Substrate transport apparatus and substrate transport method

Abstract

The present invention provides a substrate transport apparatus and a substrate transport method with which it is possible to improve control stability by sensing the state of a substrate during transport of the substrate within a substrate transport region that is set between a removal position of the substrate and an introduction position of the substrate. This substrate transport apparatus transports a substrate between a first chamber and a second chamber, and is provided with: a housing; a transport mechanism which is provided within the housing and transports the substrate; and a first sensing unit which is provided within the housing and senses the state of the substrate that is being transported by the transport mechanism. A first transport region and a second transport region, in which the substrate is transported, are formed within the housing. The first sensing unit forms a first sensing region which extends in a direction that intersects a transport direction of the substrate from the first transport region to the second transport region. The first transport region and the second transport region are positioned so as to oppose each other across the first sensing region. The first sensing unit senses the state of the substrate when the substrate, which is transported in the transport direction from the first transport region to the second transport region, passes through the first sensing region.

Description

Substrate transport device and substrate transport method

[0001] The present invention relates to a substrate transport apparatus and a substrate transport method.

[0002] In the field of semiconductor manufacturing and the like, there has conventionally been a technique for using an industrial substrate transfer robot provided in a substrate transfer apparatus to remove substrates (e.g., wafers, glass substrates, etc.) from a container containing the substrates, transfer them to various processing equipment, and perform processing on the transferred substrates. The substrate transfer apparatus uses the substrate transfer robot as a transfer mechanism to transfer substrates between a load port on which a container containing the substrates is placed and a processing equipment or load lock chamber that processes the substrates. Furthermore, when transferring a substrate into the substrate transfer apparatus, a detector in the substrate transfer apparatus detects the condition of the substrate being transferred by the substrate transfer apparatus (e.g., the height, thickness, or amount of warpage of the substrate), and controls the transfer operation of the substrate transfer robot based on the detected condition of the substrate.

[0003] Japanese Patent Application Laid-Open No. 2020-92130

[0004] In recent years, in the field of semiconductor devices, device integration has increased while device miniaturization has also progressed. Accordingly, a method called panel-level packaging (hereinafter referred to as PLP) has become widespread as a packaging technology for highly integrated devices. PLP is a method for collectively manufacturing multiple semiconductor packages by arranging multiple chips on a rectangular panel. Various industrial robots are used in semiconductor package manufacturing lines using PLP. PLP includes a process for coating (encapsulating) the top surface of a panel on which multiple chips are mounted with resin. However, panels handled in semiconductor package manufacturing lines using PLP are prone to significant warping in the vertical direction (upward and downward curvature).

[0005] In a front-opening unified pod (FOUP), a container for storing substrates, substrate support portions (hereinafter referred to as slots) are formed at equal intervals, and the intervals between each slot are becoming increasingly narrower to improve substrate storage efficiency. When a substrate is removed from a FOUP using a substrate transport robot, a robot hand is inserted into the FOUP. However, if the slot pitch within the FOUP is narrow and the substrate has upward or downward curvature, the gaps through which the robot hand is inserted between the slots become uneven. This increases the risk of contact between the robot hand and the substrate in narrow gaps. Furthermore, a predetermined area is designated on the underside of the substrate used in PLP where the robot hand is allowed to come into contact. To prevent particle adhesion to the substrate due to contact between the robot hand and the substrate, the robot hand is required to support the substrate within this area using support members such as support pins to minimize the contact area with the substrate. In addition, the robot hand is required to support the substrate so that the underside of the substrate does not come into contact with the hand members of the robot hand, which will be described later, regardless of the type of warping of the substrate. Furthermore, the robot hand is required to have sufficient rigidity in order to handle heavy objects such as substrates on which chips are mounted.

[0006] For these reasons, it is necessary to detect the condition of the substrates being transported by the substrate transport apparatus (e.g., substrate height, substrate thickness, amount of warpage, etc.) using a detection unit of the substrate transport apparatus and reflect this information in the control of the transport operation of the substrate transport apparatus. Here, the mounting position of the sensor serving as the detection unit, i.e., the position and range of the detection area formed by the detection unit of the substrate transport apparatus, affects the control accuracy of the transport operation of the substrate transport apparatus. For example, if the detection area is set near an opening formed to communicate with a load port on which a FOUP is placed or a processing device that processes the substrates, detection of the substrate condition and correction of the transport operation based on the detected substrate condition occur continuously during the transport operation of the substrate transported through the opening, resulting in a lack of control stability of the transport operation. Furthermore, depending on the number and arrangement of load ports, processing devices, or load lock chambers, the number of sensors serving as detection units to form the detection area may increase.

[0007] Therefore, the present invention provides a substrate transport device that can detect the state of a substrate while it is being transported in a substrate transport area set between a substrate removal position and a substrate loading position, thereby improving control stability, and a substrate transport method for transporting a substrate using the substrate transport device.

[0008] In order to achieve the above-mentioned object, according to the present invention, there is provided a substrate transport device that transports a substrate between a first chamber and a second chamber, comprising: a housing; a transport mechanism provided inside the housing that transports the substrate; and a first detection unit provided inside the housing that detects the state of the substrate transported by the transport mechanism, wherein a first transport region and a second transport region are formed inside the housing where the substrate is transported, the first detection unit forms a first detection region that extends in a direction intersecting the transport direction of the substrate from the first transport region to the second transport region, the first transport region and the second transport region are positioned opposite each other across the first detection region, and the first detection unit detects the state of the substrate as the substrate transported along the transport direction from the first transport region to the second transport region passes through the first detection region.

[0009] In order to achieve the above object, according to the present invention, there is provided a substrate transport method for transporting a substrate between a first chamber and a second chamber by a substrate transport device, the substrate transport device comprising: a housing; a transport mechanism provided inside the housing for transporting the substrate; and a first detection unit provided inside the housing for detecting a state of the substrate transported by the transport mechanism, wherein a first transport region and a second transport region in which the substrate is transported are formed inside the housing, and the first detection unit forms a first detection region extending in a direction intersecting a transport direction of the substrate from the first transport region to the second transport region, and The substrate transport method includes a loading step of loading the substrate into the housing, a first transport step of transporting the substrate along the transport direction from the first transport area to the second transport area, a first detection step of detecting the state of the substrate, and a transport step of transporting the substrate out of the housing, wherein in the first transport step, the first detection unit detects the state of the substrate by executing the first detection step as the substrate transported along the transport direction from the first transport area to the second transport area passes through the first detection area.

[0010] According to the present invention, it is possible to provide a substrate transport device that can detect the state of a substrate while it is being transported in a substrate transport area set between a substrate removal position and a substrate insertion position, thereby improving control stability, and a substrate transport method for transporting a substrate using the substrate transport device.

[0011] 1 is an explanatory perspective view of a substrate transport system to which a substrate transport apparatus according to an embodiment of the present invention is applied; FIG. 2 is an explanatory perspective view of a substrate transport robot as a transport mechanism used in the substrate transport apparatus shown in FIG. 1 with a portion of the housing thereof removed; FIG. 3 is an explanatory view of a cross section taken along the line A-A of the substrate transport robot as the transport mechanism shown in FIG. 4; and FIG. 4 is an explanatory view of a warped state of a substrate supported by the substrate transport robot as the transport mechanism shown in FIG. 5. FIG. 6 is a schematic explanatory top view of a substrate transport system to which the substrate transport apparatus shown in FIG. 1 is applied; FIG. 7 is a schematic explanatory side view of the substrate transport system shown in FIG. 8; FIG. 9 is a schematic explanatory side view of another comparative example of the substrate transport system shown in FIG. 9; FIG. 10 is a schematic explanatory top view of a first modified embodiment of the substrate transport system shown in FIG. 10; FIG. 11 is a schematic explanatory top view of a second modified embodiment of the substrate transport system shown in FIG. 11; FIG. 12 is a schematic explanatory top view of a third modified embodiment of the substrate transport system shown in FIG. 12; FIG. 13 is a schematic explanatory top view of a fourth modified embodiment of the substrate transport system shown in FIG. 13; and FIG. 14 is a schematic explanatory top view of a fifth modified embodiment of the substrate transport system shown in FIG. 6 is a schematic top view of a sixth modified embodiment of the substrate transport system shown in Fig. 6. FIG. 7 is a schematic top view of the substrate transport apparatus shown in Fig. 2. FIG. 8 is a flowchart of a substrate transport method to which the substrate transport apparatus shown in Figs. 1 and 6 is applied.

[0012] Reference will now be made in detail to exemplary embodiments of the present invention, examples of which are illustrated in the accompanying drawings. The following describes a substrate transport apparatus 100, a substrate transport system 50 to which the substrate transport apparatus 100 is applied, and a substrate transport method flow for transporting a substrate W using the substrate transport apparatus 100, in combination with Figures 1 to 17. The description will be made using a spatial coordinate system XYZ, which defines a left-right direction X, a front-back direction Y, and an up-down direction Z. However, this is merely an example of the present invention, and the present invention is not limited thereto.

[0013] 1 and 2 , a substrate transfer apparatus 100 according to this embodiment and a substrate transfer system 50 to which the substrate transfer apparatus 100 is applied will be described. In this embodiment, the substrate transfer apparatus 100 is applied to the substrate transfer system 50. Specifically, the substrate transfer system 50 includes the substrate transfer apparatus 100, a plurality of (e.g., two) load ports 52 disposed on one side (e.g., the front side) of the substrate transfer apparatus 100, and one processing device 54 disposed on the other side (e.g., the rear side) of the substrate transfer apparatus 100. The substrate transfer apparatus 100 is, for example, an Equipment Front End Module (EFEM), the load port 52 is a device for placing a container H (e.g., a FOUP) containing a substrate W and for opening and closing the door of the container H, and the processing device 54 is a device for processing the substrate W. The type of processing device 54 can be selected depending on the process for processing the substrate W (for example, a process required in a semiconductor manufacturing process, such as ion implantation or etching). In another embodiment (not shown), a load lock chamber may be further installed between the substrate transfer device 100 and the processing device 54. However, the present invention is not limited to this.

