Long sheet processing device, long sheet processing method, carbon nanotube manufacturing device, and carbon nanotube manufacturing method

Abstract

[Problem] To provide a long sheet processing device, a long sheet processing method, a carbon nanotube manufacturing device, and a carbon nanotube manufacturing method with which it is possible to perform a plurality of processes on a long sheet without stopping the whole conveyance line. [Solution] This long sheet processing device is provided with a plurality of processing mechanisms for processing a belt-like long sheet conveyed by a conveyance line, and includes a speed adjustment mechanism for changing a conveyance speed of the long sheet between an upstream side and a downstream side of the conveyance line.

Description

Long sheet processing apparatus, long sheet processing method, carbon nanotube manufacturing apparatus, and carbon nanotube manufacturing method

[0001] The present invention relates to a long sheet processing apparatus, a long sheet processing method, a carbon nanotube manufacturing apparatus, and a carbon nanotube manufacturing method.

[0002] This application claims priority based on Japanese Patent Application No. 2024-103861, filed with the Japan Patent Office on June 27, 2024, the contents of which are incorporated herein by reference.

[0003] Conventionally, carbon nanotube production apparatuses equipped with a CVD (Chemical Vapor Deposition) device for forming carbon nanotubes on the surface of a strip-shaped substrate have been known (see, for example, Patent Document 1). In this carbon nanotube production apparatus, a catalyst is applied to the surface of the substrate in a pretreatment chamber, and carbon nanotubes are formed on the catalyst-coated surface of the substrate by a CVD method in a downstream heating chamber.

[0004] JP 2013-032248 A

[0005] However, the carbon nanotube production apparatus described above is intended to form carbon nanotubes on the surface of a substrate in a heating chamber, and is not intended to perform multiple processes.

[0006] An object of the present invention is to provide a long sheet processing apparatus, a long sheet processing method, a carbon nanotube manufacturing apparatus, and a carbon nanotube manufacturing method that can perform multiple processes on a long sheet without stopping the entire conveying line.

[0007] That is, in order to solve the above problems, the present invention provides, for example, the following means.

[0008] [1] A long sheet processing apparatus provided with multiple processing mechanisms for processing strip-shaped long sheets transported on a transport line, characterized in that the long sheet processing apparatus is provided with a speed adjustment mechanism for changing the transport speed of the long sheets upstream and downstream of the transport line.

[0009] [2] The speed adjustment mechanism has a plurality of suspension rolls at the top and bottom of the speed adjustment mechanism, or at the upstream and downstream of the conveying line within the speed adjustment mechanism, for alternately suspending the conveyed long sheet so that it snakes, and when the suspension rolls are arranged at the top and bottom of the speed adjustment mechanism, at least one side of the suspension rolls moves vertically, and when the suspension rolls are arranged upstream and downstream of the conveying line within the speed adjustment mechanism, at least one side of the suspension rolls moves horizontally, thereby changing the conveying speed of the long sheet upstream and downstream of the conveying line. [1] The long sheet processing apparatus of [1]

[0010] [3] A long sheet processing device according to [1] or [2], characterized in that it comprises an adhesion mechanism that adheres a predetermined attachment to the long sheet, and a recovery section that recovers the attachment adhered to the long sheet by the adhesion mechanism from the long sheet.

[0011] [4] A long sheet processing apparatus according to [3], characterized in that it has a plurality of turn-back rolls for alternately turning back the long sheet being transported in a serpentine manner, at the top and bottom of the attachment mechanism, or at the upstream and downstream of the conveying line, with the attachment mechanism in between, and the recovery unit is located near each of the turn-back rolls.

[0012] [5] A long sheet processing method including a plurality of processing steps for processing a strip-shaped long sheet transported on a transport line, characterized in that the long sheet processing method includes a speed adjustment step for changing the transport speed of the long sheet upstream and downstream of the transport line.

[0013] [6] A carbon nanotube manufacturing apparatus comprising: a sputtering chamber that forms a catalyst layer on a strip-shaped base sheet transported on a transport line; a CVD chamber that forms a layer of carbon nanotubes on the catalyst layer on the base sheet by a CVD (Chemical Vapor Deposition) method; and an accumulator arranged between the sputtering chamber and the CVD chamber, wherein the accumulator adjusts the transport speed of the base sheet on the transport line so that the transport speed is different between the sputtering chamber and the CVD chamber.

[0014] [7] The carbon nanotube production apparatus of [6], characterized in that the accumulator has a plurality of transfer rolls at the top and bottom of the accumulator, or at the upstream and downstream of the conveying line within the accumulator, for alternately transferring the conveyed base sheet in a serpentine manner, and when the transfer rolls are arranged at the top and bottom of the accumulator, at least one side of the transfer rolls moves vertically, and when the transfer rolls are arranged upstream and downstream of the conveying line within the accumulator, at least one side of the transfer rolls moves horizontally, thereby changing the conveying speed of the base sheet upstream and downstream of the accumulator on the conveying line.

[0015] [8] The carbon nanotube production apparatus according to [6] or [7], further comprising a recovery unit that recovers the carbon nanotubes formed on the catalyst layer of the base sheet in the CVD chamber from the base sheet.

[0016] [9] A carbon nanotube production apparatus according to [8], characterized in that it comprises a plurality of turn-back rolls for alternately turning back the transported substrate sheet in a serpentine manner at the top and bottom of the CVD chamber, or at the upstream and downstream of the transport line across the CVD chamber, and the recovery sections are each located near the turn-back rolls.

[0017]

[10] A method for producing carbon nanotubes, comprising: a catalyst layer forming step of forming a catalyst layer on a strip-shaped base sheet transported on a transport line; a speed adjusting step of adjusting the transport speed of the base sheet on which the catalyst layer has been formed so that the transport speed is different from the transport speed in the catalyst layer forming step; and a CVD (Chemical Vapor Deposition) step of forming a layer of carbon nanotubes on the catalyst layer of the base sheet.

[0018]

[11] The carbon nanotube production method according to

[10] , comprising: a unwinding step of unwinding the base sheet from a roll; a take-up step of winding the base sheet onto a take-up machine after the carbon nanotubes formed on the catalyst layer have been collected and taking it up; and a rewinding step of unwinding the base sheet wound onto the take-up machine in a direction opposite to the original transport direction, transporting it, and rewinding it onto the roll, wherein the forward feeding operation of forming the carbon nanotubes on one base sheet, collecting the formed carbon nanotubes, and collecting the remaining base sheet, and the rewinding operation of rewinding the base sheet from which the carbon nanotubes have been collected in the reverse direction are repeated multiple times.

