Developing apparatus and developing method

Abstract

In a developing apparatus and developing method that supplies a developing solution to a substrate for developing, the foam generated by the recovery of the developing solution into the tank is efficiently defoamed within the tank to increase the operating rate of the developing apparatus. [Solution] In this invention, the developer solution in the first tank is circulated and supplied, so foam is introduced into the first tank as the developer solution returns to the first tank. A defoaming solution having the same composition as the developer solution is supplied to the foam, and as a result the foam is eliminated. Furthermore, since the defoaming solution has the same composition as the developer solution, changes in the concentration and composition of the developer solution stored in the first tank are prevented, enabling a stable developing process at all times.

Description

Technical Field

[0001] The present invention relates to a developing apparatus and a developing method for supplying a developing solution to a substrate and performing a developing process.

Background Art

[0002] An example of a developing apparatus that supplies a developing solution to a substrate and performs a developing process is described in Patent Document 1. In the developing apparatus, a substrate is conveyed by a plurality of conveying rollers in a partitioned developing tank. A developing solution nozzle is disposed above the conveying rollers. The developing solution is sent from a tank to the developing solution nozzle by a developing solution pump and supplied from the developing solution nozzle to the substrate. The developing solution supplied to the substrate is recovered at the inner bottom of the developing tank and returned to the tank. Thus, the developing solution can be circulated and used.

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0004] When the developing solution returns from the developing tank to the tank, a large amount of bubbles may be present in the tank. When the bubbles are saturated inside the tank, problems such as damage to the tank and backflow of bubbles into the developing tank may occur. Each time these problems occur, the operator temporarily stops the developing apparatus and performs operations such as replacing the tank and removing bubbles from the tank. As a result, there is a problem that the operation rate of the developing apparatus decreases.

[0005] The present invention has been made in view of the above problems, and in a developing apparatus and a developing method for supplying a developing solution to a substrate and performing a developing process, an object is to efficiently defoam bubbles generated by the recovery of the developing solution into the tank and increase the operation rate of the developing apparatus.

Means for Solving the Problems

[0006] A first aspect of this invention is a developing apparatus comprising: a developing tank; a developing nozzle for discharging developing solution onto a substrate within the developing tank; a first tank for storing developing solution; a first circulation supply unit for supplying the developing solution in the first tank to the developing nozzle and returning the developed solution recovered in the developing tank back to the first tank; and a first defoaming solution supply unit for supplying a defoaming solution having the same composition as the developing solution to the foam generated in the first tank when the developing solution returns to the first tank.

[0007] A second aspect of this invention is a developing method for developing a substrate with a developer solution discharged from a developer solution nozzle in a developing tank, characterized by comprising the steps of: supplying a developer solution in a first tank to a developer solution nozzle and returning the developer solution recovered in the developing tank back to the first tank; and defoaming the foam generated in the first tank as the developer solution returns to the first tank by supplying a defoaming solution having the same composition as the developer solution to the foam.

[0008] In this configuration, since the developer solution in the first tank is circulated, foam may be generated in the first tank as the developer solution returns to the first tank. Therefore, a defoaming solution with the same composition as the developer solution is supplied to the foam. As a result, the foam is eliminated. Furthermore, since the defoaming solution has the same composition as the developer solution, changes in the concentration and composition of the developer solution stored in the first tank are prevented, enabling a consistently stable developing process. Note that "same composition as the developer solution" means that the components constituting the developer solution and their proportions are the same. [Effects of the Invention]

[0009] As described above, according to the present invention, foam generated by the recovery of the developing solution into the tank can be efficiently defoamed within the tank, thereby increasing the operating rate of the developing apparatus. [Brief explanation of the drawing]

