The disclosed apparatus for mixing and supplying chemicals used for
semiconductor processes according to the present application includes: raw chemical supply lines for externally supplying chemicals; and a mixing line for receiving the chemicals from the raw chemical supply lines to produce a chemical mixture; wherein one end of each of the raw chemical supply lines is connected to a
chemical storage tank in which the chemicals are stored, and a chemical flow controller for controlling the flow rate of the chemicals is installed in each of the raw chemical supply lines, and the chemical flow controllers installed in each of the raw chemical supply lines are controlled in multiple channels using one controller, and the flow rate of each of the chemicals is preset corresponding to a
mixing ratio of the chemicals and stored as a preset value, and when the chemicals are supplied for mixing, the flow rates of the chemicals are simultaneously controlled using the preset values corresponding to the
mixing ratio, which are previously stored.