[0019] According to the present invention, it is possible to provide a long sheet processing apparatus, a long sheet processing method, a carbon nanotube manufacturing apparatus, and a carbon nanotube manufacturing method that can perform multiple processes on a long sheet without stopping the entire conveying line.

[0020] FIG. 1 is a schematic diagram showing an outline of a carbon nanotube production apparatus according to an embodiment; FIG. 2 is a schematic diagram showing an outline of a carbon nanotube production apparatus according to another embodiment; FIG. 3 is a schematic diagram showing an outline of a carbon nanotube production apparatus according to another embodiment; FIG. 4 is a diagram showing a structure and rotation operation of a rotating roll provided in an accumulator of a carbon nanotube production apparatus according to another embodiment; FIG. 5 is a schematic diagram showing an outline of a carbon nanotube production apparatus according to another embodiment; FIG. 6 is a schematic diagram showing an outline of a carbon nanotube production apparatus according to another embodiment; FIG. 7 is a schematic diagram showing an outline of a carbon nanotube production apparatus according to another embodiment; FIG. 8 is a schematic diagram showing an outline of a long sheet processing apparatus according to another embodiment;

[0021]

[0023] Hereinafter, an embodiment of the present invention will be described with reference to the drawings, taking as an example a case where a long sheet processing apparatus is a carbon nanotube manufacturing apparatus. Fig. 1 is a schematic diagram showing an outline of a carbon nanotube manufacturing apparatus 2 according to an embodiment.

[0022] 1 , the carbon nanotube production apparatus 2 includes a first roll chamber 4, a sputtering chamber 6, a pressure adjustment chamber 8, an accumulator 10, a first storage chamber 12a, a first heat shield 14a, a CVD (Chemical Vapor Deposition) chamber 16, a second heat shield 14b, a second storage chamber 12b, and a second roll chamber 22. Here, the carbon nanotube production apparatus 2 configures a transport line that transports one base sheet 24 consistently from the first roll chamber 4 to the second roll chamber 22.

[0023] The carbon nanotubes may be either single-walled carbon nanotubes (SWCNTs) or multi-walled carbon nanotubes (MWCNTs), or a mixture of these. Single-walled carbon nanotubes have a single tube layer, while multi-walled carbon nanotubes have a multi-layer structure with two or more tube layers, for example, 2 to 20 layers, 2 to 10 layers, preferably 2 to 8 layers, and more preferably 3 to 7 layers.

[0024] The first roll chamber 4 contains a roll 4a around which the base sheet 24 to be unwound is wound. In the conveying line, the base sheet 24 wound around the roll 4a is unwound first (unwinding process). The base sheet 24 is a long, stainless steel foil having a uniform width of 200 to 1200 mm, preferably 200 to 400 mm, and has a thin, strip-like shape extending in one direction. The length of the base sheet 24 is 200 to 600 m, preferably 200 to 400 m, and the thickness of the base sheet 24 is 10 to 300 μm, preferably 20 to 150 μm, and more preferably 30 to 90 μm.

[0025] The material of the base sheet 24 does not necessarily have to be stainless steel, and materials other than stainless steel can be used as long as they have heat resistance that can withstand the high temperatures inside the CVD chamber 16 and can be transported repeatedly.

[0026] The sputtering chamber 6 is a space for performing a process of forming a catalyst layer by sputtering on the strip-shaped substrate sheet 24 that is unwound from the roll 4a and transported to the transport line. A known device is used as the sputtering device disposed in the sputtering chamber 6. The chamber pressure in the sputtering chamber 6 at this time is, for example, 1×10 －２ to 1×10 Pa, preferably 1×10 －１ Pa to 1 Pa, for example, 3×10 －１ Pa ~ 8 x 10 －１ It is Pa.

[0027] Examples of materials that can be used to form the catalyst layer include metals such as iron (Fe), nickel (Ni), cobalt (Co), molybdenum (Mo), gold (Au), and alloys thereof, or precursors thereof (oxides or compounds).

[0028] A buffer layer may be formed between the substrate sheet 24 and the catalyst layer. In this way, when a buffer layer is formed as the first layer and a catalyst layer is formed as the second layer, the material constituting the buffer layer is preferably silica (SiO ２ ), alumina (Al ２ O ３ ), silicon nitride (SiN), zinc oxide (ZnO), copper oxide (Cu ２O), nickel oxide (NiO), etc.

[0029] In the sputtering chamber 6, a catalyst layer can be formed on one or both sides of the base sheet 24 (catalyst layer forming step). Furthermore, when a buffer layer is formed on the base sheet 24, a double layer consisting of a buffer layer as a first layer and a catalyst layer as a second layer may be formed on one or both sides of the base sheet 24.

[0030] Furthermore, in this embodiment, the case where the catalyst layer and buffer layer are sputtered onto the base sheet 24 is exemplified, but instead of sputtering, the catalyst layer and buffer layer may be coated onto the base sheet 24.

[0031] Alternatively, the catalyst layer or buffer layer may be formed by PVD (Physical Vapor Deposition) other than sputtering. Examples of PVD other than sputtering include evaporation, ion plating, and ion beam sputtering. Methods other than sputtering also include liquid phase deposition (e.g., plating) and CVD. Sputtering is preferred from the viewpoint of controlling the process and the quality (e.g., thickness, density, crystallinity, adhesion, etc.) of the resulting catalyst layer or buffer layer.

[0032] The pressure adjustment chamber 8 is a mechanism for adjusting the pressure difference between the sputtering chamber 6 and the CVD chamber 16, and adjusts the pressure in the carbon nanotube production apparatus 2 so that the chamber pressure in the sputtering chamber 6 is lower than the chamber pressure in the CVD chamber 16. Note that each chamber constituting the carbon nanotube production apparatus 2 is not sealed separately in order to realize a continuous transport line, and a slit-like gap is formed to allow the substrate sheet 24 to be transported from one chamber to another.

[0033] Furthermore, in addition to or instead of the pressure adjustment chamber 8, the pressure difference between the chamber pressures of the sputtering chamber 6 and the CVD chamber 16 may be adjusted by a gate valve (not shown) that sandwiches the base sheet, preferably by sandwiching the base sheet between cylindrical or columnar members from above and below. The gate valve may be provided, for example, between the accumulator 10 and the first storage chamber 12a, or between the pressure adjustment chamber 8 and the accumulator 10.

[0034] Furthermore, the pressure adjustment chamber 8 may be omitted and a gate valve may be provided between the sputtering chamber 6 and the accumulator 10, or may be provided at any position between the accumulator 10 and the CVD chamber 16, for example, between the accumulator 10 and the first containment chamber 12a. By closing the gate valve, the spaces before and after it can be isolated, so that the pressure difference between the sputtering chamber 6 and the CVD chamber 16 can also be adjusted by the gate valve.

