformity. More specifically, the present disclosure relates to a gas distribution plate having a cooling device, multiple heating zones, and a thermal insulation layer, and a showerhead plate having multiple heating elements at the edge of the showerhead plate. [Background technology]

[0002] Thermal uniformity in reaction chambers used in semiconductor manufacturing is a factor that affects the quality and thickness of films deposited on wafers within the reaction chamber. Therefore, it may be desirable to heat and cool different regions of the reaction chamber to achieve a desired thermal profile. Summary of the Invention

[0003] Various embodiments of the present technology may provide a gas distribution system having a top and a bottom. The top includes a cooling ring with channels, a first heating ring above a showerhead region, a second heating element along an edge of the top, and a third heating element along an edge of the top. The bottom includes multiple heating elements arranged radially outward from the showerhead region along an outer periphery of the bottom.

[0004] According to one aspect, an apparatus comprises: a top and a bottom surface; an inlet extending between the top and bottom surfaces; an exhaust plenum surrounding the inlet; and a thermal system comprising: a first heating element embedded within the top surface and arranged in a circular pattern concentric with the inlet, a second heating element arranged along an edge of the top surface, and a third heating element along the edge of the top surface opposite the second heating element; a top surface comprising: a cooling channel disposed on a top surface of the top surface and concentric with the first heating element and positioned between the first, second, and third heating elements; and a bottom surface disposed adjacent the top surface and comprising: a plurality of first through-holes in fluid communication with the inlet, a plurality of second through-holes in fluid communication with the exhaust plenum, and a plurality of fourth heating elements embedded along an outer edge of the bottom surface and arranged equidistant from each other.

[0005] In one embodiment, each of the second and third heating elements is arc-shaped.

[0006] In one embodiment, each of the fourth heating elements comprises a resistive cartridge heater and has a length in the range of 25-35 mm and a diameter in the range of 6-7 mm.

[0007] In one embodiment, each of the second and third heating elements is positioned directly above and in horizontal alignment with the exhaust plenum.

[0008] In one embodiment, the first heating element is located directly above the inlet plenum.

[0009] In one embodiment, the inlet comprises a first opening in the top surface having a first diameter and a second opening in the bottom surface having a second diameter, the second diameter being larger than the first diameter.

[0010] In one embodiment, the top further includes a contact area around the second opening of the inlet, the contact area being defined by a bottom surface of the top that directly contacts the top surface of the bottom and is directly adjacent to and radially outward from the second opening of the inlet.

[0011] In one embodiment, the top further comprises a groove in the bottom surface of the top radially outward from the contact point and around the inlet.

[0012] In one embodiment, the cooling channel is positioned directly above the contact area and is configured to carry a cooling fluid.

[0013] In one embodiment, the plurality of fourth heating elements includes at least eight heating elements.

[0014] In another aspect, an apparatus comprises a top portion comprising: a first top surface and a first bottom surface; an inlet including a first opening in the top surface and a second opening in the bottom surface; an exhaust plenum surrounding the inlet; and a thermal system comprising a plurality of arc-shaped heating elements embedded within the top portion and disposed along an edge of the top surface of the top portion; cooling channels disposed on the first top surface; and a bottom portion disposed adjacent to the top portion and comprising: a second top surface and a second bottom surface; a plurality of inlet through-holes in fluid communication with the inlet plenum extending between the second top surface and the second bottom surface; a plurality of exhaust through-holes in fluid communication with the exhaust plenum; and a plurality of fourth heating elements embedded along an outer edge of the bottom and disposed radially outward from the plurality of exhaust through-holes and equidistant from each other.

[0015] In one embodiment, the thermal system comprises a first heating element arranged in a circular pattern concentric with the first opening of the inlet, a second heating element arranged along the edge of the top, and a third heating element opposite the second heating element along the edge of the top.

[0016] In one embodiment, the first opening in the top surface has a first diameter and the second opening in the bottom surface has a second diameter, the second diameter being larger than the first diameter.

[0017] In one embodiment, the upper portion further comprises a contact area around the second opening of the inlet plenum, the contact area being defined by a first bottom surface that directly contacts the second upper surface and is radially outwardly from the inlet, and a groove in the first bottom surface that is radially outwardly from the contact point and surrounds the inlet.

[0018] In one embodiment, the cooling channels are disposed directly above and horizontally aligned with the contact area.

