Waste gas treatment facility, system and method for high-flow combustible waste gas

Abstract

The present application provides a waste gas treatment facility, system and method for high flow rate combustible waste gases.SOLUTION: The waste gas treatment device comprises a cabinet, a waste gas treatment chamber and a negative pressure device, the cabinet is provided with a waste gas inlet and a gas outlet, the waste gas treatment chamber is provided in the cabinet and comprises a reaction chamber, a cooling chamber, a liquid tank and a cleaning chamber, the negative pressure device is connected to the gas outlet and is configured to extract gas in the waste gas treatment chamber from the gas outlet, and the reaction chamber communicates with the waste gas inlet; The top of the reaction chamber is an open structure, the top of the cooling chamber communicates with the reaction chamber, the cooling chamber is provided with at least two layers of cooling devices, the liquid tank is provided at the bottom of the cooling chamber, communicates with the bottom of the cooling chamber, and is configured to receive the cooling liquid discharged from the cooling chamber and the waste gas processed by the cooling chamber, the bottom of the cleaning chamber communicates with the liquid tank, and the top of the cleaning chamber communicates with the gas outlet.SELECTED DRAWING: Figure 2

Description

[Technical Field]

[0001] The present application relates to the technical field of semiconductor equipment, and more particularly to waste gas treatment equipment, systems and methods for treating high flow combustible waste gases. [Background technology]

[0002] In semiconductor processes (e.g., integrated circuit wafer manufacturing processes), waste gases are continuously generated, and the waste gases often contain flammable and explosive by-products, such as hydrogen gas, silicon compounds, chlorides, and hydrides. These waste gases are prone to explosion and have very high destructive power.

[0003] In the prior art, when treating combustible waste gas (e.g., waste gas with a relatively high hydrogen gas content), a sufficient amount of combustion-supporting gas is supplied by a gas supply system, and the combustible waste gas is combusted by the combustion-supporting gas to achieve the purpose of treating the waste gas.

[0004] However, the inventors have noticed that when treating a large flow rate of combustible waste gas (for example, combustible waste gas with a flow rate of 200 slm or more), a large amount of combustion supporting gas is consumed, and in the prior art, all of the combustion supporting gas is supplied to the waste gas treatment facility by a gas supply system, which results in a problem of relatively high costs for treating the waste gas. Summary of the Invention

[0005] The present application aims to provide a waste gas treatment facility, system and method for high flow rate combustible waste gas.

[0006] In one aspect of the present application, the present application provides a waste gas treatment facility for high flow rate combustible waste gas. The exhaust gas treatment equipment includes a cabinet, an exhaust gas treatment chamber, and a negative pressure device, the cabinet is provided with an exhaust gas inlet and a gas outlet, the exhaust gas treatment chamber is provided within the cabinet, and includes a reaction chamber, a cooling chamber, a liquid tank, and a cleaning chamber, the negative pressure device is connected to the gas outlet and configured to extract gas in the exhaust gas treatment chamber from the gas outlet, the reaction chamber is connected to the exhaust gas inlet, the top of the reaction chamber has an open structure, the exhaust gas is burned in the reaction chamber, the top of the cooling chamber is connected to the reaction chamber, at least two layers of cooling devices are installed in the cooling chamber to cool the exhaust gas from the reaction chamber, the liquid tank is installed at the bottom of the cooling chamber and is connected to the bottom of the cooling chamber and is configured to receive the coolant discharged from the cooling chamber and the exhaust gas treated by the cooling chamber, the bottom of the cleaning chamber is connected to the liquid tank, and the top of the cleaning chamber is connected to the gas outlet, thereby discharging the exhaust gas passing through the liquid tank.

[0007] In some embodiments, the exhaust gas treatment equipment further includes a pressure relief device and a pressure relief exhaust gas discharge line, the pressure relief device is installed on a side wall of the reaction chamber, and when the pressure received by the pressure relief device exceeds a first predetermined pressure threshold, the pressure relief device ruptures, and the pressure relief exhaust gas discharge line has one end connected to the pressure relief device and the other end connected to a gas discharge port, and when the pressure relief device ruptures, the gas in the reaction chamber is discharged through the gas discharge port.

[0008] In some embodiments, the exhaust gas treatment equipment further includes an intake pipe, an intake valve, a backup pipe, the backup valve, and a pressure detection device, wherein the intake pipe is installed outside the cabinet and is in communication with the exhaust gas inlet and configured to send the exhaust gas to the exhaust gas inlet, the intake valve is installed in the intake pipe and is configured to control communication and blocking of the intake pipe, the backup pipe is installed outside the cabinet and in communication with the intake pipe and is installed in a portion of the intake pipe between the intake port of the intake pipe and the intake valve, the intake port is an inlet in the intake pipe that is connected to external equipment and receives the exhaust gas, and the backup valve is installed in the backup pipe, and the pressure detection device detects the pressure inside the reaction chamber and controls to open the backup valve and close the intake valve when the pressure inside the chamber exceeds a second predetermined pressure threshold.

[0009] In some embodiments, the waste gas treatment equipment further includes a cabinet exhauster, the cabinet exhauster including a gas inlet and a gas outlet, the gas inlet being located inside the cabinet and the gas outlet being located outside the cabinet, the cabinet exhauster discharging gas inside the cabinet when activated, and the pressure detection device controlling the cabinet exhauster to operate to discharge gas inside the cabinet when the pressure inside the chamber exceeds a second predetermined pressure threshold.

[0010] In some embodiments, the waste gas treatment equipment further comprises a variable frequency blower, and the cabinet is further provided with a combustion supporting gas inlet, the variable frequency blower is installed in the cabinet and connected to the reaction chamber and configured to send air into the reaction chamber, and the reaction chamber is in communication with the combustion supporting gas inlet and receives the combustion supporting gas sent through the combustion supporting gas inlet by the gas supply system.