[0035] Note that multiple gate valves may be provided. When the pressure adjustment chamber 8 is omitted and the pressure difference between the sputtering chamber 6 and the CVD chamber 16 is adjusted using a single gate valve, the CVD chamber 16 is depressurized in advance when the gate valve is opened to minimize the pressure difference between the sputtering chamber 6 and the CVD chamber 16, and the gate valve is then closed before the CVD process. Gas is then introduced into the CVD chamber 16, and the chamber pressure in the CVD chamber 16 is preferably adjusted to a pressure (near atmospheric pressure) that allows the formation of a CNT layer.

[0036] The accumulator 10 is disposed between the sputtering chamber 6 and the CVD chamber 16, and is a speed adjusting mechanism that adjusts the transport speed of the base sheet 24 transported from the sputtering chamber 6 to the CVD chamber 16. Inside the accumulator 10, multiple hanging rolls 11 are disposed at the top and bottom, for alternately hanging the transported base sheet 24 in a serpentine manner. The hanging rolls 11 are a first roll 11a located on the ceiling side of the accumulator 10 and a second roll 11b located on the floor side, and are arranged alternately above and below. At least one of the first roll 11a and the second roll 11b is arranged to be movable in the vertical direction.

[0037] Here, we will explain the speed adjustment process for adjusting the speed of the base sheet 24 in the accumulator 10. First, the base sheet 24 on which the catalyst layer has been formed in the sputtering chamber 6 is transported into the accumulator 10 at the same speed, and after repeatedly snaking up and down within the accumulator 10, is processed in the CVD chamber 16.

[0038] The base sheet 24 is arranged on the transport line so as to be capable of being rewound multiple times (described later), and there is no speed adjustment step in the initial transport of the base sheet 24. That is, in the initial transport, the base sheet 24 on which the catalyst layer has been formed in the sputtering chamber 6 does not need to be meandered using the first roll 11 a and the second roll 11 b, but passes through the accumulator 10 and is introduced linearly into the CVD chamber 16.

[0039] In the CVD chamber 16, the base sheet 24 is usually stopped during processing. Therefore, when the base sheet 24 is continuously unwound from the roll 4a without stopping, it becomes necessary to adjust the transport speed of the base sheet 24 so that the transport speed of the base sheet 24 differs between the CVD chamber 16 (CVD process) and the sputtering chamber 6 (catalyst layer formation process).

[0040] At this time, at least one of the first roll 11a and the second roll 11b moves vertically inside the accumulator 10, and the first roll 11a and the second roll 11b gradually move apart. As a result, the base sheet 24 transported into the accumulator 10 is accumulated in the accumulator 10 over time, and the transport speed of the base sheet 24 can be made different between upstream and downstream on the same transport line, making it possible to adjust the feed amount appropriately.

[0041] The transport speed of the base sheet 24 in the CVD chamber 16 can also be made faster than the transport speed of the base sheet 24 in the sputtering chamber 6. For example, particularly when the CVD process is once completed and the base sheet 24 in the CVD chamber 16 is replaced, the base sheet 24 is transported at a speed faster than that of sputtering. This shortens the time when no processing is performed in the CVD chamber 16, thereby improving the productivity of carbon nanotubes produced by the carbon nanotube production apparatus 2.

[0042] In this case, the first roll 11a and the second roll 11b are gradually moved closer to each other, and the base sheet 24 stored in the accumulator 10 is discharged.

[0043] The CVD chamber 16 is an attachment mechanism that attaches a predetermined attachment to the base sheet 24, and performs a process (CVD process) to form a carbon nanotube layer (hereinafter referred to as a CNT layer) on the catalyst layer of the transported base sheet 24. The CVD chamber 16 is equipped with a supply port (not shown) for supplying raw material for carbon nanotubes (hereinafter referred to as CNTs). When forming the CNT layer, the process is usually performed with the base sheet 24 stopped.

[0044] Examples of raw materials supplied to the CVD chamber 16 include hydrocarbons such as methane, ethane, ethylene, and acetylene, alcohols, and carbon-containing source gases such as carbon monoxide. Hydrocarbons are preferred as the source gas. The CNT layer is formed in the CVD chamber 16 by first evacuating the CVD chamber 16 by gas-phase substitution, then heating it to the temperature described below, and supplying nitrogen, hydrogen, and the raw materials from a cylinder (not shown).

[0045] The temperature in the CVD chamber 16 when forming the CNT layer is preferably 600 to 850° C., more preferably 650 to 800° C. The chamber pressure in the CVD chamber 16 at this time is, for example, 1×10 ４ ~1 x 10 ６ Pa, preferably 8×10 ４ ~2 x 10 ５ Pa, for example, one atmosphere (1×10 ５ ~1.1 x 10 ５ Pa).

[0046] The heat shields 14 are provided upstream and downstream of the conveying line sandwiching the CVD chamber 16, respectively, and function to allow the base sheet 24 to pass while insulating it from the high temperature within the CVD chamber 16. Here, the heat shields 14 include a first heat shield 14a adjacent to the upstream side of the CVD chamber 16 in the conveying direction of the base sheet 24, and a second heat shield 14b adjacent to the downstream side of the CVD chamber 16. As a specific example, the first heat shield 14a and the second heat shield 14b are provided with multiple slits (not shown) on the top and bottom, and the base sheet 24 passing through the slits is sandwiched between clamping components from above and below, thereby insulating it from the high temperature within the CVD chamber.

[0047] At least one of first heat shield 14a and second heat shield 14b may have, in addition to the heat shielding function, a function of sealing the inside of CVD chamber 16 to prevent leakage of raw materials supplied from the cylinder. Furthermore, first heat shield 14a and second heat shield 14b can control the partial pressure (proportion of each gas component) inside and outside CVD chamber 16. The clamping member may be of a type that clamps only from above or only from below.

[0048] 1, one base sheet 24 is folded back alternately at both ends in the CVD chamber 16 in the transport direction, forming a serpentine shape and multiple vertical layers within the CVD chamber 16. FIG. 1 illustrates an example in which one base sheet 24 forms seven layers within the CVD chamber 16. One base sheet 24 within the CVD chamber 16 may have, for example, 3 to 15 layers, and preferably 5 to 11 layers. A CNT layer is formed on one or both sides of the seven layers of the base sheet 24 using raw material supplied from a cylinder.