[0014] In the following, the structure and transport operation of the substrate transport device 100 will be described, with the container H placed on the load port 52 referred to as the first chamber C1 and the processing device 54 for processing the substrate W referred to as the second chamber C2. In this embodiment, the substrate transport device 100 includes a housing 110, a transport mechanism 120 provided inside the housing 110 for transporting the substrate W, and a first detection unit 130 provided inside the housing 110 for detecting the state of the substrate W transported by the transport mechanism 120. As an example, the housing 110 has a frame 112 (shown in FIG. 2 ) and a wall 114 (shown in FIG. 1 ) for covering the frame 112. One side (e.g., the front side) of the housing 110 communicates with the first chamber C1 through an opening O1 provided in the wall 114 of the housing 110, and the other side (e.g., the rear side) of the housing 110 communicates with the second chamber C2 through an opening O2 provided in the wall 114 of the housing 110. Furthermore, the transport mechanism 120 is provided inside the housing 110 between an opening O1 formed to communicate with the first chamber C1 and an opening O2 formed to communicate with the second chamber C2. This allows the substrate transport device 100 to transport the substrate W between the first chamber C1 and the second chamber C2 in the substrate transport system 50 when the opening O1 and the opening O2 are open.

[0015] Specifically, the substrates W are, for example, glass substrates used in PLP, and are accommodated in a container H for accommodating substrates W. The container H is placed on the load port 52 and has multiple stages (e.g., 12 stages) of slots. A substrate W can be supported in each of the multiple stages of slots, thereby accommodating multiple substrates W (as will be described in detail later). The number of substrates W to be stored in the container H can be selected as appropriate, and the present invention is not limited thereto. Furthermore, by opening the door of the container H using the load port 52, the substrates W stored in the container H face the interior of the casing 110, and the transport mechanism 120 can transport the substrates W from the container H into the casing 110. Similarly, the transport mechanism 120 can also transport the substrates W from the interior of the casing 110 to the container H. Correspondingly, the processing device 54 includes at least one mounting table, which can support at least one substrate W during the processing of the substrate W (as will be described in detail later). The number of substrates W processed by the processing device 54 (i.e., the number of mounting tables) can be selected as appropriate, and the present invention is not limited to this. Furthermore, by opening the door of the processing device 54, the substrates W inside the processing device 54 face the inside of the casing 110, and the transport mechanism 120 can transport the substrates W from inside the processing device 54 into the casing 110. Similarly, the transport mechanism 120 can also transport the substrates W from inside the casing 110 into the processing device 54.

[0016] The substrate transport device 100 also includes a movable body 116 and a guide structure 118 inside the housing 110. The movable body 116 is installed so as to be freely movable within the housing 110 by the guide structure 118. For example, the movable body 116 is attached to a guide structure 118 (e.g., a slide rail structure, a conveyor drive device, etc.) for guiding movement in the left-right direction X, and the guide structure 118 enables the movable body 116 to move in the left-right direction X within the housing 110. Therefore, the transport mechanism 120 is moved by the movable body 116 to the door position of the load port 52, allowing the transfer of substrates W between the container H and the inside of the housing 110. Similarly, the transport mechanism 120 is moved by the movable body 116 to the door position of the processing device 54, allowing the transfer of substrates W between the processing device 54 and the inside of the housing 110. As a result, the substrate transport device 100 can transport a substrate W between a first chamber C1 as a container H placed on the load port 52 and a second chamber C2 as a processing device 54 using the transport mechanism 120 inside the housing 110.

[0017] 2 and 3 , the transport mechanism 120 is a substrate transport robot having a main body 122, an arm 124 attached to the upper end of the main body 122, a robot hand 126 attached to the tip of the arm 124, and an arm driver 128 for driving the arm 124. The main body 122 is attached to a movable body 116 provided inside the housing 110 and is installed so as to be movable by the movable body 116. For example, the movable body 116 allows the transport mechanism 120 to move (slide) in the left-right direction X using a guide structure 118. The arm 124 is attached to the upper end of the main body 122 so as to be extendable and rotatable within a horizontal plane (an imaginary horizontal plane formed by the left-right direction X and the front-back direction Y) relative to the main body 122 and to be able to move up and down in the up-down direction Z. The arm driver 128 is, for example, a motor or transmission mechanism built into the main body 122 and applies a driving force to the arm 124. In other embodiments not shown, the arm driver 128 may be attached to the outside of the main body 122. Therefore, the substrate transport robot serving as the transport mechanism 120 uses the arm driver 128 to drive the arm 124, thereby freely moving (raising and lowering, rotating, and moving back and forth) the robot hand 126 and transporting the substrate W using the robot hand 126. As shown in FIGS. 3 to 5 , the transport mechanism 120 also includes a holder 129 for holding the substrate W to be transported. The holder 129 is provided on the upper surface 126a of the robot hand 126 and holds the substrate W by abutting against the underside of the substrate W to improve the stability of the substrate W during transport. The first detector 130 detects the state of the substrate W held by the holder 129 (e.g., the height T1 and thickness T2 of the substrate W shown in FIG. 4 , or the amount of warpage T3 of the substrate W shown in FIG. 5 ) (as will be described in detail later). However, the number, position, or presence or absence of the holders 129 can be adjusted as needed. The present invention is not limited to this. When the robot hand 126 does not have the holder 129, the robot hand 126 directly holds the substrate W by the hand upper surface 126 a of the robot hand 126. In one aspect, the robot hand 126 also serves as the holder 129.

[0018] 4 is, for example, the distance from the hand lower surface 126b of the robot hand 126 of the transport mechanism 120 to the upper surface of the substrate W placed on the holder 129 of the robot hand 126. Furthermore, the thickness T2 of the substrate W is the distance from the lower surface of the substrate W to the upper surface of the substrate W. Correction of the transport operation of the transport mechanism 120 after the state of the substrate W is detected by the first detector 130 may use the value of the height T1 of the substrate W or the value of the thickness T2 of the substrate W. For example, if the substrate W is not warped and is held directly on the hand upper surface 126a of the robot hand 126, the height T1 of the substrate W can be corrected assuming that it corresponds to the sum of the thickness T2 of the substrate W and the thickness of the hand 126. When the substrate W is not warped and is held by the holder 129, correction can be performed assuming that the height T1 of the substrate W corresponds to the sum of the thickness T2 of the substrate W and the height from the hand lower surface 126b to the tip of the holder 129 (as shown in FIG. 4). Furthermore, when the substrate W is warped (see the substrate W in FIG. 5), the height T1 is the distance from the hand lower surface 126b of the robot hand 126 of the transport mechanism 120 to the position where the amount of warping of the substrate W placed on the holder 129 of the robot hand 126 is greatest (the uppermost surface of the substrate W). The amount of warping T3 of the substrate W is the distance from the lowermost surface of the substrate W to the uppermost surface of the substrate W, as shown in FIG. 5. When the substrate W is directly held on the hand upper surface 126a of the robot hand 126, as shown in FIG. 5, the amount of warping T3 of the substrate W can also be expressed as the distance from the hand upper surface 126a to the upper surface of the substrate W placed on the robot hand 126. The correction of the transport operation of the transport mechanism 120 after the state of the substrate W is detected by the first detection unit 130 may use the value of the height T1 of the substrate W or the value of the amount of warpage T3 of the substrate W. In the correction using the value of the amount of warpage T3 of the substrate W, the value is determined using the known thickness of the hand 126 or the known height from the lower surface 126b of the hand to the tip of the holder 129. As an example, when the substrate W is warped and is held directly on the upper surface 126a of the robot hand 126, the height T1 of the substrate W can be corrected assuming that it corresponds to the sum of the amount of warpage T3 of the substrate W and the thickness of the hand 126 (as shown in FIG. 5 ).Furthermore, when the substrate W is warped and held by the holder 129, the height T1 of the substrate W can be corrected assuming that it corresponds to the sum of the amount of warping T3 of the substrate W and the height from the hand lower surface 126b to the tip of the holder 129, assuming that the bottom surface of the substrate W is placed on the holder 129. However, the present invention is not limited to this.

[0019] In this embodiment, the state of the substrate W is detected by a first detector 130 provided inside the housing 110 while the substrate W is being transported by the transport mechanism 120 inside the housing 110. As shown in FIG. 6 , a first transport region TR1 and a second transport region TR2, through which the substrate W is transported, are formed inside the housing 110. The first detector 130 forms a first detection region DR1 that detects the state of the substrate W. The first detection region DR1 extends in a direction (e.g., the front-rear direction Y) intersecting the transport direction D of the substrate W from the first transport region TR1 to the second transport region TR2. The first transport region TR1 and the second transport region TR2 are positioned opposite each other with the first detection region DR1 in between. In other words, the first detection region DR1 is located between the first transport region TR1 and the second transport region TR2. Therefore, the first detection unit 130 detects the state of the substrate W as it passes through the first detection region DR1 while being transported in the transport direction D from the first transport region TR1 to the second transport region TR2.

[0020] Specifically, the substrate transfer device 100 is installed between a plurality of (e.g., two) first chambers C1 and one second chamber C2. The housing 110 of the substrate transfer device 100 includes a first wall 114a having a peripheral edge E1 for forming an opening O1 communicating with the first chamber C1, a second wall 114b facing the first wall 114a and having a peripheral edge E2 for forming an opening O2 communicating with the second chamber C2, and a third wall 114c and a fourth wall 114d connecting the first wall 114a and the second wall 114b. These walls define an internal space that is rectangular when viewed from above and below (in a plan view) in the housing 110. The first wall 114a includes a peripheral edge E1 for forming a plurality of openings O1 that are arranged side by side and communicate with the plurality of first chambers C1. The first transport region TR1 and the second transport region TR2 each face one of the openings O1 of the first wall portion 114a.

[0021] The first detection unit 130 is a line sensor that includes a first light-emitting unit 132 (first light-emitting unit) that emits detection light that forms the first detection region DR1, and a first light-receiving unit 134 (first light-receiving unit) that receives the detection light. Within the housing 110, the first light-receiving unit 134 is disposed at a predetermined distance from the first light-emitting unit 132 and faces the first light-emitting unit 132. At least one of the first light-emitting unit 132 and the first light-receiving unit 134 is fixed to a first wall 114a, which is the wall 114 of the housing 110 adjacent to the first chamber C1. For example, the first light-emitting unit 132 is provided on the first wall 114a adjacent to the first chamber C1 of the housing 110 and emits detection light toward the opposing second wall 114b, and the first light-receiving unit 134 is provided on the second wall 114b at a position facing the first light-emitting unit 132 and receives the detection light emitted by the first light-emitting unit 132. Therefore, the first light-emitting unit 132 and the first light-receiving unit 134 as the first detection unit 130 form a first detection region DR1 between the first wall 114a and the second wall 114b.