[0019] In yet another aspect, a system is a thermal system including a first top surface, a first bottom surface including a contact area, an inlet plenum around a first opening in the first top surface and a second opening in the first bottom surface, the contact area being radially outward from the second opening, an exhaust plenum around the inlet, and a first heating element arranged in a circular pattern in a first groove in the first top surface, a second heating element arranged in a second groove in the first top surface and along an edge of the gas channel plate, a third heating element arranged in the second groove and along an edge of the gas channel plate opposite the second heating element, and a third groove in the first bottom surface, the third groove being radially outward from the second opening of the inlet plenum. a gas channel plate having a cooling channel disposed concentrically with the first heating element, the cooling channel disposed directly above the first heating element and horizontally aligned with the first heating element; a showerhead plate adjacent to the gas channel plate and having a second top surface and a second bottom surface, a plurality of inlet through-holes fluidly communicating with an inlet plenum, a plurality of exhaust through-holes fluidly communicating with an exhaust plenum, and a plurality of fourth heating elements embedded along an outer edge of the bottom surface and positioned equidistant from each other and radially outward from the exhaust through-holes, wherein the second top surface of the showerhead directly contacts the first bottom surface at a contact region on the gas channel plate; a cooling channel disposed concentrically with the first heating element, directly above the contact region and horizontally aligned with the contact region; and a reaction chamber disposed below the showerhead plate.

[0020] In one embodiment, each of the second and third heating elements is arc-shaped.

[0021] In one embodiment, the second heating element has a first wattage and the third heating element has a second wattage that is less than the first wattage.

[0022] In one embodiment, the system further comprises a secondary cooling ring disposed along an edge of the showerhead plate between the showerhead plate and the reaction chamber, the secondary cooling ring comprising channels configured to flow a liquid.

[0023] In one embodiment, each of the fourth heating elements comprises a resistive cartridge heater and has a length in the range of 25-35 mm and a diameter in the range of 6-7 mm, and the plurality of fourth heating elements includes at least eight heating elements.

[0024] The present technology may be more fully understood by reference to the detailed description in light of the following illustrative drawings, in which like elements and steps are designated with like reference numerals throughout. [Brief explanation of the drawings]

[0025] [Figure 1] 1 representatively illustrates a system in accordance with an embodiment of the present technology; [Figure 2] 1 is a cross-sectional view of a portion of a reactor in accordance with an embodiment of the present technique; [Figure 3] FIG. 1 is a top view of a gas channel plate in accordance with an embodiment of the present technique; [Figure 4] FIG. 10 is a bottom view of a gas channel plate in accordance with an embodiment of the present technique. [Figure 5] FIG. 1 is a top view of a gas channel plate in accordance with an embodiment of the present technique; [Figure 6] FIG. 10 is a top view of a showerhead plate in accordance with an embodiment of the present technique. [Figure 7] 1 is a perspective view of a cooling ring in accordance with an embodiment of the present technique; [Figure 8] 1 is a cross-sectional view of a cooling ring in accordance with an embodiment of the present technique; DETAILED DESCRIPTION OF THE INVENTION

[0026] The present technology may be described in terms of functional block components and various processing steps. These functional blocks may be realized by any number of components configured to perform the specified functions and achieve various results. For example, the present technology may employ various gas lines, valves, controllers, reaction chambers, vessels, and susceptors.

[0027] 1 , exemplary system 100 may include a reactor 105 configured to perform a process on a processed object, such as a substrate 150 (e.g., a wafer). For example, reactor 105 may be configured to perform heating, deposition, etching, polishing, ion implantation, and / or other processes on the processed object. In some embodiments, reactor 105 may be configured to perform transfer, vacuum sealing, and pumping functions. In some embodiments, reactor 105 may perform an atomic layer deposition (ALD) process or a chemical vapor deposition (CVD) process.

[0028] In an exemplary embodiment, the reactor 105 may comprise a reaction chamber 115 that includes a reaction space 155 above and / or around the substrate 150. For example, the reaction chamber 115 may comprise sidewalls and a bottom coupled to the sidewalls that form an enclosed volume.