[0011] In some embodiments, the cooling device of each layer includes at least two shower nozzles and a coolant circulation pipe, each shower nozzle is installed on the inner wall of the cooling chamber, the coolant circulation pipe is installed outside the cooling chamber, one end is connected to the at least two shower nozzles and the other end is connected to a liquid tank to supply coolant to the shower nozzles, and the shower nozzles in the cooling device of the top layer are installed so as to be inclined downward at a first predetermined angle with respect to the horizontal.

[0012] In some embodiments, each top layer shower nozzle is installed at a second predetermined angle on the same side of a corresponding central axial plane, the top layer shower nozzles are shower nozzles in a top layer cooling device, and the central axial plane corresponding to each top layer shower nozzle is the centerline of the cooling chamber and a cross section at which each top layer shower nozzle is located.

[0013] In some embodiments, each of the cooling devices in each layer further includes at least two spray nozzles, at least two atomizing liquid entry lines, at least two atomizing gas entry lines, an atomizing liquid shared line, an atomizing gas shared line, and a fixed part, each spray nozzle including a liquid entry end, a gas entry end, and a spray outlet end, the at least two spray nozzles being in the same plane, the plane being a horizontal plane of the cooling chamber, one end of the atomizing liquid entry line being connected to the liquid entry end, one end of the atomizing gas entry line being connected to the gas entry end, one end of the atomizing liquid shared line being in communication with the other ends of the at least two atomizing liquid entry lines and connecting a cooling liquid to the other end of the atomizing liquid shared line, one end of the atomizing gas shared line being in communication with the other ends of the at least two atomizing gas entry lines and connecting the other end of the atomizing gas shared line to a gas source, and the fixed part being fixedly connected to the atomizing liquid shared line and the atomizing gas shared line and fixed to the inner wall of the cooling chamber.

[0014] In some embodiments, the spray nozzle includes a first spray nozzle, a second spray nozzle, and a third spray nozzle, the first spray nozzle, the second spray nozzle, and the third spray nozzle being arranged to form a triangle, the angle corresponding to the first spray nozzle being 45 degrees and the angle corresponding to the second spray nozzle being 45 degrees.

[0015] In one aspect, the present application provides a semiconductor manufacturing system, which includes the above-described waste gas treatment facility for treating a large flow rate of flammable waste gas.

[0016] In one aspect, the present application provides a waste gas treatment method, which is used in the waste gas treatment equipment for treating a large flow rate of combustible waste gas, and includes the steps of combusting the waste gas in a reaction chamber to obtain a combustion gas, cooling and lowering the temperature of the combustion gas in a cooling chamber to obtain a cooled gas, scrubbing the cooled gas to remove acid gases and flue dust in a cleaning chamber to obtain a cleaned gas, and discharging the cleaned gas from a gas outlet. [Effects of the Invention]

[0017] In this application, the waste gas enters the waste gas treatment chamber through the waste gas inlet, and under the action of the negative pressure device, the waste gas passes through the reaction chamber, cooling chamber, liquid tank and cleaning chamber in order, and after being burned, cooled and cleaned, is discharged from the gas outlet, thereby achieving the purpose of waste gas treatment.

[0018] Furthermore, the present application provides that, due to the open structure provided in the reaction chamber, the combustion supporting gas used for burning the waste gas in the reaction chamber can be supplied by external air drawn in through the open structure, thereby reducing the amount of combustion supporting gas supplied by the gas supply system and reducing the cost of the combustion supporting gas.

[0019] In order to more clearly explain the technical solutions in the embodiments of the present application, the following will briefly explain the drawings necessary for explaining the embodiments. The drawings explained are only some embodiments of the present application. Those skilled in the art can obtain other drawings based on these drawings without using inventive ability. [Brief explanation of the drawings]

[0020] [Figure 1] 1 is a schematic block diagram of a waste gas treatment facility according to an embodiment of the present application; [Figure 2] 1 is a schematic diagram of a waste gas treatment chamber according to an embodiment of the present application; [Figure 3] 1 is a schematic diagram of a cleaning chamber according to an embodiment of the present application; [Figure 4] FIG. 1 is a schematic structural diagram of a cooling chamber corresponding to a cooling device with a shower nozzle according to an embodiment of the present application. [Figure 5] 1 is a schematic plan view of a cooling chamber corresponding to a cooling device equipped with a shower nozzle according to an embodiment of the present application; FIG. [Figure 6] FIG. 1 is a schematic diagram of a cooling device with a spray nozzle according to an embodiment of the present application. [Figure 7] 1 is a schematic plan view of a cooling device equipped with a spray nozzle according to an embodiment of the present application; [Figure 8] 1 is a flow chart of a waste gas treatment method according to an embodiment of the present application. DETAILED DESCRIPTION OF THE INVENTION

[0021] Hereinafter, exemplary embodiments will be described more fully with reference to the drawings. However, the exemplary embodiments may be implemented in various forms and are not limited to the embodiments described herein. Providing these embodiments will make this application thorough and complete, and will fully convey the concept of the exemplary embodiments to those skilled in the art. In the drawings, similar reference numerals indicate similar parts, and therefore redundant description will be omitted.

[0022] The described features, structures, or characteristics may be combined in any suitable manner in one or more embodiments. In the following description, numerous specific details are provided to thoroughly understand the embodiments of the present disclosure. However, it will be apparent to those skilled in the art that the technical solutions of the present disclosure can be implemented without these specific details, or that other methods, elements, materials, devices, etc. may be used. In such cases, well-known structures, methods, devices, implementations, materials, or operations are not specifically shown or described.

[0023] Additionally, the terms "comprise," "have," and similar terms are intended to cover a non-exclusive inclusion. For example, a process, method, system, or facility comprising a series of steps or units is not necessarily limited to only those specified elements, but may include other elements not specified or inherent in such process, method, product, or facility.

[0024] The terms "first," "second," and the like used in the specification, claims, and drawings of this application are intended to distinguish between different objects and do not describe a particular order.