[0022] Specifically, the first light emitter 132 emits a belt-shaped detection light L (shown in FIGS. 4 and 5 ) having a predetermined range of dimensions in the vertical direction Z. The belt-shaped detection light L extends from the first light emitter 132 toward the first light receiver 134, forming a first detection region DR1. The first light receiver 134 receives the light emitted by the first light emitter 132 at the light-receiving surface of a line-type CCD sensor (not shown). Furthermore, the vertical dimension of the belt-shaped detection light L is preferably greater than the height T1, thickness T2 (shown in FIG. 4 ), or warpage T3 (shown in FIG. 5 ) of the substrate W held by the robot hand 126 of the transport mechanism 120. In this embodiment, the vertical dimension of the belt-shaped detection light L encompasses the area from the lower surface 126 b of the robot hand 126 to the upper surface of the substrate W supported by the robot hand 126. The first detection unit 130 detects the state of the substrate W (e.g., the height T1 and thickness T2 of the substrate W shown in Figure 4, or the amount of warping T3 of the substrate W shown in Figure 5, etc.) by the robot hand 126 holding the substrate W passing through the range of the band-shaped detection light L directed from the first light emitter 132 to the first light receiver 134, blocking the light, on the optical path between the first light emitter 132 and the first light receiver 134 (i.e., the first detection region DR1).

[0023] As an example, as shown in Fig. 6, the first detection region DR1 formed by the first detection unit 130 is formed so as to extend from between two adjacent openings O1 of the plurality of openings O1 in the first wall portion 114a toward the second wall portion 114b, which is the wall portion opposing the first wall portion 114a, and is perpendicular to the transport direction D from the first transport region TR1 to the second transport region TR2 (for example, formed so as to extend toward the front-rear direction Y), and also extends horizontally as shown in Fig. 7. However, in other embodiments not shown, the first light-emitting unit 132 of the first detection unit 130 may be provided on the second wall portion 114b of the housing 110 and emit detection light toward the opposing first wall portion 114a, and the first light-receiving unit 134 may be provided on the first wall portion 114a of the housing 110 and receive the light emitted by the first light-emitting unit 132. The first detection unit 130 only needs to be installed at a position that does not interfere with the transport path of the substrate W through the openings O1 and O2 (for example, between multiple openings O1 or at the lower edge of one opening O2), and to form a first detection region DR1 between the first wall 114a and the second wall 114b. The first detection unit 130 may also employ a detection means other than a line sensor composed of a first light emitter 132 and a first light receiver 134. In other embodiments not shown, the first detection unit 130 may employ a vision sensor such as a reflective optical line sensor, a line sensor camera, or an area sensor camera. For example, if the first detection unit 130 is a vision sensor, the vision sensor may be fixed to only one of the first wall 114a or the second wall 114b, which is the wall 114 adjacent to the first chamber C1 of the housing 110, so that the first detection region DR1 is formed between the first wall 114a and the second wall 114b. In this case, the state of the substrate W (for example, the height T1 and thickness T2 of the substrate W shown in FIG. 4, or the amount of warpage T3 of the substrate W shown in FIG. 5, etc.) can be detected based on the image captured by the vision sensor. However, the present invention is not limited to this.

[0024] In the substrate transport device 100, the first detection unit 130 forms a first detection region DR1 inside the housing 110, and in the internal space of the housing 110, one side of the first detection region DR1 (e.g., the left side in FIG. 6 ) is a first transport region TR1, and the other side of the first detection region DR1 (e.g., the right side in FIG. 6 ) is a second transport region TR2. As a result, when the transport mechanism 120 transports the substrate W along the transport direction D from the first transport region TR1 to the second transport region TR2, the substrate W passes through the first detection region DR1 located between the first transport region TR1 and the second transport region TR2, and the state of the substrate W can be detected by the first detection unit 130. As an example, as shown in Fig. 6, the first detection region DR1 formed by the first detection unit 130 is formed so as to extend from between two adjacent openings O1 of the plurality of openings O1 in the first wall portion 114a toward the second wall portion 114b, which is a wall portion opposing the first wall portion 114a, and is perpendicular to the transport direction D from the first transport region TR1 to the second transport region TR2 (for example, formed so as to extend in the front-rear direction Y), and also extends in the horizontal direction as shown in Fig. 7. However, the present invention is not limited to this.

[0025] More specifically, in the substrate transport device 100, the first transport region TR1 and the second transport region TR2 formed inside the housing 110 are two transport regions separated by a first detection region DR1 formed by the first detection unit 130 inside the housing 110. In the substrate transport device 100, for example, the transport mechanism 120 loads the substrate W from the second chamber C2 along the loading direction D1, then transports the substrate W from the first transport region TR1 to the second transport region TR2 along the transport direction D, and then unloads the substrate W to the first chamber C1 along the unloading direction D2 (see the dotted line and arrow in FIG. 6 ). During the transport of the substrate W, the substrate W passes through the first detection region DR1, and the state of the substrate W is detected by the first detection unit 130. For example, the transport direction D from the first transport region TR1 to the second transport region TR2 intersects (e.g., is perpendicular to) the loading direction D1 and the unloading direction D2 of the substrate W. In another embodiment not shown, the substrate transport device 100 transports the substrate W from the first chamber C1 using the transport mechanism 120, then transports the substrate W along the transport direction D from the first transport region TR1 to the second transport region TR2, and then transports the substrate W out to the second chamber C2.In the process of transporting the substrate W, the substrate W can also pass through the first detection region DR1, and the state of the substrate W can be detected by the first detection unit 130.

[0026] Furthermore, in order to improve the detection accuracy of the first detector 130, it is preferable that each of the first transport region TR1 and the second transport region TR2 inside the casing 110 has a size sufficient to include at least the entire substrate W. More specifically, the first transport region TR1 is a region large enough to allow the transport mechanism 120 to hold the substrate W before it is transported from the first transport region TR1 to the second transport region TR2 so that it does not overlap with the first detection region DR1, or a region having an area large enough to include at least the entire substrate W when the casing 110 is viewed in a plan view. Similarly, the second transport region TR2 is a region large enough to allow the transport mechanism 120 to hold the substrate W after it has been transported from the first transport region TR1 to the second transport region TR2 so that it does not overlap with the first detection region DR1, or a region having an area large enough to include at least the entire substrate W when the casing 110 is viewed in a plan view. For example, when applied to a substrate transport system 50 having a plurality of first chambers C1, the first detection unit 130 of the substrate transport device 100 is installed between the openings O1 communicating with the plurality of first chambers C1, and forms a first transport region TR1 and a second transport region TR2 on the left and right sides within the housing 110, each large enough to accommodate at least the entire substrate W. This allows the entire substrate W to pass through the first detection region DR1 when transporting the substrate W along the transport direction D from the first transport region TR1 to the second transport region TR2, and the first detection unit 130 can detect the state of the substrate W over the entire surface, eliminating missed detections and improving reliability.

[0027] In another embodiment (not shown), changes from the substrate transport apparatus 100 are listed below with reference to FIG. 6 . Based on the substrate transport apparatus 100 of FIG. 6 , the first detector 130 provided on the first wall 114a may be formed to extend obliquely toward the opposing second wall 114b, and may obliquely intersect with the transport direction D from the first transport region TR1 to the second transport region TR2. Each of the first transport region TR1 and the second transport region TR2 need only be large enough to include at least the entire substrate W. Furthermore, the first detector 130 does not have to be fixed to the first wall 114a adjacent to the first chamber C1 of the housing 110. For example, the first detector 130 may be provided on an upper or lower wall inside the housing 110, and the first detection region DR1 may be formed to extend in the vertical direction Z. It is also possible to provide the first detection unit 130 on the third wall 114c or the fourth wall 114d inside the housing 110, and form the first detection region DR1 to extend in the left-right direction X. The first detection unit 130 only needs to be able to detect the state of the substrate W as it passes through the first detection region DR1 while being transported along the transport direction D from the first transport region TR1 to the second transport region TR2.

[0028] 7 , in the substrate transfer device 100, the opening O1 formed in the first wall portion 114a and the opening O2 formed in the second wall portion 114b are at different height positions in the vertical direction Z of the housing 110. The first detection region DR1 formed by the first detection unit 130 extends from the first wall portion 114a toward the second wall portion 114b and is formed so as to be located between the opening O1 formed in the first wall portion 114a and the opening O2 formed in the second wall portion 114b. For example, when the height position of the opening O1 formed in the first wall portion 114a is lower than the height position of the opening O2 formed in the second wall portion 114b, the first detection unit 130 is provided at a height position corresponding to the center between the upper and lower edges of the opening O1, in a location between multiple openings O1 that are arranged side by side in the left-right direction X on the first wall portion 114a and at the same height position, and forms a first detection region DR1 toward a height position corresponding to the lower edge of the opening O2 formed in the second wall portion 114b, thereby forming the first detection region DR1 between the opening O1 and the opening O2.

[0029] 7 , in the substrate transport device 100, the second chamber C2 serving as the processing device 54 has a mounting table P. The mounting table P can support at least one substrate W during the processing step of the substrate W. An opening O2 for communication with the second chamber C2 of the housing 110 is located to correspond to the position of the mounting table P (e.g., the mounting table P is located near the upper edge of the opening O2). Furthermore, the first chamber C1 serving as the container H has multiple slots S. The slots S can support the substrates W stored in the container H. An opening O1 for communication with the first chamber C1 of the housing 110 is located to correspond to the positions of the multiple slots S (e.g., the multiple slots S are located so as to be aligned in the vertical direction Z from the upper edge to the lower edge of the opening O1). The transport mechanism 120 transports the substrate W removed from the opening O1 to a height at which the first detection unit 130 is located, so that the substrate W passes through a first detection region DR1 formed by the first detection unit 130. Specifically, the transport mechanism 120 moves the substrate W in the vertical direction Z from the height position of the opening O1 where the substrate W is loaded / unloaded to the height position of the first detector 130. Similarly, the transport mechanism 120 transports the substrate W taken out from the opening O2 to the height position where the first detector 130 is located, so that the substrate W passes through a first detection region DR1 formed by the first detector 130. Specifically, the transport mechanism 120 moves the substrate W in the vertical direction Z from the height position of the opening O2 where the substrate W is loaded / unloaded to the height position of the first detector 130.