[0029] In various embodiments, the system 100 may further include a substrate mounting unit disposed within the reaction chamber 115 of the reactor 105. The substrate mounting unit may include a susceptor 145 for supporting the substrate 150 and a heater (not shown) for heating the substrate 150 supported by the susceptor 145. The heater may be embedded within the susceptor 145. The substrate mounting unit may further include a pedestal 180 for supporting the susceptor 145. For loading / unloading the substrate, the substrate mounting unit may be configured to be vertically (up and down) movable by being connected to a drive unit (not shown). The susceptor 145 may be disposed within or adjacent to the reaction space 155. For example, the susceptor 145 may be arranged to position the substrate 150 within the reaction space 155.

[0030] In various embodiments, system 100 may further include a vessel 135 configured to contain a chemical (i.e., a precursor). The vessel 135 may be configured to hold a solid or liquid chemical and may further be configured to convert the solid or liquid to a vapor. The vessel 135 may be coupled to the gas distribution system 110. For example, system 100 may further include various gas conduits and / or valves for flowing the vapor from the vessel 135 into the gas distribution system 110.

[0031] In various embodiments, and with reference to FIGS. 1 and 2 , the reactor 105 may further include a gas distribution system 110 for delivering vapor into the reaction chamber 115. In an exemplary embodiment, the gas distribution system 110 is disposed above the susceptor 145. The gas distribution system 110 may include a top portion 120 (i.e., a gas channel plate) and a bottom portion 125 (i.e., a showerhead plate). The top portion 120 and the bottom portion 125 may be in direct contact with each other. For example, the top portion 120 may include a first surface 250 and an opposite, parallel second surface 255, and the bottom portion 125 may include a first surface and an opposite, parallel second surface 260. A surface of the top portion 120 (e.g., second surface 255) may be in direct contact with a surface of the bottom portion 125 (e.g., first surface 262). In some embodiments, the first portion 120 and the second portion 125 may be coupled together by fasteners (not shown), such as screws or the like.

[0032] In various embodiments, the gas distribution system 110 may be disposed adjacent to the reaction chamber 115. For example, the gas distribution system 110 may be disposed on a sidewall of the reaction chamber 115 opposite the bottom of the reaction chamber 115. In some embodiments, the gas distribution system 110 may be fixed to the sidewall, while in other cases the gas distribution system 110 may simply rest on the sidewall of the reaction chamber 115. In various embodiments, the gas distribution system 110, together with the sidewall of the reaction chamber 115, forms an enclosed space that includes the reaction space 155.

[0033] In some embodiments, the system 100 may further include a spacer plate 225 disposed between the gas distribution system 110 and the reaction chamber 115 .

[0034] 2-4, the upper portion 120 may include an inlet plenum 200 fluidly connected to a valve manifold 240. In various embodiments, the valve manifold 240 may be connected to the vessel 135, for example, via a gas line, and the inlet plenum 200 may deliver vapor into the reaction space 155. The inlet plenum 200 may include an inlet opening 300 having a diameter D1 and an outlet opening 400 having a diameter D2, where D2 is greater than D1.

[0035] In various embodiments, the upper portion 120 may further comprise an exhaust plenum 270 coupled to the exhaust system 140. The exhaust plenum 270 may comprise an inlet at the second surface 255 and an outlet fluidly coupled to the exhaust system 140. For example, gas may flow from the plenum 270 through the respective outlets and into the exhaust system 140. In various embodiments, the exhaust plenum 270 may be disposed concentrically with the inlet plenum 200. For example, the exhaust plenum 270 may have a ring shape that surrounds the inlet plenum 200 and has a larger diameter than the inlet plenum 200.

[0036] In various embodiments, the upper portion 120 may include a thermal system. For example, the thermal system may include a first heating element 215, a second heating element 233, and a third heating element 220. Each heating element may be embedded within the upper portion 120. For example, the first heating element 215 may be disposed in a groove on the first surface 250 of the upper portion 120. The first heating element 215 may be formed in a substantially continuous ring shape and have a diameter D3 and a radius R1 (from the center point 213) in the range of 80 mm to 115 mm, for example, a radius of 97 mm. The first heating element 215 may be disposed directly above the inlet plenum 200 and concentric with the center point 213 of the inlet plenum 200 and the inlet opening 300. The first heating element 215 may include a resistance-type heater or any other suitable heating element or heating system.