[0025] The technical solutions of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. The described embodiments are only some of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without using inventive ability also fall within the scope of protection of the present application.

[0026] In one aspect, the present application provides a waste gas treatment system for a large flow rate of combustible waste gas. As shown in Figure 1, the waste gas treatment system includes a cabinet 01, a waste gas treatment chamber 02, and a negative pressure device 03. The cabinet 01 is provided with a waste gas inlet 11 and a gas outlet 12, and the waste gas treatment chamber 02 is provided within the cabinet 01. The negative pressure device 03 is in communication with the gas outlet 12 and is configured to extract gas from the waste gas treatment chamber 02 through the gas outlet 12.

[0027] 2, the waste gas treatment chamber 02 includes a reaction chamber 21, a cooling chamber 22, a liquid tank 23, and a cleaning chamber 24. The top of the reaction chamber 21 communicates with the waste gas inlet 11, the bottom of the reaction chamber 21 communicates with the top of the cooling chamber 22, and the bottom of the cooling chamber 22 communicates with the liquid tank 23. The liquid tank 23 further communicates with the bottom of the cleaning chamber 24, and the top of the cleaning chamber 24 communicates with the gas outlet 12.

[0028] In an exemplary embodiment, as shown in Fig. 2, waste gas is introduced into reaction chamber 21 through waste gas inlet 11 and combusted within reaction chamber 21. Due to the action of negative pressure device 03 and gas fluidity, the burned gas is sent from the bottom of reaction chamber 21 to cooling chamber 22, where it is cooled. The cooled gas is sent from the bottom of cleaning chamber 24 via liquid tank 23 to cleaning chamber 24, where dust and water-soluble acid gases in the cooled gas are cleaned. The cleaned gas is then discharged from gas outlet 12.

[0029] 2, the top of the reaction chamber 21 has an open structure 211. In order for the waste gas to be burned in the reaction chamber 21, a combustion-supporting gas such as air or oxygen gas needs to be introduced. The reaction chamber 21 is put into a negative pressure state by the action of the negative pressure device 03, so that the outside air flows into the reaction chamber 21 through the open structure 211 at the top of the reaction chamber 21, thereby supplying the combustion-supporting gas to the reaction chamber 21.

[0030] As shown in FIG. 2, the top of the reaction chamber 21 and the exhaust gas inlet 11 are connected via an exhaust gas inlet pipe, one end of which is connected to the exhaust gas inlet 11 and the other end of which penetrates the open structure 211 and is installed inside the reaction chamber 21.

[0031] 2, at least two layers of cooling devices 221 are installed in the cooling chamber 22. Each layer of the cooling device 221 is configured to cool the post-combustion gas from the reaction chamber 21. The cooling device 221 may specifically be a cooling device 221 that showers a cooling liquid, for example, a cooling device 221 that showers cooling water, which uses contact between the cooling water and the gas to reduce the temperature of the post-combustion gas. The cooling device 221 may be a spray device or a heat exchange device, and is not limited thereto.

[0032] In some embodiments, the reaction chamber 21 according to the present application is configured as a short reaction chamber structure. A large flow rate of flammable waste gas (e.g., a large flow rate of hydrogen gas waste gas) is easily combustible, requires less energy to ignite, and releases more heat.

[0033] In view of this, the embodiment of the present application corresponds to shortening the length of the reaction chamber 21 in the prior art and moving the bottom end of the prior art reaction chamber 21 upward relative to the prior art without changing the overall dimensions of the waste gas treatment chamber 02.

[0034] In this way, the reaction chamber 21 is shortened, and some excess space is formed below the bottom end of the reaction chamber 21. In the embodiment of the present application, this excess space also functions as part of the heat exchange chamber 22 to perform a temperature reduction process on the combustion gas. Therefore, the exhaust gas treatment equipment of the present application can lengthen the temperature reduction space compared to the prior art, thereby improving the temperature reduction effect of the exhaust gas treatment equipment.

[0035] Furthermore, an exhaust gas cooling system in which at least two layers of cooling devices 221 are installed in the cooling chamber 22 can extend the contact time between the post-combustion gas and the cooling devices 221, thereby improving the cooling effect on the post-combustion gas, compared to an exhaust gas cooling system in which one layer of cooling devices 221 is installed.

[0036] For example, in conventional technology, a single layer of cooling water showering devices is often installed, which limits the contact time between the combustion gas and the showered cooling water. In the embodiments of the present application, at least two layers of cooling water showering devices are used, which extends the contact time between the combustion gas and the showered cooling water and contributes to improving the cooling effect on the combustion gas.

[0037] 2 , the cooling liquid discharged from the cooling chamber 22 flows into the liquid tank 23 and is stored in the liquid tank 23. For example, if the cooling device 221 is a device for showering cooling liquid, the showered cooling water flows into the liquid tank 23, which is connected to the bottom of the cooling chamber 22. The liquid tank 23 is also connected to the cooling device 221, so that the cooling liquid stored in the liquid tank 23 can be circulated and supplied to the cooling device 221. For example, the cooling water showered from the cooling device 221 flows into the liquid tank 23, and the cooling water in the liquid tank 23 is sent to the cooling device 221, and the cooling device 221 showers the cooling water from the liquid tank 23 to cool the combustion gas.

[0038] In an exemplary embodiment, as shown in Fig. 2, after the combustion gas is cooled in the cooling chamber 22, the cooled gas is sent to the cleaning chamber 24 via the liquid tank 23. As shown in Fig. 3, the cleaning chamber 24 specifically includes, installed from bottom to top, a first circulating water nozzle device 241, a pall ring 242, a second circulating water nozzle device 243, a new water nozzle device 244, a demister 245, and a scheduled new water nozzle device 246.

[0039] The first circulating water nozzle device 241 and the second circulating water nozzle device 243 shower the circulating water, and after the temperature is lowered by showering the circulating water in the cooling chamber 22, the circulating water flows into the liquid tank 23. The circulating water in the liquid tank 23 can be sent again to the first circulating water nozzle device 241 and the second circulating water nozzle device 243 for showering. The water showered by the new water nozzle device 244 and the regular new water nozzle device 246 is dedicated new water, and this new water is used only for cleaning the gas after cooling and is not involved in other processes.