[0030] Therefore, when the height of the substrate W loading / unloading position at the opening O1 is far from the height of the first detector 130, the arm 124 must move up and down in the vertical direction Z for a longer distance, resulting in a longer cycle time and a loss of throughput. Similarly, when the height of the substrate W loading / unloading position at the opening O2 is far from the height of the first detector 130, the arm 124 must move up and down in the vertical direction Z for a longer distance, resulting in a longer cycle time and a loss of throughput. Therefore, in the embodiment of FIG. 7 , by providing the first detection region DR1 between the openings O1 and O2, the lifting distance is shorter when a substrate W is removed from either opening and transported to the position of the first detector 130 compared to when the first detection region DR1 is not between the openings O1 and O2 (e.g., the position shown in FIG. 9 ). This shortens the cycle time of the substrate transport operation and improves throughput.

[0031] Specifically, the first detector 130 is preferably installed so as to form a first detection region DR1 between the mounting table P, which is installed near the upper edge of the opening O2, and the lower edge of the opening O1 (e.g., in the installation range SR1 shown in FIG. 7 ). As an example, as shown in FIG. 7 , the first detection region DR1 is provided between a height position corresponding to approximately the center of the opening O1 and a height position corresponding to approximately the lower edge of the opening O2. Therefore, when a substrate W loaded from the mounting table P through the opening O2 is unloaded through the opening O1 into a predetermined slot S, the transport mechanism 120 performs lifting and lowering operations, namely, descending from the height position of the mounting table P to the height position of the first detector 130 and ascending / lowering from the height position of the first detector 130 to the height position of one of the multiple slots S (see the dotted lines and arrows in FIG. 7 ). Similarly, when a substrate W loaded from one of the slots S via the opening O1 is unloaded onto the mounting table P via the opening O2, the transport mechanism 120 performs lifting and lowering operations, namely, lifting / lowering from the height position of one of the slots S to the height position of the first detector 130, and lifting from the height position of the first detector 130 to the height position of the mounting table P. Because the first detection region DR1 is formed between the openings O1 and O2, even when the substrate W is removed from either opening and transported to the height position of the first detector 130, the substrate W does not move to a height position below the lower opening O1 or above the upper opening O2, and the lifting distance is shortened. This shortens the cycle time of the substrate transport operation, enabling improved throughput performance.

[0032] Referring to another comparative embodiment, a first detection region DR1 may be set between the mounting table P, which is installed near the upper edge of the opening O2, and the upper part of the opening O1 (e.g., the topmost slot S) (e.g., in the installation range SR2 shown in FIG. 8 ) with respect to the height position of the first detector 130. As an example, as shown in FIG. 8 , the first detection region DR1 is set between a height position above the upper edge of the opening O1 and a height position approximately corresponding to the upper edge of the opening O2. Therefore, when a substrate W loaded from the mounting table P through the opening O2 is to be unloaded to a predetermined slot S through the opening O1, the transport mechanism 120 moves from the height position of the mounting table P to the height position of the first detector 130 (approximately the same height), and then moves up and down from the height position of the first detector 130 to the height position of one of the multiple slots S (see the dotted lines and arrows in FIG. 8 ). Similarly, when a substrate W is loaded from one of the slots S via the opening O1 and then unloaded onto the mounting table P via the opening O2, the transport mechanism 120 performs a lifting operation, lifting it from the height position of one of the slots S to the height position of the first detector 130, and then moving it from the height position of the first detector 130 to the height position (approximately the same height) of the mounting table P. Because the first detection region DR1 is formed between the openings O1 and O2, even when the substrate W is removed from either opening and transported to the height position of the first detector 130, the substrate W will not move to a height position below the lower opening O1 or above the upper opening O2, and the lifting distance is therefore short. This shortens the cycle time of the substrate transport operation and improves throughput performance.

[0033] In addition, in the vertical direction Z, the first detection unit 130 may be installed so as to form a first detection region DR1 (in an installation range SR1) between the mounting table P installed near the upper edge of the opening O2 and the lower edge of the opening O1, as shown in FIG. 7 , or may be installed so as to form the first detection region DR1 (in an installation range SR2) between the mounting table P installed near the upper edge of the opening O2 and an upper portion of the opening O1 (e.g., the top slot S), as shown in FIG. 8 . Of these, it is preferable that the first detection unit 130 be installed so as to form the first detection region DR1 at the same height as the mounting table P. For example, when the mounting table P is installed near the upper edge of the opening O2, the first detection region DR1 is formed above the opening O1 and near the upper edge of the opening O2, as shown in FIG. 8 . In this case, the first detection region DR1 may be said to be formed in the installation range SR2 between the mounting table P and the upper part of the opening O1 (e.g., the top slot S), or in the installation range SR1 between the mounting table P and the lower edge of the opening O1. When the first detection region DR1 is formed at the same height as the mounting table P, no lifting or lowering occurs when the mounting table P moves between the height position of the first detector 130 and the height position of the opening O1, regardless of the distance from the height position of the first detector 130 to the height position of the opening O1. Therefore, when the transport mechanism 120 transports a substrate W loaded from the mounting table P or a predetermined slot S to the predetermined slot S or the mounting table P, reciprocating lifting and lowering in the vertical direction Z can be avoided, and the lifting distance can be shortened. This shortens the cycle time of the substrate transport operation and improves throughput. Similarly, when the mounting table P is installed near the lower edge of the opening O2, the first detection region DR1 may be formed at the same height as the mounting table P. However, the present invention is not limited to this.

[0034] In contrast, referring to a comparative embodiment opposite to those shown in FIGS. 7 and 8 , as shown in FIG. 9 , the first detection unit 130 is installed so as to form a first detection region DR1 below the opening O1, rather than between the openings O1 and O2. In this case, regardless of which opening the transport mechanism 120 loads the substrate W through, it must move the substrate W to the height of the first detection unit 130, which is installed below the openings O1 and O2. In other words, the lifting distance of the transport mechanism 120 during the substrate transport operation is long (see the dotted lines and arrows in FIG. 9 ). Therefore, it is preferable to avoid forming the first detection region DR1 at a height below the opening O1 or above the opening O2. However, the present invention is not limited to this.

[0035] In another embodiment not shown, changes from the substrate transport apparatus 100 are listed below with reference to FIG. 7 . Regarding the arrangement of the first detection unit 130, the first detection region DR1 does not have to be formed to extend horizontally. For example, based on the substrate transport apparatus 100 of FIG. 7 , the first detection region DR1 may be formed to extend obliquely toward the second wall portion 114b. For example, the first detection region DR1 is formed to extend upward from a height position corresponding to the lower edge of the opening O1 located lower to a height position corresponding to the lower edge of the opening O2 located higher. Therefore, when transporting the substrate W, the substrate W passes through the first detection region DR1, and the state of the substrate W can be detected by the first detection unit 130. Although the embodiment in which the first detection region DR1 is formed to be located between the openings O1 and O2 which are at different heights has been described, in other embodiments not shown, the openings O1 and O2 may be at the same height, or the first detection region DR1 may be formed at a position away from the openings O1 and O2 in the vertical direction Z (for example, the first detection region DR1 is formed at a position below the lower edges of the openings O1 and O2). When transporting the substrate W, it is only necessary that the substrate W passes through the first detection region DR1 and the state of the substrate W can be detected by the first detector 130.

[0036] More specifically, the first detection unit 130 detects the state of the transported substrate W. As an example, the first detection unit 130 detects the distance from the transport mechanism 120 to the upper surface of the substrate W as the height T1 of the transported substrate W. For example, as shown in FIGS. 4, 6, and 7, when the substrate W transported by the transport mechanism 120 is transported along the transport direction D from the first transport region TR1 to the second transport region TR2, it passes through a first detection region DR1 formed by the first detection unit 130, and the height T1 of the transported substrate W is detected by the detection light emitted by the first detection unit 130. For example, as shown in FIG. 4, the height T1 of the substrate W is the distance from the hand lower surface 126b of the robot hand 126 of the transport mechanism 120 to the upper surface of the substrate W. Preferably, the height T1 of the substrate W is detected by the first detection unit 130 while the substrate W is being transported while held by a plurality of holders 129 (shown in FIGS. 3 and 4) arranged on the upper surface of the robot hand 126 of the transport mechanism 120. Specifically, the first detector 130 detects the position of a shadow cast by the robot hand 126 holding the substrate W, which blocks the range of the detection light emitted from the first light emitter 132, as a light reception result of the first light receiver 134, and thereby detects the distance between the upper surface of the substrate W and the hand lower surface 126b of the robot hand 126 holding the substrate W as a height. That is, the first detector 130 is a sensor for detecting the state (e.g., height T1) of the substrate W being transported. Then, based on the detection result (e.g., height T1 of the substrate W), the transport mechanism 120 adjusts the height of the robot hand 126 holding the substrate W, for example, by raising and lowering the arm 124 in the vertical direction Z.