[0010] [Figure 1]This figure schematically shows a substrate processing system equipped with a first embodiment of the developing apparatus according to the present invention. [Figure 2] This is an enlarged view of a part of the first embodiment of the developing apparatus according to the present invention. [Figure 3A] This diagram schematically illustrates an example of a malfunction that can occur during the circulation and supply of the developing solution. [Figure 3B] This diagram schematically illustrates an example of an action taken to resolve the malfunction shown in Figure 3A. [Figure 4A] Figure 2 schematically illustrates an example of a malfunction that can occur when only the developing solution is drained from the developing apparatus shown in Figure 2. [Figure 4B] This figure schematically illustrates an example of an action taken to resolve the malfunction shown in Figure 4A. [Figure 5] This is an enlarged view of a part of the second embodiment of the developing apparatus according to the present invention. [Figure 6A] Figure 5 is a schematic diagram illustrating the operation of the developing apparatus. [Figure 6B] Figure 5 is a schematic diagram illustrating the operation of the developing apparatus. [Modes for carrying out the invention]

[0011] Figure 1 is a schematic diagram showing a substrate processing system equipped with a first embodiment of the developing apparatus according to the present invention. The substrate processing system 100 has a housing 101 that extends in the substrate transport direction X. The housing 101 is partitioned by two partition walls 102 and 103, and a total of three processing tanks are provided adjacent to each other in the X direction. A developing apparatus 200, a rinsing apparatus 300, and a drying apparatus 400 are provided in this order relative to these processing tanks. The processing tank located furthest to the (-X) direction functions as the developing tank. The transport rollers 104 are arranged in a line so as to penetrate these processing tanks in the X direction. For example, each of the transport rollers 104 extends in a horizontal direction perpendicular to the X direction (a direction perpendicular to the plane of the paper in Figure 1). The substrate S is placed on the transport rollers 104. The substrate S is transported along the X direction to the developing unit 200, the rinsing unit 300, and the drying unit 400 in that order by the synchronous rotation of the transport rollers 104.

[0012] The developing apparatus 200 is a first embodiment of the developing apparatus according to the present invention, and supplies developing solution to the upper surface of the substrate S, which is transported in direction X by the transport roller 104, and performs the developing process. The detailed configuration of the developing apparatus 200 will be described in detail later. The substrate S is, for example, a glass substrate for a color filter used in a liquid crystal display device. The substrate S may also be various substrates to be processed for electronic devices, such as various substrates for FPDs (Flat Panel Displays), semiconductor wafers, glass substrates for photomasks, glass or ceramic substrates for magnetic or optical disks, glass substrates for organic ELs, glass or silicon substrates for solar cells, and other flexible substrates and printed circuit boards.

[0013] The developed substrate S is transported by the transport roller 104 to a position facing the rinse nozzle 310 provided in the rinse device 300, where cleaning solution is supplied. This performs the rinsing process. The cleaning solution used in this rinsing process is supplied from the cleaning solution tank 320 to the rinse nozzle 310 via the first cleaning solution pump 330. The rinsed substrate S is then transported further by the transport roller 104. At a position facing the high-pressure spray nozzle 340, which is a high-pressure cleaning means, high-pressure cleaning solution is sprayed from the high-pressure spray nozzle 340 to remove any remaining film on the substrate surface. The high-pressure spray nozzle 340 is supplied with cleaning solution from the cleaning solution tank 320 by a second cleaning solution pump 350, which has a high discharge pressure. In this way, the rinse device 300 performs a two-stage rinsing process. The cleaning solution used for cleaning is collected at the bottom of the treatment tank, which is enclosed by partitions 102 and 103. From there, it is returned to the cleaning solution tank 320 via the circulation line 360, making it possible to reuse it.

[0014] The substrate S, which has undergone rinsing, is further transported by the transport roller 104, and pressurized air is blown from the air knife 510 to remove liquid from the surface of the substrate S. After the liquid has been removed, heated air for drying is blown from the drying section 520, and its surface is completely dried.