[0037] In various embodiments, second heating element 233 may be disposed along edge 305 of top 120 and recessed within the top. For example, second heating element 233 may be disposed in a groove along outer edge 305. In an exemplary embodiment, second heating element 233 may have an arc shape that spans a first half of top 120. Second heating element 233 may comprise a resistance-type heater or any other suitable heating element or heating system. In an exemplary embodiment, second heating element 233 is a single heating element configured to operate at a first wattage and a first temperature.

[0038] In various embodiments, the third heating element 220 may be disposed along an edge of the top 120 opposite the second heating element 233. The third heating element 220 may be disposed in a groove along the outer edge 305 opposite the second heating element 233. In an exemplary embodiment, the third heating element 220 may have an arc shape extending across the second half of the top 120. The third heating element 215 may comprise a resistance-type heater or any other suitable heating element or heating system. In an exemplary embodiment, the third heating element 220 is a single heating element configured to operate at a second wattage and a second temperature. The second wattage may be higher than the first wattage, and thus the third heating element 220 may be configured to operate at a higher temperature than the second heating element 233.

[0039] In various embodiments, the second heating element 233 and the third heating element 220 may be positioned directly above the exhaust plenum 270 and radially outward from the first heating element 215, the cooling channels 210, and the showerhead region 600 (FIG. 6). In an exemplary embodiment, the second heating element 233 and the third heating element 220 may have a radius R2 ranging from 180 mm to 240 mm from the center point 213, for example, 200 mm.

[0040] In an alternative embodiment, and referring to FIG. 5 , the thermal system may include multiple heating rods 500, such as heating rods 500(a)-500(o) disposed along edge 305 of top portion 120. In this embodiment, heating rods 500(a)-500(o) may be embedded within top portion 120. For example, heating rods 500 may be disposed within cavities along first surface 250 of top portion 120. In this embodiment, each heating rod may be controlled independently of the other heating rods. Alternatively, two or more adjacent heating rods (e.g., 500(a) and 500(b)) may be controlled independently of two or more different adjacent heating rods (e.g., 500(m) and 500(n)).

[0041] 2-4 , the top portion 120 may further include a contact area 235 directly adjacent the outlet opening 400 of the inlet plenum 200. The second surface 255 of the top portion 120 may include the contact area 235, which may directly contact the first surface 262 of the bottom portion 125. In other words, the contact area is defined by the bottom surface 255 of the top portion 120, which directly contacts the top surface 262 of the bottom portion 125 and is directly adjacent to and radially outward from the outlet opening 400 of the inlet plenum 200.

[0042] In various embodiments, top portion 120 may further include a channel 275 in second surface 255. In an exemplary embodiment, channel 275 may be circular in shape and may surround outlet opening 400 of inlet plenum 200. Channel 275 may be disposed between contact area 235 and exhaust plenum 270.

[0043] In various embodiments, and with reference to FIGS. 2, 3, and 5, the system 100 may further include a cooling ring 205. The cooling ring 205 may be attached to the first surface 250 of the upper portion 120. The cooling ring 205 may be formed from a metallic material, such as elemental aluminum, stainless steel, or any other metal or metal alloy. The cooling ring 205 may include a channel 210 disposed within the ring 205 and configured to channel a liquid, such as water or any other suitable coolant, from the first end 520 to the second end 525. In an exemplary embodiment, the cooling ring 205 may have a circular shape, such as a C-shape or an arc-shape. In an exemplary embodiment, the cooling ring 205 may be positioned directly above and vertically aligned with the contact region 235. For example, the channels 210 and the contact areas 235 may be aligned along an imaginary vertical line 239, and the channels 210 and the contact areas 235 may be disposed at substantially equal distances from the central axis 237. In an exemplary embodiment, the diameter of the cooling ring 205 may be substantially the same as (e.g., + / −5 mm) the diameter D2 of the outlet opening 400 of the inlet plenum 200.

[0044] In various embodiments, the bottom 125 may include a plurality of inlet through-holes 230 extending through the first surface 262 and the second surface 260. The plurality of inlet through-holes 230 may include approximately 1,000 to 1,200 through-holes. The plurality of inlet through-holes 230 may be disposed in a central region 600 (FIG. 6, also referred to as the showerhead region) of the bottom 125. The inlet plenum 200 may be in fluid communication with the plurality of inlet through-holes 230. For example, steam flowing from the vessel 135 into the inlet plenum 200 may continue to flow through the plurality of through-holes 230. The plurality of inlet through-holes 230 may be in fluid communication with the reaction space 155. For example, steam may flow into the reaction space 155 through the plurality of inlet through-holes 230.