[0037] Specifically, when the transport mechanism 120 transports the substrate W into the container H, the robot hand 126 is inserted into the gap between the slots S of the container H. However, as described above, the spacing between the slots S has become narrower than before due to the narrower pitch, and in addition, if the substrate W is significantly warped, there is a risk of interference between the substrate W or the robot hand 126 and the slot S or another substrate W placed in the slot S. To prevent this interference, as shown in Figure 2, the substrate transport apparatus 100 is provided with a control unit C (shown in Figure 2) that controls the transport mechanism 120. The control unit C drives the arm unit 124 in accordance with the height T1 of the substrate W detected by the first detection unit 130 to raise or lower the robot hand 126 holding the substrate W in the vertical direction Z to a height position where interference does not occur, thereby adjusting the height position of the robot hand 126. More specifically, the controller C receives information such as the height and gap of each slot S of the container H measured in advance by another sensor (not shown), compares this information with the height T1 of the substrate W, and adjusts the height position of the robot hand 126 so as to prevent interference. If the controller C determines that the substrate W is significantly warped and that interference cannot be avoided even if the height position of the robot hand 126 is adjusted, the controller C outputs a signal to the transport mechanism 120 to stop the transfer of the substrate W into the container H as an error. The substrate W whose transfer into the container H has been stopped is removed from the substrate transport device 100 by an operator, or is transported by the transport mechanism 120 to a recovery unit (not shown) in the housing 110. The operation of the controller C is as described below. Furthermore, detecting the state of the substrate W may not only include detecting the height T1 of the substrate W, but may also include detecting the thickness T2 of the substrate W or the amount of warping of the substrate W relative to the robot hand 126 (for example, the amount of warping T3 of the substrate W shown in FIG. 5 ). However, the present invention is not limited to this.

[0038] 10 to 15, other variations of the substrate transfer apparatus 100 applied to the substrate transfer system 50 will be described. Specifically, while the substrate transfer apparatus 100 shown in Fig. 6 is installed between a plurality of first chambers C1 and one second chamber C2, the substrate transfer apparatus 100A shown in Fig. 10 is installed between a plurality of (e.g., two) first chambers C1 and a plurality of (e.g., two) second chambers C2. Therefore, the substrate transfer apparatus 100A communicates with the first chamber C1 through a plurality of openings O1 provided in the first wall portion 114a, and communicates with the second chamber C2 through a plurality of openings O2 provided in the second wall portion 114b. As an example, the first detection region DR1 formed by the first detection unit 130 of the substrate transport device 100A is provided between multiple openings O1 in the first wall portion 114a (for example, at a height position corresponding to the upper or lower edge of the opening O1), as shown in Figure 10, and is formed to extend toward between multiple openings O2 provided in the second wall portion 114b, which is the wall portion opposite the first wall portion 114a, and extends horizontally (it may also extend diagonally in the vertical direction Z rather than horizontally).

[0039] Similarly, the substrate transfer apparatus 100B shown in Figure 11 is installed between one first chamber C1 and one second chamber C2. Therefore, the substrate transfer apparatus 100B is connected to the first chamber C1 through one opening O1 provided in the first wall portion 114a and to the second chamber C2 through one opening O2 provided in the second wall portion 114b. As an example, the first detection region DR1 formed by the first detection unit 130 of the substrate transfer apparatus 100B is provided near the opening O1 of the first wall portion 114a (e.g., at a height position corresponding to the upper or lower edge), as shown in Figure 11, and is formed to extend toward the vicinity of the opening O2 provided in the second wall portion 114b, which is the wall portion opposing the first wall portion 114a, and extends horizontally (or may extend obliquely in the vertical direction Z instead of horizontally).

[0040] As can be seen from this, the number of first chambers C1 and second chambers C2 used in the substrate transfer system 50 may be adjusted as needed (it is also possible for both to have multiple chambers). Furthermore, the number and positions of the openings O1 and O2 in the substrate transfer devices 100-100B used in the substrate transfer system 50 may be adjusted depending on the number of first chambers C1 and second chambers C2. The first detection unit 130 provided in the substrate transfer devices 100-100B may adjust the formation position and range of the first detection region DR1 depending on the number and positions of the openings O1 and O2. The present invention does not limit the number of first chambers C1 and second chambers C2 used in the substrate transfer system 50, the number and positions of the openings O1 and O2 provided in the substrate transfer devices 100-100B used in the substrate transfer system 50, the position of the first detection unit 130 provided in the substrate transfer devices 100-100B, or the formation position and range of the first detection region DR1.

[0041] Furthermore, the substrate transport devices 100 to 100B shown in Figures 6, 10 and 11 are installed between opposing first and second chambers C1 and C2, and the first detection region DR1 formed by the first detection unit 130 provided on the first wall portion 114a is formed to extend from the first wall portion 114a to the second wall portion 114b opposite the first wall portion 114a, while the substrate transport device 100C shown in Figure 12 is installed between the first and second chambers C1 and C2 which are installed perpendicular to each other. In this case, in the substrate transfer device 100C, the first wall 114a, which has an opening O1 communicating with the first chamber C1, and the second wall 114b, which has an opening O2 communicating with the second chamber C2, are installed perpendicular to each other, so that the first detection region DR1 formed by the first detection unit 130 provided on the first wall 114a is formed to extend from the first wall 114a toward the other wall 114 opposite the first wall 114a. For example, the first light-emitting unit 132 is provided near the opening O1 of the first wall 114a (at a location such as the lower edge), and the first light-receiving unit 134 is provided on the other wall 114 opposite the first wall 114a. Among them, the first detection region DR1 may be formed to extend along the front-rear direction Y (perpendicular to the conveying direction D), or may be formed to extend obliquely relative to the front-rear direction Y (intersecting the conveying direction D). Similarly, the first detection region DR1 may be formed to extend horizontally, or may be formed to extend obliquely relative to the up-down direction Z.

[0042] 13 is installed on the same side of the first chamber C1 and the second chamber C2, which are installed side by side in the left-right direction X. In this case, in the substrate transfer device 100D, the first wall portion 114a, which has an opening O1 communicating with the first chamber C1, and the second wall portion 114b, which has an opening O2 communicating with the second chamber C2, are installed side by side in the left-right direction X. Therefore, the first detection region DR1 formed by the first detector 130 provided on the first wall portion 114a is formed to extend from the first wall portion 114a toward the other wall portion 114 that faces the first wall portion 114a. For example, the first light-emitting unit 132 is provided in a location (such as a lower edge) of the first wall 114a close to the second wall 114b, and the first light-receiving unit 134 is provided on another wall 114 facing the first wall 114a. The first detection region DR1 may be formed to extend along the front-rear direction Y (orthogonal to the conveying direction D) or may be formed to extend obliquely relative to the front-rear direction Y (intersecting the conveying direction D). Similarly, the first detection region DR1 may be formed to extend horizontally or may be formed to extend obliquely relative to the up-down direction Z.

[0043] As can be seen from this, the first chamber C1 and the second chamber C2 used in the substrate transfer system 50 do not need to be installed opposite each other. The positions of the first chamber C1 and the second chamber C2 may be adjusted as needed (it is also possible to have multiple chambers for both). Furthermore, the substrate transfer devices 100-100D used in the substrate transfer system 50 may adjust the positions of the first wall portion 114a and the second wall portion 114b depending on the positions of the first chamber C1 and the second chamber C2. The first detection unit 130 provided on the first wall portion 114a of the substrate transfer devices 100-100D preferably forms a first detection region DR1 extending from the first wall portion 114a to the other wall portion 114 opposite the first wall portion 114a. It is not necessary to form the first detection region DR1 extending from the first wall portion 114a to the second wall portion 114b. However, the first detection region DR1 may be formed obliquely from the first wall portion 114a toward the second wall portion 114b that does not face the first wall portion 114a. The present invention does not limit the positions of the first chamber C1 and the second chamber C2 used in the substrate transfer system 50, the positions of the first wall portion 114a and the second wall portion 114b provided in the substrate transfer devices 100 to 100D used in the substrate transfer system 50, the position of the first detection unit 130 provided in the substrate transfer devices 100 to 100D, or the formation position or range of the first detection region DR1.

[0044] 6 and 10 to 13 have four walls 114, including a first wall 114a and a second wall 114b, and form a rectangular internal space in the housing 110 when viewed from above, whereas the substrate transport device 100E shown in Fig. 14 has six walls 114, including one first wall 114a having an opening O1 communicating with one first chamber C1 and multiple (e.g., two) second walls 114b having openings O2 communicating with multiple second chambers C2, and form a hexagonal internal space in the housing 110 when viewed from above. In this case, in the substrate transport device 100E, the first detection region DR1 formed by the first detector 130 provided on the first wall 114a is formed to extend from the first wall 114a toward the center of the housing 110. For example, the first light-emitting unit 132 is provided at a corner (such as a lower edge) of the first wall 114a, and the first light-receiving unit 134 is provided at a central portion facing the first wall 114a of the housing 110. In other embodiments not shown, the first detection region DR1 formed by the first detection unit 130 provided on the first wall 114a may be formed to extend from the first wall 114a toward the second wall 114b facing the first wall 114a, or may be formed to extend from the first wall 114a toward a space between the two second walls 114b, or may be formed to extend from another wall 114 other than the first wall 114a toward the central portion of the housing 110 or another wall 114.

[0045] As can be seen from this, the housing 110 provided in the substrate transfer devices 100-100E does not need to have an internal space that is rectangular when viewed from above. The housing 110 may have an internal space that is another shape depending on the number and arrangement of the walls 114. In other embodiments not shown, the housing 110 may have an internal space that is triangular when viewed from above using three walls 114, or may have an internal space that is circular when viewed from above using a single wall 114 formed as a continuous curved surface. Furthermore, the first detection region DR1 formed by the first detection unit 130 does not need to be completely separated into a first transfer region TR1 and a second transfer region TR2 within the housing 110. A first transport region TR1 and a second transport region TR2 are defined in the spaces on opposite sides of the first detection region DR1, and the first transport region TR1 and the second transport region TR2 are formed to sandwich the first detection region DR1. When a substrate W is transported along the transport direction D from the first transport region TR1 to the second transport region TR2, the substrate W simply passes through the first detection region DR1 and the state of the substrate W is detected by the first detection unit 130. The present invention does not limit the configuration of the housing 110 (such as the number and positions of the wall portions 114) or the position and range of the first detection region DR1.