[0015] Next, the configuration and operation of the developing device 200 will be described in detail while referring to FIGS. 1, 2, 3A, 3B, 4A, and 4B. FIG. 2 is an enlarged view of a part of the first embodiment of the developing device according to the present invention. FIG. 3A is a diagram schematically showing an example of a problem that occurs during the circulation supply of the developer. FIG. 3B is a diagram schematically showing an example of an operation for solving the problem shown in FIG. 3A. FIG. 4A is a diagram schematically showing an example of a problem that occurs when only the drainage of the developer is performed in the developing device shown in FIG. 2. FIG. 4B is a diagram schematically showing an example of an operation for solving the problem shown in FIG. 4A. In FIGS. 3A, 3B, 4A, and 4B (and FIGS. 6A and 6B to be described later), in the symbol indicating the valve, when the triangular part is black, it indicates that the valve is open, and when the triangular part is white, it indicates that the valve is closed. Also, the flow path of the developer (including the defoaming liquid) is drawn with a thick solid line, and the flow path of the foam removal liquid is drawn with a thick dotted line.

[0016] In the developing device 200, as shown in FIGS. 1 and 2, a structure surrounded by the side surface on the (-X) direction side of the housing 101, the partition wall 102, the ceiling surface, and the bottom surface of the housing 101 functions as the developing tank 210. Inside this developing tank 210, a plurality of conveyance rollers 104 are arranged in the X direction at predetermined intervals, and a plurality of developer nozzles 220 are provided above the conveyance rollers 104. Each developer nozzle 220 is attached to the ceiling surface of the developing tank 210 in a posture where its discharge port (not shown) faces the conveyance roller 104. Then, when the developer stored in the tank 230 is supplied to the developer nozzle 220 by the circulation supply unit 240, the developer is discharged in a spray shape toward the upper surface of the substrate S conveyed by the conveyance roller 104.

[0017] The tank 230 corresponds to an example of the "first tank" of the present invention and is configured to store the developing solution. The circulation supply unit 240 includes a pipe 241 connecting the lower end of the tank 230 and the developing solution nozzle 220, a valve 242 inserted into the pipe 241, and a pump 243 inserted into the pipe 241 between the valve 242 and the developing solution nozzle 220. When the valve 242 is opened and the pump 243 operates in response to a command from the control unit 500 that controls the entire substrate processing system 100, the developing solution stored in the tank 230 is supplied to the developing solution nozzle 220 through the pipe 241. Then, the developing solution is sprayed from the discharge port of the developing solution nozzle 220 onto the upper surface of the substrate S, and the substrate S is developed by the developing solution. The developing solution after the developing process is collected on the inner bottom surface of the developing tank 210. One end of a recovery pipe 244 of the circulation supply unit 240 is connected to this inner bottom surface. The other end of the recovery pipe 244 extends into the tank 230. Therefore, the developing solution collected on the inner bottom surface of the developing tank 210 is returned to the recovery pipe 244. In this way, the circulation supply unit 240 circulates the developing solution among the tank 230, the developing solution nozzle 220, the substrate S, and the developing tank 210, and the developing process is executed by supplying the developing solution to the substrate S.

[0018] In addition, a drainage unit 250 is connected to the bottom of the developing tank 210. The drainage unit 250 includes a drainage pipe 251 extending from the bottom of the developing tank 210 to a drainage facility (not shown) and a valve 252 inserted into the drainage pipe 251. When performing the developing process, the valve 252 is closed in response to a command from the control unit 500 to continue storing the developing solution in the tank 230. On the other hand, when the deterioration of the developing solution progresses, the valve 252 is opened in response to a command from the control unit 500 in a state where the developing process is stopped, and the deteriorated developing solution is drained.

[0019] When the above developing process is performed, a large amount of foam B may be generated in the tank 230 when the developer solution returns from the developing tank 210 to the tank 230, as shown in Figure 3A. For example, foam B may be generated while flowing through the recovery pipe 244 and flow into the tank 230 along with the developer solution. Foam B may also be generated when it flows from the recovery pipe 244 into the tank 230. As previously described, the foam B introduced in this way is a cause of malfunctions. Furthermore, when the deteriorated developer solution is drained from the developing tank 210, as shown in Figure 4A, foam B may remain in the tank 230. Therefore, in order to resolve these problems, the developing apparatus 200 according to this embodiment is further equipped with a plurality of multi-function nozzles 261, a common pipe 262, a three-way valve 263, a defoaming pipe 264, and a foam removal pipe 265.