[0049] The storage chambers 12 are provided at positions sandwiching the heat shields 14 located on both sides of the CVD chamber 16 in the conveyance direction of the base sheet 24. That is, the storage chambers 12 include a first storage chamber 12a adjacent to the upstream side of the first heat shield 14a in the conveyance direction of the base sheet 24, and a second storage chamber 12b adjacent to the downstream side of the CVD chamber 16.

[0050] Here, in the first storage chamber 12a, first folding rolls 18a for folding back the base sheet 24 are stored alternately in multiple tiers at the top and bottom, and in the second storage chamber 12b, second folding rolls 18b for similarly folding back the base sheet 24 are stored alternately in multiple tiers at the top and bottom.

[0051] These turn-back rolls 18 transport the base sheet 24 in a serpentine manner, alternately turning back and forth from upstream to downstream of the CVD chamber 16 and from downstream to upstream of the CVD chamber 16. Specifically, the base sheet 24 transported from the accumulator 10 passes through the first storage chamber 12a and the first heat shield 14a, is transported into the CVD chamber 16, and then passes through the second heat shield 14b before being turned back by the uppermost second turn-back roll 18b in the second storage chamber 12b.

[0052] The base sheet 24 folded back by the second folding back roll 18b passes from the second storage chamber 12b through the second heat shield 14b, the CVD chamber 16, the first heat shield 14a, and the first storage chamber 12a, and is then folded back by the uppermost first folding back roll 18a in the first storage chamber 12a. In the same manner, the base sheet 24 is folded back multiple times between the first storage chamber 12a and the second storage chamber 12b, and is then wound around the take-up machine 22a in the second roll chamber 22 and taken up (details will be described later).

[0053] After being folded back by the first folding roll 18a and the second folding roll 18b, the base sheet 24 is stopped in the CVD chamber 16 or transported at a slower speed than the speed in the sputtering chamber 6, and the base sheet 24 is processed.

[0054] In addition, in the storage chamber 12, a collection section 20 equipped with a collection tool (not shown) for collecting CNTs on the base sheet 24 is arranged near the return roll 18. Specifically, the first collection section 20a and the second collection section 20b are located near the inside (CVD chamber 16 side) of both return rolls 18 in FIG. 1. The first collection section 20a may be provided separately as a collection chamber between the first storage chamber 12a and the first heat shield 14a, and similarly, the second collection section 20b may be provided separately as a collection chamber between the second storage chamber 12b and the second heat shield 14b.

[0055] The recovery tool may, for example, be one that scrapes off CNTs from the transported base sheet 24 using a spatula-shaped scraping part and has a storage part (not shown) that stores the scraped CNTs. Alternatively, it may be one that blows off the CNTs on the base sheet 24 and sucks up the blown-off CNTs to collect them in the storage part. The CNTs stored in the storage part are collected by workers.

[0056] The second roll chamber 22 is equipped with a take-up machine 22a for taking up the base sheet 24 after the CNTs formed on the catalyst layer of the base sheet 24 have been collected, and the base sheet 24 is wound around the take-up machine 22a (take-up process).

[0057] Here, the take-up machine 22a in the second roll chamber 22 becomes larger in diameter as the base sheet 24 is wound around it, while the roll 4a in the first roll chamber 4 becomes smaller in diameter as the base sheet 24 that was wound around it is completely unwound.

[0058] In this state, a rewinding operation is performed to return the base sheet 24 to its original state (rewinding process). That is, the base sheet 24 wound around the take-up machine 22a is unwound in the direction opposite to the original conveyance direction, conveyed, and wound around the roll 4a. For one base sheet 24, the forward feeding operation to form and recover a CNT layer and the rewinding operation to rewind the base sheet 24 from which the CNTs have been recovered are repeated multiple times, for example, 1000 times.

[0059] As a rule, such repeated feeding and rewinding operations are carried out with both ends of the base sheet 24 fixed, i.e., with one end of the base sheet 24 fixed to the roll 4a and the other end fixed to the take-up machine 22a.

[0060] Specifically, both ends of the substrate sheet 24 are fixed to the roll 4a and the take-up machine 22a, regardless of whether the CNT layer is formed on the catalyst layer of the substrate sheet 24 in the CVD chamber 16 or after the CNT layer is formed on the catalyst layer of the substrate sheet 24.

[0061] This allows the base sheet 24 to be easily transported in both the forward and reverse directions on the transport line when the feeding and rewinding operations are repeated.

[0062] According to the invention of this embodiment, the carbon nanotube production apparatus 2 is equipped with an accumulator 10, which is a speed adjustment mechanism that can change the conveying speed of the base sheet 24 upstream and downstream of the conveying line, so that multiple processes can be performed on the base sheet 24 without stopping the entire conveying line.

[0063] In the above-described embodiment, a cleaning chamber may be provided immediately before the second roll chamber 22 for wiping the substrate sheet 24 with a cleaning roll, a brush, or a solution.

[0064] In the above embodiment, a mechanism for observing the state of the catalyst layer may be provided upstream of the sputtering chamber 6, and sputtering may be omitted if it is determined that there is no problem with the catalyst layer.

[0065] Furthermore, in the above-described embodiment, the recovery section 20 is illustrated as being located near the inside of each of the return rolls 18 (on the CVD chamber 16 side) in FIG. 1, but the recovery section 20 may also be located near the outside of each of the return rolls 18 (on the opposite side from the CVD chamber 16) in FIG.

[0066] Furthermore, in the above-described embodiment, an example is given in which the first storage chamber 12a stores the first turn-back roll 18a and the first recovery section 20a, and the second storage chamber 12b stores the second turn-back roll 18b and the second recovery section 20b, but it is also possible that the first storage chamber 12a stores only one of the first turn-back roll 18a and the first recovery section 20a, and the second storage chamber 12b stores only one of the second turn-back roll 18b and the second recovery section 20b.

[0067] Furthermore, in the above-described embodiment, a case has been exemplified in which a plurality of upper and lower hanging rolls 11 for alternately hanging the base sheet 24 are arranged inside the accumulator 10, but the structure of the accumulator 10 is not necessarily limited to this. For example, as shown in Fig. 2, pinch rolls 51 may be provided at the inlet and outlet of the accumulator 50 so that the base sheet 24 can be driven and transported. In this case, the base sheet 24 is stored in the accumulator 50 while being randomly folded.

[0068] In this case, too, the substrate sheet 24 that has been unwound from the roll 4a in the first roll chamber 4 and has had a catalyst layer formed on one or both sides in the sputtering chamber 6 (catalyst layer forming process) is transported to the accumulator 50 at the same speed.