[0040] As shown in FIG. 3 , the cooled gas is cleaned by the first circulating water nozzle device 241. Then, a pall ring 242 effectively separates the cooled gas from water mixed in the gas. The cooled gas is then cleaned again by the second circulating water nozzle device 243. The cleaned gas then passes through a new water nozzle device 244 and is cleaned again with new water showered by the new water nozzle device 244. The cleaned gas then passes through a demister 245 to remove mist contained in the gas, after which the cleaned gas passes through a periodic new water nozzle device 246 and is shower-cleaned by the periodic new water nozzle device 246 before leaving the cleaning chamber 24 and being discharged from the gas outlet 12.

[0041] In the above-described waste gas treatment equipment, waste gas enters the waste gas treatment chamber 02 through the waste gas inlet 11, and under the action of the negative pressure device 03, the waste gas passes through the reaction chamber 21, the cooling chamber 22, the liquid tank 23 and the cleaning chamber 24 in that order, and after undergoing combustion, cooling and cleaning, is discharged from the gas outlet 12, thereby achieving the purpose of waste gas treatment.

[0042] Furthermore, the open structure 211 provided in the reaction chamber 21 allows the combustion supporting gas used in the combustion of the waste gas in the reaction chamber 21 to be supplied by external air drawn in through the open structure 211, thereby reducing the amount of combustion supporting gas supplied by the gas supply system and reducing the cost of the combustion supporting gas.

[0043] Furthermore, by installing at least two layers of cooling devices 221 in the cooling chamber 22, the cooling effect of the waste gas in the cooling chamber 22 can be improved.

[0044] In some embodiments, the waste gas treatment facility further includes a pressure relief device 04 and a pressure relief waste gas discharge line 05, as shown in FIG.

[0045] 2, the pressure relief device 04 is installed on the side wall of the reaction chamber 21. When the pressure received by the pressure relief device 04 exceeds a first predetermined pressure threshold, the pressure relief device 04 will burst.

[0046] Optionally, the pressure relief device 04 is specifically a rupture disk.

[0047] Optionally, the first predetermined pressure threshold is specifically determined based on the explosion pressure of the reaction chamber 21. For example, the reaction chamber 21 may explode when the pressure inside the chamber is 80, that is, the explosion pressure of the reaction chamber 21 is 80 or more, and the first predetermined pressure threshold may be specifically 80 or a value obtained by subtracting a predetermined value from the explosion pressure, for example, 75.

[0048] The pressure release waste gas discharge pipe 05 has one end connected to the pressure release device 04 and the other end connected to the gas discharge port 12, and when the pressure release device 04 ruptures, the gas in the reaction chamber 21 is sent to the gas discharge port 12.

[0049] In the exemplary embodiment, a large flow rate of combustible waste gas is introduced into the reaction chamber 21, and energy is released during the combustion process of the waste gas, so that the pressure within the reaction chamber 21 is relatively high. If the pressure within the reaction chamber 21 is too high, there is a risk that the reaction chamber 21 will explode.

[0050] In the embodiment of the present application, a pressure relief device 04 is installed on the side wall of the reaction chamber 21. If the pressure in the reaction chamber 21 is relatively high and there is a risk of explosion, the pressure relief device 04 will automatically burst when the pressure received by the pressure relief device 04 exceeds a first predetermined pressure threshold. Then, the combustible waste gas and the gas after combustion in the reaction chamber 21 are sent to the pressure relief waste gas discharge line 05 via the side wall where the pressure relief device 04 is located. Then, the gas in the reaction chamber 21 is sent to the gas discharge port 12 via the pressure relief waste gas discharge line 05 and discharged from the gas discharge port 12, and then the operator can take appropriate measures.

[0051] In the embodiment of the present application, by installing the pressure release device 04 and the pressure release waste gas discharge line 05, when there is a risk of explosion, they can operate in a timely manner to reduce the probability of explosion in the reaction chamber 21, and contribute to reducing losses caused by the explosion of the reaction chamber 21.

[0052] In some embodiments, as shown in FIG. 2, the exhaust gas treatment system further includes an intake line 06, an intake valve 07, a backup line 08, a backup valve 09, and a pressure sensing device.

[0053] 1 and 2, the intake pipe 06 is installed outside the cabinet 01. One end of the intake pipe 06 communicates with the waste gas inlet 11, and the other end is an intake port, which is an inlet through which the intake pipe 06 is connected to external equipment and receives waste gas.

[0054] That is, waste gas generated in an external facility is sent from the intake port to the intake pipe 06, sent via the intake pipe 06 to the waste gas intake port 11, and sent into the reaction chamber 21 for treatment.

[0055] The intake valve 07 is installed in the intake pipe 06 and is configured to control the communication and blocking of the intake pipe 06 to control the feeding of the waste gas in the intake pipe 06.

[0056] When the intake valve 07 is opened to put the intake pipe 06 in a communication state, the waste gas received by the intake pipe 06 is sent to the reaction chamber 21 through the waste gas inlet 11. When the intake valve 07 is closed, the waste gas received by the intake pipe 06 cannot be sent to the waste gas inlet 11, i.e., cannot be sent to the reaction chamber 21.

[0057] 1 and 2, the auxiliary pipe 08 is installed outside the cabinet 01. One end of the auxiliary pipe 08 communicates with the intake pipe 06, and the other end of the auxiliary pipe 08 is installed in a portion of the intake pipe 06 between the intake port of the intake pipe 06 and the intake valve 07. The auxiliary valve 09 is installed in the auxiliary pipe 08 and is configured to control communication and blocking of the auxiliary pipe 08.

[0058] Optionally, the end of the auxiliary line 08 that is not in communication with the intake line 06 may be connected to, specifically, an auxiliary exhaust gas treatment facility or an exhaust gas collection facility, but is not limited thereto.