[0020] Each multi-function nozzle 261 is a spray nozzle mounted on the ceiling of the tank 230, with its discharge port (not shown) facing the inner bottom surface of the tank 230. The multi-function nozzle 261 is connected to the first port of the three-way valve 263 by a common pipe 262. The second port of the three-way valve 263 is connected to the lower end of the tank 230 by a defoaming pipe 264. A pump 266 is inserted into the defoaming pipe 264. Furthermore, the third port of the three-way valve 263 is connected to the DIW supply source by a foam removal pipe 265. The connection destination of the multi-function nozzle 261 is switched between the tank 230 and the DIW supply source in response to a switching command from the control unit 500. For example, when the first, second, and third ports of the three-way valve 263 are set to "open," "open," and "closed," respectively, the tank 230 and the multi-function nozzle 261 are connected. In this state, when the pump 266 is activated in response to a command from the control unit 500, the developer solution stored in the tank 230 is sent to the multi-function nozzle 261 as a defoaming solution and discharged from the multi-function nozzle 261 into the tank 230. The defoaming solution thus discharged naturally has the same composition as the developer solution and is in a spray or mist state. Therefore, even if foam B is present in the tank 230, as shown in Figure 3B, for example, the supply of the defoaming solution eliminates foam B (see Figure 3A). Moreover, the defoaming solution is the developer solution that was originally present in the tank 230. Therefore, even if the defoaming treatment is performed, the concentration of the developer solution stored in the tank 230 remains unchanged, and it is possible to perform the developing and defoaming treatments in parallel without adversely affecting the developing process.

[0021] The effects of foam B are not limited to the developing process; they must also be considered during maintenance, such as when draining the developer remaining in tank 230 and replacing it with fresh developer. This is because, as shown in Figure 4A, foam B may remain in tank 230 when the developer is drained. If new developer is added to tank 230 while foam B remains, the concentration of the developer stored in tank 230 may deviate from the desired value. Furthermore, impurities attached to foam B may mix with the developer. Therefore, it is desirable to drain the foam B remaining in tank 230 along with the developer that has been repeatedly used in the developing process before adding fresh developer.

[0022] Therefore, in this embodiment, as shown in Figure 4B, a foam removal process is performed instead of the defoaming process described above. That is, when the first, second, and third ports of the three-way valve 263 are opened, closed, and open respectively in response to a command from the control unit 500, the DIW (pure water) supply source and the multi-function nozzle 261 are connected. The "DIW supply source" is a type of water supply permanently installed in the factory where the substrate processing system 100 is installed. Once connected to the multi-function nozzle 261, the DIW is sent to the multi-function nozzle 261 as a foam removal liquid and discharged from the multi-function nozzle 261 into the tank 230. The foam removal liquid thus discharged causes the foam B remaining in the tank 230 to flow into the drainage section 250 and is discharged through the drainage section 250 (foam removal process).

[0023] In this first embodiment, the control unit 500 controls each part of the apparatus, enabling selective execution of the defoaming treatment and the foam removal treatment. When the developing treatment, defoaming treatment, and foam removal treatment are all stopped, as shown in Figure 2, all valves 242 and 252 are closed, and all ports of the three-way valve 263 are closed.

[0024] When the developing process is performed, as shown in Figure 3B, the developing solution is circulated through the path of tank 230 - piping 241 - developing solution nozzle 220 - substrate S - recovery piping 244 by opening valve 242 and operating pump 243, while the substrate S is developed. At the same time as (or slightly after) the circulation of the developing solution begins, the first and second ports of the three-way valve 263 are switched to "open" and pump 266 is operated, causing the developing solution to circulate through the path of tank 230 - defoaming piping 264 - three-way valve 263 - common piping 262 - multi-function nozzle 261 - foam B (see Figure 3A), while the defoaming process is performed.

