The invention discloses a generation method and device of an
optical proximity correction model, a
correction method, a medium and equipment. The generation method comprises the following steps: acquiring sample
light source information, preset pattern parameters corresponding to a plurality of
mask test patterns and actual measurement key sizes; and taking the sample
light source information, the plurality of preset pattern parameters and the plurality of actually measured key sizes as inputs of an initial correction model, taking an estimated
key size corresponding to the threshold distribution of the
photoresist image as an expected output, and optimizing the initial correction model based on an expected matching degree between the estimated
key size and the actually measured
key size to obtain an
optical proximity correction model. The preset pattern density is introduced into the preset pattern parameters, the density effect can be well captured, the
critical dimension deviation trend caused by the density effect is reduced, the prediction accuracy of the
optical proximity correction model is improved, additional compensation is not needed, the generation step and the correction step of the optical proximity correction model are simplified, and the prediction accuracy of the optical proximity correction model is improved. And the generation period of the model is shortened.