[0046] Furthermore, in the substrate transfer apparatus 100 shown in FIG. 6 , the transfer mechanism 120 itself is installed so as to be movable between the first chamber C1 and the second chamber C2 by the movable body 116 and the guide structure 118 (as shown in FIGS. 2 and 3 ) (i.e., a self-propelled type). In another embodiment not shown, in the substrate transfer apparatus 100, the transfer mechanism 120 itself is installed so as not to be movable between the first chamber C1 and the second chamber C2 (i.e., a stationary type). That is, when a self-propelled type transfer mechanism 120 is adopted, the substrate transfer apparatus 100 has the movable body 116 and the guide structure 118 installed inside the housing 110, as shown in FIG. 6 . In this case, the transfer mechanism 120 itself moves in the left-right direction X by the movable body 116 and the guide structure 118 in conjunction with the extension and retraction, elevation and rotation of the arm unit 124 and the main body unit 122, and can transfer substrates W between the first chamber C1 and the second chamber C2. This avoids the need for a complex structure for the arm unit 124. In contrast, when a stationary transport mechanism 120 is employed, the substrate transport device 100 omits structures such as the movable body 116 and guide structure 118 within the housing 110, and the transport mechanism 120 is directly fixed to the housing 110 (e.g., the main body 122 of the transport mechanism 120 is fixed to the bottom of the housing 110). In this case, the transport mechanism 120 transports substrates between the first chamber C1 and the second chamber C2 by extending, lowering, and rotating the arm 124, which has multiple joints, around the main body 122. This avoids the need for a complex structure for the housing 110. The substrate transport devices 100A-100E shown in FIGS. 10-14 can also be configured as either a self-propelled type or a stationary type transport mechanism 120. However, the present invention is not limited to this.

[0047] In the substrate transport device 100 shown in FIG. 6 , the first detection unit 130 is located between two adjacent openings O1 in the first wall 114a, and the first detection region DR1 formed by the first detection unit 130 forms a first transport region TR1 and a second transport region TR2 that are approximately the same size. In other embodiments, the position of the first detection unit 130 and the sizes of the first transport region TR1 and the second transport region TR2 are not limited to these. As an example, as shown in FIG. 15 , in a substrate transport device 100F, the first wall 114 of the housing 110 is installed so as to extend elongatedly toward one side (e.g., the right side), and the first detection unit 130 is located at a position on one side of the openings O1 in the first wall 114a (e.g., the end on the right side), forming the first detection region DR1 at a position on the one side of the openings O1. The size of the first transport region TR1 is larger than the size of the second transport region TR2. In this case, the substrate W is transported by the transport mechanism 120 along the transport direction D from the first transport region TR1 to the second transport region TR2, and the first detection unit 130 can detect the state of the substrate W as the substrate W transported along the transport direction D from the first transport region TR1 to the second transport region TR2 passes through the first detection region TR1. As can be seen from this, the installation positions of the first detection unit 130 and the first detection region DR1, and the sizes of the first transport region TR1 and the second transport region TR2 separated by the first detection region DR1, can be adjusted as necessary. However, the present invention is not limited to this.

[0048] 2 and 16 , in the present embodiment, the substrate transport device 100 is provided with the first detector 130 for detecting the state of the substrate W (such as the height T1, thickness T2, and warpage T3 of the substrate W). However, the substrate transport device 100 may further include a second detector 140 provided inside the housing 110 for detecting the position of the substrate W transported by the transport mechanism 120. As an example, the second detector 140 may use a line sensor, similar to the first detector 130. The second detector 140 is provided in the second wall 114 b, which is the wall 114 adjacent to the second chamber C2 of the housing 110, and is provided in the housing 110 corresponding to the opening O2 of the processing device 54 (second chamber C2). The second detector 140 forms a second detection region DR2 extending in the vertical direction Z of the housing 110, and detects the position of the substrate W in the horizontal direction intersecting the vertical direction Z. Therefore, the first detection region DR1 formed by the first detection unit 130 and the second detection region DR2 formed by the second detection unit 140 are formed to intersect (e.g., perpendicular to) each other when viewed from the side of the housing 110. As a result, unlike the role of the first detection region DR1, the second detection region DR2 is used to detect the position of the substrate W in the left-right direction X when the substrate W is transported to a substrate placement position (e.g., the placement part P shown in FIG. 7 ) in the processing apparatus 54 (second chamber C2) (i.e., when the substrate W is unloaded from inside the housing 110 to the substrate placement position (placement part P) in the second chamber C2 through the opening O2). Specifically, the second detection region DR2 detects the position of the edge of the substrate W relative to the substrate placement position (placement part P). The substrate placement position (placement part P, slot S) is the position where the substrate W is placed inside the first chamber C1 or the second chamber C2. As an example, the substrate placement position (slot S) in the first chamber C1 is an inner position on the side wall of the FOUP where the slot S, among the multiple slots formed in the FOUP, that forms the same horizontal plane supports the substrate W, and the substrate placement position (placement portion P) in the second chamber C2 is a position where a placement table is installed for temporarily placing the substrate W when transporting the substrate W between the housing 110 and the processing device 54 (second chamber C2), but the present invention is not limited to this.

[0049] As an example, the second detection unit 140 includes a second light-emitting unit 142 (second light-emitting unit) that emits detection light to form the second detection region DR2 and a second light-receiving unit 144 (second light-receiving unit) that receives the detection light. At least one of the second light-emitting unit 142 or the second light-receiving unit 144 is provided on the second wall 114b adjacent to the second chamber C2 of the housing 110. For example, the second light-emitting unit 142 is provided on an upper edge and a corner on a side of the opening O2 provided in the second wall 114b, and the second light-receiving unit 144 is provided on a lower edge and a corner on a side of the opening O2 provided in the second wall 114b. The second light emitter 142 emits detection light from above downward along the side of the opening O2, and the second light receiver 144 receives the detection light, thereby forming a second detection region DR2 extending in the vertical direction Z along the side of the opening O2. In this case, the second detection region DR2 is formed at a position that does not overlap with the transport path of the substrate W being transported by the transport mechanism 120 from inside the housing 110 through the opening O2 to the substrate placement position (placement part P) of the second chamber C2. Therefore, the second detection region DR2 does not interfere with the substrate W being transported to the substrate placement position (placement part P) of the second chamber C2. However, the present invention is not limited to this. The second detection region DR2 may also be formed at a position that overlaps with the transport path of the substrate W being transported by the transport mechanism 120 from inside the housing 110 through the opening O2 to the substrate placement position (placement part P) of the second chamber C2.

[0050] The second detection region DR2 is preferably used to detect the position of the edge of the substrate W on one side in the left-right direction X of the substrate W when the substrate W is transported to the substrate placement position (reception part P) of the processing apparatus 54 (second chamber C2). In other words, the second detection unit 140 uses the second light receiving unit 144 to detect the position of a shadow or a change in light intensity caused by the substrate W being transported by the transport mechanism 120 being positioned in the second detection region DR2 and blocking part of the detection light emitted from the second light emitter 142. This detects the relative position of the substrate W in the left-right direction X with respect to the transport mechanism 120 (specifically, the robot hand 126). Specifically, the second detection unit 140 detects substrate misalignment in the left-right direction X (corresponding to the misalignment between the center line L1 of the robot hand 126 and the center line L2 of the substrate W), which cannot be detected in the first detection region DR1. For example, the operation of bringing the substrate W closer to the second detection region DR2 may be an orthogonal operation in which the robot hand 126 approaches a predetermined position in the front-rear direction Y relative to the opening O2 (moving in the front-rear direction Y) and then moves in the left-right direction X to the second detection region DR2, or an operation in which the robot hand 126 moves (including diagonal movement) from a predetermined position away from the opening O2 to the coordinate position of the second detection region DR2. Furthermore, detection of the substrate W in the second detection region DR2 may be performed by the second detection unit 140 calculating the center position of the substrate W from the amount of detection light blocked by the substrate W in the second detection region DR2, or by identifying the position where the detection light is switched on and off as the edge position of the substrate W and calculating the center position of the substrate W from that position. Based on the detection result, the substrate W is loaded at a position where the center line L3 of the opening O2 and the center line L2 of the substrate W held by the robot hand 126 are aligned (for example, the operation of the transport mechanism 120 is controlled by the control unit C described below).

[0051] More specifically, as an example of correction by the second detection unit 140, the position of the robot hand 126 in the left-right direction X is corrected by the sum of a predetermined value a and a shielding amount b, so that the substrate W held by the robot hand 126 can be transported into the second chamber C2 without a collision. The predetermined value a is the distance between the end of the second detection region DR2 (here, the left end) and the end of the receiver P (here, the right end), and is a value uniquely determined by the layout of the substrate transport apparatus 100. Therefore, depending on the arrangement of the second chamber C2 relative to the second detection region DR2, the predetermined value a may become 0. Furthermore, the shielding amount b is the distance between the edge of the substrate W (here, the right edge) and the end of the second detection region DR2 (here, the left end), and is a value determined by the range of the detection light forming the second detection region DR2 that is blocked by the substrate W. As an example of correction by the second detection unit 140, the position of the robot hand 126 in the left-right direction X is corrected by the sum of the shielding amount b and a predetermined value a, so that the substrate W held by the robot hand 126 can be transferred to the second chamber C2 without a collision. However, in the case of the above correction, the actual center position (center line L2) of the substrate W and the center position (center line L3) of the receiver P (second chamber C2) do not necessarily coincide, depending on the trade-off between the size of the substrate W and the size of the receiver P. Furthermore, although the second detection unit 140 is applied to the second chamber C2 side, in other embodiments not shown, the second detection unit 140 can be installed on the first chamber C1 side and substantially the same operation can be performed. In this case, it is preferable that the second detection region DR2 be formed at a position that does not overlap with the transport path of the substrate W being transported by the transport mechanism 120 from the interior of the housing 110 through the opening O1 to the substrate placement position (slot S) in the first chamber C1 (i.e., the second detection region DR2 does not interfere with the substrate W being transported to the substrate placement position (slot S) in the first chamber C1), but the present invention is not limited to this. Furthermore, the second detection unit 140 may employ a vision sensor such as a reflective optical line sensor, a line sensor camera, or an area sensor camera, and the structure and position of the second detection unit 140, the position and range of the second detection region DR2 formed by the second detection unit 140, or whether or not the second detection unit 140 is installed may be adjusted as necessary. The present invention is not limited to these.