[0025] If the developer deteriorates while the above developing process is being repeated, the control unit 500 controls each part of the apparatus as follows to stop the developing and defoaming processes, and then performs a liquid removal process. More specifically, pumps 243 and 265 stop, valve 242 is closed, and the first and second ports of the three-way valve 263 are closed (stopping the developing and defoaming processes). Subsequently, valve 252 is opened, and the developer in tank 230 is drained through the drain pipe 251. Also, by switching the first and third ports of the three-way valve 263 to "open," spray-like or mist-like DIW is supplied to foam B (see Figure 4A) from the multi-function nozzle 261 in parallel with the draining of the developer, and is drained together with the developer and DIW through the drain pipe 251.

[0026] As described above, according to this embodiment, by supplying a defoaming solution with the same composition as the developer to the foam B, the foam B introduced into the tank 230 can be effectively defoamed. Moreover, since the defoaming solution has the same composition as the developer, there is no change in the concentration or composition of the developer stored in the tank 230, and stable development processing is always possible. Therefore, foam B generated during the development process can be efficiently defoamed within the tank 230. As a result, interruptions in the development process caused by foam B can be suppressed, and the operating rate of the development device can be increased.

[0027] Furthermore, when replacing the deteriorated developer stored in tank 230 with fresh developer, DIW is supplied as a foam remover, allowing foam B to be efficiently discharged from tank 230.

[0028] In the above first embodiment, the circulation supply unit 240 corresponds to an example of the "first circulation supply unit" of the present invention. Also, the multi-function nozzle 261, common piping 262, three-way valve 263, defoaming piping 264, and pump 266 function as a defoaming liquid supply unit 270, which corresponds to an example of the "first defoaming liquid supply unit" of the present invention. Furthermore, the drainage unit 250 functions as the "first drainage unit" of the present invention. In addition, the multi-function nozzle 261, common piping 262, three-way valve 263, and foam removal piping 265 function as a foam removal unit 280, which corresponds to an example of the "first foam removal unit" of the present invention.

[0029] In the first embodiment, a fluid box FB (= tank 230, circulation supply unit 240, drainage unit 250, defoaming solution supply unit 270, and foam removal unit 280) for handling the developer is provided with the developing tank 210 equipped with a developer nozzle 220, as shown by the dashed line in Figure 2. Therefore, it is impossible to perform the developing process with defoaming and the foam removal process in parallel. For this reason, the developing process must be interrupted while the foam removal process is being performed. In this case, to avoid interrupting the developing process, for example, one more fluid box may be added (second embodiment).

[0030] Figure 5 is an enlarged view of a part of the second embodiment of the developing apparatus according to the present invention. Figures 6A and 6B are schematic diagrams showing the operation of the developing apparatus shown in Figure 5. The main differences between the second embodiment and the first embodiment are the addition of a fluid box, the commonality of the piping 241 and pump 243, and the addition of a three-way valve 245 for the purpose of the commonality. Other aspects are basically the same as the first embodiment. Therefore, the following explanation will focus on the differences, and identical components will be denoted by the same reference numerals and their explanations will be omitted.

[0031] The second embodiment, as shown in Figure 5, has a first fluid box FB1 and a second fluid box FB2. A three-way valve 245 is added between the first fluid box FB1 and the second fluid box FB2. The first port of this three-way valve 245 is connected to the developer nozzle 220 by a common pipe 241a, and a common pump 243 is inserted into this pipe 241. The second port is connected to the tank 230 of the first fluid box FB1 by pipe 241b, and the third port is connected to the tank 230 of the second fluid box FB2 by pipe 241c.

[0032] As shown in Figure 6A, when the first, second, and third ports of the three-way valve 245 are opened, opened, and closed respectively in response to a command from the control unit 500, the first fluid box FB1 can perform developing and defoaming processes in parallel, and the second fluid box FB2 can perform foam removal. In other words, in the first fluid box FB1, the developing solution is circulated through the path of tank 230 - piping 241b - three-way valve 245 - piping 241a - developing solution nozzle 220 - substrate S - recovery piping 244 by the opening of valve 242 and the operation of pump 243, and the substrate S is developed (first developing mode). Furthermore, as soon as (or slightly after) the circulation of the developer solution begins, the first and second ports of the three-way valve 263 are switched to the "open" position and the pump 266 is activated, causing the developer solution to circulate through the following path: tank 230 - defoaming pipe 264 - three-way valve 263 - common pipe 262 - multi-function nozzle 261 - foam B (see Figure 3A), while the defoaming process is performed.

