Photosensitive composition, pattern, and display device having pattern
A manufacturing method and a color conversion technology, which are applied in the fields of photosensitive compositions and display devices, can solve the problems of lowering of display quality and increase of chromaticity changes, and achieve the effect of improving display quality
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Embodiment 1
[0119] TiO 2 Filler (average particle size: 200nm), 2-hydroxy-3-phenoxypropyl acrylate as a photopolymerizable (meth)acrylic monomer, benzyl methacrylate (BZMA) / methacrylic acid as an alkali-soluble resin (MAA) / glycidyl methacrylate (GMA) copolymer, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropane-1- Ketone, and diethylene glycol monobutyl ether / propylene glycol monomethyl ether acetate mixed solvent as an organic solvent are added to the container in such a way that the weight ratio reaches 30:40:30:3:100 in sequence and stirred , after roughly mixing, further mixing was performed using a three-roll mill. This produces a homogeneously dispersed TiO 2 Filled photosensitive composition.
[0120] The above-mentioned BZMA / MAA / GMA copolymer is obtained by copolymerizing BZMA, MAA and GMA in a weight ratio of 75:16.8:8.2 (because GMA is a glycidyl compound of MAA, the weight ratio of BZMA to MAA is 75:25). copolymer. The BZMA / MAA / GMA copolymer had a weight average molecul...
Embodiment 2
[0128] make TiO 2 Filler, 2-hydroxy-3-phenoxypropyl acrylate, BZMA / MAA / GMA copolymer, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropane-1 - The weight ratio of ketone and diethylene glycol monobutyl ether / propylene glycol monomethyl ether acetate mixed solvent reaches 10: 50: 40: 3: 100 successively, except that, carry out the operation identical with embodiment 1 operation, thus producing a photosensitive composition and pattern. Table 1 summarizes the evaluation results of the composition and pattern of the obtained photosensitive composition.
Embodiment 3
[0130] As the photopolymerizable (meth)acrylic acid monomer, except that the methacrylic acid adduct of bisphenol A diglycidyl ether was used instead of 2-hydroxy-3-phenoxypropyl acrylate, proceed and implement A photosensitive composition and a pattern were manufactured by the same operation as in Example 1. Table 1 summarizes the evaluation results of the composition and pattern of the obtained photosensitive composition.
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