[0069] Here, while a CNT layer is being formed on the catalyst layer of the substrate sheet 24 in the CVD chamber 16 (CVD process), the substrate sheet 24 continues to be transported into the accumulator 50 by the inlet pinch roll 51a, but the outlet pinch roll 51b is not operating, and the substrate sheet 24 accumulates over time in the accumulator 50. This causes the transport speed of the substrate sheet 24 to differ between upstream and downstream on the same transport line, and the feed amount is appropriately adjusted (speed adjustment process).

[0070] The base sheet 24 is folded back alternately from upstream to downstream of the CVD chamber 16 and from downstream to upstream of the CVD chamber 16 by first folding rolls 18a and second folding rolls 18b, which are arranged in multiple upper and lower stages in the first storage chamber 12a and the second storage chamber 12b, to form multiple stages vertically within the CVD chamber 16, and with the CVD chamber 16 sealed, a process is carried out to form a CNT layer on the catalyst layer by the CVD method (CVD process).

[0071] The CNT layer formed on the catalyst layer is collected in the collection section 20, for example by scraping it off, and the base sheet 24 from which the CNTs have been collected is wound around a take-up machine 22a in the second roll chamber 22 and taken up.

[0072] Thereafter, the base sheet 24 wound around the take-up machine 22a is unwound and a rewinding operation is performed, and the base sheet 24 is wound around the roll 4a. Such a forward feeding operation for forming and recovering a CNT layer and a rewinding operation for rewinding the base sheet 24 from which the CNTs have been recovered are repeated multiple times.

[0073] 3, multiple rotating rolls 30 may be provided within the accumulator 52. Here, FIG. 4 is a diagram showing the structure and rotational operation of such a rotating roll 30. As shown in FIG. 4, the rotating roll 30 includes a first rotating bar 32c having a first roll 32a and a second roll 32b at both ends, and a second rotating bar 34c having a first roll 34a and a second roll 34b at both ends, and the first rotating bar 32c and the second rotating bar 34c are perpendicular to each other at the center. The central portion where the first rotating bar 32c and the second rotating bar 34c are perpendicular to each other is rotatably supported on a shaft (not shown) perpendicular to the conveying direction of the base sheet 24.

[0074] 4(a), the base sheet 24 is initially arranged so as to cross the center of the rotating roll 30. Specifically, the base sheet 24 is arranged between one roll and the other roll on each of the first rotating bar 32c and the second rotating bar 34c, such as between the first roll 32a and the first roll 34a formed at both ends of the first rotating bar 32c, and between the second roll 32b and the second roll 34b formed at both ends of the second rotating bar 34c.

[0075] In this case, too, the substrate sheet 24 that has been unwound from the roll 4a in the first roll chamber 4 and has had a catalyst layer formed on one or both sides in the sputtering chamber 6 (catalyst layer formation process) is transported to the accumulator 52 at the same speed.

[0076] When the accumulator 52 is activated, the rotating rolls 30 rotate, and the base sheet 24 comes into contact with all the rolls as shown in FIG. 4( b ) and is stretched over the rotating rolls 30 in a Z-shape.

[0077] As the rotating roll 30 rotates further, it passes through an intermediate state as shown in FIG. 4(c) and then assumes a shape in which the base sheet 24 is wound around the entire circumference of the rotating roll 30 as shown in FIG. 4(d).

[0078] In this way, the base sheet 24 is wound around multiple rotating rolls 30 within the accumulator 52, thereby accumulating the base sheet 24 within the accumulator 52, and the conveying speed of the base sheet 24 can be made different upstream and downstream of the conveying line (speed adjustment process).

[0079] The base sheet 24 is folded back alternately from upstream to downstream of the CVD chamber 16 and from downstream to upstream of the CVD chamber 16 by multiple stages of first folding rolls 18a and second folding rolls 18b arranged in the first storage chamber 12a and the second storage chamber 12b, forming multiple stages vertically within the CVD chamber 16, and with the CVD chamber 16 sealed, a process is carried out to form a CNT layer on the catalyst layer by the CVD method (CVD process).

[0080] The CNT layer formed on the catalyst layer is collected in the collection section 20, for example by scraping it off, and the base sheet 24 from which the CNTs have been collected is wound around a take-up machine 22a in the second roll chamber 22 and taken up.

[0081] Thereafter, the base sheet 24 wound around the take-up machine 22a is unwound and a rewinding operation is performed, and the base sheet 24 is wound around the roll 4a. Such a forward feeding operation for forming and recovering a CNT layer and a rewinding operation for rewinding the base sheet 24 from which the CNTs have been recovered are repeated multiple times.

[0082] In addition, in such a winding type accumulator 52, in addition to the one having two bars crossing each other at right angles like the rotating roll 30, one consisting of a single bar may also be used.

[0083] 5, an accumulator 53 may be provided as a speed adjustment mechanism, in which a plurality of transfer rolls 54 are arranged upstream and downstream of the conveyance line, for alternately transferring the base sheet 24 in a meandering manner. In this case, the transfer rolls 54 are arranged such that a first roll 54a is located upstream of the conveyance line and a second roll 54b is located downstream of the conveyance line, and the transfer rolls 54 are arranged alternately. At least one of the first roll 54a and the second roll 54b is arranged to be movable in the conveyance direction of the base sheet 24.

[0084] In this case, the substrate sheet 24 on which the catalyst layer has been formed in the sputtering chamber 6 is transported into the accumulator 53 at the same speed, and repeatedly meanders horizontally within the accumulator 10 .

[0085] That is, in the accumulator 53, at least one of the first roll 54a and the second roll 54b moves horizontally, and the first roll 54a and the second roll 54b gradually move apart horizontally. As a result, the base sheet 24 transported into the accumulator 53 is accumulated in the accumulator 53 over time, and the transport speed of the base sheet 24 can be made different between upstream and downstream of the same transport line, making it possible to adjust the feed amount appropriately.

[0086] Furthermore, Figure 1 illustrates an example in which multiple tiers of turn-back rolls 18 are arranged upstream and downstream of the conveying line, sandwiching the CVD chamber 16, and a single base sheet 24 is alternately folded back and meanders across the CVD chamber 16. However, as shown in Figure 6, multiple first turn-back rolls 68a may be arranged at the top of the CVD chamber 16, and multiple second turn-back rolls 68b may be arranged at the bottom of the CVD chamber 16, and a single base sheet 24 may be alternately folded back so as to meander above and below the CVD chamber 16.

[0087] In this case, the first storage chamber 62a is disposed above the CVD chamber 16, and the first return rolls 68a are arranged in a horizontal row within the first storage chamber 62a. Similarly, the second storage chamber 62b is disposed below the CVD chamber 16, and the second return rolls 68b are arranged in a horizontal row within the second storage chamber 62b.