[0033] In the second fluid box FB2, opening valve 252 causes the developer solution in tank 230 to be drained via drain pipe 251. Additionally, switching the first and third ports of the three-way valve 263 to "open" allows spray or mist-like DIW to be supplied to foam B (see Figure 4A) from the multi-function nozzle 261 in parallel with the drainage of the developer solution, and is drained along with the developer solution and DIW via drain pipe 251 (second maintenance mode).

[0034] On the other hand, as shown in Figure 6B, when the first, second, and third ports of the three-way valve 245 are opened, closed, and open respectively in response to a command from the control unit 500, the first fluid box FB1 becomes capable of performing foam removal, and the second fluid box FB2 becomes capable of performing developing and defoaming in parallel. In other words, in the second fluid box FB2, the developing solution is circulated through the path of tank 230 - piping 241b - three-way valve 245 - piping 241a - developing solution nozzle 220 - substrate S - recovery piping 244 by opening the valve 242 and operating the pump 243, and the substrate S is developed (second developing mode). Furthermore, as soon as (or slightly after) the circulation of the developer solution begins, the first and second ports of the three-way valve 263 are switched to the "open" position and the pump 266 is activated, causing the developer solution to circulate through the following path: tank 230 - defoaming pipe 264 - three-way valve 263 - common pipe 262 - multi-function nozzle 261 - foam B (see Figure 3A), while the defoaming process is performed.

[0035] In the first fluid box FB1, opening valve 252 causes the developer solution in tank 230 to be drained via drain pipe 251. Additionally, switching the first and third ports of the three-way valve 263 to "open" allows spray or mist-like DIW to be supplied from the multi-function nozzle 261 to foam B (see Figure 4A) in parallel with the drainage of the developer solution, and is drained along with the developer solution and DIW via drain pipe 251 (first maintenance mode).

[0036] As described above, the second embodiment provides the same effects as the first embodiment while preventing interruptions to the developing process and further increasing the operating rate of the developing apparatus 200.

[0037] Thus, in the second embodiment, the tank 230, circulation supply unit 240, drainage unit 250, defoaming liquid supply unit 270, and foam removal unit 280 that constitute the second fluid box FB2 correspond to examples of the "second tank," "second circulation supply unit," "second drainage unit," "second defoaming liquid supply unit," and "second foam removal unit" of the present invention, respectively.

[0038] It should be noted that the present invention is not limited to the embodiments described above, and various modifications can be made to those described above without departing from the spirit of the invention. For example, in the above embodiments, DIW is used as a foam removal solution, but other liquids such as carbonated water, electrolyzed ionized water, hydrogen water, ozonated water, a washing solution or developer that dissolves the developer components may also be used.

[0039] Furthermore, in the above embodiment, the multi-functional nozzle 261 is configured to selectively discharge the defoaming liquid and the foam removal liquid. However, instead of the multi-functional nozzle 261, a nozzle dedicated to the defoaming liquid and a nozzle dedicated to the foam removal liquid may be provided. Also, the shape of these nozzles is not limited to a spray; for example, a slit nozzle may be used.

[0040] Furthermore, in the above embodiment, the developer stored in tank 230 is used as the defoaming solution, but unused developer may also be used as the defoaming solution, thereby replenishing the developer in tank 230 in parallel with the defoaming treatment.