[0059] In some embodiments, a pressure sensing device is connected to the intake valve 07 and the auxiliary valve 09. The pressure sensing device can sense the pressure within the reaction chamber 21 and control the auxiliary valve 09 to open and the intake valve 07 to close when the pressure within the chamber exceeds a second predetermined pressure threshold.

[0060] In an exemplary embodiment, when the pressure inside the reaction chamber 21 exceeds the second predetermined pressure threshold, the pressure inside the reaction chamber 21 is excessive and there is a risk of explosion. In this case, the pressure detection device controls the intake valve 07 to close, blocking the intake line 06, and the waste gas from the external equipment cannot be sent into the reaction chamber 21 via the intake line 06.

[0061] In this case, the pressure detection device controls the auxiliary valve 09 to open, thereby putting the auxiliary pipe 08 into a communication state, and thereby the waste gas from the external facility can be sent to the auxiliary pipe 08 via the intake pipe 06 and sent out via the auxiliary pipe 08. For example, the waste gas from the external facility is sent to the auxiliary waste gas treatment facility via the intake pipe 06 and the auxiliary pipe 08 and treated by the auxiliary waste gas treatment facility.

[0062] In some embodiments, the second predetermined pressure threshold may be equal to the first predetermined pressure threshold, less than the first predetermined pressure threshold, or greater than the first predetermined pressure threshold, and is not limited thereto.

[0063] In the present application, by installing the intake pipe 06, the intake valve 07, the spare pipe 08, the spare valve 09 and the pressure detection device, when the pressure inside the reaction chamber 21 is excessive, the waste gas from the external equipment is sent to another equipment for appropriate treatment, and is not sent further into the reaction chamber 21 where there is a risk of explosion, thereby reducing the risk of explosion of the reaction chamber 21. Furthermore, if the reaction chamber 21 has already exploded, such installation can reduce the damage caused by the explosion of the reaction chamber 21.

[0064] In some embodiments, the waste gas treatment facility specifically further comprises a cabinet exhauster.

[0065] The cabinet exhauster includes a gas inlet and a gas outlet, the gas inlet being located inside the cabinet 01 and the gas outlet being located outside the cabinet 01. When the cabinet exhauster is operating, it can exhaust gas inside the cabinet 01 through the gas inlet and the gas outlet.

[0066] The pressure detection device controls the cabinet exhauster to operate and exhaust gas from the cabinet 01 when the pressure in the chamber exceeds a second predetermined pressure threshold.

[0067] In an exemplary embodiment, if the pressure inside the reaction chamber 21 is excessive, the reaction chamber 21 may explode, or the pressure release device 04 may burst, causing the gas inside the reaction chamber 21 to be discharged through the gas outlet 12. In such a case, the gas inside the reaction chamber 21 may overflow from the open structure 211 of the reaction chamber 21 and further overflow into the cabinet 01, causing some accumulation of gas inside the cabinet 01.

[0068] In response to this, when the pressure detection device detects that the pressure inside the chamber has exceeded a second predetermined pressure threshold, it controls the cabinet exhauster to operate, causing the cabinet exhauster to exhaust gas that has overflowed from inside the reaction chamber 21 into the cabinet 01 from the cabinet 01, thereby reducing the risk of a serious accident occurring.

[0069] 1 and 2, the waste gas treatment facility further includes a variable frequency blower 010. The variable frequency blower 010 is installed in the cabinet 01, communicates with the reaction chamber 21, and is configured to blow air into the reaction chamber 21.

[0070] The cabinet 01 is further provided with a combustion supporting gas inlet 011. The reaction chamber 21 is in communication with the combustion supporting gas inlet 011. The combustion supporting gas inlet 011 can receive the combustion supporting gas supplied by a gas supply system.

[0071] In an exemplary embodiment, as shown in FIG. 2, the combustion supporting gas inlet 011 and the reaction chamber 21 are connected via a pipe, one end of which is the combustion supporting gas inlet 011 and the other end of which extends from an opening at the top of the reaction chamber 21 into the interior of the reaction chamber 21.

[0072] In an exemplary embodiment, the combustion supporting gas in the reaction chamber 21 specifically has three sources. One is to naturally draw air from outside the reaction chamber 21 through the open structure 211 of the reaction chamber 21, and the air is used as the combustion supporting gas in the reaction chamber 21. Another is to introduce air from the external environment outside the cabinet 01 into the reaction chamber 21 by a variable frequency blower 010, and the air is used as the combustion supporting gas. Another is to introduce the combustion supporting gas into the reaction chamber 21 by a gas supply system through the combustion supporting gas inlet 011.

[0073] In an exemplary embodiment, the combustion supporting gas supplied into the reaction chamber 21 by the gas supply system is specifically CDA (Clean Dry Air).

[0074] By installing the open structure 211, the variable frequency blower 010 and the combustion supporting gas inlet 011, the present application can supply sufficient combustion supporting gas into the reaction chamber 21 to combust a large amount of combustible waste gas and dilute the concentration of the waste gas in the reaction chamber 21. In this way, the amount of combustion supporting gas supplied by the gas supply system can be reduced.

[0075] In some embodiments, the exhaust gas treatment equipment further includes a control device that detects the exhaust gas flow rate in the reaction chamber 21, determines a gas supply amount for the variable frequency blower 010 based on the exhaust gas flow rate, a predetermined open structure intake air flow rate, and a predetermined gas supply amount of the gas supply system, and controls the variable frequency blower 010 to send air into the reaction chamber 21 according to the gas supply amount.

[0076] The predetermined open structure intake air flow rate is specifically the flow rate of air that is drawn in through the open structure 211 when the flow rate of the waste gas in the reaction chamber 21 is the waste gas flow rate.

[0077] The predetermined gas supply system gas supply amount is the flow rate of the gas supplied by the gas supply system.