[0088] The mechanisms are stacked vertically in the following order: first storage chamber 62a, first heat shield 64a, CVD chamber 16, second heat shield 64b, and second storage chamber 62b.

[0089] The base sheet 24 is folded back alternately up and down on the conveying line by first folding rolls 68a and second folding rolls 68b arranged in multiple horizontal rows in the first storage chamber 62a and the second storage chamber 62b, from upstream to downstream of the CVD chamber 16 and from downstream to upstream of the CVD chamber 16, and snakes up and down within the CVD chamber 16, and a process of forming a CNT layer on the catalyst layer by the CVD method is performed (CVD process) with the CVD chamber 16 sealed.

[0090] The CNT layer formed on the catalyst layer is collected in the collection section 70, for example by scraping it off, and the base sheet 24 from which the CNTs have been collected is wound around a take-up machine 22a in the second roll chamber 22 and taken up.

[0091] Thereafter, the base sheet 24 wound around the take-up machine 22a is unwound and a rewinding operation is performed, and the base sheet 24 is wound around the roll 4a. Such a forward feeding operation for forming and recovering a CNT layer and a rewinding operation for rewinding the base sheet 24 from which the CNTs have been recovered are repeated multiple times.

[0092] Furthermore, as shown in Figure 7, as a speed adjustment mechanism, an accumulator 53 is provided in which multiple transfer rolls 54 are arranged upstream and downstream of the conveying line to alternately transfer the conveyed base sheet 24, and turn-back rolls 68 (first turn-back roll 68a and second turn-back roll 68b) are arranged above and below the CVD chamber 16, so that one base sheet 24 is alternately turned back so as to snake in the vertical direction of the CVD chamber 16.

[0093] Furthermore, in the above-described embodiment, when the conveying speed of the base sheet 24 is changed using the accumulators 10, 50, 52, 53, at least one of the upper and lower hanging rolls 11, 54 is moved vertically or horizontally, but at least one of the upstream and downstream hanging rolls 11, 54 in the conveying direction may be arranged so that it can be moved in a direction inclined at a predetermined angle from the conveying direction other than the vertical or horizontal direction, for example, in an oblique direction.

[0094] Furthermore, in the above-described embodiment, when the feeding operation and the rewinding operation are repeated, there are the following three modes of use for the carbon nanotube production apparatus 2. By appropriately combining the following three modes, it is possible to extend the life of the base sheet 24 that is repeatedly reused.

[0095] <First Aspect> In the first aspect, the same flow as the first cycle is repeated from the second cycle (one cycle is the period from when the base sheet 24 is unwound from the roll 4 a to when it is taken up by the take-up machine 22 a). If the usage of the carbon nanotube production apparatus 2 is simply limited to the first aspect, a buffer layer and a catalyst layer are formed on the base sheet 24 with each cycle, and the thickness of the base sheet 24 increases.

[0096] <Second Aspect> In the second aspect, a catalyst layer removal mechanism (not shown), such as an etching device, is disposed in the carbon nanotube production apparatus 2, and the catalyst layer is removed from the base sheet 24. For example, the catalyst layer removal mechanism is disposed between the second storage chamber 12b and the take-up machine 22a shown in FIG. 1 , and the old catalyst layer formed in the first cycle is removed before the base sheet 24 from which the CNTs have been collected is taken up by the take-up machine 22a. When the base sheet 24 from which the old catalyst layer has been removed is rewound onto the roll 4a, a new catalyst layer is again formed on the base sheet 24 in the second cycle. The new catalyst layer is removed before the base sheet 24 is taken up by the take-up machine 22a. The same process is repeated from the third cycle onwards.

[0097] When the catalyst layer removal mechanism is used, the settings of the sputtering chamber 6 are adjusted so that only the catalyst layer is formed on the substrate sheet 24 from the second cycle onwards.

[0098] In this way, by providing the catalyst layer removal mechanism in the carbon nanotube production apparatus 2, it is possible to suppress an increase in the thickness of the base sheet 24 from the second cycle onwards.

[0099] The catalyst layer removal mechanism does not necessarily have to be disposed between the second storage chamber 12b and the take-up machine 22a, but may be disposed at any location between the roll 4a and the take-up machine 22a. Therefore, as long as the old catalyst layer is removed in the unwinding process, the catalyst layer removal mechanism may be disposed at any position between the roll 4a and the take-up machine 22a.

[0100] Alternatively, the old catalyst layer may be removed in a new cycle. In this case, for example, a catalyst layer removal mechanism is disposed between the roll 4a and the sputtering chamber 6. In the second cycle, when the base sheet 24 with the old catalyst layer still formed thereon is unwound from the roll 4a, the old catalyst layer is immediately removed by the catalyst layer removal mechanism, and a new catalyst layer is again formed on the base sheet 24 in the sputtering chamber 6.

[0101] <Third Aspect> In the third aspect, a layer removal mechanism (not shown) is provided in the carbon nanotube production apparatus 2 to remove the catalyst layer and the buffer layer from the substrate sheet 24. The third aspect is similar to the second aspect in that the location of the layer removal mechanism, the timing of removing the old layer, and the layer removal mechanism mainly uses an etching device, a polishing device, or the like. When the layer removal mechanism is used, the settings of the sputtering chamber 6 are adjusted so that both the catalyst layer and the buffer layer are formed on the substrate sheet 24 from the second cycle onwards.

[0102] Furthermore, in each embodiment of the carbon nanotube production apparatus 2 described using Figures 1 to 7, an example is shown in which a forward feed operation and a reverse rewind operation are repeated, but it is not necessarily necessary to repeat the forward and reverse repetitive operations.

[0103] For example, the base sheet 24 may be replaced after each cycle. Specifically, when all of the base sheet 24 wound around the roll 4a has been taken up by the take-up machine 22a, the roll 4a is released. Then, after the entire base sheet 24 has been wound up by the take-up machine 22a, the base sheet 24 is collected together with the take-up machine 22a. After one cycle is completed, a new take-up machine 22a is attached to the carbon nanotube production apparatus 2, and initial settings are performed to set the base sheet 24 along the entire conveyance line from the roll 4a to the take-up machine 22a. This is repeated each time a cycle is completed.

[0104] The base sheet 24 needs to be fixed to the take-up machine 22a, but does not necessarily need to be fixed to the roll 4a.

[0105] As another embodiment that does not require repeated feeding and rewinding operations, a method of joining new and old base sheets 24 as needed can also be considered. Specifically, when one cycle is completed, the entire base sheet 24 is taken up by the take-up machine 22a. Here, when the base sheet 24 wound around the roll 4a runs out, a new base sheet 24 is replenished onto the roll 4a. Then, the downstream end of the new base sheet 24 unwound from the roll 4a is joined to the upstream end of the existing base sheet 24. Specific joining methods include welding. Note that instead of replenishing the roll 4a with new base sheet 24, the entire roll 4a may be replaced with a new one.