[0052] 6 and 17, a substrate transfer method in this embodiment for transferring a substrate W between the first chamber C1 and the second chamber C2 by the substrate transfer device 100 will be described. As an example, the substrate transfer method is suitable for transferring a substrate W between the first chamber C1 and the second chamber C2 by the substrate transfer device 100. The substrate transfer method can also transfer multiple substrates W by repeating transfer from the first chamber C1 to the second chamber C2 and from the second chamber C2 to the first chamber C1. The substrate transfer method includes the following steps. Loading step S01: Loading the substrate W into the housing 110. Transporting step S02: Transporting the substrate W into the housing 110. First detecting step S03: Detecting the state of the substrate W. Second detecting step S04: Detecting the position of the substrate W in the horizontal direction intersecting the vertical direction Z. Unloading step S05: Unloading the substrate W from the housing 110. Of these, the transporting step S02 includes the following steps. First transport step S021: The substrate W is transported along the transport direction D from the first transport region TR1 to the second transport region TR2. Second transport step S022: The substrate W is transported toward the second detection region DR2. Therefore, the first detection step S03 is performed in the first transport step S021 to detect the state of the substrate W, and the second detection step S04 is performed in the second transport step S022 to detect the position of the substrate W in the horizontal direction.

[0053] More specifically, in the loading step S01, the substrate W is loaded into the housing 110. For example, as shown in FIG. 6 , the transport mechanism 120 provided inside the housing 110 inserts the robot hand 126 into the processing device 54 (as the second chamber C2) through the opening O2 by moving the arm unit 124 (shown in FIG. 3 ), holds the substrate W with the holder 129, and returns the robot hand 126 to the housing 110 through the opening O2 by moving the arm unit 124 (e.g., moves the robot hand 126 toward the housing 110 along the loading direction D1), and loads the substrate W held on the upper surface of the robot hand 126 by the holder 129 into the housing 110. As a result, the transport mechanism 120 can load the substrate W from the processing device 54 (as the second chamber C2) into the housing 110. However, in the loading step S01, the substrate W can also be loaded into the housing 110 from the first chamber C1. However, the present invention is not limited to this.

[0054] Next, the transport step S02 includes all operations for transporting the substrate W inside the housing 110 between the first chamber C1 and the second chamber C2. The transport step S02 includes a first transport step S021 and a second transport step S022. The first transport step S021 transports the substrate W along the transport direction D from the first transport region TR1 to the second transport region TR2. The second transport step S022 transports the substrate W toward the second detection region DR2. Specifically, in the transport step S02 (including the first transport step S021 and the second transport step S022), the substrate W held by the robot hand 126 is transported inside the housing 110 by movement of the main body 122 (shown in FIG. 3 ) of the transport mechanism 120. Of these, the first transfer region TR1 is a region located at the end of a path for loading the substrate W from the second chamber C2 or the first chamber C1 into the housing 110, and the second transfer region TR2 is a region located at the start of a path for loading the substrate W into the first chamber C1 or the second chamber C2 from the interior of the housing 110. Therefore, in the first transfer step S021, the substrate W is transported from the first transfer region TR1 facing the opening O2 or opening O1 through which the substrate W should pass in the load step S01 to the second transfer region TR2 facing the opening O1 or opening O2 through which the substrate W should pass in the unload step S05.

[0055] The first detection step S03 detects the state of the substrate W during the first transport step S021. The first detection unit 130 executes the first detection step S03 to detect the state of the substrate W when the substrate W, transported along the transport direction D from the first transport region TR1 to the second transport region TR2, passes through the first detection region DR1 located between the first transport region TR1 and the second transport region TR2. That is, the first detection step S03 is executed during the first transport step S021, and the first detection unit 130 detects the state of the substrate W being transported. For example, in the first transport step S021, the first detection step S03 is executed when the substrate W transported by the transport mechanism 120 passes through the first detection region DR1 along the transport direction D, and the first detection unit 130 detects the state of the substrate W. As an example, in the first transport step S021, it is preferable that the transport direction D from the first transport region TR1 to the second transport region TR2 intersects (e.g., is perpendicular to) the load direction D1 and the unload direction D2 of the substrate W, but the present invention is not limited to this.

[0056] 6 and 7 , in this embodiment, the first detection step S03 is performed during the first transport step S021. Therefore, the first detection step S03 detects the state of the substrate W (such as the height T1, thickness T2, and amount of warpage T3 of the substrate W) from one edge of the substrate W to the other edge of the substrate W. Specifically, as shown in FIGS. 4 and 5 , the first detection step S03 can detect the state of the substrate W (such as the height T1, thickness T2, and amount of warpage T3 of the substrate W) based on the detected amount of the belt-shaped detection light L. For example, in the first detection step S03, the distance from the transport mechanism 120 to the upper surface of the substrate W (for example, from the lower surface of the robot hand 126 to the upper surface of the substrate W) is detected as the height T1 of the substrate W being transported.

[0057] Similarly, in the second transport step S022, the substrate W is transported toward the second detection region DR2. As an example, in the second transport step S022, the substrate W is transported along the left-right direction X so as to pass through the second detection region DR2. In this case, the second transport step S022 may transport the substrate W along the transport direction D, as in the first transport step S021. However, the specific direction of the operation toward the second detection region DR2 in the second transport step S022 is not specified and can be adjusted as necessary. Furthermore, in the second transport step S022, when the substrate W is transported to the substrate placement position (reception part P) of the processing device 54 (second chamber C2), the substrate W is made to pass through the second detection region DR2, and the second detection step S04 is performed. That is, the second detection step S04 is performed during the second transport step S022, and the position of the transported substrate W is detected by the second detection part 140. For example, in the second transport step S022, when the substrate W transported by the transport mechanism 120 passes through the second detection region DR2 toward the substrate placement position (reception part P) in the processing device 54 (second chamber C2), the second detection step S04 is executed, and the position of the substrate W is detected by the second detection part 140. In other words, in the second detection step S04, the second detection part 140 detects the relative position of the substrate W in the left-right direction X with respect to the transport mechanism 120 (robot hand 126). That is, the second transport step S022 and the second detection step S04 are executed to correct the position of the substrate W for the unloading step S05 (for example, to transport the substrate W so that the above-mentioned center line L2 and center line L3 are aligned). In this case, it is preferable to use the second chamber C2 as the destination for the unloading step S05. In another embodiment not shown, the second detection unit 140 may be installed in the first chamber C1, the first chamber C1 may be the destination in the unloading step S05, and in the second transport step S022, the substrate W transported by the transport mechanism 120 may pass through the second detection region DR2 toward the substrate placement position (slot S) in the first chamber C1 to perform the second detection step S04, and the position of the substrate W may be detected by the second detection unit 140. Therefore, the second transport step S022 and the second detection step S04 are not limited to steps performed to correct the position of the substrate W for the unloading step S05.The order of the first detection step S03 and the second detection step S04 can be adjusted depending on the order in which the substrate W passes through the first detection region DR1 and the second detection region DR2 when it is transported, i.e., the positions of the first detection region DR1 and the second detection region DR2, etc. However, the present invention does not limit whether the second detection unit 140 is installed, i.e., whether the second detection step S04 is performed.

[0058] 2, the substrate transport apparatus 100 includes a controller C (shown in FIG. 2) that controls the transport mechanism 120. The controller C controls the operation of the transport mechanism 120. For example, the controller C may be installed in the housing 110 of the substrate transport apparatus 100, in the transport mechanism 120 of the substrate transport apparatus 100, or externally and separately from the substrate transport apparatus 100. The controller C only needs to be electrically connected to the transport mechanism 120 to control the transport mechanism 120. The controller C may also calculate the state (height, etc.) and position of the substrate W based on information from the first detector 130 and the second detector 140. Therefore, in order to perform the first detection step S03 during the first transport step S021, the controller C controls the operation of the transport mechanism 120 in the first transport step S021 in accordance with the state (height T1, thickness T2, warpage T3, etc.) of the substrate W detected in the first detection step S03. As an example, in the first transport step S021, when the substrate W transported by the transport mechanism 120 passes through the first detection region DR1, information about the state of the substrate W (such as the height T1, thickness T2, and warpage T3 of the substrate W) detected in the first detection step S03 is acquired, and then the controller C controls the operation of the transport mechanism 120, which moves through the first detection region DR1 to the second transport region TR2, in accordance with the information detected in the first detection step S03, so that the state of the transported substrate W conforms to a preset condition. Similarly, to perform the second detection step S04 during the second transport step S022, the controller C controls the operation of the transport mechanism 120 in accordance with the relative position of the substrate W in the left-right direction X with respect to the transport mechanism 120 (robot hand 126) detected in the second detection step S04. As an example, in the second transport step S022, when the substrate W transported by the transport mechanism 120 passes through the second detection region DR2, information regarding the relative position of the substrate W in the left-right direction X with respect to the transport mechanism 120 (robot hand 126) detected in the second detection step S04 is obtained, and then the control unit C controls the operation of the transport mechanism 120 which moves through the second detection region DR2 to the second transport region TR2 according to the information detected in the second detection step S04, so that the state of the substrate W being transported can be adjusted to predetermined conditions.

[0059] Finally, in the unloading step S05, the substrate W is unloaded from the housing 110. For example, as shown in FIG. 6 , the transport mechanism 120 provided inside the housing 110 inserts the robot hand 126 into the container H serving as the first chamber C1 through the opening O1 by moving the arm unit 124 (shown in FIG. 3 ) (e.g., moves to the first chamber C1 along the unloading direction D2), unloads the substrate W held on the upper surface of the robot hand 126 by the holder 129 from the housing 110, stores the substrate W in the slot S of the container H, and then returns the robot hand 126 to the housing 110 through the opening O1 by moving the arm unit 124. As a result, the transport mechanism 120 can unload the substrate W from inside the housing 110 to the container H serving as the first chamber C1. However, in the unloading step S05, it is also possible to unload the substrate W from the housing 110 to the second chamber C2. Furthermore, after completing the unloading step S05, the substrate transport device 100 proceeds to the next step. For example, the transport mechanism 120 transports the next substrate W from the processing device 54 serving as the second chamber C2 to the container H serving as the first chamber C1, or transports the next substrate W from the container H serving as the first chamber C1 to the processing device 54 serving as the second chamber C2. The present invention is not limited to this. Furthermore, the content and order of each step of the substrate transport method described above have been explained using the substrate transport device 100 shown in Figures 1 to 7 and 16 as an example, but the substrate transport devices 100A to 100F shown in Figures 10 to 15 also apply to the substrate transport method of the present invention. The content and order of each step of the substrate transport method can be adjusted depending on differences in the structure of the substrate transport devices 100A to 100F.