[0078] The control device determines the required amount of combustion support gas based on the waste gas flow rate. For example, oxygen gas accounts for about 1 / 5 of the amount of oxygen in air. To completely combust the waste gas and reduce the risk of explosion due to an excessively high content of oxygen in the waste gas, the required amount of combustion support gas should be three times the waste gas flow rate. In other words, 1 slm of hydrogen gas consumes about 3 slm of air, and about 1,800 slm of air is required to process 600 slm of hydrogen gas.

[0079] Then, the control device determines the gas supply amount of the variable frequency blower 010 based on the required amount, the predetermined open structure intake air flow rate and the predetermined gas supply system gas supply amount, and controls the variable frequency blower 010 to send the air of the gas supply amount to the reaction chamber 21 according to the gas supply amount, thereby ensuring complete combustion of the waste gas and improving the safety of the reaction chamber 21.

[0080] In some embodiments, after the waste gas is combusted in the reaction chamber 21, the combustion gas enters the cooling chamber 22. In the cooling chamber 22, at least two cooling devices 221 are used to cool the combustion gas.

[0081] In some embodiments, the cooling device 221 of each layer includes a coolant circulation line and at least two shower nozzles 2211 .

[0082] The coolant circulation pipe is installed outside the cooling chamber 22, one end of which is connected to at least two shower nozzles 2211, and the other end of which is connected to the liquid tank 23 to supply the coolant to the shower nozzles 2211.

[0083] 4 and 5, in an exemplary embodiment, each shower nozzle 2211 is installed on the inner wall of the cooling chamber 22. The shower nozzle 2211 includes a nozzle end 22111 and a liquid inlet end 22112, and the nozzle end 22111 is installed inside the cooling chamber 22. The liquid inlet end 22112 is installed outside the cooling chamber 22 and communicates with a coolant circulation pipe.

[0084] In an exemplary embodiment, the coolant in the liquid tank 23 is sent to the shower nozzle 2211 via a coolant circulation line, and the shower nozzle 2211 showers the coolant into the cooling chamber 22 through the nozzle end 22111, and the showered coolant flows into the liquid tank 23 by gravity, thereby realizing the circulation of the coolant.

[0085] In some embodiments, the shower nozzles 2211 in the top layer cooling device are installed at a first predetermined angle (a downward diagonal direction relative to the horizontal direction as shown in FIG. 4). The top layer cooling device is the uppermost cooling device 221 in the cooling chamber 22.

[0086] In some embodiments, as shown in Fig. 4, the shower nozzles 2211 in the cooling device of the other layer are installed along the horizontal direction, for example, they may be installed in a direction perpendicular to the center line of the cooling chamber 22 and be installed at a first predetermined angle downward with respect to the horizontal direction, but this is not limited thereto. For example, Fig. 4 shows an example in which the shower nozzles 2211 in the cooling device of the other layer are installed along the horizontal direction.

[0087] In an exemplary embodiment, the shower nozzles 2211 in the top layer cooling device are installed at an angle downward relative to the horizontal, so that the coolant showered from the shower nozzles 2211 does not enter the reaction chamber 21, thereby reducing the impact on combustion in the reaction chamber 21.

[0088] In some embodiments, refer to Figure 5, which is a plan view of the cooling chamber 22. Each top layer shower nozzle is installed on the same side of the corresponding central axis plane at a second predetermined angle. The top layer shower nozzle is the shower nozzle 2211 in the top layer cooling device.

[0089] Referring to FIG. 5, the central axial plane corresponding to each top layer shower nozzle is a cross section of the centerline of the cooling chamber 22 and the location of each top layer shower nozzle.

[0090] 5, each top layer shower nozzle may be disposed so as to be tilted at a second predetermined angle clockwise from the central axial plane, or each top layer shower nozzle may be disposed so as to be tilted at a second predetermined angle counterclockwise from the central axial plane.

[0091] Exemplarily, the second predetermined angle is specifically 30°.

[0092] By installing each top layer shower nozzle at an angle, a swirling flow is generated in the showering cooling medium, improving the cooling effect on the gas after combustion.

[0093] In some embodiments, the shower nozzles 2211 of the cooling devices of the other layers are installed in a direction perpendicular to the center line of the cooling chamber 22. See Figures 4 and 5. The center line of the cooling chamber 22 is a line connecting the centers of each horizontal plane in the cooling chamber 22. The cooling chamber 22 is usually cylindrical in structure, and the center line of the cooling chamber 22 is a straight line passing through the center of each cross section.

[0094] In some embodiments, as shown in FIG. 6, each of the cooling devices 221 in each layer includes at least two spray nozzles 2212, at least two spray liquid inlet lines L1, at least two spray gas inlet lines L2, a spray liquid shared line L3, a spray gas shared line L4, and a fixed portion d.

[0095] In some embodiments, the at least two spray nozzles 2212 are in the same plane, which is parallel to the horizontal plane of the cooling chamber 22. Exemplarily, reference is made to Figure 7, which is a plan view of the cooling device 221.

[0096] In some embodiments, when the cooling device 221 of each layer includes three spray nozzles 2212, the three spray nozzles 2212 are arranged to form a triangle, and each spray nozzle 2212 corresponds to one vertex of the triangle. The three spray nozzles 2212 are installed in the cooling chamber 22, and the plane formed by the three spray nozzles 2212 is parallel to the horizontal plane of the cooling chamber 22, and the spray nozzles 2212 are installed facing downward.

[0097] In some embodiments, each spray nozzle 2212 includes a liquid entry end a, a gas entry end b, and a spray exit end. Each spray nozzle 2212 corresponds to one spray liquid entry line L1 and one spray gas entry line L2.

[0098] One end of the spray liquid inlet conduit L1 is connected to the liquid inlet end a of the corresponding spray nozzle 2212, and the other end of the spray liquid inlet conduit L1 is connected to one end of the spray liquid common conduit L3. The other end of each spray liquid inlet conduit L1 is connected to one end of the spray liquid common conduit L3. The coolant is connected to the other end of the spray liquid common conduit L3.