[0106] Then, on the downstream side, a new take-up machine 22a is prepared, the existing take-up machine 22a is removed together with the wound base sheet 24, and the new take-up machine 22a is installed.

[0107] Specifically, a predetermined amount of the base sheet 24 is wound around the existing take-up machine 22a, and when the diameter of the base sheet 24 increases, the base sheet 24 is cut and collected together with the existing take-up machine 22a. Note that the cut portion of the base sheet 24 does not necessarily have to be the welded portion.

[0108] Next, a new take-up machine 22a is attached to the carbon nanotube production apparatus 2, and the downstream end of the base sheet 24 set in the apparatus is fixed to the new take-up machine 22a.

[0109] This allows a series of processes to be continued without repeating the forward and rewind operations. In this case, the initial setting can be performed only once.

[0110] In this regard, if a base sheet (hereinafter referred to as a "long base sheet") longer than the base sheet 24 used in each embodiment is used, the weight of the long base sheet tends to be excessive, making it difficult to operate the carbon nanotube production apparatus 2 without any problems. Furthermore, stopping the operation of the carbon nanotube production apparatus 2 every time a long base sheet is used, preparing a new base sheet, and performing initial setup to set the long base sheet along the entire conveying line requires a great deal of time and effort. However, as described above, by replenishing the roll 4a with base sheet 24 as needed and joining the old and new base sheets 24 as needed, a series of processes can be performed without repeating the feeding and rewinding operations.

[0111] Furthermore, in the above-described embodiment, a carbon nanotube production apparatus 2 is exemplified which is equipped with an accumulator 10 that adjusts the transport speed of the base sheet 24 transported from the sputtering chamber 6 to the CVD chamber 16, but the speed adjustment mechanism that adjusts the transport speed is not necessarily limited to the accumulator 10, and the devices that make up the series of transport lines are not necessarily limited to the carbon nanotube production apparatus 2.

[0112] A long sheet processing device equipped with a conveying line for conveying a long, strip-shaped sheet similar to the base sheet 24 may also be used for purposes other than the production of carbon nanotubes, such as producing thin films for integrated circuits or organic EL panels on the front or back of the long sheet.

[0113] In this case, such a long sheet processing device may be equipped with multiple processing mechanisms (processing processes) for processing long sheets, such as a payout roll that pays out the strip-shaped long sheet transported along the transport line, a speed adjustment mechanism (speed adjustment process) that adjusts the transport speed of the long sheet, and a payout roll that recovers the long sheet.

[0114] Here, the speed adjusting mechanism is not limited to the accumulator 10 described in the above embodiment, as long as it has a function of changing the conveying speed of the long sheet between the upstream and downstream of the conveying line.

[0115] As an example of a speed adjustment mechanism, similar to the accumulator 10 shown in Figure 1, a configuration can be considered in which multiple suspension rolls are provided at the top and bottom of the speed adjustment mechanism to alternately suspend the long sheet being transported so that it snakes, and at least one of the suspension rolls at the top and bottom of the speed adjustment mechanism moves vertically to change the transport speed of the long sheet upstream and downstream of the transport line.

[0116] Alternatively, the speed adjustment mechanism may be configured in a manner similar to the accumulator 53 shown in Figure 5, in which multiple transfer rolls are provided upstream and downstream of the conveying line within the speed adjustment mechanism for alternately transferring the long sheet being conveyed in a serpentine manner, and at least one of the transfer rolls upstream and downstream of the conveying line moves horizontally to change the conveying speed of the long sheet upstream and downstream of the conveying line.

[0117] The processing of long sheets is not necessarily limited to sputtering or CVD, and the long sheet processing apparatus may be provided with a deposition mechanism for depositing a predetermined deposit on the long sheet. Examples of the deposition mechanism include mechanisms for CVD, PVD (physical vapor deposition), and coating. Examples of PVD include evaporation, molecular beam epitaxy, ion plating, ion beam deposition, and sputtering.

[0118] There may be a plurality of deposition mechanisms, and the plurality of deposition mechanisms may be different mechanisms. Specifically, CVD may be overlapped, such as CVD, PVD, and CVD. Of course, a plurality of identical deposition mechanisms may be provided in series.

[0119] In this case, the series of conveying lines may be configured in the same manner as the configuration of the first storage chamber 12a to the second storage chamber 12b described using Figure 1, with the attachment mechanism sandwiched between them, and the first storage chamber located upstream of the attachment mechanism and the second storage chamber located downstream of the attachment mechanism may each store multiple tiers of folding rolls for folding back the long sheet.

[0120] The first storage chamber and the second storage chamber each store a folding roll for folding the conveyed long sheet alternately so that the sheet snakes in the horizontal direction.

[0121] The long sheet is alternately folded back in the horizontal direction by the turn-back roll from the upstream side of the adhering mechanism to the downstream side and from the downstream side of the adhering mechanism to the upstream side, while the adhering material is adhered to the long sheet in the adhering mechanism.

[0122] The turn-back rolls may be disposed above and below the attachment mechanism, so that one long sheet is turned back alternately above and below the attachment mechanism in a meandering manner (see FIG. 6).

[0123] Of course, a speed adjustment mechanism with multiple stages of hanging rolls arranged upstream and downstream of the conveying line may be provided so that the long sheet snakes horizontally, and turn-back rolls may be arranged above and below the attachment mechanism, so that a single long sheet snakes by being alternately turned above and below the attachment mechanism (see Figure 7).

[0124] The storage chamber may house both the turn-back roll and the recovery mechanism, or may house only one of them.

[0125] Furthermore, a layer forming mechanism may be provided that forms a layer on at least one of the front and back surfaces of the long sheet to facilitate the formation of a layer such as a catalyst layer or a buffer layer before the long sheet is attached with a predetermined deposit. In this case, the layer forming mechanism is not limited to the sputtering chamber 6.

[0126] The long sheet processing device may also include a recovery mechanism that recovers the deposits that have been adhered to the long sheet by the adhesion mechanism. The recovery mechanism may include a spatula-shaped scraper that is disposed near the turn-back roll and scrapes off the deposits from the conveyed long sheet, and a storage unit that stores the deposits scraped off by the scraper.

[0127] In addition, in a long sheet processing device, when the conveying speed of a long sheet is changed using a speed adjustment mechanism, at least one of the upstream and downstream hanging rolls in the conveying direction may be arranged so that it can be moved in a direction inclined at a predetermined angle from a conveying direction other than a vertical or horizontal direction, such as an oblique direction.