[0041] Furthermore, in the above embodiment, each part of the developing apparatus 200 is controlled by the control unit 500 for the substrate processing system 100. However, a dedicated control unit for controlling the developing apparatus 200 may be provided in the developing apparatus 200, and the various parts of the developing apparatus 200 may be controlled by this control unit. [Industrial applicability]

[0042] This invention can be applied to all developing techniques that involve supplying a developing solution to a substrate for developing. [Explanation of Symbols]

[0043] 200... Developing equipment 210...Developer tank 220... Developer nozzle 230... Tank 240...Circulation supply section 250... Drainage section 270…Defoaming liquid supply section 280…Bubble removal section 500... Control Unit B…bubble S…Substrate

Claims

1. Developing tank and A developing solution nozzle that dispenses developing solution onto a substrate within the developing tank, A first tank in which the developing solution is stored, A first circulation supply unit that supplies the developer in the first tank to the developer nozzle and returns the developer recovered in the developing tank back to the first tank, A first defoaming liquid supply unit supplies a defoaming liquid having the same composition as the developing liquid to the foam generated in the first tank when the developing liquid returns to the first tank. A developing apparatus equipped with a developing device.

2. A developing apparatus according to claim 1, A developing apparatus comprising a control unit that controls the first circulation supply unit so that the substrate is developed by the developing solution while the developing solution circulates between the first tank, the developing solution nozzle, the substrate, and the developing tank, and controls the first defoaming solution supply unit so that the foam is defoamed by the defoaming solution in parallel with the development of the substrate.

3. A developing apparatus according to claim 2, The developing apparatus includes a control unit that controls the first defoaming liquid supply unit so that the supply of the defoaming liquid to the foam begins at the same time as the development of the substrate begins.

4. A developing apparatus according to claim 1, With the circulation of the developer in the first tank, the developer nozzle, the substrate, and the developing tank stopped, a first drain unit drains the developer from the first tank, A first foam removal unit that washes away the foam from the first tank via the first drainage unit by supplying foam removal liquid to the first tank, A developing apparatus equipped with a developing device.

5. A developing apparatus according to claim 4, A second tank, separate from the first tank, in which the developing solution is stored, A second circulation supply unit that supplies the developer in the second tank to the developer nozzle and returns the developer recovered in the developing tank back to the second tank, A second defoaming liquid supply unit supplies the defoaming liquid to the foam generated in the second tank when the developing liquid returns to the second tank, With the circulation of the developer in the second tank, the developer nozzle, the substrate, and the developing tank stopped, a second drainage unit drains the developer from the second tank, The second foam removal unit supplies the foam removal liquid to the second tank, thereby washing the foam out of the second tank via the second drainage unit, A developing apparatus equipped with a developing device.

6. A developing apparatus according to claim 5, It further includes a control unit, The operation of developing the substrate with the developer while circulating the developer between the first tank, the developer nozzle, the substrate, and the developing tank, with the drainage of the developer from the first tank and the rinsing of the foam stopped, is defined as the first developing mode. The operation of draining the developer from the first tank and washing away the foam while the development of the substrate by the developer circulating between the first tank, the developer nozzle, the substrate, and the developing tank is stopped is defined as the first maintenance mode. The operation of developing the substrate with the developer while circulating the developer between the second tank, the developer nozzle, the substrate, and the developing tank, with the drainage of the developer from the second tank and the rinsing of the foam stopped, is defined as the second developing mode. When the development of the substrate by the developer circulating between the second tank, the developer nozzle, the substrate, and the developing tank is stopped, and the operation of draining the developer from the second tank and washing away the foam is defined as the second maintenance mode, A developing apparatus in which the control unit controls the first circulation supply unit, the first defoaming liquid supply unit, the second circulation supply unit, and the second defoaming liquid supply unit so that the second maintenance mode is executed while the first developing mode is being executed, and the first maintenance mode is executed while the second developing mode is being executed.

7. A developing method in which a substrate is developed using a developing solution discharged from a developing solution nozzle in a developing tank, A step of supplying the developer solution in the first tank to the developer solution nozzle and returning the developer solution recovered in the developing tank back to the first tank, The process involves supplying a defoaming solution having the same composition as the developer to the foam generated in the first tank when the developer returns to the first tank, thereby defoaming the foam. A developing method comprising:

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