[0099] One end of the spray gas inlet line L2 is connected to the gas inlet end b of the corresponding spray nozzle 2212, and the other end of the spray gas inlet line L2 is connected to one end of the spray gas common line L4. The other end of each spray gas inlet line L2 is connected to one end of the spray gas common line L4, and the other end of the spray gas common line L4 is connected to a gas source.

[0100] In an exemplary embodiment, each spray nozzle 2212 has one end connected to a cooling liquid and the other end connected to a gas source, thereby spraying the cooling liquid mist from the spray nozzle 2212. In the process of contact between the combustion gas and the cooling liquid mist, on the one hand, the cooling liquid mist comes into contact with the combustion gas and lowers the temperature of the combustion gas by heat conduction through contact, and on the other hand, the cooling liquid mist evaporates in the process of contact with the combustion gas, and absorbs heat from the combustion gas in the evaporation process.

[0101] Therefore, when using the same amount of cooling liquid, this spray method can remove more heat from the post-combustion gas than the direct shower method. Therefore, in the embodiment of the present application, by installing the spray nozzle 2212, the atomizing gas inlet line L2, the atomizing liquid inlet line L1, the atomizing liquid common line L3, and the atomizing gas common line L4, it is possible to improve the cooling effect on the post-combustion gas and reduce the amount of cooling liquid used.

[0102] In some embodiments, as shown in Figure 6, the other end of the spray liquid shared conduit L3 and the other end of the spray gas shared conduit L4 are both fixedly connected to the fixing part d, thereby fixing the spray liquid shared conduit L3 and the spray gas shared conduit L4 by the fixing part d, and further fixing the spray liquid inlet conduit L1, the spray gas inlet conduit L2, the spray nozzle 2212, etc.

[0103] The fixing portion d is fixed to the inner wall of the cooling chamber 22 to fix the cooling device 221 inside the cooling chamber 22, thereby realizing fixing of the cooling device 221.

[0104] In an exemplary embodiment, the fixing portion d may specifically be a flange structure, but is not limited thereto.

[0105] In some embodiments, as shown in FIG. 7, when each layer of cooling device 221 includes three spray nozzles 2212, i.e., a first spray nozzle, a second spray nozzle, and a third spray nozzle, the first spray nozzle, the second spray nozzle, and the third spray nozzle are arranged to form a triangle.

[0106] The first spray nozzle corresponds to the first interior angle, and the first interior angle is located at the location of the first spray nozzle, i.e., the angle between the side connecting the first spray nozzle and the second spray nozzle and the side connecting the first spray nozzle and the third spray nozzle.

[0107] The second spray nozzle corresponds to the second interior angle, which is located at the location of the second spray nozzle, i.e., the angle between the side connecting the second spray nozzle and the first spray nozzle and the side connecting the second spray nozzle and the third spray nozzle.

[0108] The third spray nozzle corresponds to the third interior angle, and the third interior angle is located at the location of the third spray nozzle, i.e., it is the angle between the side connecting the third spray nozzle and the first spray nozzle and the side connecting the third spray nozzle and the second spray nozzle.

[0109] In some embodiments, the first interior angle is 45°, the second interior angle is 45°, and the third interior angle is 90°.

[0110] By arranging the first spray nozzle, the second spray nozzle, and the third spray nozzle in a triangle in this manner, the spray can cover the horizontal surface of the cooling chamber 22 to the maximum extent, resulting in a good cooling effect.

[0111] In another aspect of the present application, the present application further provides a semiconductor manufacturing system, which includes a waste gas treatment facility for high-flow combustible waste gas according to the above embodiment.

[0112] In another aspect of the present application, the present application further provides a waste gas treatment method, which is used in the waste gas treatment equipment for treating a large amount of combustible waste gas according to the above embodiment. As shown in Figure 8, the method includes steps S71 to S74.

[0113] In step S71, the waste gas is combusted in the reaction chamber 21 to obtain a combustion gas.

[0114] In step S72, the gas after combustion is cooled and cooled in the cooling chamber 22 to obtain cooled gas.

[0115] In step S73, the cooled gas is cleaned of acid gas and flue dust in the cleaning chamber 24 to obtain a cleaned gas.

[0116] In step S74, the gas after cleaning is discharged from the gas discharge port 12.

[0117] The above are only preferred embodiments of the present application and are not intended to limit the present application. Although the present application has been described in detail with reference to the above embodiments, those skilled in the art may modify the technical solutions of the above embodiments and make equivalent substitutions for some of the features therein. As long as they do not deviate from the spirit and principle of the present application, any modifications, equivalent substitutions, improvements, etc., fall within the protection scope of the present application. [Explanation of symbols]

[0118] 01 Cabinet 11 Waste gas intake 12 Gas outlet 02 Waste gas treatment room 21 Reaction chamber 211 Open structure 22 Cooling room 221 Cooling device 2211 shower nozzle 22111 Nozzle end 22112 Liquid inlet end 2212 Spray nozzle a Liquid entry end b Gas entry end c Spray end L1 Spray liquid inlet line L2 Atomizing gas inlet pipe L3 Spray liquid common pipe L4 Spray gas common line d Fixed part 23 Liquid Tank 24 Cleaning Room 241 First Circulating Water Nozzle Device 242 Pall Ring 243 Second Circulating Water Nozzle Device 244 New water nozzle device 245 Demister 246 Fixed-time new water nozzle device 03 Negative pressure device 04 Pressure relief device 05 Pressure release waste gas discharge line 06 Intake pipe 07 Intake valve 08 Reserve pipeline 09 Spare valve 010 Variable Frequency Blow Machine 011 Combustion-supporting gas inlet

Claims

1. a cabinet, a waste gas treatment chamber, and a negative pressure device; The cabinet is provided with a waste gas inlet and a gas outlet; the waste gas treatment chamber is provided in the cabinet and includes a reaction chamber, a cooling chamber, a liquid tank, and a cleaning chamber; the reaction chamber is in communication with the waste gas inlet, the top of the reaction chamber is open, and the waste gas is combusted in the reaction chamber; The top of the cooling chamber is in communication with the reaction chamber, and the cooling chamber is provided with at least two layers of cooling devices for cooling the waste gas from the reaction chamber; a liquid tank disposed at a bottom of the cooling chamber, communicating with the bottom of the cooling chamber, and configured to receive the cooling liquid discharged from the cooling chamber and the waste gas treated by the cooling chamber; The bottom of the cleaning chamber communicates with the liquid tank, and the top of the cleaning chamber communicates with the gas outlet, thereby discharging waste gas passing through the liquid tank; The negative pressure device is connected to the gas outlet and configured to extract gas in the waste gas treatment chamber through the gas outlet. A waste gas treatment facility for large flow rates of combustible waste gas.