[0128] The long sheet processing apparatus may include a plurality of speed adjustment mechanisms. For example, as shown in Fig. 8, a long sheet processing apparatus 200 may include a first roll chamber 204, a first process 206, a first speed adjustment mechanism 208, a second process 210, a second speed adjustment mechanism 212, a third process 214, a third speed adjustment mechanism 216, a fourth process 218, and a second roll chamber 220.

[0129] The conveying speed of the long sheet 224 in the long sheet processing device 200 depends on each process through which the long sheet 224 passes, and the conveying speed of the long sheet 224 in the first process 206, the second process 210, the third process 214, and the fourth process 218 are different from one another. However, by providing a speed adjustment mechanism between each process in this manner, the conveying speed of the long sheet 224 can be adjusted in a comprehensive manner.

[0130] 2 Carbon nanotube production apparatus 4 First roll chamber 4a Roll 6 Sputtering chamber 8 Pressure adjustment chamber 10, 50, 52, 53 Accumulator 11, 54 Hanging roll 11a, 54a First roll 11b, 54b Second roll 12 Storage chamber 12a, 62a First storage chamber 12b, 62b Second storage chamber 14 Heat shielding section 14a, 64a First heat shielding section 14b, 64b Second heat shielding section 16 CVD chamber 18, 68 Turn-back roll 18a, 68a First turn-back roll 18b, 68b Second turn-back roll 20, 70 Recovery section 20a, 70a First recovery section 20b, 70b Second recovery section 22 Second roll chamber 22a Take-up machine 24 Base material sheet 30 Rotating roll 32a First roll 32b Second roll 32c First rotating bar 34a First roll 34b Second roll 34c Second rotating bar 51 Pinch roll 51a Inlet pinch roll 51b Exit pinch roll 200 Long sheet processing device 204 First roll chamber 206 First process 208 First speed adjusting mechanism 210 Second process 212 Second speed adjusting mechanism 214 Third process 216 Third speed adjusting mechanism 218 Fourth process 220 Second roll chamber 224 Long sheet

Claims

1. A long sheet processing device provided with multiple processing mechanisms for processing long strip sheets transported on a conveying line, characterized in that it is equipped with a speed adjustment mechanism for changing the transport speed of the long sheets upstream and downstream of the conveying line.

2. The long sheet processing apparatus described in claim 1, characterized in that the speed adjustment mechanism has a plurality of transfer rolls at the top and bottom of the speed adjustment mechanism or at the upstream and downstream of the conveying line within the speed adjustment mechanism for alternately transferring the long sheet being conveyed in a serpentine manner, and when the transfer rolls are arranged at the top and bottom of the speed adjustment mechanism, at least one side of the transfer roll moves vertically, or when the transfer rolls are arranged upstream and downstream of the conveying line within the speed adjustment mechanism, at least one side of the transfer roll moves horizontally, thereby changing the conveying speed of the long sheet upstream and downstream of the conveying line.

3. A long sheet processing apparatus as described in claim 1, characterized in that it is provided with an adhesion mechanism that adheres a predetermined adhesion substance to the long sheet, and a recovery section that recovers the adhesion substance adhered to the long sheet by the adhesion mechanism from the long sheet.

4. A long sheet processing apparatus as described in claim 3, characterized in that it is provided with a plurality of turn-back rolls for alternately turning back the transported long sheet in a serpentine manner, at the top and bottom of the attachment mechanism, or at the upstream and downstream of the transport line, with the attachment mechanism in between, and the recovery unit is located near each of the turn-back rolls.

5. A long sheet processing method including a plurality of processing steps for processing a strip-shaped long sheet transported on a conveying line, characterized in that the long sheet processing method includes a speed adjustment step for changing the conveying speed of the long sheet upstream and downstream of the conveying line.

6. A carbon nanotube manufacturing apparatus comprising: a sputtering chamber that forms a catalyst layer on a strip-shaped substrate sheet transported on a transport line; a CVD chamber that forms a layer of carbon nanotubes on the catalyst layer of the substrate sheet by a CVD (Chemical Vapor Deposition) method; and an accumulator located between the sputtering chamber and the CVD chamber, wherein the accumulator adjusts the transport speed of the substrate sheet on the transport line so that the transport speed is different between the sputtering chamber and the CVD chamber.

7. The carbon nanotube manufacturing apparatus described in claim 6, characterized in that the accumulator has a plurality of transfer rolls at the top and bottom of the accumulator, or at the upstream and downstream of the conveying line within the accumulator, for alternately transferring the conveyed base sheet in a serpentine manner, and when the transfer rolls are arranged at the top and bottom of the accumulator, at least one side of the transfer roll moves vertically, and when the transfer rolls are arranged upstream and downstream of the conveying line within the accumulator, at least one side of the transfer roll moves horizontally, thereby changing the conveying speed of the base sheet upstream and downstream of the accumulator on the conveying line.

8. The carbon nanotube manufacturing apparatus according to claim 6, further comprising a recovery section for recovering the carbon nanotubes formed on the catalyst layer of the substrate sheet in the CVD chamber from the substrate sheet.

9. A carbon nanotube manufacturing apparatus as described in claim 8, characterized in that it has multiple turn-around rolls at the top and bottom of the CVD chamber, or at the upstream and downstream of the conveying line, sandwiching the CVD chamber, for alternately turning back the transported substrate sheet in a serpentine manner, and the recovery sections are each located near the turn-around rolls.

10. A method for producing carbon nanotubes, comprising: a catalyst layer forming step of forming a catalyst layer on a strip-shaped substrate sheet being transported on a transport line; a speed adjusting step of adjusting the transport speed of the substrate sheet on which the catalyst layer has been formed so that the transport speed is different from the transport speed in the catalyst layer forming step; and a CVD (Chemical Vapor Deposition) step of forming a layer of carbon nanotubes on the catalyst layer of the substrate sheet.

11. A method for producing carbon nanotubes as described in claim 10, characterized in that it includes a payout step of paying out the base sheet from a roll, a take-up step of winding the base sheet onto a take-up machine after the carbon nanotubes formed on the catalyst layer have been collected and taking it up, and a rewinding step of paying out the base sheet wound onto the take-up machine in a direction opposite to the original transport direction, transporting it, and rewinding it onto the roll, wherein the forward feeding operation of forming the carbon nanotubes on one base sheet, collecting the formed carbon nanotubes, and collecting the remaining base sheet, and the rewinding operation of rewinding the base sheet from which the carbon nanotubes have been collected in the reverse direction are repeated multiple times.

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