[0060] In summary, the substrate transport device and substrate transport method can transport a substrate between a first chamber and a second chamber. In the substrate transport device, a first transport region and a second transport region through which the substrate is transported are formed within a housing, and a first detection unit forms a first detection region extending in a direction intersecting the substrate transport direction from the first transport region to the second transport region, with the first transport region and the second transport region being located on opposite sides of the first detection region. Therefore, when transporting a substrate along the transport direction from the first transport region to the second transport region, the transport mechanism passes the substrate through the first detection region and detects the state of the substrate with the first detection unit. Thus, the present invention provides a substrate transport device and substrate transport method that can detect the state of the substrate while it is being transported in a substrate transport region set between a substrate take-out position and a substrate input position, thereby improving control stability.

[0061] Finally, it should be noted that the above embodiments are only used to explain the technical solutions of the present invention, and are not intended to limit the same. Although the present invention has been described in detail with reference to the above embodiments, those skilled in the art will understand that the technical solutions described in the above embodiments can still be modified or some or all of the technical features can be replaced with equivalents, provided that such modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

[0062] The present invention provides a substrate transport device and a substrate transport method that can detect the state of a substrate while it is being transported in a substrate transport area set between a substrate removal position and a substrate insertion position, thereby improving control stability.

[0063] 50 substrate transport system, 52 load port, 54 processing apparatus, 100 to 100F substrate transport apparatus, 110 housing, 112 frame portion, 114 wall portion, 114a first wall portion, 114b second wall portion, 114c third wall portion, 114d fourth wall portion, 116 moving body, 118 guide structure, 120 transport mechanism, 122 main body portion, 124 arm portion, 126 robot hand, 128 arm drive portion, 129 holding portion, 130 first detection portion, 132 first light emitter, 134 first light receiver, 140 second detection portion, 142 second light emitter, 144 second light receiver, a predetermined value, b shielding amount, C control portion, C1 first chamber, C2 second chamber, D transport direction, D1 carry-in direction, D2 carry-out direction, DR1 First detection area, DR2 second detection area, E1 peripheral portion, E2 peripheral portion, H container, L detection light, L1 center line of robot hand, L2 center line of substrate, L3 center line of opening, O1 opening, O2 opening, P mounting table, S slot, S01 loading process, S02 transport process, S021 first transport process, S022 second transport process, S03 first detection process, S04 second detection process, S05 unloading process, SR1 installation range, SR2 installation range, T1 height, T2 warpage amount, TR1 first transport area, TR2 second transport area, W substrate, X left-right direction, Y front-back direction, Z up-down direction

Claims

1. A substrate transport device that transports a substrate between a first chamber and a second chamber, A housing and a transport mechanism provided inside the housing and configured to transport the substrate; a first detection unit provided inside the housing and configured to detect at least one of a height, a thickness, and an amount of warping of the substrate transported by the transport mechanism in a first detection area; Equipped with The housing has a first opening communicating with the first chamber and a second opening communicating with the second chamber, A first transport area and a second transport area in which the substrate is transported are formed inside the housing, the first detection region extends from the first transport region to the second transport region in a direction intersecting a transport direction of the substrate, The first transport region and the second transport region are positioned opposite each other with the first detection region in between, After the substrate is carried into the housing from one of the first chamber and the second chamber, the substrate passes through the first detection region while being transported from the first transport region to the second transport region along the transport direction. A substrate transport device comprising:

2. Each of the first transport region and the second transport region has a size that includes at least the entire substrate in a plan view. The substrate transport apparatus according to claim 1 .

3. a size of the first transport region is a size that allows the transport mechanism to hold the substrate before the substrate is transported from the first transport region to the second transport region so that the substrate does not overlap at least the first detection region; The size of the second transfer region is such that the transfer mechanism can hold the substrate after the substrate is transferred from the first transfer region to the second transfer region so that the substrate does not overlap at least the first detection region.

3. The substrate transport apparatus according to claim 2.

4. the transport mechanism has a holder that holds the substrate to be transported, The first detection unit detects at least one of a height, a thickness, and an amount of warping of the substrate held by the holding unit. The substrate transport apparatus according to claim 1 .

5. Further comprising a control unit for controlling the transport mechanism, The control unit corrects a transport operation of the transport mechanism based on at least one of the detected height, thickness, and amount of warping of the substrate. The substrate transport apparatus according to claim 1 .

6. Further comprising a control unit for controlling the transport mechanism, the transport mechanism has a holder that holds the substrate to be transported, the first chamber is a container that is placed on a load port and has a plurality of slots that can support the substrate; After the substrate is carried into the housing from the second chamber, the substrate passes through the first detection area during the process of being transported from the first transport area to the second transport area along the transport direction, After the first detection unit detects the height of the substrate held by the holding unit, the substrate is carried out from the housing to the container; The control unit adjusts a height position of a holder when the substrate is transferred to the container based on the detected height of the substrate. The substrate transport apparatus according to claim 1 .

7. the housing includes a first wall portion having a peripheral portion for forming the first opening, The first detection area is formed so as to extend from the first wall portion toward a wall portion opposed to the first wall portion. The substrate transport apparatus according to claim 1 .

8. The first opening is provided in plurality, A peripheral portion for forming each of the first openings is provided on each of the first walls, the first transport region and the second transport region face any one of the first openings; The first detection region extends from between two adjacent first openings in the first wall portion toward a wall portion opposite the first wall portion. The substrate transport apparatus according to claim 7 .

9. The housing comprises: a first wall portion having a peripheral portion for forming the first opening; a second wall portion having a periphery for forming the second opening; the first opening and the second opening are at different height positions in the vertical direction of the housing, The first detection area extends from the first wall portion toward the second wall portion and is located between the first opening and the second opening. The substrate transport apparatus according to claim 1 .

10. the first detection unit includes a first light emitting unit that emits detection light that forms the first detection region, and a first light receiving unit that receives the detection light; 2 . The substrate transport device according to claim 1 , wherein at least one of the first light emitter and the first light receiver is fixed to a wall of the housing adjacent to the first chamber.

11. a second detection unit provided inside the housing and configured to detect a position of the substrate transported by the transport mechanism; The second detection section forms a second detection area extending in a vertical direction of the housing and detects the position of the board in a horizontal direction intersecting the vertical direction. The substrate transport apparatus according to claim 1 .

12. the second detection unit includes a second light emitting unit that emits detection light that forms the second detection region, and a second light receiving unit that receives the detection light; At least one of the second light emitting unit and the second light receiving unit is provided on a wall of the housing adjacent to the second chamber. The substrate transport apparatus according to claim 11 .

13. The second detection region is formed at a position not overlapping with the second opening. The substrate transport apparatus according to claim 11 .

14. A substrate transport device for transporting a substrate between a first chamber and a second chamber, comprising: A housing and a transport mechanism provided inside the housing and configured to transport the substrate; a first detection unit provided inside the housing and configured to detect at least one of a height, a thickness, and an amount of warping of the substrate transported by the transport mechanism in a first detection area; Equipped with The housing has a first opening communicating with the first chamber and a second opening communicating with the second chamber, The housing has a first transport area and a second transport area in which the substrate is transported, The first opening faces the first transport region, each of the first transport region and the second transport region has a size sufficient to include at least the entire substrate in a plan view; The first detection area extends from the first transfer area to the second transfer area in a direction intersecting a transfer direction of the substrate. A substrate transport device comprising:

15. The first detection area extends along a direction in which the substrate is carried in or out of one of the first chamber or the second chamber.

15. The substrate transport apparatus according to claim 1 or 14.

16. A substrate transport method for transporting a substrate between a first chamber and a second chamber by a substrate transport device, comprising: the substrate transport device includes a housing, a transport mechanism provided inside the housing and configured to transport the substrate, and a first detection unit provided inside the housing and configured to detect at least one of a height, a thickness, and an amount of warping of the substrate transported by the transport mechanism; A first transport area and a second transport area in which the substrate is transported are formed inside the housing, The first detection unit forms a first detection area extending in a direction intersecting a transport direction of the substrate from the first transport area to the second transport area, The first transport region and the second transport region are positioned opposite each other with the first detection region in between, The substrate transport method includes: a carrying step of carrying the substrate into the housing from one of the first chamber or the second chamber; a first transfer step of transferring the substrate along the transfer direction from the first transfer region to the second transfer region; a first detection step of detecting at least one of a height, a thickness, and an amount of warping of the substrate; a carrying-out step of carrying out the substrate from the housing to the other of the first chamber or the second chamber after the detection step is completed; Equipped with In the first transport step, when the substrate transported from the first transport region to the second transport region along the transport direction passes through the first detection region, the first detection unit performs the first detection step. A substrate transport method comprising:

17. The detection by the first detection unit is performed with a band-shaped detection light having a predetermined dimension, The first detection step detects at least one of a height, a thickness, and an amount of warping of the substrate based on a detection amount of the belt-shaped detection light. The substrate transport method according to claim 16 .

18. the substrate transport device further includes a second detection unit provided inside the housing and configured to detect a position of the substrate transported by the transport mechanism; the second detection portion is provided on a wall portion of the housing adjacent to the second chamber and defines a second detection area extending in a vertical direction of the housing; The substrate transport method includes: a second transport step of transporting the substrate toward the second detection area; a second detection step of detecting a position of the substrate in a horizontal direction intersecting the up-down direction in the second transport step; Further comprising The substrate transport method according to claim 16 .

19. The substrate transport device includes a control unit that controls the transport mechanism, the transport mechanism has a holder that holds the substrate to be transported, the first detection unit detects a height of the substrate held by the holding unit, the first chamber is a container that is placed on a load port and has a plurality of slots that can support the substrate; In the carrying-in step, the substrate is carried from the second chamber into the housing; In the unloading step, the control unit adjusts a height position of the holding unit in accordance with the height of the substrate detected in the first detection step, and unloads the substrate into the container. The substrate transport method according to claim 16 .

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