2. a pressure relief device and a pressure relief waste gas exhaust line; a pressure release device disposed on a sidewall of the reaction chamber, the pressure release device bursting when a pressure received by the pressure release device exceeds a first predetermined pressure threshold; A pressure release waste gas discharge line has one end connected to the pressure release device and the other end connected to the gas discharge port, and when the pressure release device bursts, the gas in the reaction chamber is discharged from the gas discharge port.

2. The waste gas treatment facility for large flow rate combustible waste gas according to claim 1.

3. an intake pipe, an intake valve, a spare pipe, a spare valve, and a pressure detection device; the intake pipe is installed outside the cabinet and communicates with the exhaust gas inlet, configured to deliver exhaust gas to the exhaust gas inlet; the intake valve is installed in the intake pipe line and configured to control communication and blocking of the intake pipe line; the auxiliary pipeline is installed outside the cabinet, communicates with the intake pipeline, and is installed in a portion of the intake pipeline between an intake port of the intake pipeline and the intake valve, the intake port being an inlet of the intake pipeline connected to external equipment and receiving waste gas; the standby valve is installed in the standby pipeline; The pressure detection device detects the pressure inside the reaction chamber, and when the pressure inside the chamber exceeds a second predetermined pressure threshold, controls the auxiliary valve to open and the intake valve to close.

2. The waste gas treatment facility for large flow rate combustible waste gas according to claim 1.

4. Further equipped with a cabinet exhauster, the cabinet exhauster includes a gas inlet and a gas outlet, the gas inlet is provided inside the cabinet, and the gas outlet is provided outside the cabinet, and when the cabinet exhauster is operated, it exhausts gas inside the cabinet; The pressure detection device controls the cabinet exhauster to operate when the pressure in the chamber exceeds a second predetermined pressure threshold to exhaust gas from the cabinet.

4. The waste gas treatment facility for large flow rate combustible waste gas according to claim 3.

5. Further comprising a variable frequency blower; the variable frequency blower is installed in the cabinet, connected to the reaction chamber, and configured to blow air into the reaction chamber; The cabinet is further provided with a combustion-supporting gas inlet; The reaction chamber is in communication with the combustion supporting gas inlet and receives the combustion supporting gas delivered through the combustion supporting gas inlet by a gas supply system.

2. The waste gas treatment facility for large flow rate combustible waste gas according to claim 1.

6. The cooling device of each layer includes at least two shower nozzles and a cooling liquid circulation line; Each of the shower nozzles is installed on an inner wall of the cooling chamber, the coolant circulation pipe is installed outside the cooling chamber, one end of the coolant circulation pipe is connected to the at least two shower nozzles, and the other end of the coolant circulation pipe is connected to the liquid tank to supply the coolant to the shower nozzles; The shower nozzles in the top layer cooling device are installed so as to be inclined downward at a first predetermined angle with respect to the horizontal.

2. The waste gas treatment facility for large flow rate combustible waste gas according to claim 1.

7. each of the top layer shower nozzles is installed at a second predetermined angle on the same side of the corresponding central axis plane, and the top layer shower nozzle is a shower nozzle in the top layer cooling device; The central axial plane corresponding to each of the top layer shower nozzles is a cross section of the center line of the cooling chamber and the location of each top layer shower nozzle.

7. The waste gas treatment facility for large flow rate combustible waste gas according to claim 6.

8. each of the cooling devices in each layer includes at least two atomizing nozzles, at least two atomizing liquid entry lines, at least two atomizing gas entry lines, an atomizing liquid common line, an atomizing gas common line, and a stationary portion; each said spray nozzle including a liquid entry end, a gas entry end, and a spray exit end, said at least two spray nozzles being coplanar, said coplanar being a horizontal plane of said cooling chamber; one end of the atomizing liquid inlet conduit is connected to the liquid inlet end; one end of the atomizing gas inlet conduit is connected to the gas inlet end; One end of the spray liquid common pipe is in communication with the other ends of the at least two spray liquid inlet pipes, and a cooling liquid is connected to the other end of the spray liquid common pipe; one end of the atomizing gas common conduit communicates with the other ends of the at least two atomizing gas inlet conduits, and the other end of the atomizing gas common conduit is connected to a gas source; The fixing portion is fixedly connected to the spray liquid common pipe and the spray gas common pipe, and is fixed to the inner wall of the cooling chamber.

2. The waste gas treatment facility for large flow rate combustible waste gas according to claim 1.

9. The waste gas treatment facility for large volume of combustible waste gas according to any one of claims 1 to 8 is included. A semiconductor manufacturing system comprising:

10. A waste gas treatment method used in a waste gas treatment facility for a large flow rate of combustible waste gas according to any one of claims 1 to 8, comprising: combusting the waste gas in a reaction chamber to obtain a combustion gas; a step of cooling and lowering the temperature of the combustion gas in a cooling chamber to obtain a cooled gas; scrubbing the cooled gas to remove acid gas and flue dust in a scrubbing chamber to obtain a scrubbed gas; and discharging the cleaned gas from a gas outlet. A method for treating waste gas comprising the steps of:

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