[0045] In various embodiments, and referring to FIG. 6 , the bottom 125 may further include a plurality of exhaust through-holes 245, each having a first opening in the first surface 262 of the bottom 125 and a second opening adjacent to the reaction space 155. For example, the plurality of exhaust through-holes 245 may be disposed radially outward from the central region 600. Further, the first opening of the plurality of second exhaust through-holes 245 may be positioned to be in fluid communication with the exhaust plenum 270. In particular, the first opening of the plurality of exhaust through-holes 245 may be aligned with an inlet of the exhaust plenum 270. In an exemplary embodiment, each exhaust through-hole 245 may be oriented vertically within the bottom 125.

[0046] In various embodiments, and with reference to FIGS. 2 and 6 , the base 125 may further include a plurality of fourth heating elements 280. The plurality of fourth heating elements 280 may be inserted into holes along the outer edge 605 of the base 125. The fourth heating elements 280 may be arranged at equal arc lengths around the base 125. In various embodiments, each of the fourth heating elements 280 may comprise a resistive cartridge heater and have a length in the range of 25-35 mm and a diameter in the range of 6-7 mm. In various embodiments, the plurality of fourth heating elements includes at least four heating elements, particularly at least eight heating elements.

[0047] In various embodiments, and with reference to FIGS. 7 and 8 , the system 100 may further include a secondary cooling ring 700. The secondary cooling ring 700 may be disposed between the bottom portion 125 and the spacer plate 225 along the outer edges of the spacer plate 225 and the bottom portion 125. In an exemplary embodiment, the secondary cooling ring 700 may include a first part 705 and a second part 710 attached to one another, for example, by welding. The first part 705 may include a groove 800 formed along a downward-facing surface. The second part 710 may be attached to the downward-facing surface. The groove 800 in the second part 710 and the first part 705 may form an enclosed channel 805 configured to conduct a liquid, such as water. In an exemplary embodiment, the enclosed channel 805 may have a height ranging from 2 mm to 5 mm and a width ranging from 3 mm to 7 mm. In various embodiments, the secondary cooling ring 700 may be formed from elemental aluminum, stainless steel, or any other suitable metal or metal alloy.

[0048] 1-8, system 100 may further include a controller 190 configured to control the operation of various components within the system, such as the thermal system, particularly first heating element 215, second heating element 233, third heating element 220, plurality of fourth heating elements 280, and / or plurality of heating rods 500(a)-500(o). For example, controller 190 may be electrically and / or interchangeably coupled to first heating element 215, second heating element 233, third heating element 220, plurality of fourth heating elements 280, and / or plurality of heating rods 500(a)-500(o), and controller 190 may send control signals to each indicative of a desired temperature.

[0049] The controller 190 may also receive information, data, or signals from other components, such as temperature data / signals from a temperature sensor (not shown), and the controller 190 may operate the heating elements (e.g., the first heating element 215, the second heating element 233, the third heating element 220, the plurality of fourth heating elements 280, and / or the plurality of heating rods 500(a)-500(o)) based on the measured temperature from the temperature sensor. For example, the controller 190 may receive a measured temperature from a temperature sensor and determine whether the measured temperature is at a desired temperature or within a desired temperature range. If the measured temperature is not at the desired temperature or temperature range, the controller 190 may send a signal to one or more heating elements (e.g., the first heating element 215, the second heating element 233, the third heating element 220, the plurality of fourth heating elements 280, and / or the plurality of heating rods 500(a)-500(o)).

[0050] In various embodiments, the controller 190 may also initiate and / or control the flow of liquid through the channel 210 of the cooling ring 205 and / or the enclosed channel 805 of the secondary cooling ring 700, for example, via a valve (not shown). For example, the controller 190 may determine that the measured temperature is not within a desired range and initiate a control signal to adjust the flow of liquid to maintain the desired temperature.

[0051] In the foregoing description, the present technology has been described with reference to certain exemplary embodiments. The specific examples shown and described are illustrative of the present technology and its best mode and are not intended to limit the scope of the present technology in any way. Also, for the sake of brevity, conventional manufacturing, connection, preparation, and other functional aspects of the present methods and systems may not be described in detail. Furthermore, connecting lines shown in the various figures are intended to represent example functional relationships and / or steps between the various elements. Many alternative or additional functional relationships or physical connections may exist in an actual system.

[0052] The present technology has been described with reference to specific exemplary embodiments. However, various modifications and changes can be made without departing from the scope of the present technology. The description and drawings are to be considered in an illustrative manner, not restrictive, and all variations are intended to be included within the scope of the present technology. Thus, the scope of the present technology should be determined not only by the specific examples described above, but also by the general embodiments described and their legal equivalents. For example, steps described in an embodiment of a method or process may be performed in any order unless otherwise explicitly specified, and are not limited to the explicit order presented in the particular example. Furthermore, the components and / or elements described in an embodiment of any apparatus may be assembled or operably configured in various forms to produce substantially the same results as the present technology, and therefore are not limited to the specific configurations described in the particular example.

[0053] Although benefits, other advantages, and solutions to problems have been described above with reference to specific embodiments, any benefit, advantage, solution to a problem, or any element that may cause or make more pronounced any particular benefit, advantage, or solution, is not to be construed as a critical, required, or essential feature or component.

[0054] The terms "comprises," "comprising," or any variation thereof are intended to indicate a non-limiting inclusion, such that a process, method, article, composition, or apparatus comprising the listed elements includes not only those elements described, but may also include other elements not expressly described or inherent to such process, method, article, composition, or apparatus. In addition to those not specifically listed, other combinations and / or modifications of the above-described structure, arrangement, application, proportions, elements, materials, or components used in the practice of the present technology may be changed or otherwise specifically adapted to particular environments, manufacturing specifications, design parameters, or other operating requirements without departing from the general principles thereof.

[0055] The present technology has been described above with reference to exemplary embodiments. However, changes and modifications may be made to the exemplary embodiments without departing from the scope of the technology. These and other changes or modifications are intended to be included within the scope of the technology, as expressed in the following claims. [Explanation of symbols]

[0056] 100 systems 105 Reactor 110 Gas Distribution System 115 Reaction Chamber 120 Upper 125 Bottom 135 Container 140 Exhaust System 145 Susceptor 150 boards 155 Reaction Space 180 Pedestal 190 Controller 200 Entrance Plenum 205 Cooling Ring 210 Cooling Channel 213 Center point 215 First heating element 220 Third Heating Element 225 spacer plate 230 Entrance through hole 233 Second Heating Element 235 Contact area 237 Central axis 239 Virtual Vertical Line 240 Valve Manifold 245 Exhaust through hole 250 First Surface 255 Second Surface 260 Second Surface 262 First Surface 270 Exhaust Plenum 275 channels 280 Fourth Heating Element 300 Inlet opening 305 En 400 outlet opening 500 Heating Rod 520 First Edge 525 Second Edge 600 central area, shower head area 605 outer edge 700 Secondary cooling ring 705 First Part 710 Second Part 800 groove 805 channel

Claims

1. The upper part, Top and bottom surfaces, an inlet extending between the top surface and the bottom surface; an exhaust plenum surrounding the inlet; and a thermal system embedded within the upper portion, the thermal system comprising: a first heating element arranged in a circular pattern concentric with said inlet; a second heating element disposed along an edge of the top; and a top including a third heating element along an edge of the top opposite the second heating element; a cooling channel disposed on the upper surface of the upper portion, concentric with the first heating element, and disposed between the first heating element and the second and third heating elements; a bottom portion disposed adjacent to and directly below the top portion, a plurality of first through-holes in fluid communication with the inlet; a plurality of second through-holes in fluid communication with the exhaust plenum; and a base comprising a plurality of fourth heating elements embedded along an outer edge of the base and spaced equidistant from one another.

2. The apparatus of claim 1 , wherein each of the second and third heating elements is arc-shaped.

3. 10. The apparatus of claim 1, wherein each of the fourth heating elements comprises a resistive cartridge heater and has a length in the range of 25 to 35 mm and a diameter in the range of 6 to 7 mm.

4. The apparatus of claim 1 , wherein the second heating element and the third heating element are each positioned directly above and in horizontal alignment with the exhaust plenum.

5. The apparatus of claim 1 , wherein the first heating element is located directly above the inlet.

6. 10. The apparatus of claim 1, wherein the inlet comprises a first opening in the top surface having a first diameter and a second opening in the bottom surface having a second diameter, the second diameter being larger than the first diameter.

7. 7. The apparatus of claim 6, wherein the top further comprises a contact area surrounding the second opening of the inlet, the contact area being defined by the bottom surface of the top, the bottom surface of the top directly contacting an upper surface of the bottom, directly adjacent to the second opening of the inlet, and radially outward from the second opening of the inlet.

8. The apparatus of claim 7 , wherein the top further comprises a groove in the bottom surface of the top radially outward from the contact area and surrounding the inlet.

9. The apparatus of claim 7 , wherein the cooling channel is positioned directly above the contact area and configured to carry a cooling fluid.

10. The apparatus of claim 1 , wherein the plurality of fourth heating elements comprises at least eight heating elements.

11. The upper part, a first top surface and a first bottom surface; an inlet including a first opening in the first top surface and a second opening in the first bottom surface; an exhaust plenum surrounding the inlet; and a top including a thermal system including a plurality of arc-shaped heating elements embedded within the top and disposed along an edge of the first top surface of the top; a cooling channel disposed on the first upper surface; a bottom portion disposed adjacent to the top portion, a second top surface and a second bottom surface; a plurality of inlet through-holes in fluid communication with the inlet extending between the second top surface and the second bottom surface; a plurality of exhaust through-holes in fluid communication with the exhaust plenum; and a base including a plurality of fourth heating elements embedded along an outer edge of the base and positioned radially outward from the plurality of exhaust through-holes and equidistant from one another.

12. the thermal system first heating elements arranged in a circular pattern concentric with the first opening of the inlet; a second heating element disposed along an edge of the top; and 12. The device of claim 11, further comprising a third heating element along an edge of the top opposite the second heating element.

13. 12. The device of claim 11, wherein the first opening in the first top surface has a first diameter and the second opening in the first bottom surface has a second diameter, the second diameter being larger than the first diameter.

14. The upper portion is a contact area surrounding the second opening of the inlet, the contact area being defined by the first bottom surface directly contacting the second top surface and directly radially outward from the inlet; The apparatus of claim 11 , further comprising: a groove in the first bottom surface radially outward from the contact area and surrounding the inlet.

15. The apparatus of claim 14 , wherein the cooling channel is disposed directly above and in horizontal alignment with the contact area.

16. 1. A gas channel plate comprising: The first upper surface, a first bottom surface including a contact area; an inlet plenum including a first opening in the first top surface and a second opening in the first bottom surface, the contact area being radially outward from the second opening; an exhaust plenum surrounding the inlet plenum; and 1. A thermal system comprising: first heating elements arranged in a circular pattern within first grooves in the first top surface; a second heating element disposed in a second groove in the first upper surface and along an edge of the gas channel plate; a third heating element disposed within the second groove and along an edge of the gas channel plate opposite the second heating element; and a gas channel plate comprising a thermal system including a third groove in the first bottom surface radially outward from the second opening of the inlet plenum; a showerhead plate adjacent to the gas channel plate, a second top surface and a second bottom surface; a plurality of inlet through-holes in fluid communication with the inlet plenum; a plurality of exhaust through-holes in fluid communication with the exhaust plenum; and a plurality of fourth heating elements embedded along an outer edge of the showerhead plate, spaced equidistant from one another, and radially outward from the exhaust through-holes; a showerhead plate, the second top surface of the showerhead plate directly contacting the first bottom surface at the contact region on the gas channel plate; a cooling channel disposed concentrically with the first heating element and directly above and horizontally aligned with the contact area; a reaction chamber disposed below the showerhead plate.

17. 17. The system of claim 16, wherein each of the second and third heating elements is arc-shaped.

18. 17. The system of claim 16, wherein the second heating element has a first wattage and the third heating element has a second wattage that is less than the first wattage.

19. 17. The system of claim 16, further comprising a secondary cooling ring disposed along an edge of the showerhead plate between the showerhead plate and the reaction chamber, the secondary cooling ring comprising channels configured to flow a liquid.

20. each of the fourth heating elements comprises a resistive cartridge heater and has a length in the range of 25 to 35 mm and a diameter in the range of 6 to 7 mm; The system of claim 16 , wherein the plurality of fourth heating elements comprises at least eight heating elements.

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